CN102073086B - Multi-wavelength output etalon and manufacturing method of same - Google Patents
Multi-wavelength output etalon and manufacturing method of same Download PDFInfo
- Publication number
- CN102073086B CN102073086B CN2010106070654A CN201010607065A CN102073086B CN 102073086 B CN102073086 B CN 102073086B CN 2010106070654 A CN2010106070654 A CN 2010106070654A CN 201010607065 A CN201010607065 A CN 201010607065A CN 102073086 B CN102073086 B CN 102073086B
- Authority
- CN
- China
- Prior art keywords
- etalon
- substrate
- wavelength output
- coated
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/284—Interference filters of etalon type comprising a resonant cavity other than a thin solid film, e.g. gas, air, solid plates
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The present invention relates to the field of optics and laser light, in particular to the field of an etalon, and discloses a multi-wavelength output etalon and a manufacturing method of the same. The etalon comprises an etalon cavity substrate, a transitional block and a top block, the particle beam of a coating machine and a baffle are mainly adopted for gradual coverage, the etalon cavity substrate is coated with a membrane layer made with the same material as the substrate, a one-dimensional or two-dimensional step substrate is further formed on the etalon cavity substrate and is coated with a highly reflective membrane, the top block is coated with a reflective membrane, and thus the etalon with the step substrate and the top block forming a plurality of levels of central wavelengths of homology can be obtained. The etalon needs no change of the incidence direction to obtain multiple central wavelengths of homology. Moreover, the spacing processing accuracy of the etalon is high, up to a nanometer magnitude. The output with multiple central wavelengths of homology can be achieved with no need for adjustment of the incidence angle, and the etalon is particularly suitable for a device with double optical fiber receiving and reflecting ends.
Description
Technical field
The present invention relates to optics and laser field, relate in particular to the etalon field.
Background technology
Traditional etalon is comprised of two surface plates of parallel placement, metal-coated membrane or other have than the film of high reflectance and realize multiple-beam interference on two plates relative planes, utilize multiple-beam interference principle to produce very thin sharp striped, can select the light beam low-loss of specific wavelength to see through, other wavelength loss is very large.Its light path principle as shown in Figure 1, the phasic difference of adjacent two light
And then transmissivity is:
As seen its transmissivity is wavelength X
0, thickness h, reflectivity R function.
In optical-fibre communications, often need the different wavelength of same standard prodigiosin output, traditional etalon generally adopts the different incidence angles degree to realize the output of different wave length.But laser facula is usually in 400 about μ m, thereby the etalon incident angle is less, and the output wavelength scope is also less; In addition, tradition mostly is to utilize optics to process the production standard tool, so the etalon interval can only be worked into systems more than also usually, is difficult to the thickness and precision that reaches required.
Summary of the invention
For overcoming the problems referred to above, the present invention proposes etalon of a kind of novel multi-wavelength output and preparation method thereof.
for achieving the above object, technical scheme provided by the invention is: a kind of etalon of multi-wavelength output, comprise etalon chamber plate base, transition block and jacking block, described transition block is by optical cement or be adhesively fixed on substrate, described jacking block is by optical cement or be adhesively fixed on transition block, it is characterized in that: the step substrate that is coated with one dimension or two dimension on described substrate, be coated with one deck high-reflecting film on described step substrate, described jacking block is coated with reflectance coating, the step substrate of described plating high-reflecting film and the jacking block of described plating reflectance coating form the multistage etalon of centre of homology wavelength.
Further, described step substrate is identical with baseplate material; Described transition block is the optical material of easy and base plate bonding; Described jacking block is easy and the optical material of transition block gummed.
Further, a kind of method for making of etalon of multi-wavelength output comprises the steps:
Step 1: first production standard tool chamber plate base, and by the coating machine particle beams with utilize baffle plate progressively to cover to plate the rete identical with substrate material on substrate, and then form the step substrate of one dimension or two dimension on substrate;
Step 2: plating one deck high-reflecting film on the step substrate on substrate on the basis of step 1;
Step 3: the step substrate surrounding optical cement on the basis of step 2 on substrate or gluing transition block;
Step 4: optical cement or gluing is coated with the jacking block of reflectance coating on transition block on the basis of step 3.
