CN101965267A - Method for making a lithographic printing plate support - Google Patents

Method for making a lithographic printing plate support Download PDF

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Publication number
CN101965267A
CN101965267A CN2009801074298A CN200980107429A CN101965267A CN 101965267 A CN101965267 A CN 101965267A CN 2009801074298 A CN2009801074298 A CN 2009801074298A CN 200980107429 A CN200980107429 A CN 200980107429A CN 101965267 A CN101965267 A CN 101965267A
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China
Prior art keywords
roughening
acid
coating
electrolyte solution
carrier
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Granted
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CN2009801074298A
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CN101965267B (en
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P·坎佩斯特里尼
D·法斯
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Agfa Gevaert AG
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Agfa Gevaert AG
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment
    • B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • C25F1/02—Pickling; Descaling
    • C25F1/04—Pickling; Descaling in solution
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/04—Etching of light metals

Abstract

A method for making a lithographic printing plate support including the steps of : - providing an aluminum support,- graining said support in a graining electrolyte solution,- treating the grained support in a desmut electrolyte solution containing hydrochloric acid by applying a direct current resulting in a charge density Q,characterized in that the pH of the desmut electrolyte solution is less than 1, and has a Q, which is at least 400C/dm2.

Description

Make the method for lithographic printing-plate carrier
Technical field
The present invention relates to make the method for lithographic printing-plate carrier.
Background of invention
Offset press uses the so-called printing original edition plate that is assemblied on the printing machine machine barrel, for example forme.Master has the lithographic plate image in its surface, and by applying printing ink to described image, then printing ink is transferred to the reception material that is generally paper from master and obtains printed matter.In the what is called of routine " wets " lithographic printing, printing ink and water-based damping solution (being also referred to as fountain solution) are supplied to by oleophylic (or hydrophobic, promptly receive printing ink, repel water) zone and hydrophilic (or oleophobic, promptly receive water, repel printing ink) the regional lithographic plate image of forming.In so-called driography (driographic) printing, the lithographic plate image is received by printing ink and printing ink antitack agent (printing ink repulsions) is regional forms, and during driography prints, only with inking to master.
Printing original edition plate exposes by imaging usually and processes the image forming material that is called as plate precursor and obtains.Except known light sensitivity be suitable for carry out the so-called pre-sensitization version of UV contact exposure via film masks, the thermal sensitivity printing plate precursor also becomes very universal in the later stage nineties.This hot material provides the advantage of sunlight stability, and is used in particular for so-called CTP (computer-to-plate) method, and wherein plate precursor directly exposes, and does not promptly use film masks.Material is exposed to heat or infrared light, and the heat of generation causes (physics-) chemical process, for example ablation, polymerization, because crosslinked polymer and the particle aggregation of insoluble, thermal induction dissolving or thermoplastic polymer latex.
The thermal process that can make a plate under the situation of wet processing is for example based on the ablation of one or more coatings.In the exposure area, the surface of bottom is exposed, and compares with the surface of unexposed coating, and printing ink or fountain solution (fountain) are had different affinitys; Obtain image (printing) and no image or background (not having printing) zone.
Based on the another kind of forme of the thermal process that need not wet treatment step for for example based on the version of conversion-promptly ought be exposed to heat and/or light time, the surface irreversibly is changed to hydrophobic surface or the version that vice versa from hydrophilic surface.These so-called " convertible polymeric systems " based on different working mechanisms, and for example polar group shelters/demask or the destruction/generation of electric charge.
Most of popular heat versions form image by the exposure of coating and the thermal induction dissolubility difference of the alkaline developer between the unexposed area.Coating generally includes the oleophylic base-material, phenolic resins for example, and its dissolution velocity in developer reduces (negative-working) or raise (positive-working) owing to imaging (image-wise) exposure.During the processing, dissolubility difference causes not imaging (not printing) zone of coating to be removed, and appear hydrophilic support thus, and the imaging of coating (printing) zone remains on the carrier.The representative instance of this version is for example being described among the EP-A 625728,823327,825927,864420,894622 and 901902.Preheating step between the negative-working embodiment of this hot material often need be exposed and develop is as what describe among the EP-A 625,728 for example.
