CN102495443A - 一种合成曝光法制作中阶梯光栅的方法 - Google Patents
一种合成曝光法制作中阶梯光栅的方法 Download PDFInfo
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- CN102495443A CN102495443A CN2011104222962A CN201110422296A CN102495443A CN 102495443 A CN102495443 A CN 102495443A CN 2011104222962 A CN2011104222962 A CN 2011104222962A CN 201110422296 A CN201110422296 A CN 201110422296A CN 102495443 A CN102495443 A CN 102495443A
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- echelle grating
- interference fringe
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CN201110422296.2A CN102495443B (zh) | 2011-12-15 | 2011-12-15 | 一种合成曝光法制作中阶梯光栅的方法 |
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CN102495443A true CN102495443A (zh) | 2012-06-13 |
CN102495443B CN102495443B (zh) | 2015-04-08 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102880358A (zh) * | 2012-09-29 | 2013-01-16 | 深圳市深越光电技术有限公司 | 一种红外触控屏 |
US11927780B2 (en) | 2022-05-31 | 2024-03-12 | National Chung Shan Institute Of Science And Technology | Dielectric grating apparatus |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4618214A (en) * | 1984-10-26 | 1986-10-21 | Itek Corporation | Method of fabricating a controlled harmonic binary grating |
CN101738664A (zh) * | 2009-12-17 | 2010-06-16 | 上海理工大学 | 在平面光栅制作过程中精确控制光栅常数的方法 |
CN101799569A (zh) * | 2010-03-17 | 2010-08-11 | 苏州大学 | 一种制作凸面双闪耀光栅的方法 |
CN101819323A (zh) * | 2010-05-17 | 2010-09-01 | 中国科学院长春光学精密机械与物理研究所 | 一种调整洛艾镜装置中洛艾镜与光栅基底垂直度的方法 |
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2011
- 2011-12-15 CN CN201110422296.2A patent/CN102495443B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4618214A (en) * | 1984-10-26 | 1986-10-21 | Itek Corporation | Method of fabricating a controlled harmonic binary grating |
CN101738664A (zh) * | 2009-12-17 | 2010-06-16 | 上海理工大学 | 在平面光栅制作过程中精确控制光栅常数的方法 |
CN101799569A (zh) * | 2010-03-17 | 2010-08-11 | 苏州大学 | 一种制作凸面双闪耀光栅的方法 |
CN101819323A (zh) * | 2010-05-17 | 2010-09-01 | 中国科学院长春光学精密机械与物理研究所 | 一种调整洛艾镜装置中洛艾镜与光栅基底垂直度的方法 |
Non-Patent Citations (2)
Title |
---|
LUKE D. KELLER 等: "Fabrication and testing of chemically micromachined silicon echelle gratings", 《APPLIED OPTICS》, vol. 39, no. 7, 1 March 2000 (2000-03-01) * |
U. U. GRAF 等: "Fabrication and evaluation of an etched infrared diffraction grating", 《APPLIED OPTICS》, vol. 33, no. 1, 1 January 1994 (1994-01-01) * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102880358A (zh) * | 2012-09-29 | 2013-01-16 | 深圳市深越光电技术有限公司 | 一种红外触控屏 |
US11927780B2 (en) | 2022-05-31 | 2024-03-12 | National Chung Shan Institute Of Science And Technology | Dielectric grating apparatus |
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Publication number | Publication date |
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CN102495443B (zh) | 2015-04-08 |
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Inventor after: Huang Yuanshen Inventor after: Ling Jinzhong Inventor after: Zhang Dawei Inventor after: Wang Qi Inventor after: Li Baicheng Inventor after: Zhuang Songlin Inventor before: Ling Jinzhong Inventor before: Zhang Dawei Inventor before: Huang Yuanshen Inventor before: Wang Qi Inventor before: Li Baicheng Inventor before: Zhuang Songlin |
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Free format text: CORRECT: INVENTOR; FROM: LING JINZHONG ZHANG DAWEI HUANG YUANSHEN WANG QI LI BAICHENG ZHUANG SONGLIN TO: HUANG YUANSHEN LING JINZHONG ZHANG DAWEI WANG QI LI BAICHENG ZHUANG SONGLIN |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
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Granted publication date: 20150408 Termination date: 20171215 |