CN103091749A - High-transmittance photon sieve - Google Patents
High-transmittance photon sieve Download PDFInfo
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- CN103091749A CN103091749A CN2011103382589A CN201110338258A CN103091749A CN 103091749 A CN103091749 A CN 103091749A CN 2011103382589 A CN2011103382589 A CN 2011103382589A CN 201110338258 A CN201110338258 A CN 201110338258A CN 103091749 A CN103091749 A CN 103091749A
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Abstract
The invention discloses a high-transmittance photon sieve which comprises a plurality of groups of photic square micropores with different side lengths. Each group of square micropores are distributed on the same circular ring at intervals. The circular rings where the plurality of groups of square micropores are located are a series of concentric circles with different radii. The side length of each square micropore is 0.5-2 times of the ring width of the circular ring where the square micropore is located. When the sizes of focusing light spots are identical, the area of the photon sieve with the square holes is larger than that of the photon sieve with round holes. Therefore, when the light intensity of working light is constant and the same focusing light spots are formed, more light can transmit through the photon sieve with the square holes. Consequently, the light transmittance is improved, and the light intensity at the focusing light spots is improved, and the photoetching effects are also improved.
Description
Technical field
The invention belongs to field, diffraction optics components and parts field, relate in particular to a kind of high permeability photon screen.
Background technology
Traditional optical lens is made by glass, and the focusing of glass lens and imaging realize by the refraction incident light, so become refractor.Kind of lens are arranged in addition, are a kind of diffraction optics concentrating elements, filter the wavefront of incident light by selection, allow light wave after filtering at the space diffraction, form and focus on, therefore be known as diffraction lens, owing to making according to the Fresnel diffraction theorem, so be called again fresnel's zone plate.
The resolution of Fresnel zone plate depends on its outermost ring width, and still, this size is subject to processing the restriction of technique, so the resolution of fresnel's zone plate is difficult to further raising.In view of this, in 2000, someone proposed a kind of photon screen diffraction optical device that is called.
Photon screen is based on a kind of novel diffraction optical device of Fresnel zone plate, and its zone that bright ring on fresnel's zone plate is corresponding replaces with the printing opacity aperture of a large amount of stochastic distribution, and the diameter of aperture is 1.5 times of corresponding zone plate endless belt width.Therefore, can relax the requirement to processing technology, and then make more bigbore photon screen, improve numerical aperture, thereby improve the resolution of imaging.In addition, the printing opacity aperture of these position stochastic distribution makes between diffraction light mutually interferes, thereby effectively suppressed sidelobes effect and high order diffraction have improved resolution, obtain more sharp keen focal spot.And the Fresnel zone plate of the weight ratio identical parameters of photon screen is lighter, thereby in fields such as high-resolution imaging, sub-wavelength lithography and microscopes, more wide prospect is arranged.
But, when the photoetching that utilizes photon screen to carry out, the transmitance of photon screen is lower, the light intensity at focal beam spot place is also just lower, lithographic results is relatively poor, if adopt stronger light to carry out photoetching, higher for the requirement of light source, become present problem demanding prompt solution so how improve the light intensity at focal beam spot place when the light intensity of work light is certain.
Summary of the invention
In view of this, the invention provides a kind of high permeability photon screen, to solve when the photoetching that utilizes photon screen to carry out, the light intensity of work light is certain, and is lower in the light intensity at focal beam spot place, the problem that lithographic results is relatively poor.
This photon screen comprises:
The square micropores of printing opacity of the different length of sides of many groups, every prescription shape micropore is distributed on same annulus, and the annulus at each prescription shape micropore place is the different concentric circless of a series of radiuses, the radius r of m annulus
mWith endless belt width w
mSatisfy relational expression:
r
m 2＝2mfλ+m
2λ
2，w
m＝r
m-r
m-1，m＝1、2、3...
Described λ is lambda1-wavelength, and described f is the photon screen focal length;
And be distributed in the length of side a of the square micropore of m annulus
mSatisfy relational expression:
a
m＝0.5wm～2wm。
Preferably, the diagonal line of described square micropore is parallel or vertical with the tangent line of its place endless belt.
Preferably, the length of side of described square micropore is
w
m
Preferably, described square micropore is distributed on light tight metallic film.
Preferably, described light tight thickness of metal film is greater than 80nm.
Preferably, the making material of described light tight metallic film is chromium.
Preferably, the making material of described light tight metallic film is copper.
Preferably, described light tight metallic film is plated on light-transmissive substrates.
Preferably, the material of described light-transmissive substrates is light transmissive material.
Preferably, described light transmissive material is organic glass.