Do not need the negative-working plate precursor of preheating step can contain the image recording layer of working, as for example describing among the EP-As 770494,770495,770496 and 770497 by the thermal induction particles coalesce of thermoplastic polymer latex.These patent disclosures make the method for lithographic printing-plate, may further comprise the steps: (1) imaging exposure comprises the hydrophobic thermoplastic polymer particle that is dispersed in the hydrophilic base-material and light can be changed into the image-forming component of the compound of heat, (2), the element of this imaging exposure is developed by applying fountain solution and/or printing ink.
US 4,482, and 434 is open by being to apply electrolyte solution under 0.3 to 15Hz the alternating current effect in frequency, makes the aluminium roughening.
EP 422682 discloses the method for producing the aluminium printing plate support, is included in electrochemical surface-roughening step and the catholyte in water-based neutral electrolyte solution in the acidic aqueous solution, to remove stain (smut).
US 7,087,361 and the catholyte that discloses in the electrolyte solution that contains nitric acid or hydrochloric acid of US 7,078,155 handle, it applies 3C/dm thus carrying out for the first time and between electrolysis roughening for the second time (graining) processing on aluminium sheet 2To 80C/dm 2Electric weight.
US 4,482, and 444 disclose and make the method for forme with the alumina supporter material, may further comprise the steps: make the carrier electrochemical rougheningization, be 3 to 11 and comprise in the aqueous electrolyte of water-soluble salt and carry out cathode treatment in the pH value subsequently; Optional anodic oxidation and the hydrophilic post-processing step of carrying out subsequently.
US 3,935, and 080 discloses the method for the production aluminium base that comprises three steps successively, comprise electrolysis roughening aluminum sheet surface, are exposed to sulphuric acid concentration solution by the sheet material with roughening thereafter, and it is carried out the negative electrode cleaning; At last by being exposed to second sulphuric acid concentration solution and applying direct current, and with the sheet material anodization of negative electrode cleaning.
US 4,786, and 381 disclose the electrochemical modification method of the alumina supporter of roughening in multistep processes.At pH is that 0 to 11 the concentration that contains applied direct current about 5 to 90 seconds for about 3g/l in the electrolyte solution that at least a water-soluble salt and/or the concentration of saturation limit is about acid of 0.5 to 50g/l.
Usually, aluminium base requires them to experience some processing, for example roughening and anodization as lithographic printing-plate with the purposes of carrier.Lithographic support be roughened or roughening improving the cohesive of imaging layer to carrier, and can carry out wearability and water-retaining property or the wetability of anodization with the no image area territory of improving carrier.Alumina supporter comes roughening or roughening by the electrochemical roughening step usually: use carrier as electrode, and for example graphite as to electrode, the surface of electrolytic aluminium carrier in electrolyte solution.By changing type and/or the concentration and the applied voltage of electrolyte solution in the electrochemical roughening step, can obtain dissimilar roughening.Usually apply alternating current, for example sine-wave current, trapezoidal wave electric current or square wave electric current immerse alumina supporter in the acidic electrolyte solution simultaneously.Therefore, carrier alternately experiences positive voltage and negative voltage.When applying positive voltage, cathode reaction takes place on the aluminium surface, accumulates so-called stain layer (Al (OH) there 3Layer); When applying negative voltage, anode reaction takes place, and forms concave point there.Before the anodization step, carry out decontamination mark step usually, the stain layer that forms with cathodic polarization cycle period of removing the roughening step.In order to obtain to have all even consistent surface, there are not striped and so-called spot or muddy carrier, it is also referred to as the surface with good pattern in the art, should remove the stain layer as much as possible.In addition, partially or completely removing the stain layer is absolutely necessary for the base material that acquisition has good surface morphology.The lithographic performance of the forme that the configuration of surface effect of altitude is relevant: in fact, the carrier that has uniform-dimension and equally distributed little concave point on the surface is absolutely necessary for obtaining the high-quality forme, and described high-quality forme shows good coating cohesive and good no image area territory water-retaining property.
Decontamination mark step is generally the chemical process of carrying out in alkalescence or acidic aqueous solution.But this chemical process is consuming time, and in the industrial production of printing plate support, continual requirement is to produce printing plate support in the shorter time.
Summary of the invention
The purpose of this invention is to provide the alternative method of making lithographic printing aluminium printing plate support, described carrier has excellent pattern, and promptly smooth surface, equal even unanimities do not have striped and/or spot or muddiness.
