The application requires the korean patent application No. submitting on August 10th, 2010The priority of 10-2010-0076974 and consequent ownership equity, its full content is by drawingBe incorporated into this by mode.
Detailed description of the invention
The present invention is more fully described with reference to the accompanying drawings, shown in the drawings of enforcement side of the present inventionFormula. But the present invention can realize in a lot of different modes, the present invention should be interpreted as and only limit toEmbodiment described herein. On the contrary, provide the object of these embodiments to be to make the disclosure moreAbundant and complete, and scope of the present invention is conveyed to those skilled in the art completely. Same reference markNumber represent all the time similar elements.
It should be understood that when mention an element be positioned at another element " on " time, this element can be directly positionOn another element, the element in the middle of also can existing. On the contrary, " be located immediately at " when mentioning an elementOn another element time, the element in the middle of not existing. As used herein, term "and/or" bagDraw together one and all combinations of one or more relevant items in listed relevant item.
Although it should be understood that and can use term " first ", " second ", " the 3rd " etc. hereinVarious elements, parts, region, layer and/or part are described, but these elements, parts, region,Layer and/or part should not be subject to the restriction of these terms. These terms be only used for by an element, parts,Region, layer or part differentiate with another region, layer or part. Like this, do not departing from ancestor of the present inventionUnder the prerequisite of purport, " the first element " discussed below, " parts ", " region ", " layer " or " part "Also can be called the second element, parts, region, layer or part.
Term as used herein is only the object in order to describe detailed description of the invention, is not intended to limitThe present invention. In literary composition, separately there is clearly regulation the singulative " (a) ", " using in literary compositionIndividual (an) " and " should (the) " comprise equally plural form. Also can further understand, in descriptionThe term using " comprises " (" comprises " and/or " comprising ") or " comprising "(" includes " and/or " including ") represent to exist described feature, region, entirety, step,, there are or be attached with one or more other feature, districts but do not get rid of in operation, element and/or partsTerritory, entirety, step, operation, element, parts and/or its combination.
Can use the spatial relationship term such as " above " etc. herein, describe in accompanying drawing to facilitateThe element illustrating or feature are with respect to the relation of another element or feature. Be appreciated that exceptBeyond orientation shown in figure, spatial relationship term is intended to comprise the difference of device in using or operatingOrientation. Unless otherwise prescribed, containing of all terms (the comprising technology and scientific terminology) using in literary compositionJustice is identical with those skilled in the art's general understanding. Also can further understand,Term (those as defined in normal dictionary) should be interpreted as having with them at correlation technique ringBorder and implication consistent in the disclosure, and except this clearly limits, should not be construed as and there is reasonWanting or too formal implication.
Describe embodiments of the present invention with reference to sectional view in this article, these sectional views are of the present inventionThe schematic diagram of desirable embodiment. Thereby, due to for example manufacturing technology and/or tolerance cause shown inThe variation of shape is expected. Therefore, embodiments of the present invention should not be understood as that and be limited to hereinShown in the given shape in region, and should comprise owing to for example manufacturing the deviation in shape causing.For example, be illustrated or be described as smooth region and may typically there is circle and/or nonlinear characteristic.And the wedge angle illustrating can be through rounding. Therefore, the region shown in figure is schematic in essence, and the shape in region is not intended to illustrate the true form in region, and, be not intended to limitThe scope of the claims in the present invention processed.
Hereinafter, explain in detail with reference to the accompanying drawings the present invention.
Fig. 1 is the sectional view illustrating according to an illustrative embodiments of display unit of the present invention.
With reference to Fig. 1, comprise first substrate 100, according to the display unit of an illustrative embodimentsTwo substrates 200, in conjunction with distance piece ADS, image displaying part 300 and sealant SL.
According to an illustrative embodiments, first substrate 100 comprises multiple pixel region PA, andSecond substrate 200 is arranged in the face of first substrate 100.
According to an illustrative embodiments, keep first substrate 100 and second in conjunction with distance piece ADSDistance between substrate 200 is also bonded to second substrate 200 by first substrate 100. In conjunction with distance pieceADS can be formed as various shapes. According to an illustrative embodiments, in conjunction with distance piece, ADS canTo be column spacer.
According to an illustrative embodiments, sealant SL is along first substrate 100 and second substrate 200End arrange, with the space around between first substrate 100 and second substrate 200.
According to an illustrative embodiments, image displaying part 300 is arranged in by first substrate 100,Two substrates 200 and sealant SL around space in show image.
According to an illustrative embodiments, image displaying part 300 comprise absorb or reverberation scheme with demonstrationThe image display layer 301 of picture and at least one electrode from electric field to image display layer 301 that apply are (notIllustrate). Although not shown in Fig. 1, electrode can be formed on first substrate 100 or second substrateOn 200. According to an illustrative embodiments, image display layer 301 is non-light emitting displays,But be not specifically defined in this. According to an illustrative embodiments, image display layer 301 can be liquidCrystal layer, electrophoretic layer, electric wetting layer or electrochromic layer. In addition, image display layer 301 can be anti-Penetrate type image display layer. In the time that image display layer 301 is reflection-type image display layer, provide from outsideLight after being reflected by image display layer 301, be visible for user. When image display layerThe 301st, when transmission type image display layer, from be included in the light providing backlight display unit viaAfter 301 transmission of image display layer, be visible for user. According to an illustrative embodiments,Reflection display device will be described now.
