CN102063021A - Attenuation device capable of adjusting light beam energy - Google Patents
Attenuation device capable of adjusting light beam energy Download PDFInfo
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- CN102063021A CN102063021A CN2010105725470A CN201010572547A CN102063021A CN 102063021 A CN102063021 A CN 102063021A CN 2010105725470 A CN2010105725470 A CN 2010105725470A CN 201010572547 A CN201010572547 A CN 201010572547A CN 102063021 A CN102063021 A CN 102063021A
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- sheet glass
- light beam
- clamping mechanism
- beam energy
- damping device
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Abstract
The invention relates to an attenuation device capable of adjusting light beam energy. The attenuation device is arranged between a light source and a lighting system of a projection mask aligner, and first flat glass and second flat glass are arranged oppositely, so that an incident light beam passes through the first flat glass and the second flat glass to generate an output light beam, with required intensity, to be input into the lighting system. The first flat glass and the second flat glass are rigidly connected together through a clamping mechanism and a transmission mechanism and are driven by a motor to move in a reversal synchronous rotation manner so as to change the incident angle of the light beam on the flat glass, so that the intensity of the output light beam is changed. In the invention, the continuous change of the intensity of the light beam is allowed under the condition of not changing the position of the incident light beam, the uniformity of a projection beam in the projection mask aligner is improved, the exposure dosage on a substrate is controlled, and the photoetching quality is improved.
Description
Technical field
The invention belongs to the lithographic equipment technical field, relate to a kind of tunable optical beam energy attenuating device,, adjust and enter the beam energy of lithographic equipment illuminator according to different photoetching requirements.
Background technology
Photoetching technique is that the manufacturing microtexture preferably also is the most general a kind of process technology in the modern processing, particularly optical projection lithography technology wherein is modern great scale integrated circuit (worker C), MEMS (micro electro mechanical system) (MEMS), the topmost manufacturing process of flat-panel monitor (LCD, OLED etc.) made.
The similar camera photograph of the ultimate principle of projection lithography technology principle, light source passes through illuminator, the high evenly illuminated field that formation meets the demands, illumination is fixed on the mask plate on the mask stage, required litho pattern is arranged on the mask plate, projection objective is imaged onto on the substrate that is fixed on the work stage illuminated mask pattern is aberrationless, by subsequent technique, obtains required microtexture again.And illuminator will form the high evenly illuminated field that meets the demands, and controls exposure dose accurately and mainly uses the adjustable damping device and realize.
Use the attenuator mostly light beam adjustable damping device is the variable density disc type at present, each zonule has different transmission performances, realizes that by the attenuator that rotates this disc type luminous energy in various degree decays.But, this attenuator complex process, the intensification of being heated easily, bigger to the parameter of device itself and internal environment influence, cause influencing some factor of system performance, as the homogeneity of projected bundle etc.
Summary of the invention
Variable density disc type attenuator the objective of the invention is to make on-chip exposure dose not have the adverse influence performance parameter when accurately being controlled to the influence of entire lighting device in the prior art in order to overcome; No matter incident beam is to assemble, disperse or parallel, all allows optical projection system not change the incident beam position and the intensity of continuous change projected bundle, realizes the accurate control of exposure dose the invention provides a kind of beam energy adjustable damping device for this reason.
