CN102486215B - Gravity compensation device - Google Patents

Gravity compensation device Download PDF

Info

Publication number
CN102486215B
CN102486215B CN201010571517.8A CN201010571517A CN102486215B CN 102486215 B CN102486215 B CN 102486215B CN 201010571517 A CN201010571517 A CN 201010571517A CN 102486215 B CN102486215 B CN 102486215B
Authority
CN
China
Prior art keywords
air chamber
gravity
compensated device
piston
mover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201010571517.8A
Other languages
Chinese (zh)
Other versions
CN102486215A (en
Inventor
廖飞红
李小平
朱岳彬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Micro Electronics Equipment Co Ltd
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN201010571517.8A priority Critical patent/CN102486215B/en
Publication of CN102486215A publication Critical patent/CN102486215A/en
Application granted granted Critical
Publication of CN102486215B publication Critical patent/CN102486215B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Abstract

The invention discloses a gravity compensation device which is used for supporting a micropositioner of a worktable and a reticle stage in a photoetching machine and is communicated with a gas circuit of a gas supplying gas source. The gravity compensation device comprises a first gas chamber, a piston, a supporting plate and a pneumatic valve, wherein the piston is supported by the first gas chamber; the supporting plate is used for supporting the micropositioner, is positioned above the piston and is fixedly connected with the piston; and the valve is communicated with the first gas chamber and is used for adjusting the air pressure of the first air chamber. The gravity compensation device has the advantages that: firstly, the gravity compensation device has a simple structure; secondly, the gravity compensation device has lower rigidity so as to isolate low-frequency vibration; thirdly, the gravity compensation device has certain damping so as to reduce resonance; thirdly, the gravity compensation device has no action of exhausting gas to the environment and can be applied to a vacuum environment; and fourthly, when a load changes, the error of a static position of the reticle stage can be eliminated by adjusting the air pressure of the first gas chamber.

