CN102205973B - 一种蒙脱土纳米片溶胶制备方法 - Google Patents
一种蒙脱土纳米片溶胶制备方法 Download PDFInfo
- Publication number
- CN102205973B CN102205973B CN 201110107965 CN201110107965A CN102205973B CN 102205973 B CN102205973 B CN 102205973B CN 201110107965 CN201110107965 CN 201110107965 CN 201110107965 A CN201110107965 A CN 201110107965A CN 102205973 B CN102205973 B CN 102205973B
- Authority
- CN
- China
- Prior art keywords
- montmorillonite
- sol
- surfactant
- cationic surfactant
- anionic surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002135 nanosheet Substances 0.000 title claims abstract description 17
- 238000000034 method Methods 0.000 title claims abstract description 13
- 239000003093 cationic surfactant Substances 0.000 claims abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000003945 anionic surfactant Substances 0.000 claims abstract description 7
- 239000002994 raw material Substances 0.000 claims abstract description 3
- 239000003381 stabilizer Substances 0.000 claims abstract description 3
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 claims description 41
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 41
- 239000000725 suspension Substances 0.000 claims description 8
- 239000008367 deionised water Substances 0.000 claims description 4
- 229910021641 deionized water Inorganic materials 0.000 claims description 4
- 239000012047 saturated solution Substances 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 2
- 239000006185 dispersion Substances 0.000 claims description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims description 2
- 239000004094 surface-active agent Substances 0.000 claims description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000002086 nanomaterial Substances 0.000 description 3
- DAJSVUQLFFJUSX-UHFFFAOYSA-M sodium;dodecane-1-sulfonate Chemical compound [Na+].CCCCCCCCCCCCS([O-])(=O)=O DAJSVUQLFFJUSX-UHFFFAOYSA-M 0.000 description 3
- 238000003917 TEM image Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 229910018557 Si O Inorganic materials 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005341 cation exchange Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- -1 coatings Substances 0.000 description 1
- 238000001246 colloidal dispersion Methods 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000004299 exfoliation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000009775 high-speed stirring Methods 0.000 description 1
- 230000002687 intercalation Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002114 nanocomposite Substances 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910052604 silicate mineral Inorganic materials 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Images
Landscapes
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
本发明公开了一种蒙脱土纳米片溶胶制备方法，该方法以蒙脱土为原料，以阴离子表面活性剂或阳离子表面活性剂作为稳定剂，水作分散体系，用微波辐射1~10min，蒙脱土层状结构被剥离，得到稳定纳米片溶胶。本发明具有简单，易操作，时间短，效率高等特点。
Description
技术领域
本发明涉及材料制备技术领域，具体地说是一种采用微波法片层剥离蒙脱土制备蒙脱土纳米片溶胶的方法。
背景技术
蒙脱土为含水的层状铝硅酸盐矿物，其理论结构式为：(1/2Ca,Na)x(Al2-xMg)(Si4O10)(OH)·nH2O。它的单位晶胞系由二层Si-O四面体中夹一层Al-(O,OH)八面体所组成。而蒙脱土结构中同晶置换现象极为普遍，如Al3+可以取代四面体中的Si4+，而Mg2+、Fe2+、Zn2+等可以取代八面体中的Al3+。蒙脱土在微观结构上呈规则的片层排布，其层间距约1nm，片层宽厚比约100~1000，在一维尺度上具有纳米结构的材料，宏观上不具备纳米特征，所以通过进行加工改性得到所需纳米材料提供了良好的基础。由于这些特殊的结构特性蒙脱土具有良好的黏结性、膨胀性、胶体分散性、悬浮性、吸附性、催化活性、触变性及阳离子交换性，被广泛应用在工农业、国防、环保等领域。
目前制备剥离型蒙脱土，一种是对蒙脱土进行插层改性，其层间距扩大、亲油性增加后，加入到有机物中，当有机单体在其层间聚合时，片层被进一步扩展达到蒙脱土片层的剥离，得到蒙脱土纳米复合材料。另一种是对钠基蒙脱土进行离子交换处理，加以高速搅拌或高速离心沉降得到纳米分散的蒙脱土悬浮液。还有一种方法是有机插层改性后蒙脱土进行适当的机械研磨得到片层剥离的纳米蒙脱土。剥离型蒙脱土不但具有纳米材料的高比表面积、高活性、高分散性，在化妆品，涂料，添加剂中应用效果提高，而且利用蒙脱土的纳米片状材料可以进行自组装，可以制备一些多功能材料。
发明内容
本发明的目的在于提供一种蒙脱土纳米片溶胶制备方法，该方法利用微波处理一步法制备得到蒙脱土纳米片溶胶，该方法简单，所用时间短，易操作，效果好。
实现本发明目的的具体技术方案是：
一种蒙脱土纳米片溶胶的制备方法，该方法以蒙脱土为原料，表面活性剂为稳定剂，在水分散体系中，微波照射后,，蒙脱土被剥离，得到蒙脱土纳米片溶胶，具体步骤如下：
a、取10︰17重量比的蒙脱土和阳离子表面活性剂或26︰10重量比的蒙脱土和阴离子表面活性剂，先将阳离子表面活性剂或阴离子表面活性剂加入到去离子水中，形成饱和溶液，再将蒙脱土放入所述饱和溶液中，充分搅拌，制得混合均匀的悬浮液；其中，所述阳离子表面活性剂为有机铵阳离子表面活性剂，阴离子表面活性剂为十二烷基磺酸钠；
b、将混合均匀的悬浮液放入频率为2450MHz、功率为800W的微波发生器中辐射1~10分钟，自然冷却，用离心机5000~10000r/min转速离心5~10分钟后，上层吸出，得到蒙脱土纳米片溶胶。
本发明具有工艺简单易行，无需添加额外的设备，生产投入成本低，见效快等特点。
附图说明
图1为实施例1所得蒙脱土纳米片的透射电子显微镜照片；
图2为实施例2所得蒙脱土纳米片的透射电子显微镜照片。
具体实施方式
实施例1
称取2g的蒙脱土和0.8g十二烷基磺酸钠(SDS)，SDS加入到100ml去离子水全部溶解，再把蒙脱土放进去，充分搅拌得到混合均匀的悬浮液。悬浮液放入微波炉里2450MHz频率的微波辐射5分钟，自然冷却后取出，8000r/min离心10分钟，将溶胶轻轻吸出，得到蒙脱土纳米片溶胶。
实施例2
称取0.8g蒙脱土和1.3g十六烷基三甲基溴化铵(CTAB)，将CTAB加入到105ml去离子水中，使十六烷基三甲基溴化铵(CTAB)全部溶解，再把蒙脱土放进去，充分搅拌，放入微波炉里用2450MHz频率的微波加热8min，自然冷却后取出，10000r/min离心10min，将溶胶轻轻吸出，得到蒙脱土纳米片溶胶。
Claims (1)
1.一种蒙脱土纳米片溶胶的制备方法，其特征在于该方法以蒙脱土为原料，表面活性剂为稳定剂，在水分散体系中，微波照射后，蒙脱土被剥离，得到蒙脱土纳米片溶胶，具体步骤如下：
a、取10︰17重量比的蒙脱土和阳离子表面活性剂或26︰10重量比的蒙脱土和阴离子表面活性剂，先将阳离子表面活性剂或阴离子表面活性剂加入到去离子水中，形成饱和溶液，再将蒙脱土放入所述饱和溶液中，充分搅拌，制得混合均匀的悬浮液；其中，所述阳离子表面活性剂为有机铵阳离子表面活性剂，阴离子表面活性剂为十二烷基磺酸钠；
b、将混合均匀的悬浮液放入频率为2450MHz、功率为800W的微波发生器中辐射1~10分钟，自然冷却，用离心机5000~10000r/min转速离心5~10分钟后，上层吸出，得到蒙脱土纳米片溶胶。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110107965 CN102205973B (zh) | 2011-04-28 | 2011-04-28 | 一种蒙脱土纳米片溶胶制备方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110107965 CN102205973B (zh) | 2011-04-28 | 2011-04-28 | 一种蒙脱土纳米片溶胶制备方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102205973A CN102205973A (zh) | 2011-10-05 |
| CN102205973B true CN102205973B (zh) | 2013-01-23 |
Family
ID=44695079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201110107965 Expired - Fee Related CN102205973B (zh) | 2011-04-28 | 2011-04-28 | 一种蒙脱土纳米片溶胶制备方法 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102205973B (zh) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105129802A (zh) * | 2015-08-19 | 2015-12-09 | 常州大学 | 一种碳化硅纳米片的制备方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102659125A (zh) * | 2012-05-10 | 2012-09-12 | 华东师范大学 | 一种机械化学法制备蒙拓土纳米片溶胶的方法 |
| CN104944431B (zh) * | 2015-06-10 | 2017-06-27 | 北京化工大学 | 一种无机超分子双电层二维纳米片及其制备方法 |
| JP7372103B2 (ja) * | 2019-10-04 | 2023-10-31 | 公立大学法人大阪 | ケイ酸ナノシート分散液およびその製造方法 |
-
2011
