CN102319688A - Silicon material cleaning device - Google Patents
Silicon material cleaning device Download PDFInfo
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- CN102319688A CN102319688A CN201110192710A CN201110192710A CN102319688A CN 102319688 A CN102319688 A CN 102319688A CN 201110192710 A CN201110192710 A CN 201110192710A CN 201110192710 A CN201110192710 A CN 201110192710A CN 102319688 A CN102319688 A CN 102319688A
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- frame
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- silicon material
- acid
- rinse bath
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Abstract
The invention discloses a silicon material cleaning device, which comprises a frame, wherein the frame is provided with a cleaning groove; the frame above the cleaning groove is provided with an acid storage groove and a water storage groove; the frame below the cleaning groove is provided with an acid liquid recovering groove; drainage pipes are arranged between the acid storage groove and the cleaning groove, between the water storage groove and the cleaning groove as well as between the acid liquid recovering groove and the cleaning groove respectively; the drainage pipes are provided with valves; a connecting pipeline and a liquid flow pump are arranged between the acid liquid recovering groove and the acid storage groove; the top of the frame is provided with a suction opening; and the frame below the suction opening is provided with a draught fan. The invention has the beneficial effects that: the silicon material cleaning device has a simple structure, contact of acid liquid with a human body is reduced effectively, irritating gas produced by acid washing is exhausted in time, harm to the human body is reduced, and the operating safety is enhanced greatly. The silicon material cleaning device can be widely applied to silicon material cleaning equipment.
Description
Technical field
The present invention relates to the cleaning device of silicon material.
Background technology
The silicon material is a kind of very important semi-conducting material; Can be used for making multiple components and parts such as diode, triode, luminescent device, pressure cell, solar battery sheet, be widely used in fields such as radio engineering, automatic field, signalling arrangement, power engineering.
Usually there are oxide layer and metal ion in silicon material surface, need to remove its surperficial oxide layer and metal ion with the acid cleaning, and the cleaning device of present silicon material, its structure mainly comprises: frame has been arranged side by side descaling bath and rinsing bowl on the frame.The workman puts into descaling bath with silicon chip before standing in operating desk during cleaning, treats that pickling finishes, and the workman takes out the silicon material in the descaling bath and put into rinsing bowl and clean again.Human body directly contacts with acid solution in this process; Acid solution has corrosivity, spills acid solution injury human body in the descaling bath easily, and can produce a large amount of irritating dense smoke in the acid solution when cleaning; Directly jeopardize the healthy of the preceding workman of operating desk, operational danger is higher.
Summary of the invention
The technical problem of solution required for the present invention is: will provide a kind of and effectively avoid the workman directly to contact with acid solution, and effectively improve the silicon material cleaning device of processing safety.
For addressing the above problem; The technical scheme that the present invention adopts is: silicon material cleaning device, comprise frame, and frame is provided with rinse bath; Frame above the rinse bath is provided with storage acid tank and aqua storage tank; Also be provided with the acid solution accumulator tank on the frame of rinse bath below, between described storage acid tank and the rinse bath, between aqua storage tank and the rinse bath and be respectively arranged with discharging tube between acid solution accumulator tank and the rinse bath, be provided with valve on the above-mentioned discharging tube; Described acid solution accumulator tank is provided with between the acid tank with storage and is connected pipeline and fluid-flow pump; Described frame top is provided with suction opeing, and the frame of suction opeing below is provided with air-introduced machine.
Aforesaid silicon material cleaning device wherein, also is provided with water inlet pipe on the described aqua storage tank.
Aforesaid silicon material cleaning device wherein, also is provided with drainpipe on the described rinse bath, described drainpipe is provided with valve.
Beneficial effect of the present invention: simple in structure, effectively reduce contacting of acid solution and human body, and the irritative gas that brings during in time with pickling discharges, reduced harm to human body, improved the security of operation greatly.The present invention can be widely used in the cleaning equipment of silicon material.
Description of drawings
Fig. 1 is the sketch map of silicon material cleaning device of the present invention.
Fig. 2 is the operation principle sketch map of silicon material cleaning device of the present invention.
Among Fig. 1~Fig. 2: 1, frame, 2, rinse bath, 3, the storage acid tank, 4, aqua storage tank, 41, water inlet pipe; 5, acid solution accumulator tank, 6, first discharging tube, 61, first valve, 7, second discharging tube; 71, second valve, the 8, the 3rd discharging tube, the 81, the 3rd valve, 9, fluid-flow pump; 10, air-introduced machine, 11, drainpipe, the 111, the 4th valve, 12, suction opeing.
