CN102061448A - Method for preparing hard membrane by stack process - Google Patents
Method for preparing hard membrane by stack process Download PDFInfo
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- CN102061448A CN102061448A CN2009102230914A CN200910223091A CN102061448A CN 102061448 A CN102061448 A CN 102061448A CN 2009102230914 A CN2009102230914 A CN 2009102230914A CN 200910223091 A CN200910223091 A CN 200910223091A CN 102061448 A CN102061448 A CN 102061448A
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Abstract
The invention relates to a method for preparing hard membrane by a stack process. The hard membrane is sputtered on a plastic workpiece to protect the appearance of the plastic workpiece. In the method, sputtering equipment with a sputtering cavity is provided to sputter on the plastic workpiece to form the hard membrane, and a hard membrane layer is formed by sputtering for three times. The method comprises the following steps of: firstly, forming a hard membrane layer by sputtering on the plastic workpiece in first preset thickness; secondly, forming a metal layer or a decorative layer by sputtering on the hard membrane layer in second preset thickness; and finally, forming a transparent hard membrane layer by sputtering on the metal layer in third preset thickness, wherein the sum of the first preset thickness and the third preset thickness is more than 0.1 micrometer, and the third preset thickness is between about 0.05 and 0.2 micrometer.
Description
Technical field
The invention relates to and a kind ofly be equipped with the method for hard membrane layer, be meant in electronic product shell especially to prepare hard membrane layer with the storehouse legal system.
Background technology
Electronic product on the market, such as: mobile phone, notebook computer, walkman etc.Whether the human consumer is when selecting to buy, except paying attention to function, the external form of electronic product and texture are also occupied very big Consideration, such as: whether pay attention to exterior design novel, attractive in appearance, whether in light weight being convenient for carrying whether, it is good or the like perhaps to pay attention to when hand-held sense of touch.
Because the element shapes of engineering plastics usually can be integrally formed, unlike the extra metal work program of metal needs, and have light, water-fast, characteristics such as burn into no power, not heat conduction not, widespread use is in daily life.Therefore, electronic product shell is used plastic casing usually, makes electronic product have compact advantage.But because plastics itself do not have scratch resistance, attrition resistant performance, therefore doing to form scratch resistance and the attrition resistant functional film layer of having concurrently again attractive in appearance at frosting in some application, to satisfy the demand on using.
Form above-mentioned functional film layer in electronic product shell, existing technology is to plate a color layers in the mode of sputter or spraying earlier, promotes the attractive in appearance and texture of electronic device housing.But abrasion-resistant metal and hardness are not high, and because the metallic surface does not have smooth feeling.Therefore, for the wear resistance that improves the electronic product surface and make it have smooth feeling, can plate the transparent hard film layer of other layer of transparent and hardness height, abrasion performance again as minute surface, such as: stupaliths such as silicon oxide, aluminum oxide.
And the hardness of the transparent hard films of this kind and penetration coefficient must have certain condition.In general, the hardness test of transparent hard films needs greater than 1H, and transmittance needs to make it plating on metal level greater than more than 90%.Except abrasion performance, have reflecting feel and unlikely generation look again concurrently and become, influence the original color of metal.
Be to utilize spraying method that the dura mater glue more than the 1 μ m (Hard coating glue) is sprayed on the metal level at present, but yield is not good,, has again, thereby reduce the problem of production capacity because of the sputter overlong time if use sputtering way to prepare this transparent hard films.Therefore, how making the rete that is plated except the effect that has attractive in appearance and protection concurrently, can save the time of its preparation again, is a problem that waits to solve.
Summary of the invention
For solving the problems of the technologies described above, the object of the present invention is to provide a kind ofly to be equipped with the method for dura mater with the storehouse legal system, form dura mater on the surface of plastics part, with the protection plastics part and improve aesthetic.
For achieving the above object, the present invention at first provides a kind of and has been equipped with the method for dura mater with the storehouse legal system, and this dura mater sputter is on a plastics part, and to protect the outward appearance of this plastics part, this method comprises:
The hard film layer of sputter one first pre-determined thickness on plastics part;
The metal level or the ornament layer of plating one second pre-determined thickness on described hard film layer; And
The transparent hard film layer of sputter 1 the 3rd pre-determined thickness on described metal level or ornament layer;
Wherein, described first pre-determined thickness and described the 3rd pre-determined thickness summation are greater than 0.1 μ m, and described the 3rd pre-determined thickness is about 0.05 to 0.2 μ m.
In aforesaid method provided by the invention, preferably, the material of described hard film layer can be selected from silicon-dioxide, aluminum oxide, aluminium nitride, titanium nitride, titanium dioxide (TuO
2), a kind of in titanium carbide (TiC), wolfram varbide (WC), silicon nitride or chromium etc., described first pre-determined thickness is about 0.05 to 0.2 μ m.
In aforesaid method provided by the invention, preferably, the step of sputter hard film layer comprises on plastics part:
The first chromium metal level of sputter 1 the 4th pre-determined thickness on described plastic basis material;
Sputter one second metal level on the described first chromium metal level;
The second chromium metal level of sputter 1 the 5th pre-determined thickness on described second metal level;
Wherein, the summation of described the 4th pre-determined thickness and described the 5th pre-determined thickness is about 0.5 to 0.8 μ m.
In aforesaid method provided by the invention, preferably, the material of described metal level can be selected from a kind of in copper, chromium or the aluminium etc., and the material of described ornament layer can be selected from a kind of in metal nitride or the metal oxide etc., and described second pre-determined thickness is about 0.05 to 0.5 μ m.
In aforesaid method provided by the invention, preferably, the material of described transparent hard film layer can be selected from a kind of in silicon-dioxide or the titanium dioxide etc., and the transmittance of described transparent hard film layer is more than 80%, and described the 3rd pre-determined thickness is about 0.05 to 0.1 μ m.
The present invention also provides a kind of and has been equipped with the method for dura mater with the storehouse legal system, and this dura mater sputter is on a plastics part, and to protect this plastics part, this method comprises:
One sputtering equipment is provided, this sputtering equipment comprises a sputter cavity, this sputter cavity has one first sputtering chamber, one second sputtering chamber, one the 3rd sputtering chamber, respectively in order to sputter hard film layer, metal level or ornament layer, transparent hard film layer, an and transmission of rotation device, carry out sputter to utilize rotation mode that described plastics part is sent to the 3rd sputtering chamber by first sputtering chamber in regular turn, three sputtering chamber can provide at least three workpiece to carry out the sputter of above-mentioned different retes simultaneously;
Set the every rotation of described transmission of rotation device and once stop a scheduled time, and the sputter condition of setting described sputtering chamber;
Transmit described plastics part to the described transmission of rotation device of sputter cavity, in described first sputtering chamber to described plastics part sputter hard film layer to the first pre-determined thickness, described metal level or ornament layer at described second sputtering chamber sputter one second pre-determined thickness on described hard film layer, and in described the 3rd sputtering chamber on described metal level or ornament layer the described transparent hard film layer of sputter 1 the 3rd pre-determined thickness, wherein, the summation of described first pre-determined thickness and the 3rd pre-determined thickness is greater than 0.1 μ m, and described the 3rd pre-determined thickness is about 0.05 to 0.2 μ m; And
After sputter is finished described plastics part is taken out.
In aforesaid method provided by the invention, preferably, the material of described hard film layer and described transparent hard film layer is selected from a kind of in oxide compound or the nitride etc., and wherein, the transmittance of described transparent hard film layer is more than 80%.
In aforesaid method provided by the invention, preferably, the material of described metal level can be selected from a kind of in copper, chromium or the aluminium etc., and the material of described ornament layer can be selected from a kind of in metal nitride or the metal oxide etc., and described second pre-determined thickness is about 0.05 to 0.5 μ m.
In aforesaid method provided by the invention, preferably, described first pre-determined thickness is about 0.05 to 0.2 μ m, and the hardness of described dura mater is greater than 1H.
In aforesaid method provided by the invention, preferably, the material of described transparent hard film layer is a silicon-dioxide, and described the 3rd pre-determined thickness is about 0.05 to 0.1 μ m.
In aforesaid method provided by the invention, preferably, described sputter cavity also comprises one the 4th sputtering chamber, and has two sputtering chamber in the described sputter cavity at least in order to common sputter same film layer material, produces to avoid the technology bottleneck.
The present invention also provides a kind of and has been equipped with the method for dura mater with the storehouse legal system, and this dura mater sputter is on a plastics part, and to protect this plastics part, this method comprises:
One sputtering equipment is provided, this sputtering equipment comprises a sputter cavity, this sputter cavity has one first separate sputtering chamber, one second sputtering chamber, respectively in order to this plastics part sputter one transparent hard film layer and a metal level or an ornament layer, an and transmitting device, in order to described plastics part is back and forth transmitted in described first sputtering chamber and described second sputtering chamber, carry out sputter, these two sputtering chamber can provide two workpiece to carry out the sputter of above-mentioned different retes simultaneously at least;
Transmit described plastics part to described first sputtering chamber, be used to the described transparent hard film layer of sputter one first pre-determined thickness on the described plastics part;
Transmit described plastics part to described second sputtering chamber, be used to the described metal level or the ornament layer of sputter one second pre-determined thickness on the described transparent hard film layer;
Transmit described plastics part to described first sputtering chamber, be used to the described transparent hard film layer of sputter 1 the 3rd pre-determined thickness on described metal level or the ornament layer;
Wherein, described first pre-determined thickness and described the 3rd pre-determined thickness summation are greater than 0.1 μ m, and described the 3rd pre-determined thickness is about 0.05 to 0.2 μ m; And with described plastics part taking-up.
In aforesaid method provided by the invention, preferably, a kind of in the materials such as optional autoxidisable substance of the material of described transparent hard film layer or nitride, transmittance is more than 80%, and the hardness of described dura mater is greater than 1H.
In aforesaid method provided by the invention, preferably, the material of described transparent hard film layer can be selected from silicon-dioxide or titanium dioxide (TiO
2) a kind of in waiting.
The invention provides and a kind ofly be equipped with the method for dura mater with the storehouse legal system, the dura mater sputter is on a plastics part, with the outward appearance of protection plastics part; comprise: a sputtering equipment is provided; comprise a sputter cavity, in order to plastics part sputter dura mater, hard membrane layer will divide to spatter for three times and cross.At first, with a hard film layer with one first pre-determined thickness sputter on this plastics part.Then, a metal level or an ornament layer are plated on this hard film layer with one second pre-determined thickness.At last, with a transparent hard film layer with one the 3rd pre-determined thickness sputter on metal level or ornament layer, wherein, first pre-determined thickness and the 3rd pre-determined thickness summation are greater than 0.1 μ m, the 3rd pre-determined thickness is about 0.05 to 0.2 μ m.
The present invention also provides the another kind of method that is equipped with dura mater with the storehouse legal system, this dura mater sputter is on a plastics part, with the protection plastics part, this method comprises: a sputtering equipment is provided, sputtering equipment comprises a sputter cavity, the sputter cavity has one first separate sputtering chamber, one second sputtering chamber, one the 3rd sputtering chamber, respectively in order to plastics part sputter one hard film layer, one metal level or an ornament layer, an and transparent hard film layer, and a transmission of rotation device, with rotation mode this plastics part is carried out sputter by these three sputtering chamber of first sputtering chamber to the in regular turn; Set the every rotation of transmission of rotation device and once stop a scheduled time, and the sputter condition of setting those sputtering chamber; Transmit plastics part to the transmission of rotation device of sputter cavity, the rotation of transmission of rotation device once promptly stops a scheduled time, make plastics part in regular turn at first sputtering chamber's sputter hard film layer to one first pre-determined thickness, in second sputtering chamber with metal level or ornament layer with one second pre-determined thickness sputter in plastics part, and in the 3rd sputtering chamber with the transparent hard film layer of sputter with one the 3rd pre-determined thickness sputter in plastics part.Wherein, the summation of first pre-determined thickness and the 3rd pre-determined thickness is greater than 0.1 μ m, and the 3rd pre-determined thickness is about 0.05 to 0.2 μ m; After sputter is finished plastics part is taken out.
Description of drawings
Figure 1A shows that the embodiment of the invention is equipped with the schema of dura mater with the storehouse legal system;
Figure 1B shows that another embodiment of the present invention is equipped with the schema of hard films tunic with the storehouse legal system;
Fig. 2 shows that one embodiment of the invention cooperates the sputtering equipment of many sputtering chamber to be equipped with the schema of dura mater with the storehouse legal system; And
Fig. 3 A and Fig. 3 B show sputtering equipment synoptic diagram and the side-view that is used to prepare dura mater.
The primary clustering nomenclature:
Sputtering equipment 3 sputter cavitys 30 first～the 3rd sputtering chamber 301～303
Transmission of rotation device 304 workpiece gangways 305
Embodiment
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, hereinafter prepare the method for dura mater according to the present invention, especially exemplified by preferred embodiment, and cooperate appended correlative type, be described in detail below.
The invention provides and a kind ofly be equipped with the method for dura mater with the storehouse legal system, dura mater mainly is the plastic casing of sputter in electronic products such as mobile phone, mobile computer, PDA, promotes the texture of electronic product outward appearance and as the rete of protection.
In embodiments of the present invention, dura mater also comprises this transparent hard films of silicon-dioxide except metal level or ornament layer that color is provided, promote the wear resistance and the hardness of whole dura mater.
Studies show that, the silicon-dioxide sputter is on metal level or ornament layer surface, during as the transparent hard films of the superiors, thickness is more preferably greater than 1 μ m or less than 0.1 μ m, the color of this rete just can be transparent, thickness can make rete produce the look change because silica membrane refracted light and reflected light are interfered mutually between 0.1 to 1 mu m range time.
But if silicon-dioxide is sputtered to above 1 μ m, make its effect that has hardness and transmittance concurrently with sputtering way, too time-consuming.Yet only the thickness about metal level or ornament layer surface sputter 0.1 μ m has the not enough problem of hardness again.In view of this, in embodiments of the present invention, prepare dura mater in the storehouse mode, sputter makes dura mater can not produce look and becomes on plastics part, can also save preparation time, and the material of plastics part mainly is ABS/PC rubber alloy, PP, PVC, PC, PET etc.Please refer to the schema of Figure 1A, described method comprises:
S100: a sputtering equipment is provided, and sputtering equipment comprises a sputter cavity, when plastics part be transmitted enter the sputter cavity after, in the sputter cavity to plastics part sputter dura mater;
S105: with a hard film layer with one first pre-determined thickness sputter on plastics part.The effect of this hard film layer in whole dura mater mainly is in order to hardness to be provided, with protection electronic product plastic casing.Therefore when selecting material, various selection can be arranged, be selected from usually such as silicon-dioxide, aluminum oxide, aluminium nitride, titanium nitride, titanium dioxide (TiO
2), titanium carbide (TiC), wolfram varbide (WC), silicon nitride (Si
3N
4) or chromium (Cr) or the like.In a preferred embodiment, first pre-determined thickness is greatly about 0.05 to 0.2 μ m; Wherein, again because of aluminum oxide has the buffer layer effect, can improve the sticking power with plastics part, therefore, in most preferred embodiment, be to adopt aluminum oxide (Al
2O
3) as this hard film layer.
S110 a: metal level or an ornament layer are plated on this hard film layer with one second pre-determined thickness.This rete can be selected to use physical vapor deposition modes such as sputter, evaporation, ion plating or spraying in the preparation, in the embodiment of the invention, selects for use with sputtering way to prepare.Wherein, the material of metal level can be selected from metal, as: wherein a kind of of copper, chromium or aluminium, metal level can make plastic workpiece surface present metallic color, makes workpiece have noble texture.The material of ornament layer then is not limited only to metal, can use as materials such as metal nitride or metal oxides, available spraying method preparation, and design various patterns according to need.The function of this metal level or ornament layer mainly provides color, plastic workpiece surface is presented be different from the color of plastics itself, also can provide certain rigidity simultaneously.And second pre-determined thickness is also decided on the selected material of this rete, and thickness can reach several microns (μ m) at most.In embodiments of the present invention, second pre-determined thickness is approximately 0.05-0.5 μ m;
S115: because this metal level or an ornament layer are not wear-resisting, also not scratch resistance.Scrape carelessly or collide for fear of plastics part, plastic workpiece surface is caused damage.In this step, need again with a transparent hard film layer with one the 3rd pre-determined thickness sputter on metal level or ornament layer.
The transmittance of described transparent hard film layer must reach more than 80%, can not make rete produce look and become, and has the attrition resistant effect of scratch resistance simultaneously concurrently.Therefore, can be from silicon-dioxide, titanium dioxide (TiO
2) select wherein a kind ofly, the 3rd pre-determined thickness is then decided on selected material, about 0.05 to 0.2 μ m.In embodiments of the present invention, described transparent hard film layer is a silicon-dioxide, influences the color of metal level or ornament layer for preventing silica coating, and its thickness is preferably less than 0.1 μ m or greater than 1 μ m.Because before sputter one deck hard film layer provided hardness, therefore, the thickness of transparent hard film layer does not need too thick, and it is time-consuming to reduce sputter institute.In the embodiment of the invention, when transparent hard film layer was silicon-dioxide, the 3rd pre-determined thickness the best was 0.05 to 0.1 μ m.
Mainly provide the hardness of dura mater though it should be noted that hard film layer, transparent hard film layer mainly provides the function of abrasion performance.But the hardness of dura mater integral body also must be considered, need more than or equal to 1H.The employed machine of hardness test is the pencil hardness device, testing method be pencil with iH after at an angle of 90 the tip of the brushstyle of a writing or painting being polished on No. 400 sand paper, be the 45 measurement jig of packing into again, impose 750g power, draw 5-7 millimeters long line with the speed of 5 millimeters of per seconds and test.
With the embodiment of the invention, the summation of first pre-determined thickness and the 3rd pre-determined thickness needs greater than 0.1 μ m, and the hardness of dura mater is greater than 2H.
In another embodiment of the present invention, because the sticking power of chromium metal on plastic basis material is good, also can increase hardness simultaneously, therefore, also can utilize the material of chromium metal as this hard film layer, but when chromium film thickness to 0.5 μ m, chromium metallic diaphragm surface has the problem of atomizing, therefore, when using the chromium metal to provide hardness and sticking power as hard film layer, also available storehouse mode solves this problem, and step comprises, shown in Figure 1B:
S1051: sputter one first chromium metal level on this plastic basis material to one the 4th pre-determined thickness, about 0.2 to 0.4 μ m;
S1052: sputter one second metal level is on the chromium metal level, and the material of second metal level can be selected from wherein a kind of of aluminium, copper, titanium, tin or stainless steel;
S1053: sputter one second chromium metal level on second metal level to one the 5th pre-determined thickness, wherein, total and about 0.5 to 0.8 μ m of the 4th pre-determined thickness and the 5th pre-determined thickness, about 0.3 to the 0.4 μ m of the 5th pre-determined thickness.
In another embodiment of the present invention,, prepare the method for above-mentioned dura mater in conjunction with a sputtering equipment with a plurality of sputtering chamber.Described method please refer to the schema of Fig. 2, comprising:
S200 a: sputtering equipment 3 is provided,, is respectively the sputtering equipment synoptic diagram and the side-view of present embodiment as Fig. 3 A and Fig. 3 B.Sputtering equipment 3 comprises a sputter cavity 30.In the embodiment of the invention, have first to the 3rd 301-303 of sputtering chamber in the sputter cavity 30 at least, and a transmission of rotation device 304.
Described first to the 3rd 301-303 of sputtering chamber places target according to need individually, and connects different power supply unit (not shown), and simultaneously to plastics part sputter one hard film layer, a metal level or an ornament layer reach a transparent hard film layer with respectively.
As previously mentioned, hard film layer can be selected from silicon-dioxide, aluminum oxide, aluminium nitride, titanium dioxide (TiO
2), titanium carbide (TiC), wolfram varbide (WC), silicon nitride (Si
3N
4) or chromium etc. wherein a kind of.The material of jet-plating metallization layer can select as: copper, aluminium, chromium, the material of ornament layer can be selected metal nitride or metal oxide etc.And the material of the transparent oxidation film layer of sputter comprises silicon-dioxide (SiO
2), titanium dioxide (TiO
2) etc.In one embodiment, described hard film layer and transparent hard film layer all use silicon-dioxide.
Transmission of rotation device 304 utilizes rotating manner, and plastics part is orderly sent to the 3rd sputtering chamber 303 by first sputtering chamber 301, and revolution is moving once promptly to stop a scheduled time.At this moment, the plastics part in all sputtering chamber carries out sputter simultaneously, treats just to rotate after workpiece sputter in all sputtering chamber is finished.In embodiments of the present invention, this transmission of rotation device 304 is a rotating disk.
Described sputtering equipment 3 also can be provided with a workpiece gangway 305 according to need, after finishing when the workpiece sputter, replace another workpiece and enter the preparation station that sputtering chamber carries out sputter.In other words, plastics part is transmitted the workpiece gangway 305 that enters in the sputter cavity 30, carries out sputtering process through 301, the second sputtering chamber 302 of first sputtering chamber and the 3rd sputtering chamber 303 in regular turn.When plastics part was finished sputter in each sputtering chamber, described transmission of rotation device 304 rotations once were sent to next sputtering chamber with plastics part and carry out sputter.Wherein, once can place three plastics parts in the described sputter cavity 30 and carry out sputter simultaneously;
S205: set the 304 every rotations of transmission of rotation device and once stop a scheduled time, and the sputter condition of setting each sputtering chamber.In the embodiment of the invention, about 40 to 80 seconds of the described scheduled time.
S210: transmit plastics part to the transmission of rotation device 304 of sputter cavity 30, make plastics part in regular turn at first sputtering chamber, 301 sputter hard film layer to the first pre-determined thickness, second sputtering chamber 302 with a metal level or an ornament layer with the second pre-determined thickness sputter on hard film layer, and in the 3rd sputtering chamber 303 with transparent hard film layer with one the 3rd pre-determined thickness sputter on metal level.
As previously mentioned, in the embodiment of the invention, the summation of first pre-determined thickness and the 3rd pre-determined thickness is greater than 0.1 μ m, about 0.05 to the 0.5 μ m of second pre-determined thickness, and about 0.05 to the 0.2 μ m of the 3rd pre-determined thickness, and the hardness of dura mater is greater than 1H, but preferably can be greater than 2H;
S215: after sputter is finished plastics part is taken out.
Above embodiment is all roughly the same in the time that each layer film of supposition sputter is taken, and can not cause the situation of bottleneck in a certain sputtering chamber.If wherein time of being taken of a rete can be long more a lot of than the other two-layer required time of sputter for sputter.At this moment, can in the sputter cavity, set up more sputtering chamber, such as: increase by the 4th, the 5th sputtering chamber or more, common this same film layer material of sputter can address the above problem.
In another embodiment of the present invention, also can cooperate sputter cavity to prepare dura mater, first sputtering chamber's sputter hard film layer and the transparent hard film layer, second sputtering chamber's jet-plating metallization layer or the ornament layer with two sputtering chamber.Between first and second sputtering chamber, transmit with a transmitting device.Material that it should be noted that this moment hard film layer and transparent film layer needs identical, can be selected from silicon-dioxide (SiO
2) or titanium dioxide (TiO
2) wherein a kind of.
That is to say, earlier plastics part is transmitted into transparent hard film layer to one first pre-determined thickness of first sputtering chamber's sputter.Again plastics part is sent to second sputtering chamber, with metal level or ornament layer with the second pre-determined thickness sputter on hard film layer.At last, pass back again first sputtering chamber with transparent hard film layer with one the 3rd pre-determined thickness sputter on metal level or ornament layer.Each layer material and thickness are ditto described, repeat no more herein.
Use method provided by the present invention to prepare hard membrane layer, except taking into account the hardness of whole dura mater, and outside the transmittance of the superiors' hard film layer, also can save the time of technology.With silicon-dioxide is example, in the prior art, on plastics part, plating behind metal level or the ornament layer silicon dioxide film of sputter at least 1 μ m more earlier, and in embodiments of the present invention, hard film layer and transparent hard film layer are two-layer when all using silicon-dioxide, the about 0.1-0.4 μ of its thickness summation m is compared to prior art, though the present invention is the plating trilamellar membrane, but can save more preparation time, can reach again simultaneously hard membrane layer this characteristic that possesses.
The sputtering equipment that cooperates in another embodiment of the present invention again to be provided is owing to have three sputtering chamber in the sputter cavity.Therefore, the sputter that in a sputter cavity, can provide at least three plastics parts to carry out different retes simultaneously, and, in regular turn with hard film layer, metal level or ornament layer and transparent hard film layer sputter on plastics part, also shortened the process time.
Though the present invention illustrates as above with preferred embodiments, so it is not only to terminate in the foregoing description in order to limit the present invention's spirit with the invention entity.Allly be familiar with this operator, when understanding and utilize other assembly or mode to produce identical effect easily.Be with, the modification of being done in not breaking away from spirit of the present invention and category all should comprise within the scope of the claims.
Claims (14)
1. one kind is equipped with the method for dura mater with the storehouse legal system, and this dura mater is plated on the plastics part, and to protect the outward appearance of this plastics part, this method comprises:
The hard film layer of sputter one first pre-determined thickness on plastics part;
The metal level or the ornament layer of plating one second pre-determined thickness on described hard film layer; And
The transparent hard film layer of sputter 1 the 3rd pre-determined thickness on described metal level or ornament layer;
Wherein, the summation of described first pre-determined thickness and described the 3rd pre-determined thickness is greater than 0.1 μ m, and described the 3rd pre-determined thickness is 0.05 to 0.2 μ m.
2. the method for claim 1, wherein, the material of described hard film layer is selected from a kind of in silicon-dioxide, aluminum oxide, aluminium nitride, titanium nitride, titanium dioxide, titanium carbide, wolfram varbide, silicon nitride or the chromium, and described first pre-determined thickness is 0.05 to 0.2 μ m.
The method of claim 1, wherein on plastics part the step of sputter hard film layer comprise:
The first chromium metal level of sputter 1 the 4th pre-determined thickness on described plastic basis material;
Sputter one second metal level on the described first chromium metal level;
The second chromium metal level of sputter 1 the 5th pre-determined thickness on described second metal level;
Wherein, the summation of described the 4th pre-determined thickness and described the 5th pre-determined thickness is 0.5 to 0.8 μ m.
4. the method for claim 1, wherein the material of described metal level is selected from a kind of in copper, chromium or the aluminium, and the material of described ornament layer is selected from a kind of in metal nitride or the metal oxide, and described second pre-determined thickness is 0.05 to 0.5 μ m.
5. the method for claim 1, wherein the material of described transparent hard film layer is selected from a kind of in silicon-dioxide or the titanium dioxide, and the transmittance of described transparent hard film layer is more than 80%, and described the 3rd pre-determined thickness is 0.05 to 0.1 μ m.
6. one kind is equipped with the method for dura mater with the storehouse legal system, and this dura mater sputter is on a plastics part, and to protect this plastics part, this method comprises:
One sputtering equipment is provided, this sputtering equipment comprises a sputter cavity, this sputter cavity has one first sputtering chamber, one second sputtering chamber, one the 3rd sputtering chamber, respectively in order to sputter hard film layer, metal level or ornament layer, transparent hard film layer, an and transmission of rotation device, carry out sputter to utilize rotation mode that described plastics part is sent to the 3rd sputtering chamber by first sputtering chamber in regular turn, three sputtering chamber can provide at least three workpiece to carry out the sputter of above-mentioned different retes simultaneously;
Set the every rotation of described transmission of rotation device and once stop a scheduled time, and the sputter condition of setting described sputtering chamber;
Transmit described plastics part to the described transmission of rotation device of sputter cavity, in described first sputtering chamber to described plastics part sputter hard film layer to the first pre-determined thickness, in described second sputtering chamber on described hard film layer the described metal level or the ornament layer of sputter one second pre-determined thickness, and in described the 3rd sputtering chamber on described metal level or ornament layer the described transparent hard film layer of sputter 1 the 3rd pre-determined thickness, wherein, the summation of described first pre-determined thickness and the 3rd pre-determined thickness is greater than 0.1 μ m, and described the 3rd pre-determined thickness is 0.05 to 0.2 μ m; And
After sputter is finished described plastics part is taken out.
7. method as claimed in claim 6, the material of described hard film layer and described transparent hard film layer are selected from a kind of in oxide compound or the nitride, and wherein, the transmittance of described transparent hard film layer is more than 80%.
8. method as claimed in claim 6, the material of described metal level are selected from a kind of in copper, chromium or the aluminium, and the material of described ornament layer is selected from a kind of in metal nitride or the metal oxide, and described second pre-determined thickness is 0.05 to 0.5 μ m.
9. method as claimed in claim 6, described first pre-determined thickness is 0.05 to 0.2 μ m, the hardness of described dura mater is greater than 1H.
10. method as claimed in claim 6, wherein, the material of described transparent hard film layer is a silicon-dioxide, and described the 3rd pre-determined thickness is 0.05 to 0.1 μ m.
11. method as claimed in claim 6, described sputter cavity also comprises one the 4th sputtering chamber, and has two sputtering chamber in the described sputter cavity at least in order to common sputter same film layer material, produces to avoid the technology bottleneck.
12. one kind is equipped with the method for dura mater with the storehouse legal system, this dura mater sputter is on a plastics part, and to protect this plastics part, this method comprises:
One sputtering equipment is provided, this sputtering equipment comprises a sputter cavity, this sputter cavity has one first separate sputtering chamber, one second sputtering chamber, respectively in order to this plastics part sputter one transparent hard film layer and a metal level or an ornament layer, an and transmitting device, in order to described plastics part is back and forth transmitted in described first sputtering chamber and described second sputtering chamber, carry out sputter, these two sputtering chamber can provide two workpiece to carry out the sputter of above-mentioned different retes simultaneously at least;
Transmit described plastics part to described first sputtering chamber, be used to the described transparent hard film layer of sputter one first pre-determined thickness on the described plastics part;
Transmit described plastics part to described second sputtering chamber, be used to the described metal level or the ornament layer of sputter one second pre-determined thickness on the described transparent hard film layer;
Transmit described plastics part to described first sputtering chamber, be used to the described transparent hard film layer of sputter 1 the 3rd pre-determined thickness on described metal level or the ornament layer;
Wherein, the summation of described first pre-determined thickness and described the 3rd pre-determined thickness is greater than 0.1 μ m, and described the 3rd pre-determined thickness is 0.05 to 0.2 μ m; And with described plastics part taking-up.
13. method as claimed in claim 12, the material of described transparent hard film layer are selected from a kind of in oxide compound or the nitride, transmittance is more than 80%, and the hardness of described dura mater is greater than 1H.
14. method as claimed in claim 12, the material of described transparent hard film layer are selected from a kind of in silicon-dioxide or the titanium dioxide.
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|---|---|---|---|
| CN2009102230914A CN102061448A (en) | 2009-11-18 | 2009-11-18 | Method for preparing hard membrane by stack process |
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| CN2009102230914A CN102061448A (en) | 2009-11-18 | 2009-11-18 | Method for preparing hard membrane by stack process |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103568428A (en) * | 2013-11-14 | 2014-02-12 | 厦门建霖工业有限公司 | Hard film structure applied to engineering plastics and preparation method thereof |
| CN105229195A (en) * | 2013-05-31 | 2016-01-06 | 三星电子株式会社 | Manufacture the method for multilayer film and comprise parts and the electronic product of this film |
| CN112030107A (en) * | 2020-07-24 | 2020-12-04 | 深圳市沃阳精密科技有限公司 | Composite membrane material, preparation method thereof, middle frame and electronic equipment |
-
2009
- 2009-11-18 CN CN2009102230914A patent/CN102061448A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105229195A (en) * | 2013-05-31 | 2016-01-06 | 三星电子株式会社 | Manufacture the method for multilayer film and comprise parts and the electronic product of this film |
| CN103568428A (en) * | 2013-11-14 | 2014-02-12 | 厦门建霖工业有限公司 | Hard film structure applied to engineering plastics and preparation method thereof |
| CN112030107A (en) * | 2020-07-24 | 2020-12-04 | 深圳市沃阳精密科技有限公司 | Composite membrane material, preparation method thereof, middle frame and electronic equipment |
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Application publication date: 20110518 |