CN102269712A - 一种晶片缺陷检测方法 - Google Patents
一种晶片缺陷检测方法 Download PDFInfo
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- CN102269712A CN102269712A CN2010101924259A CN201010192425A CN102269712A CN 102269712 A CN102269712 A CN 102269712A CN 2010101924259 A CN2010101924259 A CN 2010101924259A CN 201010192425 A CN201010192425 A CN 201010192425A CN 102269712 A CN102269712 A CN 102269712A
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CN2010101924259A CN102269712A (zh) | 2010-06-04 | 2010-06-04 | 一种晶片缺陷检测方法 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103604814A (zh) * | 2013-10-23 | 2014-02-26 | 上海华力微电子有限公司 | 一种芯片缺陷的检测方法 |
CN103811367A (zh) * | 2012-11-07 | 2014-05-21 | 中芯国际集成电路制造(上海)有限公司 | 产品缺陷检测方法 |
CN106855520A (zh) * | 2017-02-10 | 2017-06-16 | 南京航空航天大学 | 一种基于机器视觉的工件缺陷检测方法 |
CN107204207A (zh) * | 2016-03-18 | 2017-09-26 | 阿里巴巴集团控股有限公司 | 为高速缓存应用使用降级闪存裸片的方法及架构、固态驱动器 |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0410656A (ja) * | 1990-04-27 | 1992-01-14 | Nec Corp | pnpn半導体素子の駆動方法 |
JPH09210656A (ja) * | 1995-11-28 | 1997-08-12 | Nikon Corp | 検査装置 |
US5841893A (en) * | 1989-07-12 | 1998-11-24 | Hitachi, Ltd. | Inspection data analyzing system |
CN1284744A (zh) * | 1999-08-16 | 2001-02-21 | 台湾积体电路制造股份有限公司 | 晶片缺陷检查及特性分析的方法 |
US20020181757A1 (en) * | 1998-12-01 | 2002-12-05 | Naoya Takeuchi | Appearance inspection machine and method for concurrently performing defect detection and classification |
US6504609B2 (en) * | 1998-11-30 | 2003-01-07 | Hitachi, Ltd. | Inspection method, apparatus and system for circuit pattern |
CN1735866A (zh) * | 2002-11-12 | 2006-02-15 | Fei公司 | 缺陷分析仪 |
US20070156379A1 (en) * | 2005-11-18 | 2007-07-05 | Ashok Kulkarni | Methods and systems for utilizing design data in combination with inspection data |
CN101241319A (zh) * | 2008-03-06 | 2008-08-13 | 上海微电子装备有限公司 | 具有对准标记体系的机器视觉对准系统及其对准方法 |
US7643140B2 (en) * | 2007-03-29 | 2010-01-05 | Hitachi High-Technologies Corporation | Method and apparatus for inspecting a semiconductor device |
-
2010
- 2010-06-04 CN CN2010101924259A patent/CN102269712A/zh active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5841893A (en) * | 1989-07-12 | 1998-11-24 | Hitachi, Ltd. | Inspection data analyzing system |
JPH0410656A (ja) * | 1990-04-27 | 1992-01-14 | Nec Corp | pnpn半導体素子の駆動方法 |
JPH09210656A (ja) * | 1995-11-28 | 1997-08-12 | Nikon Corp | 検査装置 |
US6504609B2 (en) * | 1998-11-30 | 2003-01-07 | Hitachi, Ltd. | Inspection method, apparatus and system for circuit pattern |
US20020181757A1 (en) * | 1998-12-01 | 2002-12-05 | Naoya Takeuchi | Appearance inspection machine and method for concurrently performing defect detection and classification |
CN1284744A (zh) * | 1999-08-16 | 2001-02-21 | 台湾积体电路制造股份有限公司 | 晶片缺陷检查及特性分析的方法 |
CN1735866A (zh) * | 2002-11-12 | 2006-02-15 | Fei公司 | 缺陷分析仪 |
US20070156379A1 (en) * | 2005-11-18 | 2007-07-05 | Ashok Kulkarni | Methods and systems for utilizing design data in combination with inspection data |
US7643140B2 (en) * | 2007-03-29 | 2010-01-05 | Hitachi High-Technologies Corporation | Method and apparatus for inspecting a semiconductor device |
CN101241319A (zh) * | 2008-03-06 | 2008-08-13 | 上海微电子装备有限公司 | 具有对准标记体系的机器视觉对准系统及其对准方法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103811367A (zh) * | 2012-11-07 | 2014-05-21 | 中芯国际集成电路制造(上海)有限公司 | 产品缺陷检测方法 |
CN103811367B (zh) * | 2012-11-07 | 2016-06-15 | 中芯国际集成电路制造(上海)有限公司 | 产品缺陷检测方法 |
CN103604814A (zh) * | 2013-10-23 | 2014-02-26 | 上海华力微电子有限公司 | 一种芯片缺陷的检测方法 |
CN107204207A (zh) * | 2016-03-18 | 2017-09-26 | 阿里巴巴集团控股有限公司 | 为高速缓存应用使用降级闪存裸片的方法及架构、固态驱动器 |
CN107204207B (zh) * | 2016-03-18 | 2021-03-02 | 阿里巴巴集团控股有限公司 | 为高速缓存应用使用降级闪存裸片的方法及架构、固态驱动器 |
CN106855520A (zh) * | 2017-02-10 | 2017-06-16 | 南京航空航天大学 | 一种基于机器视觉的工件缺陷检测方法 |
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Application publication date: 20111207 |