CN102296367A - Continuous diffusion processor - Google Patents
Continuous diffusion processor Download PDFInfo
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- CN102296367A CN102296367A CN2011100291361A CN201110029136A CN102296367A CN 102296367 A CN102296367 A CN 102296367A CN 2011100291361 A CN2011100291361 A CN 2011100291361A CN 201110029136 A CN201110029136 A CN 201110029136A CN 102296367 A CN102296367 A CN 102296367A
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Abstract
The invention provides a continuous diffusion processor, which is capable of enhancing the production efficiency and the processing quality as well. The continuous diffusion processor comprises conveying tables (50) for loading multiple plate-shaped processed parts; a cylindrical heating furnace (1) which is extended in a linear manner; a conveying apparatus (2) for successively sending the conveying tables (50) into the heating furnace (1) and successively sending out the conveying tables (50) in the heating furnace (1); a heating apparatus (3) for heating the processed parts loaded on the conveying tables (50) in the heating furnace (1); a plurality of separating members (7) for dividing the part from a send-in portion (11) to a send-out portion (12) in the heating furnace (1) into multiple processing regions in the conveying direction; and an exhaust apparatus (4) for supplying gas to every processing region and discharging gas at every processing region.
Description
Technical field
The present invention relates to a kind of continuous diffusion treatment unit.
Background technology
For example, in utilizing the solar battery cell manufacturing processed of silicon metal, need carry out DIFFUSION TREATMENT, that is, make the impurity that constitutes by the regulation element surface, and make this diffusion of contaminants to processed inside attached to processed (wafer) of silicon system.As the diffusion processing apparatus that carries out described DIFFUSION TREATMENT, the batch processing formula is for example arranged.This batch processing formula device possesses the process furnace of processed of heating, and the size of this process furnace just can be held a plurality of processed the pallet of loading.
After sending in this process furnace with processed, the gas that contains impurity is provided in this process furnace, and improves temperature in the process furnace, make diffusion of contaminants arrive processed inside.Afterwards, behind the heating descent of temperature, processed is taken out from process furnace.
Under the situation of using described batch processing formula process furnace, though wish to improve the processing quality, but in fact in process furnace, carry out before and after the time of DIFFUSION TREATMENT, must have temperature in the stove is brought up to the time of specified temperature and the time that temperature in the stove is reduced, therefore can not handle processed continuously, thereby be difficult to enhance productivity.
So, comprise as patent documentation 1 disclosed continuous diffusion treatment unit: the process furnace of tubular; Handling machinery is arranged processed and carry processed in process furnace; Heating unit is to heating by processed in the process furnace; And feedway, the gas that contains impurity is provided in process furnace.
In addition, in described device,, can blow out nitrogen from top to bottom, form air curtain at the both ends of process furnace for atmosphere in the process furnace and ambient atmos are cut off.
Patent documentation 1: Japanese Patent open communique spy open flat 9-298163 number.
The device of being put down in writing according to patent documentation 1 can be handled continuously to processed, compares more and can enhance productivity with the batch processing formula.
Yet, as indicated above, though cut off, clearly do not divide the actual treatment zone of DIFFUSION TREATMENT and other the treatment zone of carrying out in inside heating furnace because of air curtain makes the atmosphere of inside heating furnace and ambient atmos.So be difficult to the atmosphere of each treatment zone of control, the processing quality of comparing processed with the batch processing formula might step-down.
Summary of the invention
In view of the above problems, the object of the present invention is to provide a kind of continuous diffusion treatment unit that can enhance productivity and can improve the processing quality.
Continuous diffusion treatment unit of the present invention comprises: transport platform, load many tabular processed; The process furnace of tubular extends with linearity to the unloading part of sending described transport platform from the loading part of sending into described transport platform; E Foerderanlage is sent into described transport platform in described process furnace successively from described loading part, and the described transport platform that will carry in described process furnace is sent successively from described unloading part; Heating unit heats described processed by loading on the described transport platform in the described process furnace; A plurality of next doors member is arranged in the described process furnace, and will be divided into a plurality of treatment zones to the described unloading part at throughput direction from the described loading part in the described process furnace; And air-feeding-exhausting apparatus, provide gas respectively to each described treatment zone, and discharge gas respectively at each described treatment zone.
According to the present invention, can will be loaded in processed limit on the transport platform be transported to the process furnace inner edge and carry out DIFFUSION TREATMENT, compare more and can boost productivity with batch processing formula in the past.And, be divided into a plurality of treatment zones by the next door member in the process furnace, provide gas respectively to each treatment zone, and the gas in each treatment zone is discharged, thereby can control the atmosphere of each treatment zone in the process furnace, obtain high-quality processed.
In addition preferably, described heating unit comprises the well heater that is arranged on described process furnace exterior circumferential, covers the lagging material of the tubular of described process furnace with described well heater, described continuous diffusion treatment unit also comprises control device, described control device carries out temperature adjustment in the stove by the described well heater of control respectively to each described treatment zone.
At this moment, can control, obtain high-quality processed the temperature of each treatment zone in the process furnace.
In addition, preferably, described next door member is arranged in the described process furnace movably along described throughput direction, in this case, can change the length of treatment zone.
In addition, preferably, described transport platform at the length dimension on the throughput direction less than the length dimension of each treatment zone on throughput direction of being divided by described next door member.
In this case, can allow at least one transport platform integral body be positioned at each treatment zone.Thus, can at each treatment zone under the condition of same atmosphere, carry out DIFFUSION TREATMENT, can make described many processed quality homogeneous a plurality of processed of on same transport platform, loading.
In addition preferably, described heating unit comprises the well heater that is arranged on described process furnace exterior circumferential, covers the lagging material of the tubular of described process furnace with described well heater, and described lagging material is along the cut segmenting structure of described throughput direction.
In this case, be set to segmenting structure, the process furnace that is positioned at the inboard can be loaded and unloaded by lagging material.