For realizing purpose of the present invention, the present invention proposes the technical scheme that the beam energy adjustable damping device solves technical matters in a kind of projection mask aligner adopted: described device is used to regulate the beam energy that enters the lithographic equipment illuminator from light source, and be positioned in the projection mask aligner between the lighting source and illuminator, first sheet glass, second sheet glass, first clamping mechanism, second clamping mechanism, gear train, motor and angle detection device, first sheet glass and second sheet glass are staggered relatively, one end face portion of first sheet glass places between the clamping portion of first clamping mechanism, one end face portion of second sheet glass places between the clamping portion of clamping mechanism, the fixed connecting end of the fixed connecting end of first clamping mechanism and second clamping mechanism is rigidly connected with the two ends of gear train respectively, and the two ends of the axle of motor connect gear train and angle detection device respectively; First sheet glass is positioned at after the lighting source, and after first sheet glass was crossed in the light beam transmission that lighting source sends, because incident beam has certain incident angle with first sheet glass, skew had taken place in the position of light beam, and the intensity of light beam has produced decay.Motor and angle detection device drive two engaged gears by electric transmission rod and rotate, driving clamping mechanism control first sheet glass and the second sheet glass reverse sync staggered relatively rotatablely moves, in order to change the incident angle of light beam on first sheet glass and second sheet glass of lighting source, thereby the output intensity behind the light beam process beam energy adjustable damping device that the change light source sends, controlled the incident light energy of illuminator, also just control on-chip exposure dose, reached the purpose that improves photoetching quality.
Principle of the present invention is: adopt motor-driven to control two sheet glass and do reverse sync and rotatablely move, its principle is based on the refraction theorem and the reflection theorem of light, keeping changing the energy of transmitted light beam under the constant prerequisite of light path, thereby realizing the control of exposure dose.
The invention has the beneficial effects as follows:
(1) anglec of rotation and the speed of employing angle detection device and Electric Machine Control glass plate realize the control of exposure dose by the energy that changes its transmitted light beam.
(2) two glass plate reverse sync are rotated, and do not change the position of output beam when changing output beam intensity.
(3) beam energy adjustable damping apparatus structure is simple, easily adjusts, and cost is low.
The present invention allows to continuously change the intensity of light beam and the position that do not change incident beam, has improved the homogeneity of projected bundle in the projection mask aligner, has controlled exposure dose on the substrate, has improved photoetching quality.
Description of drawings
Fig. 1 is a composition structural representation of the present invention
Fig. 2 is that the present invention adjusts the light path schematic top plan view
Fig. 3 is the beam Propagation synoptic diagram
Embodiment
For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.
As Fig. 1 beam energy adjustable damping device of the present invention being shown is arranged in the projection mask aligner between the light source and lithographic equipment illuminator, it mainly acts on is that beam energy to light source sends is regulated, beam energy in the control input lithographic equipment illuminator, thereby reach the control exposure dose, guarantee the purpose of photoetching quality.
Constitute by first sheet glass 1, second sheet glass 2, first clamping mechanism 3, second clamping mechanism 4, gear train 5, motor 6 and angle detection device 7 as beam energy adjustable damping device among Fig. 1.Described device is used to regulate the beam energy that enters the lithographic equipment illuminator from light source, and be positioned in the projection mask aligner between the lighting source and illuminator, first sheet glass 1, second sheet glass 2, first clamping mechanism 3, second clamping mechanism 4, gear train 5, motor 6 and angle detection device 7, first sheet glass 1 and second sheet glass 2 are staggered relatively, one end face portion of first sheet glass 1 places between the clamping portion of first clamping mechanism 3, one end face portion of second sheet glass 2 places between the clamping portion of clamping mechanism 4, the fixed connecting end of the fixed connecting end of first clamping mechanism 3 and second clamping mechanism 4 is rigidly connected with the two ends of gear train 5 respectively, and the two ends of the axle of motor 6 connect gear train 5 and angle detection device 7 respectively; First sheet glass 1 is positioned at after the lighting source, and after first sheet glass 1 was crossed in the light beam transmission that lighting source sends, because incident beam has certain incident angle with first sheet glass, skew had taken place in the position of light beam, and the intensity of light beam has produced decay.Motor 6 and angle detection device 7 drive two engaged gears by electric transmission rod and rotate, driving clamping mechanism 4 controls first sheet glass 1 and second sheet glass, 2 reverse sync staggered relatively rotatablely moves, in order to change the incident angle of light beam on first sheet glass 1 and second sheet glass 2 of lighting source, thereby the output intensity behind the light beam process beam energy adjustable damping device that the change light source sends, controlled the incident light energy of illuminator, also just control on-chip exposure dose, reached the purpose that improves photoetching quality.