Can be found out by such scheme, it is a that high permeability photon screen provided by the present invention is selected the length of side
m=0.5w
m～2w
mSquare micropore replace circular micropore, because when focused spot size is identical, square hole photon screen is larger than the area of common circular hole photon screen, so the light intensity at work light is certain, when forming identical focal beam spot, square hole photon screen can see through more light, improves the transmitance of light, thereby and then improved focal beam spot place light intensity, promoted lithographic results.
Description of drawings
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or description of the Prior Art, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the schematic diagram of a kind of high permeability photon screen provided by the present invention;
Fig. 2 is focused light passages experiment schematic diagram of the present invention;
Fig. 3 is focused light passages interpretation figure of the present invention;
Fig. 4 is diameter (or length of side) the D-GDSII data volume curve map of the common circular hole photon screen of the present invention (PS) and square hole photon screen (SPS);
Fig. 5 is the different square hole orientation maps of high permeability photon screen provided by the present invention;
Fig. 6 is the another kind of focused light passages interpretation of the present invention figure.
Embodiment
For the purpose, technical scheme and the advantage that make the embodiment of the present invention clearer, below in conjunction with the accompanying drawing in the embodiment of the present invention, technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
Just as described in the background section, when utilizing the photoetching that existing photon screen carries out, the light intensity of work light is certain, and is lower in the light intensity at focal beam spot place, the problem that lithographic results is relatively poor.
The inventor finds after deliberation, when focused spot size is identical, square hole photon screen is larger than the area of common circular hole photon screen, so when forming identical focal beam spot, square hole photon screen can see through more light, improves the transmitance of light, and then the light intensity one of the work of solution light regularly, light intensity at the focal beam spot place is lower, the problem that lithographic results is relatively poor.
The invention discloses a kind of high permeability photon screen, described high permeability photon screen comprises: the square micropore of printing opacity of organizing the different length of sides more, every prescription shape micropore is distributed on same annulus, and the annulus at each prescription shape micropore place is the different concentric circless of a series of radiuses, the radius r of m annulus
mWith endless belt width w
mSatisfy relational expression:
r
m 2＝2mfλ+m
2λ
2，w
m＝r
m-r
m-1，m＝1、2、3...
Described λ is lambda1-wavelength, and described f is the photon screen focal length;
And be distributed in the length of side a of the square micropore of m annulus
mSatisfy relational expression:
a
m＝0.5w
m～2w
m。
Can be found out by such scheme, it is a that high permeability photon screen provided by the present invention is selected the length of side
m=0.5w
m～2w
mSquare micropore replace circular micropore, due to focused spot size when identical, square hole photon screen is larger than the area of common circular hole photon screen, so when forming identical focal beam spot, square hole photon screen can see through more light, and the light intensity one of work light regularly improves the transmitance of light, thereby improved focal beam spot place light intensity, promoted lithographic results.
It is more than the application's core concept, below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described, obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Based on the embodiment in the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
A lot of details have been set forth in the following description so that fully understand the present invention, but the present invention can also adopt other to be different from alternate manner described here and implement, those skilled in the art can be in the situation that do similar popularization without prejudice to intension of the present invention, so the present invention is not subjected to the restriction of following public specific embodiment.
Embodiment one:
The present embodiment discloses a kind of high permeability photon screen, and as shown in Figure 1, in figure, numerical value that the transverse and longitudinal coordinate is marked is the photon screen size of intercepting, comprising:
The square micropores of printing opacity of the different length of sides of many groups, every prescription shape micropore is distributed on same annulus, and the annulus at each prescription shape micropore place is the different concentric circless of a series of radiuses, the radius r of m annulus
mWith endless belt width w
mSatisfy relational expression:
r
m 2=2mf λ+m
2λ
2, w
m=r
m-r
m-1, m=1,2,3..., namely m for since 1 do not comprise a series of natural numbers of 0;
Described λ is lambda1-wavelength, and described f is the photon screen focal length, and general focal distance f is fixed up by actual conditions, so can finally determine by the light wavelength of selecting the radius r of annulus
mAnd endless belt width w
m
And be distributed in the length of side a of m the square micropore on annulus
mSatisfy relational expression:
a
m＝0.5w
m～2w
m。
Concrete, described square micropore is distributed on the light tight metallic film of thickness greater than 80nm, and the making material of described light tight metallic film is preferably and is chromium, copper, gold or aluminium.Described light tight metallic film is plated on light-transmissive substrates, and the material of described light-transmissive substrates is light transmissive material, and described light transmissive material is preferably organic glass, fused quartz or simple glass.
