CN102104056A - 有机el显示装置 - Google Patents
有机el显示装置 Download PDFInfo
- Publication number
- CN102104056A CN102104056A CN2010105782312A CN201010578231A CN102104056A CN 102104056 A CN102104056 A CN 102104056A CN 2010105782312 A CN2010105782312 A CN 2010105782312A CN 201010578231 A CN201010578231 A CN 201010578231A CN 102104056 A CN102104056 A CN 102104056A
- Authority
- CN
- China
- Prior art keywords
- organic
- layer
- mentioned
- display
- negative electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010410 layer Substances 0.000 claims abstract description 116
- 239000012044 organic layer Substances 0.000 claims abstract description 25
- 238000002347 injection Methods 0.000 claims description 20
- 239000007924 injection Substances 0.000 claims description 20
- 238000007740 vapor deposition Methods 0.000 abstract description 9
- 239000011159 matrix material Substances 0.000 abstract description 5
- 239000003086 colorant Substances 0.000 abstract description 2
- 230000008020 evaporation Effects 0.000 description 49
- 238000001704 evaporation Methods 0.000 description 49
- 238000000151 deposition Methods 0.000 description 29
- 230000008021 deposition Effects 0.000 description 26
- 239000000758 substrate Substances 0.000 description 17
- 230000035882 stress Effects 0.000 description 14
- 239000002184 metal Substances 0.000 description 12
- 239000012528 membrane Substances 0.000 description 9
- 239000011229 interlayer Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000013461 design Methods 0.000 description 5
- 101150089655 Ins2 gene Proteins 0.000 description 4
- 101100072652 Xenopus laevis ins-b gene Proteins 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 4
- 238000010276 construction Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 241000931705 Cicada Species 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- HPNSNYBUADCFDR-UHFFFAOYSA-N chromafenozide Chemical compound CC1=CC(C)=CC(C(=O)N(NC(=O)C=2C(=C3CCCOC3=CC=2)C)C(C)(C)C)=C1 HPNSNYBUADCFDR-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/88—Dummy elements, i.e. elements having non-functional features
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/82—Cathodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
- H10K59/1315—Interconnections, e.g. wiring lines or terminals comprising structures specially adapted for lowering the resistance
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8052—Cathodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/805—Electrodes
- H10K59/8052—Cathodes
- H10K59/80522—Cathodes combined with auxiliary electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006051282A JP2007234678A (ja) | 2006-02-27 | 2006-02-27 | 有機el表示装置 |
JP051282/2006 | 2006-02-27 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710005531XA Division CN101030595B (zh) | 2006-02-27 | 2007-02-09 | 有机el显示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102104056A true CN102104056A (zh) | 2011-06-22 |
CN102104056B CN102104056B (zh) | 2012-12-12 |
Family
ID=38443334
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2010105782312A Active CN102104056B (zh) | 2006-02-27 | 2007-02-09 | 有机el显示装置 |
CN200710005531XA Active CN101030595B (zh) | 2006-02-27 | 2007-02-09 | 有机el显示装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710005531XA Active CN101030595B (zh) | 2006-02-27 | 2007-02-09 | 有机el显示装置 |
Country Status (3)
Country | Link |
---|---|
US (2) | US7714506B2 (zh) |
JP (1) | JP2007234678A (zh) |
CN (2) | CN102104056B (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1905126A (zh) * | 2000-11-27 | 2007-01-31 | 精工爱普生株式会社 | 有机电致发光装置及其电子装置 |
