CN1844000A - Permanent self-cleaning glass with visible light responsibility and preparation method thereof - Google Patents
Permanent self-cleaning glass with visible light responsibility and preparation method thereof Download PDFInfo
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- CN1844000A CN1844000A CN 200610035099 CN200610035099A CN1844000A CN 1844000 A CN1844000 A CN 1844000A CN 200610035099 CN200610035099 CN 200610035099 CN 200610035099 A CN200610035099 A CN 200610035099A CN 1844000 A CN1844000 A CN 1844000A
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- 239000005348 self-cleaning glass Substances 0.000 title claims abstract description 28
- 238000002360 preparation method Methods 0.000 title claims description 19
- 239000011521 glass Substances 0.000 claims abstract description 68
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 35
- 238000004140 cleaning Methods 0.000 claims abstract description 26
- 238000004544 sputter deposition Methods 0.000 claims abstract description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 14
- 238000005245 sintering Methods 0.000 claims abstract description 12
- 238000000137 annealing Methods 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims abstract description 4
- 239000010408 film Substances 0.000 claims description 35
- 239000004408 titanium dioxide Substances 0.000 claims description 14
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- VDGJOQCBCPGFFD-UHFFFAOYSA-N oxygen(2-) silicon(4+) titanium(4+) Chemical compound [Si+4].[O-2].[O-2].[Ti+4] VDGJOQCBCPGFFD-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 8
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 239000010937 tungsten Substances 0.000 claims description 7
- 239000012298 atmosphere Substances 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 238000005477 sputtering target Methods 0.000 claims description 3
- 239000013077 target material Substances 0.000 claims description 3
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 claims description 2
- 239000005543 nano-size silicon particle Substances 0.000 claims description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 18
- 230000001699 photocatalysis Effects 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 7
- 238000007146 photocatalysis Methods 0.000 abstract description 7
- 230000005855 radiation Effects 0.000 abstract description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 4
- 230000007797 corrosion Effects 0.000 abstract description 3
- 238000005260 corrosion Methods 0.000 abstract description 3
- 230000006378 damage Effects 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 230000004298 light response Effects 0.000 abstract description 2
- 238000012545 processing Methods 0.000 abstract description 2
- 238000002834 transmittance Methods 0.000 abstract description 2
- 150000001450 anions Chemical class 0.000 abstract 1
- 150000001768 cations Chemical class 0.000 abstract 1
- 239000012459 cleaning agent Substances 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000005406 washing Methods 0.000 description 5
- 239000006210 lotion Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 238000000498 ball milling Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229960001866 silicon dioxide Drugs 0.000 description 3
- 238000002791 soaking Methods 0.000 description 3
- -1 tungsten ion Chemical class 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 238000005253 cladding Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RBTBFTRPCNLSDE-UHFFFAOYSA-N 3,7-bis(dimethylamino)phenothiazin-5-ium Chemical group C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 RBTBFTRPCNLSDE-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910001424 calcium ion Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
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- 239000000428 dust Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 238000006303 photolysis reaction Methods 0.000 description 1
- 230000015843 photosynthesis, light reaction Effects 0.000 description 1
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000006557 surface reaction Methods 0.000 description 1
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- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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Abstract
The invention belongs to functional material technology and glass processing field, concretely discloses a permanent self-cleaning glass with visible light response and method for making it. Firstly, sputtering silica dioxide film on the surface of glass, sputtering a layer of titanium oxide film with anion and cation codoping on the surface of silica dioxide film, annealing the glass with twin layer films at 500-600 DEG C, cooling by radiation in sintering stove, to get the product. The self-cleaning glass has good photocatalysis property and photo-induced hydrophilicity, stable performance, almost perpetual availability, high light transmittance ratio and transparency. It is widly used in glass curtain wall of skyscrapers, automobile glass, road lamp shade, kitchen galss and antifog glass, avoiding artificial cleaning indoor and outdoor glass of skyscrapers, saving manual power and material, reducing corrosion destruction of cleaning agent to glass and building machinery, embodying environment protection notion.
