CN102236215A - Droplet unit and substrate processing device - Google Patents

Droplet unit and substrate processing device Download PDF

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Publication number
CN102236215A
CN102236215A CN2011101104150A CN201110110415A CN102236215A CN 102236215 A CN102236215 A CN 102236215A CN 2011101104150 A CN2011101104150 A CN 2011101104150A CN 201110110415 A CN201110110415 A CN 201110110415A CN 102236215 A CN102236215 A CN 102236215A
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valve
suction space
pressure
film
unit
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CN102236215B (en
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金相淳
赵翊成
金义中
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AP Systems Inc
AP Cells Inc
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AP Cells Inc
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
    • B05C5/0275—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated flow controlled, e.g. by a valve
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Nonlinear Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)

Abstract

The invention provides a droplet unit, comprising: a pumping part comprising a pumping space main body of a pumping space comprising accommodating source materials, and a pressure adjusting film covering the lateral part of the pumping space and elastically deforming via configuration; an injection part connected to the pumping space to inject the source materials to the pumping space; an exhaust part connected to the pumping space to pump the source materials from the pumping space; a first valve provided with an end connected to the injection part, and with communication controlled according to the elastic deforming direction of the pressure adjusting film of the pumping part; and a second valve provided with one end connected to the exhaust part, and with communication controlled according to the elastic deforming direction of the pressure adjusting film of the pumping part. Since an injector rod in a reciprocating movement in the pumping space is unnecessary, friction caused by contact of the external surface of the injector rod and the internal surface defining the pumping space does not exist, thereby preventing forming of particles.

Description

Droplet unit and substrate-treating apparatus
Technical field
The present invention relates to a kind of droplet unit (droplet unit) and a kind of substrate-treating apparatus, and more particularly, relate to a kind of droplet unit and a kind of substrate-treating apparatus, it prevents to form particle (particle) when injecting and discharge source material.
Background technology
As the cathode-ray tube (CRT) of display device (cathode ray tube, CRT) relatively large and heavier.Recently, using for example liquid crystal indicator (liquid display device, LCD), plasma display (plasma display panel, PDP) and organic light emitting apparatus (organiclight emitting device, OLED) etc. two-d display panel is replaced this kind CRT, and described two-d display panel is light, elongated and save aspect power consumption.
By making this two-d display panel in conjunction with the pair of planar substrate.For instance, in order to make display panels, manufacturing comprises the lower substrate of thin film transistor (TFT) (thin film transistor) and pixel electrode (pixelelectrode), and the upper substrate that comprises colored filter (color filter) and common electrode (common electrode).Then, liquid crystal material is dropped on the lower substrate, and in conjunction with and seal the upper and lower substrate, to make display panels.
In this, use the liquid crystal substrate treatment facility that liquid crystal material is dropped on the substrate.This liquid crystal substrate treatment facility comprises the platform (stage) of placing substrate, be placed in the stand (gantry) of platform top, the droplet unit (dropletunit) that is fixed to stand and separates each other and in orientation, arrange, move horizontally the droplet cell moving parts (member) of droplet unit, and be placed on the platform to move horizontally the stand moving-member of stand.In the droplet unit each comprises the liquid crystal reservoir (storage) that stores liquid crystal material, the syringe (syringe) that holds the liquid crystal material of scheduled volume, reciprocal syringe stem (syringe rod) in syringe liquid crystal material is fed in the syringe or liquid crystal material is discharged from syringe, reception is from the liquid crystal material of syringe and with the nozzle (nozzle) of liquid crystal material discharge on substrate, and the valve (valve) of controlling the opening and closing of first to the 3rd pipe (tube).First pipe is connected to valve with the liquid crystal reservoir, and second pipe is connected to valve with syringe, and the 3rd pipe is connected to nozzle with valve.That is, valve is connected in first to the 3rd pipe end of each, to control the connection between first to the 3rd pipe.Therefore, move to the opposition side of nozzle with being placed in syringe stem in the syringe, and valve is opened first and second pipes being fed to syringe from the liquid crystal material of container.In addition, syringe is moved to nozzle, and valve is opened the 3rd pipe will be fed to nozzle from the liquid crystal material of syringe and liquid crystal material is discharged on substrate.
So, discharge from syringe for liquid crystal material is fed in the syringe or with liquid crystal material, syringe stem is reciprocal in syringe.When syringe stem is reciprocal in syringe, the inwall of syringe stem contact syringe.Therefore, the friction between inwall and the syringe stem causes the formation particle.In addition, when particle mixes with liquid crystal material, polluted liquid crystal material, this measure can cause the defective of device.
