CN102023390A - Array three-ring multiple-valued phase-ring light uniformity device and manufacturing method thereof - Google Patents

Abstract

The present invention discloses an array three-ring multiple-valued phase-ring light uniformity device, which is characterized in that the array three-ring multiple-valued phase-ring light uniformity device is an array with a structure of three-ring multiple-valued phase ring on a transparent medium manufactured according to the practical need, wherein, the size of the array is given according to the practical need; the three-ring multiple-valued phase ring is the basic unit of the array light uniformity device; three-ring multiple-valued phase ring is a phase plate with a concentric three-ring structure manufactured on a transparent substrate; the radius of the outermost ring is given by the practical optical path; the radius of the innermost ring is 0.36 times the radius of the outer ring; the radius of the middle ring is 0.09 times the radius of the outer ring; the phase of the inner ring is 0; the phase of the outer ring is 0.86 Pi; the phase of the middle ring is 0.06 Pi; the other parts are lightproof; the array is exactly the repetition of the structure of three-ring multiple-valued phase ring. The present invention also discloses a method for manufacturing array three-ring multiple-valued phase-ring light uniformity device. The invention enables flattening of the Gaussian wave-front beam and other nonuniform non-planar wave-front beams, thereby making wave-front beam approach a plane.

Description

The many-valued position of array 3 rings is encircled light uniforming device and preparation method thereof mutually

Technical field

The present invention relates to shaping technique field, laser beam corrugated, particularly a kind of be used to realize before the high bass wave and before the irregular wave laser beam promptly realize approaching the many-valued position of array 3 rings of the light field that plane wave front distributes and encircle light uniforming device and preparation method thereof mutually in the wavefront flat-topization of far field construction light field.The many-valued position of this kind array 3 ring encircles mutually that light uniforming device can be used for beam shaping, microelectronics non-mask etching and other needs in the various light paths of plane wave front.

Background technology

By all means for before the high bass wave and irregular wave before laser beam spare light, make optical beam transformation become to approach that the light beam of plane wave front is the problem of a practicality, in various light paths, all be widely used, such as needing in the various instruments of plane wave front at beam shaping, microelectronics non-mask etching and other.The optical device that can realize this function is referred to as light uniforming device.

Thereby position phase modulation technique is to distribute mutually by the position that changes diffracted ray propagation cross section to realize the technology of expection diffraction intensity distribution.The method that is used to modulate has multiple, the phase board that has fixed bit to distribute mutually, also the modulation sheet that can be distributed mutually by the Control of Voltage position made of using light electric crystal.Because the utilization ratio of diffraction phase board luminous energy is the highest, so the most frequently used.

So-called light uniforming device is also referred to as even bundle device, is that a kind of incident beam wavefront that changes is to realize the optical device of similar plane wave front light beam.General light uniforming device comprises:

Prism method: principle of work is the quasi-parallel laser beam when a branch of light distribution approximate Gaussian function, and during by prism, light beam is divided into four light beams by kaleidoscope prism, and four light beams are after stack on the X-Y plane, and the beam distribution homogeneity has better improvement.(the x of any on X-Y plane, y), through behind the kaleidoscope prism, light intensity on the X-Y plane changes number percent less than 3%, the Laser Transmission rate can reach 94%, can obtain well even effect of output beam and higher Laser Transmission rate with prism method, but the even effect of prism method only just obtains desirable effect when the strict symmetry of input beam, and obtain the extremely strict angle in position in uniform beam cross section corresponding to wedge.

The catoptron method: principle of work is the quasi-parallel laser beam process lens L when a branch of light distribution approximate Gaussian function ₁Focus on mirror M ₁On, through after the primary event, its energy distribution will be passed through lens L equally according to change and energy superposition phenomenon that beam direction takes place shown in Fig. 1-2 ₂And mirror M ₂After, light beam will superpose again.Through after the light beam stack repeatedly, its initial Gaussian beam energy distribution is with homogenized like this.Also can obtain well even effect of output beam and higher Laser Transmission rate with the catoptron method, but the assembling of catoptron method and debugging are very difficult.

The kaleidoscope method: principle of work is for being that the incident light of approximate Gaussian distribution is with maximum incident angle θ when light distribution _MaxAfter entering optical waveguide, have only with lens axis light parallel or become a less angle with optical axis and directly pass through waveguide without reflection, the light of all the other incident lights will produce in waveguide on the difference of reflection arrival output face.The kaleidoscope method makes, debugs simple and easy, and cost reduces greatly, can change the size of output facula easily, but the loss of this system is bigger.