Fig. 2 is the flow chart that the illustrative embodiments of the method for shop drawings 1 display unit is shown, andFig. 3 is the sectional view that schematically shows the illustrative embodiments of the method for shop drawings 1 display unit.
Referring to figs. 1 through Fig. 3, according to an illustrative embodiments, the method comprises: in operation 11With 12 in first substrate 100 and second substrate 200 are provided respectively. First substrate and the second base are being providedAfter plate, in operation 21,31 and 41, on first substrate 100, form in conjunction with distance piece ADS(below describing in detail); And on first substrate 100, form image display layer in operation 51301. Then, in operation 60, together with first substrate 100 is coupled in second substrate 200,Then,, in operation 70, after being carried out, first substrate 100 and second substrate 200 cure.
As mentioned above, in operation 11 and 12, prepare respectively first substrate 100 and second substrate 200.
Then,, according to an illustrative embodiments, on first substrate 100, form in conjunction with distance pieceADS. According to an illustrative embodiments, can be formed on first substrate 100 in conjunction with distance piece ADSOr on second substrate 200, or both are upper to be formed on first substrate 100 and second substrate 200, makeMust together with first substrate 100 is coupled in second substrate 200 time, be formed on first substrate 100On combination distance piece ADS with to be formed on combination distance piece ADS on second substrate 200 not overlapping.According to an illustrative embodiments, describe now with reference to the operation 21,31 and 41 shown in Fig. 2Be formed on the formation of the combination distance piece ADS on first substrate 100. But, operation 21,31 and41 also can be performed as on second substrate 200 and to form in conjunction with distance piece ADS.
In operation 21, utilize resist to form in conjunction with distance piece ADS. According to an exemplary enforcementMode, resist is photosensitive organic polymeric material, but material should not be limited to this. Resist canThe various photosensitive polymers that photopolymerization reaction or light degradation reaction wherein may occur.
And then, by photoetching process, resist is carried out to patterning. As shown in Figure 1 to Figure 3, according toOne illustrative embodiments, each combination distance piece ADS has trapezoidal shape, still, in conjunction with betweenThe shape of spacing body ADS should not be limited to this. , according to the condition of photoetching process, in conjunction with distance piece ADSCan be formed as other shapes (for example, rectangular shape).
Hereinafter, photoetching process will be described. In operation 21, coating liquid on first substrate 100The resist of bodily form formula. According to an illustrative embodiments, can utilize spin coating method to apply resist.Resist can have the thickness of about 2 microns to about 4 microns. In operation 31, at about 80 DEG CTo the temperature of about 100 DEG C, to the resist prebake time of about 50 seconds to about 70 seconds.According to an illustrative embodiments, in prebake process, the solvent in resist partly evaporates,Therefore, resist is that more yielding (flexible) and its viscosity are higher. But, in this operation,Resist is not cured completely. Then,, in operation 41, use mask to resisting through prebakeErosion agent exposure (for example, ultraviolet ray), and the described resist that develops, wherein mask has and combinationThe pattern that distance piece ADS is corresponding. The result of development operation is that resist is patterned. SchemedThe resist of case can have the width of about 10 microns to about 30 microns.
Then, on first substrate 100, form sealant SL. Sealant SL is along first substrate 100End form, so that the space that forms image display layer 301 to be provided.
Then, in operation 51, formation figure on the first substrate 100 that is formed with sealant SLPicture display layer 301. When image display layer 301 is while having the fluid of viscosity, can be by " filling out for oneFill (ODF) " technique or ink-jetting process (its fluid that instils on substrate) formation image display layer 301.
Then, in operation 60, by the first substrate 100 being formed with on it in conjunction with distance piece ADSBe arranged in the face of second substrate 200, and for example by pressing first substrate 100 and second substrate200 are coupled in together. The result coupling is to be bonded to second substrate 200 in connection with distance piece ADS.
Then, at the temperature of about 100 DEG C to about 140 DEG C, to first substrate 100 andAfter two substrates 200, cure the time (70) of about 15 minutes to about 120 minutes. Rear bake operationBe performed as and cure sealant SL and in conjunction with distance piece ADS simultaneously. After completing when bake operation,Sealant SL and being cured completely in conjunction with distance piece ADS. Due in conjunction with distance piece ADS in combinationTo second substrate 200 time, cured completely, so can stably keep first substrate 100 andDistance between two substrates 200.
In the time manufacturing display unit according to said method, as mentioned above, can stably keep first substrate100 and second substrate 200 between distance, in addition, first substrate 100 and second substrate 200 canTo be bonded to each other in the situation that not using additional binder. Therefore, with use adhesive relevant lackFall into, for example, the defect in the time that adhesive mixes with image display layer 301, can be reduced.
Fig. 4 be schematically show according to another of the method for manufacture display unit of the present invention exemplaryThe sectional view of embodiment.
Same reference numerals represents and element identical in the illustrative embodiments shown in Fig. 3, thereforeThe detailed description of similar elements will be omitted.
