CN102011096A - Vacuum evaporation system capable of controlling evaporating airflow distribution and components - Google Patents
Vacuum evaporation system capable of controlling evaporating airflow distribution and components Download PDFInfo
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Abstract
The invention relates to a vacuum evaporation system capable of controlling evaporating airflow distribution and components. The system comprises an evaporation gun, a high-temperature evaporation crucible and a storage tank filled with an evaporating material, wherein a nozzle with an upper conical surface and a lower conical surface is formed on the evaporation gun, and a movable airflow guidance plug is arranged inside the nozzle; a substrate to be evaporated is opposite to the front of the nozzle; the evaporation gun is connected with the high-temperature evaporation crucible which is provided with a cross baffle through a heat pipeline or a surge flask, and the other side of the crucible is connected with the storage tank through a pipeline which is provided with a feed valve; heating coils are arranged on the evaporation gun, the heat pipeline, the high-temperature evaporation crucible and the outer wall of the pipeline, and a heat coil is arranged on the outer wall of the storage tank as well; the evaporating material in the storage tank is delivered into the high-temperature evaporation crucible through the feed valve and the pipeline, so that the evaporating material to be evaporated is immediately turned to be vapor delivered to the evaporating gun; and the volume and the direction of the vapor can be controlled by changing the relative position of the airflow guidance plug and the nozzle, and the vapor is evaporated to the substrate to form an evaporating film, which is uniform and has set area and multiple components. The vacuum evaporation system has simple structure, can improve the utilization rate of the organic evaporating material, and can improve the production efficiency.
Description
Technical field
The present invention relates to be used to be manufactured with OLED (OLED), OTFT (TFT), organic photovoltaic cell, semiconducter device, flat-panel display device, and during other organic and inorganic devices organic and inorganic evaporation material evaporation to the substrate the distribution of may command evaporative air and the vacuum vaporation system of composition.
Background technology
Vacuum evaporation process has been widely used in the making of semiconductor components and devices and flat-panel display device.Formed a very big industry as Organic Light Emitting Diode aspects such as (OLED) especially, main process is vacuum-evaporation in the preparation process of OLED, the organic evaporating material is placed in the crucible of heating to be deposited on the substrate after the evaporation material become steam exactly.Owing to, require more and more higher to the homogeneity of big area evaporation and evaporation cheaply along with the continuous expansion of flat pannel display area.And evaporation source generally commonly used has an evaporation source and line evaporation source.For an evaporation source such as Chinese patent 01129122,200810210270.x, 003110977 etc., this kind evaporation source is because be dome shape during evaporation therefore be uneven when being evaporated to planar substrates, and the thick middle periphery is thin.Just then need evaporation source is placed on the edge of substrate and can obtains uniform film under the situation of substrate rotation in order to obtain uniform film.This has not only increased the complicacy of technology but also has caused a large amount of wastes of evaporation material.The utilization ratio of general evaporation material in this way has only percentum.Particularly to it has increased cost greatly under the very expensive situation of the material of its organic light emission of organic luminescent device.For the utilization ratio that improves the evaporation material has a lot of patents such as Chinese patent 200710169464.5 etc. to propose the scheme of line evaporation source.Its method is the evaporation source that becomes a uniform linear by the evaporation boat-shaped that the line evaporation source is promptly made a long strip shape to the evaporation boat, and the constant speed movement by this line evaporation source or substrate realizes uniform evaporation.Its evaporation material utilization ratio has had large increase, can reach the utilization ratio about 20%.But its complex structure is a lot of for the factor that realizes even its control of vaporator rate on the line, and equipment cost is just than higher.Because needing doping agent more, general organic luminous layer therefore needs the multi-source evaporation in addition.This has not only brought more control, needs very long debug process in order to regulate its stable vaporator rate, and this has also brought the waste and the technology cost of very big evaporation material.
Summary of the invention
The objective of the invention is to defective at the prior art existence, the vacuum vaporation system of a kind of may command evaporative air distribution and composition is provided, and the film thickness that is evaporated on the substrate is uniformly, and improves the utilization ratio of organic evaporating material greatly, system architecture is simple, boosts productivity.