Valve can be electrovalve, and described electrovalve uses electric signal to control the connection between first to the 3rd pipe.This electrovalve can have frequent signal errors.Therefore, open first and second pipe when being injected into liquid crystal material in the syringe at valve, signal errors can cause the 3rd pipe to be opened, and therefore causes leakage.Therefore, may be difficult to liquid crystal material is injected in the syringe.In addition, opening the 3rd pipe when will be fed to nozzle from the liquid crystal material of syringe, signal errors can cause first and second pipe to be opened, and therefore causes leakage.Therefore, may be difficult to the liquid crystal material from syringe is fed to nozzle.Therefore, can in the process that liquid crystal material is dropped on the substrate, produce the defective of product, perhaps can postpone the processing time.
Summary of the invention
The invention provides a kind of droplet unit and a kind of substrate-treating apparatus, it prevents when injecting and discharge source material the pollution owing to the source material of particle.
According to one exemplary embodiment, the droplet unit comprises: pumping unit, and it comprises the main body with suction space of holding source material, and the pressure adjustment film that covers the side part of suction space, pressure is adjusted film and is configured to flexibly be out of shape; Inject part, it is connected to suction space so that source material is injected into suction space; Discharge section, it is connected to suction space so that source material is discharged from suction space; First valve, it has an end that is connected to the injection part, and the connection of first valve is to control according to the elastic deformation direction of the pressure adjustment film of pumping unit; And second valve, it has an end that is connected to discharge section, and the connection of second valve is to control according to the elastic deformation direction that the pressure of pumping unit is adjusted film.
When pressure is adjusted the distortion of film elasticity ground, can open one in first and second valve, and can close another person.
The droplet unit can comprise operation part, and described operation part is connected to pressure and adjusts film, pressure be deformed to suction space with adjusting film elasticity or arrive the side relative with suction space.
Pumping unit can comprise fixed part, and described fixed part is placed in pressure and adjusts the film top, is fixed to main body so that pressure is adjusted film.
Fixed part can have through hole at least one part, and of operation part can be partially submerged into to through hole.
Operation part can comprise and is connected to pressure and adjusts the operating axis of film and vertical moving power is applied to the power section of operating axis, and operating axis can pass the through hole of fixed part and be connected to pressure on the opening of pumping unit and adjusts film.
Pressure is adjusted film can have the zone that is connected to operating axis, and can flexibly be deformed to suction space to the described zone of major general or arrive the side relative with suction space.
Pass the through hole of fixed part and be connected to pressure adjust the diameter of the operating axis of film can be less than the through hole of fixed part and the inside diameter of suction space.
The other end of first valve can be connected to first supply pipe that source material is fed to first valve, and the other end of second valve can be connected to second supply pipe that source material is discharged from second valve.
First and second valve can comprise non-return valve.
When pressure is adjusted film elasticity ground and is deformed to the side relative with suction space with the pressure of minimizing suction space, can open first valve, and can close second valve.
When pressure is adjusted film elasticity ground and is deformed to suction space with the pressure of increase suction space, can close first valve, and can open second valve.
Source material can comprise liquid crystal material.
According to another one exemplary embodiment, substrate-treating apparatus comprises: the platform of placing substrate, be placed in the stand of platform top, and be fixed on the stand and source material is discharged droplet unit on substrate, wherein said droplet unit comprises: pumping unit, it comprises the main body with suction space of holding source material, and the pressure adjustment film that covers the side part of suction space, and pressure is adjusted film and is configured to flexibly be out of shape; Inject part, it is connected to suction space so that source material is injected into suction space; Discharge section, it is connected to suction space so that source material is discharged from suction space; First valve, it has an end that is connected to the injection part, and the connection of first valve is to control according to the elastic deformation direction of the pressure adjustment film of pumping unit; And second valve, it has an end that is connected to discharge section, and the connection of second valve is to control according to the elastic deformation direction that the pressure of pumping unit is adjusted film.
When pressure is adjusted the distortion of film elasticity ground, can open one in first and second valve, and can close another person.
When pressure is adjusted film elasticity ground and is deformed to the side relative with suction space with the pressure of minimizing suction space, can open first valve, and can close second valve.
When pressure is adjusted film elasticity ground and is deformed to suction space with the pressure of increase suction space, can close first valve, and can open second valve.
First and second valve can comprise non-return valve.
Description of drawings
Can from the following description of being done in conjunction with the accompanying drawings, understand one exemplary embodiment in more detail, wherein:
Fig. 1 is the skeleton view of explanation according to the substrate-treating apparatus of one exemplary embodiment.
Fig. 2 is the amplification cross-sectional view of the droplet unit of key diagram 1.
Fig. 3 A is the enlarged drawing of the A part of key diagram 2, and wherein pressure is deformed to the side relative with suction space with adjusting film elasticity.
