CN102163006A - Fully automatic stepping digital lithography device - Google Patents
Fully automatic stepping digital lithography device Download PDFInfo
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- CN102163006A CN102163006A CN 201110098132 CN201110098132A CN102163006A CN 102163006 A CN102163006 A CN 102163006A CN 201110098132 CN201110098132 CN 201110098132 CN 201110098132 A CN201110098132 A CN 201110098132A CN 102163006 A CN102163006 A CN 102163006A
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- slm
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Abstract
The invention provides a fully automatic stepping digital lithography device. An industrial control computer is respectively connected with an SLM (spatial light modulator) driver, a digital image acquisition card and a digital control card, wherein the digital control card is connected with a program controlled switch controller; the program controlled switch controller is respectively connected with a program controlled ultraviolet light source and a program controlled three-dimensional precise work-piece table controller; the program controlled ultraviolet light source is connected with an SLM; the SLM is respectively connected with the SLM driver and a beam splitter; the beam splitter is respectively connected with a CCD (charge coupled device) and a precise lens; the precise lens is connected with the program controlled three-dimensional precise work-piece table controller; and the CCD is connected with the digital image acquisition card. The fully automatic stepping digital lithography device has the advantages of reducing the manual factor to the lowest degree with high design precision and good stability.
Description
Technical field
The present invention relates to a kind of stepping digitizing lithographic equipment, relate in particular to a kind of full-automatic stepping digitizing lithographic equipment.
Background technology
In today that the micro-optic technology develops rapidly, increasing scientific research and application practice depend on method for digitizing and realize that this has become current urgent technical barrier, become a bottleneck problem that needs to be resolved hurrily of research and production.Along with the fast development of Computer Control Technology, based on digitizing etching system and control method, be proved and had very high element manufacturing precision and efficient, and reduced the influence of artificial unfavorable factor.The experiment that can utilize full-automatic stepping digitizing etching system to carry out photoetching is made.
Summary of the invention
The object of the present invention is to provide a kind of full-automatic stepping digitizing lithographic equipment, this device is each parts by computer programming control etching system, has improved stability, the reliability of system, and the precision and the performance of micro-optical device making.When carrying out lithography experiments, the digital mask figure that we will experimentize by industrial computer through the SLM(spatial light modulator) driver outputs on the SLM, adopts program control ultraviolet source to realize setting to the time shutter making that the precision of time shutter is higher.The sharpness of the digital mask figure that uses high resolution CCD (charge-coupled image sensor) to make observation to expose to aim at is higher, thereby the exposure photo-etching graphical effect is better.Utilize program control three-dimensional precision workpiece stage controller to control the precision positioning of program control three-dimensional precision workpiece stage, effectively improved the precision and the efficient of element manufacturing.
The present invention is achieved like this, it comprises industrial computer, digital control card, the programmed switch controller, the SLM driver, program control ultraviolet source, program control three-dimensional precision workpiece stage controller, the digital image acquisition card, SLM, beam splitter, the final minification lens, program control three-dimensional precision workpiece stage, CCD, it is characterized in that industrial computer connects the SLM driver respectively, digital image acquisition card and digital control card, digital control card connection programmed switch controller, the programmed switch controller connects program control ultraviolet source and program control three-dimensional precision workpiece stage controller respectively, program control ultraviolet source connects SLM, SLM connects SLM driver and beam splitter respectively, beam splitter connects CCD and final minification lens respectively, the final minification lens connect program control three-dimensional precision workpiece stage, CCD linking number word image capture card.
Technique effect of the present invention is: this device has dropped to artificial factor minimum, and precision height, the good stability of design.Be mainly reflected in following some: 1, use the high-precision program control ultraviolet source, obviously eliminated of the influence of exposure light source instability etching system.2, adopt the building module design, each ingredient of system hardware all adopts high-precision parts, has reduced the influence of parts to system performance to greatest extent.3, use the high-performance industrial computer, realized the more effective control of each parts of system.4, adopt highly sensitive CCD can obtain high-resolution picture, thereby make the focusing imaging more accurate as the supervision image device.5 adopt high-accuracy program control three-dimensional precision workpiece stage, make that the stationary accuracy of etching system is higher, thereby the location of the device system of making are more accurate, precision is higher.
Description of drawings
Fig. 1 is a schematic diagram of the present invention.
