CN102096131B - Device for preparing microstep reflector structure by using a plurality of cuboid substrates - Google Patents
Device for preparing microstep reflector structure by using a plurality of cuboid substrates Download PDFInfo
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- CN102096131B CN102096131B CN2010105927576A CN201010592757A CN102096131B CN 102096131 B CN102096131 B CN 102096131B CN 2010105927576 A CN2010105927576 A CN 2010105927576A CN 201010592757 A CN201010592757 A CN 201010592757A CN 102096131 B CN102096131 B CN 102096131B
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Abstract
The invention relates to a device for preparing a microstep reflector structure by using a plurality of cuboid substrates. A standard block of the device is fixed at a position, close to the left, of a first substrate, and a fine tuning bracket is fixed on the right side of the first substrate; a sliding adjustment sheet 0 is arranged at a position, close to the right side, of the first substrate 1; one end of a second substrate with metal scales is placed at the contact included corner between the standard block and the first substrate, while the other end is suspended above the sliding adjustment sheet; and the sliding adjustment sheet can move on the first substrate under the action of the fine tuning bracket to adjust the included angle between the right side of the standard block and the upper surface of the second substrate. The device effectively improves the precision of control over the height of each step, the surface roughness precision of the microstep reflector, the longitudinal dimensional precision and the repeatability.
Description
Technical field
The present invention relates to a kind of device of making little ladder catoptron staircase structure, particularly a kind of device that utilizes a plurality of rectangular parallelepiped substrates to make little ladder catoptron staircase structure.
Background technology
Micro-reflector with a plurality of steps is a kind of reflection of light device, and application is more and more widely arranged in optical system, as: spectral analysis, beam shaping and optical fiber coupling etc.
Along with optical system is little to volume, the compact conformation direction develops, the device miniature in the optical system changes into an important subject into optical device, and minitype optical device design and fabrication level directly determines the performance of optical instrument.At present, through binary optical technique can be on multiple material substrate such as quartz through repeatedly photoetching and the repeatedly multistage ladder microstructure of corrosion (dry method or wet method) preparation, still, there is following shortcoming in this method: 1, because of alignment repeatedly, horizontal accuracy is difficult to assurance; 2, corrosion or etching depth are difficult to accurate control, and precision is relatively poor with repeatability, thereby low, the poor repeatability of ladder height control accuracy; 3, corrode or the mirror surface roughness that etches is difficult to satisfy the optical instrument requirement.
Summary of the invention
The technical matters that the present invention will solve provides that a kind of ladder height control accuracy is high, good reproducibility, and can guarantee that a plurality of rectangular parallelepiped substrates of utilizing of little ladder catoptron horizontal accuracy and surfaceness make the device of little ladder catoptron staircase structure.
In order to solve the problems of the technologies described above, the device that utilizes a plurality of rectangular parallelepiped substrates to make little ladder catoptron staircase structure of the present invention comprises calibrated bolck, first substrate, second substrate, fine adjustment frame, slidable adjustment sheet; Said calibrated bolck is fixed in first substrate near the position in left side, and the fine adjustment frame is fixed in the right side of first substrate; The slidable adjustment sheet is positioned in first substrate position near the right side; Second substrate, one end that has a metal scale mark is placed on the angle that contacts of calibrated bolck and first substrate, and the other end is suspended in the top of slidable adjustment sheet; The slidable adjustment sheet can move in first substrate under the effect of fine adjustment frame, with the angle between the adjustment calibrated bolck right flank and second upper surface of substrate.