- 2011-04-28 CN CN 201110107965 patent/CN102205973B/zh not_active Expired - Fee Related
Non-Patent Citations (2)
| Title |
|---|
| 崔会旺等.有机蒙脱土的制备及表征.《化工矿物与加工》.2009,(第3期),第14-17页. * |
| 费进波等.微波辅助化学反应制备纳米高岭石.《岩石矿物学杂志》.2006,第25卷(第4期),第335-337页. * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105129802A (zh) * | 2015-08-19 | 2015-12-09 | 常州大学 | 一种碳化硅纳米片的制备方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102205973A (zh) | 2011-10-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Jiang et al. | Lightweight spongy bone-like graphene@ SiC aerogel composites for high-performance microwave absorption | |
| Zhan et al. | Fabrication of a flexible electromagnetic interference shielding Fe3O4@ reduced graphene oxide/natural rubber composite with segregated network | |
| Chuah et al. | Investigation on dispersion of graphene oxide in cement composite using different surfactant treatments | |
| Wu et al. | Two-step reduction of self-assembed three-dimensional (3D) reduced graphene oxide (RGO)/zinc oxide (ZnO) nanocomposites for electromagnetic absorption | |
| Xu et al. | Graphene oxide-supported zinc oxide nanoparticles for chloroprene rubber with improved crosslinking network and mechanical properties | |
| CN102205973B (zh) | 一种蒙脱土纳米片溶胶制备方法 | |
| Vuluga et al. | Straightforward synthesis of conductive graphene/polymer nanocomposites from graphite oxide | |
| CN102249255B (zh) | 阴离子-非离子复合型有机蒙脱石及其制备方法 | |
| Chen et al. | Electromagnetic and microwave absorbing properties of RGO@ hematite core–shell nanostructure/PVDF composites | |
| CN102241403B (zh) | 阳离子-阴离子复合插层型有机蒙脱石材料及其制备方法 | |
| CN102219231A (zh) | 阳离子-非离子复合型有机蒙脱石及其制备方法 | |
| KR101939968B1 (ko) | 호스트 내에서의 그래핀 비말동반 | |
| CN104760969B (zh) | 一种机械化学改性制备蒙脱石无机凝胶的方法 | |
| Song et al. | Gemini surfactant assisted synthesis of two-dimensional metal nanoparticles/graphene composites | |
| Liu et al. | Improving thermal conductivity of styrene-butadiene rubber composites by incorporating mesoporous silica@ solvothermal reduced graphene oxide hybrid nanosheets with low graphene content | |
| CN105950109B (zh) | 还原氧化石墨烯、二氧化锡和三氧化二铁复合材料 | |
| Baldassari et al. | Microwave versus conventional preparation of organoclays from natural and synthetic clays | |
| CN105293511A (zh) | 一种易分散钠基膨润土及其制备方法 | |
| CN106366418B (zh) | 纳米石墨负载石墨烯纳米带改性聚乙烯薄膜的方法 | |
| CN105733316A (zh) | 一种有机酸盐插层改性蒙脱土的制备方法 | |
| CN103951916A (zh) | 一种rgo/氧化铁填充的聚偏氟乙烯复合吸波材料及其制备方法 | |
| de Carvalho Costa et al. | Thermal and chemical treatments of montmorillonite clay | |
| Pojanavaraphan et al. | Fabrication and characterization of new semiconducting nanomaterials composed of natural layered silicates (Na+-MMT), natural rubber (NR), and polypyrrole (PPy) | |
| CN106277014A (zh) | 预先分散湿法表面改性制备活性超细碳酸钙的方法 | |
| Du et al. | Fabrication of high-performance poly (vinyl alcohol)/MgAl-layered double hydroxide nanocomposites |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130123 |