EP2302981B1 (en) * | 2008-06-17 | 2013-05-15 | Hitachi Ltd. | Organic light-emitting element, method for manufacturing the organic light-emitting element, apparatus for manufacturing the organic light-emitting element, and organic light-emitting device using the organic light-emitting element |
JP2012064564A (ja) | 2010-08-17 | 2012-03-29 | Canon Inc | 成膜マスク及び有機el表示装置の製造方法 |
JP2012059631A (ja) * | 2010-09-10 | 2012-03-22 | Hitachi Displays Ltd | 有機エレクトロルミネッセンス用マスク |
KR102077723B1 (ko) * | 2013-05-23 | 2020-04-08 | 삼성디스플레이 주식회사 | 유기발광표시장치 및 그 제조방법 |
TWI550932B (zh) * | 2014-06-06 | 2016-09-21 | 豐彩科技有限公司 | 有機發光二極體結構及其製造方法以及有機層金屬遮罩 |
JP2016004910A (ja) * | 2014-06-17 | 2016-01-12 | キヤノン株式会社 | 有機発光装置 |
JP7134589B2 (ja) * | 2016-05-18 | 2022-09-12 | 大日本印刷株式会社 | 蒸着マスク |
JP6868227B2 (ja) * | 2019-02-20 | 2021-05-12 | 大日本印刷株式会社 | 蒸着マスク |
CN109713027B (zh) * | 2019-02-28 | 2020-12-11 | 上海天马有机发光显示技术有限公司 | 一种有机发光显示面板的像素排布及有机发光显示面板 |
JP6997973B2 (ja) * | 2020-10-13 | 2022-01-18 | 大日本印刷株式会社 | 蒸着マスク |
JP7232430B2 (ja) * | 2020-10-13 | 2023-03-03 | 大日本印刷株式会社 | 蒸着マスクの製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3401356B2 (ja) * | 1995-02-21 | 2003-04-28 | パイオニア株式会社 | 有機エレクトロルミネッセンスディスプレイパネルとその製造方法 |
JP2815004B2 (ja) * | 1996-10-30 | 1998-10-27 | 日本電気株式会社 | 表示装置およびその製造方法 |
US7109653B2 (en) * | 2002-01-15 | 2006-09-19 | Seiko Epson Corporation | Sealing structure with barrier membrane for electronic element, display device, electronic apparatus, and fabrication method for electronic element |
JP4230258B2 (ja) * | 2003-03-19 | 2009-02-25 | 東北パイオニア株式会社 | 有機elパネル、有機elパネルの製造方法 |
TW588471B (en) * | 2003-04-24 | 2004-05-21 | Delta Optoelectronics Inc | Active matrix organic light emitting diode and fabricating method thereof |
JP3915734B2 (ja) * | 2003-05-12 | 2007-05-16 | ソニー株式会社 | 蒸着マスクおよびこれを用いた表示装置の製造方法、ならびに表示装置 |
EP1491653A3 (en) * | 2003-06-13 | 2005-06-15 | Pioneer Corporation | Evaporative deposition methods and apparatus |
JP3765314B2 (ja) * | 2004-03-31 | 2006-04-12 | セイコーエプソン株式会社 | マスク、マスクの製造方法、電気光学装置の製造方法および電子機器 |
KR100623449B1 (ko) * | 2004-09-09 | 2006-09-19 | 엘지전자 주식회사 | 유기 전계발광 표시소자 및 그 제조방법 |
KR100699254B1 (ko) * | 2006-02-14 | 2007-03-28 | 삼성전자주식회사 | 표시장치의 제조방법과 이에 의한 표시장치 |
-
2006
- 2006-02-27 JP JP2006051282A patent/JP2007234678A/ja active Pending
-
2007
- 2007-02-09 CN CN2010105782312A patent/CN102104056B/zh active Active
- 2007-02-09 CN CN200710005531XA patent/CN101030595B/zh active Active
- 2007-02-26 US US11/678,695 patent/US7714506B2/en active Active
-
2010
- 2010-04-29 US US12/769,978 patent/US8441186B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20070200494A1 (en) | 2007-08-30 |
JP2007234678A (ja) | 2007-09-13 |
US7714506B2 (en) | 2010-05-11 |
US20100213456A1 (en) | 2010-08-26 |
US8441186B2 (en) | 2013-05-14 |
CN102104056B (zh) | 2012-12-12 |
CN101030595B (zh) | 2011-06-22 |
CN101030595A (zh) | 2007-09-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: IPS ALPHA SUPPORT CO., LTD. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20111009 Address after: Chiba County, Japan Applicant after: Hitachi Displays, Ltd. Co-applicant after: IPS Pioneer Support Society Address before: Chiba County, Japan Applicant before: Hitachi Displays, Ltd. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Chiba County, Japan Co-patentee after: Panasonic Liquid Crystal Display Co.,Ltd. Patentee after: JAPAN DISPLAY Inc. Address before: Chiba County, Japan Co-patentee before: Panasonic Liquid Crystal Display Co.,Ltd. Patentee before: Hitachi Displays, Ltd. |
|
TR01 | Transfer of patent right |
Effective date of registration: 20180913 Address after: Gyeonggi Do, South Korea Patentee after: SAMSUNG DISPLAY Co.,Ltd. Address before: Chiba County, Japan Co-patentee before: Panasonic Liquid Crystal Display Co.,Ltd. Patentee before: JAPAN DISPLAY Inc. |
|
TR01 | Transfer of patent right |