Further, described baseplate material is quartz material or performance and quartzy similarly optical material; Described transition block and jacking block are also quartz materials; Described step substrate is the one dimension step of ten grades or the two-dimensional stepped of 10 * 10 grades, every layer of height that differs 1nm-10nm.
The etalon of a kind of multi-wavelength output of the present invention does not need to change the incident light direction, can obtain the wavelength output of a plurality of centres of homology, and etalon interval machining precision is high, can reach nanometer scale.Need not regulate incident angle because of it and can obtain the wavelength output of a plurality of centres of homology, be specially adapted to two optical fiber and received the reflection end device.
Description of drawings
Fig. 1 is the basic index path of etalon, i.e. a multiple-beam interference schematic diagram;
Fig. 2 is a kind of etalon manufacturing process of multi-wavelength output, the schematic diagram of plating step substrate on substrate;
Fig. 3 is a kind of etalon manufacturing process of multi-wavelength output, the schematic diagram of plating high-reflecting film on the step substrate;
Fig. 4 is a kind of etalon manufacturing process of multi-wavelength output, the schematic diagram of the step substrate surrounding optical cement SiO2 transition block on substrate;
Fig. 5 is a kind of etalon manufacturing process of multi-wavelength output, and optical cement one is coated with the schematic diagram of the SiO2 jacking block of reflectance coating on the SiO2 transition block, is also the structural representation of the etalon of a kind of multi-wavelength output of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described further explanation.
technical scheme provided by the invention is: a kind of etalon of multi-wavelength output, comprise etalon chamber plate base 101, transition block 107 and jacking block 109, described transition block is by optical cement 106 or be adhesively fixed on substrate, described jacking block is by optical cement 108 or be adhesively fixed on transition block, it is characterized in that: the step substrate 102 that is coated with one dimension or two dimension on described substrate, be coated with one deck high-reflecting film 105 on described step substrate, described jacking block is coated with reflectance coating 110, the step substrate of described plating high-reflecting film and the jacking block of described plating reflectance coating form the multistage etalon of centre of homology wavelength.A kind of method for making of etalon of multi-wavelength output, mainly by the coating machine particle beams with utilize baffle plate progressively to cover on the plate base of etalon chamber to plate the rete identical with baseplate material, and then form the step substrate of one dimension or two dimension on substrate, plate high-reflecting film again on the step substrate, plate reflectance coating on jacking block, thereby step substrate and jacking block form the multistage etalon of centre of homology wavelength.
Embodiment one: as shown in Figure 1, and by phasic difference
And transmissivity
(wherein, n ' is the substrate refractive index, and h is etalon thickness, and θ ' incides refraction angle in medium for light, and R is reflectivity) can draw transmission peak wavelength maximum value condition:
The tuning amount of transmission peak wavelength λ maximum value and etalon thickness h and incident angle θ have following relation:
Etalon thickness is fixedly the time,
Because incident angle is very little, Δ λ
jAlso be difficult to reach very large, therefore larger centre of homology wavelength tuning amount is difficult to realize.And when incident angle fixedly the time, as shown in Figure 5,
(wherein Δ h=h2-h1=h3-h4=hn-hn-1) changes thickness and is easy to satisfy larger centre of homology wavelength tuning amount, further, when thickness changes Δ h, 2 Δ h, 3 Δ h......, can export successively transmission maximum value wavelength X+Δ λ
j, λ+2 Δ λ
j, λ+3 Δ λ
j....
