CN102184821B - Method for manufacturing grid of millimeter-wave traveling wave tube - Google Patents
Method for manufacturing grid of millimeter-wave traveling wave tube Download PDFInfo
- Publication number
- CN102184821B CN102184821B CN 201110090556 CN201110090556A CN102184821B CN 102184821 B CN102184821 B CN 102184821B CN 201110090556 CN201110090556 CN 201110090556 CN 201110090556 A CN201110090556 A CN 201110090556A CN 102184821 B CN102184821 B CN 102184821B
- Authority
- CN
- China
- Prior art keywords
- aperture plate
- grid
- wave tube
- traveling wave
- preparation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
- Plasma Technology (AREA)
Abstract
The invention discloses a method for manufacturing a grid of a millimeter-wave traveling wave tube. The method comprises the following steps of: firstly etching to obtain a planar grid with a required shape on a grid substrate by applying a photoetching technology, then, processing and forming the planar grid by a special spherical forming mold to obtain a spherical-crown-shaped grid, finally polishing the grid to obtain the grid of the millimeter-wave traveling wave tube. The method for manufacturing the grid of the millimeter-wave traveling wave tube, provided by the invention, has the advantages of strong maneuverability and reasonable technical design, and can be used for processing and manufacturing small-size, thin and complexly-shaped spherical grids with special size requirement; the grid manufactured with the method disclosed by the invention has the advantages of no burrs on the surface, low fire striking probability, high qualification rate, stable performances and very important application value.
Description
Technical field
The present invention designs a kind of preparation method of travelling wave tube part, is specifically related to the preparation method of the aperture plate of a kind of millimeter wave or miniaturization grid-control TWT.
Background technology
Travelling wave tube is the microwave tube that a kind of speed by the modulation electron beam realizes enlarging function, the characteristics of travelling wave tube are bandwidths, gain is high, dynamic range is large and noise is low, travelling wave tube frequency bandwidth (frequency band height two ends frequency poor/centre frequency) can reach more than 100%, gain is in 25～70 decibels of scopes, the noise factor of low-noise traveling-wave tube is minimum to reach 1～2 decibel, and therefore modern travelling wave tube has become radar, electronic countermeasures, trunking traffic, satellite communication, the live telecast satellite, navigation, remote sensing, remote control, the important microwave electronic device of the electronic equipments such as remote measurement.Millimeter wave traveling wave tube has with wide, the characteristics such as wave beam is narrow, the impact of propagation climate is little, size Xiao Yi miniaturization, wherein aperture plate is the strength member of millimeter wave traveling wave tube, but the processing method of existing sphere aperture plate is lathe to be struck out the sphere blank and uses the spark machined aperture plate again, the aperture plate that this method prepares is mostly jagged large, the shortcoming that the concentricity of wheel and symmetry are difficult to guarantee, and the aperture plate size of millimeter wave or miniaturization grid-control TWT is too little, spoke is many, almost can't adopt spark machined.And because Fixture Design is unreasonable, often cause the incorrect or grid silk fracture of radius of curvature of aperture plate spherical crown during prior art aperture plate sphere forming, qualification rate is lower; And the aperture plate that prior art prepares is because surperficial burr is many, and aperture plate sparking probability is larger, and the travelling wave tube quality of assembling is unstable.
Summary of the invention
Goal of the invention: the objective of the invention is provides a kind of strong operability in order to solve the deficiencies in the prior art, and technological design is reasonable, and the energy preparation size is little, wire-grid structure is complicated, and the preparation method of the aperture plate of surperficial carrot-free millimeter wave traveling wave tube.