The specific embodiment
Below in conjunction with accompanying drawing and specific embodiment the present invention is done further detailed description.
As shown in Figure 1; Silicon material cleaning device comprises frame 1, and frame 1 is provided with rinse bath 2; Frame 1 above the rinse bath 2 is provided with storage acid tank 3 and aqua storage tank 4; Also be provided with acid solution accumulator tank 5 on the frame 1 of rinse bath 2 belows, be provided with first discharging tube, 6, the first discharging tubes between described storage acid tank 3 and the rinse bath 2 and be provided with first valve 61; Be provided with second discharging tube, 7, the second discharging tubes 7 between aqua storage tank 4 and the rinse bath 2 and be provided with second valve 71; Be provided with the 3rd discharging tube 8, the three discharging tubes 8 between acid solution accumulator tank 5 and the rinse bath 2 and be provided with the 3rd valve 81; Described acid solution accumulator tank 5 is provided with between the acid tank 3 with storage and is connected pipeline fluid-flow pump 9; The top of described frame 1 is provided with suction opeing 12, and the frame 1 of suction opeing 12 belows is provided with air-introduced machine 10.Also be provided with water inlet pipe 41 on the described aqua storage tank 4, also be provided with drainpipe 11 on the described rinse bath 2, described drainpipe 11 is provided with the 4th valve 111.
When cleaning the silicon material, the workman puts into the silicon material earlier in the rinse bath 2 of sky, then first valve 61 is opened; Acid solution slowly enters into rinse bath 2 along first discharging tube 6 from storage acid tank 3, close first valve 61 behind the cleaning liquid level position in acid solution to the rinse bath 2 in the groove 2 to be cleaned, and the silicon material promptly cleans in acid solution; The irritative gas that produce this moment can be discharged from the suction opeing 12 at frame 1 top by air-introduced machine 10, and to be cleaned finishing opened the 3rd valve 81; Acid solution in the rinse bath 2 enters into acid solution accumulator tank 5 along the 3rd discharging tube 8, and fluid-flow pump 9 is constantly pumped back the acid solution in the acid solution accumulator tank 5 in the storage acid tank 4, after the acid solution in the groove 2 to be cleaned all drains in the acid solution accumulator tank 5; Close the 3rd valve 81, open second valve 71 simultaneously, the water in the aqua storage tank 4 enters into rinse bath 2 along second discharging tube 7; Treat that water closes second valve 71 after cleaning liquid level position, because aqua storage tank 4 is provided with water inlet pipe 41, so can carry out moisturizing through 41 pairs of aqua storage tanks of water inlet pipe; After treating that washing finishes; Open the 4th valve 111, water is discharged along drainpipe 11, then accomplishes a silicon material and cleans.Can the gauge tap of above-mentioned each valve be concentrated to be contained on the frame, operating personnel can leave rinse bath one segment distance after in rinse bath, adding the silicon material like this, are convenient to the injury that operating personnel operate and avoid causing human body.
Beneficial effect of the present invention: simple in structure, effectively reduce contacting of acid solution and human body, and the irritative gas that brings during in time with pickling discharges, reduced harm to human body, improved the security of operation greatly.The present invention can be widely used in the cleaning equipment of silicon material.
Claims (3)
1. silicon material cleaning device; Comprise frame; Frame is provided with rinse bath, it is characterized in that: the frame above the rinse bath is provided with storage acid tank and aqua storage tank, also is provided with the acid solution accumulator tank on the frame of rinse bath below; Between described storage acid tank and the rinse bath, between aqua storage tank and the rinse bath and be respectively arranged with discharging tube between acid solution accumulator tank and the rinse bath, be provided with valve on the above-mentioned discharging tube; Described acid solution accumulator tank is provided with between the acid tank with storage and is connected pipeline and fluid-flow pump; The top of described frame is provided with suction opeing, and the frame of suction opeing below is provided with air-introduced machine.
2. silicon material cleaning device according to claim 1 is characterized in that: also be provided with water inlet pipe on the described aqua storage tank.