Fig. 3 B is the enlarged drawing of the A part of key diagram 2, and wherein pressure is deformed to suction space with adjusting film elasticity.
Fig. 4 A is the cross-sectional view of explanation according to the open mode of first valve of one exemplary embodiment.
Fig. 4 B is the cross-sectional view of closed condition of first valve of key diagram 4A.
Fig. 5 A is the cross-sectional view of explanation according to the open mode of second valve of one exemplary embodiment.
Fig. 5 B is the cross-sectional view of closed condition of second valve of key diagram 5A.
Fig. 6 A and Fig. 6 B are the cross-sectional view of explanation according to the operation of the droplet unit of one exemplary embodiment.
Embodiment
Hereinafter, will be described in detail with reference to the attached drawings specific embodiment.Yet the present invention can different forms embody, and should not be limited to the embodiment that states as this paper and explain the present invention.On the contrary, provide these embodiment to make that the present invention will be also complete comprehensively, and will fully pass on scope of the present invention to the those skilled in the art.
Fig. 1 is the skeleton view of explanation according to the substrate-treating apparatus of one exemplary embodiment.Fig. 2 is the amplification cross-sectional view of the droplet unit of key diagram 1.Fig. 3 A is the enlarged drawing of the A part of key diagram 2, wherein pressure is adjusted film (pressure adjustment membrane) and flexibly is deformed to and the relative side of suction space (pumping space).Fig. 3 B is the enlarged drawing of the A part of key diagram 2, wherein pressure is deformed to with adjusting film elasticity suction space.
Referring to Fig. 1 and Fig. 2, substrate-treating apparatus according to one exemplary embodiment comprises the platform 100 of placing substrate S, be placed in the stand 200 of platform 100 tops, the droplet unit 400 that is fixed to stand 200 and separates each other and in orientation, arrange, and be placed on the stand 200 and in the orientation of droplet unit 400, extend and move horizontally the droplet cell moving parts 500 of droplet unit 400.Substrate-treating apparatus further comprises the stand moving-member 300 that is placed on the platform 100 and moves horizontally stand 200.In current embodiment, liquid crystal material can be used as the source material of waiting to drop on the substrate S, and substrate-treating apparatus can be the liquid crystal substrate treatment facility.Yet, the invention is not restricted to this, and therefore, various liquid can be used as source material.
Platform 100 has the shape corresponding to substrate S, makes substrate S can be placed on the platform 100.Owing to the square glass substrate is used as substrate S, so platform 100 is a square.Although not shown, platform 100 can comprise and be used for substrate S is placed on independent fixed part on the platform 100.Electrostatic chuck (electrostatic chuck) or vacuum fixture can be used as fixed part.When using vacuum fixture, the top part of platform 100 can possess the hole (not shown) that is communicated with vacuum pump (not shown).The hole can be in order to be fixed to substrate S the top part of platform 100.
Stand moving-member 300 can with the mobile stand 200 on the direction that direction intersects that moves horizontally of droplet unit 400.Stand moving-member 300 comprise a pair of on platform 100 parallel to each other the and guide rail (guide rail) 310 that separates each other, and the stand driver part 320 that is placed on the guide rail 310 and slides along guide rail 310.Guide rail 310 is extended on the direction perpendicular to the moving direction of droplet unit 400.The top part of stand driver part 320 is coupled to the bottom part of stand 200.Therefore, when guide rail 310 was slided, the stand 200 that is coupled to stand driver part 320 moved horizontally at stand driver part 320.For instance, stand driver part 320 can be linearity (linear) motor, ball screw (ball screw) that is configured to straight line and moves and the motor combination that is used for the swing roller screw rod.Yet, the invention is not restricted to this, and therefore stand driver part 320 can be any parts that slide on guide rail 310.
In the droplet unit 400 each is coupled to the droplet cell moving parts 500 that are placed on the stand 200, and comprises: coupling unit 410, and it is moved horizontally by droplet cell moving parts 500; Source material reservoir 420, it is placed in the top part of coupling unit 410 and stores liquid crystal material; Pumping unit 431, it has the inner space that holds liquid crystal material; And operation part 434, it adjusts the internal pressure of pumping unit 431.Droplet unit 400 further comprises: inject part 432, it is connected to pumping unit 431 liquid crystal material is injected in the pumping unit 431; Discharge section 433, it is connected to pumping unit 431 so that liquid crystal material is discharged from pumping unit 431; Droplet part 450, it receives liquid crystal material from pumping unit 431 so that liquid crystal material is distributed on the substrate S; First supply pipe 480, it will inject part 432 and be connected to source material reservoir 420; And second supply pipe 490, it is connected to droplet part 450 with discharge section 433.First valve 460 is connected to first supply pipe 480 and injects part 432, and second valve 470 is connected to discharge section 433 with second supply pipe 490.