Technical scheme: in order to realize above purpose, the technical solution used in the present invention is:
A kind of preparation method of aperture plate of millimeter wave traveling wave tube, it may further comprise the steps:
(a) according to the size of the required aperture plate size design of reality plane aperture plate, according to plane aperture plate selection of dimension aperture plate base material, remove the contaminant particles of aperture plate substrate surface, on the aperture plate base material, apply photoresist with rotation mode, then 85～120 ℃ of hot plates cure and (removed the photoresist partial solvent in 30～60 seconds under vacuum state, strengthen its adhesion, discharge the stress in the photoresist film, prevent that photoresist from staining equipment), then with the photoresist on mask plate and the raster graphic aligning aperture plate base material, then use optics mask aligner (high-pressure mercury lamp, the light that it produces is ultraviolet light) exposure, adopt after the exposure to revolve and cover the submergence mode and develop, thereby remove non-polymeric photoresist, after developing on 100～200 ℃ of hot plates hard baking (can evaporate the solvent of photoresist the inside fully in 1 to 2 minute; Post bake is protected the ability of lower surface in Implantation or etching to improve photoresist; Further strengthen the adhesion between photoresist and the substrate surface; Further reduce standing wave effect), adopt reactive ion method or inductive couple plasma method to carry out etching after the hard baking, remove the photoresist of substrate surface after the etching, can obtain at base material the plane aperture plate of raster graphic, for subsequent use;
(b) get the plane aperture plate that step (a) obtains and carry out sphere forming technique, at first lower cavity die (1) and copper base (2) are packed in the pedestal (3), then the plane aperture plate is placed on the copper base (2), and upper cavity die (4) is pressed on the aperture plate, and be placed on after compressing with housing screw (5) and be heated to 320 ℃ on the electric furnace, then move to rapidly on the hydraulic press after punch (6) being put into upper cavity die (4), punch (6) top is applied the pressure of 2～5Mpa, and pressurize unloaded frock after 1 to 2 minute, turning aperture plate cylindrical, and with chromic acid removal copper base, obtain lattice, for subsequent use;
(c) get the lattice that step (b) obtains, carrying out electrobrightening processes, at first aperture plate being put into concentration is that 20% sodium hydroxide solution boils grease and the oxide of removing the aperture plate surface in 30 to 40 minutes, then after taking out aperture plate was immersed chromic acid 8～12 seconds, then take out aperture plate and be immersed in the ferrous metal fused mass of removing the aperture plate surface in water-ammonia water-hydrogen peroxide solution that ratio is 1:1:1 in 5 to 8 minutes, then take out aperture plate at H
3PO
4-H
2SO
4-NiSO
4-H
2In the system solution of O, with 16 to 20 volts of voltages, 20 to 50 ℃ of polishings of temperature 2 to 15 seconds were immersed aperture plate chromic acid 2 to 5 seconds after the polishing again, and at last dehydration is dried and be get final product.
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, the described aperture plate base material of step (a) is molybdenum or molybdenum rhenium, thickness can be 0.03～0.1mm, can effectively reduce the grid temperature, reduces the electron emission of grid.
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, the described photoresist of step (a) is linear phenolic resin (phenolic aldehyde formaldehyde) positive photoresist, the thickness of coating can be 0.5～1.5 μ m.
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, the used developer solution of step (a) development is Tetramethylammonium hydroxide.
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, step (a) adopts optical lithography machine contact exposure (being the direct and photoresist layer contact exposure of mask plate), perhaps adopts projection exposure (using the lens gathered light to realize exposure between mask plate and the photoresist).
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, step (b) place the copper base first hydrogen-burning stove 850 ℃ of annealing in hydrogen atmosphere annealing in process 20 minutes before mounting tool, can reduce like this hardness of copper base.The present invention designs the special tooling of aperture plate sphere forming in step (b), and the pressure of the present invention during to the moulding of aperture plate spherical crown screens, because the too small aperture plate of pressure does not reach required spherical crown height, but pressure is excessive, spherical crown is yielding, the present invention is 2～5Mpa through the optimal pressure range that preferably obtains sphere forming, more preferably 4.5～5Mpa, and pressurize can obtain good sphere aperture plate in 1 minute, and the aperture plate straight flange after the moulding is smooth, grid silk non-cracking, the radius of curvature accuracy of aperture plate spherical crown is high, performance is good, oval spherical crown phenomenon when the prior art moulding not occurring, and qualification rate promotes more than 1 times.
As preferred version, the preparation method of the aperture plate of above-described millimeter wave traveling wave tube, the described H of step (c)
3PO
4-H
2SO
4-NiSO
4-H
2The system solution of O consists of: H
3PO
4400～450ml, H
2SO
4150～200ml, NiSO
440～60g, H
2O150～200ml.
