CN102465269A - 铝合金防腐处理方法及铝合金制品 - Google Patents
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Abstract
本发明提供一种铝合金防腐处理方法及铝合金制品。该铝合金防腐处理方法包括如下步骤:提供一铝合金基材;采用真空溅镀法在该铝合金基材的表面溅镀颜色层;采用真空溅镀法在该颜色层的表面溅镀绝缘层。该铝合金制品包括一铝合金基材、一形成于铝合金基材表面的颜色层及一形成于颜色层表面的绝缘层。所述的铝合金防腐处理方法极大地降低了铝合金基材发生腐蚀的速率,提高了铝合金制品的耐腐蚀性能。
Description
技术领域
本发明涉及一种铝合金防腐处理方法及铝合金制品。
背景技术
铝合金具有质量轻、散热性能好等诸多优点,在通讯、电子、交通运输、建筑以及航空航天等领域的应用非常广泛。在空气中铝合金表面会形成氧化铝的保护膜(厚度约10nm),在一般的大气环境下,铝合金表面的这层氧化铝膜能够有效地保护铝合金基材。但在含有电解质的湿气中,例如海洋表面大气环境,铝合金表面会出现点蚀,严重破坏产品外观,同时导致产品使用寿命缩短。为了提高铝合金产品的耐腐蚀性能(或耐盐雾性能),通常要对铝合金基材进行表面处理,如阳极氧化、烤漆等,但这些工艺都存在较大的环境污染。
真空镀膜技术(PVD)是一种较环保的镀膜技术。PVD膜层具有高硬度、高耐磨性、良好的化学稳定性等优点,因此在表面防护或装饰处理领域的应用越来越广。而对于铝合金来说,其标准电极电位与许多PVD功能性膜层(如装饰性的颜色层等)的差异较大,极易造成电偶腐蚀,使整个铝合金产品失效。
现有技术中通常是设置一绝缘层于铝合金基材与功能性膜层之间来防止铝合金基材的电偶腐蚀及失效,但收效甚微。这是由于PVD膜层本身不可避免的会存在缺陷,如针孔、裂纹等,这些缺陷将成为电解质溶液的通道,使铝合金基材和表面的功能性膜层相连形成微电池。此时,功能性膜层成为微电池的阴极,而铝合金基材表面的微小孔洞接触点成为阳极,由于阴极的面积远远大于阳极的面积,即阴阳极的面积比趋于无限大,致使腐蚀电流极大而急剧加速了腐蚀。这种腐蚀失效严重限制了铝合金基材于PVD镀膜技术的应用。
发明内容
鉴于此,有必要提供一种可克服上述缺陷的铝合金防腐处理方法。
另外,还有必要提供一种经由上述防腐处理方法所制得的铝合金制品。
一种铝合金防腐处理方法,其包括如下步骤:
提供一铝合金基材;
采用真空溅镀法在该铝合金基材的表面溅镀颜色层;
采用真空溅镀法在该颜色层的表面溅镀绝缘层。
一种铝合金制品,其包括一铝合金基材、一形成于铝合金基材表面的颜色层及一形成于颜色层表面的绝缘层。
相较于现有技术,所述的铝合金防腐处理方法通过对铝合金基材表面的PVD膜系进行结构调整,将装饰性的颜色层与绝缘层的位置互换,将绝缘层设置为外表层,这样一来,绝缘层阻挡了大部分的电解质溶液,而仅少部分的电解质溶液到达颜色层表面,使颜色层的阴极面积大大降低,腐蚀电流也随之大大降低,从而极大地降低了发生腐蚀的速率,提高了铝合金制品的耐腐蚀性能。
附图说明
图1是本发明一较佳实施方式的铝合金制品的剖视示意图。
主要元件符号说明
铝合金制品 10
铝合金基材 11
颜色层 13
绝缘层 15
具体实施方式
请参阅图1,本发明一较佳实施方式的铝合金防腐处理方法包括如下步骤:
提供一铝合金基材11,并对该铝合金基材11进行前处理。该前处理可包括以下步骤:
依次用去离子水及无水乙醇对铝合金基材11表面进行擦拭。
将铝合金基材11放入盛装有丙酮溶液的超声波清洗器中进行超声波清洗,以除去铝合金基材11表面的杂质和油污等。
对经超声波清洗后的铝合金基材11的表面进行等离子清洗,以进一步去除铝合金基材11表面的脏污,以及改善铝合金基材11表面与后续镀层的结合力。将铝合金基材11放入一真空溅镀机(图未示)的镀膜室中,装入硅(Si)靶和钛(Ti)靶,抽真空该镀膜室至真空度为8.0×10-3Pa,然后通入流量为100~200sccm(标准毫升每分)的工作气体氩气(纯度为99.999%),对铝合金基材11施加-300~-500V的偏压,使镀膜室中产生高频电压,使所述氩气发生离子化而产生氩气等离子体对铝合金基材11的表面进行物理轰击,而达到对铝合金基材11表面等离子清洗的目的。所述等离子清洗的时间可为5~10min。所述真空溅镀机可为中频磁控溅射镀膜机。
所述等离子清洗完成后,在所述镀膜室中以真空溅镀法在铝合金基材11的表面溅镀颜色层13。所述真空溅镀法可为中频磁控溅射镀膜法。溅镀该颜色层13时,加热所述镀膜室至温度为20~120(即溅镀温度为20~120℃),保持氩气的流量不变,调节铝合金基材11的偏压至-150~-500V,开启Ti靶的电源,然后通入氮气,于铝合金基材11的表面沉积颜色层13。所述氮气的流量可为20~120sccm,所述Ti靶的电源功率可为8~10KW。该颜色层13为氮化钛(TiN)层,其厚度在200~400nm之间。沉积该颜色层13的时间可为15~30分钟。