For achieving the above object, the present invention adopts following technical proposals:
The vacuum vaporation system of a kind of may command evaporative air distribution and composition, comprise evaporation rifle, high temperature evaporation crucible and the storage tank that evaporation is expected is housed, it is characterized in that described evaporation sling has a spout of the conical surface up and down, and settle a movably air-flow guiding stopper in the spout inboard, aiming at described spout the place ahead is substrate to be deposited, this evaporation rifle intersects the described high temperature evaporation crucible of baffle plate and links to each other with having by a water back or surge flask, links to each other with described storage tank by a pipeline that the feeding valve is housed at the opposite side of described crucible; On described evaporation rifle, water back, high temperature evaporation crucible and the pipeline outer wall heater coil is arranged all, heater coil is also arranged on the storage tank outer wall; By feeding valve and pipeline the evaporation material in the storage tank being rendered to becomes evaporation material moment of evaporating and becomes vaporised gas and be delivered to the evaporation rifle in the high temperature evaporation crucible, by changing the size and Orientation of air-flow guiding stopper and the relative position may command vaporised gas of spout, be evaporated to and form setting area, uniform, multi-component thin evaporated film on the substrate.
The having up and down the nozzle exit shape of the conical surface and can do squarely or rectangle or circle of described evaporation rifle according to the shape of substrate and the distribution of evaporative air flow, and the shape of its conical surface is single taper or biconical, be the side's of being taper or rectangular taper or conical or curved surface conical in shape, the shape of the conical surface is symmetric or asymmetric up and down.
The described spout inboard movably shape of air-flow guiding stopper is spherical or the garden awl or the quadrate cone shape of ellipsoid shape or taper or band curved surface; Movably air-flow guiding stopper links to each other with a phase shift bar, and this carriage release lever stretches out the external of evaporation rifle, and corrugated tube one end is fixedlyed connected with carriage release lever, and the other end is fixedlyed connected with evaporation rifle housing, and it is whole to make evaporation rifle cavity form a sealing.Can play the distribution of regulating air-flow by driving the distance that carriage release lever moves air-flow guiding stopper and round mouth, big or small and reach the function of closing.
Described evaporation material is a single-material, or the mixing material of multiple material, and this mixing material is the mechanically mixing material, or by expecting to be dissolved in to join trace impurity in the matrix in the appropriate solvent again mixing up.
Described evaporation material is Powdered, or coccoid, granular, flaky piller.
The crucible bottom of described high temperature evaporation crucible is taper or spherical.
The material of described evaporation rifle, water back and high temperature evaporation crucible is a stainless steel, molybdenum, and tantalum is chosen any one kind of them in tungsten and the pyroceramic.
The vacuum vaporation system of a kind of may command evaporative air distribution and composition, comprise the evaporation rifle and the storage tank that evaporation is expected is housed, it is characterized in that described evaporation sling has the spout of the conical surface up and down, and at mobile air-flow guiding stopper of the inboard arrangement of spout, aim at the place ahead of described spout and settle substrate to be deposited, this evaporation rifle inner chamber bottom is provided with staggered baffle plate, and the evaporation rifle is by the described storage tank of the pipe connection that the feeding valve is housed; On the evaporation rifle outer wall heater coil is housed, on pipeline and the storage tank outer wall heater coil is housed.
The present invention has following conspicuous outstanding substantive distinguishing features and remarkable advantage compared with prior art:
1) because the spout of the evaporation rifle among the present invention and guiding are filled in the function of the fixed direction allocation of the air-flow with directed and all directions, the gas flow when making it to arrive the substrate of certain distance just in time is thereby that to reach in specified area uniformly be uniformly, and all air-flows all concentrate in the useful area of substrate.The film thickness that had so both guaranteed to be evaporated on the substrate is that the utilization ratio that has improved the organic evaporating material has again greatly reduced cost uniformly.Because all evaporation material all have been evaporated on the substrate, so the interior other parts of vacuum-evaporation cavity can contaminatedly not guarantee the cleanliness factor of vacuum-evaporation cavity.
2) design of the spout taper by the evaporation rifle and guiding stopper shape not only can realize large-area evaporation homogeneity but also can shorten the distance of evaporation, thereby can dwindle the volume of evaporation cavity greatly.
3) can obtain uniform thin evaporated film by orientation evaporation, so substrate and contacted with it metal mask plate do not need to rotate, this makes and can obtain simplifying in the design of vapo(u)rization system.
4) because the gasification that the evaporation rifle of this system and evaporation are expected is what to separate, so can both can make progress also to any direction can be downwards or flat fire for the direction of its air-flow.Substrate both can be on the evaporation rifle when vapo(u)rization system designs like this, reduce to pollute, also can help substrate below the evaporation rifle and the tight of metal mask plate contacts, and perhaps substrate can be that axial form helps moving of substrate.This brings a lot of handinesies for the design of deposition system.
