CN102331514A - 元件结构体、惯性传感器以及电子设备 - Google Patents
元件结构体、惯性传感器以及电子设备 Download PDFInfo
- Publication number
- CN102331514A CN102331514A CN2011101390881A CN201110139088A CN102331514A CN 102331514 A CN102331514 A CN 102331514A CN 2011101390881 A CN2011101390881 A CN 2011101390881A CN 201110139088 A CN201110139088 A CN 201110139088A CN 102331514 A CN102331514 A CN 102331514A
- Authority
- CN
- China
- Prior art keywords
- substrate
- zone
- element structure
- electrode
- movable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems ; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems ; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
- B81C1/00134—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
- B81C1/00182—Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5642—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams
- G01C19/5663—Manufacturing; Trimming; Mounting; Housings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/125—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by capacitive pick-up
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
- H01G5/18—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes due to change in inclination, e.g. by flexing, by spiral wrapping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/38—Multiple capacitors, e.g. ganged
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/02—Sensors
- B81B2201/0228—Inertial sensors
- B81B2201/025—Inertial sensors not provided for in B81B2201/0235 - B81B2201/0242
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0174—Manufacture or treatment of microstructural devices or systems in or on a substrate for making multi-layered devices, film deposition or growing
- B81C2201/019—Bonding or gluing multiple substrate layers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
- G01P2015/0828—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
- G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
- G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
- G01P2015/0837—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being suspended so as to only allow movement perpendicular to the plane of the substrate, i.e. z-axis sensor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0862—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system
- G01P2015/0877—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system using integrated interconnect structures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P2015/0862—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system
- G01P2015/088—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with particular means being integrated into a MEMS accelerometer structure for providing particular additional functionalities to those of a spring mass system for providing wafer-level encapsulation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Computer Hardware Design (AREA)
- Pressure Sensors (AREA)
- Gyroscopes (AREA)
- Micromachines (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010121727A JP5527017B2 (ja) | 2010-05-27 | 2010-05-27 | 素子構造体、慣性センサーおよび電子機器 |
| JP2010-121727 | 2010-05-27 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102331514A true CN102331514A (zh) | 2012-01-25 |
Family
ID=45021384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011101390881A Pending CN102331514A (zh) | 2010-05-27 | 2011-05-26 | 元件结构体、惯性传感器以及电子设备 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US20110291208A1 (https=) |
| JP (1) | JP5527017B2 (https=) |
| CN (1) | CN102331514A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103449352A (zh) * | 2012-05-31 | 2013-12-18 | 精工爱普生株式会社 | 电子装置及其制造方法、以及电子设备 |
| CN108663540A (zh) * | 2017-03-27 | 2018-10-16 | 精工爱普生株式会社 | 物理量传感器及其制造方法、电子设备、移动体 |
| CN109946482A (zh) * | 2019-04-02 | 2019-06-28 | 四川知微传感技术有限公司 | 一种高信噪比的三明治式微加速度计 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9505607B2 (en) | 2015-03-27 | 2016-11-29 | Intel Corporation | Methods of forming sensor integrated packages and structures formed thereby |
