CN102163006A - Fully automatic stepping digital lithography device - Google Patents

Fully automatic stepping digital lithography device Download PDF

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Publication number
CN102163006A
CN102163006A CN 201110098132 CN201110098132A CN102163006A CN 102163006 A CN102163006 A CN 102163006A CN 201110098132 CN201110098132 CN 201110098132 CN 201110098132 A CN201110098132 A CN 201110098132A CN 102163006 A CN102163006 A CN 102163006A
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CN
China
Prior art keywords
connected
slm
programmable
digital
program controlled
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CN 201110098132
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Chinese (zh)
Inventor
付裕芳
王平奇
罗宁宁
肖孟超
邹文栋
雷刚
高益庆
龚勇清
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南昌航空大学
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Priority to CN 201110098132 priority Critical patent/CN102163006A/en
Publication of CN102163006A publication Critical patent/CN102163006A/en

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Abstract

The invention provides a fully automatic stepping digital lithography device. An industrial control computer is respectively connected with an SLM (spatial light modulator) driver, a digital image acquisition card and a digital control card, wherein the digital control card is connected with a program controlled switch controller; the program controlled switch controller is respectively connected with a program controlled ultraviolet light source and a program controlled three-dimensional precise work-piece table controller; the program controlled ultraviolet light source is connected with an SLM; the SLM is respectively connected with the SLM driver and a beam splitter; the beam splitter is respectively connected with a CCD (charge coupled device) and a precise lens; the precise lens is connected with the program controlled three-dimensional precise work-piece table controller; and the CCD is connected with the digital image acquisition card. The fully automatic stepping digital lithography device has the advantages of reducing the manual factor to the lowest degree with high design precision and good stability.

Description

一种全自动步进数字化光刻装置 Full-automatic digital lithography stepper apparatus

技术领域 FIELD

[0001] 本发明涉及一种步进数字化光刻装置,尤其涉及一种全自动步进数字化光刻装置。 [0001] The present invention relates to a digital stepper lithography apparatus, in particular, it relates to a fully automatic digital lithography stepper apparatus.

背景技术 Background technique

[0002] 在微光学技术迅速发展的今天,越来越多的科学研究和应用实践依赖于数字化的方法来实现,这已成为当前紧迫的技术难题,成为科研生产的一个亟待解决的瓶颈问题。 [0002] In the rapid development of micro-optical technology today, more and more dependent on scientific research and practical application of digital methods to achieve, it has become urgent technical problems, research and production bottlenecks become a serious problem. 随着计算机控制技术的快速发展,基于数字化光刻系统及控制方法,已被证实具有很高的器件制作精度和效率,且减少了人为不利因素的影响。 With the rapid development of computer control technology, digital lithography system and control method based on, it has been shown to have high device fabrication accuracy and efficiency, and reduce the negative influence of human factors. 可以利用全自动步进数字化光刻系统来进行光刻的实验制作。 Experiments may be produced using photolithography digital automatic stepping lithographic system.

发明内容 SUMMARY

[0003] 本发明的目的在于提供了一种全自动步进数字化光刻装置,该装置是通过计算机编程控制光刻系统的各个部件,提高了系统的稳定性、可靠性,及微光学器件制作的精度和性能。 [0003] The object of the present invention to provide a digital automatic stepping lithographic apparatus, various components of the apparatus is controlled by a computer programmed lithography system, improve the stability, reliability, and production of micro-optical devices the accuracy and performance. 当进行光刻实验时,我们将要进行实验的数字掩模图形由工控机经SLM(空间光调制器)驱动器输出到SLM上,采用程控紫外光源来实现对曝光时间的设定,使得曝光时间的精度更高。 When photolithography experiment, we are going to be digitally output by the mask pattern experiment by IPC SLM (spatial light modulator) to drive the SLM, the ultraviolet light source is achieved using programmable setting of the exposure time, such that the exposure time higher accuracy. 使用高分辨率CCD (电荷耦合器件)使得观察要曝光对准的数字掩模图形的清晰度更高,从而曝光光刻图形效果更好。 Using a high resolution CCD (Charge Coupled Device) so that the alignment was observed to be higher definition digital exposure mask pattern, thereby exposing the lithographic pattern better. 利用程控三维精密工件台控制器控制程控三维精密工件台的精密定位,有效提高了器件制作的精度和效率。 Using a programmable controller to control the three-dimensional precision workpiece dimensional precision positioning programmable precision stage, improve the accuracy and efficiency of the device fabrication.

