CN102495532A - Single/double driving step scanning based double-workpiece table lateral exchange device - Google Patents
Single/double driving step scanning based double-workpiece table lateral exchange device Download PDFInfo
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- CN102495532A CN102495532A CN2011103780745A CN201110378074A CN102495532A CN 102495532 A CN102495532 A CN 102495532A CN 2011103780745 A CN2011103780745 A CN 2011103780745A CN 201110378074 A CN201110378074 A CN 201110378074A CN 102495532 A CN102495532 A CN 102495532A
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Abstract
Belonging to the technical field of semiconductor manufacturing equipment, the invention relates to a single/double driving step scanning based double-workpiece table lateral exchange device. The device comprises: a base platform, silicon wafer platforms positioned at a prealignment position and an exposure position, 4 linear motion units in Y direction and 2 linear motion units in X direction preset on balancing mass blocks, and transition linear motion units in Y direction simultaneously added between the prealignment position and the exposure position. Through butt joint of linear motor stators of the linear motion units in Y direction and the transition linear motion units in Y direction, motion of the silicon wafer platforms between a prealignment area and an exposure area can be finished so as to realize three-beat platform change. Three beats are adopted during platform changing, thus improving platform changing efficiency. Meanwhile, during specific implementation of the invention, the silicon wafer platforms always operate on the base platform, and move more stably. Besides, the linear motor stators in Y direction are in fixed connection with the silicon wafer platforms, thus avoiding grabbing mechanisms of the silicon wafer platforms. The device of the invention has the advantages of small motion inertia, short stability time, as well as compact structure and large structural rigidity, etc.
Description
Technical field
The invention belongs to semiconductor manufacturing equipment, relate generally to a kind of based on single/two double-workpiece-table outside switches that drive step-scan.
Background technology
Photoetching technique be method through exposure with the figure transfer on the mask to the photoresist that is coated on silicon chip surface, utilize technology such as follow-up development, etching with the figure transfer on the photoresist to silicon chip.Litho machine is one of ultraprecise system type engineering equipment important in the photoetching technique, and its overall performance has important effect for the overall optical carving technology.The main effect of work stage is under the condition of high speed and high acceleration, to carry wafer to realize the nanoscale location, operations such as the sheet up and down in the completion photoetching process, prealignment, aligning, and the while cooperates with mask platform accomplishes exposure actions.The work stage technology has crucial effects for improving litho machine resolution, alignment precision and productive rate.
Productive rate is mainly one of pursuing one's goal of litho machine industrialized development.In order to improve productive rate, avoid the frequent change wafer, the wafer current diameter progressively is increased to present 300mm from 150m, 200mm.When diameter wafer increased, the movement velocity of work stage and acceleration of motion had also been carried out corresponding raising.The movement velocity of work stage and the raising of acceleration of motion propose bigger test to the nanoscale location, and overall performance is made a big impact.In order further to improve productive rate; From reducing time to locating tab assembly; Someone proposes the double-workpiece-table technology; Promptly on work stage, set exposure station and prealignment station, two silicon chip platforms lay respectively at exposure station and prealignment station, carry out when adopting this mode to realize prealignment and exposure.The TwinScan system of Holland ASML company is the double-workpiece-table system that proposes the earliest in the world, also is the most representative present double-workpiece-table litho machine based on TwinScan technology (being the double-workpiece-table technology) litho machine.
Adopt the operational efficiency of the raising litho machine that the double-workpiece-table technology can be very big, improve productive rate.Different companies adopts different realization methods.Among two platform patent WO98/40791, each silicon chip platform has the unit of two commutative cooperations to realize the exchange of two platforms, works alone when realizing pre-service and exposure, has improved production efficiency.But the mode because the employing of silicon chip platform and guide rail is of coupled connections, can there be of short duration separating in the silicon chip platform with driver element in exchange process, and the bearing accuracy of silicon chip platform is impacted.Among the patent US2001/0004105A1; Adopt two platform switching technologies; Be implemented under the prerequisite that does not improve silicon chip platform movement velocity and improved productive rate; But owing to also adopt the mode that is of coupled connections between silicon chip platform and the guide rail, in changing the platform process, can occur the silicon chip platform equally equally and separate, influence the bearing accuracy of silicon chip platform with the of short duration of driver element.Simultaneously moving cell and guide rail are longer, and moving-mass is bigger, all produce harmful effect for the raising of movement velocity and acceleration.Among the patent CN101231471A; Adopt H type driver element to dock with friction pulley on the transition catching device; Avoiding guide rail merging precision problem, but the silicon chip platform need wait for when changing platform that driver element and friction pulley are accomplished and just can change platform after dock and operate, productive rate is brought very big influence.Among the patent CN1828427A; Be provided with an X to guide rail at the pre-service station; The exposure station is provided with two X to guide rail, realizes the concurrent working of two stations, but owing to driver element is fixed on the pedestal; When the silicon chip platform moves, have and be delivered to more energetically on the pedestal, integral body is brought harmful effect.
In the such scheme, the motion of guiding driver element is not to the influence of efficient when all having when changing platform to consider to change platform.Consider all to adopt five beat forms from changing the platform beat, promptly in changing the platform process, two silicon chip platforms need stay for some time and make catching device accomplish exchange, thereby accomplish the platform work of changing.Productive rate is being required under the increasingly high situation, and also can produce very big influence to productive rate the swap time of catching device.Among the patent CN101201555, utilize travelling belt to accomplish with the butt joint slide block and change the platform process, tact of motion is few; Therefore Operation and Maintenance is simple, but conveyer mechanism is fixed on the base station with the butt joint slide block, in changing the platform process; Have bigger masterpiece and be used on the base station, bigger to the overall dynamics performance impact.Among the patent CN1485694; Utilize Y to accomplish and change the platform operation, but, make tact of motion increase owing to the excesssive gap in the middle of the base station is introduced bridge-set to the butt joint of linear electric motors and line slideway; Increased and changed the platform time; On base station, the athletic meeting of moving component produces bigger reacting force to base station to X when changing platform to linear electric motors magnet steel partial fixing simultaneously, and then influences the dynamic property of total system.Utilize the butt joint of permute unit to accomplish among the patent CN101770181 and change platform work, but its guide piece is fixed on the base station, in changing the platform motion, moving component can produce bigger reacting force to base station, and then influences the dynamic property of total system.Therefore present two platform schemes have much room for improvement.
Summary of the invention
To the deficiency that exists in the above-mentioned prior art; It is a kind of based on single/two double-workpiece-table outside switches that drive step-scan that the present invention provides; Thereby this device adopts through Y and realizes that with the motion of completion silicon chip platform between prealignment zone and exposure area of docking of Y to transition rectilinear motion unit three beats change platform to the linear motor stator electric of rectilinear motion unit; Can improve and change platform efficient; The silicon chip platform runs on the base station all the time in the practical implementation process of the present invention simultaneously, and it is more steady to move, and Y connects firmly to linear motor rotor and silicon chip platform; Avoided the mechanism for card of grabbing of silicon chip platform, advantage such as have that movement inertia is little, stabilization time is short and have compact conformation and the rigidity of structure is big.