| WO2017061635A1 (ko) * | 2015-10-06 | 2017-04-13 | 주식회사 스탠딩에그 | Mems 장치 및 그 제조 방법 |
| TWI599764B (zh) * | 2015-10-19 | 2017-09-21 | 國立清華大學 | 多階感測元件 |
| JP6594527B2 (ja) * | 2016-04-21 | 2019-10-23 | 富士フイルム株式会社 | 複合センサ |
| US10643006B2 (en) * | 2017-06-14 | 2020-05-05 | International Business Machines Corporation | Semiconductor chip including integrated security circuit |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5092174A (en) * | 1989-10-19 | 1992-03-03 | Texas Instruments Incorporated | Capacitance accelerometer |
| US5095752A (en) * | 1988-11-15 | 1992-03-17 | Hitachi, Ltd. | Capacitance type accelerometer |
| US5905203A (en) * | 1995-11-07 | 1999-05-18 | Temic Telefunken Microelectronic Gmbh | Micromechanical acceleration sensor |
| CN1749759A (zh) * | 2004-09-13 | 2006-03-22 | 星电株式会社 | 加速度传感器 |
| US20070240509A1 (en) * | 2006-02-14 | 2007-10-18 | Takeshi Uchiyama | Dynamic amount sensor |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4439238A1 (de) * | 1994-11-03 | 1996-05-09 | Telefunken Microelectron | Kapazitiver Beschleunigungssensor |
| US6105427A (en) * | 1998-07-31 | 2000-08-22 | Litton Systems, Inc. | Micro-mechanical semiconductor accelerometer |
-
2010
- 2010-05-27 JP JP2010121727A patent/JP5527017B2/ja not_active Expired - Fee Related
-
2011
- 2011-05-25 US US13/115,632 patent/US20110291208A1/en not_active Abandoned
- 2011-05-26 CN CN2011101390881A patent/CN102331514A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5095752A (en) * | 1988-11-15 | 1992-03-17 | Hitachi, Ltd. | Capacitance type accelerometer |
| US5092174A (en) * | 1989-10-19 | 1992-03-03 | Texas Instruments Incorporated | Capacitance accelerometer |
| US5905203A (en) * | 1995-11-07 | 1999-05-18 | Temic Telefunken Microelectronic Gmbh | Micromechanical acceleration sensor |
| CN1749759A (zh) * | 2004-09-13 | 2006-03-22 | 星电株式会社 | 加速度传感器 |
| US20070240509A1 (en) * | 2006-02-14 | 2007-10-18 | Takeshi Uchiyama | Dynamic amount sensor |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103449352A (zh) * | 2012-05-31 | 2013-12-18 | 精工爱普生株式会社 | 电子装置及其制造方法、以及电子设备 |
| CN108663540A (zh) * | 2017-03-27 | 2018-10-16 | 精工爱普生株式会社 | 物理量传感器及其制造方法、电子设备、移动体 |
| CN108663540B (zh) * | 2017-03-27 | 2021-07-30 | 精工爱普生株式会社 | 物理量传感器及其制造方法、电子设备、移动体 |
| CN109946482A (zh) * | 2019-04-02 | 2019-06-28 | 四川知微传感技术有限公司 | 一种高信噪比的三明治式微加速度计 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110291208A1 (en) | 2011-12-01 |
| JP2011247768A (ja) | 2011-12-08 |
| JP5527017B2 (ja) | 2014-06-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8950259B2 (en) | Element structure, inertia sensor, and electronic device | |
| CN102331514A (zh) | 元件结构体、惯性传感器以及电子设备 | |
| JP6580804B2 (ja) | Mems圧力センサとmems慣性センサの集積構造 | |
| US7258011B2 (en) | Multiple axis accelerometer | |
| CN105372451B (zh) | 物理量传感器、物理量传感器装置、电子设备以及移动体 | |
| US7238999B2 (en) | High performance MEMS packaging architecture | |
| CN1954188B (zh) | 陀螺仪传感器和使用该陀螺仪传感器的传感器装置 | |
| KR101300576B1 (ko) | 물리량 센서 및 전자 기기 | |
| JP2012225920A (ja) | マイクロ−電子機械システム(mems)デバイス | |
| US7178398B2 (en) | Coplanar proofmasses employable to sense acceleration along three axes | |
| CN107010588A (zh) | 物理量传感器以及物理量传感器的制造方法 | |
| JP5427199B2 (ja) | 半導体物理量検出センサ | |
| JP6285541B2 (ja) | 加速度検出装置 | |
| JP6343102B2 (ja) | 慣性力センサ | |
| CN114518471A (zh) | 物理量传感器、物理量传感器器件以及惯性测量装置 | |
| JP5598515B2 (ja) | 物理量センサ及びその製造方法 | |
| JP2012237664A (ja) | 物理量センサー、電子機器 | |
| WO2015008422A1 (ja) | センサ | |
| JPH11248733A (ja) | 角速度センサ及びその製造方法 | |
| US20250178885A1 (en) | Microelectromechanical motion sensor device having a single proof mass | |
| TWI681192B (zh) | 三軸加速度計 | |
| JPH0419568A (ja) | 加速度センサ | |
| JP2002048553A (ja) | 振動型ジャイロセンサ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20120125 |