CN102477550B - Device for depositing semiconductor film on flexible substrate - Google Patents
Device for depositing semiconductor film on flexible substrate Download PDFInfo
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- CN102477550B CN102477550B CN201010559577.8A CN201010559577A CN102477550B CN 102477550 B CN102477550 B CN 102477550B CN 201010559577 A CN201010559577 A CN 201010559577A CN 102477550 B CN102477550 B CN 102477550B
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- flexible substrate
- reactive tank
- spool
- stationary shaft
- semiconductor film
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Abstract
The invention relates to a device for depositing a semiconductor film on a flexible substrate. The device contains a reaction tank, a reaction solution and a web-like flexible substrate. Two reels are vertically fixed on the bottom of the reaction tank close to the inner wall of the reaction tank. A flexible substrate surface between the two reels is wound on the whole fixed shaft so as to form the flexible substrate with a snake-like transverse plane. According to the invention, the flexible substrate is wound into the fixed shaft with the transverse plane being snake-like, the reels are driven by a motor to transfer the flexible substrate in a snake-like movement from one reel to another rotating shaft in the reaction solution. Therefore, long-distance substrate is placed in the reaction tank so as to effectively increase the deposition area of the substrate, fully utilize the reaction solution and make the flexible substrate to fully deposit in the reaction solution to form the semiconductor film with good uniformity. In addition, the device provided by the invention has a simple structure, requires low manufacturing cost and can be produced at large scale.
Description
Technical field
The invention belongs to manufacture semiconductor film and use device technique field, especially a kind of at depositing semiconductor film on flexible substrate device.
Background technology
CdS film, ZnS film, CdTe film, In
2s
3film, CuInS
2film, CuInSe
2film, Cu
2the films such as S film are widely used in the semiconducter device such as thin film solar cell.As CdTe film, CuInS
2film, CuInSe
2film, Cu
2s film can be used as the absorption layer of solar cell, and its effect can absorb photon and be converted into photo-generated carrier; And CdS film, ZnS film, In
2s
3film can be used as N-shaped layer or the buffer layer of solar cell.Prepare these films methods that adopt has more: vacuum vapor deposition method, sputtering method, molecular beam epitaxy, chemical bath etc.First three methods general requirement High Temperature High Pressure, so apparatus expensive, operational path is complicated, the product cost of preparing for scale operation is very high, if be substrate and adopt flexible materials, the extensive volume volume of realization is produced higher to the requirement of this kind equipment, realizes more difficult.And chemical bath can well solve too high this problem of equipment cost, because it can realize the deposition of film under normal pressure, low temperature.
Existing chemical bath is prepared semiconductor film film device and is used for the rigid substrate such as glass, cannot realize the deposition of the flexible substrate semiconductor-on-insulator film of rolling.And mostly be volume to volume design for the device of preparing semiconductor film in flexible substrate; device structure is complicated; reaction soln utilizes insufficient, deposit film lack of homogeneity on the substrate of motion, and mass-producing is very high at the cost of depositing semiconductor film on flexible substrate.
Summary of the invention
The object of the invention is to overcome the deficiencies in the prior art part; provide a kind of at depositing semiconductor film on flexible substrate device; this apparatus structure is simple; make full use of reaction soln; deposit film good uniformity on the substrate of motion, has and realizes mass-producing low cost in the feature of depositing semiconductor film on flexible substrate.
The object of the invention is to be achieved through the following technical solutions:
At depositing semiconductor film on flexible substrate device, comprise reactive tank, reaction soln in reactive tank and web-like flexible substrate, it is characterized in that: described reactive tank is the rectangle box body shape with reactive tank lid, reactive tank outer wall is stainless steel, reactive tank inwall is acrylic plastering, near on the reactive tank bottom surface of reactive tank inwall, be vertically fixed with two spools, described spool material is plastics Baogang, two spools are near longwell direction both sides in reactive tank, on one of them spool, be coaxially fixed with motor, on bottom surface in reactive tank, be also vertically fixed with not on same straight line, and length is greater than web-like flexible substrate width, at least three above stationary shaft, on described stationary shaft, cover has axle sleeve, web-like flexible substrate is set on the spool that motor is not housed, the external end head of web-like flexible substrate is installed on the spool with motor, flexible liner bottom surface between two spools installs around in whole stationary shaft, the flexible substrate that formation end face is snakelike shape, described flexible substrate is tinsel or polyimide, described stationary shaft is divided into two rows, and respectively near the two ends inwall of two longwell directions in reactive tank, the angle between the corresponding relative shortwall of stationary shaft line of two longwells is greater than 0 degree, described reaction soln is (CH
3cOO)
2cd, SC (NH
2)
2, CH
3cOONH
4for 1:10:3 mixes, ammoniacal liquor is adjusted mixing solutions pH value scope 9～11 in proportion.
Advantage of the present invention and beneficial effect are:
1, the present invention can be coiled into flexible substrate reaction tank bottom being provided with the stationary shaft that end face is snakelike shape, by driven by motor spool, flexible substrate is moved from a spool and forwards another rotating shaft to through snake shape in reaction soln, make full use of reactive tank space, the substrate of as far as possible long distance is placed in reactive tank, effectively increased the depositional area of substrate, reaction soln is fully used, make flexible substrate abundant formation of deposits semiconductor film that has good uniformity in reaction soln, and device is simple in structure, low cost of manufacture, the feature with scale operation.
2, in the present invention, chemical bath method is the lower semiconductor film of preparing at normal pressure (1 normal atmosphere), low temperature (temperature range room temperature to 100 ℃ between), not extra electric field or other energy, can be in flexible substrate deposit film, further reduced cost, and the homogeneity of big area film forming is fine.Realized mass-producing low cost at depositing semiconductor film on flexible substrate.
Accompanying drawing explanation
Fig. 1 is that the present invention is in depositing semiconductor film on flexible substrate device schematic top plan view.
Wherein, 1-is with the spool of motor, 2-reactive tank, 3-flexible substrate, 4-reactive tank bottom surface, 5-stationary shaft, 6-spool.
Embodiment
Below in conjunction with accompanying drawing and by specific embodiment, the invention will be further described, and following examples are descriptive, are not determinate, can not limit protection scope of the present invention with this.
Embodiment: with reference to accompanying drawing 1.Acrylic plastering is cast on stainless steel plate, as the material of preparation feedback groove 2, according to dimensional requirement, tailors out respectively a block length square plate as reactive tank base plate, and corresponding with reactive tank base plate size four side panels and reactive tank upper cover; At the polypropylene plastics charge level of reactive tank base plate, near the both sides, one end of length direction, respectively get out a hole, for installing with the spool 1 of motor with without the spool 6 of motor; The identical round of each drilling bore hole distance of two ends at reactive tank base plate near length direction, the stationary shaft 5 of using for supporting flexible substrate is installed, has angle after corresponding Kong center, described two ends is linked to be line and between a side of reactive tank base plate.
With acrylic plastering, make the smooth stationary shaft that length is greater than flexible substrate width, stationary shaft is welded in the hole that stationary shaft is installed; Acrylic plastering is made smooth spool and is welded in the hole that spool is installed, and wherein the spool cover with motor has after the spool cover that can rotate, and spool cover is fixed on motor; A kind of flexible substrate 3 of the stainless steel of web-like, Copper Foil, aluminium foil or polyimide is enclosed within on the spool without motor, after the termination of flexible substrate is coiled into end face and is snakelike shape along reactive tank base plate two ends adjacent stationary shaft, the termination of flexible substrate is gluing in putting with the spool of motor coaxle.
Four side panel sealings are packed on reactive tank base plate, on the side panel of a length direction, with hinge, reactive tank upper cover are installed and are made reactive tank.
Reaction soln (CH3COO) 2Cd, SC (NH2) 2, CH3COONH4 in mass ratio example is 1:10:3 mixing, ammoniacal liquor is adjusted mixing solutions pH value scope 9～11, under normal pressure under 1 normal atmosphere, low temperature (temperature range room temperature to 100 ℃ between), pour reaction soln into reactive tank, flexible substrate is dipped in reaction soln, starter motor, flexible substrate moves along route in reaction soln, without extra electric field or other energy, can be at depositing semiconductor film on flexible substrate.
