CN102305256A - Metal micrometer/nanometer spring as well as preparation method and application thereof - Google Patents
Metal micrometer/nanometer spring as well as preparation method and application thereof Download PDFInfo
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- CN102305256A CN102305256A CN201110262186A CN201110262186A CN102305256A CN 102305256 A CN102305256 A CN 102305256A CN 201110262186 A CN201110262186 A CN 201110262186A CN 201110262186 A CN201110262186 A CN 201110262186A CN 102305256 A CN102305256 A CN 102305256A
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Abstract
The invention belongs to the technical field of micro-nano devices, and in particular relates to a metal micrometer/nanometer spring as well as a preparation method and an application thereof. The preparation method comprises the following steps: preparing a substrate provided with a sacrificial layer; depositing a metal strip with internal stress and anisotropic Young's modulus on the sacrificial layer; and selectively removing parts of the sacrificial layer between a metal strip and the substrate, and releasing the metal strip, thereby curling the metal strip into the metal nanometer/micrometer spring. The metal nanometer/micrometer spring can be used for measuring a flow sensor, specifically the substrate with the metal micrometer/nanometer spring is fixed in a fluid channel; and when the fluid passes through the channel, the spring achieves the balance state, and the rate of flow of fluid is measured by measuring the spring elongation.
Description
Technical field
The invention belongs to the micro-nano device technical field, be specifically related to a kind of metal micrometer/nanometer spring and its production and application.
Background technique
In recent years, micro-nano device, is paid close attention to thereby receive widely owing to have potential application foreground in fields such as drug delivery, sensor, optics and Chu Qing such as pipe, line and the spring etc. of micro/nano-scale.In all three-D micro-nano devices, spring is owing to its special pattern receives more extensive studies.Because the helical type structure of the uniqueness that the micrometer/nanometer spring possesses and piezoelectric property, mechanical property and the electric property that material itself possesses, there is potential using value in this micrometer/nanometer spring in fields such as micro-nano Mechatronic Systems (N/MEMS), drug delivery and cell operations.Because nano thin-film has the high specific surface area and the surface of modification easily, utilize the curling micrometer/nanometer spring that obtains of nano thin-film also having certain application prospect aspect biology and the chemical sensor.
People such as Pu XianGao utilized the solids-gases process successfully to prepare in 2006 to have hyperelastic ZnO nanometer spring, people such as Cao Chuanbao to utilize the chemical vapor deposition method to prepare in 2007 years to have hyperelastic Si
3N
4The micron spring, people such as Li Zhang utilize curling method with semiconductor duplicature of internal stress successfully to prepare a micron spring.In the methods that the people adopted such as Li Zhang, the internal stress of duplicature is to be caused by the lattice mismatch between the different layers, and the direction of curling is then by the Young's modulus decision, and the Young's modulus in semiconductive thin film has significant anisotropism.Their result shows thickness and the lattice mismatch degree decision of the diameter of spring by film, and curl direction is along the minimum direction of Young's modulus.
At present; Utilizing the micrometer/nanometer spring of the nano thin-film preparation of curling generally all is the semiconductor epitaxial material; Such as InGaAs/GaAs duplicature and SiGe/Si duplicature, because limited and epitaxy technology does not also have the research report about the micrometer/nanometer spring preparation of pure metal so far.And compare with semi-conducting material, metallic material has better mechanics and electric property, so metal micrometer/nanometer spring is more suitable for the application in micro-nano device.
Summary of the invention
The object of the present invention is to provide good metal micrometer/nanometer spring of a kind of mechanics and electric property and its production and application.
The preparation method of metal micrometer/nanometer spring provided by the invention comprises following step:
(1) prepares a substrate, on substrate, have sacrifice layer;
(2) metal bar that deposition has internal stress and anisotropic Young's modulus on sacrifice layer;
(3) optionally remove partial sacrifice layer between metal bar and substrate, discharge metal bar, thereby metal bar curls and becomes metal nano/micron spring.
Among the present invention; Step (2) deposits the metal bar with internal stress and anisotropic Young's modulus on sacrifice layer; Comprise following two steps; At first utilize physics or Low Pressure Chemical Vapor Deposition on sacrifice layer, to deposit the layer of metal film; The method of utilizing photoetching then is called metal bar with film patternization.Wherein, the method for physical vapor deposition comprises sputter, thermal evaporation and electron beam evaporation etc.
Among the present invention; The said physical vaporous deposition that utilizes deposits the layer of metal film on sacrifice layer; Can be through the control deposition parameter; Such as deposition rate, underlayer temperature, substrate tilting angle and deposition pressure etc., obtain having metallic thin film in direction of growth internal stress gradient difference and anisotropy Young's modulus.