The objective of the invention is to realize like this:
Based on single/two double-workpiece-table outside switches that drive step-scan; This system comprises base station; The second silicon chip platform of first silicon chip platform that is set on the base station and runs on the prealignment station and exposure station; Be provided with the X that is made up of to second linear motor rotor to second linear motor stator electric, X to second static pressure air-float guide rail, X to first linear motor rotor, X to first linear motor stator electric, X to first static pressure air-float guide rail, X X to the first rectilinear motion unit along base station prealignment station, X is provided with Y that the Y that is made up of to first static pressure air-float guide rail to first linear motor stator electric, Y to first linear motor rotor, Y Y constitutes to second linear motor stator electric to second static pressure air-float guide rail, Y to the first rectilinear motion unit with by Y to the second rectilinear motion unit to the first rectilinear motion unit; Be provided with the X that constitutes to the 4th linear motor rotor to the 4th linear motor stator electric, X to the 4th static pressure air-float guide rail, X to the 3rd linear motor rotor, X to the 3rd linear motor stator electric, X to the 3rd static pressure air-float guide rail, X by X to the second rectilinear motion unit at base station exposure station; Be provided with Y that the Y that is made up of to the 3rd linear motor stator electric to the 3rd static pressure air-float guide rail, Y Y constitutes to the 4th static pressure air-float guide rail to the 4th linear motor stator electric, Y to the 4th linear motor rotor, Y to the 3rd rectilinear motion unit with by Y to the second rectilinear motion unit at X to the 4th rectilinear motion unit; Y is H type configuration to the second rectilinear motion unit and X to the first rectilinear motion unit to the first rectilinear motion unit and Y, and Y is H type configuration to the 4th rectilinear motion unit and X to the second rectilinear motion unit to the 3rd rectilinear motion unit and Y; Y to the first rectilinear motion unit and Y to the 3rd rectilinear motion units shared Y to first linear motor rotor; Y to the second rectilinear motion unit and Y to the shared Y of the 4th rectilinear motion waybill unit to the 4th linear motor rotor; Y is rigidly connected to first linear motor rotor and the first silicon chip platform, and Y is rigidly connected to the 4th linear motor rotor and the second silicon chip platform; X is arranged on the balance mass unit to the second rectilinear motion unit to the first rectilinear motion unit and X, and the balance mass unit bottom is an air bearing surface, and the air supporting of balance mass unit is on base station.
X is plate or U type motor to first and second rectilinear motion unit and the linear electric motors of Y to first, second, third and fourth rectilinear motion unit, and the arrangement form of linear electric motors adopts vertical or horizontal.
Change the platform scheme with existing rectilinear motion and compare, innovative point of the present invention and significant advantage are:
1, this device has realized that parallel bridge-type three beats of striding change platform.Work stage and Y connect firmly together to air-float guide rail cover and linear motor rotor, so in changing the platform process, do not grab card motion and change card motion, three beats can be accomplished the exchange of two work stage positions, save two beats than existing double-workpiece-table exchange scheme; Simultaneously in the exchange process first beat to keep to the side to integrate with the 3rd beat all are Y to two actions of working position pair drives mode to two guide rails, driving force is big, and driven member; Be y to guide rail (less than y to whole process 1/2) and work stage; Quality and inertia are little, and actuating speed is fast, comprehensive above-mentioned technical advantage; The platform time of changing of this programme can significantly be shorter than existing method and apparatus scheme, and this is one of innovative point of the present invention and remarkable advantage;
2, the parallel bridge duplex spare platform system architecture scheme of striding is proposed.On bridge, two groups of (4) y cooperate installation with it to air-float guide rail sliding sleeve and linear motor rotor with two air-float guide rails and linear electric motors arranged parallel.When exposure, exposure position work stage and two y constitute the step-scan system to air-float guide rail and linear electric motors; Prealignment position work stage and other two y to air-float guide rail and linear electric motors constitute the prealignment system (unload sheet, last slice, measure and adjustment).When two work stage switches, the corresponding top air-float guide rail and the linear electric motors of two systems slide to the base rapidly, run through the long air-float guide rail and the linear electric motors on y base on platform at composition one on the bridge; In like manner, form one and run through long air-float guide rail and the linear electric motors of y to the platform bottom.Two work stage slide to the opposite along upper and lower base air-float guide rail and linear electric motors respectively on bridge, and with two stations on two groups of y to new step-scan system and the prealignment system of air-float guide rail formation.This structure can guarantee two work stage when work all with the short lead rail form realize x to y to two guide rails with pair drive forms; Moving-mass and inertia are little, and one-piece construction rigidity and angular rigidity obviously promote, and make the driving force multiplication; Change platform and step-scan speed significantly promotes, productive rate obviously promotes; Step-scan precision and stable accuracy time obviously improve simultaneously.This be this programme innovative point and remarkable advantage two.