Make N level micro-reflector staircase structure and need adopt N the rectangular parallelepiped substrate that shape and size are all identical.Each rectangular parallelepiped substrate is neatly overlayed in second substrate successively, the left surface of first substrate is contacted with the right flank coplane of calibrated bolck, and the right flank of each substrate contacts with the left surface coplane of adjacent substrate; As long as the upper surface of second substrate and the right flank out of plumb of calibrated bolck, then because substrate is a rectangular parallelepiped, and its left and right side is perpendicular to lower surface, and it is poor to form certain height between the lower surface of each substrate, promptly each substrate forms staircase structure.Through being fixed on the position of the first suprabasil fine adjustment frame adjustment slidable adjustment sheet, can change the angle between second upper surface of substrate and the calibrated bolck right flank, thereby change the bench height of the staircase structure of each substrate formation.Staircase structure size according to little ladder catoptron precomputes the angle between second upper surface of substrate and the calibrated bolck right flank; Utilize the size of this angle and slidable adjustment sheet to calculate the setpoint distance between slidable adjustment sheet left surface and the calibrated bolck right flank again, find the second suprabasil corresponding metal scale mark corresponding then with this setpoint distance; Adjustment fine adjustment frame makes the slidable adjustment sheet aim at above-mentioned respective metal scale mark with the osculatory between second substrate, locks the fine adjustment frame then the relative position between second substrate and the slidable adjustment sheet is locked.Neatly overlay N rectangular parallelepiped substrate in second substrate successively; The left surface of first substrate contacts with the right flank coplane of calibrated bolck; The right flank of each substrate contacts with the left surface coplane of adjacent substrate and is fixing, can obtain meeting the staircase structure of setting dimensional requirement.
The present invention makes N measure-alike rectangular parallelepiped substrate form staircase structure owing to utilize the inclination angle of second upper surface of substrate with respect to the calibrated bolck right flank, and the height of every layer of ladder can both accurately be controlled; Because each substrate is measure-alike rectangular structure; The surface as reflecting surface of N substrate can form by same batch of grinding and polishing; Surface shape can both reach consistent with roughness; Flatness is high, has effectively improved little ladder catoptron stepped surfaces roughness precision, longitudinal size precision and repeatability.
The present invention also comprises vertical compression assemblies and horizontal compressive assembly; Said vertical compression assemblies comprises horizontal sliding bar, slide block, vertical slide bar and mass; The left part of horizontal sliding bar is fixed on calibrated bolck top, and right part is suspended from the top of each substrate; Slide block and horizontal sliding bar flexibly connect, and can move with respect to the horizontal sliding bar along continuous straight runs; Vertically the upper end of slide bar is fixedly connected with slide block; Mass and vertically slide bar flexible connection can move in the vertical direction with respect to vertical slide bar; Said horizontal compressive assembly comprises first, second catch, and at least two standing screws are with the corresponding extruding screw of standing screw quantity, extrusion spring and extruding nut; The two ends of extrusion spring are fixedly connected with an end of standing screw, extruding screw respectively, and the other end of standing screw is fixedly connected with first catch, and the other end of extruding screw passes second catch and is connected with the extruding nut thread; First catch contacts with the left surface coplane of calibrated bolck; Each substrate is stacked between the calibrated bolck and second catch successively; The left surface of first substrate contacts with the calibrated bolck coplane, and the right flank of last a slice substrate contacts with the second catch coplane, and the rotation extrusion nut can compress each substrate.
The rotation extrusion nut, second catch compresses each substrate; Moving slider, the control of quality piece pushes each substrate successively to lower slider simultaneously, and each substrate is contacted with second matrix lines, forms staircase structure.
Owing to adopted horizontal compressive device and vertical pressurizing unit, in utilizing substrate making staircase structure process, can when compressing each substrate, push each substrate successively downwards, further improved the making precision of staircase structure.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the present invention is done further explain.
Fig. 1 is the apparatus structure synoptic diagram that utilizes a plurality of rectangular parallelepiped substrates to make little ladder catoptron staircase structure of the present invention.
Fig. 2 is the stereographic map of second substrate.
Fig. 3 a is the front view of substrate; Fig. 3 b is the stereographic map of substrate.