Description
Technical field
The invention belongs to functional materials technology and glass processing field, be specifically related to a kind of glass with new function material preparation and preparation method thereof with visible light-responded permanent self-cleaning performance.
Technical background
Self-cleaning glass be grow up recent years a kind of novel glass material, can be widely used on the glass and glasswork relevant with people's living environment.As building glass, cladding glass, partition glass, decoration glass, automobile windshield, automobile side window glass, speculum, skylight glass, light fixture lamp shade glass, cover-plate glass, hospital surgical equipment, kitchen glass, glass for lenses, household appliance glass, instrument glass, special operation glass etc.But, self-cleaning glass development at present also comes with some shortcomings, automatically cleaning effect as it is relatively poor, can only just have the automatically cleaning effect under given conditions, simultaneously, the automatically cleaning effect time is short, after the self-cleaning glass surface is exposed to and crosses for a long time in the contaminated air, loses efficacy owing to the surface is covered dirty being easy to by dust.
Studying a kind of glass that really has permanent automatically cleaning effect is a secular problem.Research method is a lot of at present, and mainly several is that glass is carried out finishing, and common has: have the film of self-cleaning function at glass surface plating one deck, or utilize the high-energy ion bombardment glass surface to improve surface energy etc.Thin-film material with self-cleaning function can be a silicon-dioxide, titanium dioxide or the like, and the characteristics of these materials are to have photocatalysis performance or photic wetting ability.Automatically cleaning principle with photocatalytic material is to utilize material breakdown to be adsorbed on the organism of material surface, organic polymer is degraded to small molecules, thereby reach self-cleaning purpose, shortcoming is that the decomposed substance on surface is not easy to remove, and uses the rear surface material that is decomposed easily to cover and lose self-cleaning function for a long time.And the automatically cleaning principle of hydrophilic material is because material surface has Superhydrophilic, can form moisture film on the surface.After pollution substance is adsorbed on material surface, just be easy to be washed away, reach self-cleaning purpose by water.But the material of this only possess hydrophilic property energy can not decompose the pollutent of surface adsorption, when the surface contamination material gathers the hydrophilic-structure of enough destruction material surfaces, will lose self-cleaning function.Since finding to have in 1972 after photolysis water and nineteen ninety-five find to have photic hydrophilic effect, nano titanium oxide has the extensive concern that has been subjected to material circle owing to have these two character simultaneously, is used in gradually above the development self-cleaning glass.But simple nano-titanium dioxide film can only be in exciting light catalytic under the UV-light and photic wetting ability, do not respond for the visible light part, range of application mainly concentrates on outdoor cladding glass and the indoor zone that UV-irradiation is arranged, as the hospital disinfection district etc., the just very faint even not reaction of automatically cleaning effect under the weather of common interior lighting and outdoor darkness.Simultaneously, the photocatalysis thin film on surface lost efficacy when being subjected to outside contamination and mechanical friction easily, and real effective service life is limited.The Activ that Britain Pilkington company produces
TMSelf-cleaning antifog glass is the gold mark in self-cleaning glass field now, its surface TiO
2Photic wetting ability of film and photocatalytic effect do not respond indoor, and outdoor response speed is slower, need 5 day time to activate fully.In actual use, even under the complete sunny weather condition in south, also need the sun 2-5 talent that is exposed to the sun to have antifog preferably and automatically cleaning effect.This has limited the application space of self-cleaning glass greatly.
Summary of the invention
The objective of the invention is to overcome the deficiency that existing self-cleaning glass exists, a kind of visible light-responded permanent self-cleaning glass that has is provided.
Another object of the present invention provides the preparation method of above-mentioned self-cleaning glass.
Self-cleaning glass of the present invention is by reaching the automatically cleaning purpose under the visible light at plating function film on the surface of ordinary glass.Described function film is a modified nano-titanium dioxide thin film, and its composition is Ti
1-xW
xO1
-yN
y(x, y=0.5).Utilize tungsten and nitrogen to replace part titanium and oxygen respectively according to band theory in titanium dioxide, wherein tungsten ion is incorporated in the titanium dioxide by the mixing and ball milling targetry.And reach doping nitrogen ionic purpose by rf magnetron sputtering in nitrogen atmosphere.
