CN102391789B - Method for preparing nano diamond polishing solution - Google Patents

Method for preparing nano diamond polishing solution Download PDF

Info

Publication number
CN102391789B
CN102391789B CN 201110244241 CN201110244241A CN102391789B CN 102391789 B CN102391789 B CN 102391789B CN 201110244241 CN201110244241 CN 201110244241 CN 201110244241 A CN201110244241 A CN 201110244241A CN 102391789 B CN102391789 B CN 102391789B
Authority
CN
China
Prior art keywords
nano diamond
diamond
kinds
preparation
polishing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN 201110244241
Other languages
Chinese (zh)
Other versions
CN102391789A (en
Inventor
翟海军
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HUNAN HAOZHI TECHNOLOGY CO., LTD.
Original Assignee
HUNAN HAOZHI NEW MATERIALS CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HUNAN HAOZHI NEW MATERIALS CO Ltd filed Critical HUNAN HAOZHI NEW MATERIALS CO Ltd
Priority to CN 201110244241 priority Critical patent/CN102391789B/en
Publication of CN102391789A publication Critical patent/CN102391789A/en
Application granted granted Critical
Publication of CN102391789B publication Critical patent/CN102391789B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Abstract

The invention discloses a method for preparing a nano diamond polishing solution, relating to the technical field of preparation of non rare earth polishing materials. The method comprises the following technical processes of: placing diamond micro powder, a grinding aid, a dispersing agent and deionized water into a ball mill, and carrying out wet ball milling to form initial slurry; then addingthe deionized water into the initial slurry and washing diamond dispersion slurry out; adding concentrated acid to the diamond dispersion slurry for carrying out acid treatment; cleaning the diamond dispersion slurry subjected to acid treatment, then adding the dispersing agent to the diamond dispersion slurry, and carrying out classification to form the nano diamond polishing solution. The method has the characteristics that not only the aggregation problem of nano diamond can be solved, but also the nano diamond can be ensued to stably float in a water base; the process is simpler, and the like. The nano diamond polishing solution prepared by the method is suitable for precisely grinding and polishing liquid crystal conductive glass, plane optical glass, an optical sphere, optical lens glass, an optical filter, a filter window and a glass plate substrate and is particularly suitable for grinding and polishing spherical glass made of a soft material.