The present invention adopts the mode of voltage stabilizing that spherical aperture plate is carried out polishing, according to R=Ρ L/S, (Ρ represents the coefficient of material, L represents aperture plate apart from the distance of anode, and S represents the area of aperture plate), U=IR, I is proportional to S, be that the aperture plate area is larger in the constant situation of other factors, electric current is larger, the large grid silk of electric current quantity of heat production is large, the present invention is 16 to 20 volts by the optimum voltage scope of great many of experiments screening aperture plate electrobrightening, and experimental result shows, when voltage during less than 16 volts, the burr on aperture plate surface can not fully be removed, the polishing effect of aperture plate is poor, appoint so to have sparking hidden danger, but voltage is during greater than 20 volts, electric current is excessive, thin grid silk blows easily, so the optimum voltage of electrobrightening aperture plate of the present invention is 16～20 volts, preferred 18 volts.
Polishing time is relevant with the aperture plate surplus, and simultaneously the present invention has carried out preferably polishing time, because polishing time is oversize, etching extent is too large, the grid silk is easily broken, but polishing time is too short, does not reach equally the effect of polishing, the present invention through great many of experiments relatively, filtering out best polishing time is 2～15 seconds, is more preferably 4 to 5 seconds, can not only remove burr fully, the polishing effect of aperture plate is good, and can not damage the grid silk.
Polish temperature also affects the key factor of polishing effect simultaneously, because polish temperature is excessively low, the aperture plate surface finish is inhomogeneous, piebald can appear in the aperture plate surface when serious, but excess Temperature polishes too violent, the bubble that produces makes the surface of aperture plate produce pit, affect the performance of aperture plate, the present invention is 25～50 ℃ through the best polish temperature that great many of experiments filters out aperture plate, is more preferably 30 to 45 ℃.
Electrolytic polishing liquid provided by the invention; phosphoric acid is main component in the component; it not only plays dissolution but also can form phosphate coating on the aperture plate surface in polishing process; avoid the surface that excessive dissolution occurs thereby can play, and the stickiness that the generation that can suppress to corrode can increase again solution simultaneously make the surface form the effect of mucous layer.
Sulfuric acid helps to improve the conductivity of electropolishing liquid in the component, improves dispersibility and anodic current efficiency, and sulfuric acid is conducive to the dissolving leveling of metal surface, roughness and the quality of finish on improvement surface.And the molybdenum trisulfate in the component helps to improve the effect of conductive capability and the buffered etch of polishing fluid, and the proportioning of above each component determines that through the orthogonal experiment screening polishing effect is good in molybdenum gate screen electrobrightening process.
Beneficial effect: the preparation method of the aperture plate of millimeter wave traveling wave tube provided by the invention compared with prior art has the following advantages:
1, the preparation method of the aperture plate of millimeter wave traveling wave tube provided by the invention, workable, technological design is reasonable, at first use the plane aperture plate that photoetching technique etching on the aperture plate base material obtains required shape, then adopt special-purpose sphere forming mould that plane aperture plate machine-shaping is obtained lattice, the sphere aperture plate amount of tension after the moulding is little, straight flange is smooth, grid silk non-cracking, the radius of curvature accuracy of aperture plate spherical crown is high, and performance is good; Adopt again at last preferred version, aperture plate is carried out polishing, can effectively remove the burr on aperture plate surface, reduce the sparking probability of aperture plate, improve the performance of aperture plate.
2, the preparation method of the aperture plate of millimeter wave traveling wave tube provided by the invention, it is little to process preparation size, material is thin, aperture plate is complex-shaped, the sphere aperture plate of special size requirement is arranged, as: grid, honeycomb grid, hole grid etc., the aperture plate for preparing can assemble the travelling wave tube of millimeter wave or miniaturization, has important using value.
Description of drawings
The structural representation of used moulds of industrial equipment when Fig. 1 is aperture plate sphere forming of the present invention.
Fig. 2 is the structural representation of the dispersion shape aperture plate of the millimeter wave traveling wave tube for preparing of method of the present invention.
