CN102061449B - 真空镀膜装置 - Google Patents

真空镀膜装置 Download PDF

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CN102061449B
CN102061449B CN200910309766.7A CN200910309766A CN102061449B CN 102061449 B CN102061449 B CN 102061449B CN 200910309766 A CN200910309766 A CN 200910309766A CN 102061449 B CN102061449 B CN 102061449B
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王仲培
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Abstract

本发明提供一种真空镀膜装置，其具有一腔体以及收容在腔体内的轨道、多个料杆以及多对靶材。料杆设置在轨道上，每个料杆能够绕自身中心轴转动且挂设有多个待镀工件。每对靶材分设在轨道内外两侧，所述多对靶材分别用于对多个待镀工件镀膜。所述轨道包括多个弧形轨道部，每两个相邻的弧形轨道部之间为弧形连接且使得轨道呈封闭状。本发明的真空镀膜装置，通过将轨道设置为花朵状，使得轨道的长度加长，从而能够在轨道上放置更多的料杆，增加了每次镀膜的待镀膜工件的数量，提高了镀膜效率。

Description

真空镀膜装置
技术领域
本发明涉及一种镀膜装置，尤其涉及一种真空镀膜装置。
背景技术
目前，利用真空溅镀技术对待镀膜工件进行镀膜时，通常将多个待镀膜工件吊设在多个旋转料架上，然后将旋转料架放置在一个圆环形轨道上运动，多对靶材则分别相对地设置在圆环形轨道内外侧，以对每个旋转料架上的待镀膜工件进行镀膜。镀膜时，圆环形轨道带动待镀膜工件相对靶材转动，使得待镀膜工件能够沉积膜层。然而，由于圆环形轨道的长度受限于圆环形轨道的半径，使得在圆环形轨道上设置旋转料架的数量有限，导致每次镀膜的待镀膜工件数量也有限，镀膜效率不高。
发明内容
有鉴于此，有必要提供一种提高镀膜效率的真空镀膜装置。
一种真空镀膜装置，其具有一腔体以及收容在腔体内的轨道、多个料杆以及多对靶材。料杆设置在轨道上，每个料杆能够绕自身中心轴转动且挂设有多个待镀工件。每对靶材分设在轨道内外两侧，所述多对靶材分别用于对多个待镀工件镀膜。所述轨道包括多个弧形轨道部，每两个相邻的弧形轨道部之间为弧形连接且使得轨道呈封闭状。
相较于现有技术，本发明的真空镀膜装置，通过将轨道设置为花朵状，使得轨道的长度加长，从而能够在轨道上放置更多的料杆，增加了每次镀膜的待镀膜工件的数量，提高了镀膜效率。
附图说明
图1为本发明较佳实施方式提供的真空镀膜装置的俯视图；
图2为图1的真空镀膜装置的II部分的放大图。
具体实施方式
下面将结合附图对本发明实施方式作进一步的详细说明。
请参阅图1，本发明较佳实施方式提供的真空镀膜装置100，包括一腔体10、一轨道20、多个料杆30和多对靶材40。腔体10形成有一个溅镀腔12，所述轨道20和多对靶材40固定收容在溅镀腔12内。多个料杆30设置在轨道20上，所述轨道20能够带动多个料杆30在溅镀腔12内运动。每对靶材40分设在轨道20内外两侧，其为用于对多个待镀工件200进行溅镀的溅射源。待镀工件200挂设在料杆30上，并通过轨道20传送以进行连续镀膜。
具体地，腔体10上设置有与溅镀腔12相连通的进气管14以及抽气管16，进气管14用于供溅镀所需的反应气体进入到溅镀腔12内，抽气管16用于对溅镀腔12进行抽真空处理。腔体10具有一底壁18以及多个侧壁19，所述轨道20以及靶材40固定在该底壁18上。
轨道20包括至少三个依次连接的弧形轨道部20a，每两个相邻的弧形轨道部20a之间为弧形连接且使得轨道20呈封闭状。本实施方式中，弧形轨道部20a的数量为3个，每个弧形轨道部20a尺寸相等且通过焊接方式依次连接，使得所述轨道20呈花朵状，其周长大于轨道20呈相同直径的圆形时的周长，因此，可承载更多数量的料杆30。可以理解，所述弧形轨道部20a的数量可根据具体的镀膜要求来设定，例如可以设置为10个。
为了能够使得轨道20连续运动，该轨道20还包括驱动部21以及与驱动部21传动连接的传动部22，该传动部22用于承载料杆30，使得传动部22能够在驱动部21的驱动下，带动料杆30在溅镀腔12内运动。
具体的，每个驱动部21包括马达210以及与马达210固定连接的齿轮212。马达210固定在腔体10上，其能够在通电情况下驱动所述齿轮212旋转。每个驱动部21还具有一控制装置214，所述控制装置214内预先设置有马达210的驱动时间以及驱动效率，控制装置214用于根据所述驱动时间以及效率，控制所述传动部22的运动距离，以控制多个待镀工件200的镀膜时间。可以理解，为了操作方便，所述控制装置214可通过导线连接至腔体10外。
请结合图2，本实施方式中，传动部22为传动链条。所述多个料杆30装设在传动部22上。具体的，所述传动部22上设置多个等间距设置的固持孔220，每个料杆30对应固定于每个固持孔220上。所述传动部22的外边缘开设有多个与所述齿轮212啮合的轮齿222，所述马达210能够通过所述齿轮212驱动所述传动部22运动。
每个料杆30包括一个主杆31以及从主杆31沿其径向向外延伸的多个支杆32，每个支杆32上悬挂有多个所述待镀工件200。每个主杆31能够绕自身中心轴转动。具体的，每一个主杆31连接有一个致动部310，致动部310用于驱动相对应的主杆31绕自身中心轴转动。本实施方式中，致动部310包括转子310a和定子310b，转子310a与主杆31固定，以驱动主杆31旋转。定子310b固定组装至固持孔220，以将对应的料杆30组装至传动部22上。优选地，致动部310为一个旋转马达。
每对靶材40分别相对设置在轨道20两侧，且每两对靶材40之间的距离相等。优选的，每对靶材40均关于轨道20对称设置，且各对靶材40到对应弧形轨道部20a的弧心的距离均相等，使得对应的弧形轨道部20a上的每一个料杆30悬挂的待镀工件到该靶材40的距离相等，从而使每个待镀工件200所镀的膜层保持均匀一致。可以理解，靶材40的数量可根据轨道20的数目而决定。本实施例中，靶材40设置为13对。
镀膜时，将腔体10的溅镀腔12抽为真空，然后往所述溅镀腔12输送反应气体；开启所述料杆30的致动部310以及控制装置214，使得料杆30绕其中心轴旋转，且驱动部21驱动所述传动部22在设定时间段内沿所述轨道20运动，使得靶材40能够对所述料杆30上的待镀工件200均匀地镀膜。
本发明的真空镀膜装置100，通过将轨道20设置为花朵状，增加了轨道20的长度，从而能够在轨道20上放置更多的料杆30，增加了每次镀膜的待镀膜工件200的数量，提高了镀膜效率。
可以理解，所述轨道20的形状不限于花朵状，例如可以呈梳子状等等，可根据具体要求进行设计。
另外，本领域技术人员还可以在本发明精神内做其它变化，当然，这些依据本发明精神所做的变化，都应包含在本发明所要求保护的范围之内。

Claims (8)

1.一种真空镀膜装置，其具有一腔体以及收容在腔体内的轨道、多个料杆以及多对靶材，料杆设置在轨道上，每个料杆能够绕自身中心轴转动且挂设有多个待镀工件，每对靶材分设在轨道内外两侧，所述多对靶材分别用于对多个待镀工件镀膜，其特征在于，所述轨道包括多个弧形轨道部，每两个相邻的弧形轨道部之间为弧形连接且使得轨道呈封闭状，每对靶材均关于所述轨道对称设置且各对靶材到对应弧形轨道部的弧心的距离均相等。
2.如权利要求1所述的真空镀膜装置，其特征在于，腔体形成有一溅镀腔，腔体上设置有与溅镀腔相连通的进气管以及抽气管，进气管用于供溅镀所需的反应气体进入到溅镀腔内，抽气管用于对溅镀腔进行抽真空处理。
3.如权利要求1所述的真空镀膜装置，其特征在于，所述轨道包括驱动部以及与驱动部传动连接的传动部，驱动部用于带动传动部在腔体内连续运动，所述传动部用于带动所述多个料杆运动。
4.如权利要求3所述的真空镀膜装置，其特征在于，传动部为传动链条，该传动链条上设置有多个固持孔，每个料杆对应固定于每个固持孔上。
5.如权利要求4所述的真空镀膜装置，其特征在于，每个驱动部包括马达以及与马达连接的齿轮，马达驱动所述齿轮旋转，所述传动链条的外边缘开设有多个与所述齿轮啮合的轮齿，使得所述马达能够通过所述齿轮驱动所述传动链条运动。
6.如权利要求5所述的真空镀膜装置，其特征在于，所述驱动部具有一控制装置，所述控制装置内预先设置有马达驱动时间以及驱动效率，所述控制装置用于根据所述马达驱动时间以及驱动效率控制多个料杆在轨道上的运动时间。
7.如权利要求3所述的真空镀膜装置，其特征在于，每个料杆包括一主杆以及多个从沿主杆径向向外延伸的支杆，主杆通过一致动部与传动部连接，致动部用于驱动主杆绕自身中心轴旋转，支杆用于悬挂待镀工件以进行镀膜处理。
8.如权利要求7所述的真空镀膜装置，其特征在于，致动部包括定子和转子，定子固定至传动链条上，转子与主杆固定以驱动主杆旋转。
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JP6364388B2 (ja) * 2015-08-20 2018-07-25 東芝メモリ株式会社 半導体製造装置および半導体装置の製造方法

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