With reference to Fig. 4, be provided with inorganic layer according to an illustrative embodiments of display unit of the present inventionIOL, this inorganic layer is arranged in conjunction with between distance piece ADS and second substrate 200. Due to the second basePlate 200 comprises the material such as glass, quartz or silicon, so inorganic layer IOL is arranged in second substrate200 and include between the combination distance piece ADS of organic polymer, to improve second substrate 200 and knotClose the adhesion characteristic between distance piece ADS. According to an illustrative embodiments, inorganic layer IOL canComprise silicon nitride (SiNx).
According to the present invention, the display unit of this illustrative embodiments is manufactured by following. When shown in Fig. 2Operation 11 and 12 in while preparing respectively first substrate 100 and second substrate 200, operation 21,In 31 and 41, on first substrate 100, form in conjunction with distance piece ADS and sealant SL. Then,In operation 51, on first substrate 100, form image display layer 301, and by first substrate 100Together with being coupled in second substrate 200. After this, operation 70 in to first substrate 100 and secondSubstrate 200 cures.
But, in this illustrative embodiments, by first substrate 100 and second substrate 200Before being coupled in together, on second substrate 200, form inorganic layer IOL, as shown in Figure 4. InorganicLayer IOL is formed as with corresponding in conjunction with distance piece ADS, makes by first substrate 100 and the second baseWhen plate 200 is coupled in together, inorganic layer IOL can with contact in conjunction with the upper surface of distance piece ADS.According to an illustrative embodiments, can be by the inorganic material of deposition such as silicon nitride on insulated substrateAnd by photoetching process, described inorganic material is carried out to patterning and form inorganic layer IOL.
According to illustrative embodiments, also can use additive method to manufacture display unit.
Fig. 5 is another example schematically showing according to the method for shop drawings 4 display unit of the present inventionThe sectional view of property embodiment.
As shown in Figure 5, prepare respectively first substrate 100 and second substrate 200, and at first substrateOn 100, form in conjunction with distance piece ADS.
And then, according to an illustrative embodiments, on second substrate 200, form inorganic layer IOL.Together with first substrate 100 is coupled in second substrate 200 time, inorganic layer IOL is formed as and tiesClose distance piece ADS correspondence. Inorganic both alignment layers IOAN can be formed on second substrate 200, to coverInorganic layer IOL. Inorganic both alignment layers IOAN can comprise such as silicon nitride (SiNx) or silica (SiOx)Inorganic material. End along second substrate 200 forms sealant SL. Then, form thereonOn the second substrate 200 of inorganic layer IOL, inorganic both alignment layers IOAN and sealant SL, form figurePicture display layer 301. Together with first substrate 100 is coupled in second substrate 200, then as above instituteState after first substrate 100 and second substrate 200 are carried out and cure, to manufacture display unit.
Because image display layer 301 comprises liquid crystal layer, so inorganic both alignment layers IOAN can be to liquid crystal layerLiquid crystal molecule carry out orientation and keep liquid crystal molecule, and can dispersed LCD molecule. , inorganic joiningBe formed as changing the surface energy of second substrate 200 to layer IOAN, therefore, inorganic both alignment layers IOANAnd the surface tension between liquid crystal layer increases, to weaken the dispersiveness of image display layer 301. Therefore,According to an illustrative embodiments, image display layer 301 can be arranged according to the pattern of inorganic layer IOL.In the time not forming inorganic both alignment layers IOAN, liquid crystal layer can be formed as with the first electrode or the second electrode straightContact, this is described further below. In the time that liquid crystal layer directly contacts with the first electrode or the second electrode,The dispersiveness of liquid crystal layer becomes the dispersiveness when having inorganic both alignment layers IOAN. Therefore, canUse ink ejecting method to form liquid crystal layer, thereby can in presumptive area, form liquid crystal layer.
Fig. 6 be schematically show according to another of the method for manufacture display unit of the present invention exemplaryThe sectional view of embodiment.
With reference to Fig. 6, comprise second substrate 200 according to the display unit of an illustrative embodiments, shouldOn second substrate, be formed with in conjunction with distance piece ADS, sealant SL and image display layer 301. As aboveDescribed, prepare respectively first substrate 100 and second substrate 200. Then, on second substrate 200Form in conjunction with distance piece ADS and sealant SL, then on second substrate 200, form image and showLayer 301. Together with first substrate 100 is coupled in second substrate 200, and to first substrate 100After carrying out with second substrate 200, cure.
Fig. 7 is the sectional view illustrating according to another illustrative embodiments of display unit of the present invention.
With reference to Fig. 7, comprise first substrate 100, according to the display unit of an illustrative embodimentsTwo substrates 200, in conjunction with distance piece ADS, support distance piece SS, image displaying part 300 and sealingAgent SL.
According to an illustrative embodiments, support distance piece SS and keep first substrate 100 and the second baseDistance between plate 200. Although first substrate 100 and second substrate 200 are in conjunction with distance pieceBefore not cured completely, ADS is coupled in together, but owing to having used support distance piece SS,So can keep equably first substrate on the whole region of first substrate 100 and second substrate 200100 and second substrate 200 between distance. Support distance piece SS and there is unified height, and withCuring applied pressure while supporting distance piece SS completely has nothing to do.
Fig. 8 is the illustrative embodiments illustrating according to the method for manufacture display unit of the present inventionFlow chart. Fig. 9 illustrates according to of the present invention first substrate shown in Fig. 7 and second substrate to enterRow couples the sectional view of the illustrative embodiments of operation.