Fig. 3 is the structural representation that 20 grades of the millimeter wave traveling wave tube for preparing of method of the present invention are divided aperture plate.
Embodiment:
Below in conjunction with the drawings and specific embodiments, further illustrate the present invention, should understand these embodiment only is used for explanation the present invention and is not used in and limits the scope of the invention, after having read the present invention, those skilled in the art all fall within the application's claims limited range to the modification of the various equivalent form of values of the present invention.
The preparation of the aperture plate of embodiment 1 millimeter wave traveling wave tube
(a) size of design plane aperture plate, be the aperture plate molybdenum base material of 0.06mm according to plane aperture plate selection of dimension thickness, remove the contaminant particles of aperture plate molybdenum substrate surface, at aperture plate molybdenum substrate surface with rotation mode (500 rev/mins of low speed rotation, drip glue, 3000 rev/mins are accelerated rotation, whirl coating, solvent flashing) coating thickness is the linear phenolic resin positive photoresist of 1 μ m, then 110 ℃ of hot plates cured 30 seconds under vacuum state, then with the photoresist on mask plate and the dispersion shape raster graphic aligning aperture plate molybdenum base material, then use optics mask aligner (high-pressure mercury lamp) projection exposure to process, the rear employing of exposure is revolved the submergence mode of covering and (is sprayed enough developer solutions to substrate surface, and formation puddle shape makes the mobile maintenance of developer solution lower, to reduce the variation of edge developing rate, base material is fixed or slowly rotation, adopts repeatedly to revolve and covers developer solution: apply for the first time, kept 10～30 seconds, remove; Apply for the second time, keep, remove, dry with the deionized water rinsing rotation at last) develop (the used developer solution that develops is Tetramethylammonium hydroxide), thereby remove non-polymeric photoresist, on 150 ℃ of hot plates, firmly dried by the fire 2 minutes after developing, adopt the inductive couple plasma method to carry out etching after the hard baking, remove remaining photoresist on the molybdenum substrate surface after the etching, obtain the plane aperture plate of dispersion shape, for subsequent use;
(b) as shown in Figure 1, get the plane aperture plate that step (a) obtains and carry out sphere forming technique, at first copper base (2) is placed hydrogen-burning stove 850 ℃ of annealing in hydrogen atmosphere annealing in process 20 minutes, then lower cavity die (1) and copper base (2) are packed in the pedestal (3), then the plane aperture plate is placed on the copper base (2), and upper cavity die (4) is pressed on the aperture plate, and be placed on after compressing with housing screw (5) and be heated to 320 ℃ on the electric furnace, then move to rapidly on the hydraulic press after punch (6) being put into upper cavity die (4), punch (6) top is applied the pressure of 4.5Mpa, and pressurize unloaded frock after 1 minute, turning aperture plate cylindrical, and with chromic acid removal copper base (2), obtain lattice, for subsequent use;
(c) get the lattice that step (b) obtains, carrying out electrobrightening processes, at first aperture plate being put into concentration is that 20% sodium hydroxide solution boils grease and the oxide of removing the aperture plate surface in 30 minutes, then after taking out aperture plate was immersed chromic acid 10 seconds, then take out aperture plate and be immersed in the ferrous metal fused mass of removing the aperture plate surface in water-ammonia water-hydrogen peroxide solution that ratio is 1:1:1 in 8 minutes, then take out aperture plate at H
3PO
4-H
2SO
4-NiSO
4-H
2In the system solution of O, with 18 volts of voltages, 35 ℃ of polishings of temperature 4 seconds were immersed aperture plate chromic acid 2 seconds after the polishing again, at last dehydration, and it is 0.06mm that oven dry namely gets thickness, and the surface is without the sphere aperture plate of the millimeter wave traveling wave tube of burr dispersion shape, and structure is as shown in Figure 2.
The described H of above step (c)
3PO
4-H
2SO
4-NiSO
4-H
2The system solution of O consists of: H
3PO
4450ml, H
2SO
4200ml, NiSO
460g, H
2O 200ml.