Description

A kind of gravity-compensated device
Technical field
The present invention relates to a kind of integrated circuit fabrication process equipment, relate in particular to a kind of gravity-compensated device.
Background technique
In the front end of large-scale semiconductive intergrated circuit is manufactured, photoetching is very important one processing procedure wherein, and it is that the graphics chip on a series of mask plates is transferred to the complicated technology processing procedure on wafer equivalent layer successively by exposure system.Whole photoetching process approximately consumes 60% of the front road of chip manufacturing time, and occupies nearly 40% cost of whole chip manufacturing.This series of complex, costliness, photo-etching technological process consuming time concentrate on the group for photo etching machine that the front pipeline production line of chip is corresponding and complete, and the equipment that the front end that described lithography machine is also semiconductor integrated circuit is the most complicated in manufacturing, requirement is the highest,, the lithographic accuracy of lithography machine and productive rate height directly affect chip integration and manufacture cost for described lithography machine light harvesting, power technology.Along with the development of semiconductor integrated circuit technique, the requirement of the accuracy of mechanical system and stability has almost been reached to the limit especially.In order to reach such requirement, in the design and production of lithography machine, need to pay attention to the problem of following two aspects:
First be the perturbed problem of the each side such as external environment condition and earth shock.In the working procedure of lithography machine, in order to reach the working environment of microcosmic precision (micron order or nanometer), need to utilize shock isolation system the disturbance of this respect to be carried out to elimination or the inhibition of maximum possible, at present with the most use is to utilize air spring system to carry out vibration isolation, because air spring system has lower natural frequency, wider frequency range disturbance isolation can be subdued, be secondly the perturbed problem that the motion of the internal motion parts such as work stage, mask stage causes, this is mainly the variation of the tilting moment that causes of the skew due to center of gravity.Generally by active vibration damping control system, to carry out compensation and the positioning control of moment at present.Along with the raising of lithography machine internal motion part quality and movement velocity, this do not become control faces great pressure and difficulty.
In lithography machine, the micropositioner of work stage and mask platform adopts the gravity-compensated device of low rigidity to support, can avoid the violent heating that adopts motor support to cause, for example, at TFT-LCD (Thin Film Transistor-Liquid Crystal Display) lithography machine, also run into similar problem.
In the U. S. Patent that is US20050036126 in the patent No., disclosing a kind of micropositioner that adopts steel spring to support, there is following several shortcoming in micropositioner described in this patent: 1, the mass change of micropositioner, causes firm spring to produce static position skew; 2, for maintaining the positional stability of micropositioner, the rigidity of steel spring is larger, and the vibration of pedestal is easy to pass to micropositioner; 3, steel spring undamped, easily excitation resonance.
In the U. S. Patent that is US6473161 in the patent No., disclose a kind of micropositioner that adopts air supporting to support, in this patent, had following several shortcoming: 1, air floating structure design is very complicated; 2, this structure can, to environmental emission gas, can not be applied to vacuum environment; 3, air floating structure is very responsive to the particle contamination of gas, need to adopt particulate filter arrangement to eliminate particle contamination, has improved user cost; 4, the internal pipeline of air floating structure and the processed complex of aperture, cost is higher.
Summary of the invention
The technical problem to be solved in the present invention is, provides a kind of and has lower rigidity, can reduce resonance phenomenon, can be used in vacuum environment and gravity-compensated device simple in structure.
For addressing the above problem, the invention provides a kind of gravity-compensated device, for supporting the micropositioner of lithography machine work stage and mask platform, and communicate with air feed source of the gas gas circuit, comprise the first air chamber, piston, dunnage and pneumatic valve, wherein said the first air chamber supports described piston; Described dunnage, for supporting described micropositioner, is positioned at described piston top, and is fixedly connected with described piston; Described valve is connected with described the first air chamber, regulates the first air chamber air pressure.
Further, described the first air chamber is formed by the first air chamber shell, membrane structure and lining; Described lining is positioned at described the first air chamber shell top; The two ends of described membrane structure are between described lining and described the first air chamber shell, to form described the first air chamber between described membrane structure and described the first air chamber shell.
Further, described piston is positioned at described membrane structure top, and described membrane structure supports described piston.
Further, between described the first air chamber and described pneumatic valve, be also provided with the second air chamber.
Further, described the first air chamber is connected with the second air chamber by the first air chamber aperture and the second air chamber aperture.
Further, described the first air chamber aperture is positioned on described the first air chamber; Described the second air chamber aperture is positioned on described the second air chamber.