Among the present invention, the geometric parameter of said metal micrometer/nanometer spring, like diameter, helix angle and spiral shell spacing etc. are confirmed according to designing requirement.
Among the present invention; One-component metals (metal book film) such as the material of metal micrometer/nanometer spring (the metal book film of deposition) can gold, titanium, chromium or aluminium; Also can be the alloy (alloy book film) of these metals, also can be the multiple layer metal (multiple layer metal book film) of these metals.
Among the present invention, described sacrifice layer can be the SiO2 layer.
Metal micrometer/nanometer spring provided by the invention can be used for carrying out in the flow transducer flow rate to be measured, specific as follows:
Flow transducer comprises a fluid passage, and the substrate that will have metal micrometer/nanometer spring is fixed on inside, fluid passage.When fluid when this passage, spring receives viscous force and the substrate of flow of fluid to the pulling force of spring, is in state of equilibrium.At this moment, equate on viscous force and the pulling force numerical value of substrate spring.The viscosity factor and the flow velocity of viscous force and fluid self are relevant, and substrate can be represented through the spring elongation the pulling force of spring.In general, for a kind of fluid, its viscosity factor immobilizes, and the elongation of spring increases along with the rising of flow rate of fluid, and therefore, we can measure flow rate of fluid through the elongation of measuring spring.And the elongation of spring obtains through optical microscope measuring.
Description of drawings
The flow chart of Fig. 1 golden micrometer/nanometer spring for the present invention prepares.Wherein, (a) one deck SiO is arranged on the Si substrate
2As sacrifice layer; (b) method of expression employing electron beam evaporation is at SiO
2Deposition one layer thickness is the Au film of 40 nm on the sacrifice layer; (c) expression utilizes hydrofluoric acid with SiO
2Sacrifice layer is removed; (d) form Au micrometer/nanometer spring at last.
Fig. 2 is the inclination substrate angle deposit film of uniting, and obtains the Au film and has anisotropic Young's modulus diagram.
Fig. 3 is for adopting the schematic representation of metal micrometer/nanometer spring test fluid flow flow velocity.Wherein, (a) be fluid when static, spring is in original state, and when (b) flowing through from left to right with certain speed for fluid, spring receives the viscous force effect and the state that extends.
Label among the figure: 1. substrate; 2. sacrifice layer; 3. metal layer; 4. metal micrometer/nanometer spring; 5. the angle that becomes with the incident direction of evaporation atom gas of the Normal direction of substrate; 6. evaporation source; 7. substrate; 8. fluid passage.
Embodiment
Below further present invention is described through instance.
Below in conjunction with accompanying drawing and instantiation, invention preparation metal micrometer/nanometer spring is described further.
Fig. 1 utilizes method among the present invention to prepare the schematic representation of golden micrometer/nanometer spring.Wherein, (a) one deck SiO is arranged on the Si substrate 1
2As sacrifice layer 2.(b) expression, the method that adopts electron beam evaporation is at SiO
2Deposition one layer thickness is the Au metal layer 3 of 40 nm on the sacrifice layer.Wherein in deposition process,,, can prepare Au film with internal stress like deposition rate, underlayer temperature and deposition pressure etc. through changing deposition parameter; The incident direction of the Normal direction of substrate and evaporation source 6 evaporation atom gas is angled
5, as shown in Figure 2,, deposit the Au film that obtains by this method and have anisotropic Young's modulus because there is shadoweffect in inclination substrate angle deposit film.Utilize the method for photoetching then, the Au film is carried out graphically obtaining metal bar, shown in (c).At last, utilize hydrofluoric acid with SiO
2Sacrifice layer is removed, thereby the Au metal bar is come from the substrate disengaging, forms Au metal micrometer/nanometer spring 4, shown in (d).
Fig. 3 is the schematic representation based on metal micrometer/nanometer spring test fluid flow flow velocity, and the substrate 7 with metal micrometer/nanometer spring is fixed on 8 inside, fluid passage, and wherein an end of metal micrometer/nanometer spring 4 is fixed on the substrate 7.Wherein, (a) expression, when fluid was static, spring was in original state, was not stretched, and this moment, length did
l 0(b) expression, when fluid flow through with certain speed, spring was received the viscous force effect and extends that the length of this moment does
lThe elongation of spring
xEqual
l-
l 0, this numerical value is by the viscosity factor and the flow velocity decision of fluid.And when adopting with a kind of fluid, viscosity factor remains unchanged, therefore
xValue only is directly proportional with flow velocity.Thereby, promptly can measure flow rate of fluid through the elongation of measuring spring according to above analysis.