With reference to Fig. 8, the method comprises: in operation 11 and 12, prepare respectively first substrate 100 HesSecond substrate 200, and (in operation 21,31 and 41) is at first substrate 100 or second substrateOn 200, form in conjunction with distance piece ADS. Do not form the first base in conjunction with distance piece ADS thereonOn plate 100 or second substrate 200, form and support distance piece SS. According to this illustrative embodiments,In operation 22,32,42 and 52, on second substrate 200, form and support distance piece SS, thisA little operations are similar with operation 21,31,41, and difference is, after carrying out, cures in operation 52Operation (will describe below), and in operation 51, on first substrate 100, form image and showLayer 301. Together with first substrate 100 is coupled in second substrate 200, and in operation 70, rightAfter carrying out, first substrate 100 and second substrate 200 cure.
Therefore, as mentioned above, in operation 11 and operation 12, prepare respectively first substrate 100 and theTwo substrates 200. Then, in operation 21,31 and 41, at first substrate 100 or second substrateOn 200, form in conjunction with distance piece ADS, and do not form thereon in conjunction with the of distance piece ADSOn one substrate 100 or second substrate 200, form and support distance piece SS. In this illustrative embodimentsIn, in operation 22,32,42 and 52, on second substrate 200, form and support distance piece SS.For illustration purpose, in this illustrative embodiments, description is formed in conjunction with distance piece ADSOn first substrate 100 and support distance piece SS and be formed on the structure on second substrate 200, but,Illustrative embodiments is not limited to this.
Being similar to the method for describing in Fig. 2 forms in conjunction with distance piece ADS.
In addition, can use the resist formation being similar in conjunction with distance piece ADS to support distance piece SS.According to an illustrative embodiments, support distance piece SS and be formed as having than little in conjunction with distance piece ADSHeight. , there is the first height H 1 in conjunction with distance piece ADS and support distance piece SS and have theTwo height H 2, make the first height H 1 be greater than the second height H 2. Resist can be photosensitive organicMaterial and can carry out patterning by photoetching process. Now by the details of describing about photoetching process.
Operation 22 in, by the resist-coating of liquid form on first substrate 100. According to oneIllustrative embodiments, can utilize spin coating method to apply resist.
In operation 32, at the temperature of about 80 DEG C to about 100 DEG C, resist is baked and banked up with earth in advanceThe time of about 50 seconds to about 70 seconds. In prebake operation, the solvent in resist can partGround evaporation, therefore, resist be more yielding and its viscosity very high. But, operate in prebakeIn, resist is not cured completely.
Then, in operation 42, use mask to be exposed to ultraviolet ray to the resist curing, this is coveredMould has the pattern corresponding with supporting distance piece SS and described mask to be formed on not form combinationIn the region of distance piece ADS, make when first substrate 100 and second substrate 200 are coupled in to oneWhile rising, mask is not with overlapping in conjunction with distance piece ADS. In the time that the resist of exposure is developed, anti-Erosion agent is patterned.
In operation 52, at the temperature of about 210 DEG C to about 240 DEG C, to resisting of patterningAfter erosion agent, cure the time of about 15 minutes to about 120 minutes. After cure process after, anti-Erosion agent becomes the support distance piece SS being cured completely. Due to support distance piece SS by after cure behaviourDo to be cured completely, therefore support distance piece SS and have than in conjunction with relatively lower sticky of distance piece ADSDegree and elasticity.
Although not shown in Fig. 8, according to an illustrative embodiments, can be at first substrate 100Or on second substrate 200, form sealant SL. Sealant SL is along first substrate 100 or the second baseThe end of plate 200 forms, thereby the space that wherein forms image display layer 301 is provided. In this exampleIn property embodiment, can on first substrate 100, form sealant SL, but, exemplary enforcementMode is not limited to this.
Then, in operation 51, formation figure on the first substrate 100 that is formed with sealant SLPicture display layer 301. When image display layer 301 is while having the fluid of viscosity, can pass through a filling(" ODF ") technique or ink-jetting process (its fluid that instils on substrate) form image display layer 301.
First substrate 100 is arranged in the face of second substrate 200, and to first substrate 100 or the secondAt least one in substrate 200 P that exerts pressure, to be coupled to second substrate by first substrate 100200. First substrate 100 and second substrate 200 are pressed together, until first substrate 100 withDistance between second substrate 200 equals the second height H 2.
Owing to being more yielding in conjunction with distance piece ADS, thus can press in conjunction with distance piece ADS,Until become and equal the second height H 2 in conjunction with the first height H 1 of distance piece ADS. When pressing combinationWhen distance piece ADS, increase in conjunction with the contact area between distance piece ADS and second substrate 200,And the bond properties in conjunction with distance piece ADS can improve by pressure P. Therefore, in conjunction with distance pieceADS can stably be bonded to second substrate 200. Support distance piece SS after carrying out, cure process itAfter do not there is deformability, thereby no matter pressure P how all can keep the second height H 2. As a result,Can on whole area, keep equably first substrate 100 and second substrate by supporting distance piece SSDistance between 200.
In operation 70, at the temperature of about 100 DEG C to about 140 DEG C, to first substrate 100With the time of curing about 15 minutes to about 120 minutes after second substrate 200. Rear bake operationBe performed as and cure sealant SL completely and in conjunction with distance piece ADS.