The cylindrical mirror method: the method principle is for being surrounded the square structure of a hollow by four cylindrical mirrors, every cylindrical mirror is installed on the meticulous adjustment rack, by regulating the size and dimension that to control hollow space, laser radiation is on device, hollow space laser directly sees through, be radiated at the strong part of the low light level that light on the edge cylindrical lens will compensate to intermediate light, adjust knob by the parameter and suitable adjusting of calculating cylindrical mirror, just can obtain equal light effect, the advantage of this method is that the light beam transmitance is higher, all light effect is better, but the designer has relatively high expectations, and the designer need calculate lens parameters and design high-precision micro-adjusting mechanism.

Fly's-eye lens array method: principle is a fly_eye lens array condenser system light path, and by the square lens arra L that m * m sheet focal length and measure-alike lenslet are formed, lens array L is divided into m to the collimated light beam corrugated of incident ²The bundle beamlet, actual in the light distribution that forms on the target surface is the integration that spherical mirror is focused at each beamlet the light intensity on its focal plane.Use the lens arra condenser system, even under the very poor situation of incident beam near field distribution homogeneity, still can on the focal plane, obtain uniform lighting effect.

The array light uniforming device, be called the even bundle of array device again, be based on mathematics integral principle design, it can be divided into light beam unlimited a plurality of tiny light beams, the energy distribution of the light beam inside that each is tiny is uniform, penlight accumulative total stack with all has just obtained the hot spot that distributes in a certain position energy even.[referring to, Lin ying, Lawrence Geoge N, Buck Jesse.Charaterization of excimer lasers for application to lenslet arrayhomogenizer[J], Applied Optics, 2001,49 (12): 1931-1941].The basic array unit of array light uniforming device can be lens, and promptly above-mentioned fly eye lens array method also can be that Fresnel zone plate is [referring to Liu Xun, Chen Tao, Zuo Tiechuan is applied to the design studies of the binary optical elements of excimer laser corrugated shaping, Chinese laser (monograph), in March, 2008.]

Given annular position is ring mutually, and its far field construction field light distribution is that a position is encircled each radius and each ring position function mutually mutually.Adopt the many-valued position of 3 rings to encircle the wavefront flat-topization that can realize the incident Gaussian beam mutually.[referring to Jia Jia, Changhe Zhou, Xiaohui Sun, and Liren Liu, " Superresolutionlaser beam shaping ", Applied optics, vol 43, No.10,2004], the many-valued position of the 3 rings project organization of ring is mutually provided by actual light path for outer shroud radius, interior 1 ring radius is 0.36 of an outer shroud radius, and interior 2 ring radiuses are 0.09 of outer shroud, and interior annulus position is 0 mutually, with the position of outer toroid is 0.86 π mutually, and the adapter ring position is 0.06 π mutually.Remaining part is light tight.So-called array is exactly this many-valued position of 3 ring of repetition structure of ring mutually.

Summary of the invention

(1) technical matters that will solve

In view of this, fundamental purpose of the present invention is to provide the many-valued position of a kind of array 3 rings to encircle light uniforming device and preparation method thereof mutually, to realize Gaussian beam and other wavefront non-uniform laser beams are transformed to the diffracted beam of wavefront almost plane.

(2) technical scheme

For achieving the above object, the invention provides the many-valued position of a kind of array 3 rings and encircle light uniforming device mutually, it is a kind of many-valued position of 3 rings of making according to actual needs on transparent medium array of ring mutually that this many-valued position of array 3 rings is encircled light uniforming device mutually, the size of array is provided by actual needs, the size of array selects to want to make the light beam of incident be held by array fully that the many-valued position of 3 rings ring mutually is the elementary cell of array.

In the such scheme, the many-valued position of 3 rings ring mutually is the position photo of concentric 3 ring structures making on transparent substrate.Outer shroud radius is provided by actual light path, and interior 1 ring radius is 0.36 of an outer shroud radius, and interior 2 ring radiuses are 0.09 of outer shroud, and interior annulus position is 0 mutually, and the position of outer toroid is 0.86 π mutually, and the adapter ring position is 0.06 π mutually.Remaining part is light tight.