This purpose is realized by the method for claim 1; Promptly make the method for lithographic printing-plate carrier, may further comprise the steps:
-alumina supporter is provided;
-in the roughening electrolyte solution, make described carrier roughening;
-by applying direct current, produce charge density Q, in containing the decontamination mark electrolyte solution of hydrochloric acid, handle the carrier of this roughening;
Be characterised in that pH＜1 of electrolyte aqueous solution, Q is 400C/dm at least 2
Find in pH＜1 surprisingly and contain in the electrolyte aqueous solution of hydrochloric acid, utilize direct current to produce 400C/dm at least 2Charge density, handle the alumina supporter of roughening, highly improved the pattern of carrier, i.e. the outward appearance of carrier surface.The surface is all even smooth, and does not show any spot and/or striped.In addition, with the efficient stain layer that in the roughening step, accumulates of removing of very short reaction time, so not only can significantly shorten the time of alumina supporter production technology, and can obtain the improved carrier of lithographic performance.Preferably, carrier shows uniform roughened textures, does not have bigger hole, makes that the control between exposure period improves, and the heat of forme-and/or the resolution ratio of photosensitive coating improve.More shallow surface roughness can further make the damping solution consumption during printing reduce and the wearability of substrate surface strengthens.In addition, can be brighter according to the carrier that the inventive method obtains, this make exposure and develop after the image of forme and the contrast of not having between the image section improve.
Further feature of the present invention, element, step, characteristic and advantage will become more apparent from the following detailed description of the preferred embodiments of the invention.
The accompanying drawing summary
Fig. 1 and Fig. 2 schematically show the preferred embodiment of the inventive method separately.
Detailed Description Of The Invention
The lithographic printing-plate carrier of the inventive method is an alumina supporter.Carrier can be flaky material, plate for example, and perhaps it can be circle tube element, for example the sleeve that can slide around the printing machine barrel of printing machine.
The surface of alumina supporter is the aluminium of roughening.By making alumina supporter roughening (or roughening), the adhesive force of printing image and not the wetting characteristics of imaging region all improve.Carrier surface uses the roughening electrolyte solution that contains acid, below is called the roughening electrolyte solution and carries out roughening.Preferred roughening electrolyte solution comprises at least a of following chemicals: HNO 3, HCl and/or H 3PO 4HCl, HNO 3And/or H 3PO 4Concentration in the roughening electrolyte solution is preferably 1g/l to 50g/l; 5g/l to 30g/l more preferably; Most preferably be 7g/l to 25g/l.In the height preferred embodiment, the roughening electrolyte solution contains hydrochloric acid.
It is 1g/l to 50g/l that the roughening electrolyte solution can further contain concentration; 5g/l to 30g/l more preferably; Most preferably be the anion of 6g/l to 20g/l, for example sulfate radical, phosphate radical, acetate or nitrate anion.
Roughening can be for example 5V to 50V by working voltage, and the alternating current that is preferably 20V to 40V carried out 5 to 120 seconds.Usually, current density is 10A/dm 2To 250A/dm 2, be preferably 50A/dm 2To 200A/dm 2And most preferably be 60A/dm 2To 150A/dm 2Charge density is preferably 300C/dm 2To 1500C/dm 2, 400C/dm more preferably 2To 1200C/dm 2And most preferably be 500C/dm 2To 1050C/dm 2Electrolyte temperature can be any suitable temperature, but is preferably 20 ℃ to 55 ℃, more preferably 30 ℃ to 45 ℃.
Optional, the roughening electrolyte solution can contain additive, for example benzoic acid derivative and/or sulfonic acid.The concentration of benzoic acid derivative or sulfonic acid is preferably 0.0001mol/l to 0.2mol/l, and more preferably 0.0001mol/l to 0.1mol/l most preferably is 0.001mol/l to 0.05mol/l.
Preferred benzoic acid derivative comprises benzoic acid, for example adjacent-,-benzoic acid of or right-benzoic acid or two of replacing-or three-replace, phthalic acid, M-phthalic acid, terephthalic acid (TPA), salicylic acid, benzoyl oxide, 1-naphthoic acid or 2-naphthoic acid; Or its salt or ester and can be substituted separately.Suitable salt is for example sodium, potassium or ammonium salt.Suitable ester is for example optional alkylbenzoic acid that replaces, and wherein alkyl represents to have linearity, branching or the cyclic alkyl of 10 carbon atoms at the most.