Source material reservoir 420 stores waits to be fed to the liquid crystal material of source material supply section 430, and can have cylindrical shape.Yet the shape of source material reservoir 420 is not limited thereto.Source material reservoir 420 comprises skimming device (defoaming device) (not shown), comprises vacuum component (not shown) in the described skimming device so that air is discharged to the outside from source material reservoir 420.Source material reservoir support 420-1 is placed in the below of source material reservoir 420, to support source material reservoir 420.Source material reservoir support 420-1 is installed on the coupling unit 410, to support source material reservoir 420.
Pumping unit 431 receives the liquid crystal material from source material reservoir 420, and liquid crystal material is discharged to droplet part 450.The pumping unit support member 431-1 that supports pumping unit 431 is placed in the part place, bottom of pumping unit 431, and is installed on the coupling unit 410.Pumping unit 431 comprises: main body 431b, and it has and holds for example inner space of source material such as liquid crystal material, and has opening at one side place; Pressure is adjusted film 431c, and it covers opening, and is configured to flexibly be out of shape to adjust the pressure of inner space; And fixed part 431d, it is adjusted film 431c with pressure and is fixed to main body 431b.Pressure is adjusted the pressure that film 431c adjusts the inner space of main body 431b, makes liquid crystal material to be expelled to inner space or space discharge internally.That is, the inner space of pumping unit 431 not only holds liquid crystal material, and serves as suction space.Therefore, hereinafter the inner space of pumping unit 431 is defined as suction space 431a.Main body 431b has barrel-shaped so that suction space 431a to be provided, and can be formed by for example materials such as metal, plastics or glass.Come in main body 431b, directly to form suction space 431a by in main body 431b, forming dimple (recess).Form suction space 431a and be not limited thereto, and the parts (for instance, having the container of inner space) that therefore have an inner space can be embedded in main body 431b, to form suction space 431a.The opening of main body 431b is opened the upside (that is, the top part of main body 431b) of suction space 431a, and pressure is adjusted the opening of the main body covered 431b of film 431c.Can form pressure by the material that is resiliently deformable (rubber or engineering plastics for instance) and adjust film 431c.Pressure is adjusted film 431c can have the bigger diameter of diameter than the opening of pumping unit 431, with the opening of main body covered 431b effectively.Pressure adjust film 431c the center can with the centrally aligned of opening.Operation part 434 is adjusted film 431c with pressure and flexibly is deformed to suction space 431a, or to the pressure of the side relative with suction space 431a with change suction space 431a.Pressure is adjusted the pressure that film 431c changes suction space 431a, thereby controls being communicated with of first valve 460 and second valve 470.Fixed part 431d is placed in the upside of main body 431b, is fixed to main body 431b pressure is adjusted film 431c.Fixed part 431d has through hole, and the operating axis 434a that constitutes operation part 434 passes described through hole.
Inject part 432 and be placed between the suction space 431a of first valve 460 and pumping unit 431, in the suction space 431a of pumping unit 431, to inject liquid crystal material.Discharge section 433 is placed between the suction space 431a of second valve 470 and pumping unit 431, so that the suction space 431a of liquid crystal material from pumping unit 431 discharged.Can make injection part 432 and discharge section 433 by forming the hole that is communicated with the suction space 431a of pumping unit 431.Yet, make injection part 432 and discharge section 433 and be not limited thereto, and therefore, the parts (for instance, having the pipe of inner space) with inner space can be embedded in main body 431b, inject part 432 and discharge section 433 to form.
Operation part 434 comprises the operating axis 434a that the pressure that is connected to pumping unit 431 is adjusted film 431c, and power section (power part) 434b that vertical moving power is applied to operating axis 434a.Operating axis 434a passes the through hole of fixed part 431d, and is connected to the pressure adjustment film 431c that is placed in fixed part 431d below.Operation part 434 is adjusted the suction space 431a that film 431c flexibly is deformed to pumping unit 431 with pressure, or to the side relative with suction space 431a.Pressure is adjusted film 431c and is placed in volume and the pressure that pressure is adjusted the suction space 431a of film 431c below through flexibly being out of shape with change, thereby controls the opening and closing of first valve 460 and second valve 470.That is, referring to Fig. 3 A, when power section 434b moved up operating axis 434a, the pressure that is connected to operating axis 434a was adjusted film 431c flexibly distortion in the side relative with suction space 431a.Therefore, the volume of suction space 431a increases, and its pressure minimizing, thereby opens first valve 460 and close second valve 470.Referring to Fig. 3 B, when power section 434b moved down operating axis 434a, the pressure that is connected to operating axis 434a was adjusted film 431c through flexibly being deformed to suction space 431a.Therefore, the volume reducing of suction space 431a, and its pressure increase, thus close first valve 460 and open second valve 470.To describe the operation of first valve 460 and second valve 470 afterwards in detail.
