CN102082201A - Isocyatic chemical reagent supplementing device - Google Patents
Isocyatic chemical reagent supplementing device Download PDFInfo
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- CN102082201A CN102082201A CN2010105620799A CN201010562079A CN102082201A CN 102082201 A CN102082201 A CN 102082201A CN 2010105620799 A CN2010105620799 A CN 2010105620799A CN 201010562079 A CN201010562079 A CN 201010562079A CN 102082201 A CN102082201 A CN 102082201A
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- chemical reagent
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- texturing
- fluid reservoir
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention relates to an isocyatic chemical reagent supplementing device comprising a liquid reservoir, a transfusion tube, a liquid-supplementing pump, a one-way valve, a flowmeter and a texturing tank. An electromagnetic reversing valve and an overflowing valve are arranged between the liquid-supplementing pump and the one-way valve, and a liquid outlet of the overflowing valve and a reflux inlet of the electromagnetic reversing valve are communicated with the liquid reservoir. The liquid-supplementing pump is constantly in a working state, the electromagnetic reversing valve is in a closed state, and the overflowing valve is in an overflowing state before supplementing liquid, and chemical reagent flowing out of the overflowing valve directly flushes into the liquid reservoir so as to stir the chemical reagent in the liquid reservoir and ensure the uniform up-and-down concentration of the chemical reagent in the liquid reservoir. In liquid the supplementing process, the electromagnetic reversing valve is in an open state, the overflowing valve is in a closed state, and the liquid-supplementing pump sucks the chemical reagent from the liquid reservoir and directly conveys the chemical reagent into the texturing tank to ensure that the chemical reagent supplemented every time has the same concentration, and the texturing liquid in the texturing tank meets the process requirements so as to improve the stability of the texturing process and ensure the texturing quality of a silicon sheet.
Description
Technical field:
The present invention relates to the etching device in the solar battery sheet production, relate in particular to the liquid supply device on the etching device.
Background technology:
In the production technology of solar cell, the preparation of suede structure is the important step that increases battery sheet absorptivity.Desirable suede structure helps to improve the performance of battery.Because incident light has increased the absorption of light in the repeatedly reflection and the refraction of silicon chip surface, its reflectivity is very low, is mainly reflected in the raising of short circuit current.The preparation of so-called suede structure is to utilize NaOH dilution, ethylenediamine and chemical mordants such as phosphorus benzenediol water, the monoethanolamine aqueous solution that silicon chip surface is carried out matte to handle, handle the back silicon chip surface and form densely covered pyramid shape tetragonal pyramid, the reflection of incident light rate is reduced in 10%.Making herbs into wool is reflected in the texturing slot to be carried out, because silicon chip and Woolen-making liquid have produced chemical reaction, original chemicals in order to make technology stability stronger, need be replenished corresponding chemicals by reaction consumes in the Woolen-making liquid in Woolen-making liquid after certain reaction times.In order to reduce the number of times of fluid infusion manually, the process of convenient fluid infusion, concentrated liquid supply device must be set, this liquid supply device can a large amount of chemical reagent of disposable storage, in the etching device operation process, according to the design of program, at the appointed time use mechanical pump in texturing slot, quantitatively to replenish chemical reagent.
This texturing slot liquid supply device, as shown in Figure 1, it comprises fluid reservoir 1, woven hose 2, fluid infusion pump 3, unidirectional valve 4, flowmeter 5 and texturing slot 6, fluid reservoir 1 passes through woven hose 2 with fluid infusion pump 3, unidirectional valve 4 and flowmeter 5 are together in series with texturing slot 6, the imbibition end of fluid infusion pump 3 links to each other with the bottom of fluid reservoir 1 by woven hose 2, the outlet end of flowmeter 5 feeds in the texturing slot 6 by woven hose 2, manually the chemical reagent for preparing is joined in the fluid reservoir of being made by the PP material 1, then in the process of etching device operation, at set intervals or after reacting certain number of times, open fluid infusion pump 3, extracting a certain amount of chemical reagent solution from the bottom of fluid reservoir 1 is transported to the texturing slot 6 of etching device by woven hose 2, by the capacity of flowmeter 5 demonstration make-up solution, after reaching predetermined magnitude of recruitment, close fluid infusion pump 3.From add the additional chemical reagent solution for preparing to fluid reservoir 1 after, to replenishing in the process of chemical reagent to texturing slot 6, the chemical reagent solution in the fluid reservoir 1 remains static always.Owing to contain number of chemical article and water in the chemical reagent solution, layering can take place after long-time static, thereby the concentration that has caused the chemical reagent solution of fluid reservoir 1 bottom is higher than the concentration at top, make that the chemical reagent solution concentration of replenishing in the different periods is variant, thereby influenced the stability of process for etching.