In addition preferably, described air-feeding-exhausting apparatus comprises: air feeder is provided for the gas of DIFFUSION TREATMENT to the treatment zone that is used to carry out DIFFUSION TREATMENT; Gas barrier, the gas of this treatment zone is discharged, described air feeder is configured in the top of described process furnace, described process furnace has coverture, described coverture covers the transfer passage that the described transport platform of the treatment zone that is used for carrying out described DIFFUSION TREATMENT is passed through from the top and left and right sides, and is provided with a plurality of communicating poress.
At the treatment zone that is used to carry out DIFFUSION TREATMENT, the gas that provides from process furnace top flows to the bottom while spreading, in air-flow, can produce turbulent flow once in a while, and utilize described coverture can make gas by communicating pores by rectification, prevent that air-flow from producing turbulent flow, and can be with processed gas concentration (atmosphere) homogenizing on every side of loading on the transport platform.
In addition preferably, from the described loading part in the described process furnace to the described unloading part, be divided into hyperthermic treatment district, equal heat-treatment zone and cooling treatment zone by described next door member from described loading part one side, described continuous diffusion treatment unit also comprises the bypass flow path that the gas of described cooling treatment zone is offered described hyperthermic treatment district.
In this case, can offer the hyperthermic treatment district, and can reduce and be used to make the required consumes power of intensification in the process furnace in the hyperthermic treatment district by the gas that processed waste heat that sends will become pyritous cooling treatment zone.
According to the present invention, can in process furnace, carry the limit to carry out DIFFUSION TREATMENT on processed limit, thereby can boost productivity, and the atmosphere by each treatment zone in the control process furnace obtains high-quality processed.That is, can not only enhance productivity but also improve and handle quality.
Description of drawings
Fig. 1 is the stereographic map of continuous diffusion treatment unit.
Fig. 2 is the stereographic map of transport platform.
Fig. 3 is the longitudinal sectional view of explanation process furnace, e Foerderanlage and heating unit.
Fig. 4 is the explanatory view of e Foerderanlage.
Fig. 5 is the explanatory view of e Foerderanlage.
Fig. 6 is the transverse sectional view of continuous diffusion treatment unit.
Fig. 7 is the transverse sectional view that is used to illustrate the process furnace of process furnace inner structure.
Fig. 8 is the stereographic map of next door member.
Fig. 9 is the explanatory view of gas barrier.
Figure 10 is the explanatory view of the bottom of expression process furnace.
Figure 11 is the explanatory view of the wheel portion of transport platform.
Figure 12 is the explanatory view that is loaded in the distance piece on the transport platform.
Description of reference numerals
1: process furnace; 2: e Foerderanlage; 3: heating unit; 4: air-feeding-exhausting apparatus; 5: control device; 7: the next door member; 11: loading part; 12: unloading part; 13: coverture; 14: transfer passage; 15: communicating pores; 17: bypass flow path; 21: pressure-driven portion; 30: well heater; 31: lagging material; 32: divisional plane; 41: air feeder; 42: gas barrier; 45: exhaust structure portion; 46: exhaust flow path; 50: transport platform; A1: hyperthermic treatment district; A2: equal heat-treatment zone; A3: cooling treatment zone; S: stroke; L: the length of transport platform; W: processed.
Embodiment
Below with reference to the accompanying drawings embodiments of the present invention are described.
[1. about one-piece construction]
Fig. 1 is the stereographic map of continuous diffusion treatment unit of the present invention.Described continuous diffusion treatment unit is used for carrying out DIFFUSION TREATMENT to processed.For example, described continuous diffusion treatment unit is used for utilizing the solar battery cell manufacturing processed of silicon metal, makes the impurity that is made of regulation element wafer (processed) surface attached to silicon system, and makes the inside of described diffusion of contaminants to described wafer.In Fig. 1, omitted record to processed.
The continuous diffusion treatment unit comprises: transport platform 50, place many tabular processed; The process furnace 1 of tubular; E Foerderanlage 2 is carried a plurality of transport platform 50; Heating unit 3 has the well heater 30 with process furnace 1 internal heating; Air-feeding-exhausting apparatus 4 provides gas and discharges gas in the described process furnace 1 in process furnace 1.In addition, the continuous diffusion treatment unit possesses the control device 5 of each device such as control e Foerderanlage 2 grades.The long side direction of process furnace 1 (being left and right directions in Fig. 1) is consistent with the direction that transport platform 50 is transferred, and this direction is called fore-and-aft direction.In addition, also will be called left and right directions sometimes with the vertical horizontal direction of the direction that transport platform 50 is transferred.
The brief configuration of transport platform 50 [2. about]
Fig. 2 is the stereographic map of transport platform 50.Transport platform 50 possesses: main part 51, load many processed tabular W with the state that uniformly-spaced vertically erects; Wheel portion 52 is installed on the main part 51, and rolls on the bottom surface of process furnace 1.
Processed W is to be loaded in the main part 51 with the vertical state of fore-and-aft direction.The rectangular-shaped framework that main part 51 is made up of many columned rod member 51a.In addition, be described further below the detailed structure of transport platform 50.
The structure of process furnace 1, e Foerderanlage 2 and heating unit 3 [3. about]
Fig. 3 is the longitudinal sectional view of explanation process furnace 1, e Foerderanlage 2 and heating unit 3.In Fig. 3, omitted record to processed.
Process furnace 1 (being commonly referred to as furnace core tube) is long at fore-and-aft direction, from the loading part 11 of sending into transport platform 50 to the unloading part 12 linearly extensions of sending transport platform 50.Process furnace 1 is made by silica glass or pottery, is to be that circular tube constitutes by the cross section.Process furnace 1 is arranged on the platform 6 (with reference to Fig. 1) that the continuous diffusion treatment unit has.
Described process furnace 1 is a unremitting integral body 12 from loading part 11 to unloading part, to prevent the leakage of internal gas.Open wide as the loading part 11 of 1 one ends of process furnace and unloading part 12 as another end.But utilize the purge gas (purgegas) of explanation later, the both ends process furnace 1 in form air curtain, make the atmosphere partition outside atmosphere and the process furnace 1 in the process furnace 1.