5) comparing the volume of general some evaporation source or this system of line evaporation source can be smaller, its heating area can be smaller comparatively speaking, the speed ratio of evaporation is very fast, can reduce the temperature of substrate like this, with shortening system pitch time, the production efficiency that this helps to improve the performance of OLED screen and improves system.
Therefore 6) disposable the evaporating in back because used evaporation material feeds intake is always under high temperature unlike the evaporation material of generic point evaporation source or line evaporation source, can difference and cause the difference of quality of forming film in the situation of start vaporizer when evaporating.
7) owing to can come film forming thickness on the control basal plate, so simplified the Controlling System of thickness greatly by the quantity that feeds intake of evaporation material.And after evaporation was finished, substrate conversion and the time of metal mask plate contraposition can not feed intake that this compares with the line evaporation source with general some evaporation source and can save a lot of evaporation material.Because general some evaporation source and line evaporation source during in evaporation in order to guarantee uniform velocity of evaporation, evaporation source is still at evaporating state at the uniform velocity when conversion baseplate and metal mask plate contraposition, just with baffle plate evaporation current is blocked, this part material is wasted.
8) because used evaporation material through mixing up, does not therefore need the multi-source evaporation, this can simplify much for the structure design of vapo(u)rization system.Also cancelled the time of the vaporator rate of modulating different evaporation sources, thereby saved evaporation material and time.
Description of drawings
Fig. 1 is that the may command evaporative air distributes and the vacuum vaporation system structural representation of composition among the present invention;
Fig. 2 is that the may command evaporative air simplified among the present invention distributes and the structural representation of the vacuum vaporation system of composition;
Fig. 3 is that may command evaporative air upwards distributes and the structural representation of the vacuum vaporation system of composition implementing among the present invention;
Fig. 4 is the structural representation that the vacuum vaporation system of distribution of may command evaporative air and composition is shifted to down in enforcement among the present invention.
Embodiment
Details are as follows in conjunction with the accompanying drawings for the preferred embodiments of the present invention:
Embodiment 1:Referring to Fig. 1, this may command evaporative air distributes and the vacuum vaporation system of composition is by evaporation rifle (3), high-temperature pipe (4), high temperature evaporation crucible (5), feeding valve (8) and storage tank (9) are formed, described evaporation rifle (3) has the spout (1) of the conical surface up and down, and settle a movably air-flow guiding stopper (2) in spout (1) inboard, aim at the place ahead of described spout (1) and settle substrate (16) to be deposited, evaporation rifle (3) intersects the high temperature evaporation crucible (5) of baffle plate (6) and links to each other with having by described water back (4) or surge flask, links to each other with storage tank (9) by the pipeline (7) that feeding valve (8) are housed at the opposite side of crucible (5).On evaporation rifle (3), water back (4), high temperature evaporation crucible (5) and pipeline (7) outer wall heater coil (13) is arranged, on storage tank (9) outer wall heater coil (15) is arranged.Process is that the evaporation material (10) in storage tank is put into a certain amount of evaporation material in the high temperature evaporation boat through valve, because the vaporization temperature that the temperature of this boat is higher than the evaporation material more is therefore should evaporation material very fast is evaporated into gas, this high-temperature gas passes high-temperature pipe enter pyritous vacuum-evaporation rifle spout (1) and movably air-flow guiding stopper effect down formation middle a little less than peripheral strong air-flow can obtain uniform thin evaporated film when making it to reach substrate.The storage tank here is to have an openable hole storage tank reinforced and that bleed that one group of heater coil (15) is arranged outward by its bottom of container that metal such as aluminium, stainless steel or glass are made, be used as usefulness when heating is degassed when beginning to find time, its Heating temperature is carried out time variable control by specific temperature regulator.The feed appliance here can have multiple structure, and the state of expecting with evaporation becomes, and can be spiral feeder to Powdered evaporation material, and the track type transveyer is to particulate state evaporation available plug-type feeder of material or rotary feeder.The material of feeder can be stainless steel or glass.The high temperature evaporation boat here is to be made by high temperature materials such as stainless steel, molybdenum, tantalums, its shape can be taper, the structure of flat shape drum type brake for guaranteeing do not have small-particle in the evaporative air, can adopt the maze-type structure that the multilayer baffle plate is housed in the high temperature evaporation boat.The high-temperature vacuum evaporation rifle here is the core of native system.It is to be made by materials such as resistant to elevated temperatures material such as molybdenum, tantalum, stainless steels.Spout all be conical up and down or the such spout of square taper itself just has the function of dispersing, it can be spherical also having its shape of a gas channeling stopper (12) below spout, ellipsoid shape or cone-shaped.It and spout form the space and become the distribution that air-flow that guide channel makes ejection is the inverse of cosine.Its shape also can design and calculate by hydromeehanics.This gas channeling stopper can be regulated to make under the situation of different air strengths by the push-and-pull that is connected in the carriage release lever (11) on the stopper with the distance between the spout and can both obtain uniform film by the outside.And this carriage release lever (11) also is connected to form an airtight space by a corrugated tube (12) and rifle body air-flow can only be sprayed by spout.Evaporation rifle (3) in the system, high-temperature pipe (4), high temperature evaporation boat (5) all carry out precise dose control and heating by heating unit (13) through temperature regulator.The outside of heating unit has heat-insulating protective layer to forward on the substrate for the energy that prevents heating unit, also has a water(-cooling) jacket in its outside, is heated to prevent substrate and evaporation mask.