Embodiment
Like Fig. 1, shown in 2, the device that utilizes a plurality of rectangular parallelepiped substrates to make little ladder catoptron staircase structure of the present invention comprises calibrated bolck 1, the first substrate 31, the second substrates 32, fine adjustment frame 7, slidable adjustment sheet 20.Said calibrated bolck 1 is fixed in first substrate 31 near the position in left side, and fine adjustment frame 7 is fixed in the right side of first substrate 31; Slidable adjustment sheet 20 is positioned in first substrate 31 position near the right side, can in first substrate 31, move under the effect of fine adjustment frame 7; Second substrate, 32 1 ends that have a metal scale mark 324 are placed on the angle that contacts of calibrated bolck 1 and first substrate 31, and the other end is suspended in the top of slidable adjustment sheet 20.The present invention also comprises vertical compression assemblies and horizontal compressive assembly; Said vertical compression assemblies comprises horizontal sliding bar 61, slide block 62, vertical slide bar 63 and mass 64; The left part of horizontal sliding bar 61 is fixed on calibrated bolck 1 top, and right part is suspended from the top of each substrate 2; Horizontal sliding bar 61 is passed by the through hole of slide block 62, and slide block 62 can move with respect to horizontal sliding bar 61 along continuous straight runs; Vertically the upper end of slide bar 63 is fixedly connected with slide block 62; Vertically slide bar 63 is passed by the through hole of mass 64, and mass 64 can move in the vertical direction with respect to vertical slide bar 63; Said horizontal compressive assembly comprises first, second catch 41,42, and at least two standing screws 43 are with the corresponding extruding screw of standing screw 43 quantity 44, extrusion spring 5 and extruding nut 45; The two ends of extrusion spring 5 are fixedly connected with an end of standing screw 43, extruding screw 44 respectively, and the other end of standing screw 43 is fixedly connected with first catch 41, and the other end of extruding screw 44 passes second catch 42 and is threaded with extruding nut 45; First catch 41 contacts with the left surface coplane of calibrated bolck 1; Each substrate 2 is stacked between the calibrated bolck 1 and second catch 42 successively; The left surface of first substrate contacts with calibrated bolck 1 coplane; The right flank of last a slice substrate contacts with second catch, 42 coplanes, and rotation extrusion nut 45 can compress each substrate.
Make N level micro-reflector staircase structure and need adopt N the rectangular parallelepiped substrate that shape and size are all identical; Six faces of substrate are respectively left surface 21, right flank 22, upper surface 23, lower surface 24, surface, back 25, front surface 26 (shown in Fig. 3 a, 3b); Wherein, Left surface 21 is the face of broad with right flank 22, and all the other four faces are narrower face.The used material of substrate is that silicon chip, glass, silicon dioxide, silit, molybdenum sheet or piezoid etc. can be processed solid material.The left surface 21 of substrate, the surfaceness of right flank 22 all reach 0.1nm～1 μ m; The surfaceness of the upper surface 23 of substrate reaches 0.1nm～1 μ m, and face shape reaches 0.1～10nm, and the upper surface 23 of each substrate is perpendicular to its left surface 21 and right flank 22.
Said first substrate 31 and second substrate 32 are cuboid, the upper surface 311 and lower surface 312 broads of first substrate 31, and remaining surface is narrower, the upper surface 321 and lower surface 322 broads of second substrate 32, remaining surface is narrower; Require upper surface 311 and the upper surface 321 of second substrate 32, the surfaceness of lower surface 322 of first substrate 31 to reach 0.1nm～1 μ m; The surfaceness of the left surface 323 of second substrate 32 reaches 0.1nm～1 μ m, and the upper surface 321 of second substrate 32 is parallel to lower surface 322, and left surface 323 is perpendicular to its upper surface 321; Because left surface 323 surfacenesses of second substrate 32 are less, and perpendicular to its upper surface 321 and lower surface 322, thereby can contact with the right flank 12 complete lines of calibrated bolck 1, the precision of second substrate, 32 angular adjustment guaranteed; First substrate 31 and second substrate 32 are adopted silicon, glass, silicon dioxide, silit, molybdenum or quartz etc. can process solid material and are ground and polish and process.
As shown in Figure 2, lower surface 322 preparations of second substrate 32 have metal scale mark 324.This metal scale mark 324 adopts following method preparation: the metal film that on the lower surface 322 of second substrate 32, adopts magnetron sputtering or radio-frequency sputtering or ion beam sputtering or d.c. sputtering or electron beam evaporation or thermal evaporation method vapor deposition or sputter 10～300nm; Resist coating, mask exposure, development then; Form the equidistantly tree lace bar of (spacing is 500 μ m), the wide 500 μ m of tree lace bar; In acid solution, erode the metal film that is not covered by photoresist, remove photoresist then, forming spacing is the metal scale mark of 500 μ m.Metal scale mark 324 is parallel with the left surface 323 of second substrate 32, and this metal scale mark is used for the accurate demarcation of adjustable range.
Said calibrated bolck 1 is a rectangular parallelepiped, its left surface 11 and right flank 12 broads, and its lap is narrower; Require the right flank 12 of calibrated bolck 1 and the surfaceness of lower surface 13 to reach 0.1nm～1 μ m, and the right flank 12 that requires calibrated bolck 1 is perpendicular to lower surface 13.Calibrated bolck 1 places an end of first substrate 31, and its lower surface 13 contacts with upper surface 311 coplanes of first substrate 31 and is adhesively fixed.
Slidable adjustment sheet 20 can employing require (surfaceness and flatness) all identical rectangular parallelepiped with substrate shape, size, material and sufacing.Slidable adjustment sheet 20 lies in first substrate 31, and its lower surface contacts with upper surface 311 coplanes of first substrate 31, and its left surface 201 is near calibrated bolck 1; Slidable adjustment sheet 20 can slip on first substrate 31.
One end of second substrate 32 is placed on the angle that contacts of calibrated bolck 1 and first substrate 31, and the other end is suspended in the top of slidable adjustment sheet 20, and second substrate 32 contacts with slidable adjustment sheet 20 lines with first substrate 31, calibrated bolck 1 respectively.Through being fixed on the position of the fine adjustment frame 7 adjusting slidable adjustment sheets 20 in first substrate 31, can change the upper surface of second substrate 32 and the angle between calibrated bolck 1 right flank, thereby change the bench height of the staircase structure of each substrate formation.
Each rectangular parallelepiped substrate 2 is neatly overlayed in second substrate 32 successively, the left surface 21 of first substrate is contacted with right flank 12 coplanes of calibrated bolck 1, the right flank 22 of each substrate 2 contacts with left surface 21 coplanes of adjacent substrate; As long as right flank 12 out of plumb of upper surface of second substrate 32 321 and calibrated bolck 1; Then because substrate 2 is a rectangular parallelepiped; Its left and right side 21,22 is perpendicular to lower surface 24, and it is poor to form certain height between the lower surface 24 of each substrate 2, and promptly each substrate forms staircase structure.Staircase structure size according to little ladder catoptron precomputes the angle between second upper surface of substrate 321 and the calibrated bolck right flank 12; Utilize the size of this angle and slidable adjustment sheet 20 to calculate the setpoint distance between slidable adjustment sheet 20 left surfaces 201 and the calibrated bolck right flank 12 again, find the corresponding metal scale mark in second substrate 32 corresponding then with this setpoint distance.Adjustment fine adjustment frame 7 makes slidable adjustment sheet 20 aim at above-mentioned respective metal scale mark with the osculatory between second substrate 32, locks fine adjustment frame 7 then the relative position between second substrate 32 and the slidable adjustment sheet 20 is locked.N rectangular parallelepiped substrate neatly overlayed in second substrate 32 successively, and the left surface 21 of first substrate contacts with right flank 12 coplanes of calibrated bolck 1, and the right flank 22 of each substrate contacts with left surface 21 coplanes of adjacent substrate; The rotation extrusion nut 45 then, make second catch 42 compress each substrate; Moving slider 62, control of quality piece 64 pushes each substrate successively to lower slider simultaneously, and each substrate is contacted with upper surface 321 lines of second substrate 32, can obtain meeting the staircase structure of setting dimensional requirement.
The described mass and first substrate, second base material can adopt fused quartz, molybdenum sheet, silit, glass or silicon dioxide.
The invention is not restricted to above-mentioned embodiment, first substrate, second substrate, calibrated bolck and slidable adjustment sheet can also adopt other geometric configuration, as long as satisfy out of plumb between the calibrated bolck right flank and second upper surface of substrate.Thereby any simple deformation of on claim 1 technical scheme of the present invention basis, making all the invention is intended within the protection domain.
Claims (1)
1. a device that utilizes a plurality of rectangular parallelepiped substrates to make little ladder catoptron staircase structure is characterized in that comprising calibrated bolck (1), first substrate (31), second substrate (32), fine adjustment frame (7), slidable adjustment sheet (20), vertical compression assemblies, horizontal compressive assembly; Said calibrated bolck (1) is fixed in first substrate (31) and goes up the position near the left side, and fine adjustment frame (7) is fixed in the right side of first substrate (31); Slidable adjustment sheet (20) is positioned at first substrate (31) and goes up the position near the right side; Second substrate (32) one ends that have a metal scale mark (324) are placed on the angle that contacts of calibrated bolck (1) and first substrate (31), and the other end is suspended in the top of slidable adjustment sheet (20); Slidable adjustment sheet (20) can be gone up mobile under the effect of fine adjustment frame (7) in first substrate (31), with the angle between adjustment calibrated bolck right flank (12) and second upper surface of substrate (321); Said vertical compression assemblies comprises horizontal sliding bar (61), slide block (62), vertical slide bar (63) and mass (64); The left part of horizontal sliding bar (61) is fixed on calibrated bolck (1) top, and right part is suspended from the top of each substrate (2); Slide block (62) flexibly connects with horizontal sliding bar (61), can move with respect to horizontal sliding bar (61) along continuous straight runs; Vertically the upper end of slide bar (63) is fixedly connected with slide block (62); Mass (64) and vertically slide bar (63) flexible connection can move in the vertical direction with respect to vertical slide bar (63); Said horizontal compressive assembly comprises first, second catch (41), (42), and at least two standing screws (43) are with the corresponding extruding screw of standing screw (43) quantity (44), extrusion spring (5) and extruding nut (45); The two ends of extrusion spring (5) are fixedly connected with an end of standing screw (43), extruding screw (44) respectively; The other end of standing screw (43) is fixedly connected with first catch (41), and the other end of extruding screw (44) passes second catch (42) and is threaded with extruding nut (45); First catch (41) contacts with the left surface coplane of calibrated bolck (1); Each substrate (2) is stacked between calibrated bolck (1) and second catch (42) successively; The left surface of first substrate contacts with calibrated bolck (1) coplane; The right flank of last a slice substrate contacts with second catch (42) coplane, and rotation extrusion nut (45) can compress each substrate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010105927576A CN102096131B (en) | 2010-12-17 | 2010-12-17 | Device for preparing microstep reflector structure by using a plurality of cuboid substrates |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010105927576A CN102096131B (en) | 2010-12-17 | 2010-12-17 | Device for preparing microstep reflector structure by using a plurality of cuboid substrates |
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| CN102096131B true CN102096131B (en) | 2012-02-08 |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1786742A (en) * | 2005-12-07 | 2006-06-14 | 乐孜纯 | Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material |
| CN1920476A (en) * | 2006-06-30 | 2007-02-28 | 西安交通大学 | Nano multi-step height sample plate and its preparation |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| KR100503814B1 (en) * | 2003-02-04 | 2005-07-27 | 동부아남반도체 주식회사 | Method for forming gate of semiconductor element |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1786742A (en) * | 2005-12-07 | 2006-06-14 | 乐孜纯 | Process for mfg. unidimensional X ray refracted diffraction micro structural component of aluminium material |
| CN1920476A (en) * | 2006-06-30 | 2007-02-28 | 西安交通大学 | Nano multi-step height sample plate and its preparation |
Non-Patent Citations (1)
| Title |
|---|
| Yasuyuki Unno.Fabrication of N-level binary optical elements by use of M mask patterns with N in the range of 2M21 1 1 < N < 2M.《APPLIED OPTICS》.1998,第37卷(第34期),8012-8020. * |
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