In the such scheme, so-called array is exactly this many-valued position of 3 ring of repetition structure of ring mutually.

For achieving the above object, the present invention also provides a kind of method that the many-valued position of array 3 rings is encircled light uniforming device mutually of making, and this method utilizes lsi technology technology and plane photoetching process technology to realize, may further comprise the steps:

Utilize the electron-beam direct writing legal system to make mother matrix;

Master pattern is transferred on the optical glass that scribbles photoresist by the contact photolithography method;

Utilize the inductive couple plasma lithographic technique, will move on to pattern etch on the optical glass photoresist in optical glass.

In the such scheme, describedly master pattern is transferred in the step on the optical glass that scribbles photoresist by the contact photolithography method, the error of repelication of described contact exposure is less than 0.5 μ m, and the photoresist that is adopted is Shipley s1818, and thickness is 1.8 μ m.

In the such scheme, in the described step of pattern etch in the optical glass that will move on on the optical glass photoresist, the etching gas that is adopted is fluoroform (CHF ₃), flow is 30SCCM, and RF power is 500W, and bias power is 200W, is 0.077 μ m/min to the etch rate of quartz substrate.

(3) beneficial effect

The many-valued position of array 3 rings provided by the invention is encircled light uniforming device mutually, be based on mathematics integral principle design, it can be divided into light beam unlimited a plurality of tiny light beams, the energy distribution of the light beam inside that each is tiny is uniform, penlight accumulative total stack with all has just obtained the hot spot that distributes in a certain position energy even.The many-valued position of elementary cell 3 rings of this kind array light uniforming device is ring mutually, it is the diffraction element of a phase-type, its independent function is to realize inciding light beam on it in the wavefront flat-topization in far field, and after incident beam incides this elementary cell, the focusing again of light beam and the diffusion in far field have been realized, thereby realized the even light of array device, Gaussian beam and other wavefront non-uniform laser beams have been transformed to the diffracted beam of wavefront almost plane.

Description of drawings

Fig. 1 is the basic diffraction element that the many-valued position of array 3 rings is encircled light uniforming device mutually, and the many-valued position of 3 rings is the synoptic diagram of ring mutually.The figure Oxford gray is the part of 0.86 π for the position mutually, and white is 0 place for the position mutually, and the part of black is light tight, and light gray is that the position is the part of 0.06 π mutually, and the radius of interior 1 ring is 0.36 times of outer shroud radius, and the innermost ring radius is 0.09 times of outer shroud radius;

Fig. 2 is many-valued synoptic diagram that encircles light uniforming device mutually of 10 * 10 arrays, 3 rings that the many-valued position of array 3 rings of the present invention is encircled one of light uniforming device embodiment mutually, and diffraction element is Fig. 1;

Fig. 3 is that a branch of Gaussian beam incides the synoptic diagram that the many-valued position of array 3 rings is encircled light uniforming device mutually.

Fig. 4 is the synoptic diagram of 10 * 10 array Fresnel zone plate light uniforming devices.The basic diffraction element formula Fresnel zone plate of this kind light uniforming device, this kind light uniforming device is published.The purpose that the present invention lists this light uniforming device is the many-valued position of array 3 rings of the present invention to be encircled light uniforming device mutually and array fresnel's zone plate light uniforming device compares, thereby proves that even light result of the present invention is better than array Fei Nier zone plate light uniforming device.

Fig. 5 is the synoptic diagram that a branch of Gaussian beam incides array Fresnel zone plate light uniforming device.

Fig. 6 is that Gaussian beam does not incide any light uniforming device, incides array Fresnel zone plate light uniforming device, incides the intensity contrast figure that the many-valued position of array 3 rings is encircled the diffracted beam of light uniforming device mutually.Can obviously find out from figure: do not incide any light uniforming device, the light intensity distributions of Gaussian beam is a Gaussian curve.Two kinds of light uniforming devices all are the even light of having realized Gaussian beam, but the even light effect that the many-valued position of array provided by the invention 3 rings is encircled light uniforming device mutually is better than the even light effect of existing array Fresnel zone plate light uniforming device.Because it has realized more approaching the diffracted beam of plane wave front.

Fig. 7 is the experiment pick-up unit that the many-valued position of array 3 rings is encircled light uniforming device mutually.

