CN102325422A - 平板型全密封低温等离子体激发源 - Google Patents
平板型全密封低温等离子体激发源 Download PDFInfo
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- CN102325422A CN102325422A CN 201110268578 CN201110268578A CN102325422A CN 102325422 A CN102325422 A CN 102325422A CN 201110268578 CN201110268578 CN 201110268578 CN 201110268578 A CN201110268578 A CN 201110268578A CN 102325422 A CN102325422 A CN 102325422A
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CN 201110268578 CN102325422A (zh) | 2011-09-13 | 2011-09-13 | 平板型全密封低温等离子体激发源 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102946685A (zh) * | 2012-10-15 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | 大气压诱导空气介质阻挡放电低温等离子体发生装置 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1763520A (zh) * | 2005-09-27 | 2006-04-26 | 清华大学 | 介质阻挡放电原子化/离子化方法及其装置 |
CN201004732Y (zh) * | 2007-02-02 | 2008-01-09 | 西安交通大学 | 一种大气压介质阻挡辉光放电等离子体发生装置 |
JP2008034184A (ja) * | 2006-07-27 | 2008-02-14 | National Univ Corp Shizuoka Univ | 細線状大気圧放電プラズマの生成方法および生成装置 |
US20080067283A1 (en) * | 2006-03-14 | 2008-03-20 | University Of Notre Dame Du Lac | Methods and apparatus for reducing noise via a plasma fairing |
JP2009544854A (ja) * | 2006-07-31 | 2009-12-17 | テクナ・プラズマ・システムズ・インコーポレーテッド | 誘電体バリア放電を利用したプラズマ表面処理 |
WO2010007135A1 (en) * | 2008-07-16 | 2010-01-21 | Agc Flat Glass Europe S.A. | Process and installation for surface preparation by dielectric barrier discharge |
CN101945527A (zh) * | 2010-08-13 | 2011-01-12 | 武中臣 | 基于介质阻挡放电技术的平板全密封低温等离子体激发源 |
CN201732063U (zh) * | 2010-08-13 | 2011-02-02 | 北京吉天仪器有限公司 | 基于介质阻挡放电的原子光谱分析用原子化器 |
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Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1763520A (zh) * | 2005-09-27 | 2006-04-26 | 清华大学 | 介质阻挡放电原子化/离子化方法及其装置 |
US20080067283A1 (en) * | 2006-03-14 | 2008-03-20 | University Of Notre Dame Du Lac | Methods and apparatus for reducing noise via a plasma fairing |
JP2008034184A (ja) * | 2006-07-27 | 2008-02-14 | National Univ Corp Shizuoka Univ | 細線状大気圧放電プラズマの生成方法および生成装置 |
JP2009544854A (ja) * | 2006-07-31 | 2009-12-17 | テクナ・プラズマ・システムズ・インコーポレーテッド | 誘電体バリア放電を利用したプラズマ表面処理 |
CN201004732Y (zh) * | 2007-02-02 | 2008-01-09 | 西安交通大学 | 一种大气压介质阻挡辉光放电等离子体发生装置 |
WO2010007135A1 (en) * | 2008-07-16 | 2010-01-21 | Agc Flat Glass Europe S.A. | Process and installation for surface preparation by dielectric barrier discharge |
CN101945527A (zh) * | 2010-08-13 | 2011-01-12 | 武中臣 | 基于介质阻挡放电技术的平板全密封低温等离子体激发源 |
CN201732063U (zh) * | 2010-08-13 | 2011-02-02 | 北京吉天仪器有限公司 | 基于介质阻挡放电的原子光谱分析用原子化器 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102946685A (zh) * | 2012-10-15 | 2013-02-27 | 中国科学院西安光学精密机械研究所 | 大气压诱导空气介质阻挡放电低温等离子体发生装置 |
CN102946685B (zh) * | 2012-10-15 | 2016-01-20 | 中国科学院西安光学精密机械研究所 | 大气压诱导空气介质阻挡放电低温等离子体发生装置 |
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Address after: 266000 Shandong city of Qingdao province Fuzhou Northroad 169-919 Applicant after: QINGDAO JIAMING MEASUREMENT AND CONTROL TECHNOLOGY CO., LTD. Address before: 266000 Shandong city of Qingdao province Fuzhou Northroad 169-919 Applicant before: Qingdao Jiaming Measurement and Control Instrument Co., Ltd. |
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Application publication date: 20120118 |