[0004] 本发明是这样来实现的,它包括工控机、数字控制卡、程控开关控制器、SLM驱动器、程控紫外光源、程控三维精密工件台控制器、数字图像采集卡、SLM、分束镜、精缩透镜、 程控三维精密工件台、CCD,其特征是工控机分别连接SLM驱动器、数字图像采集卡和数字控制卡,数字控制卡连接程控开关控制器,程控开关控制器分别连接程控紫外光源和程控三维精密工件台控制器,程控紫外光源连接SLM,SLM分别连接SLM驱动器和分束镜,分束镜分别连接CXD和精缩透镜,精缩透镜连接程控三维精密工件台,CXD连接数字图像采集卡。 [0004] The present invention is implemented, including industrial, digital control card, programmable switch controller, the SLM drive, programmable source of ultraviolet light, three-dimensional precision parts programmable controllers, digital frame grabbers, the SLM, the beam splitter , minified lens, programmable dimensional precision of the workpiece table, CCD, characterized in that the IPC is connected SLM drive, a digital image acquisition card and a digital control card, a digital card connectors programmable switch controller, the switch controller is connected programmable programmable source of ultraviolet light and programmable dimensional precision work station controller, programmable source of ultraviolet light connected SLM, SLM respectively connected SLM driver and a beam splitter, a beam splitter connected CXD and minified lens, reduction-lens is connected programmable dimensional precision of the workpiece table, CXD connected to the digital image capture card.

[0005] 本发明的技术效果是:该装置把人为因素的影响降到了最低,并且设计的精度高、 稳定性好。 [0005] Technical effects of the invention are: the influence of human factors of the device to a minimum, and high design accuracy, good stability. 主要体现在以下几点:1、使用高精度程控紫外光源,明显消除了曝光光源不稳定对光刻系统的影响。 Mainly in the following points: 1, a high-precision programmable ultraviolet light source, exposure light source significantly eliminate the influence of the unstable lithography system. 2、采用积木式模块化设计,系统硬件的各个组成部分均采用高精度的部件,最大限度降低了部件对系统性能的影响。 2, using the building block of modular design, the various components of the system hardware components are high-precision, minimize the impact on system performance member. 3、使用高性能工控机,实现了对系统各部件更有效控制。 3, a high performance industrial computer, a more effective control of the system components. 4、采用高灵敏CCD作为监视成像器件可以获得高分辨率的像,从而使调焦成像更精确。 4, a monitoring use of highly sensitive CCD imaging device can be obtained high-resolution image, so that more accurate image focusing. 5采用高精密的程控三维精密工件台,使得光刻系统的平稳性精度更高,从而使器件制的定位更精确、精度更高。 5 programmable high precision dimensional precision of the work station, so that stability higher precision lithography system, so that the positioning device made more precise and more accurate.

附图说明 BRIEF DESCRIPTION

[0006] 图1为本发明的原理图。 [0006] FIG. 1 is a schematic diagram of the present invention.

[0007] 在图中,1、工控机2、数字控制卡3、程控开关控制器4、SLM驱动器5、程控紫外光源6、程控三维精密工件台控制器7、数字图像采集卡8、SLM 9、分束镜10、精缩透镜11、程控三维精密工件台12、CXD。 [0007] In the drawings, 1, IPC 2, a digital control card 3, programmable switch controller 4, SLM driver 5, 6 programmable source of ultraviolet light, three-dimensional precision parts programmable controllers 7, digital image acquisition card 8, SLM 9 , beam splitter 10, a lens 11 minified, programmable dimensional precision of the workpiece table 12, CXD.

具体实施方式 Detailed ways

[0008] 如图1所示,本发明是这样实现的,一种全自动步进数字化光刻装置,工控机(1) 分别连接SLM驱动器G)、数字图像采集卡(7)和数字控制卡(2),数字控制卡(2)连接程控开关控制器(3),程控开关控制器C3)分别连接程控紫外光源(¾和程控三维精密工件台控制器(6),程控紫外光源(5)连接SLM (8),SLM (8)分别连接SLM驱动器(4)和分束镜(9),分束镜(9)分别连接CXD (12)和精缩透镜(10),精缩透镜(10)连接程控三维精密工件台(11),CXD (12)连接数字图像采集卡(7)。该控制方法是:工控机(1)发出控制指令给数字控制卡(2),启动程控开关控制器(3),开启程控紫外光源(5)和程控三维精密工件台控制器(6)。由工控机(1)预设的数字掩模图经SLM驱动器(4)输出到SLM (8),SLM (8)在程控紫外光源(5)照射下,经分束镜(9)、精缩透镜(10),将数字掩模图形转印到程 [0008] As shown, the present invention is achieved, a fully automatic digital lithography stepper apparatus, an industrial computer (1) are connected to the drive SLM G), the digital image acquisition card (7) and a digital control card (2), a digital control card (2) connected to programmable switch controller (3), the switch controller programmed C3) are connected to programmable source of ultraviolet light (¾ dimensional precision parts and programmable controllers (6), programmable ultraviolet light source (5) connecting SLM (8), SLM (8) are connected to SLM driver (4) and the beam splitter (9), beam splitter (9) are connected CXD (12) and the reduction-lens (10), reduction-lens (10 ) programmable connection dimensional precision work table (11), CXD (12) connected to a digital image acquisition card (7) is the control method: IPC (1) a control command to the digital control card (2), programmed start switch controller (3), programmable ultraviolet light source is turned on (5) dimensional precision parts and programmable controllers (6) by the IPC (1) masks a predetermined digital driver outputs the SLM (4) to the SLM (. 8), SLM (8) under irradiation with UV light programmable source (5), the beam splitter (9), reduction-lens (10), the mask pattern is transferred to the digital process 控三维精密工件台(11)上涂有光刻胶的基片上。工控机(1)控制程控三维精密工件台控制器(6),在CXD (12)监视下来调整程控三维精密工件台(11)精密定位,使基片上投影图形更清晰,然后由程控紫外光源(5)按照程序设定的时间完成曝光实验,从而实现全自动步进数字化投影曝光光刻实验制作的目的。 The photoresist coated substrate on control dimensional precision work table (11). IPC (1) control the loop dimensional precision work station controller (6), the CXD (12) monitors the down adjustment programmable dimensional precision work table (11) Precision positioning, the projection pattern on the substrate clearer, then exposure is completed in accordance with the experimental procedure set time programmed by the ultraviolet light source (5), in order to achieve the purpose of automatic digital stepping lithographic projection exposure experimentally manufactured.