Be installed in the below that droplet part 450 on the coupling unit 410 is placed in pumping unit 431, so that liquid crystal material is coated on the substrate S that is positioned on the platform 100.Droplet part 450 comprises liquid crystal material is coated in the nozzle 451 on the substrate S and the nozzle support 452 of fixing nozzle 451.Nozzle support 452 is installed on the coupling unit 410, and nozzle 451 is fixed to nozzle support 452.Nozzle 451 is connected to an end of second supply pipe 490, and passes through the liquid crystal material that second supply pipe 490 receives from pumping unit 431, and liquid crystal material is discharged to substrate S.
Fig. 4 A is the cross-sectional view of explanation according to the open mode of first valve of one exemplary embodiment.Fig. 4 B is the cross-sectional view of closed condition of first valve of key diagram 4A.Fig. 5 A is the cross-sectional view of explanation according to the open mode of second valve of one exemplary embodiment.Fig. 5 B is the cross-sectional view of closed condition of second valve of key diagram 5A.
According to one exemplary embodiment, non-return valve (check valve) is used as first valve 460 and second valve 470.Pressure by suction space 431a changes the opening and closing of controlling non-return valve.When opening first valve 460, close second valve 470.When closing first valve 460, open second valve 470.
Referring to Fig. 4 A and Fig. 4 B, an end of first valve 460 is connected to first supply pipe 480, and the other end of first valve 460 is connected to injection part 432.First valve 460 comprises: first shell 461, and it has the inner space; First detent (stopper) 462, it separates each other on the inwall of first shell 461 and faces each other; First stop member 463, it is placed in place, first detent, 462 right sides; And first support member 464, it is placed in first stop member, 463 right sides and sentences and support first stop member 463.Open at the center of detent 462.Therefore, be fed to by first supply pipe 480 that liquid crystal materials in first valve 460 move and the center of opening by detent 462.Hereinafter the center of opening with detent 462 is defined as the first exhaust opening 462-1.Spring is used as first support member 464, and sphere (ball) is used as first stop member 463.One end of first support member 464 is fixed to the interior section of first shell 461, and the other end supports first stop member 463.Diameter as the comparable first exhaust opening 462-1 of diameter of the sphere of first stop member 463 is big, and littler than the inside diameter of first shell 461.
To Fig. 4 B, the operation according to first valve of the operation of pumping unit will be described now referring to Fig. 2.
At first, operation part 434 is adjusted film 431c with the pressure of pumping unit 431 and flexibly is deformed to the side relative with suction space 431a, to open first valve 460.Therefore, be placed in the volume increase that pressure is adjusted the suction space 431a of film 431c below, and its pressure reduces.In this, suction space 431a and the pressure differential of injecting between the part 432 cause pulling force, and described pulling force is injecting part 432 sensing suction space 431a.Therefore, first stop member 463 of first valve 460 that will be communicated with injection part 432 moves to and injects part 432.Then, referring to Fig. 4 A, first stop member 463 is away from detent 462, to open the first exhaust opening 462-1.Because with first support member 464 of spring, so first stop member 463 can be easy to move to suction space 431a as support first stop member 463.The pulling force that first stop member 463 is moved to suction space 431a is compressed to suction space 431a with first support member 464.When pressure being adjusted film 431c and flexibly be deformed to the side relative, close second valve 470 with suction space 431a.
Operation part 434 is adjusted film 431c with the pressure of pumping unit 431 and flexibly is deformed to suction space 431a, to close first valve 460.Therefore, be placed in the volume reducing that pressure is adjusted the suction space 431a of film 431c below, and its pressure increases.In this, suction space 431a and the pressure differential of injecting between the part 432 cause thrust, and described thrust is being injected the part 432 sensings side relative with suction space 431a.Therefore, will move to the side relative with first stop member 463 that injects first valve 460 that part 432 is communicated with injecting part 432.Then, referring to Fig. 4 B, first stop member 463 closely contacts detent 462, to close the first exhaust opening 462-1.The thrust that first stop member 463 is moved to the side relative with suction space 431a prolongs first support member 464.When pressure being adjusted film 431c and flexibly be deformed to suction space 431a, open second valve 470.
