CN104650741A - Grinding and polishing paste for high-purity aluminum oxide ceramics - Google Patents
Grinding and polishing paste for high-purity aluminum oxide ceramics Download PDFInfo
- Publication number
- CN104650741A CN104650741A CN201510002172.7A CN201510002172A CN104650741A CN 104650741 A CN104650741 A CN 104650741A CN 201510002172 A CN201510002172 A CN 201510002172A CN 104650741 A CN104650741 A CN 104650741A
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- Prior art keywords
- grinding
- polishing
- particle
- nano diamond
- polishing cream
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a grinding and polishing paste for high-purity aluminum oxide ceramics. The grinding and polishing paste is prepared by mixing the following raw materials in parts by weight: 2-5 parts of nanodiamond particle, 150-340 parts of Vaseline, 200-320 parts of animal fat oil and 30-100 parts of a surface modifier. The grinding and polishing paste is high in polishing efficiency; the polished surface is free of scratches and high in smoothness; and the roughness is smaller than 0.1micron.
Description
Technical field
The present invention relates to a kind of grinding and polishing cream, particularly a kind of grinding and polishing cream for high-purity alumina ceramic.
Background technology
High-purity alpha-alumina ceramic grinding dish is mainly used for full-automatic vertical thinning machine, entirely/thin machine of semi-automatic water deflation, dress one side formula grinding/polishing machine, double-faced grinding/polishing machine (touch-screen type/panel type), one side pressure type precision lapping machine, the open shredder of one side, the key part of the equipment such as one side high precision shredder, and grinding plant is the necessaries of the silicon wafer of semi-conductor and LED industry, sapphire epitaxial wafer and GaAs thinning back side processing.
High-purity alpha-alumina pottery has high-strength, high-ductility, high hard, wear-resisting, corrosion resistant feature, its Rockwell hardness HRA80-90, hardness is only second to diamond, and alumina lap dish requires that surface smoothness is high, roughness will reach less than 0.1 micron, and the abrasive disc degree of 300 mm dias will below 2 microns.Common working method is grinding step by step from coarse to fine, final surface finish, generally adopts the alumina powder being less than 1 micron or Buddha's warrior attendant gypsum to carry out polishing, but when polishing large size (about 300 mm diameter) alumina-ceramic dish, there is following problem:
Adopt the polishing technology of existing rubbing paste, product surface roughness can not reach less than 0.1 micron;
Easily produce polishing line at product surface, its major cause is that diamond polishing sand produces reunion in polishing, and particle micro-shape indentation, produce in polishing process at alumina ceramic face groove, cause defect.
Summary of the invention
The object of the invention is to the problems referred to above solving prior art existence, provide a kind of grinding and polishing cream for high-purity alumina ceramic, polishing efficiency is high, the product surface no marking after polishing, and highly polished, roughness is less than 0.1 micron.
The technical solution adopted for the present invention to solve the technical problems is:
For a grinding and polishing cream for high-purity alumina ceramic, become by the mixed raw material of following parts by weight: Nano diamond particle 2-5 part, Vaseline 150-340 part, animal tallow oil 200-320 part, surface-modifying agent 30-100 part.
In rubbing paste of the present invention, Nano diamond evenly, is stably dispersed in rubbing paste, can not precipitate, surface-modifying agent has modification and diluting effect, Vaseline has lubrication in rubbing paste, final formula is paste after making, can not splash, use and can to clean up after boiling 5 to 10 minutes afterwards, can not cause residual.
Innovative point of the present invention is:
1) this invention exploits by the grinding and polishing cream of animal tallow oil as main bonding agent, Nano diamond is after mechanochemistry is pulverized, unsalted surface is exposed after diamond particle fragmentation, because a large amount of dangling bonds are contained on the surface that fragmentation is new afterwards, fine particle is easily reunited, first by the introducing of surface-modifying agent, the particle of agglomerated is dispersed, then condensed paste animal tallow oil, the particle of dispersion is wrapped up, thoroughly solve the problem that Nano diamond is reunited again, from but paste rubbing paste thin layer is dispersed in product surface, product surface roughness is made to obtain further improvement.Use grinding and polishing cream of the present invention, the product coarse rugosity about 300 mm diameter can to less than 0.1 micron.