The inventor tests by focusing and finds that the common circular hole photon screen of the needed Area Ratio of square hole photon screen is large when the focal beam spot that keeps is identical, and the experiment method that the focusing Foundation is experiment those skilled in the art of light path know.Test situation is specific as follows:
As shown in Figure 2,355nm laser instrument 1 sends the laser of 355nm, laser obtains large-area parallel beam through lens 2, pin hole 3 and beam expanding lens 4, afterwards, light beam is mapped on photon screen 5, focuses of the light beam on CCD (Charge Coupled Device, charge coupled cell) imageing sensor through photon screen 5, ccd image sensor is connected with computing machine 6, can observe the focusing result on computing machine 6.
The focal beam spot that detects as shown in Fig. 3 (a), (b), (c), Fig. 3 (a), (b), (c) be respectively common circular hole photon screen (PS), square hole photon screen (SPS) and with the focusing result of the square hole photon screen (same data SPS) of the identical layout data amount of common circular hole photon screen.Can see, the former two's focal beam spot size is identical, and diameter all is about 1 μ m, and to the inhibiting effect of secondary lobe also all clearly, and brightness is close.The latter's hot spot is obviously much smaller, is about the former two's 1/3, to the inhibiting effect of secondary lobe also clearly.Wherein, the former two's incident intensity remains unchanged, and because the bore of square hole photon screen (SPS) is much bigger, therefore focuses on light intensity also much bigger.Fig. 3 (d) is the focal beam spot intensity distribution of the former two under identical incident intensity, and ordinate Focus intensity is for focusing on light intensity, and horizontal ordinate Focus spot is the position distribution situation of focal beam spot.The square hole photon screen (SPS) of the identical bore of focusing beam intensity ratio that can see common circular hole photon screen (PS) is smaller, but resolution both is substantially identical, to the inhibition of secondary lobe all clearly.Fig. 3 (e) is three's focal beam spot normalization surface of intensity distribution (accompanying drawing in the upper right corner is the focal beam spot normalization surface of intensity distribution of refinement), Normalalized intensity is the normalization light intensity of focal beam spot, and Focus spot is the distribution situation of focal beam spot.Can see, the resolution that has the square hole photon screen (same data SPS) of identical layout data amount with common circular hole photon screen (PS) is significantly improved, and the Sidelobe Suppression effect also clearly.This explanation, the square hole photon screen (same data SPS) that has same quantity of data with common circular hole photon screen (PS) can be made larger bore, thereby can reach higher resolution and focus on light intensity.
So in the intensity one of work light regularly, when forming identical focal beam spot, square hole photon screen can see through more light, and then improve focal beam spot place light intensity, promoted lithographic results.
In addition, Fig. 4 is diameter (or length of side) the D-data volume curve of common circular hole photon screen (PS) and square hole photon screen (SPS), ordinate GDSII data is the data volume of GDSII domain, and horizontal ordinate Diameter is the diameter (or length of side) of common circular hole photon screen (PS) and square hole photon screen (SPS).As can be seen from Figure, along with the increase of D, the GDSII layout data amount of common circular hole photon screen (PS) sharply increases, and the data volume grow of square hole photon screen (SPS) is comparatively mild.D is larger, and square hole photon screen (SPS) is more with respect to the data volume that common circular hole photon screen (PS) reduces.The layout data amount of the square hole photon screen that D is identical (SPS) is than low 85% left and right of common circular hole photon screen (PS).When the D of common circular hole photon screen (PS) was 90mm, the layout data amount reached 3.1GB, and the layout data amount of corresponding square hole photon screen (SPS) is only 360MB.Therefore, square hole photon screen (SPS) can greatly reduce the data volume of domain.And for identical layout data amount, the diameter of square hole photon screen (SPS) can reach 3 times of common circular hole photon screen (PS).If according to the present manufacture level of beamwriter lithography machine---be limited to 1GB on the layout data amount, can only produce diameter is the common circular hole photon screen (PS) of 50mm.For square hole photon screen (SPS), its diameter can reach 150mm.The difficulty of processing that this greatly reduces large-diameter photon sieve, making photon screen be applied to the heavy caliber imaging field becomes possibility.