Based on this principle, the multi-wavelength outputting standard lamps structure of the present embodiment as shown in Figure 5, adopt mask to plate out the stepped ramp type substrate on the plate base of etalon chamber, as forming quartzy step substrate with the SiO2 plated film on quartz substrate, plate high-reflecting film again on the step substrate, as shown in Figure 2 and Figure 3, so just can ignore its refractive index difference.If every layer of plated film differs 1nm-10nm, ten grades just change 10-100nm.If vertical direction is plated the step of 10 different-thickness again, can form 10 * 10 step substrates.Step substrate surrounding optical cement one SiO2 transition block on substrate, optical cement one is coated with the jacking block of reflectance coating on transition block again, this jacking block and the described step substrate that is coated with high-reflecting film form a multistage etalon of centre of homology wavelength, such etalon can on the basis that does not change incident direction, obtain n * m centre of homology wavelength.
The manufacturing process of the etalon of this multi-wavelength output specifically comprises the steps: as shown in Fig. 2-5
Step 1: as shown in Figure 2, first with quartz substrate production standard tool chamber plate base 101, and by the coating machine particle beams 104 with utilize baffle plate 103 progressively to cover to plate the SiO2 step substrate rete 102 identical with baseplate material on substrate, so just can ignore its refractive index difference.Every layer of plated film differs 1nm-10nm, and ten grades of step substrate retes just change 10-100nm, and then plate in the vertical direction the step rete of 10 different-thickness again, can form 10 * 10 step substrates.
Step 2: as shown in Figure 3, plating one deck high-reflecting film 105 on the step substrate on substrate on the basis of step 1;
Step 3: as shown in Figure 4, the step substrate surrounding optical cement 106 on the basis of step 2 on substrate or gluing SiO2 transition block 107;
Step 4: as shown in Figure 5, on the basis of step 3 on the SiO2 transition block optical cement 108 or gluing be coated with the SiO2 jacking block 109 of reflectance coating 110.
So, be coated with the quartzy jacking block of reflectance coating and the multistage etalon of centre of homology wavelength of the SiO2 step substrate formation one 10 * 10 of plating high-reflecting film, on the basis that does not change incident direction, can obtain 10 * 10 centre of homology wavelength output.
Although specifically show and introduced this patent in conjunction with preferred embodiment; but the those skilled in the art should be understood that; within not breaking away from the spirit and scope of the present invention that appended claims limits; can make a variety of changes the present invention in the form and details, be protection scope of the present invention.
Claims (6)
1. the method for making of the etalon of a multi-wavelength output, comprise the steps:
Step 1: first production standard tool chamber plate base (101), and by the coating machine particle beams (104) with utilize baffle plate (103) progressively to cover to plate the rete identical with substrate (101) material on substrate (101), and then at the upper step substrate (102) that forms one dimension or two dimension of substrate (101);
Step 2: plating one deck high-reflecting film (105) on the step substrate (102) on substrate (101) on the basis of step 1;
Step 3: (102) surrounding optical cement (106) on substrate (101) on the basis of step 2 or gluing transition block (107);
Step 4: the jacking block (109) that is coated with reflectance coating (110) on the basis of step 3 at the upper optical cement (108) or gluing of transition block (107).
2. the method for making of the etalon of a kind of multi-wavelength output as claimed in claim 1, it is characterized in that: described substrate (101) material is quartzy.
3. the method for making of the etalon of a kind of multi-wavelength output as claimed in claim 1, it is characterized in that: described transition block (107) and jacking block (109) are quartz.
4. the method for making of the etalon of a kind of multi-wavelength output as claimed in claim 1, is characterized in that: every layer of height that differs 1nm-10nm of described step substrate (102).
5. the method for making of the etalon of a kind of multi-wavelength output as claimed in claim 1, it is characterized in that: described step substrate (102) is the one dimension step of ten grades.