Further, described the first air chamber aperture and the second air chamber aperture are connected by pipeline.
Further, between described the first air chamber and described dunnage, be also provided with driver element.
Further, described driver element comprises electric mover, motor stator, mover support, stator support; Described motor stator is connected on described stator support, and the mover of described motor is connected on mover support; Described stator support is connected to described the first air chamber shell; Described mover support is connected in dunnage.
Optionally, between described lining and described dunnage, be also provided with driver element.
Further, described driver element comprises electric mover, motor stator, mover support, stator support; Described motor stator is connected on described stator support, and the mover of described motor is connected on mover support; Described stator support is connected on described the first air chamber shell or described lining; Described mover support is connected in dunnage.
Further, described pneumatic valve is proportional flow control valve, and described gravity-compensated device also comprises pressure transducer and controller, and described pressure transducer is used for measuring described the first air chamber air pressure inside; Described controller receives the signal of described pressure transducer, and proportional flow control valve described in feedback control.
In sum, gravity-compensated device described in the present invention adopts piston to be supported on the first air chamber by membrane structure, and the first air chamber inside is full of high-pressure air, and described the first air chamber is for reducing structural rigidity; Between described lining and described dunnage, be also provided with driver element, described driver element adopts Lorentz lorentz's motor, for fast driving micropositioner.Therefore, have the following advantages: 1, simple in structure; 2, there is lower rigidity, can isolate the vibration of low frequency; 3, described gravity-compensated device has certain damping, can reduce resonance; 3, not to environmental emission gas, can be applied to vacuum environment; 4,, during load variations, regulate air pressure in the first air chamber can eliminate the error of the static position of micropositioner.
Accompanying drawing explanation
Fig. 1 is the structural representation of gravity-compensated device in one embodiment of the invention.
Fig. 2 is the structural representation of gravity-compensated device in another embodiment of the present invention.
Fig. 3 is the vibration isolating effect figure of gravity-compensated device in the embodiment of the present invention.
Embodiment
For making content of the present invention more clear understandable, below in conjunction with Figure of description, content of the present invention is described further.Certainly the present invention is not limited to this specific embodiment, and the known general replacement of those skilled in the art is also encompassed in protection scope of the present invention.
Secondly, the present invention utilizes schematic diagram to carry out detailed statement, and when example of the present invention is described in detail in detail, for convenience of explanation, schematic diagram does not amplify according to general ratio is local, should not using this as limitation of the invention.
Core concept of the present invention is: by the first air chamber is provided, described the first air chamber inside is full of high-pressure air, described the first air chamber top is membrane structure, the dunnage of described membrane structure support piston and piston top, and then load-supporting, thereby adopt described first air chamber of airbag structure to reach reduction structural rigidity object; Simultaneously in conjunction with driver element, fast driving micropositioner.Thereby reach the object of low rigidity, rapid fine adjustment.
[specific embodiment one]
Fig. 1 is the structural representation of gravity-compensated device in one embodiment of the invention, please refer to Fig. 1 and in conjunction with above-mentioned core concept, the invention provides a kind of gravity-compensated device, communicate with air feed source of the gas 118 gas circuits, comprise the first air chamber shell 107, lining 106, membrane structure 115, piston 116, dunnage 101 and pneumatic valve 112, wherein said lining 106 is positioned at described the first air chamber shell 107 tops; Described in the two ends of described membrane structure 115 between lining 106 and described the first air chamber shell 107, to form the first air chamber 114 between described membrane structure 115 and described the first air chamber shell 107; Described piston 116 is supported in described membrane structure 115; Described dunnage 101 is fixed on described piston 116 tops; Described pneumatic valve 112 one end communicate with described the first air chamber 114 gas circuits, and the other end communicates with described air feed source of the gas 118 gas circuits.Described gas circuit communicates and refers to by tracheae and be communicated with.The below of described membrane structure 115 is sandwiched between described the first air chamber shell 107 and described lining 106, and described the first air chamber shell 107 can pass through nut body close proximity with described lining 106, thereby clamp, is positioned at its membrane structure between the two; Or the below of described membrane structure 115 is by being adhesive between described the first air chamber shell 107 and described lining 106, is fixed on described lining 106, but is attached on described lining 106 under the tension force effect of internal high pressure gas but described membrane structure is non-.
