CN102259102A - Silicon material washer - Google Patents

Silicon material washer Download PDF

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Publication number
CN102259102A
CN102259102A CN2011102316518A CN201110231651A CN102259102A CN 102259102 A CN102259102 A CN 102259102A CN 2011102316518 A CN2011102316518 A CN 2011102316518A CN 201110231651 A CN201110231651 A CN 201110231651A CN 102259102 A CN102259102 A CN 102259102A
Authority
CN
China
Prior art keywords
agitator
silicon material
silicon
cleaning machine
waste gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2011102316518A
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Chinese (zh)
Inventor
王土军
徐增宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ZHEJIANG GUIHONG ELECTRONIC TECHNOLOGY Co Ltd
Original Assignee
ZHEJIANG GUIHONG ELECTRONIC TECHNOLOGY Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ZHEJIANG GUIHONG ELECTRONIC TECHNOLOGY Co Ltd filed Critical ZHEJIANG GUIHONG ELECTRONIC TECHNOLOGY Co Ltd
Priority to CN2011102316518A priority Critical patent/CN102259102A/en
Publication of CN102259102A publication Critical patent/CN102259102A/en
Pending legal-status Critical Current

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Abstract

The invention relates to a silicon material washer. A waste gas collection cover is arranged on the upper part of the silicon material washer; a waste gas inlet and a waste gas outlet are arranged on the waste gas collection cover; an acid-base reaction tank is arranged on the lower part of the silicon material washer; a stirring barrel and a material receiving barrel are arranged in the acid-base reaction tank; the stirring barrel is connected with transmission and rotation devices; the material receiving barrel is positioned on one side of the stirring barrel and communicated with the stirring barrel; a strip-shaped stirring sheet is arranged at one end of the interior of the stirring barrel; and a spiral stirring blade is arranged at the other end of the interior of the stirring barrel. By adoption of the silicon material washer, various kinds of silicon materials such as silicon wafers and silicon blocks are placed in the stirring barrel and uniformly washed in a mechanical mode and then can be subsequently washed in a pure water washing tank. The silicon material washer is large in material washing quantity and labor-saving, and can reduce oxidation due to high washing speed.