沉积所述颜色层13后,关闭所述Ti靶的电源并停止通入氮气,并持续抽真空约10分钟,将镀膜室中的氮气排出,然后开启Si靶,通入氧气,于颜色层13的表面溅镀绝缘层15。所述氧气的流量可为40~60sccm,所述Si靶的电源功率可为8~10KW。该绝缘层15为透明的二氧化硅层(SiO2),其厚度在200~500nm之间。溅镀该绝缘层15的时间可为40~70分钟。
可以理解的,所述颜色层13还可以为TiNO层、TiCN层、CrN层、CrNO层、CrCN层或其他任意的具装饰性的膜层。该颜色层13也可被其他的功能性膜层所替代。
可以理解的,所述绝缘层15还可为透明的PVD氧化铝(Al2O3)膜层。
本发明一较佳实施方式的经由上述防腐处理方法所制得的铝合金制品10包括铝合金基材11、形成于铝合金基材11表面的颜色层13、及形成于颜色层13表面的绝缘层15。
所述的铝合金制品10可为通讯、电子、交通运输、建筑以及航空航天等领域的任意铝合金零部件或装饰件。
相较于现有技术,所述的铝合金防腐处理方法通过对铝合金基材11表面的PVD膜系进行结构调整,将装饰性的颜色层13与绝缘层15的位置互换,将绝缘层15设置为外表层,这样一来,绝缘层15阻挡了大部分的电解质溶液,而仅少部分的电解质溶液到达颜色层13表面,使颜色层13的阴极面积大大降低,腐蚀电流也随之大大降低,从而极大地降低了发生腐蚀的速率,提高了铝合金制品10的耐腐蚀性能。同时,由于绝缘层15为透明层,其不会影响到颜色层13对铝合金制品10的装饰性功能。
Claims (9)
1.一种铝合金防腐处理方法,其包括如下步骤:
提供一铝合金基材;
采用真空溅镀法在该铝合金基材的表面溅镀颜色层;
采用真空溅镀法在该颜色层的表面溅镀绝缘层。
2.如权利要求1所述的铝合金防腐处理方法,其特征在于:溅镀所述颜色层以Ti靶为靶材,Ti靶的电源功率为8-10KW,对铝合金基材设置-150~-500V的偏压,以氩气为工作气体,氩气的流量为100~200sccm,以氮气为反应气体,氮气的流量为20~120sccm,溅镀温度为20~120℃,溅镀时间为15~30分钟。
3.如权利要求2所述的铝合金防腐处理方法,其特征在于:所述颜色层为氮化钛层,其厚度在200~400nm之间。
4.如权利要求1所述的铝合金防腐处理方法,其特征在于:所述真空溅镀法为中频磁控溅射镀膜法。
5.如权利要求1所述的铝合金防腐处理方法,其特征在于:溅镀所述绝缘层以Si靶为靶材,Si靶的电源功率为8-10KW,对铝合金基材设置-150~500V的偏压,以氩气为工作气体,氩气的流量为100~200sccm,以氧气为反应气体,氧气的流量为40~60sccm,溅镀温度为20~120℃,溅镀时间为40~70分钟。
6.如权利要求5所述的铝合金防腐处理方法,其特征在于:所述绝缘层为二氧化硅层,其厚度在200~500nm之间。
7.如权利要求5所述的铝合金防腐处理方法,其特征在于:所述绝缘层为透明层。
8.如权利要求1所述的铝合金防腐处理方法,其特征在于:所述方法还包括在溅镀颜色层前对铝合金基材进行超声波清洗及等离子清洗的步骤。
9.一种由权利要求1-8中的任一项所述的方法制得的铝合金制品,其包括一铝合金基材,其特征在于:该铝合金制品还包括依次形成于铝合金基材表面的颜色层及绝缘层。
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CN2010105415243A CN102465269A (zh) | 2010-11-12 | 2010-11-12 | 铝合金防腐处理方法及铝合金制品 |
US13/176,302 US20120121895A1 (en) | 2010-11-12 | 2011-07-05 | Anti-corrosion treatment process for aluminum or aluminum alloy and aluminum or aluminum alloy article thereof |
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CN102345102A (zh) * | 2010-08-04 | 2012-02-08 | 鸿富锦精密工业(深圳)有限公司 | 真空镀膜件及其制备方法 |
CN102453855B (zh) * | 2010-10-28 | 2014-12-31 | 鸿富锦精密工业(深圳)有限公司 | 壳体及其制造方法 |
CN110343998B (zh) * | 2019-07-24 | 2021-11-23 | 艾瑞森表面技术(苏州)股份有限公司 | 一种印刷电路板钻针ta-C涂层及其制备方法 |
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