Embodiment
As shown in Figure 1, the present invention realizes like this, a kind of full-automatic stepping digitizing lithographic equipment, industrial computer (1) connects SLM driver (4) respectively, digital image acquisition card (7) and digital control card (2), digital control card (2) connects programmed switch controller (3), programmed switch controller (3) connects program control ultraviolet source (5) and program control three-dimensional precision workpiece stage controller (6) respectively, program control ultraviolet source (5) connects SLM (8), SLM (8) connects SLM driver (4) and beam splitter (9) respectively, beam splitter (9) connects CCD(12 respectively) and final minification lens (10), final minification lens (10) connect program control three-dimensional precision workpiece stage (11), CCD(12) linking number word image capture card (7).This control method is: industrial computer (1) sends steering order and gives digital control card (2), starts programmed switch controller (3), opens program control ultraviolet source (5) and program control three-dimensional precision workpiece stage controller (6).The digital mask figure default by industrial computer (1) outputs to SLM(8 through SLM driver (4)), SLM(8) under program control ultraviolet source (5) irradiation, through beam splitter (9), final minification lens (10), the digital mask graph transfer printing is scribbled on the substrate of photoresist to program control three-dimensional precision workpiece stage (11).Industrial computer (1) control program control three-dimensional precision workpiece stage controller (6), at CCD(12) monitor and adjust program control three-dimensional precision workpiece stage (11) precision positioning, make on the substrate projecting figure more clear, finish exposure experiments by program control ultraviolet source (5) according to the time of program setting then, thereby realize the purpose that full-automatic stepping digitizing projection exposure lithography experiments is made.
Claims (1)
1. full-automatic stepping digitizing lithographic equipment, it comprises industrial computer (1), digital control card (2), programmed switch controller (3), SLM driver (4), program control ultraviolet source (5), program control three-dimensional precision workpiece stage controller (6), digital image acquisition card (7), SLM (8), beam splitter (9), final minification lens (10), program control three-dimensional precision workpiece stage (11), CCD(12), it is characterized in that industrial computer (1) connects SLM driver (4) respectively, digital image acquisition card (7) and digital control card (2), digital control card (2) connects programmed switch controller (3), programmed switch controller (3) connects program control ultraviolet source (5) and program control three-dimensional precision workpiece stage controller (6) respectively, program control ultraviolet source (5) connects SLM (8), SLM (8) connects SLM driver (4) and beam splitter (9) respectively, beam splitter (9) connects CCD(12 respectively) and final minification lens (10), final minification lens (10) connect program control three-dimensional precision workpiece stage (11), CCD(12) linking number word image capture card (7).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110098132 CN102163006A (en) | 2011-04-19 | 2011-04-19 | Fully automatic stepping digital lithography device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201110098132 CN102163006A (en) | 2011-04-19 | 2011-04-19 | Fully automatic stepping digital lithography device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102163006A true CN102163006A (en) | 2011-08-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201110098132 Pending CN102163006A (en) | 2011-04-19 | 2011-04-19 | Fully automatic stepping digital lithography device |
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| CN (1) | CN102163006A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010033996A1 (en) * | 1998-10-19 | 2001-10-25 | Vanguard International Semiconductor Corporation | Electronically controlled universal phase-shifting mask for stepper exposure method and system |
| WO2003023494A1 (en) * | 2001-09-12 | 2003-03-20 | Micronic Laser Systems Ab | Improved method and apparatus using an slm |
| WO2010044307A1 (en) * | 2008-10-15 | 2010-04-22 | 株式会社ニコン | Illumination optical system, aligner, and process for fabricating device |
| CN201654453U (en) * | 2010-03-23 | 2010-11-24 | 南昌航空大学 | Digital photolithography device for optical fiber end face micro-optical device |
| US20100296068A1 (en) * | 2007-12-17 | 2010-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
-
2011
- 2011-04-19 CN CN 201110098132 patent/CN102163006A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010033996A1 (en) * | 1998-10-19 | 2001-10-25 | Vanguard International Semiconductor Corporation | Electronically controlled universal phase-shifting mask for stepper exposure method and system |
| WO2003023494A1 (en) * | 2001-09-12 | 2003-03-20 | Micronic Laser Systems Ab | Improved method and apparatus using an slm |
| US20100296068A1 (en) * | 2007-12-17 | 2010-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
| WO2010044307A1 (en) * | 2008-10-15 | 2010-04-22 | 株式会社ニコン | Illumination optical system, aligner, and process for fabricating device |
| CN201654453U (en) * | 2010-03-23 | 2010-11-24 | 南昌航空大学 | Digital photolithography device for optical fiber end face micro-optical device |
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Application publication date: 20110824 |