Description

A kind of silicon material cleaning machine
Technical field
The present invention relates to a kind of silicon material cleaning machine.
Background technology
Traditional cleaning silicon material method is that the silicon material is placed in the tank, and the cleaning fluid that adds acid or bases then cleans, and what need during cleaning manually not stop stirs the silicon material; Simultaneously, because the face and the face of some silicon material stick together, therefore can not clean fully and put in place; In addition, add design and the slow-footed reason of manually-operated, the disposable material amount of washing is few, and sheet stock is about 1.5kg usually, and the piece material is about 3kg.
Summary of the invention
The purpose of this invention is to provide and clean evenly, it is big to wash the material amount, reduces a kind of silicon material cleaning machine of manpower
The technical scheme that the present invention takes is: a kind of silicon material cleaning machine, and the top that it is characterized in that it is the gas sampling cover, the gas sampling cover is provided with waste gas inlet and waste gas gas outlet; Its bottom is provided with the acid-base reaction groove, is provided with agitator in the acid-base reaction groove and the bucket that connects material; Agitator is connected with transmission and tumbler, and the bucket that connects material is positioned at a side of agitator, and is connected with agitator; End in the agitator is provided with the stirring piece of strip, and the other end in the agitator is provided with spiral helicine paddle.
Described its bottom also is provided with the pure water rinse bath, and the pure water rinse bath is positioned at a side of the bucket that connects material.
The stirring piece of described strip and the axis of agitator are not at grade.
Described gas sampling cover has air inlet face, and air inlet is located on the air inlet face, and air inlet face is curved.
Described agitator is provided with the cleaning fluid circulation port.
Also be provided with the cleaning fluid circulation port on the described bucket that connects material.
Described transmission and tumbler comprise driving motor, power transmission shaft and bearing, travelling gear, driven gear and rotate support roller synchronously, driving motor, power transmission shaft and bearing, travelling gear and driven gear are connected successively, agitator is positioned on the synchronous rotation support roller, and agitator is connected with driven gear.
Adopt the present invention, various silicon material such as silicon chip, silico briquette can be placed in the agitator, evenly clean mechanically, afterwards again can be then in the flushing of pure water rinse bath, wash the material amount not only greatly but also laborsaving, simultaneously,, can also reduce oxidation because cleaning speed is fast.
Description of drawings
Fig. 1 is that master of the present invention looks schematic diagram.
Fig. 2 is that schematic diagram is looked on a left side of the present invention.
Sequence number is represented among the figure: rotate support roller 1, stirring piece 2, agitator 3, driven gear 4, driving motor 5, power transmission shaft and bearing 6, travelling gear 7, waste gas gas outlet 8, gas sampling cover 9, waste gas inlet 10, acid-base reaction groove 11 synchronously, bucket 12, pure water rinse bath 13, paddle 14, cleaning fluid circulation port 15, charge door 16, electric control gear 17 and air inlet face 18 connect material.
The specific embodiment
The invention will be further described below in conjunction with specific embodiment.
With reference to Fig. 1, Fig. 2, the top of this silicon material cleaning machine is gas sampling cover 9, gas sampling cover 9 is provided with waste gas inlet 10 and waste gas gas outlet 8, and the waste gas inlet 10 of gas sampling cover 9 is located on the air inlet face 18 of arc, and waste gas gas outlet 8 is located at the top of gas sampling cover 9; The bottom of this silicon material cleaning machine is provided with acid-base reaction groove 11 and pure water rinse bath 13, and the pure water rinse bath is positioned at a side of the bucket that connects material; Be provided with agitator 3 in the acid-base reaction groove 11 and the bucket 12 that connects material, acid-base reaction groove 11 is provided with charge door 16, and charge door 16 is connected with agitator 3; Agitator 3 is connected with transmission and tumbler, transmission and tumbler comprise driving motor 5, power transmission shaft and bearing 6, travelling gear 7, driven gear 4 and rotate support roller 1 synchronously, driving motor 5, power transmission shaft and bearing 6, travelling gear 7 and driven gear 4 are connected successively, agitator 3 is positioned on the synchronous rotation support roller 1, and agitator 3 is connected with driven gear 4; The bucket 12 that connects material is positioned at a side of agitator 3, and is connected with agitator 3; Ends in the agitator 3 are provided with the stirring piece 2 of oblique strip, promptly the axis of stirring piece 2 and agitator 3 not at grade, the other ends in the agitator 3 are provided with spiral helicine paddle 14.Be provided with cleaning fluid circulation port 15 with the bucket 12 that connects material on the agitator 3.
During use, open an amount of silicon material of charge door 16 addings and shut its door then, with a certain amount of acid-base solution of packing in the acid-base reaction groove 11, rotate and reverse the time by control motor in the automatically controlled program that sets in the electric control gear 17, starting driving motor 5 beginnings then just changes, drive power transmission shaft and bearing 6, travelling gear 7 and driven gear 4, agitator 3 is rotated on the support roller 1 synchronously rotate; The upset that silicon material in the agitator 3 does not stop under the effect of the stirring piece 2 of oblique strip, the paddle that passes through spiral 14 that acid simultaneously or alkali lye body do not stop enters in the agitator 3 and reacts with the silicon material, what reacted acid-base solution did not stop discharges from cleaning fluid circulation port 15, mixes with agitator 3 acid-base solution outward.The waste gas that the reaction back produces is also discharged by cleaning fluid circulation port 15, and enters gas sampling cover 4 by waste gas inlet 10, by 8 collection and treatments of waste gas gas outlet.When just change finished setting-up time after, driving motor 5 will enter rollback routine automatically, agitator 3 reverses thereupon, the silicon material that agitator is 3 li is subjected under the thrust of stirring piece 2, spiral paddle 14 of oblique strip the silicon material to be released agitator 3, and fall in the bucket 12 that connects material, after treating that transmission motor 5 counter-rotating finishes, the pure water rinse bath 13 that the bucket 12 that connects material is proposed to put into the right side with the silicon material carries out the flushing of silicon material and gets final product.
Like this, can evenly clean the silicon material by above-mentioned mechanical system, can carry out pure water rinsing again afterwards, dual-use is washed the material amount not only greatly but also laborsaving, simultaneously, because cleaning speed is fast, can also reduce oxidation.

Claims (7)

1. silicon material cleaning machine, the top that it is characterized in that it is the gas sampling cover, the gas sampling cover is provided with waste gas inlet and waste gas gas outlet; Its bottom is provided with the acid-base reaction groove, is provided with agitator in the acid-base reaction groove and the bucket that connects material; Agitator is connected with transmission and tumbler, and the bucket that connects material is positioned at a side of agitator, and is connected with agitator; End in the agitator is provided with the stirring piece of strip, and the other end in the agitator is provided with spiral helicine paddle.
2. a kind of silicon material cleaning machine according to claim 1 is characterized in that its bottom also is provided with the pure water rinse bath, and the pure water rinse bath is positioned at a side of the bucket that connects material.
3. a kind of silicon material cleaning machine according to claim 1, the axis that it is characterized in that the stirring piece of strip and agitator is not at grade.
4. a kind of silicon material cleaning machine according to claim 1 is characterized in that the gas sampling cover has air inlet face, and air inlet is located on the air inlet face, and air inlet face is curved.
5. a kind of silicon material cleaning machine according to claim 1 is characterized in that agitator is provided with the cleaning fluid circulation port.
6. a kind of silicon material cleaning machine according to claim 1 also is provided with the cleaning fluid circulation port on the bucket that it is characterized in that connecting material.
7. a kind of silicon material cleaning machine according to claim 1, it is characterized in that transmission and tumbler comprise driving motor, power transmission shaft and bearing, travelling gear, driven gear and rotate support roller synchronously, driving motor, power transmission shaft and bearing, travelling gear and driven gear are connected successively, agitator is positioned on the synchronous rotation support roller, and agitator is connected with driven gear.
CN2011102316518A 2011-08-10 2011-08-10 Silicon material washer Pending CN102259102A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011102316518A CN102259102A (en) 2011-08-10 2011-08-10 Silicon material washer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011102316518A CN102259102A (en) 2011-08-10 2011-08-10 Silicon material washer

Publications (1)

Publication Number Publication Date
CN102259102A true CN102259102A (en) 2011-11-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011102316518A Pending CN102259102A (en) 2011-08-10 2011-08-10 Silicon material washer

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CN (1) CN102259102A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104259129A (en) * 2014-07-25 2015-01-07 江苏美科硅能源有限公司 Acid-base soaking machine for silicon material treatment
CN105905911A (en) * 2016-06-30 2016-08-31 宁夏金梯氟塑防腐设备有限公司 Horizontal split type silicon material pickling and impurity-removing device
CN112071957A (en) * 2020-09-18 2020-12-11 北京智创芯源科技有限公司 Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2476357Y (en) * 2001-05-08 2002-02-13 杨金辉 Automatic washing and separating device
CN2544842Y (en) * 2002-04-29 2003-04-16 中国科技开发院浙江分院 Silicon material cleaning apparatus
EP2036856A2 (en) * 2007-09-04 2009-03-18 Mitsubishi Materials Corporation Clean bench and method of producing raw material for single crystal silicon
CN201253615Y (en) * 2008-09-04 2009-06-10 常熟市胜诺环保设备有限公司 Silicon material cleaning device
CN201470636U (en) * 2009-04-14 2010-05-19 刘世全 Silicon material cleaner
CN201659132U (en) * 2010-04-27 2010-12-01 安阳市凤凰光伏科技有限公司 Polycrystalline silicon material pickling tank
JP4600666B2 (en) * 2005-03-29 2010-12-15 栗田工業株式会社 Sulfuric acid recycle type single wafer cleaning system
CN202212377U (en) * 2011-08-10 2012-05-09 浙江硅宏电子科技有限公司 Silicon material cleaning machine

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2476357Y (en) * 2001-05-08 2002-02-13 杨金辉 Automatic washing and separating device
CN2544842Y (en) * 2002-04-29 2003-04-16 中国科技开发院浙江分院 Silicon material cleaning apparatus
JP4600666B2 (en) * 2005-03-29 2010-12-15 栗田工業株式会社 Sulfuric acid recycle type single wafer cleaning system
EP2036856A2 (en) * 2007-09-04 2009-03-18 Mitsubishi Materials Corporation Clean bench and method of producing raw material for single crystal silicon
CN201253615Y (en) * 2008-09-04 2009-06-10 常熟市胜诺环保设备有限公司 Silicon material cleaning device
CN201470636U (en) * 2009-04-14 2010-05-19 刘世全 Silicon material cleaner
CN201659132U (en) * 2010-04-27 2010-12-01 安阳市凤凰光伏科技有限公司 Polycrystalline silicon material pickling tank
CN202212377U (en) * 2011-08-10 2012-05-09 浙江硅宏电子科技有限公司 Silicon material cleaning machine

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104259129A (en) * 2014-07-25 2015-01-07 江苏美科硅能源有限公司 Acid-base soaking machine for silicon material treatment
CN105905911A (en) * 2016-06-30 2016-08-31 宁夏金梯氟塑防腐设备有限公司 Horizontal split type silicon material pickling and impurity-removing device
CN105905911B (en) * 2016-06-30 2017-12-15 宁夏金梯氟塑防腐设备有限公司 Horizontal split type silicon material pickling impurity removal device
CN112071957A (en) * 2020-09-18 2020-12-11 北京智创芯源科技有限公司 Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method
CN112071957B (en) * 2020-09-18 2021-04-20 北京智创芯源科技有限公司 Focal plane chip dielectric film stripping device and focal plane chip dielectric film stripping method

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Application publication date: 20111130