Description

A kind of preparation method of nano diamond polishing liquid
Technical field
The present invention relates to the non-rare-earth polishing material preparing technical field in the new material technology field, be applied to the preparation method in precise finiss and polishing technology field, particularly a kind of nano diamond polishing liquid.
Background technology
Nano diamond has the dual nature of nano material and superhard material concurrently, and the machinery of its excellence, chemistry, light, electricity, thermal characteristics have broad application prospects in fields such as running in oil, composite deposite, Ultraprecise polished, chemistry/medical science.The coarse grain footpath of single of Nano diamond particle is 60nm only, and median size is 8~12nm, however general commercial Nano diamond median size reach more than the 2 μ m, the most slightly reach 10 μ m, degree of aggregation is up to 200~1000.The existence of coacervate may be mutually to be bonded together the hard agglomeration that crystallization forms owing to carbon drop that the superhigh-temperature and-pressure of detonation forms in process of cooling, also may be owing to forming the inferior hard agglomeration that oxo bridge key etc. forms in the aftertreatment drying and dehydrating process of detonation product between particle.The hard agglomeration of Nano diamond occupies sizable ratio, and has certain texture tendency, so difficult is with depolymerization.Hard agglomeration is restricting the application development of Nano diamond, the excellent properties of Nano diamond is almost lost, therefore the depolymerization of hard agglomeration is the matter of utmost importance that the Nano diamond application needs solution, also is the major issue that the nano diamond polishing liquid preparation needs solution.In the prior art, to the depolymerization of the hard agglomeration of Nano diamond, usually adopt chemical mechanical processing that Nano diamond is carried out surface modification, under the synergy of physics and chemical reagent, by regulating the hydrophilic and hydrophobic energy of particle surface, realize the purpose of stable dispersion in water.Chinese patent (application number 200410022936.0) " a kind of water-base nano diamond polishing liquid and manufacture method thereof ", its main component comprises: Nano diamond, properties-correcting agent, dispersion agent and/or hyper-dispersant, pH value conditioning agent, wetting conditioning agent, the additive with chemical action and deionized water; Its its manufacture method mainly comprises: 1. by mechanochemical modification, the coacervate of Nano diamond is dispersed into the little aggregate that mean particle size is 20~100nm, 2. removes coarse particles and other impurity in the suspension; 3. add conditioning agent (wetting agent), dispersion stabilizer, pH value conditioning agent, the additive with chemical action and the deionized water of regulating workpiece and polishing fluid wetting property, ultrasonic or/and dispersed with stirring.Chinese patent (application number 200510030024.2) " water-based diamond polishing liquid and preparation method thereof " and for example, this disclosure of the invention a kind of water-based diamond polishing liquid, formed by the component of following parts by weight: special diadust: 0.001-10, dispersion agent: 0.02-4 part, suspension agent: 0.01-5 part, suspension aids: 0.01-1 part, PH conditioning agent: 0.1-1.5 part, sanitas: 0.1-0.5 part, deionized water: 60-99 part; The water-based diamond polishing liquid quality product of this invention preparation is consistent, good stability.
Summary of the invention
Technical problem to be solved by this invention provides a kind ofly can either solve the agglomeration traits of Nano diamond, can make it in the preparation method of the fairly simple nano diamond polishing liquid of water base middle stable suspersion and technique again.
The technical solution used in the present invention is the preparation method of a kind of nano diamond polishing liquid of invention, and its technological process is as follows:
A, weight share are got 100 parts of diadust 5-20 part, grinding aid 2-8 part, dispersion agent 2-8 part, the deionized waters that particle diameter is 0.1-1 μ m, insert in the ball mill, take water as medium, carry out wet ball grinding, Ball-milling Time is 1~10 hour, drum's speed of rotation is 200~500r/min, becomes initial slurry;
B, get the deionized water of 600 parts of weight quota again, join in the initial slurry in the ball mill, clean out the diamond dispersed paste, for subsequent use;
C, diamond dispersed paste for subsequent use is carried out strong stirring, and add while stirring the concentrated acid liquid of 0.5-200 part weight quota in the diamond dispersed paste, carry out acid treatment, the time is 30-60 minute, and temperature is 20~100 ℃;
D, adopt centrifugal settling method to clean up the diamond dispersed paste after peracid treatment, the dispersion agent that adds again 1-10 part weight quota, regulate the pH value to 9-10 with the NaOH solution of 0.1mo l/L, then carry out classification, can obtain having in water the nano diamond polishing liquid of height suspension stability, wherein adamantine weight percentage is 0.1~10, adamantine particle diameter is 10~100nm;
Described grinding aid can be a kind of or two kinds of several or whole combinations in oleic acid, tripoly phosphate sodium STPP, polyoxyethylene glycol, the sodium lauryl sulphate; When being several or whole combination of wherein two kinds, the consumption of each component is equal portions;
Described dispersion agent can be a kind of or two kinds of several or whole combinations among Sodium hexametaphosphate 99, tripoly phosphate sodium STPP, OP-10, sodium lauryl sulphate, cetyl trimethylammonium bromide, the TW-80; When being several or whole combination of wherein two kinds, the consumption of each component is equal portions;