The preparation of the aperture plate of embodiment 2 millimeter wave traveling wave tubes
(a) size of design plane aperture plate, be the aperture plate molybdenum rhenium base material of 0.08mm according to plane aperture plate selection of dimension thickness, remove the contaminant particles of aperture plate molybdenum rhenium substrate surface, be coated with (500 rev/mins of low speed rotation at aperture plate molybdenum substrate surface with rotation mode, drip glue, 3000 rev/mins are accelerated rotation, whirl coating, solvent flashing) covers the linear phenolic resin positive photoresist that thickness is 0.6 μ m, then 120 ℃ of hot plates cured 30 seconds under vacuum state, then mask plate and 20 etc. are divided the photoresist on the raster graphic aligning aperture plate molybdenum base material, then use optics mask aligner (high-pressure mercury lamp) projection exposure to process, the rear employing of exposure is revolved the submergence mode of covering and (is sprayed enough developer solutions to substrate surface, and formation puddle shape makes the mobile maintenance of developer solution lower, to reduce the variation of edge developing rate, base material is fixed or slowly rotation, adopts repeatedly to revolve and covers developer solution: apply for the first time, kept 10～30 seconds, remove; Apply for the second time, keep, remove, dry with the deionized water rinsing rotation at last) develop (the used developer solution that develops is Tetramethylammonium hydroxide), thereby remove non-polymeric photoresist, on 200 ℃ of hot plates, firmly dried by the fire 1 minute after developing, adopt the inductive couple plasma method to carry out etching after the hard baking, remove remaining photoresist on the molybdenum rhenium substrate surface after the etching, obtain the plane aperture plate of 20 minute shapes such as grade, for subsequent use;
(b) get the plane aperture plate that step (a) obtains and carry out sphere forming technique, at first lower cavity die (1) and copper base (2) are packed in the pedestal (3), then the plane aperture plate is placed on the copper base (2), and upper cavity die (4) is pressed on the aperture plate, and be placed on after compressing with housing screw (5) and be heated to 320 ℃ on the electric furnace, then move to rapidly on the hydraulic press after punch (6) being put into upper cavity die (4), punch (6) top is applied the pressure of 3Mpa, and pressurize unloaded frock after 2 minutes, turning aperture plate cylindrical, and with chromic acid removal copper base (2), obtain lattice, for subsequent use;
(c) get the lattice that step (b) obtains, carrying out electrobrightening processes, at first aperture plate being put into concentration is that 20% sodium hydroxide solution boils grease and the oxide of removing the aperture plate surface in 40 minutes, then after taking out aperture plate was immersed chromic acid 8 seconds, then take out aperture plate and be immersed in the ferrous metal fused mass of removing the aperture plate surface in water-ammonia water-hydrogen peroxide solution that ratio is 1:1:1 in 6 minutes, then take out aperture plate at H
3PO
4-H
2SO
4-NiSO
4-H
2In the system solution of O, with 20 volts of voltages, temperature 50 C polishing 6 seconds was immersed aperture plate chromic acid 4 seconds after the polishing again, at last dehydration, and oven dry namely gets 20 five equilibriums, and thickness is 0.08mm, the sphere aperture plate of surperficial carrot-free millimeter wave traveling wave tube, structure is as shown in Figure 3.
The described H of above step (c)
3PO
4-H
2SO
4-NiSO
4-H
2The system solution of O consists of: H
3PO
4400ml, H
2SO
4150ml, NiSO
440g, H
2O 150ml.
The aperture plate of the millimeter wave traveling wave tube for preparing through method provided by the invention, precision is high, stable performance, the electron emission of the millimeter wave traveling wave tube grid that assembling obtains is low, and aperture plate sparking probability is low, good stability.