Summary of the invention:
In order to remedy the above deficiency that existing texturing slot liquid supply device exists, the purpose of this invention is to provide a kind of isoconcentration chemical reagent supplementary device.
The technical solution adopted in the present invention is:
A kind of isoconcentration chemical reagent supplementary device, it comprises fluid reservoir, woven hose, fluid infusion pump, unidirectional valve, flowmeter and texturing slot, fluid infusion pump, unidirectional valve and flowmeter are arranged between fluid reservoir and the texturing slot after being connected by woven hose, the liquid sucting port of fluid infusion pump is fed the bottom of fluid reservoir by woven hose, the liquid outlet of flowmeter feeds in the texturing slot through woven hose, it is characterized in that: be provided with solenoid directional control valve and overflow valve between fluid infusion pump and unidirectional valve, the liquid outlet of overflow valve and the refluxing opening of solenoid directional control valve all communicate with fluid reservoir.
Further, described solenoid directional control valve is the bi-bit bi-pass solenoid directional control valve.
Action request of the present invention is as follows: the fluid infusion pump is in running order all the time, before fluid infusion, the bi-bit bi-pass solenoid directional control valve is in closed condition, this moment, overflow valve was in overflow situation, it is suitable for reading that the chemical reagent that flows out from overflow valve directly pours fluid reservoir, thereby the chemical reagent in the fluid reservoir is evenly stirred, when needs during to the texturing slot fluid infusion, the bi-bit bi-pass solenoid directional control valve is in opening state, and the fluid infusion pump aspirates concentration evening chemical reagent and directly sends in the texturing slot through unidirectional valve, flowmeter from fluid reservoir.
Owing to set up bi-bit bi-pass solenoid directional control valve and overflow valve between fluid infusion pump and the unidirectional valve, in the etching device course of work, the fluid infusion pump is being worked always, before fluid infusion, the bi-bit bi-pass solenoid directional control valve is in closed condition, this moment, overflow valve was in overflow situation, flowing out chemical reagent from its liquid outlet directly is back to the fluid reservoir, so just can the chemical reagent in the fluid reservoir evenly be stirred, guarantee that the chemical reagent levels concentration in the fluid reservoir is even, make that the solution in the fluid reservoir is evenly not stratified, the concentration of guaranteeing each chemical reagent that replenishes in texturing slot is identical, guarantee that Woolen-making liquid satisfies technological requirement in the texturing slot, thereby improved the stability of process for etching, guaranteed the making herbs into wool quality of silicon chip.When needs during to the texturing slot fluid infusion, the bi-bit bi-pass solenoid directional control valve is in opening state, and the fluid infusion pump aspirates concentration evening chemical reagent and directly sends in the texturing slot through unidirectional valve, flowmeter from fluid reservoir.
Description of drawings:
Fig. 1 is the structural representation of existing rinse bath liquid supply device;
Fig. 2 is a structural representation of the present invention;
Among the figure: the 1-fluid reservoir; The 2-woven hose; 3-fluid infusion pump; The 4-unidirectional valve; The 5-flowmeter; The 6-texturing slot; The 7-solenoid directional control valve; The 8-overflow valve.
Embodiment:
Introduce the specific embodiment of the present invention in detail below in conjunction with accompanying drawing:
Described isoconcentration chemical reagent supplementary device, as shown in Figure 2, it comprises fluid reservoir 1, woven hose 2, fluid infusion pump 3, unidirectional valve 4, flowmeter 5 and texturing slot 6, fluid infusion pump 3, unidirectional valve 4 and flowmeter 5 are arranged between fluid reservoir 1 and the texturing slot 6 after being connected by woven hose 2, the liquid sucting port of fluid infusion pump 3 is fed the bottom of fluid reservoir 1 by woven hose 2, the liquid outlet of flowmeter 5 feeds in the texturing slot 6 through woven hose 2, it is characterized in that: between fluid infusion pump 3 and unidirectional valve 4, be provided with bi-bit bi-pass solenoid directional control valve 7, between bi-bit bi-pass solenoid directional control valve 7 and fluid infusion pump 3, be provided with overflow valve 8, the refluxing opening of the liquid outlet of overflow valve 8 and bi-bit bi-pass solenoid directional control valve 7 all communicates with fluid reservoir 1, the job requirement of bi-bit bi-pass solenoid directional control valve 7 is: before fluid infusion, bi-bit bi-pass solenoid directional control valve 7 is in closed condition, fluid infusion pump 3 is worked all the time, this moment, overflow valve 8 was in overflow situation, it is suitable for reading that its liquid outlet feeds fluid reservoir 1, thereby the chemical reagent in the fluid reservoir 1 is evenly stirred, when needs during to texturing slot 6 fluid infusion, bi-bit bi-pass solenoid directional control valve 7 is in opening state, and fluid infusion pump 3 aspirates concentration evening chemical reagent through unidirectional valve 4 from fluid reservoir 1, flowmeter 5 is directly sent in the texturing slot 6.