Referring to Fig. 5 A and Fig. 5 B, an end of second valve 470 is connected to discharge section 433, and the other end is connected to second supply pipe 490.Second valve 470 comprises: second shell 471, and it has the inner space; Second detent 472, it separates each other on the inwall of second shell 471 and faces each other; Second stop member 473, it is placed in second detent, 472 belows; And second support member 474, it is placed in second stop member, 473 belows to support second stop member 473.Open at the center of second detent 472.The center of opening of second detent 472 is a passage, and the liquid crystal material that is fed in second valve 470 by discharge section 433 passes described passage.Hereinafter the center of opening with second detent 472 is defined as the second exhaust opening 471-1.Spring is used as second support member 474, and sphere is used as second stop member 473.One end of second support member 474 is fixed to the interior section of second shell 471, and the other end supports second stop member 473.Diameter as the comparable second exhaust opening 471-1 of diameter of the sphere of second stop member 473 is big, and littler than the inside diameter of second shell 471.
To Fig. 3 B and Fig. 5 A and Fig. 5 B, the operation according to second valve of the operation of pumping unit will be described now referring to Fig. 2.
At first, operation part 434 is adjusted film 431c with the pressure of pumping unit 431 and flexibly is deformed to suction space 431a, to open second valve 470.Therefore, be placed in the volume reducing that pressure is adjusted the suction space 431a of film 431c below, and its pressure increases.In this, the pressure differential between suction space 431a and the discharge section 433 causes thrust, and described thrust is pointed to the side relative with suction space 431a in discharge section 433.Therefore, second stop member 473 of second valve 470 that will be communicated with discharge section 433 moves to the side relative with discharge section 433.Then, referring to Fig. 5 A, second stop member 473 is away from second detent 472, to open the second exhaust opening 471-1.In this, support second stop member 473 by spring as second support member 474.The thrust that moves second stop member 473 is compressed to the side relative with discharge section 433 with second support member 474.When pressure being adjusted film 431c and flexibly is deformed to suction space 431a, settle as mentioned, close first valve 460.
Operation part 434 is adjusted film 431c with the pressure of pumping unit 431 and flexibly is deformed to the side relative with suction space 431a, to close second valve 470.Therefore, be placed in the volume increase that pressure is adjusted the suction space 431a of film 431c below, and its pressure reduces.In this, the pressure differential between suction space 431a and the discharge section 433 causes pulling (pulling) direction, and described pulling direction is pointed to suction space 431a in discharge section 433.Therefore, second stop member 473 of second valve 470 that will be communicated with discharge section 433 moves to discharge section 433.Then, referring to Fig. 5 B, second stop member 473 closely contacts second detent 472, to close the second exhaust opening 471-1.In this, the pulling force of mobile second stop member 473 extends to discharge section 433 with second support member 474.When pressure being adjusted film 431c and flexibly be deformed to the side relative, open first valve 460 with suction space 431a.
First valve 460 and second valve 470 are not limited to non-return valve as described above.Promptly, first valve 460 and second valve 470 can be any valve, inject opening and closing of part 432 and discharge section 433 as long as will inject pressure differential between the suction space 431a of part 432 and pumping unit 431 and the pressure differential between suction space 431a and the discharge section 433 in order to control.
According to embodiment, when pressure being adjusted film 431c and flexibly be deformed to the side relative, open first valve 460, and close second valve 470 with suction space 431a.In addition, when pressure being adjusted film 431c and flexibly be deformed to suction space 431a, close first valve 460, and open second valve 471.Yet therefore, the invention is not restricted to this, and when pressure being adjusted film 431c and flexibly be deformed to the side relative, can close first valve 460, and can open second valve 470 with suction space 431a.In addition, when pressure being adjusted film 431c and flexibly be deformed to suction space 431a, can open first valve 460, and can close second valve 471.
Fig. 6 A and Fig. 6 B are the cross-sectional view of explanation according to the operation of the droplet unit of one exemplary embodiment.
Substrate S is placed on the platform 100, and droplet unit 400 is placed in the substrate S top.Substrate S can comprise thin film transistor (TFT) and pixel electrode.Droplet unit 400 is in order to drop in liquid crystal material on the substrate S.When liquid crystal material dripped, stand moving-member 300 can be in order to moving horizontally stand 200, and droplet cell moving parts 500 can be in order to move horizontally droplet unit 400.Liquid crystal material is supplied to the suction space 431a of pumping unit 431, so that liquid crystal material is dropped on the substrate S.For this reason, liquid crystal material is fed to first supply pipe 480 from source material reservoir 420, and operation part 434 so that adjusting film 431c, pressure flexibly is deformed to the side relative with suction space 431a through operation, as illustrated in Fig. 6 A.Therefore, the volume of suction space 431a increases, and its pressure reduces.In this, pressure differential between suction space 431a and the injection part 432 and the pressure differential between suction space 431a and the discharge section 433 cause pulling force, and described pulling force is injecting part 432 and discharge section 433 sensing suction space 431a.Therefore, first stop member 463 of first valve 460 that will be communicated with injection part 432 moves to and injects part 432.Therefore, first stop member 463 is away from first detent 462, to open the first exhaust opening 462-1.Therefore, liquid crystal material moves to suction space 431a by the first exhaust opening 462-1 of first valve 460 from first supply pipe 480.When pressure being adjusted film 431c and flexibly be deformed to the side relative with suction space 431a, second stop member 473 of second valve 470 that is communicated with discharge section 433 moves to the side relative with discharge section 433.Therefore, second stop member 473 closely contacts second detent 472, to close the second exhaust opening 471-1.