Described concentrated acid liquid can be the combination of a kind of of concentrated hydrochloric acid, the vitriol oil, concentrated nitric acid or two kinds or three kinds; When being the combination of wherein two kinds or three kinds, the consumption of each component is equal portions.
The particle diameter of preferred diadust is 0.3-0.5 μ m.
Preferred Ball-milling Time is 3~6 hours.
Best Ball-milling Time is 5 hours.
Temperature during best acid treatment is 70 ℃.
Best drum's speed of rotation is 300r/min.
Above-mentioned used weight quota unit can be gram or kilogram or ton, also can be other weight unit.
The preparation method of nano diamond polishing liquid of the present invention, the method of applied chemistry mechanical treatment, ball milling solution group, pickling impurity removal and three key steps of dispersion classification have been adopted, technique is fairly simple, both solve the agglomeration traits of Nano diamond, obtained again the nano diamond polishing liquid of Nano diamond at water base middle stable suspersion.
Embodiment
Below in conjunction with embodiment, the present invention is further illustrated.Following explanation is to adopt the mode that exemplifies, but protection scope of the present invention should not be limited to this.
Embodiment one:
The preparation process of the present embodiment is as follows:
A, weight share is got commercially available diadust 10 grams that particle diameter is 0.5 μ m, (grinding aid can adopt oleic acid to polyoxyethylene glycol, tripoly phosphate sodium STPP, polyoxyethylene glycol, a kind of or two kinds of several or whole combinations in the sodium lauryl sulphate, this example adopts polyoxyethylene glycol to make grinding aid) 5 grams, (dispersion agent can adopt Sodium hexametaphosphate 99 to OP-10, tripoly phosphate sodium STPP, OP-10, sodium lauryl sulphate, cetyl trimethylammonium bromide, a kind of or two kinds of several or whole combinations among the TW-80, this example adopts OP-10 to make dispersion agent) 5 grams, deionized water 100 grams (that is: 100ml), insert in the ball grinder of high energy ball mill, take water as medium, carry out wet ball grinding, Ball-milling Time is 5 hours, drum's speed of rotation is 300r/min, becomes initial slurry;
B, get 600 gram (that is: 600ml) deionized waters again, join in the initial slurry in the ball grinder, clean out the diamond dispersed paste, for subsequent use;
C, diamond dispersed paste for subsequent use is carried out strong stirring, and add 10 gram concentrated hydrochloric acids while stirring in the diamond dispersed paste, carry out acid treatment, the time is 30 minutes, and temperature is 70 ℃;
D, adopt centrifugal settling method to clean up the diamond dispersed paste after peracid treatment, (dispersion agent can adopt a kind of or two kinds of several or whole combinations among Sodium hexametaphosphate 99, tripoly phosphate sodium STPP, OP-10, sodium lauryl sulphate, cetyl trimethylammonium bromide, the TW-80 to add 15 tripoly phosphate sodium STPPs that restrain again, this example adopts tripoly phosphate sodium STPP to make dispersion agent), regulate the pH value to 9 of slurry with the NaOH solution of 0.1mol/L, obtain the nano diamond polishing liquid that adamantine particle diameter is 10~100nm after the classification.
Embodiment two:
The preparation process of the present embodiment is as follows:
A, weight share are got commercially available diadust 10 grams, polyoxyethylene glycol 5 grams, OP-10 5 grams, deionized water 100 grams (that is: 100ml) that particle diameter is 0.5 μ m, insert in the ball grinder of high energy ball mill, take water as medium, carry out wet ball grinding, Ball-milling Time is 5 hours, drum's speed of rotation is 300r/min, becomes initial slurry;
B, get 600 gram (that is: 600ml) deionized waters again, join in the initial slurry in the ball grinder, clean out the diamond dispersed paste, for subsequent use;
C, diamond dispersed paste for subsequent use is carried out strong stirring, and add the 10 gram vitriol oils while stirring in the diamond dispersed paste, carry out acid treatment, the time is 30 minutes, and temperature is 70 ℃;
D, the diamond dispersed paste after peracid treatment cleaned up (centrifugal settling method cleaning), the tripoly phosphate sodium STPP that adds 15 grams, regulate the pH value to 9 of slurry with the NaOH solution of 0.1mol/L, obtain the nano diamond polishing liquid that adamantine particle diameter is 10~100nm after the classification.
Embodiment three:
The preparation process of the present embodiment is as follows:
A, weight share are got commercially available diadust 10 grams, polyoxyethylene glycol 5 grams, OP-10 5 grams, deionized water 100 grams (that is: 100ml) that particle diameter is 0.5 μ m, insert in the ball grinder of high energy ball mill, take water as medium, carry out wet ball grinding, Ball-milling Time is 5 hours, drum's speed of rotation is 300r/min, becomes initial slurry;
B, get 600 gram (that is: 600ml) deionized waters again, join in the initial slurry in the ball grinder, clean out the diamond dispersed paste, for subsequent use;
C, diamond dispersed paste for subsequent use is carried out strong stirring, and add 10 gram concentrated nitric acids while stirring in the diamond dispersed paste, carry out acid treatment, the time is 30 minutes, and temperature is 70 ℃;
D, the diamond dispersed paste after peracid treatment cleaned up (centrifugal settling method cleaning), the tripoly phosphate sodium STPP that adds 15 grams, regulate the pH value to 9 of slurry with the NaOH solution of 0.1mol/L, obtain the nano diamond polishing liquid that adamantine particle diameter is 10~100nm after the classification.
Use the preparation method of nano diamond polishing liquid of the present invention, the nano diamond polishing liquid of preparation, be applicable to the precise finiss polishing of conductive liquid crystal glass, plane opticglass, optical spherical surface, optical lens glass, spectral filter, spectral window and glass substrate, be specially adapted to the grinding and polishing of the spherical glass of softwood matter.