Embodiment 2:Referring to Fig. 2, this may command evaporative air distributes and the vacuum vaporation system of composition is the simplified construction of embodiment 1, total system is reduced to by high-temperature vacuum evaporation rifle (3) feeding valve (8) and storage tank (9) forms in the present embodiment.The high-temperature vacuum evaporation rifle (3) here combines the function that the high-temperature vacuum among the embodiment 1 evaporates rifle (3), high-temperature pipe (4), high temperature evaporation crucible (5).The vacuum-evaporation rifle here is not only as the evaporation rifle but also as evaporator crucible.It is to be made by materials such as resistant to elevated temperatures material such as molybdenum, tantalum, stainless steels for this high-temperature vacuum evaporation rifle.All tapered up and down such spout of spout itself just has the function of dispersing, and it can be spherical also having its shape of a gas channeling stopper (12) below spout, ellipsoid shape or cone-shaped.It and spout form the space and become the distribution that air-flow that guide channel makes ejection is the inverse of cosine.The bottom of this vacuum-evaporation rifle is that taper or sphere can be made crucible usefulness, and the inside also has multilayer to work as plate (6) to be maze-type structure and to be evaporated on the substrate to prevent particle.Evaporation material (10) then enters into high-temperature vacuum evaporation rifle (3) by feeding valve (8) and is converted into the air-flow that the space of gas between spout (1) and gas channeling stopper (12) form orientation fast and sprayed by spout (1).
Embodiment 3:Referring to Fig. 3, the vacuum vaporation system of distribution of this may command evaporative air and composition is substantially the same manner as Example 1, and not being both in total system of present embodiment and embodiment 1 has mask plate (17) and the substrate (16) that has open-work on high-temperature vacuum evaporation rifle (3).It showed since use the high-temperature vacuum evaporation rifle (3) of embodiment 1 can obtain by high-temperature vacuum evaporation rifle upwards directed be uniform vacuum-evaporation air-flow to substrate, at substrate is that the molecule owing to vaporised gas under the situation in high vacuum is straight-line substantially under the fixed situation, even therefore mask plate is not the mask drop shadow effect that still can be made progress preferably under the situation about closely contacting with substrate.
Embodiment 4:Referring to Fig. 4, this may command evaporative air distribute and the vacuum vaporation system of composition substantially the same manner as Example 1, present embodiment and embodiment 3 are different is that the rotation 180 that is directed downwards of the high-temperature vacuum evaporation rifle is here spent, and evaporative air is evaporated downwards.At this moment substrate (16) has a mask plate (17) that has open-work towards last on the substrate plate.The advantage of this structure is that whole base plate and mask plate can be placed on the smooth supporting plate, makes substrate and mask plate all keep the planeness of height.This point tool concerning large-area thin substrate has an enormous advantage.Also can forward the direction that high-temperature vacuum evaporates rifle to simultaneously the direction of level, substrate at this moment can be vertical direction.
Embodiment 5:Referring to Fig. 1, present embodiment is substantially the same manner as Example 1, special feature is as follows: the having up and down spout (1) cross-sectional shape of the conical surface and can do squarely or rectangle or circle according to the shape of substrate (16) and the distribution of evaporative air flow of described evaporation rifle (3), and the shape of its conical surface is single taper or biconical, be the side's of being taper or rectangular taper or conical or curved surface conical in shape, the shape of the conical surface is symmetric or asymmetric up and down.