When suction space 431a fills up the liquid crystal material of scheduled volume, liquid crystal material is dropped on the substrate S by droplet part 450.For this reason, as illustrated in Fig. 6 B, by operation part 434 pressure adjusted film 431c and flexibly be deformed to suction space 431a.Therefore, the volume reducing of suction space 431a, and its pressure increases.In this, pressure differential between suction space 431a and the discharge section 433 and suction space 431a and the pressure differential of injecting between the part 432 cause thrust, and described thrust is being injected part 432 and the discharge section 433 sensings side relative with suction space 431a.Therefore, first stop member 463 of first valve 460 is moved to the side relative with injecting part 432.Therefore, first stop member 463 closely contacts first detent 462, to close the first exhaust opening 461-1.When pressure being adjusted film 431c and flexibly be deformed to suction space 431a, second stop member 473 of second valve 470 moves to the side relative with discharge section 433.Therefore, second stop member 473 is away from second detent 472, to open the second exhaust opening 471-1.Therefore, liquid crystal material moves to second supply pipe 490 by the second exhaust opening 471-1 of the discharge section 433 and second valve 470 from source material supply section 430.Then, liquid crystal material moves to nozzle 451 from second supply pipe 490, and nozzle 451 is discharged to liquid crystal material on the substrate S.
Repeatedly repeat to fill the process of pumping unit 431 and the process that liquid crystal material is discharged to substrate S by the elastic deformation that repeatedly repeats pressure adjustment film 431c with liquid crystal material.
Adjust the pressure that film 431c adjusts this suction space 431a owing to be placed in the pressure of the part top, top of suction space 431a, so, control opening and closing of first valve 460 and second valve 470 not forming under the situation of particle owing to friction.
Although can illustrate in an embodiment liquid crystal material is discharged to liquid crystal substrate treatment facility on the substrate S, can illustrates the substrate-treating apparatus that drips or handle other source material in other embodiments.
According to above-described embodiment, pumping unit comprises the main body with suction space of holding source material, and the pressure that covers the part of suction space and adjust suction space pressure is adjusted film, and first and second valve has different directivity, thus the effectively injection and the discharge of Controlling Source material.That is, pressure is deformed to suction space with adjusting film elasticity, or to the side relative with suction space.In this, the pressure of suction space reduces or increases, source material is injected into suction space or source material is discharged from suction space.Under the situation of not using syringe stem, adjust the pressure of suction space, thereby inject and the discharge source material.Because reciprocal syringe stem is unnecessary in suction space, thus do not exist owing to the friction that causes that contacts between the outer surface of syringe stem and the surface, inside of defining suction space, thus prevent to form particle.Therefore, pollution can be prevented, and therefore, the defective of the equipment of source material can be prevented to use owing to the source material of particle.
Because first and second valve has different directivity, so when source material is injected into suction space by injecting part, can close discharge section effectively.With source material by discharge section when suction space is discharged, can close the injection part effectively.Therefore, source material is injected into suction space and with source material when suction space is discharged, can prevent that source material from leaking.Therefore, can prevent owing to leaking and the defective of process lag.
According to embodiment, the substrate-treating apparatus that does not have an electrovalve has the function corresponding to the electrovalve function.Therefore, the single pipe that syringe is connected to valve is unnecessary, thereby has simplified substrate-treating apparatus.In addition because electrovalve is unnecessary, also be unnecessary so be electrically connected, thereby promoted the droplet unit attached, separate and cleaning.
Although described droplet unit and substrate-treating apparatus with reference to particular exemplary embodiment, it is not limited thereto.Therefore, the those skilled in the art will readily appreciate that, under the situation that does not break away from the spirit and scope of the present invention that defined by claims, can carry out various modifications and change to it.