The integral structure scheme of x to moving cell proposed.Work stage is connected firmly to linear electric motors with y mutually, realized that silicon chip platform and y to the integrated design of air-float guide rail and linear electric motors, make more compact structure, the rigidity of structure significantly improves, and helps the lifting of control characteristic.This both can obviously promote two work stage and change the speed that platform duration stroke drives, and stepping and sweep velocity in the exposure process are significantly promoted.Comprehensive above-mentioned technical advantage, this programme can make the monolithic process-cycle obviously shorten than prior art, and this is three of innovative point of the present invention and a remarkable advantage.
Description of drawings
Fig. 1 general structure synoptic diagram of the present invention.
The side view of Fig. 2 general structure synoptic diagram.
Fig. 3,4,5,6 changes the platform schematic flow sheet for work stage.
Piece number among the figure: 1-base station; 2-balance mass unit; The 3a-first silicon chip platform; The 3b-second silicon chip platform; 4-X is to the first rectilinear motion unit; 4a-X is to first static pressure air-float guide rail; 4b-X is to first linear motor stator electric; 4c-X is to second static pressure air-float guide rail; 4d-X is to second linear motor stator electric; 4e-X is to first linear motor rotor; 4f-X is to second linear motor rotor; 5-Y is to the first rectilinear motion unit; 5a-Y is to first linear motor rotor; 5b-Y is to first linear motor stator electric; 5c-Y is to first static pressure air-float guide rail; 6-Y is to the second rectilinear motion unit; 6a-Y is to second static pressure air-float guide rail; 6b-Y is to second linear motor stator electric; 7-X is to the second rectilinear motion unit; 7a-X is to the 3rd static pressure air-float guide rail; 7b-X is to the 3rd linear motor stator electric; 7c-X is to the 4th static pressure air-float guide rail; 7d-X is to the 4th linear motor stator electric; 7e-X is to the 3rd linear motor rotor; 7b-X is to the 4th linear motor rotor; 8-Y is to the 3rd rectilinear motion unit; 8a-Y is to the 3rd static pressure air-float guide rail; 8b-Y is to the 3rd linear motor stator electric; 9-Y is to the 4th rectilinear motion unit; 9a-Y is to the 4th linear motor rotor; 9b-Y is to the 4th linear motor stator electric; 9c-Y is to the 4th static pressure air-float guide rail;
Embodiment
Below in conjunction with accompanying drawing the present invention is done further explain:
Based on single/two double-workpiece-table outside switches that drive step-scan; This system comprises base station 1; The second silicon chip platform 3b of first silicon chip platform 3a that is set on the base station 1 and runs on the prealignment station and exposure station; Be provided with the X that is made up of to the second linear motor rotor 4f to the second linear motor stator electric 4d, X to the second static pressure air-float guide rail 4c, X to the first linear motor rotor 4e, X to the first linear motor stator electric 4b, X to the first static pressure air-float guide rail 4a, X X to the first rectilinear motion unit 4 along base station 1 prealignment station, X is provided with Y that the Y that is made up of to the first static pressure air-float guide rail 5c to the first linear motor stator electric 5b, Y to the first linear motor rotor 5a, Y Y constitutes to the second linear motor stator electric 6b to the second static pressure air-float guide rail 6a, Y to the first rectilinear motion unit 5 with by Y to the second rectilinear motion unit 6 to the first rectilinear motion unit 4; Be provided with the X that constitutes to the 4th linear motor rotor 7f to the 4th linear motor stator electric 7d, X to the 4th static pressure air-float guide rail 7c, X to the 3rd linear motor rotor 7e, X to the 3rd linear motor stator electric 7b, X to the 3rd static pressure air-float guide rail 7a, X by X to the second rectilinear motion unit 7 at base station 1 exposure station; Be provided with Y that the Y that is made up of to the 3rd linear motor stator electric 8b to the 3rd static pressure air-float guide rail 8a, Y Y constitutes to the 4th static pressure air-float guide rail 9c to the 4th linear motor stator electric 9b, Y to the 4th linear motor rotor 9a, Y to the 3rd rectilinear motion unit 8 with by Y to the second rectilinear motion unit 7 at X to the 4th rectilinear motion unit 9; Y is H type configuration with X to the first rectilinear motion unit 4 to the second rectilinear motion unit 6 with Y to the first rectilinear motion unit 5, and Y is H type configuration with X to the second rectilinear motion unit 7 to the 4th rectilinear motion unit 9 with Y to the 3rd rectilinear motion unit 8; Y to the first rectilinear motion unit 5 with Y to the 3rd rectilinear motion unit 8 shared Y to the first linear motor rotor 5a; Y to the second rectilinear motion unit 6 with Y to the 9 shared Y of the 4th rectilinear motion waybill unit to the 4th linear motor rotor 9a; Y is rigidly connected to the first linear motor rotor 5a and the first silicon chip platform 3a, and Y is rigidly connected to the 4th linear motor rotor 9a and the second silicon chip platform 3b; X is arranged on the balance mass unit 2 to the second rectilinear motion unit 7 with X to the first rectilinear motion unit 4, and 2 bottoms, balance mass unit are air bearing surface, and 2 air supportings of balance mass unit are on base station 1.