Claims (1)

1. 一种全自动步进数字化光刻装置,它包括工控机(1)、数字控制卡(2)、程控开关控制器C3)、SLM驱动器G)、程控紫外光源(5)、程控三维精密工件台控制器(6)、数字图像采集卡(7)、SLM (8)、分束镜(9)、精缩透镜(10)、程控三维精密工件台(11)、CCD (12),其特征是工控机(1)分别连接SLM驱动器G)、数字图像采集卡(7)和数字控制卡(2),数字控制卡(2)连接程控开关控制器(3),程控开关控制器C3)分别连接程控紫外光源(5)和程控三维精密工件台控制器(6),程控紫外光源(5)连接SLM (8),SLM (8)分别连接SLM驱动器(4)和分束镜(9),分束镜(9)分别连接CCD (12)和精缩透镜(10),精缩透镜(10)连接程控三维精密工件台(11),CXD (12)连接数字图像采集卡(7)。 An automatic digital lithography stepper apparatus, comprising IPC (1), a digital control card (2), programmed switch controller C3), SLM drive G), programmable ultraviolet light source (5), three-dimensional precision programmable the work station controller (6), a digital image acquisition card (7), SLM (8), beam splitter (9), reduction-lens (10), three-dimensional programmable precision work table (11), CCD (12), which characterized in that the IPC (1) are connected to the drive SLM G), the digital image acquisition card (7) and a digital control card (2), a digital control card (2) connected to programmable switch controller (3), the switch controller programmed C3) They are connected to programmable ultraviolet light source (5) and programmable dimensional precision work station controller (6), programmable ultraviolet light source (5) connected to SLM (8), SLM (8) are connected to SLM driver (4) and the beam splitter (9) , beam splitter (9) are connected to CCD (12) and the reduction-lens (10), reduction-lens (10) connected to programmable dimensional precision work table (11), CXD (12) connected to a digital image acquisition card (7).
CN 201110098132 2011-04-19 2011-04-19 Fully automatic stepping digital lithography device CN102163006A (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010033996A1 (en) * 1998-10-19 2001-10-25 Vanguard International Semiconductor Corporation Electronically controlled universal phase-shifting mask for stepper exposure method and system
WO2003023494A1 (en) * 2001-09-12 2003-03-20 Micronic Laser Systems Ab Improved method and apparatus using an slm
WO2010044307A1 (en) * 2008-10-15 2010-04-22 株式会社ニコン Illumination optical system, aligner, and process for fabricating device
CN201654453U (en) * 2010-03-23 2010-11-24 南昌航空大学 Digital photolithography device for optical fiber end face micro-optical device
US20100296068A1 (en) * 2007-12-17 2010-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010033996A1 (en) * 1998-10-19 2001-10-25 Vanguard International Semiconductor Corporation Electronically controlled universal phase-shifting mask for stepper exposure method and system
WO2003023494A1 (en) * 2001-09-12 2003-03-20 Micronic Laser Systems Ab Improved method and apparatus using an slm
US20100296068A1 (en) * 2007-12-17 2010-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2010044307A1 (en) * 2008-10-15 2010-04-22 株式会社ニコン Illumination optical system, aligner, and process for fabricating device
CN201654453U (en) * 2010-03-23 2010-11-24 南昌航空大学 Digital photolithography device for optical fiber end face micro-optical device

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