Embodiment two:
Replace circular micropore can improve the light intensity at focal beam spot place with square micropore, but, can obtain different effects for the difference setting of square micropore, in order to obtain optimum efficiency, the present embodiment discloses a kind of high permeability photon screen of optimum, and the described photon screen of the present embodiment comprises:
Printing opacity quartz substrate and plating lighttight crome metal film thereon, the diameter of described quartz substrate is 10cm, be distributed with the square micropore of printing opacity of the different length of sides of many groups on the crome metal film, every prescription shape micropore is distributed on same annulus, the diagonal line of square micropore is parallel or vertical with the tangent line of its place endless belt, and the annulus at each prescription shape micropore place has together circle center and radius is different, wherein outside each annulus sequence number m is the natural number that is selected between 1～370 from this center of circle, comprise 1 and 370, and the center radius r of m annulus
mWith endless belt width w
mSatisfy relational expression:
r
m 2=2mf λ+m
2λ
2, r
370=8.875mm, w
m=r
m-r
m-1, w
370=6 μ m,
Described λ is lambda1-wavelength, and the described λ=355nm of the present embodiment, described f are the photon screen focal lengths, the described f=0.3m of the present embodiment;
And be distributed in the length of side a of the square micropore of m annulus
mSatisfy relational expression:
Concrete, as shown in Figure 5, the set-up mode of square micropore mainly comprises two kinds: it is just like shown in Fig. 5 (a), and the limit of square micropore is parallel or vertical with the tangent line of its place endless belt; It is two as shown in Fig. 5 (b), and the diagonal line of square micropore is parallel or vertical with the tangent line of its place endless belt.Mode outside above-mentioned dual mode is the transition between above-mentioned dual mode, does not do at this and gives unnecessary details.
As shown in Fig. 5 (a), when the square hole length of side becomes large, the area of the Area Ratio dash area of additional white portion is little, and the transmitted light of additional white portion in the phase phasic difference at focal beam spot place between 0～pi/2, enhancing can superpose after interfere in the far field, the transmitted light of additional dash area, can superpose after interfere in the far field and weaken between-pi/2～0 in the phasic difference at focal beam spot place.So square hole is along with the increase of the length of side, the area change value that stack weakens part is larger than the area change value that stack strengthens part, and its far field construction efficient can descend along with the increase of the length of side.Therefore, at the light one that sees through photon screen regularly, the light intensity at the focal beam spot place of the square hole photon screen of this direction orientation can descend because of the decline of diffraction efficiency.
As shown in Fig. 5 (b), square hole is along with the increase of the length of side, additional white portion is larger than the area of dash area, so the area change value that after interfere in the far field, stack strengthens part deducts the area change value that stack weakens part and also wants large, the square hole photon screen of therefore this direction orientation has larger diffraction efficiency.But along with the increase of the square hole length of side, it not is to increase that the area change value of stack enhancing part deducts the area change value that weakens part that superposes always, and the square hole photon screen that therefore this direction is orientated has the diffraction efficiency of a maximum.Through calculating, the square hole of this direction orientation is along with the increase of the length of side, and the area change rate that stack strengthens part is:
After getting differential:
The area change value that stack weakens part is:
After getting differential, obtain the area change rate and be:
Wherein, S+, S-are respectively the stack enhancing and stack weakens area partly, and x is half of square hole length of side value, and a is half of respective rings bandwidth.As seen, the stack area change rate that strengthens part remains unchanged and the area change rate that weakens part that superposes increases gradually.When both the area change rate was identical, the diffraction efficiency in far field can be got maximal value.Calculate this moment
Namely when the square hole length of side be the endless belt width
Times the time, diffraction efficiency is maximum, the light intensity at focal beam spot place is also got maximal value.
By above-mentioned calculating, the optimized design parameter that obtains square hole photon screen is: the tangent line of the diagonal line of square hole and its place endless belt is perpendicular or parallel, and the length of side is the respective rings bandwidth
Doubly.This moment, square hole photon screen can be obtained optimum focusing effect, and other set-up mode can also obtain better focusing effect with respect to common common circular hole photon screen.
Perpendicular or parallel for the tangent line of the diagonal line of better proof square hole and its place endless belt, the length of side is the respective rings bandwidth
Parameter doubly is optimum parameter, and the inventor adopts as the described light path of embodiment one and focuses on experiment, obtains curve as shown in Figure 6.
Fig. 6 (a) is depicted as a/w=1.414,1.065,1.5, the schematic diagram of light intensity/focal spot radius of 1.59 o'clock, and ordinate is the light intensity of focal beam spot, and horizontal ordinate is the radius of focal beam spot, as seen, when the focal beam spot radius is identical, works as a/w=1.414, namely
The time, the intensity of focal beam spot is maximum; Fig. 6 (b) is that the tangent line of the diagonal line of square hole and its place endless belt is perpendicular or parallel, namely vertical orientated, and the tangent line of the opposite side of square hole and its place endless belt is perpendicular or parallel, i.e. horizontal alignment, the time light intensity/focal spot radius schematic diagram, ordinate is the light intensity of focal beam spot, and horizontal ordinate is the radius of focal beam spot, as seen, when the focal beam spot radius is identical, when the tangent line of the diagonal line of square hole and its place endless belt perpendicular or parallel, is namely vertical orientated, the intensity of focal beam spot was maximum.