Claims (18)

1. droplet unit, it comprises:
Pumping unit, it comprises the main body with suction space of holding source material, and the pressure adjustment film that covers the side part of described suction space, described pressure is adjusted film and is configured to flexibly be out of shape;
Inject part, it is connected to described suction space, so that described source material is injected into described suction space;
Discharge section, it is connected to described suction space, so that described source material is discharged from described suction space;
First valve, it has an end that is connected to described injection part, and the connection of described first valve is to control according to the elastic deformation direction of the described pressure adjustment film of described pumping unit; And
Second valve, it has an end that is connected to described discharge section, and the connection of described second valve is to control according to the elastic deformation direction of the described pressure adjustment film of described pumping unit.
2. droplet according to claim 1 unit, wherein when described pressure was adjusted the distortion of film elasticity ground, one in described first valve and second valve opened, and another person closes.
3. droplet according to claim 1 unit, it comprises operation part, described operation part is connected to described pressure and adjusts film, described pressure be deformed to described suction space with adjusting film elasticity or arrive the side relative with described suction space.
4. droplet according to claim 1 unit, wherein said pumping unit comprises fixed part, described fixed part is placed in described pressure and adjusts the top of film so that described pressure adjustment film is fixed to described main body.
5. droplet according to claim 4 unit, wherein said fixed part has through hole at least one part, and of described operation part is partially submerged into to described through hole.
6. according to claim 3 or 5 described droplet unit, wherein said operation part comprises and is connected to the operating axis that described pressure is adjusted film, and vertical moving power is applied to the power section of described operating axis, and
Described operating axis passes the described through hole of described fixed part and be connected to described pressure on the opening of described pumping unit adjusts film.
7. droplet according to claim 6 unit, wherein said pressure are adjusted film and are had the zone that is connected to described operating axis, and
At least described zone flexibly is deformed to described suction space or arrives the described side relative with described suction space.
8. according to claim 5 or 6 described droplet unit, wherein pass the described through hole of described fixed part and be connected to described pressure and adjust the diameter of described operating axis of film less than the described through hole of described fixed part and the inside diameter of described suction space.
9. droplet according to claim 1 unit, the other end of wherein said first valve are connected to first supply pipe that described source material is fed to described first valve, and
The other end of described second valve is connected to second supply pipe that described source material is discharged from described second valve.
10. droplet according to claim 1 unit, wherein said first valve and second valve comprise non-return valve.
11. droplet according to claim 1 unit wherein is deformed to the side relative with described suction space when reducing the pressure of described suction space at described pressure with adjusting film elasticity, described first valve is opened, and described second valve cuts out.
12. droplet according to claim 1 unit wherein is deformed to described suction space when increasing the pressure of described suction space at described pressure with adjusting film elasticity, described first valve cuts out, and described second valve is opened.
13. droplet according to claim 1 unit, wherein said source material comprises liquid crystal material.
14. a substrate-treating apparatus, it comprises:
Placing the platform of substrate;
Be placed in the stand of described platform top, and
The droplet unit is fixed on the described stand and with source material and discharges on described substrate,
Wherein said droplet unit comprises:
Pumping unit, it comprises the main body with suction space of holding described source material, and the pressure adjustment film that covers the side part of described suction space, described pressure is adjusted film and is configured to flexibly be out of shape;
Inject part, it is connected to described suction space, so that described source material is injected into described suction space;
Discharge section, it is connected to described suction space, so that described source material is discharged from described suction space;
First valve, it has an end that is connected to described injection part, and the connection of described first valve is to control according to the elastic deformation direction of the described pressure adjustment film of described pumping unit; And
Second valve, it has an end that is connected to described discharge section, and the connection of described second valve is to control according to the elastic deformation direction of the described pressure adjustment film of described pumping unit.
15. substrate-treating apparatus according to claim 14, wherein when described pressure was adjusted the distortion of film elasticity ground, one in described first valve and second valve opened, and another person closes.
16. substrate-treating apparatus according to claim 14 wherein is deformed to the side relative with described suction space when reducing the pressure of described suction space at described pressure with adjusting film elasticity, described first valve is opened, and described second valve cuts out.
17. substrate-treating apparatus according to claim 14 wherein is deformed to described suction space when increasing the pressure of described suction space at described pressure with adjusting film elasticity, described first valve cuts out, and described second valve is opened.
18. substrate-treating apparatus according to claim 14, wherein said first valve and second valve comprise non-return valve.
CN201110110415.0A 2010-04-30 2011-04-29 Droplet unit and substrate processing device Expired - Fee Related CN102236215B (en)

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CN105934705A (en) * 2014-01-23 2016-09-07 堺显示器制品株式会社 Liquid crystal dropping apparatus and method for manufacturing liquid crystal display device
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KR20110121256A (en) 2011-11-07

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