Claims (6)
1. the preparation method of a metal micrometer/nanometer spring is characterized in that concrete steps are:
(1) prepares a substrate, on substrate, have sacrifice layer;
(2) metal bar that deposition has internal stress and anisotropic Young's modulus on sacrifice layer;
(3) optionally remove partial sacrifice layer between metal bar and substrate, discharge metal bar, thereby metal bar curls and becomes metal nano/micron spring;
Step (2) deposits the metal bar with internal stress and anisotropic Young's modulus on sacrifice layer; Comprise following two steps; At first utilize physics or Low Pressure Chemical Vapor Deposition on sacrifice layer, to deposit the layer of metal film; The method of utilizing photoetching then is called metal bar with metal thin-film patternization.
2. preparation method according to claim 1; It is characterized in that the said physical vaporous deposition that utilizes deposits the layer of metal film on sacrifice layer; Through the control deposition parameter; Comprise deposition rate, underlayer temperature, substrate tilting angle or deposit pressure, obtain having metallic thin film in direction of growth internal stress gradient difference and anisotropy Young's modulus.
3. preparation method according to claim 1 and 2, the material that it is characterized in that said metal is gold, titanium, chromium or aluminium one-component metal, or several alloy in these metals, or several multiple layer metal in these metals.
4. preparation method according to claim 1 and 2 is characterized in that described sacrifice layer is the SiO2 layer.
5. the metal micrometer/nanometer spring for preparing like the described preparation method of one of claim 1-4.
6. metal micrometer/nanometer spring as claimed in claim 5 is measured the application of rate of flow of fluid and flow in flow transducer.
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| CN 201110262186 CN102305256B (en) | 2011-09-06 | 2011-09-06 | Metal micrometer/nanometer spring as well as preparation method and application thereof |
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| CN 201110262186 CN102305256B (en) | 2011-09-06 | 2011-09-06 | Metal micrometer/nanometer spring as well as preparation method and application thereof |
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| CN102305256B CN102305256B (en) | 2013-06-12 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102539379A (en) * | 2011-12-22 | 2012-07-04 | 复旦大学 | Optical fluid detection device based on inorganic oxide thin film and preparation method thereof |
| CN103193196A (en) * | 2013-03-20 | 2013-07-10 | 北京大学 | Assembling method of three-dimensional micro-nano structure |
| CN103663363A (en) * | 2013-12-05 | 2014-03-26 | 浙江大学 | Disordered alloy micro-spring, and preparation method and lighthouse thereof |
| CN104020152A (en) * | 2014-06-02 | 2014-09-03 | 复旦大学 | Sandwich-structural micron tube and preparation method and application thereof |
| CN104555908A (en) * | 2014-12-04 | 2015-04-29 | 复旦大学 | Machining method of micro-spring |
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| CN101343033A (en) * | 2008-08-28 | 2009-01-14 | 上海交通大学 | Method for manufacturing miniature spring mechanical sensor for film performance test |
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| US6534413B1 (en) * | 2000-10-27 | 2003-03-18 | Air Products And Chemicals, Inc. | Method to remove metal and silicon oxide during gas-phase sacrificial oxide etch |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102539379A (en) * | 2011-12-22 | 2012-07-04 | 复旦大学 | Optical fluid detection device based on inorganic oxide thin film and preparation method thereof |
| CN102539379B (en) * | 2011-12-22 | 2014-01-08 | 复旦大学 | Optical fluid detection device based on inorganic oxide thin film and preparation method thereof |
| CN103193196A (en) * | 2013-03-20 | 2013-07-10 | 北京大学 | Assembling method of three-dimensional micro-nano structure |
| CN103193196B (en) * | 2013-03-20 | 2015-09-30 | 北京大学 | A kind of assemble method of three-dimensional micro-nano structure |
| CN103663363A (en) * | 2013-12-05 | 2014-03-26 | 浙江大学 | Disordered alloy micro-spring, and preparation method and lighthouse thereof |
| CN104020152A (en) * | 2014-06-02 | 2014-09-03 | 复旦大学 | Sandwich-structural micron tube and preparation method and application thereof |
| CN104020152B (en) * | 2014-06-02 | 2017-04-05 | 复旦大学 | A kind of sandwich structure micron tube and its preparation method and application |
| CN104555908A (en) * | 2014-12-04 | 2015-04-29 | 复旦大学 | Machining method of micro-spring |
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| CN102305256B (en) | 2013-06-12 |
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