3. silicon material cleaning device according to claim 1 and 2 is characterized in that: also be provided with drainpipe on the described rinse bath, described drainpipe is provided with valve.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110192710A CN102319688A (en) | 2011-07-11 | 2011-07-11 | Silicon material cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201110192710A CN102319688A (en) | 2011-07-11 | 2011-07-11 | Silicon material cleaning device |
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CN102319688A true CN102319688A (en) | 2012-01-18 |
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Family Applications (1)
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CN201110192710A Pending CN102319688A (en) | 2011-07-11 | 2011-07-11 | Silicon material cleaning device |
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Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102794288A (en) * | 2012-08-30 | 2012-11-28 | 常州捷佳创精密机械有限公司 | Air draft structure of rinse tank |
CN103245549A (en) * | 2013-05-10 | 2013-08-14 | 西安航空动力股份有限公司 | Grain size corrosion device of single crystal blade |
CN103435042A (en) * | 2013-08-24 | 2013-12-11 | 内蒙古盾安光伏科技有限公司 | Polycrystalline silicon reduction pickling system |
CN103866397A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Surface pretreatment device for polycrystalline silicon ingot and treatment method thereof |
CN103866396A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Polycrystalline silicon ingot scrap surface pretreatment device and pretreatment method thereof |
CN106128981A (en) * | 2016-08-29 | 2016-11-16 | 天津汉德威药业有限公司 | A kind of axial diode acid dip pickle |
CN108722977A (en) * | 2017-04-20 | 2018-11-02 | 隆基绿能科技股份有限公司 | Raw material cleaning device and material cleaning apparatus |
CN111701937A (en) * | 2020-07-10 | 2020-09-25 | 付立瑞 | Continuous processing device for surface treatment and cutting forming of refined monocrystalline silicon |
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CN201253615Y (en) * | 2008-09-04 | 2009-06-10 | 常熟市胜诺环保设备有限公司 | Silicon material cleaning device |
CN201632469U (en) * | 2010-01-15 | 2010-11-17 | 常州捷佳创精密机械有限公司 | Air exhaust channel of silicon wafer cleaning equipment |
CN201676839U (en) * | 2010-04-11 | 2010-12-22 | 锦州阳光能源有限公司 | Silicon wafer flusher |
CN202155331U (en) * | 2011-07-11 | 2012-03-07 | 苏州赤诚洗净科技有限公司 | Silicon material rinser |
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CN101061261A (en) * | 2004-09-17 | 2007-10-24 | 栗田工业株式会社 | Cleaning system of sulfuric acid recycling type and persulfuric acid feeder of sulfuric acid recycling type |
JP2006278687A (en) * | 2005-03-29 | 2006-10-12 | Kurita Water Ind Ltd | Sulfuric-acid recycling single-wafer cleaning system |
CN201253615Y (en) * | 2008-09-04 | 2009-06-10 | 常熟市胜诺环保设备有限公司 | Silicon material cleaning device |
CN201632469U (en) * | 2010-01-15 | 2010-11-17 | 常州捷佳创精密机械有限公司 | Air exhaust channel of silicon wafer cleaning equipment |
CN201676839U (en) * | 2010-04-11 | 2010-12-22 | 锦州阳光能源有限公司 | Silicon wafer flusher |
CN202155331U (en) * | 2011-07-11 | 2012-03-07 | 苏州赤诚洗净科技有限公司 | Silicon material rinser |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102794288A (en) * | 2012-08-30 | 2012-11-28 | 常州捷佳创精密机械有限公司 | Air draft structure of rinse tank |
CN103245549A (en) * | 2013-05-10 | 2013-08-14 | 西安航空动力股份有限公司 | Grain size corrosion device of single crystal blade |
CN103245549B (en) * | 2013-05-10 | 2014-12-24 | 西安航空动力股份有限公司 | Grain size corrosion device of single crystal blade |
CN103435042A (en) * | 2013-08-24 | 2013-12-11 | 内蒙古盾安光伏科技有限公司 | Polycrystalline silicon reduction pickling system |
CN103866397A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Surface pretreatment device for polycrystalline silicon ingot and treatment method thereof |
CN103866396A (en) * | 2014-03-23 | 2014-06-18 | 山西中电科新能源技术有限公司 | Polycrystalline silicon ingot scrap surface pretreatment device and pretreatment method thereof |
CN103866397B (en) * | 2014-03-23 | 2016-03-30 | 山西中电科新能源技术有限公司 | Polycrystal silicon ingot surface pretreatment device and treatment process thereof |
CN106128981A (en) * | 2016-08-29 | 2016-11-16 | 天津汉德威药业有限公司 | A kind of axial diode acid dip pickle |
CN106128981B (en) * | 2016-08-29 | 2019-01-29 | 天津汉德威药业有限公司 | A kind of axial diode acid dip pickle |
CN108722977A (en) * | 2017-04-20 | 2018-11-02 | 隆基绿能科技股份有限公司 | Raw material cleaning device and material cleaning apparatus |
CN111701937A (en) * | 2020-07-10 | 2020-09-25 | 付立瑞 | Continuous processing device for surface treatment and cutting forming of refined monocrystalline silicon |
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Application publication date: 20120118 |