Described spout (1) the inboard movably shape of air-flow guiding stopper (2) is spherical or the garden awl or the quadrate cone shape of ellipsoid shape or taper or band curved surface; Movably air-flow guiding stopper (2) links to each other with a phase shift bar (11), this carriage release lever (11) stretches out the external of evaporation rifle (3), corrugated tube (12) one ends are fixedlyed connected with carriage release lever (11), the other end is fixedlyed connected with evaporation rifle (3) housing, and it is whole to make evaporation rifle cavity form a sealing.Can play the distribution of regulating air-flow by the distance that drives the mobile air-flow guiding stopper of carriage release lever (11) (2) and round mouth, size and reach the function of closing.
Described evaporation material (10) is a single-material, or the mixing material of multiple material, and this mixing material is the mechanically mixing material, or by expecting to be dissolved in to join trace impurity in the matrix in the appropriate solvent again mixing up.
Described evaporation material (10) is Powdered, or coccoid, granular, flaky piller.
The crucible bottom of described high temperature evaporation crucible (5) is taper or spherical.
The material of described evaporation rifle (3), water back (4) and high temperature evaporation crucible (5) is a stainless steel, molybdenum, and tantalum is chosen any one kind of them in tungsten and the pyroceramic.
Claims (9)
1. a may command evaporative air distributes and the vacuum vaporation system of composition, comprise evaporation rifle (3), high temperature evaporation crucible (5) and the storage tank (9) of evaporation material (10) is housed, it is characterized in that described evaporation rifle (3) has a spout (1) of the conical surface up and down, and settle a movably air-flow guiding stopper (2) in spout (1) inboard, aiming at described spout (1) the place ahead is substrate (16) to be deposited, this evaporation rifle (3) intersects the described high temperature evaporation crucible (5) of baffle plate (6) and links to each other with having by a water back (4) or surge flask, links to each other with described storage tank (9) by a pipeline (7) that feeding valve (8) are housed at the opposite side of described crucible (5); On described evaporation rifle (3), water back (4), high temperature evaporation crucible (5) and pipeline (7) outer wall heater coil (13) is arranged all, on storage tank (9) outer wall, heater coil (15) is also arranged; By feeding valve (8) and pipeline (7) the evaporation material (10) in the storage tank (9) being rendered to becomes evaporation material (14) moment of evaporating and becomes vaporised gas and be delivered to evaporation rifle (3) in the high temperature evaporation crucible (5), by the size and Orientation of change air-flow guiding stopper (2), be evaporated to substrate (16) and go up formation setting area, uniform, multi-component thin evaporated film with the relative position may command vaporised gas of spout (1).
2. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition, it is characterized in that having up and down spout (1) cross-sectional shape of the conical surface and can doing squarely or rectangle or circle of described evaporation rifle (3) according to the shape of substrate (16) and the distribution of evaporative air flow, and the shape of its conical surface is single taper or biconical, be the side's of being taper or rectangular taper or conical or curved surface conical in shape, the shape of the conical surface is symmetric or asymmetric up and down.
3. may command evaporative air according to claim 1 distributes and the vacuum vaporation system of composition, it is characterized in that described spout (1) inboard movably the shape of air-flow guiding stopper (2) be spherical or bore or the quadrate cone shape in the garden of ellipsoid shape or taper or band curved surface; Movably air-flow guiding stopper (2) links to each other with a phase shift bar (11), this carriage release lever (11) stretches out the external of evaporation rifle (3), corrugated tube (12) one ends are fixedlyed connected with carriage release lever (11), the other end is fixedlyed connected with evaporation rifle (3) housing, and it is whole to make evaporation rifle cavity form a sealing; Can play the distribution of regulating air-flow by the distance that drives the mobile air-flow guiding stopper of carriage release lever (11) (2) and round mouth, size and reach the function of closing.
4. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition, it is characterized in that described evaporation material (10) is a single-material, or the mixing material of multiple material, this mixing material is the mechanically mixing material, or by expecting to be dissolved in to join trace impurity in the matrix in the appropriate solvent again mixing up.
5. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition, it is characterized in that described evaporation material (10) is Powdered, or coccoid, granular, a flaky piller or evaporation material package is enclosed in the narrow meshed metal vessel forms the evaporation bead.
6. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition is characterized in that the crucible bottom of described high temperature evaporation crucible (5) is taper or spherical.
7. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition, the material that it is characterized in that described evaporation rifle (3), water back (4) and high temperature evaporation crucible (5) is a stainless steel, molybdenum, tantalum is chosen any one kind of them in tungsten and the pyroceramic.
8. a may command evaporative air distributes and the vacuum vaporation system of composition, comprise evaporation rifle (3) and the storage tank (9) that (10) are expected in evaporation is housed, it is characterized in that described evaporation rifle (3) has the spout (1) of the conical surface up and down, and at mobile air-flow guiding stopper (2) of the inboard arrangement of spout, aim at the place ahead of described spout (1) and settle substrate (16) to be deposited, this evaporation rifle (3) inner chamber bottom is provided with staggered baffle plate (16), and evaporation rifle (3) connects described storage tank (9) by the pipeline (7) that feeding valve (8) are housed; On evaporation rifle (3) outer wall heater coil (13) is housed, on pipeline (7) and storage tank (9) outer wall heater coil (15) is housed.
9. the vacuum vaporation system of may command evaporative air distribution according to claim 1 and composition is characterized in that there is heat-insulating protective layer described heater coil (13) outside, also has a water(-cooling) jacket in its outside.
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103160788A (en) * | 2011-12-16 | 2013-06-19 | 上海大学 | Vacuum evaporation system |
| CN104596906A (en) * | 2015-01-16 | 2015-05-06 | 上海大学 | Water and oxygen air permeability measuring system with multiple measuring heads |
| WO2015100730A1 (en) * | 2014-01-03 | 2015-07-09 | 北京航空航天大学 | Write-through vacuum evaporation system and a method therefor |
| CN105200373A (en) * | 2015-09-14 | 2015-12-30 | 京东方科技集团股份有限公司 | Filling device and filling method for evaporation system of organic light emitting diode (OLED) |
| CN105349948A (en) * | 2015-12-04 | 2016-02-24 | 贵州大学 | Novel thermal evaporation coating device and using method thereof |
| CN106947941A (en) * | 2017-04-13 | 2017-07-14 | 合肥鑫晟光电科技有限公司 | Deposition system |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050188921A1 (en) * | 2004-02-27 | 2005-09-01 | Anthony Malone | Matrix assisted pulsed-laser evaporation technique for coating a medical device and associated system and medical device |
| JP2006274284A (en) * | 2005-03-28 | 2006-10-12 | Hitachi Zosen Corp | Flow rate control device for evaporation material, and vapor deposition apparatus |
| CN101061249A (en) * | 2004-10-14 | 2007-10-24 | 多摩-技术转让机关株式会社 | Physical deposition system |
| CN101182627A (en) * | 2006-11-16 | 2008-05-21 | 财团法人山形县产业技术振兴机构 | Evaporation source and vacuum evaporator using the same |
-
2010
- 2010-12-29 CN CN2010106110859A patent/CN102011096B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050188921A1 (en) * | 2004-02-27 | 2005-09-01 | Anthony Malone | Matrix assisted pulsed-laser evaporation technique for coating a medical device and associated system and medical device |
| CN101061249A (en) * | 2004-10-14 | 2007-10-24 | 多摩-技术转让机关株式会社 | Physical deposition system |
| JP2006274284A (en) * | 2005-03-28 | 2006-10-12 | Hitachi Zosen Corp | Flow rate control device for evaporation material, and vapor deposition apparatus |
| CN101182627A (en) * | 2006-11-16 | 2008-05-21 | 财团法人山形县产业技术振兴机构 | Evaporation source and vacuum evaporator using the same |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103160788A (en) * | 2011-12-16 | 2013-06-19 | 上海大学 | Vacuum evaporation system |
| CN103160788B (en) * | 2011-12-16 | 2017-06-30 | 上海大学 | Vacuum vaporation system |
| WO2015100730A1 (en) * | 2014-01-03 | 2015-07-09 | 北京航空航天大学 | Write-through vacuum evaporation system and a method therefor |
| CN104596906A (en) * | 2015-01-16 | 2015-05-06 | 上海大学 | Water and oxygen air permeability measuring system with multiple measuring heads |
| US10276835B2 (en) | 2015-09-14 | 2019-04-30 | Boe Technology Group Co., Ltd. | Filling apparatus used in an evaporator system and filling method |
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