Wherein: the rotation of first sheet glass 1 and second sheet glass, 2 reverse sync does not change the position of incident beam when guaranteeing to continuously change the intensity of light beam.
Wherein: the surface of described first sheet glass 1 and second sheet glass 2 is coated with and is useful on film, the film of described single film layer coating and the film of laminated coating that improves its reflectivity.
Wherein: the laminated coating of described first sheet glass 1 and second sheet glass 2 also is included in the double-deck lamination of random variation on the laminated thickness.
Wherein: described first clamping mechanism 3, second clamping mechanism 4 are glass folder or instrument bezel, and described glass folder or instrument bezel are used for first sheet glass 1 and second sheet glass 2 are fixed on mechanism on the gear train 5.
Wherein: described gear train 5 comprises two engaged gears and an electronic bull stick, and described gear train is to be used to drive the mechanism that first sheet glass 1 and second sheet glass 2 rotate.
Wherein: described motor 6 is a kind of in stepper motor, servomotor and the torque motor.
Wherein, described angle detection device 7 and motor 6 supporting uses are used for accurately locating the anglec of rotation of first sheet glass 1 and second sheet glass 2.
Wherein, described angle detection device 7 is scramblers.
As shown in Figure 2, the light beam that light source sends is input in the beam energy adjustable damping device, incides at a certain angle on first sheet glass 1.This moment with regard to first sheet glass 1 as shown in Figure 3
According to energy relationship
I
in＝I
out+I
f， (1)
I
f＝RI
in (2)
I in the formula
InBe incident light energy, I
OutBe transmitted light energy, I
fBe the luminous energy of reflection loss, R is the reflection factor relevant with incident angle.Can get by formula (1) and (2)
I
out＝(1-R)I
in
Certain decay has taken place compared to the energy of incident beam in the transmission beam energy of crossing first sheet glass 1 and second sheet glass 2 thus.Under the immovable situation in incident beam position, owing to the rotation of first sheet glass 1 and second sheet glass 2, changed the incident angle of light beam, corresponding reflection factor R also changes thereupon, thereby changes the output energy I of light beam
OutThe method reflects away the part luminous energy, has solved the problem that additive method causes device to heat up easily because of energy absorption.
In the light energy output of adjusting light beam, because first sheet glass 1 and second sheet glass 2 certainly exist certain thickness, this will cause the light beam of transmission with incident beam certain skew to be arranged.As shown in Figure 3, first sheet glass 1 and second sheet glass 2 are arranged in air, the refractive index of first sheet glass 1 and second sheet glass 2 is n, and incident angle and the refraction angle of light on two planes of refraction of first sheet glass 1 and second sheet glass 2 is respectively I
1, I '
1, and I
2, I '
2Because two planes of refraction are parallel, and I is then arranged
2=I '
1, by refraction law,
sinI
1＝nsinI’
1＝nsinI
2＝sinI’
2
So, I
1=I '
2, promptly light beam through first sheet glass 1 and second sheet glass, 2 rears to constant.Outgoing beam and incident beam do not overlap as can be known from Figure, have produced lateral shift Δ L, according to triangular relationship, finally can get
By refraction law sinI
1/ (sinI '
1)=n, substitution gets
O is the intersection point of the incident beam and the first sheet glass plane of incidence in the formula, and D is that the plane of incidence of same first sheet glass of extended line of outgoing beam gets intersection point.OD is the distance between 2, d is the thickness of first sheet glass, n is the optical index of first sheet glass, then as can be known by last formula, lateral shift Δ L is different with the difference of incident angle, therefore in first sheet glass 1 and 2 rotations of second sheet glass, the position of output beam is also in skew thereupon.
For fear of the skew of light path, as shown in Figure 2, the transmitted light beam that translation takes place through first sheet glass 1 again through second sheet glass, 2 post-compensations the skew of light path.Because second sheet glass 2 and first sheet glass 1 are the reverse sync motions, the angle of light beam incident first sheet glass 1 and second sheet glass 2 is just surplus mutually, and light beam produces lateral shift reverse with through first sheet glass 1 time through second sheet glass 2.Initial position when light beam is got back to incident has been avoided compensating the adverse effect that the light path skew brings by moving of light source.When assurance continuously changes the intensity of light beam, do not change the position of incident beam, improved the homogeneity of projected bundle in the projection mask aligner, controlled exposure dose on the substrate, improved photoetching quality.
The above; only be the embodiment among the present invention; but protection scope of the present invention is not limited thereto; anyly be familiar with the people of this technology in the disclosed technical scope of the present invention; can understand conversion or the replacement expected; all should be encompassed in of the present invention comprising within the scope, therefore, protection scope of the present invention should be as the criterion with the protection domain of claims.
Claims (9)
1. beam energy adjustable damping device, it is characterized in that comprising: described device is used to regulate the beam energy that enters the lithographic equipment illuminator from light source, and be positioned in the projection mask aligner between the lighting source and illuminator, first sheet glass (1), second sheet glass (2), first clamping mechanism (3), second clamping mechanism (4), gear train (5), motor (6) and angle detection device (7), first sheet glass (1) is staggered relatively with second sheet glass (2), one end face portion of first sheet glass (1) places between the clamping portion of first clamping mechanism (3), one end face portion of second sheet glass (2) places between the clamping portion of clamping mechanism (4), the fixed connecting end of the fixed connecting end of first clamping mechanism (3) and second clamping mechanism (4) is rigidly connected with the two ends of gear train (5) respectively, and the two ends of the axle of motor (6) connect gear train (5) and angle detection device (7) respectively; First sheet glass (1) is positioned at after the lighting source, after first sheet glass (1) is crossed in the light beam transmission that lighting source sends, because incident beam has certain incident angle with first sheet glass, skew has taken place in the position of light beam, and the intensity of light beam has produced decay; Motor (6) and angle detection device (7) drive two engaged gears by electric transmission rod and rotate, driving clamping mechanism (4) control first sheet glass (1) and second sheet glass (2) reverse sync staggered relatively rotatablely moves, in order to change the incident angle of light beam on first sheet glass (1) and second sheet glass (2) of lighting source, thereby the output intensity behind the light beam process beam energy adjustable damping device that the change light source sends, control the incident light energy of illuminator, also just controlled on-chip exposure dose.
2. beam energy adjustable damping device according to claim 1 is characterized in that: the rotation of first sheet glass (1) and second sheet glass (2) reverse sync does not change the position of incident beam when guaranteeing to continuously change the intensity of light beam.
3. beam energy adjustable damping device according to claim 1, it is characterized in that: the surface of described first sheet glass (1) and second sheet glass (2) is coated with and is useful on film, the film of described single film layer coating and the film of laminated coating that improves its reflectivity.
4. beam energy adjustable damping device according to claim 3 is characterized in that: the laminated coating of described first sheet glass (1) and second sheet glass (2) also is included in the double-deck lamination of random variation on the laminated thickness.
5. beam energy adjustable damping device according to claim 1, it is characterized in that: described first clamping mechanism (3), second clamping mechanism (4) are glass folder or instrument bezel, and described glass folder or instrument bezel are used for first sheet glass (1) and second sheet glass (2) are fixed on mechanism on the gear train (5).
6. beam energy adjustable damping device according to claim 1, it is characterized in that: described gear train (5) comprises two engaged gears and an electronic bull stick, and described gear train is to be used to drive the mechanism that first sheet glass (1) and second sheet glass (2) rotate.
7. beam energy adjustable damping device according to claim 1 is characterized in that: described motor (6) is a kind of in stepper motor, servomotor and the torque motor.
8. beam energy adjustable damping device according to claim 1 is characterized in that, described angle detection device (7) and the supporting use of motor (6) are used for accurately locating the anglec of rotation of first sheet glass (1) and second sheet glass (2).
9. beam energy adjustable damping device according to claim 1 is characterized in that described angle detection device (7) is a scrambler.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105725470A CN102063021B (en) | 2010-12-01 | 2010-12-01 | Attenuation device capable of adjusting light beam energy |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010105725470A CN102063021B (en) | 2010-12-01 | 2010-12-01 | Attenuation device capable of adjusting light beam energy |
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| CN102063021A true CN102063021A (en) | 2011-05-18 |
| CN102063021B CN102063021B (en) | 2013-04-10 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104111238A (en) * | 2013-04-16 | 2014-10-22 | 烁光特晶科技有限公司 | Optical material transmittance testing system and testing method thereof |
| CN105988211A (en) * | 2015-01-28 | 2016-10-05 | 上海微电子装备有限公司 | Dual-lens laser attenuation device capable of realizing full-open mode |
| CN109466909A (en) * | 2018-12-18 | 2019-03-15 | 天津沃翔科技有限公司 | Laser emitter for mine conveying belt detection device |
| CN113050378A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Energy adjusting device, energy adjusting method, illumination system and photoetching machine |
| CN114326315A (en) * | 2020-09-30 | 2022-04-12 | 上海微电子装备（集团）股份有限公司 | Light beam transmittance adjusting device and optical lighting system |
| WO2024000641A1 (en) * | 2022-06-29 | 2024-01-04 | 长鑫存储技术有限公司 | Control method and apparatus for beam energy adjusting device and wafer processing device |
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| US4747673A (en) * | 1987-06-01 | 1988-05-31 | The United States Of America As Represented By The Secretary Of The Navy | High power optical attenuator |
| US4775220A (en) * | 1987-11-23 | 1988-10-04 | Advanced Research And Applications Corporation | Optical system with laser pulse energy control |
| CN101681119A (en) * | 2007-05-31 | 2010-03-24 | 康宁股份有限公司 | Photomodulator with beam-pointing correction |
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2010
- 2010-12-01 CN CN2010105725470A patent/CN102063021B/en not_active Expired - Fee Related
Patent Citations (3)
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|---|---|---|---|---|
| US4747673A (en) * | 1987-06-01 | 1988-05-31 | The United States Of America As Represented By The Secretary Of The Navy | High power optical attenuator |
| US4775220A (en) * | 1987-11-23 | 1988-10-04 | Advanced Research And Applications Corporation | Optical system with laser pulse energy control |
| CN101681119A (en) * | 2007-05-31 | 2010-03-24 | 康宁股份有限公司 | Photomodulator with beam-pointing correction |
Non-Patent Citations (1)
| Title |
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| 《强激光与粒子束》 20091130 陈绍武 等 高能激光束在线测量系统的光强衰减设计 第21卷, 第11期 2 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104111238A (en) * | 2013-04-16 | 2014-10-22 | 烁光特晶科技有限公司 | Optical material transmittance testing system and testing method thereof |
| CN105988211A (en) * | 2015-01-28 | 2016-10-05 | 上海微电子装备有限公司 | Dual-lens laser attenuation device capable of realizing full-open mode |
| CN109466909A (en) * | 2018-12-18 | 2019-03-15 | 天津沃翔科技有限公司 | Laser emitter for mine conveying belt detection device |
| CN113050378A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Energy adjusting device, energy adjusting method, illumination system and photoetching machine |
| CN113050378B (en) * | 2019-12-27 | 2022-06-17 | 上海微电子装备（集团）股份有限公司 | Energy adjusting device, energy adjusting method, illumination system and photoetching machine |
| CN114326315A (en) * | 2020-09-30 | 2022-04-12 | 上海微电子装备（集团）股份有限公司 | Light beam transmittance adjusting device and optical lighting system |
| WO2024000641A1 (en) * | 2022-06-29 | 2024-01-04 | 长鑫存储技术有限公司 | Control method and apparatus for beam energy adjusting device and wafer processing device |
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|---|---|
| CN102063021B (en) | 2013-04-10 |
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