Summary of the invention
The present invention has designed a kind of film contamination analysis and cleaning device and control method thereof, it solves membrane pollution problem, it is integrated to realize that film cleans with performance test, and the standardized data analysis system is provided, and realizes that membrane cleaning process cleans and safeguard the comprehensive and systematic service that provides for film efficiently.
In order to solve the technical problem of above-mentioned existence, the present invention has adopted following scheme:
A kind of film contamination analysis and cleaning device, it is characterized in that: comprise that film pollutes the test analysis unit and film pollutes cleaning unit, described film pollutes the test analysis unit and mainly comprises test water tank, low-lift pump, microstrainer, high-pressure pump and pressure vessel, and described test water tank, low-lift pump, microstrainer, high-pressure pump and pressure vessel are in turn connected into a circulatory system by pipeline; Described film pollutes cleaning unit and mainly comprises cleaning water tank, described low-lift pump, described microstrainer and described pressure vessel, and described cleaning water tank, described low-lift pump, described microstrainer and described pressure vessel are in turn connected into a circulatory system by pipeline; Described film pollutes the test analysis unit and described film pollutes cleaning unit shared described low-lift pump, described microstrainer and described pressure vessel; Membrane component to be cleaned and that analyze is placed in the described pressure vessel, is respectively equipped with an instrument appliance system at input and the output of described pressure vessel.
Further, described cleaning water tank connects with the input of described low-lift pump and the output of described pressure vessel respectively with input with the output of testing after water tank is connected in parallel by pipeline, described cleaning water tank input and output two ends are respectively equipped with first valve and the 3rd valve, and described test water tank input and output two ends are respectively equipped with second valve and the 4th valve.
Further, with the input of described high-pressure pump and output a connecting pipe road that is connected in parallel, described connecting pipe is provided with the 6th valve, is provided with one the 7th valve between the input junction of the input of described high-pressure pump and described connecting pipe and high-pressure pump.
Further, described microstrainer also connects a discharge tube that is communicated with external environment condition, and described discharge tube is provided with vent valves.
The control method of a kind of film contamination analysis and cleaning device may further comprise the steps: with described first valve, the 3rd valve, vent valves and the 6th valve closing, with described second valve, the 4th valve and the 7th valve open; Starting switch then, the test fluid for preparing by the requirement of film test condition is put in the test water tank, through behind described low-lift pump, microstrainer and the high-pressure pump, water quality enters into described membrane component, the dense water of film is all got back to the test water tank with product water, online described instrument appliance system provides flow, pressure, temperature and the conductivity values of Inlet and outlet water then, calculates through the PLC micro computer, and the film that draws after the standardization produces water flux and film salt rejection rate index.
The control method of a kind of film contamination analysis and cleaning device may further comprise the steps: earlier with described second valve, the 4th valve, vent valves and the 7th valve closing, with described first valve, the 3rd valve and the 6th valve open; Starting switch then, prepare cleaning fluid by the requirement of film cleaning condition, prepare in advance and be put in the described cleaning water tank, directly enter into described membrane component through described low-lift pump and microstrainer, the dense water of film is all got back in the described cleaning water tank with product water, online described instrument appliance system provides flow, pressure, temperature, the conductivity values of Inlet and outlet water then, provides cleaning procedure by the cleaning requirement, cleans.
The pollutant that film washes down filters through the micro-filtration membrane of described microstrainer, and regularly discharges pollutants by vent valves.
This film contamination analysis and cleaning device and control method thereof have following beneficial effect:
(1) to realize that film cleans with performance test integrated in the present invention, and the standardized data analysis system is provided, and realizing that membrane cleaning process cleans and safeguards for film efficiently provides comprehensive and systematic service, and can realize.The film properties automatic standardizing shows.
(2) the present invention also realizes air water flushing, water flushing, Chemical cleaning and testing integrated automatic cleaning equipment.
The specific embodiment
Below in conjunction with Fig. 1, the present invention will be further described:
A kind of film contamination analysis and cleaning device, comprise that film pollutes the test analysis unit and film pollutes cleaning unit, described film pollutes the test analysis unit and mainly comprises test water tank, low-lift pump, microstrainer, high-pressure pump and pressure vessel, and described test water tank, low-lift pump, microstrainer, high-pressure pump and pressure vessel are in turn connected into a circulatory system by pipeline; Described film pollutes cleaning unit and mainly comprises cleaning water tank, described low-lift pump, described microstrainer and described pressure vessel, and described cleaning water tank, described low-lift pump, described microstrainer and described pressure vessel are in turn connected into a circulatory system by pipeline; Described film pollutes the test analysis unit and described film pollutes cleaning unit shared described low-lift pump, described microstrainer and described pressure vessel; Membrane component to be cleaned and that analyze is placed in the described pressure vessel, is respectively equipped with an instrument appliance system 8 at input and the output of described pressure vessel.