Principle of the present invention is the nano titanium dioxide photocatalysis film that applies one deck modification in surface of ordinary glass.Nano titanium oxide itself has certain photocatalysis characteristic, but its photocatalysis characteristic can only excite under ultraviolet ray, for partly not response of visible light.The quantitative nitrogen that mixes therein replaces oxygen, forms the oxygen room, simultaneously impurity band can and titanium dioxide effectively overlap, make and pass through TiO in the life cycle of photoexcitation carrier
2Be delivered to surface reaction, and low being with can responding to visible light.In doping nitrogen, Doped Tungsten ion also, tungsten ion has the effect of stored energy, and it is right to store visible light and ultraviolet ray excited electronics-hole, prolongs its recombination time, also can not lose efficacy thereby self-cleaning glass was stored for a long time in the dark.
Self-cleaning glass of the present invention also has one deck nanometer titanium dioxide silicon film between glass surface and function film.The effect of nanometer titanium dioxide silicon film is to serve as the blocking layer in the post annealed process, in case in the annealing process in the glass ingredient sodium ion, potassium ion and calcium ion etc. be penetrated in the nano-titanium dioxide film of modification and go, influence the performance of follow-up modified film, also can prevent simultaneously in use these ionic infiltrations in the glass.
The preparation method of self-cleaning glass of the present invention comprises the steps: 1) preparation sputter titanium dioxide hybrid target: the doping tungstic oxide prepares hybrid target in titanium dioxide, and the mol ratio of tungsten and titanium is 1: 19～49; Press proportioning mixing and ball milling, high temperature sintering in sintering oven then with titania powder and tungsten trioxide powder.2), cleaning glass: the common spot in water cleaning glass surface at first, utilize " washing lotion " to soak glass again and utilize deionized water ultrasonic cleaning repeatedly after 3 hours.The ultrasonic cleaning time is 5～15min, and wash number is 3～5 times.3), utilize magnetron sputtering at glass surface sputter silica membrane, the thickness of sputtered film is 20～30nm.4), in the presence of the nitrogen argon gas, utilize magnetron sputtering sputter titanium dioxide hybrid target on the surface of nanometer titanium dioxide silicon film, obtain modified nano-titanium dioxide thin film; Thickness is 30～80nm.5), the glass that plated bilayer film is at 500～600 ℃ of annealing after 3～5 hours down, naturally cooling in the sintering oven.
In above-mentioned preparation method, glass substrate is a simple glass, and the washing lotion composition is the vitriol oil and potassium bichromate.In the washing lotion of during immersion whole glass surface being submerged, soak time is 3 hours.Magnetron sputtering is the radio frequency reaction magnetron sputtering, and sputtering target material is the pure silicon dioxide target during preparation silica membrane.Sputtering atmosphere is a pure argon.Operating pressure is 0.8～1.2Pa during the sputter reaction, and sputtering power is 180W.Sputtering time 2～4h.Target is the hybrid target of doping tungstic oxide during preparation modifying titanium dioxide film, and sputtering atmosphere is nitrogen and argon gas, and its component volume ratio is pressed N
2/ (N
2+ Ar) be 0.5～1, operating pressure is 0.8～1.5Pa during the sputter reaction.Sputtering power is 180～250W, and sputtering time is 3～8h; The glass substrate temperature is 100～150 ℃.During annealing, the temperature rise rate of sintering oven remains on 1 ℃/min.
Compare with existing self-cleaning glass, the present invention has following beneficial effect:
1, has good hydrophilicity.At wavelength is 400nm-700nm, and power is under the white light irradiation of 8W behind the 60min, and the contact angle of water 72 ° when initial become 5 °, have Superhydrophilic.Simultaneously, when preserving in the dark, the wetting ability out-of-service time is longer, after the illumination contact be 5 °, preserve 4 days in the dark after, contact angle only is 21 °.