According to said method, can stably keep the distance between first substrate 100 and second substrate 200From, and first substrate 100 and second substrate 200 can be in the situation that not using additional binder thatThis combination.
And then, according to an illustrative embodiments, can be used as image to show in conjunction with distance piece ADSLayer 301 is divided into the separator in multiple regions. Therefore, do not need additional separator to separate image aobviousShow layer 301, thereby simplified manufacture method.
Figure 10 is the plane illustrating according to another illustrative embodiments of display unit of the present inventionFigure, and Figure 11 is the sectional view along the line I-I ' intercepting in Figure 10.
Utilize method manufacture same as shown in Figure 2 according to the display unit of this illustrative embodiments,And be used as separator in conjunction with distance piece ADS instead of column spacer. In addition show according to this,The display unit of example embodiment comprises the liquid crystal layer as image display layer 301. Exemplary at thisIn embodiment, save and support distance piece SS, but, this should be limited to. Therefore, prop up if comprisedSupport distance piece SS, can utilize method same as shown in Figure 8 to form and support distance piece.
With reference to Figure 10 and Figure 11, according to an illustrative embodiments, display unit comprises first substrate100, second substrate 200, (do not show in conjunction with distance piece ADS, image displaying part 300 and sealantGo out).
Display unit comprises and shows multiple pixel region PA of image and the end shape along display unitBecome the non-pixel region around pixel region. As shown in Figures 1 to 9, sealant is along the first baseThe end of plate 100 or second substrate 200 is arranged in non-pixel region.
In Figure 10 and Figure 11, for illustration purpose, the exemplary of pixel region PA describedEmbodiment, but pixel region PA also can be arranged in the matrix construction with multiple row and columns.Each pixel region PA has identical 26S Proteasome Structure and Function, therefore will describe a pixel region in detailTerritory PA. In addition,, according to an illustrative embodiments, each pixel region PA has the institute as Figure 10The rectangular shape showing, but the shape of pixel region PA should not be limited to rectangular shape. , pixel regionPA can have various shapes, as V-arrangement or Z-shaped.
According to an illustrative embodiments, first substrate 100 comprises the first insulated substrate 110, firstInsulating barrier 113, grid line GL, data wire DL, jump compensating pattern SCP, switch element are (for exampleThin film transistor (TFT) (" TFT ")) and the second insulating barrier 115.
Grid line GL is arranged on the first insulated substrate 110 and at first direction D1 and extends.
The first insulating barrier 113 forms on the first insulated substrate 110 that is formed with grid line GL thereon.
Data wire DL is arranged on the first insulating barrier 113 and with grid line GL and intersects. Data wireDL comprises the first data wire part DL1 and the second data wire part DL2, wherein the first data wire partDivide DL1 to extend on the second direction D2 that is substantially perpendicular to first direction D1, the second data wirePart DL2 is connected to the first data wire part DL1 and is outstanding on first direction D1. SecondThe contiguous grid line GL of data wire part DL2 arranges.
According to an illustrative embodiments, jump compensating pattern SCP be arranged in be positioned at grid line GL andOn the first insulating barrier 113 between data wire DL. Jump compensating pattern SCP is for offset data lineJump between DL and the first insulating barrier 113, and the upper surface of jump compensating pattern SCP is arrangedIn the plane identical with the upper surface of data wire DL. As shown in plane, jump compensating pattern SCPBe arranged on the second direction D2 of the first data wire part DL1 extension. Therefore, jump compensating patternNear the SCP region that data wire DL and grid line GL intersect therein, be positioned at the both sides place of grid line GL.Jump compensating pattern SCP can comprise inorganic material. Described inorganic material can comprise silicon nitride (SiNx),The non-crystalline silicon (n+a-Si) of non-crystalline silicon (a-Si) or impurity.
According to an illustrative embodiments, thin film transistor (TFT) TFT contiguous wherein data wire DL and gridThe region that line GL intersects is arranged, and is comprised gate electrode GE, semiconductor layer SM, source electrode SEWith drain electrode DE.
According to an illustrative embodiments, gate electrode GE from grid line GL branch out. Semiconductor layerSM is formed on the first insulating barrier 113 with overlapping with gate electrode GE. Source electrode SE is from data wireDL branch out and overlapping with a part of semiconductor layer SM. Drain electrode DE and source electrode SE everyOpen and overlapping with a part of semiconductor layer SM. Semiconductor layer SM forms source electrode SE and electric leakageConductive channel between utmost point DE.
According to an illustrative embodiments, the second insulating barrier 115 formation active electrode disposed thereonOn the first insulating barrier 113 of SE and drain electrode DE. The second insulating barrier 115 be provided with through wherein andThe contact hole CH forming, expose drain electrode DE, and the first electrode EL1 (will be in the back with partDescribe) be connected to drain electrode DE by contact hole CH.
According to an illustrative embodiments, jump compensating pattern SCP can be by independent patterning mistakeJourney forms, or according to another illustrative embodiments, jump compensating pattern SCP can by with semiconductorThe layer that layer SM is identical forms. Therefore, semiconductor layer SM and jump compensating pattern SCP can be substantiallyBy while patterning, thereby do not need other process to form jump compensating pattern SCP.
As further illustrated in Figure 11, second substrate 200 is arranged in the face of first substrate 100. TheTwo substrates 200 comprise the second insulated substrate 210.
According to an illustrative embodiments, be arranged on first substrate 100 in conjunction with distance piece ADS.In conjunction with the distance between distance piece ADS maintenance first substrate 100 and second substrate 200 and by firstSubstrate 100 is bonded to second substrate 200. In this illustrative embodiments, in conjunction with distance piece ADSCan be used as first substrate 100 to be divided into the separator in multiple regions. Because separator is formed on the first baseBetween plate 100 and second substrate 200, therefore separator can be by first substrate 100 and second substrate 200Between space be divided into multiple regions.
According to an illustrative embodiments, can tool by the multiple regions that are divided in conjunction with distance piece ADSThere are various shapes. And, can form along the end of pixel region PA in conjunction with distance piece ADS. KnotClose distance piece ADS along first data wire part DL1 extend second direction D2 with rectilinear formForm, and in conjunction with distance piece ADS and the first data wire part DL1 and jump compensating pattern SCPOverlapping. According to an illustrative embodiments, the width having in conjunction with distance piece ADS is greater than the first numberAccording to the width of line part DL1. Contact with other elements in conjunction with distance piece ADS, and in conjunction with intervalContact size between part ADS and these elements can be based on Pixel Design and process margin and is changed.And, can be overlapping with a part of the second data wire part DL2 in conjunction with distance piece ADS.
Image displaying part 300, between first substrate 100 and second substrate 200, and is positioned at byIn one substrate 100, second substrate 200 and the space in conjunction with distance piece ADS restriction.
Image displaying part 300 comprises the first electrode EL1, the second electrode EL2 and image display layer 301,To absorb or reflection exterior light, thereby show image.
With reference to Figure 10 and Figure 11, the first electrode EL1 with pixel region PA relation one to oneBe arranged on first substrate 100. The first electrode EL1 is arranged on the second insulating barrier 115. The first electricityUtmost point EL1 comprises catoptrical metallic reflective material. The first electrode EL1 passes through through the second insulating barrier115 and form contact hole CH be electrically connected to drain electrode DE.
The second electrode EL2 is formed on the second insulated substrate 210. The second electrode EL2 receives publicVoltage, and produce electric field between the second electrode EL2 and the first electrode EL1. The second electrode EL2Utilize transparent material to be formed on the second insulated substrate 210.
According to an illustrative embodiments, image display layer 301 is liquid crystal layers 310. Liquid crystal layer 310By electric field controls with show image. Liquid crystal layer 310 can be cholesteric crystal layer, therefore display unitIt can be reflection display device. Cholesteric crystal layer comprises the periodicity spiral knot with constant pitchStructure according to optionally reverberation of constant pitch. Therefore, cholesteric crystal layer can be anti-according to its pitchPenetrate ruddiness, green glow and blue light. Therefore, the liquid crystal layer of each reflect red, green glow and blue light is established respectivelyPut image display layer 301 by the each region separating in conjunction with distance piece ADS in.
According to an illustrative embodiments, in the time that display unit is reflection display device, in conjunction with intervalPart ADS can be formed as having the white with respect to exterior light with high reflectance. Show in reflection-typeIn device, can cover data line in conjunction with distance piece ADS, and without forming additional black matrix. ThisOutward, owing to having white in conjunction with distance piece ADS, therefore the brightness of reflection display device can increase.
Figure 12 is the exemplary enforcement side in conjunction with the pixel region of distance piece that comprises illustrating in Figure 10The plane of formula.
With reference to Figure 12, first substrate 100 comprises pixel region PA. In conjunction with distance piece, ADS is positioned atThe end of each pixel region PA. Extend and edge on second direction D2 in conjunction with distance piece ADSFirst direction D1 arranges. Be filled with red reflex type by the each region separating in conjunction with distance piece ADSCholesteric crystal layer, green reflective cholesteric phase liquid crystal layer and blue reflective cholesteric crystal layer. AsShown in Figure 12, be arranged in conjunction with distance piece ADS between the pixel region PA that represents different colours,And be not arranged between the pixel region PA that represents same color. Therefore, represent the picture of same colorElement region PA can be filled to have the face corresponding with the pixel region PA that represents same color simultaneouslyThe cholesteric crystal layer of look.
According to an illustrative embodiments, in display unit, when the alignment direction of liquid crystal molecule due toElectric field and while changing, the amount of the light by liquid crystal layer transmission is controlled, thereby shows image. Due to courageSteroid phase liquid crystal layer Show Color, even if therefore color display does not need independent colour filter yet.
According to an illustrative embodiments, the second data wire part DL2 is prominent on first direction D1Go out, so as to minimize first substrate 100 with to be formed with region in conjunction with distance piece ADS correspondingLip-deep jump. Therefore, intersect with grid line GL in conjunction with distance piece ADS and data wire DL whereinRegion not overlapping. And, because the second data wire part DL2 is outstanding on first direction D1,Therefore between the first insulating barrier 113 and the first and second data wire part DL1 and DL2, produceJump can be by jump compensating pattern SCP compensation. Therefore, first substrate 100 is being formed with between combinationThe region of spacing body ADS comprises flat surfaces, thereby can prevent that liquid crystal is to adjacent pixel regions PA'sLeak.