2) the present invention proposes the grain composition by improving Nano diamond particle first, reaches the concept improving surface of ceramic products roughness.By the grating between adjustment particle, Nano diamond particle energy even compact be distributed in product surface, avoid macrobead and directly contact with product surface, the problem of easy scuffing product surface, avoids the generation of product surface polishing line.
As preferably, by weight percentage, described Nano diamond particle is by the Nano diamond granulometric composition of following size: 30nm particle: 50-70%, 80nm particle: 20-40%, 200nm particle: 10-20%.
As preferably, the purity of described Nano diamond particle is greater than 99.9%.
As preferably, described Vaseline is medical grade.
As preferably, described animal tallow oil is the mixture of lard, sheep oil or lard and sheep oil.
As preferably, described surface-modifying agent is selected from one or more in oleic acid, silane coupling agent, polyoxyethylene glycol, citric acid.
For a preparation method for the grinding and polishing cream of high-purity alumina ceramic, comprise the steps:
(1) animal tallow oil heating and melting is become liquid;
(2) then Nano diamond particle is added in the animal tallow oil of melting, be uniformly mixed to obtain Nano diamond liquid;
(3) Vaseline and surface-modifying agent are added in Nano diamond liquid, be uniformly mixed, be cooled to normal temperature.
The invention has the beneficial effects as follows:
1. the grinding and polishing cream technique of the present invention's exploitation is simple, rationally easily produces, and is not easy to produce precipitation at product surface, greatly reduces the burden of follow-up cleaning.
2. the grinding and polishing cream of the present invention's exploitation is due to special grain composition, and more traditional polishing fluid polishing efficiency is higher, and polishing time was reduced to present 1.5 hours by traditional 3 hours, and avoided the generation of surface finish line after polishing.
3. the grinding and polishing cream of the present invention's exploitation, introduce animal tallow oil and surface-modifying agent, avoid diamond particles and reunite, for large-sized ceramic grinding dish (300 millimeter), roughness can reach less than 0.1 micron.
Accompanying drawing explanation
Fig. 1 is the microscopical view of high-purity alpha-alumina ceramic grinding dish after traditional polishing fluid polishing.
Fig. 2 is the microscopical view of high-purity alpha-alumina ceramic grinding dish after grinding and polishing cream of the present invention polishing.
Embodiment
Below by specific embodiment, and by reference to the accompanying drawings, technical scheme of the present invention is described in further detail.
In the present invention, if not refer in particular to, the raw material adopted and equipment etc. all can be buied from market or this area is conventional.Method in following embodiment, if no special instructions, is the ordinary method of this area.
Vaseline of the present invention is medical grade, and the purity of Nano diamond particle is greater than 99.9%.
Embodiment 1:
For a grinding and polishing cream for high-purity alumina ceramic, become by the mixed raw material of following parts by weight: Nano diamond particle 2 parts, 150 parts, Vaseline, animal tallow oil (lard) 200 parts, surface-modifying agent (polyoxyethylene glycol) 30 parts.
By weight percentage, described Nano diamond particle is by the Nano diamond granulometric composition of following size: 30nm particle: 50%, 80nm particle: 40%, 200nm particle: 10%.
Embodiment 2:
A kind of grinding and polishing cream for high-purity alumina ceramic, become by the mixed raw material of following parts by weight: Nano diamond particle 5 parts, 340 parts, Vaseline, animal tallow oil (mixture of the mass ratio of 1:1 pressed by lard and sheep oil) 320 parts, surface-modifying agent (mixture of the mass ratio of 1:4 pressed by silane coupling agent KH560 and polyoxyethylene glycol) 100 parts.
By weight percentage, described Nano diamond particle is by the Nano diamond granulometric composition of following size: 30nm particle: 70%, 80nm particle: 20%, 200nm particle: 10%.