2, has high visible light response activity.Test the self-cleaning glass that this experimental technique prepares down at visible light (wavelength 400nm-700nm), the rate of decomposition of methylene blue can reach 0.06893hr
-1
3, have good corrosion resistance and friction resistant performance.In concentration is to soak 24 hours in the NaOH solution of 1mol/L, transmission of visible light difference DELTA T＜1% before and after soaking, and superficial film does not have considerable change.Soaked 24 hours in the HCl of 1mol/L solution, transmission of visible light difference DELTA T is about 1% before and after soaking, and superficial film does not have considerable change.At 500g, under the 200r, transmission of visible light difference DELTA T is about 1.01% before and after the meter layer film mill.
4, the self-cleaning glass uniformity of film of the inventive method preparation is good, glass color difference value Δ E*ab=2.6～2.8CIELAB.The visible region average transmittance is more than 80%.
5, preparation method of the present invention prepares photocatalysis thin film by the radio frequency reaction magnetron sputtering, and plated film is even, and thickness is controlled easily, both has been suitable for prepared in laboratory research, also is suitable for the big area industrial production.The glass curtain wall that can be widely used in skyscraper, vehicle glass, the street lamp lampshade, kitchen glass, and antifog glass (the bathroom antifog glass is decorated antifog glass) or the like.The widespread use of glass of the present invention can be exempted the artificial cleaning of skyscraper indoor and outdoor glass, uses manpower and material resources sparingly, and reduces the artificial corrosion and the destruction to glass and building structure of using sanitising agent to bring of cleaning, and embodies the environmental protection notion.
Description of drawings
Fig. 1 is the structure of permanent self-cleaning glass of the present invention;
Fig. 2 is a permanent self-cleaning glass preparation method flow process of the present invention;
Fig. 3 is the variation diagram of permanent self-cleaning glass of the present invention contact angle before and after radiation of visible light.
Among Fig. 1,1 is the modifying titanium dioxide film, and 2 is the nanometer titanium dioxide silicon film, and 3 is the simple glass substrate.
Embodiment
Embodiment 1
Glass cutting is become the size of needs.Water cleaning glass surface blot; The glass of washing surperficial dirt off is immersed in the washing lotion 3 hours, again with deionized water ultrasonic cleaning 5 times repeatedly, each 10min.Cleaning the back dries up with nitrogen; Utilize rf magnetron sputtering at glass surface sputter one deck nanometer titanium dioxide silicon film.Sputtering target material is the pure silicon dioxide target, and sputtering atmosphere is a pure argon, and sputter pressure is 0.8Pa, and sputtering power is 180W, and the glass substrate temperature is 150 ℃, sputtering time 4 hours, and sputter nano silicon film thickness is for being about 30nm; With titania powder and tungsten trioxide powder (mol ratio of tungsten and titanium is 1: 19) mixing and ball milling, high temperature sintering in sintering oven then in proportion; At the radio frequency reaction magnetron sputtering titanium dioxide hybrid target of using on glass of surface plating nanometer titanium dioxide silicon film, sputtering atmosphere is N
2/ (Ar+N
2)=2/3, operating pressure is 1.0Pa, sputtering power is 250W, 150 ℃ of glass substrate temperature, sputtering time 6 hours, obtain modified nano-titanium dioxide thin film that thickness is about 60nm after, in sintering oven, anneal, annealing temperature is 500 ℃, and temperature rise rate is 1 ℃/min, soaking time naturally cooling in the sintering oven after 3 hours.The structure of gained glass such as Fig. 1, preparation flow such as Fig. 2.
Self-cleaning glass prepared by this method is 400nm-700nm in illumination wavelength, and power is 8W, and behind the 60min, contact angle is reduced to below 5 ℃ by 72 ℃, has super hydrophilic effects under the spacing 7cm radiation of visible light.Fig. 3 is seen in the variation of the self-cleaning glass that makes contact angle before and after radiation of visible light.