Figure 13 is the plane illustrating according to an illustrative embodiments of display unit of the present invention,And Figure 14 is the plane that the pixel region PA that comprises separator shown in Figure 13 is shown. At figure13 and Figure 14 in, identical reference number represents and element identical in Figure 10 and Figure 11, thereforeThe detailed description of similar elements will be omitted.
With reference to Figure 13 and Figure 14, different from the combination distance piece ADS shown in Figure 12, in conjunction with betweenSpacing body ADS is formed as around each pixel region PA. , in conjunction with distance piece ADS in second partyTo D2 upper with data wire DL and jump compensating pattern SCP is overlapping and on first direction D1 andGrid line GL is overlapping. Therefore, by first substrate 100, second substrate 200 with in conjunction with distance piece ADSThe space limiting is formed as corresponding with each pixel region PA.
According to an illustrative embodiments, can be formed as having with respect to outside in conjunction with distance piece ADSLight has the white of high reflectance. Although do not form additional black matrix, display unit can profitWith covering grid line GL and data wire DL in conjunction with distance piece ADS. And, when in conjunction with distance piece ADSWhile thering is white, increased by the amount of the light in conjunction with distance piece ADS reflection, thereby improve display unitBrightness.
According to this illustrative embodiments, cholesteric crystal layer can be arranged in and adjacent pixel regions PAShow in each pixel region PA of different colours. In an illustrative embodiments, work as rednessWhen reflective cholesteric phase liquid crystal layer is arranged in a pixel region PA, green reflective cholesteric phase liquid crystalLayer or blue reflective cholesteric crystal layer are arranged in and are furnished with red reflex type cholesteric crystal layerThe adjacent pixel region PA of a pixel region PA in.
Figure 15 is the plane illustrating according to another illustrative embodiments of display unit of the present inventionFigure. In Figure 15, identical reference number represents and element identical in Figure 10 and Figure 11, because ofThis will omit the detailed description of similar elements.
With reference to Figure 15, can have and the combination distance piece ADS shown in Figure 12 in conjunction with distance piece ADSSimilarly structure, but, have than the according to the combination distance piece ADS of this illustrative embodimentsThe little width of width of one data wire part DL1. In addition have than combination in conjunction with distance piece ADS,The large width in region that distance piece ADS and the first data wire part DL1 are overlapping, with complete order of coveringPoor compensating pattern SCP.
Therefore,, according to an illustrative embodiments, cover and may mend at jump in conjunction with distance piece ADSRepay the crack (crevice) producing between pattern SCP and data wire DL. As a result, first substrate 100Can be formed as having and be formed with the flat surfaces corresponding in conjunction with the region of distance piece ADS, thereby subtractingFew liquid crystal molecule is to the leakage of adjacent pixel regions PA.
Figure 16 is the plane illustrating according to another illustrative embodiments of display unit of the present inventionFigure. In Figure 16, identical reference number represents and element identical in Figure 10 and Figure 11, because ofThis will omit the detailed description of similar elements.
With reference to Figure 16, according to an illustrative embodiments, the combination distance piece ADS illustrating can haveWith the similar structure of combination distance piece ADS shown in Figure 12, but this is in conjunction with distance piece ADSComprise double-walled shape. , comprise by the first data wire part DL1 each other in conjunction with distance piece ADSSeparate simultaneously adjacent one another are first in conjunction with distance piece ADS1 and second in conjunction with distance piece ADS2. TheOne extends in conjunction with distance piece ADS2 in conjunction with distance piece ADS1 and second on second direction D2. TheOne in conjunction with distance piece ADS1 and second in conjunction with distance piece ADS2 can with the first data wire part DL1Partly overlapping. In Figure 16, according to an illustrative embodiments, first in conjunction with distance piece ADS1With second not overlapping in conjunction with distance piece ADS2 and the first data wire part DL1.
According to an illustrative embodiments, first in conjunction with distance piece ADS1 and second in conjunction with distance pieceOne in ADS2 prevents the leakage of liquid crystal molecule to adjacent pixel regions PA, and another is in conjunction with intervalPart ADS1 or ADS2 prevent the leakage of liquid crystal molecule. Therefore, can prevent the leakage of liquid crystal molecule.
As mentioned above, according to an illustrative embodiments, image display layer 301 is liquid crystal layers 310,But it is not limited to this. According to another illustrative embodiments, image display layer 301 can be asLower described electrophoretic layer 320.
Figure 17 is the sectional view illustrating according to the illustrative embodiments of display unit of the present invention, shouldDisplay unit comprises the electrophoretic layer as image display layer. Figure 17 is corresponding to the line II-II ' in Figure 13Sectional view. In Figure 17, identical reference number represents element identical in Figure 11, therefore willOmit the detailed description of similar elements.
With reference to Figure 13 to Figure 17, in this illustrative embodiments, image display layer 301 is electrophoresisLayer 320.
According to an illustrative embodiments, electrophoretic layer 320 comprises dielectric 323 and charged particle325 and 327. Dielectric 323 is corresponding to the dispersion that is wherein dispersed with charged particle 325 and 327Decentralized medium in system. Charged particle 325 and 327 comprises white charged particle 325 and non-whiteCharged particle 327. Non-white charged particle 327 can have black. White charged particle 325 and non-White charged particle 327 is charged has contrary polarity mutually.
According to an illustrative embodiments, second substrate 200 comprises the color filter layer CF of Show Color.Color filter layer CF is arranged between the second insulated substrate 210 and the second electrode EL2. Color filter layerCF shows red R, green G and the blue B corresponding with each pixel region PA.
According to an illustrative embodiments, when thin film transistor (TFT) TFT is in response to executing by grid line GLThe driving signal adding and while connecting, the picture signal providing by data wire DL is by the film of connectingTransistor T FT transfers to the first electrode EL1. Therefore, the first electrode EL1 be applied with publicBetween the second electrode EL2 of voltage, produce electric field. Charged particle 325 and 327 moves according to electric field,Therefore the exterior light that incides electrophoretic layer 230 is absorbed or reflection by charged particle 325 and 327, to showDiagram picture.
Although do not illustrate in the drawings, according to another illustrative embodiments, electrophoretic layer 320 canComprise multiple capsules (capsule). In the time that electrophoretic layer 320 comprises capsule, charged particle 325 and 327 withAnd dielectric 323 is arranged in described capsule. According to another illustrative embodiments, work as charged particleWhile thering is color, can omit color filter layer CF. And, according to another illustrative embodiments,Electrophoretic layer 320 can comprise electrophoresis emulsion. Electrophoresis emulsion comprises the non-polar solven and the quilt that form continuous phaseNon-polar solven disperses and forms the electric field control being produced by the first electrode EL1 and the second electrode EL2The polar solvent of the drop of system. Polar solvent comprises and is insoluble to non-polar solven and dissolves in polar solventDyestuff, make polar solvent can show black or white by described dyestuff. Therefore, due to electric field,Polar solvent can have than the better mobility of non-polar solven or bonding force.
According to another illustrative embodiments, image display layer 301 can be electrochromic layer 330.
Figure 18 is the sectional view illustrating according to an illustrative embodiments of display unit of the present invention,This display unit comprises the electrochromic layer 330 as image display layer. In Figure 18, identical ginsengExamine label and represent and element identical in Figure 17, therefore will omit the detailed description of similar elements.
Electrochromic layer 330 demonstrates oxidation reaction and reduction reaction in various degree, and electricity causes changeThe transparency of chromatograph 330 is controlled by being oxidized and reducing difference. Electrochromic layer 330 is by being applied toThe voltage of the first electrode EL1 and the second electrode EL2 shows image.
According to an illustrative embodiments, electrochromic layer 330 is by selecting free tungsten oxide (WO3)、Molybdenum oxide (MoO3) and the group of iridium oxide (IrOx) composition at least one inorganic compoundOr select at least one organic compound in the group of free viologen, rare earth phthalocyanine dye and styrene compositionThing forms. And electrochromic layer 330 can comprise polypyrrole, polythiophene and polyaniline by being selected fromGroup at least one conducting polymer form.
According to another illustrative embodiments, image display layer 301 can be electric wetting layer 340.
Figure 19 is the sectional view illustrating according to an illustrative embodiments of display unit of the present invention,This display unit comprises the electric wetting layer 340 as image display layer 301. In Figure 19, identicalReference number represents and element identical in Figure 18, therefore will omit the detailed description of similar elements.With reference to Figure 19, image displaying part 300 comprises the first electrode EL1 and electric wetting layer 340, and has savedThe second electrode EL2.
In electric wetting layer 340, there is electrocapillarity, the surface tension of its median surface is due to existenceElectric charge on the interface of conductor fluid and changing, to change contact angle. Electricity is wetting is such oneTechnology, applies electricity to conductor fluid when contacting the non conducting fluid on the first electrode when conductor fluidPress, and control the surface tension of conductor fluid, utilize electrocapillarity to change connecing of conductor fluidThe interface of feeler and two kinds of fluids.
According to an illustrative embodiments, electric wetting layer 340 comprises unmixed first fluid each other345 and second fluid 343. First fluid 345 can be black fluid. Electricity wetting layer 340 basesElectric field changes the distribution of first fluid 345 and second fluid 343, thereby stops or transmit outer light.
According to an illustrative embodiments, first fluid 345 and second fluid 343 can have differenceElectric conductivity. An illustrative embodiments, first fluid 345 can have electric conductivity, and theTwo fluids 343 can have electrical insulation characteristics. In an illustrative embodiments, first fluid 345 isIts solvent is the electrolyte of water, and second fluid 343 is oil.
According to an illustrative embodiments, in the time that the first electrode EL1 is applied to voltage, first fluid345 surface tension dies down and covers the whole surface of each pixel region PA, thereby shows black.According to another illustrative embodiments, in the time the first electrode EL1 not being applied to voltage, first fluid345 surface tension grow, and first fluid 345 is assembled some at each pixel region PAIn region, thus transmission light.
Although described illustrative embodiments, it should be understood that, the present invention should not be limited toThese illustrative embodiments, those skilled in the art can be as the essence of the present invention for required protectionWith in scope, carry out various variations and change.
For example, although the various illustrative embodiments of image display layer have been described, but, figureShould not be limited to this as display layer. , the layer of electrofluid layer or other types also can show as imageLayer. In addition, although mainly described exemplary enforcement of the present invention with reference to reflection display deviceMode, but display unit should not be limited to this. , above-mentioned illustrative embodiments can be applicable to adoptThe transmission display unit of independent light source.