CN102477550A - Device for depositing semiconductor film on flexible substrate - Google Patents
Device for depositing semiconductor film on flexible substrate Download PDFInfo
- Publication number
- CN102477550A CN102477550A CN2010105595778A CN201010559577A CN102477550A CN 102477550 A CN102477550 A CN 102477550A CN 2010105595778 A CN2010105595778 A CN 2010105595778A CN 201010559577 A CN201010559577 A CN 201010559577A CN 102477550 A CN102477550 A CN 102477550A
- Authority
- CN
- China
- Prior art keywords
- flexible substrate
- reactive tank
- semiconductor film
- spool
- stationary shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 65
- 239000004065 semiconductor Substances 0.000 title claims abstract description 25
- 238000000151 deposition Methods 0.000 title abstract description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 4
- 239000010935 stainless steel Substances 0.000 claims description 4
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 239000004033 plastic Substances 0.000 claims description 3
- 229920003023 plastic Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 230000037237 body shape Effects 0.000 claims description 2
- 241000270295 Serpentes Species 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 230000008021 deposition Effects 0.000 abstract 1
- 238000011031 large-scale manufacturing process Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 37
- 238000000034 method Methods 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 3
- 229910004613 CdTe Inorganic materials 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000005030 aluminium foil Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
The invention relates to a device for depositing a semiconductor film on a flexible substrate, which comprises a reaction tank, a reaction solution and a roll-shaped flexible substrate, wherein two reels are vertically and fixedly arranged on the bottom surface of the reaction tank close to the inner wall of the reaction tank; the flexible substrate surface between the two reels is wound on all the fixed shafts to form a flexible substrate with a snake-shaped end surface. The flexible substrate is wound into the fixed shaft with the end surface in the shape of a snake, the reel is driven by the motor, the flexible substrate is transferred from one reel to the other reel in the reaction solution through the snake-shaped movement, so that the substrate which is as long as possible is placed in the reaction tank, the deposition area of the substrate is effectively increased, the reaction solution is fully utilized, the flexible substrate is fully deposited in the reaction solution to form a semiconductor film with good uniformity, and the device has the characteristics of simple structure, low manufacturing cost and large-scale production.
Description
Technical field
The invention belongs to and make semiconductor film and use the device technique field, especially a kind of on flexible substrate the deposited semiconductor film use device.
Background technology
The CdS film, ZnS film, CdTe film, In
2S
3Film, CuInS
2Film, CuInSe
2Film, Cu
2Films such as S film are widely used in semiconducter device such as thin film solar cell.Like CdTe film, CuInS
2Film, CuInSe
2Film, Cu
2The S film can be used as the absorption layer of solar cell, and its effect can absorb photon and be converted into photo-generated carrier; And the CdS film, ZnS film, In
2S
3Film can be used as the n type layer or the impact plies of solar cell.Prepare these films methods that adopt has more: vacuum vapor deposition method, sputtering method, molecular beam epitaxy, chemical bath etc.First three methods general requirement HTHP, so apparatus expensive, operational path is complicated; The product cost that is used for the scale operation preparation is very high; And if adopt flexible materials is substrate, the extensive volume volume of realization is produced higher to the requirement of this kind equipment, and realization is difficulty more.And chemical bath can well solve too high this problem of equipment cost, because it can realize depositing of thin film under normal pressure, low temperature.
Existing chemical bath prepares the semiconductor film film device and is used for rigid substrate such as glass more, can't realize the flexible substrate semiconductor-on-insulator depositing of thin film of rolling.And be mostly the volume to volume design for the device of preparation semiconductor film on flexible substrate; Device structure is complicated; Reaction soln utilizes insufficient, deposit film lack of homogeneity on the substrate of motion, and the cost of mass-producing deposited semiconductor film on flexible substrate is very high.
Summary of the invention
The objective of the invention is to overcome the weak point of prior art; Provide a kind of on flexible substrate the deposited semiconductor film use device; This apparatus structure is simple; Make full use of reaction soln, deposit film good uniformity on the substrate of motion has the advantages that to realize mass-producing low cost deposited semiconductor film on flexible substrate.
The objective of the invention is to realize through following technical scheme:
The deposited semiconductor film is used device on flexible substrate; Comprise reaction soln and web-like flexible substrate in reactive tank, the reactive tank; It is characterized in that: vertically be fixed with two spools on the reactive tank bottom surface near the reactive tank inwall; The coaxial motor that is fixed with on one of them spool, also vertically be fixed with not on same straight line on the bottom surface in the reactive tank and length greater than web-like flexible substrate width, the stationary shaft more than at least three; The web-like flexible substrate is set on the spool that motor is not housed, and the external end head of web-like flexible substrate is installed on the spool that has motor, and the flexible liner bottom surface between two spools installs around in whole stationary shaft, and constituting end face is the flexible substrate of snakelike shape.
And; Said reactive tank is the rectangle box body shape that has the reactive tank lid; The reactive tank outer wall is that stainless steel, reactive tank inwall are acrylic plastering, and two spools are near longwell direction both sides in the reactive tank, and said stationary shaft is divided into two rows; Respectively near the two ends inwall of two longwell directions in the reactive tank, the angle between two relative shortwalls of the corresponding stationary shaft line of longwell is greater than 0 degree.
And, be with axle sleeve on the said stationary shaft.
And said spool material is a plastics Baogang.
And said flexible substrate is tinsel or polyimide.
And said reaction soln is (CH3COO) 2Cd, SC (NH2) 2, the mixing solutions of CH3COONH4 and ammoniacal liquor.
Advantage of the present invention and beneficial effect are:
1, the present invention can be the stationary shaft of snakelike shape with flexible substrate coiled end face reaction tank bottom being provided with; By the driven by motor spool, flexible substrate moved from a spool through the snake shape in reaction soln forward another rotating shaft to, make full use of the reactive tank space; Make the substrate of as far as possible long distance be placed in the reactive tank; Effectively increased the depositional area of substrate, reaction soln is fully used, and makes flexible substrate abundant formation of deposits semiconductor film that has good uniformity in reaction soln; And device is simple in structure, low cost of manufacture, has the characteristics of scale operation.
2, the chemical bath method is the following preparation semiconductor film at normal pressure (1 normal atmosphere), low temperature (TR room temperature to 100 ℃ between) among the present invention; Not extra electric field or other energy; Can be on flexible substrate deposit film; Further reduced cost, and the film forming homogeneity of big area is fine.Realized mass-producing low cost deposited semiconductor film on flexible substrate.
Description of drawings
Fig. 1 uses the device schematic top plan view for the present invention's deposited semiconductor film on flexible substrate.
Wherein, 1-has the spool of motor, 2-reactive tank, 3-flexible substrate, 4-reactive tank bottom surface, 5-stationary shaft, 6-spool.
Embodiment
Below in conjunction with accompanying drawing and through specific embodiment the present invention is made further detailed description, following examples are descriptive, are not determinate, can not limit protection scope of the present invention with this.
Embodiment: with reference to accompanying drawing 1.Acrylic plastering is cast on the stainless steel plate,,, tailors out a block length square plate respectively as reactive tank base plate and corresponding with the reactive tank base plate size four side panels and reactive tank loam cake according to dimensional requirement as the material of preparation feedback groove 2; Respectively get out a hole at the polypropylene plastics charge level of reactive tank base plate near end both sides of length direction, be used to install spool 1 that has motor and the spool 6 that does not have motor; At the reactive tank base plate near each drilling bore hole of the two ends of length direction apart from an identical round, be used to install the stationary shaft 5 that the supporting flexible substrate is used, corresponding center, hole, said two ends be linked to be behind the line and a side of reactive tank base plate between angle is arranged.
Process the slick stationary shaft of length with acrylic plastering, stationary shaft is welded in the hole that installs and fixes axle greater than the flexible substrate width; Acrylic plastering is processed slick spool and is welded in the hole that spool is installed, and after the spool that wherein has motor was with the spool cover that can rotate, the spool cover was fixed on the motor; The flexible substrate 3 that stainless steel, Copper Foil, aluminium foil or the polyimide of web-like is a kind of is enclosed within on the spool that does not have motor; After the termination of flexible substrate was snakelike shape along reactive tank base plate two ends and adjacent stationary shaft coiled end face, the termination of flexible substrate is gluing to put in the spool with motor coaxle.
Four side panel sealings are packed on the reactive tank base plate, with hinge the reactive tank loam cake are installed on the side panel of a length direction and are processed reactive tank.
Reaction soln (CH3COO) 2Cd, SC (NH2) 2, CH3COONH4 is mixing in 1: 10: 3 by mass ratio; Ammoniacal liquor adjustment mixing solutions pH value scope is 9～11, under the normal pressure under 1 normal atmosphere, low temperature (TR room temperature to 100 ℃ between), pours reaction soln into reactive tank; Flexible substrate is dipped in the reaction soln, starter motor, flexible substrate moves along route in reaction soln; Need not extra electric field or other energy, can be on flexible substrate the deposited semiconductor film.
Principle of work:
The present invention is inserted in the flexible substrate of rolling on the spool of no motor, and after the termination of flexible substrate was snakelike shape along the also adjacent up and down stationary shaft coiled end face of reactive tank base plate, the termination of flexible substrate is gluing to put in the spool with motor coaxle.Add the reaction soln prepare, starter motor drives flexible substrate and carries out snakelike moving along stationary shaft, the flexible substrate of whole volume by the spool of no motor around put deposited semiconductor film on flexible substrate to spool with motor coaxle.Discharge reaction soln, take out substrate, realize mass-producing low cost deposited semiconductor film on flexible substrate.
Claims (6)
1. the deposited semiconductor film is used device on flexible substrate; Comprise reaction soln and web-like flexible substrate in reactive tank, the reactive tank; It is characterized in that: vertically be fixed with two spools on the reactive tank bottom surface near the reactive tank inwall; The coaxial motor that is fixed with on one of them spool, also vertically be fixed with not on same straight line on the bottom surface in the reactive tank and length greater than web-like flexible substrate width, the stationary shaft more than at least three; The web-like flexible substrate is set on the spool that motor is not housed, and the external end head of web-like flexible substrate is installed on the spool that has motor, and the flexible liner bottom surface between two spools installs around in whole stationary shaft, and constituting end face is the flexible substrate of snakelike shape.
2. according to claim 1 on flexible substrate the deposited semiconductor film use device; It is characterized in that: said reactive tank is the rectangle box body shape that has the reactive tank lid; The reactive tank outer wall is that stainless steel, reactive tank inwall are acrylic plastering, and two spools are near longwell direction both sides in the reactive tank, and said stationary shaft is divided into two rows; Respectively near the two ends inwall of two longwell directions in the reactive tank, the angle between two relative shortwalls of the corresponding stationary shaft line of longwell is greater than 0 degree.
3. according to claim 1 on flexible substrate the deposited semiconductor film use device, it is characterized in that: be with axle sleeve on the said stationary shaft.
4. according to claim 1 on flexible substrate the deposited semiconductor film use device, it is characterized in that: said spool material is a plastics Baogang.
5. according to claim 1 on flexible substrate the deposited semiconductor film use device, it is characterized in that: said flexible substrate is tinsel or polyimide.
6. according to claim 1 on flexible substrate the deposited semiconductor film use device; It is characterized in that: said reaction soln is (CH3COO) 2Cd; SC (NH2) 2, CH3COONH4 are mixing in 1: 10: 3 in proportion, and ammoniacal liquor adjustment mixing solutions pH value scope is 9～11.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010559577.8A CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010559577.8A CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102477550A true CN102477550A (en) | 2012-05-30 |
| CN102477550B CN102477550B (en) | 2014-04-16 |
Family
ID=46090327
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010559577.8A Expired - Fee Related CN102477550B (en) | 2010-11-25 | 2010-11-25 | Device for depositing semiconductor film on flexible substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102477550B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040104176A (en) * | 2003-06-03 | 2004-12-10 | 학교법인 성균관대학 | Flexible Polyethyleneterephthalate Have Anti-Reflection Film And Method |
| US20070131164A1 (en) * | 2005-12-13 | 2007-06-14 | D.M.I Tech Co., Ltd. | Electroless metal film-plating system |
| CN101155942A (en) * | 2005-03-22 | 2008-04-02 | 导电喷墨技术有限公司 | Treatment of flexible web material |
| CN101350315A (en) * | 2007-07-20 | 2009-01-21 | 住友金属矿山株式会社 | Manufacturing method of metal-coated polyimide substrate |
| US7541067B2 (en) * | 2006-04-13 | 2009-06-02 | Solopower, Inc. | Method and apparatus for continuous processing of buffer layers for group IBIIIAVIA solar cells |
| CN101586310A (en) * | 2009-06-18 | 2009-11-25 | 浙江理工大学 | Conductive fibers and preparation method |
-
2010
- 2010-11-25 CN CN201010559577.8A patent/CN102477550B/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20040104176A (en) * | 2003-06-03 | 2004-12-10 | 학교법인 성균관대학 | Flexible Polyethyleneterephthalate Have Anti-Reflection Film And Method |
| CN101155942A (en) * | 2005-03-22 | 2008-04-02 | 导电喷墨技术有限公司 | Treatment of flexible web material |
| US20070131164A1 (en) * | 2005-12-13 | 2007-06-14 | D.M.I Tech Co., Ltd. | Electroless metal film-plating system |
| US7541067B2 (en) * | 2006-04-13 | 2009-06-02 | Solopower, Inc. | Method and apparatus for continuous processing of buffer layers for group IBIIIAVIA solar cells |
| CN101350315A (en) * | 2007-07-20 | 2009-01-21 | 住友金属矿山株式会社 | Manufacturing method of metal-coated polyimide substrate |
| CN101586310A (en) * | 2009-06-18 | 2009-11-25 | 浙江理工大学 | Conductive fibers and preparation method |
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| Publication number | Publication date |
|---|---|
| CN102477550B (en) | 2014-04-16 |
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Granted publication date: 20140416 Termination date: 20171125 |