Claims (6)
1, a kind of self-cleaning glass has self-cleaning function by reaching under visible light at plating function film on the glass surface, it is characterized in that described function film is a modified nano-titanium dioxide thin film, and its molecular formula is: Ti
1-xW
xO
1-yN
y, x, y=0.5.
2, self-cleaning glass according to claim 1 is characterized in that, also has one deck nanometer titanium dioxide silicon film between glass surface and the function film.
3, the preparation method of the described self-cleaning glass of claim 2 comprises the steps: (1) preparation sputter titanium dioxide hybrid target: in titanium dioxide, adds tungstic oxide, mixes, and high temperature sintering then, the mol ratio of tungsten and titanium is 1: 19～49; (2) cleaning glass surface; (3) utilize magnetron sputtering at glass surface sputter nanometer titanium dioxide silicon film; (4) in the presence of the nitrogen argon gas, utilize magnetron sputtering sputter tungstic oxide and titanium dioxide hybrid target on the surface of nanometer titanium dioxide silicon film; (5) glass that has plated bilayer film descends annealing after 3～5 hours at 500～600 ℃, naturally cooling in sintering oven.
4, preparation method according to claim 3 is characterized in that the described magnetron sputtering of step (3) is the radio frequency reaction magnetron sputtering, and sputtering target material is the pure silicon dioxide target, and sputtering atmosphere is a pure argon, and the glass substrate temperature is 100～150 ℃.Obtaining the nano silicon film thickness is 20～30nm.
5, preparation method according to claim 3 is characterized in that the sputtering power of the described sputter titanium dioxide of step (4) hybrid target is 180～250W, and sputtering time is 3～8 hours; Sputtering atmosphere is nitrogen and argon gas, and its component volume ratio is pressed N
2/ (N
2+ Ar) be 0.5～1, sputter reaction operating pressure is 0.8～1.5Pa.Obtaining titania-doped film thickness is 30～80nm.
6, preparation method according to claim 3 is characterized in that the temperature rise rate of the described annealed sintering oven of step (5) remains on 1 ℃/min.
Priority Applications (1)
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|---|---|---|---|
| CNB2006100350994A CN100551858C (en) | 2006-04-21 | 2006-04-21 | A kind of have visible light-responded permanent self-cleaning glass and preparation method thereof |
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|---|---|---|---|
| CNB2006100350994A CN100551858C (en) | 2006-04-21 | 2006-04-21 | A kind of have visible light-responded permanent self-cleaning glass and preparation method thereof |
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| CN100551858C CN100551858C (en) | 2009-10-21 |
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| CN102168247A (en) * | 2011-04-15 | 2011-08-31 | 河南大学 | Preparation method and application of TiO2/WO3 composite film |
| CN102225849A (en) * | 2011-04-21 | 2011-10-26 | 常州大学 | Preparation method of glass surface antireflection film without sintering |
| CN102515566A (en) * | 2011-11-07 | 2012-06-27 | 中山市格兰特实业有限公司火炬分公司 | Magnetron sputtering self-cleaning glass with visible light response, and preparation method thereof |
| CN102649623A (en) * | 2011-02-28 | 2012-08-29 | 中国科学院理化技术研究所 | Anti-reflection super-hydrophilic self-cleaning anti-fog glass and preparation method thereof |
| CN102950843A (en) * | 2012-11-29 | 2013-03-06 | 大连创达技术交易市场有限公司 | Automotive glass with anti-fog and self-cleaning functions |
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| CN107200580A (en) * | 2017-06-21 | 2017-09-26 | 佛山市钜仕泰粉末冶金有限公司 | A kind of optical nano ceramic insulation glass for strengthening visible light-transmissive and preparation method thereof |
| CN107604311A (en) * | 2017-08-10 | 2018-01-19 | 酒泉职业技术学院 | A kind of preparation method of automatically cleaning solar thermal collector antireflective coating |
| CN108126681A (en) * | 2016-12-01 | 2018-06-08 | 通用汽车环球科技运作有限责任公司 | For enhancing titanium dioxide（TiO2）The nucleating layer of the photocatalytic activity of coating |
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