Preferably, described membrane structure 115 is comprised of base cloth upper and lower surface coating rubber material sandwich structure.Described scrim material is polyester material or nylon material; Described rubber is nitrile rubber or fluorine rubber.Adopt scrim material for bearing larger tensile stress, rubber is for sealing.The thickness of described membrane structure 115 is 0.1mm~1mm, has good elasticity and tenacious and persistent will, and the load that can bear described the first air chamber 114 causes the tensile stress of membrane structure, has good sealing simultaneously.Preferably, the thickness of membrane structure, between 0.2mm~0.4mm, can maintain 10bar with the pressure of interior air chamber.
Membrane structure 115 and the first air chamber shell 107 form the first air chamber 114 of sealing, be full of high-pressure air, thereby piston 116 is supported in the first air chamber 114 of sealing.Piston 116 and membrane structure 115 and the first air chamber 114 form pneumatic spring.Effective Area of bearing of supposing piston 116 is A, and the air pressure in the first air chamber 114 is P, and effectively support force is G.
G=PA
By dynamic control pneumatic valve 112, can realize the dynamic change of the pressure P of the first air chamber 114.When load quality changes, can regulate air pressure P in the first air chamber 114 to maintain dunnage 101 in the equilibrium position of pneumatic spring; Also can control pneumatic valve 112 driven plunger 115, with the gravity of dynamic compensation dunnage 101.
The rigidity k of pneumatic spring can adopt following formula to calculate:
k = κ · A 2 · p V
Suppose that parameter is:
κ=1.41 (heat transfer ratio)
A=0.0003m 2(piston Area of bearing)
P=5.2bar (air pressure)
V=1.57*10 -5m 3(air chamber total volume)
M=20kg (quality of load-supporting)
Can calculate rigidity k=5.5 * 10 3n/m, therefore the vertical natural frequency under this kind of operating mode is:
f n = 1 2 π k m = 2.6 Hz
From above-mentioned formula, calculate and can find out, adopt that gravity-compensated device in the embodiment of the present invention one is vertical all has lower natural frequency and rigidity.
In addition, membrane structure 115 and lining 106 are not fastenedly connected, but interact by the tension force of air, and have certain distance between the outer wall of described piston 116 and the inwall of described lining 106, therefore, piston 116 in level to can be with extremely low rigidity unrestricted motion.Therefore, gravity-compensated device described in the present invention has lower rigidity, thereby can isolate the vibration that is delivered to dunnage 101 of the first air chamber 114.
Further, the distance between described piston 116 outer walls and described lining 106 inwalls is 0.3mm~5mm.Described gravity-compensated device is in application, between described piston 116 outer walls and described lining 106 inwalls, there is the vertical stroke that certain distance has directly determined gravity-compensated device, be conducive to not disturb other devices to carry out the fine setting of level or other directions to the load in dunnage 101, and can guarantee the low rigidity of horizontal direction.
Further, on described the first air chamber shell 107, be provided with the first air chamber aperture 108, described the first air chamber aperture 108 communicates with described pneumatic valve 112 gas circuits.Preferably, described the first air chamber aperture 108 is damping hole.Increase after damping hole, can make the damping ratio of described gravity compensator between 0.01~0.85, thereby therefore reduce gravity compensator in the resonance that has frequency place.
The valve 112 of gravity compensator can be proportional flow control valve or proportional pressure valve, respectively corresponding two kinds of control modes, and details are as follows:
(1) described pneumatic valve 112 is proportional flow control valve.In the first air chamber, install gas pressure sensor 120 additional, measure air chamber pressure.Add cartridge controller 117, be connected and be connected with proportional flow control valve 112 with described pressure sensor signal, for accepting the measurement signal of pressure transducer 117, and feedback control is selected proportional flow control valve 112, the pressure adjusting of realization to air chamber inside.
(2) pneumatic valve 112 also can be proportional pressure valve, and valve inner integrated pressure transducer and controller, regulate for the pressure to air chamber 114.Without increasing pressure transducer 120 and controller 117.
Further, described gravity-compensated device also comprises driver element 119, and described driver element 119 is Lorentz motor, between described dunnage 101 and described lining 106.Wherein, described driver element 119 comprises mover support 102, stator support 105, mover 103 and stator 104, wherein, described stator support 105 is fixed on described lining 106 or on the first air chamber shell 107, wherein in Fig. 1, indicate described stator support 105 and be fixed on described lining 106, described stator 104 is fixed on described stator support 105; Described mover support 102 is fixedly connected with described dunnage 101, and described mover 103 is fixed on described mover support 102; Described mover 103 is relative with described stator 104.In the present embodiment, being shaped as that described driver element is overlooked is circular or square.Described Lorentz motor corresponding speed is fast, for high-frequency drive dunnage 101.By after described mover 103 energisings, 103 pairs of described stators 104 generation directions of power of described mover and the direction of gravity are parallel.In addition, other common driver elements, as sound figure motor etc., also in thought range of the present invention.
In the present invention, by the pressure of pneumatic control the first air chamber 114, can, with lower frequency drives dunnage 101, generate heat minimum simultaneously.The fast response time of the driver element Lorentz lorentz motor in the present embodiment, but heating is large, for high-frequency drive dunnage 101.The mode that simultaneously adopts pneumatic drive dunnage 101 and Lorentz motor is quick adjustment both, reduce exerting oneself of Lorentz lorentz's motor, thereby the heating of Lorentz lorentz's motor coil also can greatly reduce simultaneously.