Embodiment 3:
For a grinding and polishing cream for high-purity alumina ceramic, become by the mixed raw material of following parts by weight: Nano diamond particle 3 parts, 200 parts, Vaseline, animal tallow oil (sheep oil) 280 parts, surface-modifying agent (oleic acid) 65 parts.
By weight percentage, described Nano diamond particle is by the Nano diamond granulometric composition of following size: 30nm particle: 60%, 80nm particle: 20%, 200nm particle: 20%.
The preparation method of grinding and polishing cream of the present invention comprises the steps:
(1) animal tallow oil is heated to 250 to 300 DEG C and is melt into liquid state;
(2) then Nano diamond particle is added in the animal tallow oil of melting, be uniformly mixed to obtain Nano diamond liquid;
(3) Vaseline and surface-modifying agent are added in Nano diamond liquid, be uniformly mixed, be cooled to normal temperature.
Use the high purity aluminium oxide product of grinding and polishing cream of the present invention polishing can reach following technical characterstic:
Product polishing efficiency is high, and polishing time was reduced to present 1.5 hours by traditional 3 hours;
Product surface no marking after polishing, highly polished, roughness is less than 0.1 micron;
In rubbing paste, diamond solid content is low, and stability is strong, and recyclable recycling, its polishing cost can reduce by more than 20%.
The effect of high purity aluminium oxide product through traditional polishing fluid polishing is shown in accompanying drawing 1,2 with the effect through grinding and polishing cream of the present invention polishing.Contrast accompanying drawing 1 and accompanying drawing 2, the polishing effect of grinding and polishing cream of the present invention obviously will be better than the polishing effect of traditional polishing fluid
Above-described embodiment is one of the present invention preferably scheme, not does any pro forma restriction to the present invention, also has other variant and remodeling under the prerequisite not exceeding the technical scheme described in claim.
Claims (7)
1. for a grinding and polishing cream for high-purity alumina ceramic, it is characterized in that, become by the mixed raw material of following parts by weight: Nano diamond particle 2-5 part, Vaseline 150-340 part, animal tallow oil 200-320 part, surface-modifying agent 30-100 part.
2. grinding and polishing cream according to claim 1, it is characterized in that: by weight percentage, described Nano diamond particle is by the Nano diamond granulometric composition of following size: 30nm particle: 50-70%, 80nm particle: 20-40%, 200nm particle: 10-20%.
3. grinding and polishing cream according to claim 2, is characterized in that: the purity of described Nano diamond particle is greater than 99.9%.
4. grinding and polishing cream according to claim 1 and 2, is characterized in that: described Vaseline is medical grade.
5. grinding and polishing cream according to claim 1 and 2, is characterized in that: described animal tallow oil is lard, the mixture of sheep oil or lard and sheep oil.
6. grinding and polishing cream according to claim 1 and 2, is characterized in that: described surface-modifying agent is selected from one or more in oleic acid, silane coupling agent, polyoxyethylene glycol, citric acid.
7., as claimed in claim 1 for the preparation method of the grinding and polishing cream of high-purity alumina ceramic, it is characterized in that, comprise the steps:
(1) animal tallow oil heating and melting is become liquid;
(2) then Nano diamond particle is added in the animal tallow oil of melting, be uniformly mixed to obtain Nano diamond liquid;
(3) Vaseline and surface-modifying agent are added in Nano diamond liquid, be uniformly mixed, be cooled to normal temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510002172.7A CN104650741A (en) | 2015-01-05 | 2015-01-05 | Grinding and polishing paste for high-purity aluminum oxide ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510002172.7A CN104650741A (en) | 2015-01-05 | 2015-01-05 | Grinding and polishing paste for high-purity aluminum oxide ceramics |
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| CN104650741A true CN104650741A (en) | 2015-05-27 |
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| CN201510002172.7A Pending CN104650741A (en) | 2015-01-05 | 2015-01-05 | Grinding and polishing paste for high-purity aluminum oxide ceramics |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107663422A (en) * | 2016-07-29 | 2018-02-06 | 蓝思科技股份有限公司 | A kind of ceramic polished lapping liquid |
| CN110804418A (en) * | 2019-09-18 | 2020-02-18 | 湖州湖磨陶瓷研磨液有限公司 | Grinding paste suitable for plant type polishing block and preparation method thereof |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1513934A (en) * | 2002-12-26 | 2004-07-21 | ������������ʽ���� | Grinding liquid composition |
| CN101033374A (en) * | 2007-04-13 | 2007-09-12 | 中国地质大学（武汉） | High-purity nano diamond polishing liquid and preparing method thereof |
| CN101050339A (en) * | 2007-05-17 | 2007-10-10 | 中国地质大学（武汉） | Diamond polishing paste in high purity, and preparation method |
| CN101831243A (en) * | 2010-04-30 | 2010-09-15 | 中国计量学院 | High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof |
| CN101875817A (en) * | 2009-04-29 | 2010-11-03 | 重庆川仪自动化股份有限公司 | Polishing paste used for sapphire round-rod bakelite wheel and preparation method thereof |
| CN102391789A (en) * | 2011-08-19 | 2012-03-28 | 永州皓志稀土材料有限公司 | Method for preparing nano diamond polishing solution |
| CN103160208A (en) * | 2013-03-01 | 2013-06-19 | 青岛恒汇帕特模具科技有限公司 | Man-made diamond grinding paste |
| CN103333617A (en) * | 2013-06-27 | 2013-10-02 | 北京工业大学 | Special polishing fluid for plastic soft metallic materials and method for preparing polishing fluid |
| CN103897606A (en) * | 2013-11-11 | 2014-07-02 | 东南大学 | High-purity nano-diamond polishing solution and preparation method thereof |
| CN103958123A (en) * | 2011-11-08 | 2014-07-30 | 福吉米株式会社 | Polishing composition |
-
2015
- 2015-01-05 CN CN201510002172.7A patent/CN104650741A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1513934A (en) * | 2002-12-26 | 2004-07-21 | ������������ʽ���� | Grinding liquid composition |
| CN101033374A (en) * | 2007-04-13 | 2007-09-12 | 中国地质大学（武汉） | High-purity nano diamond polishing liquid and preparing method thereof |
| CN101050339A (en) * | 2007-05-17 | 2007-10-10 | 中国地质大学（武汉） | Diamond polishing paste in high purity, and preparation method |
| CN101875817A (en) * | 2009-04-29 | 2010-11-03 | 重庆川仪自动化股份有限公司 | Polishing paste used for sapphire round-rod bakelite wheel and preparation method thereof |
| CN101831243A (en) * | 2010-04-30 | 2010-09-15 | 中国计量学院 | High-precision non-water-based nano-diamond grinding fluid and preparation method and application thereof |
| CN102391789A (en) * | 2011-08-19 | 2012-03-28 | 永州皓志稀土材料有限公司 | Method for preparing nano diamond polishing solution |
| CN103958123A (en) * | 2011-11-08 | 2014-07-30 | 福吉米株式会社 | Polishing composition |
| CN103160208A (en) * | 2013-03-01 | 2013-06-19 | 青岛恒汇帕特模具科技有限公司 | Man-made diamond grinding paste |
| CN103333617A (en) * | 2013-06-27 | 2013-10-02 | 北京工业大学 | Special polishing fluid for plastic soft metallic materials and method for preparing polishing fluid |
| CN103897606A (en) * | 2013-11-11 | 2014-07-02 | 东南大学 | High-purity nano-diamond polishing solution and preparation method thereof |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107663422A (en) * | 2016-07-29 | 2018-02-06 | 蓝思科技股份有限公司 | A kind of ceramic polished lapping liquid |
| CN107663422B (en) * | 2016-07-29 | 2020-08-11 | 蓝思科技股份有限公司 | Ceramic polishing grinding fluid |
| CN110804418A (en) * | 2019-09-18 | 2020-02-18 | 湖州湖磨陶瓷研磨液有限公司 | Grinding paste suitable for plant type polishing block and preparation method thereof |
| CN110804418B (en) * | 2019-09-18 | 2022-01-18 | 湖州湖磨陶瓷研磨液有限公司 | Grinding paste suitable for plant type polishing block and preparation method thereof |
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Application publication date: 20150527 |