The optional substituting group that exists is selected from halogen on the benzoic acid derivative, and nitro has linearity, branching or the cyclic alkyl of 10 carbon atoms at the most, hydroxyl, amino, sulfonic group, methoxyl group, or its combination.Preferably, benzoic acid derivative is the optional benzoic acid that replaces.
Preferred sulfonic acid comprises benzene sulfonic acid, benzenedisulfonic acid, pyridine-sulfonic acid, naphthalene sulfonic acids, naphthalenedisulfonic acid, alkyl sulfonic acid, alkylidene sulfonic acid and quinoline sulfonic acid; Or its salt or ester; And it can be substituted separately.Suitable salt is for example sodium, potassium or ammonium salt.Suitable ester is for example sulfonic acid, the Arrcostab of the optional replacement of for example optional alkyl benzene sulphonate that replaces or pyridine alkyl sulfonic acid; Wherein alkyl represents to have linearity, branching or the cyclic alkyl of 10 carbon atoms at the most.Sulfonic acid can be single-(adjacent, or to), two-or three-replace.The optional substituting group that exists is selected from halogen on the sulfonic acid, amino, nitro, hydroxyl, methoxyl group, the carboxylic acid group, optional replace have linearity, branching or the cyclic alkyl of 10 carbon atoms at the most or its combination.Preferably, sulfonic acid is the optional benzene sulfonic acid that replaces.
After the roughening step, remove the stain layer that accumulates during the described roughening step to the full extent by means of decontamination mark step.In preferred embodiments, during decontamination mark step, remove the stain layer fully.Decontamination mark step below is called in the decontamination mark electrolyte solution and carries out at the acid decontamination mark aqueous solution.The decontamination mark step of decontamination mark comprises the cathodic polarization step.Decontamination mark electrolyte solution comprises that concentration is 1g/l to 50g/l; 5g/l to 30g/l more preferably; Most preferably be the HCl of 7g/l to 25g/l.PH＜1 of decontamination mark electrolyte solution, more preferably pH＞0 and＜1, most preferably pH＞0 and＜0.5.In addition, pH is preferably 0.1 to 0.9 and more preferably 0.1 to 0.6.It is 1g/l to 50g/l that decontamination mark electrolyte solution can further contain concentration; 5g/l to 30g/l more preferably; Most preferably be the anion of 6g/l to 20g/l, for example sulfate radical, phosphate radical, acetate or nitrate anion.Electrolyte temperature can be any suitable temperature, but is preferably 20 ℃ to 55 ℃, more preferably 30 ℃ to 45 ℃.
Optional, decontamination mark electrolyte solution can contain additive, for example benzoic acid derivative and/or sulfonic acid.The concentration of benzoic acid derivative or sulfonic acid is preferably 0.0001mol/l to 0.2mol/l, and more preferably 0.0001mol/l to 0.1mol/l most preferably is 0.001mol/l to 0.05mol/l.Preferred benzoic acid derivative and preferred sulfonic acid are described in above-mentioned paragraph [0024] to [0027].
Decontamination mark step working voltage is for example 5V to 50V, and the direct current that is preferably 20V to 40V carries out.Charge density is 400C/dm at least 2Be preferably 450C/dm at least 2With most preferably be 500C/dm at least 2Perhaps, charge density is preferably 400C/dm 2To 1000C/dm 2, 450C/dm more preferably 2To 750C/dm 2And most preferably be 500C/dm 2To 600C/dm 2Current density is 50A/dm 2To 350A/dm 2, be preferably 60A/dm 2To 300A/dm 2And most preferably be 80A/dm 2To 250A/dm 2
The decontamination mark reaction time is preferably 0.1s to 10s, more preferably 0.2s to 8s and most preferably be 0.2s to 5s.In preferred embodiments, decontamination mark step is carried out in being less than 5s.
In the height preferred embodiment, the roughening electrolyte solution that uses in the roughening step has and the identical composition of decontamination mark electrolyte solution that is used for decontamination mark step.
After in preferred one or more roughening jars that are full of the roughening electrolyte solution, carrying out the roughening step, preferably in the one or more process tanks that contain decontamination mark electrolyte solution, carry out the decontamination mark and handle.The composition of roughening electrolyte solution can be identical with the composition of decontamination mark electrolyte solution.In particularly preferred embodiments, roughening step is carried out in identical one or more process tanks with decontamination mark step.The representative instance of these embodiments is schematically illustrated in Fig. 1 and 2 respectively.