Its course of work is as follows: in the etching device course of work, fluid infusion pump 3 is being worked always, before fluid infusion, bi-bit bi-pass solenoid directional control valve 7 is in closed condition, this moment, overflow valve 8 was in overflow situation, flowing out chemical reagent from its liquid outlet directly is back to the fluid reservoir 1, so just can the chemical reagent in the fluid reservoir 1 evenly be stirred, guarantee that the chemical reagent levels concentration in the fluid reservoir 1 is even, make that the solution in the fluid reservoir 1 is evenly not stratified, guarantee that the concentration of each chemical reagent that replenishes in texturing slot 6 is identical, guarantee that Woolen-making liquid satisfies technological requirement in the texturing slot 6, thereby improved the stability of process for etching, guaranteed the making herbs into wool quality of silicon chip.When needs during to texturing slot 6 fluid infusion, bi-bit bi-pass solenoid directional control valve 7 is in opening state, and fluid infusion pump 3 aspirates concentration evening chemical reagent and directly sends in the texturing slot 6 through unidirectional valve 4, flowmeter 5 from fluid reservoir 1.
Claims (2)
1. isoconcentration chemical reagent supplementary device, it comprises fluid reservoir (1), woven hose (2), fluid infusion pump (3), unidirectional valve (4), flowmeter (5) and texturing slot (6), fluid infusion pump (3), unidirectional valve (4) and flowmeter (5) are arranged between fluid reservoir (1) and the texturing slot (6) after being connected by woven hose (2), the liquid sucting port of fluid infusion pump (3) is fed the bottom of fluid reservoir (1) by woven hose (2), the liquid outlet of flowmeter (5) feeds in the texturing slot (6) through woven hose (2), it is characterized in that: be provided with solenoid directional control valve (7) and overflow valve (8) between fluid infusion pump (3) and unidirectional valve (4), the refluxing opening of the liquid outlet of overflow valve (8) and solenoid directional control valve (7) all communicates with fluid reservoir (1).
2. according to the described isoconcentration chemical reagent of claim 1 supplementary device, it is characterized in that: described solenoid directional control valve (7) is the bi-bit bi-pass solenoid directional control valve.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105620799A CN102082201A (en) | 2010-11-29 | 2010-11-29 | Isocyatic chemical reagent supplementing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105620799A CN102082201A (en) | 2010-11-29 | 2010-11-29 | Isocyatic chemical reagent supplementing device |
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| Publication Number | Publication Date |
|---|---|
| CN102082201A true CN102082201A (en) | 2011-06-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010105620799A Pending CN102082201A (en) | 2010-11-29 | 2010-11-29 | Isocyatic chemical reagent supplementing device |
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| CN (1) | CN102082201A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103185805A (en) * | 2011-12-28 | 2013-07-03 | 上海丰汇医学科技有限公司 | Cuvette flushing system for full automatic biochemical analyzer |
| CN105734676A (en) * | 2016-02-24 | 2016-07-06 | 江苏永能光伏科技有限公司 | Polycrystalline texturing automatic liquid supplementing device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003230868A (en) * | 2002-02-08 | 2003-08-19 | Sony Corp | Cleaning device |
| CN101667608A (en) * | 2009-09-29 | 2010-03-10 | 上海昕通半导体设备有限公司 | System and method for automatically and circularly complementing crystalline-silicon solar cell texture etch solution |
| CN201570510U (en) * | 2009-12-15 | 2010-09-01 | 南安市三晶阳光电力有限公司 | Novel silicon wafer texturing device |
| CN201887065U (en) * | 2010-11-29 | 2011-06-29 | 常州亿晶光电科技有限公司 | Device for supplementing isoconcentration chemical reagents |
-
2010
- 2010-11-29 CN CN2010105620799A patent/CN102082201A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003230868A (en) * | 2002-02-08 | 2003-08-19 | Sony Corp | Cleaning device |
| CN101667608A (en) * | 2009-09-29 | 2010-03-10 | 上海昕通半导体设备有限公司 | System and method for automatically and circularly complementing crystalline-silicon solar cell texture etch solution |
| CN201570510U (en) * | 2009-12-15 | 2010-09-01 | 南安市三晶阳光电力有限公司 | Novel silicon wafer texturing device |
| CN201887065U (en) * | 2010-11-29 | 2011-06-29 | 常州亿晶光电科技有限公司 | Device for supplementing isoconcentration chemical reagents |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103185805A (en) * | 2011-12-28 | 2013-07-03 | 上海丰汇医学科技有限公司 | Cuvette flushing system for full automatic biochemical analyzer |
| CN105734676A (en) * | 2016-02-24 | 2016-07-06 | 江苏永能光伏科技有限公司 | Polycrystalline texturing automatic liquid supplementing device |
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Application publication date: 20110601 |