In sum, adopt gravity-compensated device in the embodiment of the present invention one in level to all thering is lower rigidity with vertical, can isolate the vibration of pedestal, reduced the heating of Lorentz lorentz's motor simultaneously.
[specific embodiment two]
Fig. 2 is the structural representation of gravity-compensated device in another embodiment of the present invention, please refer to Fig. 2.On the basis of specific embodiment one, between described the first air chamber 114 and described pneumatic valve 112, increase and be provided with the second air chamber 113.Within described the second air chamber 113 is sealed in the second air chamber shell 111, on described the second air chamber shell 113, be provided with the second air chamber aperture 110, described the second air chamber aperture 110 communicates with described the first air chamber 114 gas circuits, and wherein the second air chamber aperture 110 is communicated with by tracheae with the first air chamber aperture 108.Preferably, described the second air chamber aperture is damping hole.Design damping hole, can make the damping ratio of gravity-compensated device between 0.01 to 0.85, and wherein preferred, damping ratio is 0.4~0.7.In the time of in above-mentioned scope, therefore gravity compensator is having frequency place to amplify and can control to lower level the vibration of ground.
Further, the volume of described the first air chamber 114 is 1~10 times of described the second air chamber 113 volumes, and preferred, volume multiple is 4 times.Within the scope of given volume ratio, can isolate most of dither transmitting from outside, simultaneously also less in the resonance at natural frequency place.
Further, between described the first air chamber 114 and described the second air chamber 113, be also provided with orifice valve.Described orifice valve does not indicate in the drawings.Adopt orifice valve can easily adjust the aperture of damping hole, realize the dynamic adjustments to damping.
According to the rigidity formula of pneumatic spring
k = κ · A 2 · p V ,
In the present embodiment, the frequency f of gravity-compensated device, between 0.1 to 25Hz, has increased after the second air chamber 113, can make the structure frequency of gravity-compensated device be even lower.The present embodiment increases to 1.1*10 by the volume of pneumatic spring in embodiment one -4m 3, the natural frequency of pneumatic spring can be reduced to 0.5Hz.
The first air chamber 114 of its correspondence and the second air chamber volume 113 sums, can calculate according to formula:
V = κ · A 2 · p ( 2 πf ) 2 m .
In embodiments of the invention two, between the second air chamber 113 and the first air chamber, design damping hole, the first air chamber aperture 108 is designed to damping hole or the second air chamber aperture 110 is designed to damping hole; According to reference (Jeung-Hoon Lee, Kwang-Joon Kim, A method of transmissibility design fordual-chamber pneumatic vibration isolator.Journal of Sound and Vibration.2009.doi:10.1016/j.jsv.2008.12.028), the size of damping and the opening of damping hole have corresponding relation.In this article, the size of design damping hole, realizes the damping of gravity-compensated device between 0.01 to 0.85.Wherein preferred, damping ratio is 0.4~0.7.In the time of within the scope of this, therefore gravity compensator is having frequency place to amplify and can control to lower level the vibration of ground.
Fig. 3 is the vibration isolating effect figure of gravity-compensated device in the embodiment of the present invention.As shown in Figure 3, from the first air chamber shell 107, be delivered to the vibration transmissibility of dunnage 101.Curve 10 is not for when there is no the second air chamber 113, and the resonant frequency of gravity-compensated device is higher, and resonance peak is higher.Curve 20 is for when having the second air chamber 113, the second air chamber apertures 110 not design damping hole, and the resonant frequency of gravity-compensated device is lower, but resonance peak is higher.Curve 30 is for there to be the second air chamber 113, and when the first air chamber 114 or the second air chamber 113 design damping hole, the resonant frequency of gravity-compensated device is lower, and resonance peak is relatively little.
Therefore see from Fig. 3, embodiment best in the present invention is on the basis of specific embodiment one, between described the first air chamber 114 and described pneumatic valve 112, increase and be provided with the second air chamber 113, and at the first air chamber 114 or the second air chamber 113 design damping holes.Adopt gravity-compensated device of the present invention, can effectively isolate the vibration of transmitting from gravity-compensated device supporting base.
In sum, gravity-compensated device described in the present invention adopts piston 116 to be supported on the first air chamber 114 by membrane structure 115, and the first air chamber 114 inside are full of high-pressure air, and described the first air chamber 114 is for reducing structural rigidity; Between described lining 106 and described dunnage 101, be also provided with driver element 119, described driver element 119 adopts Lorentz lorentz's motor, for fast driving micropositioner.Therefore, have the following advantages: 1, simple in structure; 2, there is lower rigidity, can isolate the vibration of low frequency; 3, described gravity-compensated device has certain damping, can reduce resonance; 3, not to environmental emission gas, can be applied to vacuum environment; 4,, during load variations, regulate air pressure in the first air chamber 114 can eliminate the error of the static position of micropositioner.
Although the present invention discloses as above with preferred embodiment; so it is not in order to limit the present invention; under any, in technical field, have and conventionally know the knowledgeable; without departing from the spirit and scope of the present invention; when doing a little change and retouching, so protection scope of the present invention is when being as the criterion depending on claims person of defining.

Claims (11)

1. a gravity-compensated device, for supporting the micropositioner of lithography machine work stage and mask platform, and communicates with air feed source of the gas gas circuit, it is characterized in that, comprise the first air chamber, piston, dunnage and pneumatic valve, wherein said the first air chamber supports described piston; Described dunnage, for supporting described micropositioner, is positioned at described piston top, and is fixedly connected with described piston; Described valve is connected with described the first air chamber, regulates the first air chamber air pressure; Described the first air chamber is formed by the first air chamber shell, membrane structure and lining; Described lining is positioned at described the first air chamber shell top; The two ends of described membrane structure are between described lining and described the first air chamber shell, to form described the first air chamber between described membrane structure and described the first air chamber shell.
2. gravity-compensated device as claimed in claim 1, is characterized in that, described piston is positioned at described membrane structure top, and described membrane structure supports described piston.
3. gravity-compensated device as claimed in claim 1, is characterized in that, between described the first air chamber and described pneumatic valve, is also provided with the second air chamber.
4. gravity-compensated device as claimed in claim 3, is characterized in that, described the first air chamber is connected with the second air chamber by the first air chamber aperture and the second air chamber aperture.
5. gravity-compensated device as claimed in claim 4, is characterized in that, described the first air chamber aperture is positioned on described the first air chamber; Described the second air chamber aperture is positioned on described the second air chamber.
6. the gravity-compensated device as described in claim 4 or 5, is characterized in that, described the first air chamber aperture and the second air chamber aperture are connected by pipeline.
7. gravity-compensated device as claimed in claim 1, is characterized in that, between described the first air chamber and described dunnage, is also provided with driver element.
8. gravity-compensated device as claimed in claim 7, is characterized in that, described driver element comprises electric mover, motor stator, mover support, stator support; Described motor stator is connected on described stator support, and the mover of described motor is connected on mover support; Described stator support is connected to described the first air chamber shell; Described mover support is connected in dunnage.
9. gravity-compensated device as claimed in claim 1, is characterized in that, between described lining and described dunnage, is also provided with driver element.
10. gravity-compensated device as claimed in claim 9, is characterized in that, described driver element comprises electric mover, motor stator, mover support, stator support; Described motor stator is connected on described stator support, and the mover of described motor is connected on mover support; Described stator support is connected on described the first air chamber shell or described lining; Described mover support is connected in dunnage.
11. gravity-compensated devices as claimed in claim 1, is characterized in that, described pneumatic valve is proportional flow control valve, and described gravity-compensated device also comprises pressure transducer and controller, and described pressure transducer is used for measuring described the first air chamber air pressure inside; Described controller receives the signal of described pressure transducer, and proportional flow control valve described in feedback control.
CN201010571517.8A 2010-12-02 2010-12-02 Gravity compensation device Active CN102486215B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201010571517.8A CN102486215B (en) 2010-12-02 2010-12-02 Gravity compensation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201010571517.8A CN102486215B (en) 2010-12-02 2010-12-02 Gravity compensation device

Publications (2)

Publication Number Publication Date
CN102486215A CN102486215A (en) 2012-06-06
CN102486215B true CN102486215B (en) 2014-02-19

Family

ID=46151749

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201010571517.8A Active CN102486215B (en) 2010-12-02 2010-12-02 Gravity compensation device

Country Status (1)

Country Link
CN (1) CN102486215B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103375660B (en) * 2012-04-20 2016-11-23 上海微电子装备有限公司 Auxiliary support apparatus, support means and auxiliary method for supporting
CN103092007B (en) * 2013-02-06 2015-06-17 京东方科技集团股份有限公司 Mask plate installing device of exposure machine
CN104635427B (en) * 2013-11-14 2018-07-20 上海微电子装备(集团)股份有限公司 Mask apparatus for shaping and mask shaping methods for lithographic equipment
CN104698766B (en) * 2013-12-10 2017-01-18 上海微电子装备有限公司 Gravity compensation device
CN104746527B (en) * 2013-12-30 2017-06-06 上海微电子装备有限公司 A kind of suspension shock-proofing device and method
CN104709475B (en) * 2015-03-26 2020-06-05 北京航空航天大学 Lever counter weight type gravity compensation device
CN106541418B (en) * 2015-09-16 2019-11-19 中国科学院宁波材料技术与工程研究所 End effector and industrial robot
DE102015225537B4 (en) * 2015-12-17 2019-11-14 Carl Zeiss Smt Gmbh Device for aligning a component, actuating device and projection exposure device
CN107781350B (en) * 2016-08-31 2019-05-31 上海微电子装备(集团)股份有限公司 Damper air control unit and its control method and damper
CN108279714A (en) * 2018-01-11 2018-07-13 中国机械工业集团有限公司 A kind of distribution line traffic control pressure feedback offset-type air supporting vibration control system
CN108376000A (en) * 2018-01-11 2018-08-07 中国机械工业集团有限公司 A kind of distributed wireless pressure feedback offset-type air supporting vibration control system
CN111288042B (en) * 2018-12-07 2022-07-26 中车唐山机车车辆有限公司 Air floatation support preloading system and method
CN109879188A (en) * 2019-04-02 2019-06-14 哈尔滨工业大学 A kind of vertical direction high-precision quick response gravity-compensated device
CN112104186A (en) * 2019-06-18 2020-12-18 高明铁企业股份有限公司 Pre-loading structure of linear driving device with gravity compensation