Claims (6)

1. the preparation method of a nano diamond polishing liquid is characterized in that technological process is as follows:
A, weight share are got 100 parts of diadust 5-20 part, grinding aid 2-8 part, dispersion agent 2-8 part, the deionized waters that particle diameter is 0.1-1 μ m, insert in the ball mill, take water as medium, carry out wet ball grinding, Ball-milling Time is 1~10 hour, drum's speed of rotation is 200~500r/min, becomes initial slurry;
B, get the deionized water of 600 parts of weight quota again, join in the initial slurry in the ball mill, clean out the diamond dispersed paste, for subsequent use;
C, diamond dispersed paste for subsequent use is carried out strong stirring, and add while stirring the concentrated acid liquid of 0.5-200 part weight quota in the diamond dispersed paste, carry out acid treatment, the time is 30-60 minute, and temperature is 20~100 ℃;
D, adopt centrifugal settling method to clean up the diamond dispersed paste after peracid treatment, the dispersion agent that adds again 1-10 part weight quota, regulate the pH value to 9-10 with the NaOH solution of 0.1mol/L, then carry out classification, can obtain having in water the nano diamond polishing liquid of height suspension stability, wherein adamantine weight percentage is 0.1~10, adamantine particle diameter is 10~100nm;
Described grinding aid is a kind of or two kinds of several or whole combinations in oleic acid, tripoly phosphate sodium STPP, polyoxyethylene glycol, the sodium lauryl sulphate; When being several or whole combination of wherein two kinds, the consumption of each component is equal portions;
Described dispersion agent is a kind of or two kinds of several or whole combinations among Sodium hexametaphosphate 99, tripoly phosphate sodium STPP, OP-10, sodium lauryl sulphate, cetyl trimethylammonium bromide, the TW-80; When being several or whole combination of wherein two kinds, the consumption of each component is equal portions;
Described concentrated acid liquid is the combination of a kind of of concentrated hydrochloric acid, the vitriol oil, concentrated nitric acid or two kinds or three kinds; When being the combination of wherein two kinds or three kinds, the consumption of each component is equal portions.
2. the preparation method of nano diamond polishing liquid according to claim 1, it is characterized in that: the particle diameter of diadust is 0.3-0.5 μ m.
3. the preparation method of nano diamond polishing liquid according to claim 1, it is characterized in that: Ball-milling Time is 3~6 hours.
4. according to claim 1 or the preparation method of 3 described nano diamond polishing liquids, it is characterized in that: Ball-milling Time is 5 hours.
5. the preparation method of nano diamond polishing liquid according to claim 1, it is characterized in that: the temperature during acid treatment is 70 ℃.
6. the preparation method of nano diamond polishing liquid according to claim 1, it is characterized in that: drum's speed of rotation is 300r/min.
CN 201110244241 2011-08-19 2011-08-19 Method for preparing nano diamond polishing solution Active CN102391789B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201110244241 CN102391789B (en) 2011-08-19 2011-08-19 Method for preparing nano diamond polishing solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201110244241 CN102391789B (en) 2011-08-19 2011-08-19 Method for preparing nano diamond polishing solution

Publications (2)

Publication Number Publication Date
CN102391789A CN102391789A (en) 2012-03-28
CN102391789B true CN102391789B (en) 2013-10-16

Family

ID=45859177

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201110244241 Active CN102391789B (en) 2011-08-19 2011-08-19 Method for preparing nano diamond polishing solution

Country Status (1)

Country Link
CN (1) CN102391789B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103923606A (en) * 2014-04-04 2014-07-16 湖南省美程陶瓷科技有限公司 Steatite ceramic compound grinding aid and preparation method thereof
CN104059539B (en) * 2014-06-04 2015-07-29 武汉三灵科技产业股份有限公司 A kind of high-efficiency diamond polishing agent and preparation method thereof
CN104261404B (en) * 2014-09-29 2016-03-30 中国科学技术大学 The preparation of the super-dispersed nano diamond water-sol
CN104592936A (en) * 2015-01-04 2015-05-06 和县科嘉阀门铸造有限公司 Nano silicon carbide grinding paste for sealing surface of valve and preparation method of nano silicon dioxide grinding paste
CN104650741A (en) * 2015-01-05 2015-05-27 杭州大和热磁电子有限公司 Grinding and polishing paste for high-purity aluminum oxide ceramics
CN105496001A (en) * 2015-12-22 2016-04-20 郑州人造金刚石及制品工程技术研究中心有限公司 Nano carbon crystal toothbrush and manufacturing method
CN105534010A (en) * 2015-12-22 2016-05-04 郑州人造金刚石及制品工程技术研究中心有限公司 Tooth brush monofilaments containing nano carbon crystals and manufacturing method of tooth brush monofilaments
CN105533987A (en) * 2016-01-21 2016-05-04 郑州人造金刚石及制品工程技术研究中心有限公司 Hair care comb containing nanometer carbon crystals
CN105524558B (en) * 2016-01-25 2018-02-09 河南联合精密材料股份有限公司 One kind polishing solution additive and preparation method thereof
CN106381071A (en) * 2016-08-31 2017-02-08 常熟市光学仪器有限责任公司 Polishing solution used for processing optical glass
CN106509985A (en) * 2016-12-14 2017-03-22 郑州人造金刚石及制品工程技术研究中心有限公司 Cigarette filter tip and preparation method thereof
CN108219678B (en) * 2016-12-21 2020-09-04 蓝思科技(长沙)有限公司 Diamond grinding fluid and preparation method thereof
CN106625204B (en) * 2017-01-06 2019-05-24 东莞市天域半导体科技有限公司 A kind of back side process method of large scale SiC wafer
CN107049804A (en) * 2017-01-21 2017-08-18 郑州人造金刚石及制品工程技术研究中心有限公司 A kind of skin care milk containing nanometer carbon crystal and preparation method thereof
CN107345178A (en) * 2017-07-07 2017-11-14 广州克思曼研磨科技有限公司 A kind of nanometer cleaning-nursing liquid and preparation method thereof
CN109536041A (en) * 2018-12-28 2019-03-29 天津洙诺科技有限公司 A kind of sapphire ball cover processing polished liquid and preparation method thereof
CN112480825A (en) * 2020-12-10 2021-03-12 河南联合精密材料股份有限公司 Diamond polishing solution for rough polishing of silicon carbide wafer and preparation method thereof
CN114806501B (en) * 2022-04-28 2023-04-28 浙江奥首材料科技有限公司 Modified diamond powder, preparation method, application and polishing solution containing modified diamond powder
CN114686171A (en) * 2022-05-19 2022-07-01 中国振华集团云科电子有限公司 Suspensible diamond grinding fluid and preparation process thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304968A (en) * 2000-12-01 2001-07-25 清华大学 Nm-class polishing liquid and its preparing process
CN1439451A (en) * 2002-11-18 2003-09-03 长沙矿冶研究院 Nano-diamond deagglomeration and grading method
CN1560161A (en) * 2004-03-01 2005-01-05 长沙矿冶研究院 Water-based nano diamond polishing solution and preparation method thereof
CN1940003A (en) * 2005-09-27 2007-04-04 耐博检测技术(上海)有限公司 Water-based diamond polishing liquid and its production
CN1962964A (en) * 2006-11-08 2007-05-16 北京国瑞升科技有限公司 Nano monocrystalline diamond and method for making same
CN101186804A (en) * 2007-11-21 2008-05-28 北京国瑞升科技有限公司 Water diamond lapping liquid and its preparation method and use
CN101649183A (en) * 2009-09-01 2010-02-17 永州皓志稀土材料有限公司 Production technology of zirconia grinding fluid
CN101831243A (en) * 2010-04-30 2010-09-15 中国计量学院 High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009017734A1 (en) * 2007-07-31 2009-02-05 Aspt, Inc. Slurry containing multi-oxidizer and nano-sized diamond abrasive for tungsten cmp