E Foerderanlage 2 has following function: when transport platform 50 is sent in process furnace 1 successively from loading part 11, the transport platform 50 that is admitted to is carried in process furnace 1, and transport platform 50 is sent successively from unloading part 12.Fig. 4 and Fig. 5 are the explanatory views of e Foerderanlage 2.
E Foerderanlage 2 has pressure-driven portion 21, is used for becoming in process furnace 1 row to carry a plurality of transport platform 50.Pressure-driven portion 21 has: thruster 22 contacts with transport platform 50; Moving sheet 23, described thruster 22 is installed on the described moving sheet; Drive unit 24 moves back and forth this moving sheet 23 on fore-and-aft direction.Thruster 22, moving sheet 23 and drive unit 24 are configured on described 6 (with reference to Fig. 1), and they all are arranged on outside the process furnace 1.
Adopt described e Foerderanlage 2, the transport platform 50 (is 50-1 at Fig. 4 and Fig. 5) of treatment zone A0 by will being arranged in loading part 11 upstreams (the last side of body) is moving to loading part 11 1 thrusters, described transport platform 50-1 is sent in the process furnace 1, simultaneously, moving by the transport platform 50 (50-2,50-3) that this transport platform 50-1 that sends into will be admitted to before to unloading part 12 1 thrusters, can simultaneously a plurality of transport platform 50 (50-2,50-3) arow be carried in process furnace 1.And, can transport platform 50 be passed out to the treatment zone A4 that is positioned at process furnace 1 outside from unloading part 12.
The stroke S of thruster 22, that is, the pressure stroke S of the transport platform 50 that is promoted by pressure-driven portion 21 equates substantially with the length L of transport platform 50.In addition, the so-called situation that equates substantially to be meant that the total length of length L after having comprised surplus K that comprise transport platform 50 equates with described stroke S, described surplus K is when carrying out transport platform 50 to preparation work that process furnace 1 is sent into, for transport platform 50 being placed the necessary surplus K of treatment zone A0 (space) of loading part 11 upstreams.
In addition, in Fig. 5, it is unanimous on the whole in the position of fore-and-aft direction to utilize a pressure stroke S to be admitted to the left end of the left end of transport platform 50-1 of process furnace 1 and process furnace 1.Like this, just 50 1 of transport platform can be connect a tableland by a pressure stroke S and be fed through in the process furnace 1, and 50 1 of transport platform can be connect a tableland and send from process furnace 1 from loading part 11.
In Fig. 3, heating unit 3 possesses: a plurality of well heaters 30 are arranged on the exterior circumferential of process furnace 1 and are arranged on the fore-and-aft direction; The lagging material 31 of tubular covers process furnace 1 with each well heater 30 from exterior circumferential.Heat 3 pairs of process furnace 1 inside of heating unit, and heating is by processed of placement on the transport platform 50 in the process furnace 1.
To describe later, and be divided into a plurality of treatment zones in the process furnace 1, treatment zone A1-2, the A2-1 among a plurality of treatment zones, the exterior circumferential of A2-2, A3-1 are respectively arranged with well heater 30.Well heater 30 for example is the cartridge type well heater.
Lagging material 31 is set at the exterior circumferential of treatment zone A1-2, A2-1, A2-2, A3-1 at least.Fig. 6 is the transverse sectional view of diffusion processing apparatus.Lagging material 31 integral body are tubular, but are segmenting structure, are cut off along fore-and-aft direction (being the paper direction in Fig. 6), have long divisional plane 32 on fore-and-aft direction.
Identical with lagging material 31, ring-like described well heater 30 also is along the cut segmenting structure of fore-and-aft direction, is cut apart in identical position with divisional plane 32.
In the exterior circumferential of lagging material 31,, be provided with articulated section 33 and sticking department 34 across the diametric(al) both sides of divisional plane 32.By sticking department 34 is adjusted into fixedly disarm state by stationary state (state of Fig. 6), be the center with articulated section 33, the lagging material 31 of segmenting structure can be launched.By lagging material 31 and well heater 30 are set to segmenting structure, the process furnace 1 in the inboard of lagging material 31 can be loaded and unloaded, make the maintenance of device become easy.
In Fig. 3, in process furnace 1, be provided with a plurality of next doors member 7.Next door member 7 is being divided into a plurality of treatment zones at fore-and-aft direction from loading part 11 to unloading part 12 in the process furnace 1.In the present embodiment, by five next door members 7, be divided into six treatment zone A1-1, A1-2, A2-1, A2-2, A3-1, A3-2.
First and second treatment zone A1-1, A1-2 are hyperthermic treatment district A1, and the first treatment zone A1-1 therein forms described air curtain.In the second treatment zone A1-2,, make temperature rising by processed the W of the second treatment zone A1-2 by coming in the process furnace by the well heater 30 that is arranged on its exterior circumferential.
The the 3rd and the 4th treatment zone A2-1, A2-2 make the certain equal heat-treatment zone A2 of temperature maintenance in the stove, by being arranged on the well heater 30 of equal heat-treatment zone exterior circumferential, make the interior temperature of stove remain on for example 850～900 ℃, thereby make processed temperature keep certain by equal heat-treatment zone A2.At the 3rd treatment zone A2-1, in stove, be provided for carrying out the gas of DIFFUSION TREATMENT, at the 4th treatment zone A2-2, the surface is attached with processed DIFFUSION TREATMENT of carrying out reality of the impurity that is contained in the described gas.
The the 5th and the 6th treatment zone A3-1, A3-2 are cooling treatment zone A3, and the 5th treatment zone A3-1 therein utilizes the well heater 30 that is arranged on its exterior circumferential, and the interior temperature of stove is reduced gradually from the temperature of regulation, form described air curtain at the 6th treatment zone A3-2.
Fig. 7 is the transverse sectional view that is used to illustrate the process furnace 1 of process furnace 1 internal structure.Fig. 8 is the stereographic map of next door member 7.Be described further below the coverture of representing among Fig. 8 13.Next door member 7 has: the tabular 7a of wall portion; About the 7b of foot, be fixed on the bottom of the 7a of this wall portion, make the described wall 7a of portion keep the state that erects.Allow the opening 7c that the transport platform 50 of processed W of loading is passed through in the 7a of wall portion formation.In addition, form a plurality of communicating pores 7d, insert pipe that the cable (depositing pipe) and being used for of cable (depositing pipe), the pressure transmitter of the supply-pipe 44 of logical hereinafter explanation and temperature sensor takes a sample to the gas of each treatment zone etc. at the 7a of wall portion.
Each next door member 7 is arranged in the process furnace 1 movably along fore-and-aft direction, can change the length of the fore-and-aft direction of each treatment zone.That is, the 7b of foot is installed in the bottom of process furnace 1, and next door member 7 is not the interior perimeter surface that is permanently affixed at process furnace 1.
[4. about air-feeding-exhausting apparatus 4]
In Fig. 1, air-feeding-exhausting apparatus 4 has: the air feeder 41 that gas is provided in process furnace 1; With the gas barrier 42 of the gas in the process furnace 1 to described process furnace 1 outside discharge.
In Fig. 3, the supply-pipe 44 that air feeder 41 possesses gas source 43, links to each other with this gas source 43 and extend in process furnace 1.Be provided with in the present embodiment from gas source 43 by the many supply-pipes 44 of loading part 11 1 sides, from the many piece supply-pipes 44 of gas source 43 by unloading part 12 1 sides.
Each supply-pipe 44 is provided with a plurality of ejiction openings (hole) that can spray gas, and the ejiction opening of each supply-pipe 44 is the position difference on fore-and-aft direction.In addition, gas source 43 is sent different types of gas to each supply-pipe 44, and by the different types of gas of each supply-pipe 44 ejection.Therefore, can provide different gas to each treatment zone in a plurality of treatment zones on fore-and-aft direction.In addition, air feeder 41 has valve 49a, and described valve 49a adjusts the flow of the gas that offers each treatment zone at each treatment zone.
In present embodiment (with reference to Fig. 3), provide nitrogen (purge gas) to form air curtain to the first treatment zone A1-1.The second treatment zone A1-2 that heats up in making stove provides the gas that contains nitrogen and oxygen.Provide the gas that contains Phosphorus Oxychloride and oxygen to the 3rd treatment zone A2-1, with as the gas that can carry out DIFFUSION TREATMENT.Provide the gas that contains nitrogen and oxygen to actual the 4th treatment zone A2-2 that carries out DIFFUSION TREATMENT.Provide nitrogen to the 5th treatment zone A3-1 that makes descent of temperature.And, provide nitrogen (purge gas) to form air curtain to the 6th treatment zone A3-2.In addition, can manage the kind of the gas of district's ejection throughout according to changes such as contents processings.
By described air feeder 41, can be to the gas that is used for processed equal heat-treatment zone A2 that carries out DIFFUSION TREATMENT is provided for DIFFUSION TREATMENT, and the gas of regulation can be provided to hyperthermic treatment district A1 and cooling treatment zone A3.
And the 3rd treatment zone A2-1 in equal heat-treatment zone A2 by making in processed the gas that rests on the impurity (Phosphorus Oxychloride) that contains normality, makes described impurity attached to processed surface.And,,, make distribution (diffusion depth of the regulation) diffusion of impurity with regulation for processed at the 4th treatment zone A2-2.
Fig. 9 is the explanatory view of gas barrier 42.Gas barrier 42 possesses: displacer (pump) 47 is used to discharge gas; Vent pipe 48 links to each other with this displacer 47, and extends in process furnace 1.The part of vent pipe 48 is arranged on the bottom of process furnace 1.And be provided with, and by the many vent pipes 48 of displacer 47 by unloading part 12 1 sides by the many vent pipes 48 of displacer 47 by loading part 11 1 sides.In addition, gas barrier 42 has valve 49b, and described valve 49b adjusts the flow of expellant gas in process furnace 1 at each treatment zone.
Figure 10 is the explanatory view of the bottom of process furnace 1.In process furnace 1, each described vent pipe 48 is provided with attraction mouth (hole) 48a of a plurality of attraction gases, and the position of attraction mouth 48a on fore-and-aft direction on each vent pipe 48 has nothing in common with each other.In addition, each vent pipe 48 attracts different types of gas, and different types of gas is flowing in each vent pipe 48.Therefore, can different gas be discharged to outside the stove at each treatment zone.
Be provided with exhaust structure portion 45 in the bottom of process furnace 1, have the exhaust flow path 46 that the gas in the process furnace 1 is derived in the inside of this exhaust structure portion 45 outside process furnace 1.In the present embodiment, exhaust flow path 46 is made of described vent pipe 48.That is, vent pipe 48 is contained in the exhaust structure portion 45.
The gas barrier 42 (with reference to Fig. 9) of present embodiment attracts to form the nitrogen of air curtain at the first treatment zone A1-1.Attract to be provided to the gas that contains nitrogen and oxygen in the stove at the second treatment zone A1-2.Attract to be used to carry out the gas (gas that contains Phosphorus Oxychloride and oxygen) of DIFFUSION TREATMENT at the 3rd treatment zone A2-1.Attract to be provided to the gas that contains nitrogen and oxygen in the stove at the 4th treatment zone A2-2 that carries out DIFFUSION TREATMENT.Attract to be provided to nitrogen in the stove at the 5th treatment zone A3-1.In addition, attract to form the nitrogen of air curtain at the 6th treatment zone A3-2.
Described gas barrier 42 can be discharged the residual gas of the equal heat-treatment zone A2 that is used to carry out DIFFUSION TREATMENT, can discharge the gas of hyperthermic treatment district A1 and cooling treatment zone A3 again.
As indicated above, possess the air-feeding-exhausting apparatus 4 of described gas barrier 42 and described air feeder 41, can provide gas respectively to each treatment zone, can discharge gas respectively at each treatment zone again.
In addition, the supply-pipe 44 of air feeder 41 is dismountable, and supply-pipe 44 that can be different with the configuration mode of ejiction opening is replaced.In addition, the upper wall 45a and the vent pipe 48 of exhaust structure portion 45 are dismountable, can upper wall 45a and the vent pipe 48 different with the configuration mode of communicating pores 45c and attraction mouthful 48a replace.
In addition, exhaust structure portion 45 also has the function of guiding transport platform 50 except that having the function that the gas in the process furnace 1 is discharged.
As shown in Figure 9, exhaust structure portion 45 is configured in the process furnace 1 continuously, and is a straight line along fore-and-aft direction.In addition, this exhaust structure portion 45 extends to treatment zone A0 and the treatment zone A4 of process furnace 1 outer (with reference to Fig. 3) always.Like this, exhaust structure portion 45 is configured in along on the throughput direction of transport platform 50, and is a straight line, and a plurality of transport platform 50 that e Foerderanlage 2 can be carried 11 guide to unloading part 12 along fore-and-aft direction from loading part.
Below described guiding function is elaborated.As shown in figure 10, the sidewall 45b and upper wall 45a of exhaust structure portion 45 about having, also have at the long base plate 45d of fore-and-aft direction.The left and right sides at base plate 45d forms walking surface 45e, and described walking surface 45e is extended by sidewall 45b two side directions to the left and right, and continuous at fore-and-aft direction.Wheel portion 52 about transport platform 50 rolls on described walking surface 45e, on the sidewall 45b and upper wall 45a about transport platform 50 is striden and stood in.
In addition, also will describe hereinafter, transport platform 50 has the slide block 53 with sidewall 45b sliding contact, by this slide block 53, linearly guides transport platform 50 along exhaust structure portion 45.
As mentioned above, the exhaust structure portion 45 with the function of discharging gas can also double as guides the guide arrangement of transport platform 50 on fore-and-aft direction.
[5. about control device 5]
Control device 5 is made of the computer with treatment unit (CPU) and storing device, carry out the computer program that is stored in the storing device by described treatment unit, control each device such as e Foerderanlage 2 (drive unit 24), heating unit 3 (well heater 30).
For example, heating unit 3 has the temperature sensor that detects each treatment zone A1-2, A2-1, A2-2, A3-1 temperature, and according to the detected result of this temperature sensor, control device 5 is adjusted the interior temperature of stove of each treatment zone respectively by each well heater 30 of control.Can be by this control device 5 in the atmosphere temperature in each treatment zone is accurately controlled process furnace 1.
In addition, air-feeding-exhausting apparatus 4 has the pressure transmitter that detects each treatment zone A1-2, A2-1, A2-2, A3-1 pressure, detected result according to this pressure transmitter, control device 5 (is adjusted the described valve 49a of supply flow by the flow of the gas that control provides in stove, as Fig. 3) and/or in the stove expellant gas flow (adjust delivery flow as described in valve 49b, as Fig. 9), adjust the pressure in the stove of each treatment zone respectively.Can be by this control device 5 at the pressure in each treatment zone is accurately controlled process furnace 1.
[6. other structures that possess about diffusion processing apparatus]
In Fig. 3, because the supply-pipe 44 of air feeder 41 is configured in the top of process furnace 1, the vent pipe 48 of gas barrier 42 is configured in the bottom of process furnace 1, and therefore, gas is managed district's diffusional flow throughout from top to the bottom in process furnace 1.
So, at the treatment zone that is used to carry out DIFFUSION TREATMENT that is the 3rd treatment zone A2-1 and the 4th treatment zone A2-2 coverture 13 is set, described coverture 13 covers the transfer passage 14 (with reference to Fig. 8) that transport platform is passed through described treatment zone A2-1, the A2-2 from top and the left and right sides.This coverture 13 is arranged between the adjacent next door member 7 of fore-and-aft direction.The top of coverture 13 with about both sides have a plurality of communicating poress 15,, and discharge by this communicating pores 15 by the gas of supply-pipe 44 ejections from vent pipe 48.
At described treatment zone A2-1, A2-2, as indicated above, the gas that provides from the top of process furnace 1 is (transport platform 50) side flow downwards while spreading, in air-flow, can produce turbulent flow once in a while, utilize described coverture 13, make gas by communicating pores 15 by rectification, can prevent that air-flow from producing turbulent flow, thus can be with gas concentration (atmosphere) homogenizing around processed the W that is loaded on the transport platform 50.Thus, can make the further homogenizing of quality of a plurality of processed W after the DIFFUSION TREATMENT.
In addition, as indicated above in Fig. 3, be divided into hyperthermic treatment district A1, equal heat-treatment zone A2 and cooling treatment zone A3 by next door member 7 from loading part 11 1 sides in the process furnace 1.
Therefore, bypass flow path 17 is set, is used for the nitrogen of the 6th treatment zone A3-2 of cooling treatment zone A3 is offered the first treatment zone A1-1 of hyperthermic treatment district A1.Bypass flow path 17 is made of pipe.In addition, be provided with in the exterior circumferential of the 6th treatment zone A3-2 and be used for nitrogen is forced the fan 18 of discharging, the nitrogen of being discharged by this fan 18 offers the first treatment zone A1-1 by described bypass flow path 17.In addition, bypass flow path 17 has the supply-pipe 44 of nitrogen to link to each other with mobile in order to form air curtain, and the nitrogen of bypass flow path 17 inside also may be combined in the nitrogen that offers the first treatment zone A1-1.In addition, the 6th treatment zone A3-2 is contained among the cooling treatment zone A3, because processed W after being heated passes through, makes the nitrogen temperature height of the nitrogen of described the 6th treatment zone A3-2 than the first treatment zone A1-1.
By described bypass flow path 17, can send the waste heat of the 6th treatment zone A3-2 (becoming processed W of pyritous) to first treatment zone A1-1, and processed preheating can will in the second treatment zone A1-2, heating by this waste heat, can reduce and be used to heat processed required consumes power.
In addition, in order to utilize waste heat, among the vent pipe 48 of gas barrier 42, the vent pipe 48 that setting becomes the pyritous gas flow (for example, the vent pipe 48 of the gas flow of equal heat-treatment zone A2), and among the supply-pipe 44 of air feeder 41, the supply-pipe 44 of the gas flow of oxygenated chlorinated phosphorus is set, also described pipe 48,44 can be used the common insulation encloses.In this case, the heat transferred of vent pipe 48 can be contained the gas of Phosphorus Oxychloride, can reduce consumes power for the required well heater of the condensation that prevents Phosphorus Oxychloride.In addition, and the pipe of establishing 48,44 be set at outside the process furnace 1.
The structure of transport platform 50 [7. about]
Below transport platform 50 is elaborated.In Fig. 2 and Figure 10, transport platform 50 comprises: the main part 51 that loads processed W; The wheel portion 52 of rolling in the bottom surface of process furnace 1 (base plate 45d).Transport platform 50 is by in the pyritous process furnace 1, so must have thermotolerance.Therefore, main part 51 and wheel portion 52 are all made by glass or pottery, for example, are made by silica glass or silicon nitride.
In the present embodiment, possess in the rolling bearing 60 of wheel 57, foreign steamer 58 and ball 59 are angular contact ball bearings.In addition, foreign steamer 58 is as go up the member that rolls in the bottom surface of process furnace 1 (base plate 45d).In addition, rolling bearing 60 does not comprise the retainer that keeps ball 59, but ball bearing constitutes by completely adorning.
Leading section at axletree 56 is formed on the hole 56a that above-below direction connects, and pin 65 is inserted among the 56a of this hole.The head 65a of pin 65 is in from the outstanding state of the periphery of axletree 56, and interior wheel 57 is arranged between this head 65a and the slide block 53, and interior wheel 57 is installed on the axletree 56 with the anticreep state in the left and right directions both sides.Can prevent that by this pin 65 interior wheel 57 from coming off, and rolling bearing 60 can be installed.In addition, maintenance is arranged to it dismountable for convenience.
Be arranged between ball 59 and bottom 62 (slide block 53) by shoulder 58b, prevent that foreign steamer 58 from coming off the direction both sides to the left and right left and right directions inboard (in Figure 11, being the left side).
The inside diameter D 1 of the shoulder 58c in the left and right directions outside (being the right side in Figure 11) of foreign steamer 58 is identical substantially with the internal diameter of outside rolling surface 58a, or bigger than the internal diameter of outside rolling surface 58a.This be because, as indicated above, rolling bearing 60 is the high materials of thermotolerance, described material is less at the generalized case linear expansivity.That is, use steel in the general deep trouth rolling bearing that for example under normal temperature environment, uses, utilize thermal expansion can assemble rolling bearing, but the rolling bearing of making by the little material of linear expansivity difficulty comparatively in assembling.But adopt the rolling bearing 60 of present embodiment, the operation in ball 59 is packed between wheel 57 and the foreign steamer 58 then becomes simple.
In Figure 10, as mentioned above, be provided with exhaust structure portion 45 in the bottom of process furnace 1, this exhaust structure portion 45 is configured in along on the throughput direction of transport platform 50, and is a straight line.
The main part 51 of transport platform 50 is positioned at the top of described exhaust structure portion 45, is provided with the gap between the left and right sides of slide block 53 and exhaust structure portion 45 (sidewall 45b).About slide block 53,53 between be formed with spatial portion, about each slide block 53 on be provided with can independent rotation wheel portion 52.That is the axletree that, between left and right wheels portion 52,52, does not have shared length.
Therefore, the described spatial portion that exhaust structure portion 45 can be between slide block 53 and 53.In addition, the space beyond the diffusion processing apparatus, the arm that can be used in the transfer robot that processed W taken out from transport platform 50 is positioned at described spatial portion, thereby helps the automatization of transfer robot operation.
By slide block 53 and exhaust structure portion 45, transport platform 50 is striden stand in exhaust structure portion 45 about, the transport platform of being carried by e Foerderanlage 2 50 is directed at fore-and-aft direction.Contact with sidewall 45b about exhaust structure portion 45 by slide block 53, make transport platform 50 be directed and can not come off at left and right directions.In addition, as shown in Figure 2, the contact part with sidewall 45b of slide block 53 is made from the scarp 53b of fore-and-aft direction two side direction central part 53a protuberance.Reducing the contact area with sidewall 45b, thereby reduce contact resistance.
In addition, as shown in Figure 7, wheel portion 52 is positioned at the below of processed W, is arranged on than in the narrow scope of the width of described processed W.To prevent that transport platform 50 from becoming big at left and right directions.
In Fig. 3, the length dimension of the fore-and-aft direction of transport platform 50 is less than the length dimension of the fore-and-aft direction of each treatment zone of being divided by next door member 7.In the present embodiment,, make each treatment zone be configured to equal length, and the length of each treatment zone equate with the total length of two transport platform 50 by next door member 7 uniformly-spaced is provided with.
According to described formation, each transport platform 50 can not be across continuous three treatment zones.For example, a transport platform 50 can not be across the 3rd treatment zone A2-1 that is provided the gas that contains Phosphorus Oxychloride, actual the 4th treatment zone A2-2 of DIFFUSION TREATMENT and the 5th treatment zone A3-1 that lowers the temperature of carrying out.
In addition, to be made as substantially with the length dimension of transport platform 50 by the pressure stroke S (with reference to Fig. 4, Fig. 5) that pressure-driven portion 21 promotes the transport platform 50 that forms and equate, in each stroke, transport platform 50 is in end of fore-and-aft direction (side of a side) and boundary portion consistent (state of Fig. 3) between each treatment zone.
Thus, 50 1 of transport platform can be connect a tableland by a pressure stroke S and send into each treatment zone, and 50 1 of transport platform can be connect a tableland and send from each treatment zone.
And,, processed the W that is loaded on same the transport platform 50 all can be configured in for example the 4th treatment zone A2-2 by each stroke.Therefore, at the 4th treatment zone A2-2, processed all W for being loaded in same transport platform 50 carries out DIFFUSION TREATMENT under same atmosphere condition, can make the quality homogenizing of described many processed W.In addition, in the present embodiment, each stroke all has two transport platform 50 to be positioned at each treatment zone.
Figure 12 is the side-view of two transport platform 50,50 of a row conveying.The transport platform 50 on right side contacts with the leading section of the adjacent transport platform 50 that is positioned at described thruster 22 1 sides (left side), and is promoted by described leading section, advances to unloading part 12 1 sides (right side).In addition, though not expression among the figure, the transport platform 50 on described right side contacts with the rearward end of the adjacent transport platform 50 that is positioned at unloading part 12 1 sides, and promotes described rearward end, and adjacent transport platform 50 is advanced.
Like this, a plurality of transport platform 50 are transported in the process furnace 1 at fore-and-aft direction with being row, yet between processed W, W loading respectively on the adjacent transport platform 50,50,, produce bigger gap at fore-and-aft direction owing to constitute rod member 51a, the 51a of transport platform 50.This gap is bigger than the spacing between processed W, W loading on same the transport platform 50.
If there is described gap, then described gap can cause the air-flow in the process furnace 1 to produce turbulent flow, be loaded in transport platform 50 the end processed W be loaded between processed the W of central part, may produce the qualitative deviation of processing.
Therefore, the both ends of the fore-and-aft direction of each transport platform 50 are provided with distance piece 54.Distance piece 54 is installed on the main part 51 by one.Distance piece 54 has: first 54a that is installed in the perpendicular length on the main part 51; Second 54b that extends to horizontal direction by the upper end of the 54a of this first part.The upper surface of this second 54b is positioned at equal height with the upper surface of processed the W that is supported by main part 51, and in addition, the width of the left and right directions of second 54b is identical with the width of the left and right directions of described processed W.
By this distance piece 54,54, in process furnace 1, the bigger gap that is produced between processed the W that loads on processed W of loading on the transport platform 50 of a side (being the left side in Figure 12) and the opposing party's who is adjacent (being the right side in Figure 12) the transport platform 50 can be filled up.Therefore, the turbulent flow of air-flow in the process furnace 1 can be prevented, in DIFFUSION TREATMENT, the homogenization of the processing quality of processed W can be realized by distance piece 54.In addition, also can catch the handle of usefulness to use as the operating personnel second 54b of the distance piece 54 of each transport platform 50.
In addition, in Figure 10, transport platform 50 has the brush 55 that contacts with the bottom surface (upper surface of base plate 45d) of process furnace 1.In addition, in the present embodiment, also has the brush 55 that contacts with exhaust structure portion 45 (upper surface of upper wall 45a).These brushes 55 are installed in the bottom of transport platform 50, and when e Foerderanlage 2 was carried transport platform 50, brush 55 can will be swept into outside the process furnace 1 in the bottom surface of process furnace 1 and the foreign matter of piling up above the exhaust structure portion 45.The fibrous bundle that brush 55 is made up of quartz constitutes.
The continuous diffusion treatment unit of present embodiment [8. about]
Continuous diffusion treatment unit according to said structure, can the limit will be loaded in processed W on the transport platform 50 is transported to process furnace 1 inner edge and carries out DIFFUSION TREATMENT, carry out the DIFFUSION TREATMENT of processed W continuously, compare more and can boost productivity with batch processing formula device in the past.For example, the processing power that has 4 times in batch processing formula device.
And, the pressure-driven portion 21 of e Foerderanlage 2 is positioned at the transport platform 50 of the upstream of loading part 11 by promotion, when sending into this transport platform 50 in the process furnace 1 successively, utilize the described transport platform of sending into 50 transport platform of formerly sending into 50 can be moved to unloading part 12 1 thrusters, in process furnace 1, be a row ground and carry.Therefore, need not e Foerderanlage 2 is arranged in the process furnace 1, and can be arranged on outside the process furnace 1.Consequently, can prevent process furnace 1 because become big, and can prevent the maximization of locking apparatus integral body with the irrelevant factor of the size of processed W.
In addition, because in the process furnace 1 is the condition of high temperature, so, the part that in the past was arranged in the e Foerderanlage in the process furnace must be resistant to elevated temperatures structure of energy or material, and in the present embodiment, owing to need not e Foerderanlage 2 is arranged in the process furnace 1, therefore do not need resistant to elevated temperatures structure of described energy or material.
In addition, be divided into a plurality of treatment zones by next door member 7 in the process furnace 1, when providing gas respectively, discharge gas respectively at each treatment zone to each treatment zone.Therefore, the contents processing and the treatment condition that can make each treatment zone that processed W taked to have nothing in common with each other.
In more detail, be provided for the gas of DIFFUSION TREATMENT to the 3rd treatment zone A2-1, and the 4th treatment zone A2-2 is closed almost in the zone that is divided.Therefore, can accurately be controlled at the atmosphere such as gas concentration of the 3rd treatment zone A2-1, in addition, can accurately control the atmosphere of the 4th treatment zone A2-2, obtain high-quality processed W.In addition, can make processed all W have identical hot resume and gas resume, make quality keep certain.
In addition, in batch processing formula diffusion processing apparatus in the past, need to heat up and cooling in the front and back of DIFFUSION TREATMENT, power loss is bigger, and the diffusion processing apparatus of present embodiment can be in each treatment zone keeps certain stove temperature, can help to save the energy.
In addition, owing to need not cooling at hyperthermic treatment district A1 and equal heat-treatment zone A2, thus can use the high lagging material of heat-proof quality, can reduce the current consumption of heating unit 3.
In addition,, and compare, can suppress to produce dust because of the wearing and tearing in process furnace 1 with the device in the past that slides because transport platform 50 possesses the wheel portion 52 of rolling in the bottom surface of process furnace 1.That is, during processed W on carrying transport platform 50, can suppress the processing quality of described processed W is caused the generation of the dust of bad influence.
Diffusion processing apparatus of the present invention is not limited to illustrated mode, also can adopt other modes within the scope of the present invention.Cross section to process furnace 1 is that example is illustrated with the circle in the present invention, but also can be rectangle beyond circular.In addition, under the situation of circle, as shown in Figure 7, the dead band between the inner peripheral surface of processed W of orthogonal and process furnace 1 can dispose the exhaust structure portion 45 of guiding wheel portion 52 or transport platform 50, thereby effectively utilizes the space in the process furnace 1.
In addition, to the length dimension of each treatment zone (promptly, distance between the adjacent next door member 7,7) situation about equating with the total length of two transport platform 50 is illustrated, but in addition, also can making everywhere, the length dimension in reason district equates with the total length of n platform (n=natural number) transport platform 50.
Claims (7)
1. continuous diffusion treatment unit is characterized in that comprising:
Transport platform is loaded many tabular processed;
The process furnace of tubular extends with linearity to the unloading part of sending described transport platform from the loading part of sending into described transport platform;
E Foerderanlage is sent into described transport platform in described process furnace successively from described loading part, and the described transport platform that will carry in described process furnace is sent successively from described unloading part;
Heating unit heats described processed by loading on the described transport platform in the described process furnace;
A plurality of next doors member is arranged in the described process furnace, and will be divided into a plurality of treatment zones to the described unloading part at throughput direction from the described loading part in the described process furnace; And
Air-feeding-exhausting apparatus provides gas respectively to each described treatment zone, and discharges gas respectively at each described treatment zone.
2. continuous diffusion treatment unit according to claim 1 is characterized in that,
Described heating unit comprises the well heater that is arranged on described process furnace exterior circumferential, covers the lagging material of the tubular of described process furnace with described well heater,
Described continuous diffusion treatment unit also comprises control device, and described control device carries out temperature adjustment in the stove by the described well heater of control respectively to each described treatment zone.
3. continuous diffusion treatment unit according to claim 1 and 2 is characterized in that, described next door member is arranged in the described process furnace movably along described throughput direction.
4. continuous diffusion treatment unit according to claim 1 and 2 is characterized in that, described transport platform at the length dimension on the throughput direction less than the length dimension of each treatment zone on throughput direction of being divided by described next door member.
5. continuous diffusion treatment unit according to claim 1 is characterized in that, described heating unit comprises the well heater that is arranged on described process furnace exterior circumferential, covers the lagging material of the tubular of described process furnace with described well heater,
Described lagging material is along the cut segmenting structure of described throughput direction.
6. continuous diffusion treatment unit according to claim 1 and 2 is characterized in that,
Described air-feeding-exhausting apparatus comprises: air feeder is provided for the gas of DIFFUSION TREATMENT to the treatment zone that is used to carry out DIFFUSION TREATMENT; Gas barrier is discharged the gas of this treatment zone,
Described air feeder is configured in the top of described process furnace,
Described process furnace has coverture, and described coverture covers the transfer passage that the described transport platform of the treatment zone that is used for carrying out described DIFFUSION TREATMENT is passed through from the top and left and right sides, and is provided with a plurality of communicating poress.
7. continuous diffusion treatment unit according to claim 1 and 2 is characterized in that,
To the described unloading part, be divided into hyperthermic treatment district, equal heat-treatment zone and cooling treatment zone from described loading part one side from the described loading part in the described process furnace by described next door member,
Described continuous diffusion treatment unit also comprises the bypass flow path that the gas of described cooling treatment zone is offered described hyperthermic treatment district.
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| JP2010144528A JP5912230B2 (en) | 2010-06-25 | 2010-06-25 | Continuous diffusion processing equipment |
| JP2010-144528 | 2010-06-25 |
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| WO2014184927A1 (en) * | 2013-05-16 | 2014-11-20 | 株式会社島津製作所 | Substrate processing system |
| CN103928374B (en) * | 2014-05-02 | 2016-08-24 | 广州市佑航电子有限公司 | For the automation equipment making sensor and the method making sensor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615944A (en) * | 1968-12-13 | 1971-10-26 | Corning Glass Works | Method for the continuous doping of semiconductor materials |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5224463A (en) * | 1975-08-20 | 1977-02-23 | Nippon Denso Co Ltd | Method for thermal diffusion for semiconductor |
| JPS5242075A (en) * | 1975-09-29 | 1977-04-01 | Nippon Denso Co Ltd | Device for controlling gas atmosphere in semiconductor producing equip ment |
| JPS54103750U (en) * | 1977-12-29 | 1979-07-21 | ||
| JPS6029295B2 (en) * | 1979-08-16 | 1985-07-10 | 舜平 山崎 | Non-single crystal film formation method |
| JPS5885523A (en) * | 1981-11-17 | 1983-05-21 | Nec Home Electronics Ltd | Semiconductor manufacturing apparatus |
| JPS6335776A (en) * | 1986-07-30 | 1988-02-16 | Matsushita Electronics Corp | Chemical vapor deposition device |
| JPH01228123A (en) * | 1988-03-09 | 1989-09-12 | Fujitsu Ltd | Processor for semiconductor device |
| JPH0395632U (en) * | 1990-01-11 | 1991-09-30 | ||
| JP2723795B2 (en) * | 1994-02-22 | 1998-03-09 | 九州日本電気株式会社 | Horizontal processing furnace |
| JP3103718B2 (en) * | 1994-05-30 | 2000-10-30 | 京セラ株式会社 | Equipment for forming semiconductor junctions for solar cells |
| JPH09148259A (en) * | 1995-11-24 | 1997-06-06 | Nec Kyushu Ltd | Lateral reactor |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3615944A (en) * | 1968-12-13 | 1971-10-26 | Corning Glass Works | Method for the continuous doping of semiconductor materials |
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Application publication date: 20111228 |