Experimental result proved that together with theoretical analysis result the tangent line of the diagonal line of square hole and its place endless belt is perpendicular or parallel, and the length of side is the respective rings bandwidth
Times the time, diffraction efficiency is maximum, the light intensity at focal beam spot place is also got maximal value.
Description to described high permeability photon screen in various embodiments of the present invention emphasizes particularly on different fields a little, relevant, similarity reference mutually.
The above is only the preferred embodiment of the present invention; should be pointed out that for those skilled in the art, under the prerequisite that does not break away from the principle of the invention; can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.
Claims (10)
1. a high permeability photon screen, is characterized in that, comprising:
The square micropores of printing opacity of the different length of sides of many groups, every prescription shape micropore is distributed on same annulus, and the annulus at each prescription shape micropore place is the different concentric circless of a series of radiuses, the radius r of m annulus
mWith endless belt width w
mSatisfy relational expression:
r
m 2＝2mfλ+m
2λ
2，w
m＝r
m-r
m-1，m＝1、2、3...
Described λ is lambda1-wavelength, and described f is the photon screen focal length;
And be distributed in the length of side a of the square micropore of m annulus
mSatisfy relational expression:
a
m＝0.5w
m～2w
m。
2. photon screen according to claim 1, is characterized in that, the diagonal line of described square micropore is parallel or vertical with the tangent line of its place endless belt.
3. photon screen according to claim 2, is characterized in that, the length of side of described square micropore is
w
m
4. photon screen according to claim 1, is characterized in that, described square micropore is distributed on light tight metallic film.
5. photon screen according to claim 4, is characterized in that, described light tight thickness of metal film is greater than 80nm.
6. photon screen according to claim 4, is characterized in that, the making material of described light tight metallic film is chromium.
7. photon screen according to claim 4, is characterized in that, the making material of described light tight metallic film is copper.
8. photon screen according to claim 4, is characterized in that, described light tight metallic film is plated on light-transmissive substrates.
9. photon screen according to claim 8, is characterized in that, the material of described light-transmissive substrates is light transmissive material.
10. photon screen according to claim 9, is characterized in that, described light transmissive material is organic glass.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103091751A (en) * | 2011-10-31 | 2013-05-08 | 中国科学院微电子研究所 | High-transmittance photon sieve |
| CN106054297A (en) * | 2016-08-01 | 2016-10-26 | 苏州大学 | Large field diffraction photon sieve |
| CN110441849A (en) * | 2019-08-27 | 2019-11-12 | 中南大学 | Novel score divides the building method and its manufactured photon screen of shape photon screen |
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
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| CN102043178A (en) * | 2009-10-14 | 2011-05-04 | 中国科学院微电子研究所 | Compound photon sieve for large-caliber imaging and manufacturing method thereof |
| CN102053295A (en) * | 2011-01-20 | 2011-05-11 | 中国科学院光电技术研究所 | Compound type photon sieve |
| CN102073084A (en) * | 2009-11-23 | 2011-05-25 | 中国科学院微电子研究所 | Square hole photon screen and manufacture method thereof |
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| US20030012692A1 (en) * | 2001-05-25 | 2003-01-16 | Lemee Valerie J.C. | Detection of reactions and metabolic changes with fluorscent materials |
| US20050046944A1 (en) * | 2003-08-29 | 2005-03-03 | Shenderova Olga Alexander | Imaging devices and methods |
| CN102043178A (en) * | 2009-10-14 | 2011-05-04 | 中国科学院微电子研究所 | Compound photon sieve for large-caliber imaging and manufacturing method thereof |
| CN102073084A (en) * | 2009-11-23 | 2011-05-25 | 中国科学院微电子研究所 | Square hole photon screen and manufacture method thereof |
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| CN103091751A (en) * | 2011-10-31 | 2013-05-08 | 中国科学院微电子研究所 | High-transmittance photon sieve |
| CN106054297A (en) * | 2016-08-01 | 2016-10-26 | 苏州大学 | Large field diffraction photon sieve |
| CN110441849A (en) * | 2019-08-27 | 2019-11-12 | 中南大学 | Novel score divides the building method and its manufactured photon screen of shape photon screen |
| CN111273441A (en) * | 2020-02-25 | 2020-06-12 | 业成科技（成都）有限公司 | Optical module and electronic equipment |
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Application publication date: 20130508 |