6. the method for making of the etalon of a kind of multi-wavelength output as claimed in claim 1, it is characterized in that: described step substrate (102) is the two-dimensional stepped of 10 * 10 grades.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010106070654A CN102073086B (en) | 2010-12-27 | 2010-12-27 | Multi-wavelength output etalon and manufacturing method of same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010106070654A CN102073086B (en) | 2010-12-27 | 2010-12-27 | Multi-wavelength output etalon and manufacturing method of same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102073086A CN102073086A (en) | 2011-05-25 |
| CN102073086B true CN102073086B (en) | 2013-06-26 |
Family
ID=44031697
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010106070654A Active CN102073086B (en) | 2010-12-27 | 2010-12-27 | Multi-wavelength output etalon and manufacturing method of same |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102073086B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4822998A (en) * | 1986-05-15 | 1989-04-18 | Minolta Camera Kabushiki Kaisha | Spectral sensor with interference filter |
| CN1309285A (en) * | 1999-09-01 | 2001-08-22 | 朗迅科技公司 | Improved step standard device |
| CN201278029Y (en) * | 2008-10-14 | 2009-07-22 | 福州高意通讯有限公司 | Optical structure |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7202955B2 (en) * | 2004-06-30 | 2007-04-10 | Digital Optics Corporation | Spectrally diverse spectrometer and associated methods |
| US20090073451A1 (en) * | 2004-06-30 | 2009-03-19 | Tekolste Robert D | Spectrally diverse, spatially sensitive apparatus and associated methods |
-
2010
- 2010-12-27 CN CN2010106070654A patent/CN102073086B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4822998A (en) * | 1986-05-15 | 1989-04-18 | Minolta Camera Kabushiki Kaisha | Spectral sensor with interference filter |
| CN1309285A (en) * | 1999-09-01 | 2001-08-22 | 朗迅科技公司 | Improved step standard device |
| CN201278029Y (en) * | 2008-10-14 | 2009-07-22 | 福州高意通讯有限公司 | Optical structure |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102073086A (en) | 2011-05-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP3063570B1 (en) | Optical grating coupling structure | |
| US7616856B2 (en) | Varying refractive index optical medium using at least two materials with thicknesses less than a wavelength | |
| CN107664780B (en) | Dielectric nano brick array structure and its application as high-reflecting film and high transmittance film | |
| CN102549328A (en) | Optical element, light source device, and projection display device | |
| EP2300859B1 (en) | Light manipulation arrangement | |
| CN102109625A (en) | Method for manufacturing subwavelength grating reflector with high reflectivity and high bandwidth | |
| Li et al. | Reflectionless tilted grating couplers with improved coupling efficiency based on a silicon overlay | |
| US7230762B1 (en) | Polarization phase difference plate | |
| CN116165742A (en) | Double-layer silicon nitride grating coupler integrated with bottom reflecting layer | |
| US6904200B2 (en) | Multidimensional optical gratings | |
| CN110989061A (en) | All-dielectric polarization-independent total internal reflection grating and manufacturing method thereof | |
| KR101510358B1 (en) | Broadband optical beam splitters | |
| CN102073086B (en) | Multi-wavelength output etalon and manufacturing method of same | |
| CN202870343U (en) | Reflecting type array waveguide grating based on multiple-mode interferometer reflector | |
| CN103235417A (en) | Thin film type optical collimator on basis of surface plasmon polaritons | |
| CN101464535A (en) | Etalon and method for producing the same | |
| JP2007101926A (en) | Transmission grating and spectral element and spectroscope using the same | |
| CN101086453B (en) | Measuring rod with a reflective phase jitter | |
| CN110661172A (en) | Surface-emitting DFB semiconductor laser array and manufacturing method thereof | |
| CN115144964A (en) | Silicon-based array waveguide grating based on Euler bending wide waveguide | |
| CN113064228A (en) | Vortex light generating device and manufacturing method thereof | |
| CN103647207A (en) | Reflective film for laser resonant cavity mirror, and preparation method thereof | |
| CN100385266C (en) | Two-dimensional pass band channel filter capable of tuning relative position | |
| CN112649910A (en) | Multi-layer grating structure | |
| CN114859453B (en) | Random polarization beam combining grating based on continuous interface all-dielectric film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |