CN102253524A - Manufacturing method of colorful filtering substrate - Google Patents
Manufacturing method of colorful filtering substrate Download PDFInfo
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- CN102253524A CN102253524A CN2010101771041A CN201010177104A CN102253524A CN 102253524 A CN102253524 A CN 102253524A CN 2010101771041 A CN2010101771041 A CN 2010101771041A CN 201010177104 A CN201010177104 A CN 201010177104A CN 102253524 A CN102253524 A CN 102253524A
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- overlayer
- color filter
- filter patterns
- optical filtering
- colored optical
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Abstract
The invention discloses a manufacturing method of a colorful filtering substrate. The manufacturing method of the colorful filtering substrate comprises the following steps of: providing a substrate, wherein the substrate is provided with a plurality of display unit regions and a non-display region; forming a plurality of colorful filtering pattern columns in the display unit regions; forming a first covering layer on the substrate; providing a first photomask to cover the non-display region and expose the display unit regions; carrying out exposing procedure by the first photomask as a cover mask; forming a second covering layer on the first covering layer; providing a second photomask to cover the colorful filtering pattern columns and the non-display region; carrying out exposing procedure by taking the second photomask as a cover mask; carrying out developing and baking procedures on the first covering layer and the second covering layer so as to form the patterned first covering layer covering the display unit regions, and the patterned second covering layer positioned among the colorful filtering pattern columns. According to the manufacturing method of the colorful filtering substrate, the processing procedures of the colorful filtering substrate are simplified, the processing time is shortened and the manufacturing cost is reduced, and the productivity and yield of the colorful filtering substrate are increased.
Description
Technical field
The invention relates to a kind of manufacture method of substrate, and particularly relevant for a kind of manufacture method of colored optical filtering substrates.
Background technology
(liquid crystal display LCD) has thin thickness, high image quality, low consumpting power and advantage such as radiationless to LCD, and becomes the main flow of flat-panel screens (Flat Display Apparatus) gradually.Generally speaking, LCD is made of module backlight and display panels, and wherein display panels has generally included active component array base board, liquid crystal layer and colored optical filtering substrates.
Traditionally, colored optical filtering substrates comprises a substrate, black matrix, a plurality of color filter patterns and an overlayer (overcoat layer).Wherein, black matrix defines pixel region a plurality of times on substrate.Color filter patterns is disposed in time pixel region, and it for example is red filter pattern, green filter pattern or blue filter pattern.Overlayer is on the substrate and cover black matrix between color filter patterns and the color filter patterns.Particularly; when colored optical filtering substrates is applied to half-penetration half-reflection liquid crystal display panel; usually also dispose a plurality of transparent patterns on the overlayer; these transparent patterns are on the overlayer between the color filter patterns row; and the echo area corresponding to active component array base board is provided with, to shorten the distance between echo area and the colored optical filtering substrates.
In general, because overlayer and transparent pattern are all photoresist, therefore in the process that forms overlayer and transparent pattern, can carry out exposure manufacture process, developing manufacture process and baking processing procedure respectively.Thus, make the complex steps and the cost height of colored optical filtering substrates processing procedure.
Summary of the invention
The invention provides a kind of manufacture method of colored optical filtering substrates, can simplify fabrication steps and increase process rate.
The present invention proposes a kind of manufacture method of colored optical filtering substrates, said method comprising the steps of:
One substrate is provided, has an a plurality of display units district and a non-display area, described non-display area is between described display unit district;
Form a plurality of color filter patterns row in each described display unit district, each described color filter patterns row comprises a plurality of color filter patterns;
On described substrate, form one first overlayer;
One first light shield is provided, and described first light shield covers described non-display area and exposes described display unit district;
With described first light shield serves as that the cover curtain carries out one first exposure manufacture process to described first overlayer;
On described first overlayer, form one second overlayer;
One second light shield is provided, and described second light shield covers described color filter patterns row and described non-display area;
With described second light shield serves as that the cover curtain carries out one second exposure manufacture process to described second overlayer; And
Described first overlayer and described second overlayer are carried out a developing manufacture process and a baking processing procedure, with first overlayer that forms a patterning and second overlayer of a patterning, first overlayer of described patterning covers described display unit district, second overlayer of described patterning comprises a plurality of overlay pattern, and described overlay pattern is formed on first overlayer of described patterning and between described color filter patterns row.
Based on above-mentioned, the present invention utilizes first overlayer and the second tectal isomorphism type to simplify the processing procedure of colored optical filtering substrates, makes first overlayer can finish patterning in the processing procedure with developing manufacture process and with toasting with second overlayer.Thus, can simplify fabrication steps, the shortening processing procedure time of colored optical filtering substrates and reduce cost of manufacture, and increase the productive rate and the yield of colored optical filtering substrates.
Description of drawings
Fig. 1 is the process flow diagram of the manufacture method of a kind of colored optical filtering substrates of providing of one embodiment of the invention.
Fig. 2 A to Fig. 2 F looks synoptic diagram on the flow process of manufacture method of a kind of colored optical filtering substrates of providing of one embodiment of the invention.
Fig. 3 A to Fig. 3 D is respectively the diagrammatic cross-section along A-A ' line of Fig. 2 A to Fig. 2 D.
Fig. 3 E and Fig. 3 F are respectively the diagrammatic cross-section along A-A ' line and B-B ' line of Fig. 2 E and Fig. 2 F.
Embodiment
In order to make purpose of the present invention, technical scheme and beneficial effect clearer,, the present invention is further elaborated below in conjunction with drawings and Examples.Should be appreciated that specific embodiment described herein only in order to explanation the present invention, and be not used in qualification the present invention.
Fig. 1 is the process flow diagram of the manufacture method of a kind of colored optical filtering substrates of providing of one embodiment of the invention.Fig. 2 A to Fig. 2 F looks synoptic diagram on the flow process of manufacture method of a kind of colored optical filtering substrates of providing of one embodiment of the invention, Fig. 3 A to Fig. 3 D is respectively the diagrammatic cross-section along A-A ' line of Fig. 2 A to Fig. 2 D, and Fig. 3 E and Fig. 3 F are respectively the diagrammatic cross-section along A-A ' line and B-B ' line of Fig. 2 E and Fig. 2 F.
Please at first, carry out step S 100 simultaneously with reference to Fig. 1, Fig. 2 A and Fig. 3 A, a substrate 200 is provided, have an a plurality of display units district 202 and a non-display area 204, wherein non-display area 204 is between display unit district 202.In the present embodiment, substrate 200 for example is a mother substrate, and display unit district 202 for example is the predetermined zone that will form a colored optical filtering substrates monomer, and non-display area 204 for example is a cutting area.In other words, the manufacture method of the colored optical filtering substrates of present embodiment can form a plurality of colored optical filtering substrates monomers on substrate 200, separates these colored optical filtering substrates monomers via cutting non-display area 204 again.
Then, carry out step S110, form a plurality of color filter patterns row 220 in each display unit district 202, wherein each color filter patterns row 220 comprises a plurality of color filter patterns 222.In the present embodiment, for example be to form a black matrix 210 in each display unit district 202 earlier, to define pixel region P a plurality of times.Then, in each time pixel region P, form a color filter patterns 222.Wherein, the material of black matrix 210 for example is a resin, and its formation method for example is to adopt micro image etching procedure, screen painting, coating, ink-jet or other suitable method.Color filter patterns 222 for example is a red filter pattern, a green filter pattern or a blue filter pattern, and its formation method for example is a micro image etching procedure.In the present embodiment, color filter patterns row 220 for example are to comprise a plurality of red filter pattern, a plurality of green filter pattern and a plurality of blue filter pattern of alternately arranging.What pay special attention to is, though present embodiment is so that black matrix 210 of formation and color filter patterns 222 are example respectively, but the present invention is not limited the formation method and the configuration mode of black matrix 210 with color filter patterns 222, in other words, the those skilled in the art can adopt the whole bag of tricks to form black matrix and color filter patterns according to actual conditions and demand.
Please then, carry out step S120 simultaneously with reference to Fig. 1, Fig. 2 B and Fig. 3 B, forming one first overlayer, 230, the first overlayers 230 on substrate 200 for example is to comprise the minus photoresist.In the present embodiment, the formation method of first overlayer 230 is rubbing method for example, and its material for example is transparent minus photoresist.In detail, for example be that the material of first overlayer 230 is coated on the whole base plate 200, the non-display area 204 that makes first overlayer 230 cover black matrix 210, color filter patterns 222 comprehensively and not dispose color filter patterns 222.
Please then, carry out step S130 simultaneously with reference to Fig. 1, Fig. 2 C and Fig. 3 C, provide one first light shield, 232, the first light shields 232 to cover non-display area 204 and expose display unit district 202.Continuing it, carry out step S140, serves as that the cover curtain carries out one first exposure manufacture process E1 to first overlayer 230 with first light shield 232.In other words, in the first exposure manufacture process E1, first overlayer 230 that is positioned at display unit district 202 can be exposed.
Please then, carry out step S150 simultaneously with reference to Fig. 1, Fig. 2 D and Fig. 3 D, forming one second overlayer, 240, the second overlayers 240 on first overlayer 230 for example is to comprise the minus photoresist.In the present embodiment, for example be second overlayer 240 to be formed on first overlayer 230 with rubbing method, make second overlayer 240 cover first overlayer 230 comprehensively.Wherein, the material of second overlayer 240 for example is identical with the material of first overlayer 230, for example is to be all transparent minus photoresist.Or, in one embodiment, the material of first overlayer 230 can be different with the material of second overlayer 240, but has similar character between the two, for instance, first overlayer 230 and second overlayer 240 are all the material with high grade of transparency, with the material of the material of avoiding first overlayer 230 and second overlayer 240 on color or other pollutes in nature mutually.
Please then, carry out step S160 simultaneously with reference to Fig. 1, Fig. 2 E and Fig. 3 E, provide one second light shield, 242, the second light shields 242 to cover color filter patterns row 220 and non-display area 204.Then, carrying out step S170, serves as that the cover curtain carries out one second exposure manufacture process E2 to second overlayer 240 with second light shield 242.In other words, in the second exposure manufacture process E2, can be exposed corresponding to second overlayer 240 between the color filter patterns row 220.
Please be simultaneously with reference to Fig. 1, Fig. 2 F and Fig. 3 F, continue it, carry out step S180, first overlayer 230 and second overlayer 240 are carried out a developing manufacture process D and a baking processing procedure B, with the first overlayer 230a that forms patterning and the second overlayer 240a of patterning, and finish the making of colored optical filtering substrates 300.In developing manufacture process D, because being positioned at second overlayer 240 of first overlayer 230, covering color filter patterns row 220 and the non-display area 204 of non-display area 204 is not exposed, therefore these parts can be removed, and stay first overlayer 230a of patterning and the second overlayer 240a of patterning.Wherein, the first overlayer 230a of patterning covers viewing area 202, and the second overlayer 240a of patterning comprises a plurality of overlay pattern 252, and overlay pattern 252 is formed on first overlayer of patterning 230a and between color filter patterns row 220.Wherein, the parameter of developing manufacture process D can be adjusted according to actual conditions and demand such as time of the concentration of the kind of developer solution, developer solution, development, temperature etc., and this is known by one of ordinary skill in the art, so do not give unnecessary details in this.Similarly, the parameter of baking processing procedure B can also be adjusted according to actual conditions and demand such as number of times, the temperature of baking and the time of baking etc. of baking, and this is known by one of ordinary skill in the art, so do not give unnecessary details in this.
Special one carry be, in one embodiment, colored optical filtering substrates 300 for example is to design at half-penetration half-reflection liquid crystal display panel, wherein overlay pattern 252 is provided with corresponding to the echo area of active component array base board, to shorten the distance between echo area and the colored optical filtering substrates 300, make half-penetration half-reflection liquid crystal display panel can have uniform brightness.
In the present embodiment, because first overlayer 230 and second overlayer 240 have isomorphism type, such as being all material, therefore can avoid undeveloped first overlayer 230 and undeveloped second overlayer 240 on color or other pollutes in nature mutually with high grade of transparency.Therefore, after first overlayer 230 is carried out exposure manufacture process E1, it is not developed and the baking processing procedure earlier, but on first overlayer 230, form second overlayer 240, after second overlayer 240 is carried out exposure manufacture process E2, again first overlayer 230 after exposing and second overlayer 240 are developed and toast, to finish the patterning of first overlayer 230 and second overlayer 240 with developing manufacture process and with toasting processing procedure.Thus, can simplify fabrication steps, the shortening processing procedure time of colored optical filtering substrates and reduce cost of manufacture, and increase the productive rate and the yield of colored optical filtering substrates.
In sum, the present invention utilizes first overlayer and the second tectal isomorphism type to simplify the processing procedure of colored optical filtering substrates, makes first overlayer can finish patterning in the processing procedure with developing manufacture process and with toasting with second overlayer.Thus, can simplify fabrication steps, the shortening processing procedure time of colored optical filtering substrates and reduce cost of manufacture, and increase the productive rate and the yield of colored optical filtering substrates.
The above only is preferred embodiment of the present invention, not in order to restriction the present invention, all any modifications of being done within the spirit and principles in the present invention, is equal to and replaces and improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. the manufacture method of a colored optical filtering substrates is characterized in that, said method comprising the steps of:
One substrate is provided, has an a plurality of display units district and a non-display area, described non-display area is between described display unit district;
Form a plurality of color filter patterns row in each described display unit district, each described color filter patterns row comprises a plurality of color filter patterns;
On described substrate, form one first overlayer;
One first light shield is provided, and described first light shield covers described non-display area and exposes described display unit district;
With described first light shield serves as that the cover curtain carries out one first exposure manufacture process to described first overlayer;
On described first overlayer, form one second overlayer;
One second light shield is provided, and described second light shield covers described color filter patterns row and described non-display area;
With described second light shield serves as that the cover curtain carries out one second exposure manufacture process to described second overlayer; And
Described first overlayer and described second overlayer are carried out a developing manufacture process and a baking processing procedure, with first overlayer that forms a patterning and second overlayer of a patterning, first overlayer of described patterning covers described display unit district, second overlayer of described patterning comprises a plurality of overlay pattern, and described overlay pattern is formed on first overlayer of described patterning and between described color filter patterns row.
2. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, described first overlayer comprises the minus photoresist.
3. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, described second overlayer comprises the minus photoresist.
4. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, each described color filter patterns row comprises a plurality of first color filter patterns, a plurality of second color filter patterns and a plurality of the 3rd color filter patterns of alternately arranging.
5. the manufacture method of colored optical filtering substrates as claimed in claim 4, it is characterized in that described first color filter patterns, described second color filter patterns and described the 3rd color filter patterns comprise a plurality of red filter pattern, a plurality of green filter pattern and a plurality of blue filter pattern.
6. the manufacture method of colored optical filtering substrates as claimed in claim 1 is characterized in that, described first overlayer and described second overlayer comprise transparent insulation material.
7. the manufacture method of colored optical filtering substrates as claimed in claim 1, described method also comprises:
Form a black matrix in each described display unit district, described black defined matrix goes out pixel region a plurality of times, and described color filter patterns is formed in described pixel region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010177104 CN102253524B (en) | 2010-05-18 | 2010-05-18 | Manufacturing method of colorful filtering substrate |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010177104 CN102253524B (en) | 2010-05-18 | 2010-05-18 | Manufacturing method of colorful filtering substrate |
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| CN102253524A true CN102253524A (en) | 2011-11-23 |
| CN102253524B CN102253524B (en) | 2013-03-27 |
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| CN 201010177104 Expired - Fee Related CN102253524B (en) | 2010-05-18 | 2010-05-18 | Manufacturing method of colorful filtering substrate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107065428A (en) * | 2016-12-29 | 2017-08-18 | 深圳市华星光电技术有限公司 | Concatenation unit light shield for forming color blocking layer, black matrix |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07248412A (en) * | 1994-03-11 | 1995-09-26 | Fujitsu Ltd | Color filter and its production |
| US7255967B2 (en) * | 2002-06-04 | 2007-08-14 | Fujifilm Corporation | Image forming method used in liquid crystal display device for both reflection and transmission modes |
| CN101149505A (en) * | 2006-09-22 | 2008-03-26 | 株式会社日立显示器 | Liquid crystal display device and manufacturing method thereof |
| CN101246231A (en) * | 2007-12-18 | 2008-08-20 | 深圳南玻伟光导电膜有限公司 | Semi-reflective semi-permeable colorful color filter |
-
2010
- 2010-05-18 CN CN 201010177104 patent/CN102253524B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07248412A (en) * | 1994-03-11 | 1995-09-26 | Fujitsu Ltd | Color filter and its production |
| US7255967B2 (en) * | 2002-06-04 | 2007-08-14 | Fujifilm Corporation | Image forming method used in liquid crystal display device for both reflection and transmission modes |
| CN101149505A (en) * | 2006-09-22 | 2008-03-26 | 株式会社日立显示器 | Liquid crystal display device and manufacturing method thereof |
| CN101246231A (en) * | 2007-12-18 | 2008-08-20 | 深圳南玻伟光导电膜有限公司 | Semi-reflective semi-permeable colorful color filter |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107065428A (en) * | 2016-12-29 | 2017-08-18 | 深圳市华星光电技术有限公司 | Concatenation unit light shield for forming color blocking layer, black matrix |
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| CN102253524B (en) | 2013-03-27 |
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Owner name: CPT TECHNOLOGY (GROUP) CO., LTD. Free format text: FORMER OWNER: CPT DISPLAY TECHNOLOGY SHENZHEN LTD. Effective date: 20130704 |
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Effective date of registration: 20130704 Address after: 350000, No. 6 West Road, Mawei District, Fujian, Fuzhou Patentee after: CPT DISPLAY TECHNOLOGY (SHENZHEN)CO., LTD. Patentee after: Chunghwa Picture Tubes Ltd. Address before: 518000, Guangming hi tech Industrial Park, Shenzhen, Guangdong, No. 9, Ming Tong Road, Baoan District Patentee before: CPT Display Technology Shenzhen Ltd. Patentee before: Chunghwa Picture Tubes Ltd. |
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Granted publication date: 20130327 Termination date: 20190518 |