Embodiment

For making the purpose, technical solutions and advantages of the present invention clearer, below in conjunction with specific embodiment, and with reference to accompanying drawing, the present invention is described in more detail.

It is a kind of novel diffraction optics phase part, i.e. phase board that the many-valued position of array 3 rings is encircled light uniforming device mutually.This phase board is positioned over before or after the diffraction limit lens, and laser beam far field construction light field is revised, promptly even light, and realization more approaches the diffracted beam of plane wave front than (such as Gaussian beam) before the incident beam irregular wave.The present invention has provided the many-valued position of array 3 rings and has encircled the project organization of light uniforming device mutually, and has carried out relevant simulated experiment.Experimental verification adopt the many-valued position of array 3 rings to encircle the flat-topization that light uniforming device can be realized the Gaussian beam wavefront mutually, promptly Gaussian beam is for conversion into the diffracted beam that wavefront approaches plane wave front.The technology of the present invention can be used for beam shaping, microelectronics non-mask etching and other needs in the various light paths of plane wave front light beam.

The many-valued position of this array 3 rings provided by the invention is encircled light uniforming device mutually, is a kind of on transparent medium, and the many-valued position of 3 rings of making according to actual needs is the array of ring mutually, and the size of array is provided by actual needs.The many-valued position of so-called 3 rings ring mutually is the elementary cell of this kind array type light uniforming device.The many-valued position of 3 rings ring mutually is on transparent substrate, make the position photo of concentric 3 ring structures.Outer shroud radius is provided by actual light path, and interior 1 ring radius is 0.36 of an outer shroud radius, interior 2 ring radiuses be outer shroud radius 0.09, interior annulus position is 0 mutually, the position of outer toroid is 0.86 π mutually, middle ring position is 0.06 π mutually.Remaining part is light tight.So-called array is exactly this many-valued position of 3 ring of repetition structure of ring mutually.

Fig. 2 is many-valued synoptic diagram that encircles light uniforming device mutually of 10 * 10 arrays, 3 rings that the many-valued position of array 3 rings of the present invention is encircled one of light uniforming device embodiment mutually, and diffraction element is Fig. 1; The figure Oxford gray is the part of 0.86 π for the position mutually, and white is that the position is 0 place mutually, and the part of black is light tight, and is light grey for the position is the part of 0.06 π mutually, and interior 1 radius that encircles is 0.36 times of outer shroud radius, and interior 2 ring radiuses are 0.09 times of outer shroud;

Because the position of diffraction element has a plurality of values mutually on all phase boards, 0 and 0.86 π and 0.06 π just are called the many-valued position of array 3 rings and encircle light uniforming device mutually

By the conclusion of diffraction optics angular spectrum as can be known:

Be located at and introduce an infinitely-great position photo that includes the light uniforming device structure on the z=0 plane, desirable Gaussian beam impinges upon on the light uniforming device.The transmittance function of light uniforming device is that (z): it is E (x, y, 0) that Gaussian beam sees through the light uniforming device light intensity to S for x, y, and discrete Fourier transformation obtains the angular spectrum F0 (fx, fy, 0) of incident light on diffraction screen through two-dimensional space.

$E(f_x,f_Y,0)=\underset{-\∞}{\overset{\∞}{\∫}}\underset{-\∞}{\overset{\∞}{\∫}}E(x,y,0)\exp [-j2\mathrm{\π}(f_{X}x+f_{Y}y)]\mathrm{dxdy}---\left(1\right)$

In (1), f _X, f _YBe spatial frequency, $f_X=\frac{\mathrm{\α}}{\mathrm{\λ}},$ $f_Y=\frac{\mathrm{\β}}{\mathrm{\λ}}$ (α, β are wave vectors With X-axis, the angle between the Y-axis).Incident light is propagated along the Z direction through behind the light uniforming device.At the Z=z place, the frequency spectrum E. of spatial frequency (fx, fy z) are:

$E(f_X,f_Y,z)=E(f_X,f_Y,0)\exp (j2\mathrm{\π}\sqrt{\frac{1}{{\mathrm{\λ}}^2}-f_X^2-f_Y^2}.z)---\left(3\right)$

In (3), f _Xf _YMust satisfy condition $f_X^2+f_Y^2\≤1/{\mathrm{\λ}}^2,$ This formula shows that the effect of propagating the z of a segment distance has just changed the relative phase of each angular spectrum component.But work as $f_X^2+f_Y^2>1/{\mathrm{\λ}}^2$ The time, (fx, fy z) are the frequency spectrum E. of spatial frequency

E(f _X，f _Y，z)＝E(f _X，f _Y，0)exp(-μz) (4)

In (4), $\mathrm{\μ}=\frac{2\mathrm{\π}}{\mathrm{\λ}}\sqrt{{\left(\frac{x}{z}\right)}^2+{\left(\frac{y}{z}\right)}^2-1}.$

Because μ is an arithmetic number, these wave components increase decay rapidly because of propagation distance.(4) formula is done inverse Fourier transform, obtain light wave amplitude E (x, y, z)

$E(x,y,z)={\∫}_{-\∞}^{\∞}{\∫}_{-\∞}^{\∞}E(f_X,f_Y,0)\exp (j2\mathrm{\π}\sqrt{\frac{1}{{\mathrm{\λ}}^2}-f_X^2-f_Y^2}.z)\exp \left[j2\mathrm{\π}(f_{X}x+f_{Y}y)\right]d{f}_{X}d{f}_Y---\left(5\right)$

More than being common angular spectrum diffraction theory, also is that we simulate the theoretical foundation of light uniforming device along light path.Encircle light uniforming device mutually at the many-valued position of array 3 rings, what need modification is exactly each transmittance function.

The present invention has provided many-valued design parameter that encircles light uniforming device mutually of array 3 rings.We have selected 10 * 10 array in Fig. 2, the selection of this array will be satisfied a principle: promptly the aperture of incident beam must be less than the amplitude of array, thereby can make incident beam to shine on the light uniforming device fully.Design parameter for each the many-valued position of 3 rings this diffraction element of phase cyclic group is as follows: the outgoing aperture of generally choosing laser instrument is as the radius of outer shroud, and the outgoing aperture of common lasers is the with a tight waist of the Gaussian beam sent.

Array of the present invention 3 rings 2 values encircle mutually light uniforming device in the application of reality shown in 7.The 1st, the collimation laser device, the 2nd, condenser lens, the 3rd, the many-valued position of array 3 rings of the present invention is encircled light uniforming device mutually, and the 4th, the CCD photodetector.The light that sends from collimation laser 1 encircles light uniforming device 3 through condenser lens 2 mutually with the many-valued position of array 3 rings, produces diffractogram on the focal plane of condenser lens 2.Such diffracted beam intensity distributes and can be detected and confirmed it by the ccd detector on the focal plane that is placed on condenser lens 24.

After experimental results show that adding the many-valued position of designed array 3 rings encircles light uniforming device mutually, realized really Gaussian beam is for conversion into emergent light near the plane wave front light beam.This explanation the present invention can be used for beam shaping, microelectronics non-mask etching and other needs in the various light paths of plane wave front.

The many-valued position of this making array 3 rings provided by the invention is encircled the method for light uniforming device mutually, utilizes lsi technology technology and plane photoetching process technology to realize, specifically may further comprise the steps:

Step 1, utilize the electron-beam direct writing legal system to make mother matrix;

Step 2, master pattern is transferred on the optical glass that scribbles photoresist by the contact photolithography method;

Step 3, utilize the inductive couple plasma lithographic technique, will move on to pattern etch on the optical glass photoresist in optical glass.

Above-mentioned manufacturing girdle photon sieve utilizes lsi technology technology and plane photoetching process technology to realize.At first, utilize the electron-beam direct writing legal system to make mother matrix, by the contact photolithography method, master pattern has been transferred on the optical glass that scribbles photoresist.The photoresist that is adopted is Shipley s1818, and thickness is 1.8 μ m.The error of repelication of contact exposure is less than 0.5 μ m.Each parameter of girdle photon sieve provides in preamble.At last, utilize the inductive couple plasma lithographic technique, with pattern etch in optical glass.The etching gas that is adopted is fluoroform (CHF ₃), flow is 30SCCM, and RF power is 500W, and bias power is 200W, is 0.077 μ m/min to the etch rate of quartz substrate.Corresponding to 0.6328 mum wavelength, the refractive index of optical glass is 1.521, thereby the corresponding degree of depth in 0.86 π position is 0.5220 μ m, and the corresponding degree of depth in 0.06 π position is 0.0364 μ m.Utilize Taylor's contourgraph to measure the degree of depth of this device.Light path synoptic diagram according to Fig. 7 arranges the measurement light path. and the laser works wavelength is 632.8nm.Expand bundle, collimation then.In experiment, be that the many-valued position of 3 rings of one 10 * 10 array is encircled light uniforming device mutually, place ccd detector, the considerable thus size of measuring diffraction pattern then at the focal beam spot place.Measured data has proved the correctness of Theoretical Calculation.

