JPH0395632U - - Google Patents
Info
- Publication number
- JPH0395632U JPH0395632U JP203090U JP203090U JPH0395632U JP H0395632 U JPH0395632 U JP H0395632U JP 203090 U JP203090 U JP 203090U JP 203090 U JP203090 U JP 203090U JP H0395632 U JPH0395632 U JP H0395632U
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- mixed gas
- intermediate product
- semiconductor intermediate
- furnace core
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 claims description 5
- 239000013067 intermediate product Substances 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
Description
第１図は本考案の第一実施例を示す拡散炉装置
の概略断面図、第２図は第１図のＡ−Ａ断面図、
第３図は本考案の第二実施例を示す拡散炉装置の
断面図、第４図は第３図のＢ−Ｂ断面図、第５図
は本考案の他の実施例を示す拡散炉装置の断面図
、第６図は従来の拡散炉装置を示す断面図である
。
１１……半導体中間品、１２……混合ガス、１
３……排出口、１４……炉心管、１５……内側炉
心管、１６……外側炉心管、１７……注入孔。
FIG. 1 is a schematic sectional view of a diffusion furnace apparatus showing a first embodiment of the present invention, FIG. 2 is a sectional view taken along line A-A in FIG.
Fig. 3 is a sectional view of a diffusion furnace apparatus showing a second embodiment of the present invention, Fig. 4 is a sectional view taken along line BB in Fig. 3, and Fig. 5 is a diffusion furnace apparatus showing another embodiment of the invention. FIG. 6 is a sectional view showing a conventional diffusion furnace apparatus. 11...Semiconductor intermediate product, 12...Mixed gas, 1
3...Discharge port, 14...Furnace core tube, 15...Inner reactor core tube, 16...Outer reactor core tube, 17...Injection hole.
Claims (1)
外部に排出するための排出口を有する炉心管を備
え、該炉心管は、内部に半導体中間品が載置され
る内側炉心管と、該内側炉心管内に半導体中間品
を挿入し混合ガスを吹きつける外側炉心管とから
構成され、前記内側炉心管の外周壁に、前記外側
炉心管から混合ガスを半導体中間品に均一に拡散
させて吹きつけるための多数の注入孔が形成され
たことを特徴とする拡散炉装置。 The furnace core tube has an exhaust port for blowing a mixed gas onto the semiconductor intermediate product, diffusing it, and discharging it to the outside. an outer furnace core tube into which a semiconductor intermediate product is inserted and a mixed gas is blown thereto, and the mixed gas from the outer core tube is uniformly diffused and blown onto the semiconductor intermediate product on the outer peripheral wall of the inner furnace core tube. A diffusion furnace device characterized in that a large number of injection holes are formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP203090U JPH0395632U (en) | 1990-01-11 | 1990-01-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP203090U JPH0395632U (en) | 1990-01-11 | 1990-01-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0395632U true JPH0395632U (en) | 1991-09-30 |
Family
ID=31505912
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP203090U Pending JPH0395632U (en) | 1990-01-11 | 1990-01-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0395632U (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005150573A (en) * | 2003-11-19 | 2005-06-09 | Kyocera Corp | Impurity diffusion device |
| JP2012009641A (en) * | 2010-06-25 | 2012-01-12 | Koyo Thermo System Kk | Continuous diffusion processing apparatus |
| JP2013182916A (en) * | 2012-02-29 | 2013-09-12 | Mitsubishi Electric Corp | Thermal diffusion device |
| JP2015188095A (en) * | 2015-05-20 | 2015-10-29 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
| JP2015201651A (en) * | 2015-05-20 | 2015-11-12 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
| JP2015201650A (en) * | 2015-05-20 | 2015-11-12 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
-
1990
- 1990-01-11 JP JP203090U patent/JPH0395632U/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005150573A (en) * | 2003-11-19 | 2005-06-09 | Kyocera Corp | Impurity diffusion device |
| JP2012009641A (en) * | 2010-06-25 | 2012-01-12 | Koyo Thermo System Kk | Continuous diffusion processing apparatus |
| JP2013182916A (en) * | 2012-02-29 | 2013-09-12 | Mitsubishi Electric Corp | Thermal diffusion device |
| JP2015188095A (en) * | 2015-05-20 | 2015-10-29 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
| JP2015201651A (en) * | 2015-05-20 | 2015-11-12 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
| JP2015201650A (en) * | 2015-05-20 | 2015-11-12 | 光洋サーモシステム株式会社 | Continuous diffusion processing apparatus |
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