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6473161B2 (en) * 2000-06-02 2002-10-29 Asml Netherlands B.V. Lithographic projection apparatus, supporting assembly and device manufacturing method
EP1803963A1 (en) * 2005-12-30 2007-07-04 Integrated Dynamics Engineering GmbH Hybrid stiffness modul for vibration isolation
CN201080989Y (en) * 2007-09-17 2008-07-02 上海微电子装备有限公司 Piston air cylinder vibration damping device
CN101398636A (en) * 2008-09-17 2009-04-01 华中科技大学 Precision vibration damping assembly and vibration damping platform composed of the assembly
CN101526118A (en) * 2009-01-13 2009-09-09 上海微电子装备有限公司 Vibration damping supporting device
CN101725662A (en) * 2009-12-10 2010-06-09 华中科技大学 Shock absorber for vacuum environment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5196000A (en) * 1991-06-13 1993-03-23 The Proctor & Gamble Company Absorbent article with dynamic elastic waist feature comprising an expansive tummy panel
WO1997042429A1 (en) * 1996-05-07 1997-11-13 Phoenix Aktiengesellschaft Pneumatic spring
US7170582B2 (en) * 2004-12-13 2007-01-30 Asml Netherlands B.V. Support device and lightographic apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6473161B2 (en) * 2000-06-02 2002-10-29 Asml Netherlands B.V. Lithographic projection apparatus, supporting assembly and device manufacturing method
EP1803963A1 (en) * 2005-12-30 2007-07-04 Integrated Dynamics Engineering GmbH Hybrid stiffness modul for vibration isolation
CN201080989Y (en) * 2007-09-17 2008-07-02 上海微电子装备有限公司 Piston air cylinder vibration damping device
CN101398636A (en) * 2008-09-17 2009-04-01 华中科技大学 Precision vibration damping assembly and vibration damping platform composed of the assembly
CN101526118A (en) * 2009-01-13 2009-09-09 上海微电子装备有限公司 Vibration damping supporting device
CN101725662A (en) * 2009-12-10 2010-06-09 华中科技大学 Shock absorber for vacuum environment

Also Published As

Publication number Publication date
CN102486215A (en) 2012-06-06

Similar Documents

Publication Publication Date Title
CN102486215B (en) Gravity compensation device
CN202381623U (en) Precision active damper
JP6253778B2 (en) Halbach array and magnetic floating damper employing the Halbach array
CN100456140C (en) Accurate vibration isolation system in use for step-by-step scanning photo-etching device
CN102734379B (en) Active vibration isolating device based on composite support of electromagnetism and static-pressure air floatation
US6036162A (en) Vibration isolator and method of isolating vibration
US9429208B2 (en) Vibration isolator with zero stiffness whose angle degree of freedom is decoupled with spherical air bearing
CN101364052B (en) Active vibration damping system and forecast control method thereof
EP2235394B1 (en) An active vibration isolation system having an inertial reference mass
CN101718327B (en) precise vibration isolation system
JP5064316B2 (en) Vibration isolator
US20150260255A1 (en) Magnetically suspended vibration isolator with zero stiffness whose angle degree of freedom is decoupled with a joint ball bearing
CN102141733B (en) Vibration absorption device and photolithographic device using same
CN101477316B (en) Gravity compensator
CN201679901U (en) Precise vibration isolation device
JP2010031953A (en) Vibration damping-vibration control device by compression coil spring
JP2001193879A (en) Vibration eliminating joint
JP2011247314A (en) Active vibration removing device
JPH11257419A (en) Active type vibration eliminating device
JP2005069303A (en) Pneumatic control type vibration isolator
CN100465473C (en) Actuator arrangement for active vibration isolation comprising an inertial reference mass
CN103375660B (en) Auxiliary support apparatus, support means and auxiliary method for supporting
JP2001263415A (en) Active vibration damping device, and composite actuator therefor
CN219139701U (en) Rigidity-variable double-freedom-degree active micro-vibration prevention base
CN219139698U (en) Double-freedom-degree active micro-vibration prevention base based on magnetic levitation

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: 201203, No. 1525 Zhang Dong Road, Shanghai, Shanghai, Pudong New Area

Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd

Address before: 201203, No. 1525 Zhang Dong Road, Shanghai, Shanghai, Pudong New Area

Patentee before: Shanghai Micro Electronics Equipment Co., Ltd.