Principle of work:
The present invention is inserted in the flexible substrate of rolling on the spool without motor, and the termination of flexible substrate is after along reactive tank base plate, also adjacent stationary shaft is coiled into end face and is snakelike shape up and down, and the termination of flexible substrate is gluing in putting with the spool of motor coaxle.Add the reaction soln prepare, starter motor, drives flexible substrate to carry out snakelike movement along stationary shaft, the flexible substrate of entire volume by the spool without motor around to putting with the spool of motor coaxle, at depositing semiconductor film on flexible substrate.Discharge reaction soln, take out substrate, realize mass-producing low cost at depositing semiconductor film on flexible substrate.
Claims (1)
1. at depositing semiconductor film on flexible substrate device, comprise reactive tank, reaction soln in reactive tank and web-like flexible substrate, it is characterized in that: described reactive tank is the rectangle box body shape with reactive tank lid, reactive tank outer wall is stainless steel, reactive tank inwall is acrylic plastering, near on the reactive tank bottom surface of reactive tank inwall, be vertically fixed with two spools, described spool material is plastics Baogang, two spools are near longwell direction both sides in reactive tank, on one of them spool, be coaxially fixed with motor, on bottom surface in reactive tank, be also vertically fixed with not on same straight line, and length is greater than web-like flexible substrate width, at least three above stationary shaft, on described stationary shaft, cover has axle sleeve, web-like flexible substrate is set on the spool that motor is not housed, the external end head of web-like flexible substrate is installed on the spool with motor, flexible liner bottom surface between two spools installs around in whole stationary shaft, the flexible substrate that formation end face is snakelike shape, described flexible substrate is tinsel or polyimide, described stationary shaft is divided into two rows, and respectively near the two ends inwall of two longwell directions in reactive tank, the angle between the corresponding relative shortwall of stationary shaft line of two longwells is greater than 0 degree, described reaction soln is (CH
3cOO)
2cd, SC (NH
2)
2, CH
3cOONH
4for 1:10:3 mixes, ammoniacal liquor is adjusted mixing solutions pH value scope 9～11 in proportion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010559577.8A CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010559577.8A CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102477550A CN102477550A (en) | 2012-05-30 |
| CN102477550B true CN102477550B (en) | 2014-04-16 |
Family
ID=46090327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010559577.8A Expired - Fee Related CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102477550B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101155942A (en) * | 2005-03-22 | 2008-04-02 | 导电喷墨技术有限公司 | Treatment of flexible web material |
| CN101350315A (en) * | 2007-07-20 | 2009-01-21 | 住友金属矿山株式会社 | Manufacturing method of metal-coated polyimide substrate |
| US7541067B2 (en) * | 2006-04-13 | 2009-06-02 | Solopower, Inc. | Method and apparatus for continuous processing of buffer layers for group IBIIIAVIA solar cells |
| CN101586310A (en) * | 2009-06-18 | 2009-11-25 | 浙江理工大学 | Conductive fibers and preparation method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100535211B1 (en) * | 2003-06-03 | 2005-12-08 | 학교법인 성균관대학 | Flexible Polyethyleneterephthalate Have Anti-Reflection Film And Method |
| US7611584B2 (en) * | 2005-12-13 | 2009-11-03 | Lg Electronics Inc. | Electroless metal film-plating system |
-
2010
- 2010-11-25 CN CN201010559577.8A patent/CN102477550B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101155942A (en) * | 2005-03-22 | 2008-04-02 | 导电喷墨技术有限公司 | Treatment of flexible web material |
| US7541067B2 (en) * | 2006-04-13 | 2009-06-02 | Solopower, Inc. | Method and apparatus for continuous processing of buffer layers for group IBIIIAVIA solar cells |
| CN101350315A (en) * | 2007-07-20 | 2009-01-21 | 住友金属矿山株式会社 | Manufacturing method of metal-coated polyimide substrate |
| CN101586310A (en) * | 2009-06-18 | 2009-11-25 | 浙江理工大学 | Conductive fibers and preparation method |
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|---|---|
| CN102477550A (en) | 2012-05-30 |
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