X to the, two rectilinear motion unit 4,7 and the linear electric motors of Y to first, second, third and fourth rectilinear motion unit 5,6,8,9 are plate or U type motor, the arrangement form of linear electric motors adopts vertical or horizontal.
The platform scheme workflow of changing of the present invention is following:
As shown in Figure 3; The initialization state; The first silicon chip platform 3a that is in the prealignment station loads new wafer and finishes, and the second silicon chip platform 3b prealignment that is in the exposure station finishes, and the first silicon chip platform 3a that is in the pre-service station afterwards begins to carry out prealignment to be handled; Meanwhile be in the exposure station the second silicon chip platform 3b begin to carry out exposure-processed; Handle the asynchronism(-nization) with exposure-processed owing to accomplish prealignment, the time shutter is longer with respect to pretreatment time, and the first silicon chip platform 3a that therefore is positioned at the pre-service station accomplishes prealignment operation back and waits for that the second silicon chip platform 3b that is positioned at the exposure station accomplishes and carry out the silicon chip platform after the exposing operation and exchange.
As shown in Figure 4; Second silicon chip platform 3b that exposure finishes and Y are driven into to the second rectilinear motion unit 7 by X to the 4th rectilinear motion unit 9 and change the platform precalculated position; This moment, Y accomplished docking operation to the second linear motor stator electric 6b and Y to the 4th linear motor stator electric 9b; The first silicon chip platform 3a and the Y that are in waiting status after prealignment finishes are driven into to the first rectilinear motion unit 4 by X to the first rectilinear motion unit 5 and change the platform precalculated position, this moment Y to the first linear motor stator electric 5b and Y to the 3rd linear motor stator electric 8b completion docking operation.
As shown in Figure 5; The second silicon chip platform 3b that finishes of exposure Y under the driving of the 4th linear motor rotor 9a along moving to the prealignment zone to the second linear motor stator electric 6b and Y to the 4th linear motor stator electric 9b by Y; The first silicon chip platform 3a that prealignment finishes Y under the driving of the first linear motor rotor 5a along moving to the exposure area to the first linear motor stator electric 5b and Y to the 3rd linear motor stator electric 8b by Y, accomplish and change the platform action.
As shown in Figure 6; The second silicon chip platform 3b and Y that exposure finishes are driven into down sheet station by X to the first rectilinear motion unit 4 to the second rectilinear motion unit 6; This moment, Y removed opposite joining relation to the second linear motor stator electric 6b and Y to the 4th linear motor stator electric 9b; Accomplish following of wafer with last slice after, the second silicon chip platform 3b moves to the prealignment station.The first silicon chip platform 3a and Y that prealignment finishes are driven into exposure station by X to the second rectilinear motion unit 7 to the 3rd rectilinear motion unit 8, and this moment, Y removed opposite joining relation to the first linear motor stator electric 5b and Y to the 3rd linear motor stator electric 8b.This moment, original state was got back to by system, accomplished a work period.
Claims (2)
1. based on single/two double-workpiece-table outside switches that drive step-scan; This system comprises base station (1); Be set in base station (1) and go up and run on first silicon chip platform (3a) of prealignment station and the second silicon chip platform (3b) of exposure station; It is characterized in that: be provided with the X that is made up of to second linear motor rotor (4f) to second linear motor stator electric (4d), X to second static pressure air-float guide rail (4c), X to first linear motor rotor (4e), X to first linear motor stator electric (4b), X to first static pressure air-float guide rail (4a), X X to the first rectilinear motion unit (4) along base station (1) prealignment station, X is provided with Y that the Y that is made up of to first static pressure air-float guide rail (5c) to first linear motor stator electric (5b), Y to first linear motor rotor (5a), Y Y constitutes to second linear motor stator electric (6b) to second static pressure air-float guide rail (6a), Y to the first rectilinear motion unit (5) with by Y to the second rectilinear motion unit (6) to the first rectilinear motion unit (4); Be provided with the X that constitutes to the 4th linear motor rotor (7f) to the 4th linear motor stator electric (7d), X to the 4th static pressure air-float guide rail (7c), X to the 3rd linear motor rotor (7e), X to the 3rd linear motor stator electric (7b), X to the 3rd static pressure air-float guide rail (7a), X by X to the second rectilinear motion unit (7) at base station (1) exposure station; Be provided with Y that the Y that is made up of to the 3rd linear motor stator electric (8b) to the 3rd static pressure air-float guide rail (8a), Y Y constitutes to the 4th static pressure air-float guide rail (9c) to the 4th linear motor stator electric (9b), Y to the 4th linear motor rotor (9a), Y to the 3rd rectilinear motion unit (8) with by Y to the second rectilinear motion unit (7) at X to the 4th rectilinear motion unit (9); Y is H type configuration with X to the first rectilinear motion unit (4) to the second rectilinear motion unit (6) to the first rectilinear motion unit (5) and Y, and Y is H type configuration with X to the second rectilinear motion unit (7) to the 4th rectilinear motion unit (9) to the 3rd rectilinear motion unit (8) and Y; Y to the first rectilinear motion unit (5) and Y to the shared Y in the 3rd rectilinear motion unit (8) to first linear motor rotor (5a); Y to the second rectilinear motion unit (6) and Y to (9) the shared Y of the 4th rectilinear motion waybill unit to the 4th linear motor rotor (9a); Y is rigidly connected to first linear motor rotor (5a) and the first silicon chip platform (3a), and Y is rigidly connected to the 4th linear motor rotor (9a) and the second silicon chip platform (3b); X is arranged on the balance mass unit (2) to the second rectilinear motion unit (7) to the first rectilinear motion unit (4) and X, and balance mass unit (2) bottom is an air bearing surface, and balance mass unit (2) air supporting is on base station (1).
2. according to claim 1 based on single/two double-workpiece-table outside switches that drive step-scan; It is characterized in that: X is plate or U type motor to first and second rectilinear motion unit (4,7) and the linear electric motors of Y to first, second, third and fourth rectilinear motion unit (5,6,8,9), and the arrangement form of linear electric motors adopts vertical or horizontal.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2011103780745A CN102495532A (en) | 2011-11-12 | 2011-11-12 | Single/double driving step scanning based double-workpiece table lateral exchange device |
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| CN2011103780745A CN102495532A (en) | 2011-11-12 | 2011-11-12 | Single/double driving step scanning based double-workpiece table lateral exchange device |
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| CN102495532A true CN102495532A (en) | 2012-06-13 |
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| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN102122120A (en) * | 2011-03-22 | 2011-07-13 | 哈尔滨工业大学 | Two-table switching system of stepping and scanning lithography machine |
| CN102189413A (en) * | 2011-04-12 | 2011-09-21 | 华中科技大学 | Ultra-precise workbench |
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|---|---|---|---|---|
| CN2938172Y (en) * | 2006-07-18 | 2007-08-22 | 上海微电子装备有限公司 | Exposure precision positioning system of changed by two-device |
| US20080068571A1 (en) * | 2006-09-15 | 2008-03-20 | Nikon Corporation | Immersion exposure apparatus and immersion exposure method, and device manufacturing method |
| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN102122120A (en) * | 2011-03-22 | 2011-07-13 | 哈尔滨工业大学 | Two-table switching system of stepping and scanning lithography machine |
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Application publication date: 20120613 |