The above only is preferred implementation of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (2)
1. the preparation method of the aperture plate of a millimeter wave traveling wave tube is characterized in that, it may further comprise the steps:
(a) size of design plane aperture plate, according to plane aperture plate selection of dimension aperture plate base material, remove the contaminant particles of aperture plate substrate surface, on the aperture plate base material, apply photoresist with rotation mode, then 85 ~ 120 ℃ of hot plates cured 30 ~ 60 seconds under vacuum state, then with the photoresist on mask plate and the raster graphic aligning aperture plate base material, then use the optics photo-etching machine exposal, adopt after the exposure to revolve and cover the submergence mode and develop, thereby remove non-polymeric photoresist, hard baking 1 to 2 minute on 100 ~ 200 ℃ of hot plates after developing, adopt reactive ion method or inductive couple plasma method to carry out etching after the hard baking, remove photoresist after the etching, obtain the plane aperture plate, for subsequent use;
(b) get the plane aperture plate that step (a) obtains and carry out sphere forming technique, at first lower cavity die (1) and copper base (2) are packed in the pedestal (3), then the plane aperture plate is placed on the copper base (2), and upper cavity die (4) is pressed on the aperture plate, and be placed on after compressing with housing screw (5) and be heated to 320 ℃ on the electric furnace, then move to rapidly on the hydraulic press after punch (6) being put into upper cavity die (4), punch (6) top is applied the pressure of 2 ~ 5Mpa, and pressurize unloaded frock after 1 to 2 minute, turning aperture plate cylindrical, and with chromic acid removal copper base (2), obtain lattice, for subsequent use;
(c) get the lattice that step (b) obtains, carrying out electrobrightening processes, at first aperture plate being put into concentration is that 20% sodium hydroxide solution boils grease and the oxide of removing the aperture plate surface in 30 to 40 minutes, then after taking out aperture plate was immersed chromic acid 8 ~ 12 seconds, then take out aperture plate and be immersed in the ferrous metal fused mass of removing the aperture plate surface in water-ammonia water-hydrogen peroxide solution that ratio is 1:1:1 in 5 to 8 minutes, then take out aperture plate at H
3PO
4-H
2SO
4-NiSO
4-H
2In the system solution of O, with 16 to 20 volts of voltages, 25 to 50 ℃ of polishings of temperature 2 to 15 seconds were immersed aperture plate chromic acid 2 to 5 seconds after the polishing again, and at last dehydration is dried and be get final product.
2. the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, the described aperture plate base material of step (a) is molybdenum or molybdenum rhenium, and thickness is 0.03 ~ 0.1mm.
3, the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, the described photoresist of step (a) is the linear phenolic resin positive photoresist, thickness 0.5 ~ 1.5 μ m of coating.
4, the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, the used developer solution of step (a) development is Tetramethylammonium hydroxide.
5, the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, step (a) adopts optical lithography machine contact exposure or projection exposure.
6, the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, step (b) places copper base (2) first hydrogen-burning stove 850 ℃ of annealing in hydrogen atmosphere annealing in process 20 minutes before mounting tool.
7, the preparation method of the aperture plate of millimeter wave traveling wave tube according to claim 1 is characterized in that, the described H of step (c)
3PO
4-H
2SO
4-NiSO
4-H
2The system solution of O consists of: H
3PO
4400 ~ 450ml, H
2SO
4150 ~ 200ml, NiSO
440 ~ 60g, H
2O150 ~ 200ml.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110090556 CN102184821B (en) | 2011-04-12 | 2011-04-12 | Method for manufacturing grid of millimeter-wave traveling wave tube |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110090556 CN102184821B (en) | 2011-04-12 | 2011-04-12 | Method for manufacturing grid of millimeter-wave traveling wave tube |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102184821A CN102184821A (en) | 2011-09-14 |
| CN102184821B true CN102184821B (en) | 2013-04-17 |
Family
ID=44570979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201110090556 Expired - Fee Related CN102184821B (en) | 2011-04-12 | 2011-04-12 | Method for manufacturing grid of millimeter-wave traveling wave tube |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102184821B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103854936B (en) * | 2012-12-07 | 2017-08-25 | 中国科学院电子学研究所 | A kind of manufacture method of rectangle comb-type slow wave structure |