Described cleaning water tank connects with the input of described low-lift pump and the output of described pressure vessel respectively with input with the output of testing after water tank is connected in parallel by pipeline, described cleaning water tank input and output two ends are respectively equipped with first valve 1 and the 3rd valve 3, and described test water tank input and output two ends are respectively equipped with second valve 2 and the 4th valve 4.
With the input of described high-pressure pump and output a connecting pipe road that is connected in parallel, described connecting pipe is provided with the 6th valve 6, is provided with one the 7th valve 7 between the input junction of the input of described high-pressure pump and described connecting pipe and high-pressure pump.
Described microstrainer also connects a discharge tube that is communicated with external environment condition, and described discharge tube is provided with vent valves 5.
Wherein clean water tank and the supply water source of test water tank as former water, realize switching according to the different requirements with cleaning of test.
Low-lift pump is the supply pump as high-pressure pump, and the power flow then is provided in cleaning process.
Microstrainer is the protective effect to film, simultaneously outside the pollutant discharge system that in time cleaning process is produced.
High-pressure pump provides the high voltage power requirement of film test, and the water requirement processed of cleaning required pure water also can be provided.And in cleaning process, then pass through valve closing.
Above-mentioned each valve cleans the switching that pipeline is provided with test for satisfying.
The electrical instrumentation system then provides numerical value indications such as the pressure of Inlet and outlet water, flow, electrical conductivity, temperature for satisfying film test and the requirement of cleaning; also provide simultaneously automatic operation needed liquid level protection, overvoltage protection, overcurrent protection and frequency conversion provide technology needed flow pressure output.
The operation principle of film contamination analysis of the present invention and cleaning device is:
The film test process: for etc. the film of cleaning or the film that had cleaned, need do the assessment test to the performance of film.Then need this device is adjusted to the film test mode.Earlier described first valve 1, the 3rd valve 3, vent valves 5 and the 6th valve 6 are closed, described second valve 2, the 4th valve 4 and the 7th valve 7 are opened; Starting switch then, the test fluid for preparing by the requirement of film test condition is put in the test water tank, through behind described low-lift pump, microstrainer and the high-pressure pump, water quality enters into described membrane component, the dense water of film is all got back to the test water tank with product water, online described instrument appliance system provides flow, pressure, temperature and the conductivity values of Inlet and outlet water then, calculates through the PLC micro computer, and the film that draws after the standardization produces water flux and film salt rejection rate index.
Membrane cleaning process: behind the film test analysis, film need clean, and then system is adjusted to film and cleans state.Earlier described second valve 2, the 4th valve 4, vent valves 5 and the 7th valve 7 are closed, described first valve 1, the 3rd valve 3 and the 6th valve 6 are opened; Starting switch then, prepare cleaning fluid by the requirement of film cleaning condition, prepare in advance and be put in the described cleaning water tank, directly enter into described membrane component through described low-lift pump and microstrainer, the dense water of film is all got back in the described cleaning water tank with product water, online described instrument appliance system provides flow, pressure, temperature, the conductivity values of Inlet and outlet water then, provides cleaning procedure by the cleaning requirement, cleans.
The pollutant that film washes down filters through the micro-filtration membrane of described microstrainer, and regularly discharges pollutants by vent valves 5.
For example: a film that has been subjected to biological pollution is put in the system, carried out the film test.Equipment is placed into the film test mode, press the film test condition of film producer, (this membrane component is DOWBW400FR, and the film test condition is 2000mg/LNaCL, 1.55MPa, 25, PH8,15% rate of recovery, prepare test fluid by described condition, and equipment is adjusted to condition as requiring, then according to value, calculate aquifer yield and the salt rejection rate of membrane.According to the result as shown in Table 1, it is comparatively serious that the performance of newer film (aquifer yield is 40m3/d, and salt rejection rate is 99.5%) thinks that film has polluted, and cleans so will carry out film.Switch to film below and clean state.
Preparing cleaning fluid in cleaning water tank, think by this research and take the LX-MA10 of blue star company to clean, is 30 degree by cleaning requirement, concentration 2%, and PH12 prepares cleaning fluid.By the cleaning requirement, the flow of initial clean is 5m3/h, circulation 3h, then; take high flow capacity 12 m3/h, circulation 1h, therebetween; efflux the part pollutant by vent valves 5, and add cleaning fluid and keep temperature, if cause temperature to raise because of circulation then need to shut down low pressure recycle.
Table 1: the service data of cleaning front and back through special-purpose film cleaning equipment
By reference to the accompanying drawings the present invention has been carried out exemplary description above; obvious realization of the present invention is not subjected to the restriction of aforesaid way; as long as the various improvement of having adopted method design of the present invention and technical scheme to carry out; or without improving design of the present invention and technical scheme are directly applied to other occasion, all in protection scope of the present invention.