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1304968A (en) * 2000-12-01 2001-07-25 清华大学 Nm-class polishing liquid and its preparing process
CN1439451A (en) * 2002-11-18 2003-09-03 长沙矿冶研究院 Nano-diamond deagglomeration and grading method
CN1560161A (en) * 2004-03-01 2005-01-05 长沙矿冶研究院 Water-based nano diamond polishing solution and preparation method thereof
CN1940003A (en) * 2005-09-27 2007-04-04 耐博检测技术(上海)有限公司 Water-based diamond polishing liquid and its production
CN1962964A (en) * 2006-11-08 2007-05-16 北京国瑞升科技有限公司 Nano monocrystalline diamond and method for making same
CN101186804A (en) * 2007-11-21 2008-05-28 北京国瑞升科技有限公司 Water diamond lapping liquid and its preparation method and use
CN101649183A (en) * 2009-09-01 2010-02-17 永州皓志稀土材料有限公司 Production technology of zirconia grinding fluid
CN101831243A (en) * 2010-04-30 2010-09-15 中国计量学院 High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof

Also Published As

Publication number Publication date
CN102391789A (en) 2012-03-28

Similar Documents

Publication Publication Date Title
CN102391789B (en) Method for preparing nano diamond polishing solution
CN101186804A (en) Water diamond lapping liquid and its preparation method and use
JP5495508B2 (en) Abrasive particle dispersion and method for producing the same
TW593649B (en) Cerium-based abrasive slurry and method for manufacturing cerium-based abrasive slurry
CN106115748B (en) A kind of method of preparing super fine magnesium hydroxide by wet method slurry
CN106479371A (en) A kind of high precision composite polishing liquid and preparation method thereof
CN102250585A (en) Preparation method of zirconia grinding fluid
JP2003109921A (en) Abrasive silica particle-dispersed fluid, its manufacturing method, and abrasive material
CN101096571A (en) Polishing liquid for glass material and preparation method thereof
TWI530595B (en) Preparation method for single-crystal diamond grain
CN105038607A (en) Effective sapphire fine grinding method and fine grinding solution
CN107243783B (en) Chemical and mechanical grinding method, equipment and cleaning solution
CN101659850A (en) Modified nanometer cerium oxide and preparation and application thereof
CN106349948B (en) A kind of preparation method of nanometer burnishing liquid
JP2012011526A (en) Abrasive and manufacturing method thereof
CN107955545A (en) A kind of A is to sapphire polishing agent and preparation method thereof
CN106010297B (en) A kind of preparation method of alumina polishing solution
CN105565359A (en) Preparation method of superfine cerium oxide polishing powder adjustable in average grain diameter
CN101081966A (en) Polishing liquid for gallium arsenide wafer and preparation method thereof
WO2002072726A1 (en) Cerium based abrasive material and abrasive material slurry, and method for producing cerium based abrasive material
CN102719295A (en) Core-shell metal oxide/titanium oxide compound electrorheological fluid and preparation method thereof
CN102329571B (en) Rare earth and silicon compound precision type rare earth polishing powder and preparation method thereof
CN104619462B (en) The renovation process of the useless abrasive material of oxidation-containing cerium
CN104017501B (en) A kind of ultrasonic atomizatio type polishing fluid being applicable to TFT-LCD glass substrate
CN102079950A (en) Preparation method of monodisperse rare earth polishing powder

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C53 Correction of patent for invention or patent application
CB02 Change of applicant information

Address after: Whitewater Jianye road 426141 Yongzhou city of Hunan province Qiyang County No. 7

Applicant after: Hunan Haozhi New Materials Co., Ltd.

Address before: Baishui town 426141 Hunan County of Qiyang province (Qiyang science and Technology Industrial Park)

Applicant before: Yongzhou Haozhi RareEarth Co.,Ltd.

COR Change of bibliographic data

Free format text: CORRECT: APPLICANT; FROM: YONGZHOU HAOZHI RARE EARTH CO., LTD. TO: HU NAN HAOZHI NEW MATERIALS CO.,LTD.

C14 Grant of patent or utility model
GR01 Patent grant
ASS Succession or assignment of patent right

Owner name: HUNAN HAOZHI TECHNOLOGY CO., LTD.

Free format text: FORMER OWNER: HU NAN HAOZHI NEW MATERIALS CO., LTD.

Effective date: 20141117

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20141117

Address after: Whitewater Jianye road 426141 Yongzhou city of Hunan province Qiyang County No. 7

Patentee after: HUNAN HAOZHI TECHNOLOGY CO., LTD.

Address before: Whitewater Jianye road 426141 Yongzhou city of Hunan province Qiyang County No. 7

Patentee before: Hunan Haozhi New Materials Co., Ltd.