| CN103531414B (en) * | 2013-10-14 | 2016-03-02 | 南京三乐电子信息产业集团有限公司 | A kind of picosecond pulse laser cutting preparation method of grid-control TWT aperture plate |
| CN103901236B (en) * | 2014-03-06 | 2016-04-20 | 广东工业大学 | A kind of hyperfine electrodeless metallic filaments grid mesh packaging ring |
| CN106847651A (en) * | 2016-07-11 | 2017-06-13 | 安徽华东光电技术研究所 | A kind of Electronic Control aperture plate and preparation method based on molybdenum base bottom |
| CN106298401B (en) * | 2016-08-31 | 2018-10-23 | 安徽华东光电技术研究所 | Tool die for forming spherical grid and spherical grid forming method |
| CN108796503A (en) * | 2018-06-12 | 2018-11-13 | 睿惢思工业科技（苏州）有限公司 | A kind of manufacture craft of speaker net |
| CN110931330A (en) * | 2019-12-23 | 2020-03-27 | 安徽华东光电技术研究所有限公司 | Preparation process of honeycomb spherical grid mesh |
| CN110919304B (en) * | 2020-01-09 | 2021-07-06 | 安徽华东光电技术研究所有限公司 | Method for processing grid of vacuum microwave oscillation source |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864590A (en) * | 2010-04-26 | 2010-10-20 | 南京三乐电子信息产业集团有限公司 | Electrolytic solution used for molybdenum gate screen electrolytic polishing and preparation method and application thereof |
| CN101864559A (en) * | 2010-04-26 | 2010-10-20 | 南京三乐电子信息产业集团有限公司 | Grid mesh magnetron sputtering hafnium evaporation method |
| CN101985202A (en) * | 2010-11-01 | 2011-03-16 | 安徽华东光电技术研究所 | Manufacturing process of multi-beam traveling wave tube grid |
-
2011
- 2011-04-12 CN CN 201110090556 patent/CN102184821B/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101864590A (en) * | 2010-04-26 | 2010-10-20 | 南京三乐电子信息产业集团有限公司 | Electrolytic solution used for molybdenum gate screen electrolytic polishing and preparation method and application thereof |
| CN101864559A (en) * | 2010-04-26 | 2010-10-20 | 南京三乐电子信息产业集团有限公司 | Grid mesh magnetron sputtering hafnium evaporation method |
| CN101985202A (en) * | 2010-11-01 | 2011-03-16 | 安徽华东光电技术研究所 | Manufacturing process of multi-beam traveling wave tube grid |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102184821A (en) | 2011-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102184821B (en) | Method for manufacturing grid of millimeter-wave traveling wave tube | |
| TWI532073B (en) | Method and system for modifying substrate relief features using ion implantation | |
| US10363687B2 (en) | Mold and method for manufacturing the same | |
| CN102795591B (en) | Method for reducing metal secondary electron yield by utilizing regular array structure | |
| JPS58157975A (en) | Plasma etching method | |
| TWI646598B (en) | Microscopic three-dimensional structure forming method and microscopic three-dimensional structure | |
| US20230174416A1 (en) | Method for etching curved substrate | |
| CN101625971A (en) | Method for etching class-III nitride by using photo-assisted oxidation wet method | |
| CN111039253A (en) | Groove composite multi-protrusion structure and preparation process thereof | |
| JP2014043068A (en) | Fine pattern forming roll | |
| US20220051903A1 (en) | Preparation method for accurate pattern of integrated circuit | |
| JP4399310B2 (en) | Dry etching method, microlens array and manufacturing method thereof | |
| CN101752210A (en) | Reduce the residual charge method of plasma etching industrial | |
| CN201160337Y (en) | Apparatus for transmitting plasma | |
| CN111146051A (en) | Electronic beam hole forming device and method for terahertz-level folded waveguide traveling-wave tube | |
| JPH0770510B2 (en) | Plasma processing device | |
| JPH06180277A (en) | Preparation of sample for transmission electron microscope | |
| CN118280830A (en) | Etching method and etching system | |
| CN106226851B (en) | Micro-lens array and manufacturing method thereof | |
| CN112289665A (en) | Ultrathin refractory metal grid mesh of field emission cathode and preparation method thereof | |
| JPS60119053A (en) | Formation of high-luminance ion beam | |
| RU2597373C1 (en) | Method of producing metal films with given shape | |
| CN115831721A (en) | Hard mask etching method based on side wall protection | |
| CN118206070A (en) | Manufacturing and wet sharpening method for high-aspect-ratio silicon nano cone array | |
| CN112289664A (en) | Terahertz vacuum electronic device cold cathode grid and preparation method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130417 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |