CN102043178B - Composite photon sieve for large-caliber imaging and manufacturing method thereof - Google Patents
Composite photon sieve for large-caliber imaging and manufacturing method thereof Download PDFInfo
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- CN102043178B CN102043178B CN2009102354654A CN200910235465A CN102043178B CN 102043178 B CN102043178 B CN 102043178B CN 2009102354654 A CN2009102354654 A CN 2009102354654A CN 200910235465 A CN200910235465 A CN 200910235465A CN 102043178 B CN102043178 B CN 102043178B
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- 238000004519 manufacturing process Methods 0.000 title abstract description 7
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 4
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- 239000010931 gold Substances 0.000 claims abstract description 4
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 3
- 239000011651 chromium Substances 0.000 claims abstract description 3
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- 238000007639 printing Methods 0.000 claims description 78
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Abstract
The invention discloses a composite photon sieve for large-aperture imaging and a manufacturing method thereof, and belongs to the technical field of diffraction optical elements. The composite photon sieve comprises a light-transmitting substrate and a light-tight metal film plated on the light-transmitting substrate, wherein a series of light-transmitting annular bands and light-transmitting small holes which are randomly distributed are designed on the light-tight film. The light-transmitting plane can be made of light-transmitting materials such as fused quartz, common glass and organic glass, the light-tight film is a light-blocking layer made of metal such as chromium, gold, aluminum and copper and prepared on the light-transmitting substrate, and the light-transmitting ring belt and the light-transmitting small holes are not provided with the light-blocking layer. Compared with a Fresnel zone plate, the composite photon sieve provided by the invention can improve the numerical aperture and the imaging resolution, and can effectively inhibit the side lobe effect and high-order diffraction in the optical axis direction; compared with a common photon sieve, the imaging contrast can be improved, the data volume of a GDSII layout file is effectively reduced, and the processing difficulty of the large-caliber imaging photon sieve is reduced.
Description
Technical field
The present invention relates to the diffraction optical element technical field, be specifically related to a kind of compound photon screen that is used for the heavy caliber imaging and preparation method thereof.
Background technology
Photon screen is based on a kind of novel diffraction optical element of fresnel's zone plate, and its zone that bright ring on the fresnel's zone plate is corresponding replaces with the printing opacity aperture of a large amount of stochastic distribution, and the diameter of aperture is 1.5 times of corresponding zone plate endless belt width.The printing opacity aperture of these position stochastic distribution makes between the diffraction light interferes each other, thereby suppressed sidelobes effect and high order diffraction effectively improve resolution, obtain more sharp keen focal spot.
The conventional wave strap depends on its outermost ring width in the resolution of imaging field, and restriction thereby resolution that this size receives processing technology are difficult to be further improved.Therefore photon screen can relax the requirement to processing technology because its outer shroud hole diameter is 1.5 times of corresponding zone plate ring width, and then makes more bigbore photon screen, has improved numerical aperture, thereby improves the resolution of imaging.
The zone plate of the weight ratio identical parameters of photon screen is lighter, thereby in space flight telescope field wide prospect is more arranged.These characteristics of photon screen make it that extraordinary application prospect arranged aspect high-resolution imaging, sub-wavelength lithography, the microscopy.
Though large-diameter photon sieve has wide application prospect in the ultraviolet telescope imaging field, there are two defectives in it:
1) it is huge to make the required data volume of domain, and existing processing technology is difficult to reach requirement;
2) diffraction efficiency is low, and image contrast is bad.
Summary of the invention
The technical matters that (one) will solve
In order to improve the diffraction efficiency of photon screen, improve image contrast, one object of the present invention is to provide a kind of compound photon screen that is used for the heavy caliber imaging.
In order to solve the problem that existing processing technology can't be made large-aperture imaging photon sieve; Another object of the present invention is to provide a kind of method for making that is used for the compound photon screen of heavy caliber imaging; With effective reduction layout data amount, make existing processing technology can satisfy the requirements of making of large-aperture imaging photon sieve.
(2) technical scheme
For achieving the above object, the technical scheme that the present invention adopts is:
A kind of compound photon screen, this photon screen comprise light-transmissive substrates and are plated in the lighttight metallic film on this light-transmissive substrates, be distributed with the printing opacity aperture of a series of printing opacity endless belt and some stochastic distribution on this lighttight metallic film.
In the such scheme, the material that said light-transmissive substrates adopts is a light transmissive material, and this light transmissive material is fused quartz, simple glass or organic glass.
In the such scheme, the material that said lighttight metallic film adopts is chromium, gold, aluminium or copper, and the thickness of said lighttight metallic film is greater than 80nm.
In the such scheme, said a series of printing opacity endless belt are the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, r wherein
n 2=2nf λ+n
2λ
2, w
n=λ/2r
n, wherein λ is a wavelength, f is a focal length.
In the such scheme, the distribution radius scope of said a series of printing opacity endless belt be compound photon screen radius 1/3 to 2/3 between part.
In the such scheme, the printing opacity aperture of said stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, wherein:
r
m 2＝2mfλ+m
2λ
2，
Corresponding r
mOn the diameter of plane formula printing opacity aperture be:
d
m=w
m=λ/2r
m, wherein λ is a wavelength, f is a focal length.
In the such scheme, the printing opacity aperture distribution radius scope of said stochastic distribution is the inside 1/3 and outside 1/3 part of compound photon screen radius.
A kind of method for making of compound photon screen, this method comprises:
Design layout;
Domain making based on design obtains the optical lithography mask;
Vapor deposition layer of metal film on light-transmissive substrates;
On light-transmissive substrates, apply photoresist, carry out optical lithography with this optical lithography mask, behind the developing fixing, the metallic film that the method that adopts wet method or dry etching comes out after with photoetching is removed.
In the such scheme; The step of said design layout comprises: the footpath at compound photon screen makes progress; The some printing opacity apertures of difference stochastic distribution on the endless belt that endless belt that inner 1/3 part is constituted and outside 1/3 part are constituted, a series of printing opacity endless belt distribute on the endless belt that middle 1/3 part is constituted;
In the such scheme, said a series of printing opacity endless belt are the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, r wherein
n 2=2nf λ+n
2λ
2, w
n=λ/2r
n, wherein λ is a wavelength, f is a focal length;
The printing opacity aperture of said stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, r wherein
m 2=2mf λ+m
2λ
2, corresponding r
mOn the diameter of plane formula printing opacity aperture be d
m=w
m=λ/2r
m, wherein λ is a wavelength, f is a focal length.
(3) beneficial effect
Compared with prior art, the beneficial effect of technical scheme generation of the present invention is:
1, the diameter of used its printing opacity aperture of compound photon screen of the present invention is 1.5 times of corresponding zone plate endless belt width; With respect to zone plate; Thereby making, the printing opacity aperture of these position stochastic distribution interferes suppressed sidelobes effect and high order diffraction effectively between the diffraction light each other; Improve resolution, obtain more sharp keen focal spot.
2, the compound photon screen that the present invention adopted substitutes centre 1/3 part of common photon screen with zone plate, thereby has increased transmitance, has improved diffraction efficiency, and image contrast is improved.
3, the compound photon screen that the present invention adopted brings centre 1/3 part of common photon screen alternative with light penetrating ring; Thereby greatly reduce the data volume of domain GDSII file; Thereby reduced difficulty of processing, made the manufacturing techniques available level can satisfy the making of large-aperture imaging photon sieve.
Description of drawings
The zone plate of Fig. 1 for adopting in order to contrast in the embodiment of the invention, the structural representation of photon screen and compound photon screen, they have identical characteristic dimension; Wherein, Fig. 1 (a), Fig. 1 (b), Fig. 1 (c) represent zone plate, photon screen and compound photon screen respectively.
Fig. 2 makes the data volume comparison diagram for compound photon screen in the embodiment of the invention and common photon sieve series; Wherein, Fig. 2 (a) is the data volume distribution plan at the different endless belt with common photon screen of compound photon screen place, and Fig. 2 (b) is the compound photon screen and the required data volume variation diagram of common photon screen of different-diameter.
Fig. 3 is a zone plate in the embodiment of the invention, the focus characteristics analogous diagram of photon screen and compound photon screen; Wherein, Fig. 3 (a) focuses on the surface of intensity distribution, and Fig. 3 (b) is that normalization focuses on light intensity exponential distribution figure.
Fig. 4 is the mask and the partial enlarged drawing thereof of compound photon screen in the embodiment of the invention.
Fig. 5 is an imaging experiment index path in the embodiment of the invention.
Fig. 6 is imaging experiment figure as a result in the embodiment of the invention; Wherein, Fig. 6 (a), Fig. 6 (b), Fig. 6 (c) are respectively zone plate, photon screen and compound photon screen to resolution version imaging, and Fig. 6 (d) is the light intensity section distribution plan of 10 μ m lines in three kinds of device imagings.
Fig. 7 is a compound photon screen method for making process flow diagram in the embodiment of the invention.
Embodiment
For making the object of the invention, technical scheme and advantage clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, to further explain of the present invention.
A kind of compound photon screen; Comprise printing opacity quartz substrate and plating lighttight crome metal film above that; The material of light-transmissive substrates can also be light transmissive materials such as simple glass or organic glass, and the material of lighttight metallic film can also be light tight metals such as gold, aluminium or copper;
A series of printing opacity endless belt and some printing opacity apertures distribute on the said lighttight crome metal film; The diameter of said quartz substrate is 10cm, and the photon screen diameter is 17.75mm, and the endless belt number is 370 rings, and wavelength is 355nm, and focal length is 0.3m, and the printing opacity hole diameter on the outermost layer endless belt is 9 μ m, characteristic dimension 6 μ m.Wherein, at the 42nd～165 ring (being 1/3～2/3 place of radius), the present invention adopts light penetrating ring to bring the printing opacity aperture that replaces stochastic distribution.Said design parameter has not only been realized the big numerical aperture of photon screen but also has been taken into account little characteristic dimension, makes imaging resolution more competitive than general zone plate.
In order to contrast the imaging effect of this compound photon screen and zone plate, common photon screen.The present invention has also designed zone plate and the common photon screen with same characteristic features size, wavelength and focal length.Wherein, the zone plate diameter is 11.83mm, several 165 rings of endless belt; Photon screen diameter 17.75mm, 370 rings.
This compound photon screen printing opacity endless belt is the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, wherein:
r
n 2＝2nfλ+n
2λ
2，
w
n＝λ/2r
n，n＝42～165，
Wherein λ is a wavelength, and f is a focal length.
The printing opacity aperture of stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, wherein:
r
m 2＝2mfλ+m
2λ
2，
Corresponding r
mOn the diameter of plane formula printing opacity aperture be:
d
m＝w
m＝λ/2r
m，m＝1-41，166-370，
Wherein λ is a wavelength, and f is a focal length.
As shown in Figure 1; Fig. 1 (c) is the compound photon screen of the present invention (CPS) synoptic diagram; Fig. 1 (a), Fig. 1 (b) represent the zone plate (FZP) and common photon screen (PS) synoptic diagram that adopt in the contrast test respectively, and the printing opacity aperture that wherein white circular hole is a stochastic distribution, black region are light tight zone.
The printing opacity aperture that comprises stochastic distribution on the printing opacity aperture of stochastic distribution on the interior annulus, middle printing opacity endless belt and the outside endless belt on the compound photon screen, said interior annulus, middle endless belt and outside endless belt overall width respectively account for 1/3 of radius.The present invention takes the reason of like this design to be: 1) data volume of common photon screen radius 1/3 with interior all very little; And sharply increase (photon screen through after the shaping reduces in outermost loop section data volume to some extent) in addition at 1/3 of radius; Therefore; Adopt the design of printing opacity endless belt can reduce the complexity of domain outside 2/3 part of radius, thereby reduce data volume (seeing the explanation of Fig. 2 for details).2) outside 1/3 part of common its radius of photon screen is an expansion with respect to Fresnel zone plate, and its transparent hole diameter is 1.5 times of corresponding printing opacity endless belt.Therefore, have under the prerequisite of same characteristic features size in maintenance, this a part of printing opacity aperture can not be replaced by the printing opacity endless belt.Comprehensive above 2 points, it is the printing opacity aperture that the compound photon screen of our design adopts inside and outside 1/3 radius, middle 1/3 radius is the printing opacity endless belt.
As shown in Figure 2, Fig. 2 makes the data volume comparison diagram for compound photon screen in the embodiment of the invention and common photon sieve series.Wherein, Fig. 2 (a) is the data volume distribution plan at the different endless belt with common photon screen of compound photon screen place.Can see, the part beyond 1/3 radius, common photon screen layout data amount obviously increases, and compound photon screen obviously reduces in middle 1/3 partial data amount.Fig. 2 (b) is the compound photon screen and the required data volume variation diagram of common photon screen of different-diameter.Can see that along with the increase of diameter, compound photon screen can reduce the more data amount.For certain process data upper limit, compound photon screen can obtain bigger bore.
As shown in Figure 3, Fig. 3 is the focus characteristics analogous diagram of zone plate, photon screen and compound photon screen.Wherein, Fig. 3 (a) focuses on the surface of intensity distribution, and Fig. 3 (b) is that normalization focuses on light intensity exponential distribution figure.Can see that from figure compound photon screen has improved 60% with respect to its focusing peak value of common photon screen.This compound photon screen also has more excellent inhibiting effect to secondary lobe, and but its secondary lobe is a bit larger tham common photon screen obviously is superior to zone plate.We adopt the design of printing opacity endless belt with middle 1/3 part, also are on the basis of farthest reducing data volume, to obtain Sidelobe Suppression effect as well as possible.Therefore, this scheme is a kind of optimized design proposal.
As shown in Figure 4, Fig. 4 is the mask and the partial enlarged drawing thereof of compound photon screen.
As shown in Figure 5, Fig. 5 is the imaging experiment index path.We adopt the method for off-axis illumination to experimentize, thereby reduce the interference of 0 order diffraction light to picture to greatest extent.
As shown in Figure 6, Fig. 6 is imaging experiment figure as a result in the embodiment of the invention.Wherein, Fig. 6 (a), Fig. 6 (b), Fig. 6 (c) are respectively zone plate, photon screen and compound photon screen to resolution version imaging.Fig. 6 (d) is the light intensity section distribution plan of 10 μ m lines in three kinds of device imagings.
As shown in Figure 7, a kind of method for making of compound photon screen, the method for making step is following:
Step 1: design layout:
In the design layout process; Footpath at compound photon screen makes progress; The some printing opacity apertures of difference stochastic distribution on the endless belt that endless belt that inner 1/3 part is constituted and outside 1/3 part are constituted, a series of printing opacity endless belt distribute on the endless belt that middle 1/3 part is constituted;
In the process of layout design, a series of printing opacity endless belt are the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, wherein:
r
n 2＝2nfλ+n
2λ
2，
w
n=λ/2r
n, wherein λ is a wavelength, f is a focal length.
The printing opacity aperture of stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, wherein:
r
m 2＝2mfλ+m
2λ
2，
Corresponding r
mOn the diameter of plane formula printing opacity aperture be:
d
m=w
m=λ/2r
m, wherein λ is a wavelength, f is a focal length.
According to the compound photon screen that this designing institute gets, the data volume of the GDSII data file of its generation is 84.8MB, is 135.7MB and do not adopt its data volume of GDSII data file of the common photon screen that this kind method for designing generated.Therefore, this compound photon screen has reduced by 38% data volume than common photon screen.The difference of the two data volume is that mainly the zone plate data volume that the center section of compound photon screen adopts has only 1.43MB, and the center section data volume of common photon screen is 57.67MB.Therefore, compound photon screen can effectively reduce the required data volume of manufacturing.This is particularly useful in the manufacture process of large-diameter photon sieve, can on the level that existing manufacturing process can reach, make more bigbore photon screen, improves imaging resolution.
Step 2: the domain making according to design obtains the optical lithography mask.
Step 3: vapor deposition layer of metal film on light-transmissive substrates.
Step 4: on light-transmissive substrates, apply photoresist, carry out optical lithography with the optics lithography mask version, behind the developing fixing, the metallic film that the method that adopts wet method or dry etching comes out after with photoetching is removed, and promptly obtains compound photon screen.
Compound photon screen of the present invention is that the printing opacity aperture with the centre 1/3 radius part of common photon screen brings replacement with light penetrating ring, and these printing opacity endless belt make the transmitance of incident light be enhanced, and have improved diffraction efficiency, thereby obtain higher image contrast.
Adopt light penetrating ring to bring the printing opacity aperture of the centre 1/3 radius part of the common photon screen of replacement in the method for making of compound photon screen of the present invention; Promoted 60% diffraction efficiency and reduced 38% layout data amount, reduced the demand of large-aperture imaging photon sieve of making current technological and manufacturing level.
Above-described specific embodiment; The object of the invention, technical scheme and beneficial effect have been carried out further explain, and institute it should be understood that the above is merely specific embodiment of the present invention; Be not limited to the present invention; All within spirit of the present invention and principle, any modification of being made, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. a compound photon screen is characterized in that, this photon screen comprises light-transmissive substrates and is plated in the lighttight metallic film on this light-transmissive substrates, is distributed with the printing opacity aperture of a series of printing opacity endless belt and some stochastic distribution on this lighttight metallic film;
Wherein, the distribution radius scope of said a series of printing opacity endless belt be compound photon screen radius 1/3 to 2/3 between part, the printing opacity aperture distribution radius scope of said stochastic distribution is the inside 1/3 and outside 1/3 part of compound photon screen radius.
2. compound photon screen as claimed in claim 1 is characterized in that, the material that said light-transmissive substrates adopts is a light transmissive material, and this light transmissive material is fused quartz, simple glass or organic glass.
3. compound photon screen as claimed in claim 1 is characterized in that, the material that said lighttight metallic film adopts is chromium, gold, aluminium or copper, and the thickness of said lighttight metallic film is greater than 80nm.
4. compound photon screen as claimed in claim 1 is characterized in that, said a series of printing opacity endless belt are the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, r wherein
n 2=2nf λ+n
2λ
2, w
n=λ/2r
n, wherein λ is a wavelength, f is a focal length, n=42～165, m=1～41,166～370.
5. compound photon screen as claimed in claim 1 is characterized in that, the printing opacity aperture of said stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, wherein:
r
m 2＝2mfλ+m
2λ
2，
Corresponding r
mOn the diameter of plane formula printing opacity aperture be:
d
m=w
m=λ/2r
m, wherein λ is a wavelength, f is a focal length, n=42～165, m=1～41,166～370.
6. the method for making of a compound photon screen is characterized in that, this method comprises:
Design layout;
Domain making based on design obtains the optical lithography mask;
Vapor deposition layer of metal film on light-transmissive substrates;
On light-transmissive substrates, apply photoresist, carry out optical lithography with this optical lithography mask, behind the developing fixing, the metallic film that the method that adopts wet method or dry etching comes out after with photoetching is removed;
Wherein, The step of said design layout comprises: the footpath at compound photon screen makes progress; The some printing opacity apertures of difference stochastic distribution on the endless belt that endless belt that inner 1/3 part is constituted and outside 1/3 part are constituted, a series of printing opacity endless belt distribute on the endless belt that middle 1/3 part is constituted.
7. the method for making of compound photon screen as claimed in claim 6, it is characterized in that: said a series of printing opacity endless belt are the plane formula endless belt, and the center radius of each printing opacity endless belt is r
n, width is w
n, r wherein
n 2=2nf λ+n
2λ
2, w
n=λ/2r
n, wherein λ is a wavelength, f is a focal length;
The printing opacity aperture of said stochastic distribution is a plane formula printing opacity aperture, and it is distributed in center radius is r
m, width is w
mEndless belt on, not overlapping between the said plane formula printing opacity aperture; The center of circle of said plane formula printing opacity aperture is distributed in endless belt center radius r
mOn, r wherein
m 2=2mf λ+m
2λ
2, corresponding r
mOn the diameter of plane formula printing opacity aperture be d
m=w
m=λ/2r
m, wherein λ is a wavelength, f is a focal length, n=42～165, m=1～41,166～370.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102681060A (en) * | 2011-03-17 | 2012-09-19 | 中国科学院微电子研究所 | Compound zone plate photon sieve |
| CN102289157B (en) * | 2011-08-16 | 2013-03-06 | 中国科学院微电子研究所 | Composite photon sieve projection type photoetching system |
| WO2013023357A1 (en) * | 2011-08-16 | 2013-02-21 | 中国科学院微电子研究所 | Composite photon sieve projection lithography system |
| CN103091749A (en) * | 2011-10-31 | 2013-05-08 | 中国科学院微电子研究所 | High-transmittance photon sieve |
| CN103293677B (en) * | 2012-02-24 | 2016-06-29 | 中国科学院微电子研究所 | Light homogenizer and manufacturing method thereof |
| CN104849787B (en) * | 2015-03-25 | 2017-09-15 | 西华大学 | Multi-wavelength photon screen compound eye |
| CN105319630B (en) * | 2015-12-07 | 2018-07-13 | 上海新跃仪表厂 | Imaging optical system based on Schupmann correcting structures and its application |
| CN117706801A (en) * | 2024-02-02 | 2024-03-15 | 佛山科学技术学院 | Micro-aperture diaphragm array for 3D suspension imaging and suspension imaging device |
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| US7502178B2 (en) * | 2003-08-29 | 2009-03-10 | International Technology Center | Multiple wavelength and multiple field of view imaging devices and methods |
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| CN201035172Y (en) * | 2007-04-24 | 2008-03-12 | 浙江大学 | A binary light quantum riddle |
| CN101470269A (en) * | 2007-12-26 | 2009-07-01 | 中国科学院微电子研究所 | Super-resolution compressed amplitude optical modulator for laser long-distance transmission of central light spot |
| CN101398493A (en) * | 2008-09-26 | 2009-04-01 | 中国科学院微电子研究所 | Amplitude type zone plate photon sieve |
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