Encircling light uniforming device mutually with one 10 * 10 many-valued position of array 3 rings below is example, describes its method for making:

1), determine optical maser wavelength and perforation hole radius, also be the outgoing beam waist radius;

2), determine the radius of the light beam of the wealthy Shu Yihou of laser according to need of work, the array that make must be greater than this radius.

3), according to the draw domain of light uniforming device of method as herein described.

4), make the many-valued position of array 3 rings and encircle light uniforming device mutually.

Suppose that optical maser wavelength is 632.8 nanometers, the waist radius in laser emitting hole is 32 microns.The radius of drawing together the Shu Yihou Gaussian beam is 180 microns, selects 10 * 10 array, can satisfy whole requirements.Each 3 rings, 2 values position outer shroud radius of ring mutually is 32 microns, and interior 1 ring radius is 32 * 0.36=11.52 micron, and interior 2 ring radiuses are 32 * 0.09=2.88 microns.The ring position is 0 mutually wherein, does not need etching; Outer toroid is that the corresponding etching depth of 0.86 π is 0.5220 μ m, and middle garden ring is that the corresponding etching depth of 0.06 π is 0.0364 μ m.Lighttight part all plates chromium.

Above-described concrete embodiment has carried out further detailed explanation to purpose of the present invention, technical scheme and beneficial effect.Institute it should be understood that the above only for concrete embodiment of the present invention, is not limited to the present invention.All any modifications of being made within the spirit and principles in the present invention, be equal to and replace or improvement etc., all should be included within protection scope of the present invention.

Claims (6)

1. the many-valued position of array 3 rings is encircled light uniforming device mutually, it is characterized in that, it is a kind of many-valued position of 3 rings of making on transparent medium array of ring mutually that this many-valued position of 3 ring is encircled light uniforming device mutually, the size of array is provided by actual needs, the size of array selects to want to make the light beam of incident be held by array fully that the many-valued position of 3 rings ring mutually is the elementary cell of array.

2. the many-valued position of array 3 rings according to claim 1 is encircled light uniforming device mutually, it is characterized in that, this many-valued position of 3 ring ring mutually is the position photo of concentric 3 ring structures making on transparent substrate, the real radius of outer shroud is provided by actual needs, interior 1 ring radius is 0.36 times of outer shroud radius, and interior 2 ring radiuses are 0.09 times of outer shroud.

3. the many-valued position of array 3 rings according to claim 1 is encircled light uniforming device mutually, it is characterized in that, in this many-valued position of 3 ring was encircled mutually, interior annulus position was 0 mutually, and the position of outer toroid is 0.86 π mutually, and the adapter ring position is 0.06 π mutually, and remaining part is light tight.

4. make the method that the many-valued position of array 3 rings is encircled light uniforming device mutually for one kind, it is characterized in that this method utilizes lsi technology technology and plane photoetching process technology to realize, comprising:

Utilize the electron-beam direct writing legal system to make mother matrix;

Master pattern is transferred on the optical glass that scribbles photoresist by the contact photolithography method;

Utilize the inductive couple plasma lithographic technique, will move on to pattern etch on the optical glass photoresist in optical glass.

5. making array according to claim 43 ring positions are encircled the method for light uniforming device mutually, it is characterized in that, describedly master pattern is transferred in the step on the optical glass that scribbles photoresist by the contact photolithography method, the error of repelication of described contact exposure is less than 0.5 μ m, the photoresist that is adopted is Shipley s1818, and thickness is 1.8 μ m.

6. the many-valued position of making array according to claim 43 rings is encircled the method for light uniforming device mutually, it is characterized in that, in the described step of pattern etch in the optical glass that will move on on the optical glass photoresist, the etching gas that is adopted is fluoroform CHF ₃, flow is 30SCCM, and RF power is 500W, and bias power is 200W, is 0.077 μ m/min to the etch rate of quartz substrate.

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