Among Fig. 1, alumina supporter (1) is transferred through containing the roughening jar (2) of roughening electrolyte solution.Roughening jar (2) has AC power supplies (3), and this power supply provides alternating current to roughening electrode (4).Subsequently, alumina supporter is transferred through containing the process tank (5) of decontamination mark electrolyte solution.Process tank (5) has one or more DC power supplys (6), and this power supply provides direct current to decontamination mark negative electrode (7).
Among Fig. 2, alumina supporter (8) is transferred through containing the process tank (9) of decontamination mark electrolyte solution.Process tank (9) has two zones (A) and (B).Zone (A) has one or more AC power supplies (10), and this power supply provides alternating current to the roughening electrode (11) that carries out the roughening step.Area B has one or more DC power supplys (12), and this power supply provides direct current to the decontamination mark negative electrode (13) that carries out decontamination mark step.
Find surprisingly by after the roughening step with in identical electrolyte solution, applying the DC electric current immediately, can cancel decontamination mark step as physical separation step to carrier.
Aluminium further preferably carries out anodization by the anodization technology of using sulfuric acid and/or sulfuric acid/phosphate mixture, forms alumina layer (Al thus 2O 3).By making the alumina supporter anodization, its wearability and hydrophily improve.Al 2O 3The micro-structural of layer and thickness are by the decision of anodization step, the anode weight (Al that forms on the aluminium surface 2O 3G/m 2) be 1-8g/m 2Anodization process is known in the art, and for example at GB 2,088, and is open in 901.
Aluminium base of the present invention can carry out post processing, with the further hydrophily of improving the surface.For example, alumina surface can be by for example handling the silicic acid salinization with sodium silicate solution under 95 ℃ the high temperature.Perhaps, can apply phosphate treated, comprise with the phosphate solution that can further contain inorganic fluoride and handle alumina surface.In addition, alumina surface can be used for example carboxylic acid, hydroxycarboxylic acid (hydrocarboxylic acid), sulfonic acid or phosphonic acids, or its salt, for example organic acid of succinate, phosphate, phosphonate, sulfate and sulfonate and/or its salt rinsing.Citric acid or citrate solution are preferred.This processing can at room temperature be carried out or can carry out under about 30 ℃ to 50 ℃ high temperature slightly.Another noticeable processing comprises with bicarbonate solution rinsing alumina surface.Further, alumina surface can be handled with the sulfuric ester of polyvinyl phosphonic acids, polyvinyl methylphosphonic acid, polyethylene alcohol phosphate, polyvinylsulfonic acid, polyvinylbenzenesulfonic acid, polyvinyl alcohol with by the acetal of the polyvinyl alcohol that forms with the sulfonated aliphatic aldehyde reaction.It is evident that in addition and can carry out the one or more of these post processings separately or with combining form.Being described in more detail in GB 1084070, DE4423140, DE 4417907, EP 659909, EP 537633, DE 4001466, EP A292801, EP A 291760 and US 4458005 of these processing provides.
According to the present invention, the method for making lithographic printing plate precursor also is provided, may further comprise the steps: the carrier as above detailed argumentation is provided, on described carrier, applies and to comprise at least a heat-or the coating solution of photosensitive imaging layer, and the precursor that obtains of subsequent drying.
This precursor can be for negativity or positive-working, promptly can form the printing ink receiving area in exposure or unexposed area respectively.The suitable example of temperature-sensitive and photosensitive coating below at length is discussed.
The temperature-sensitive printing plate precursor
The imaging mechanism of hot stamping plate precursor can be by directly being exposed to heat, for example by means of hot head, or by in the coating can be with light, more preferably the infrared light light absorption that transforms into one or more compounds of heat causes.
First kind of suitable example of hot stamping plate precursor is that for example EP 770494 based on the coalescent precursor of the thermal induction that preferably is dispersed in the hydrophobic thermoplastic polymer particle in the hydrophilic base-material; EP 770495; EP 770497; EP 773112; EP 774364; EP 849090; EP 1614538; EP 1614539; EP 1614540; WO 2006/133741; WO2007/045515; EP 1777067; Describe among EP 1767349 and the WO 2006/037716.
In second kind of suitable embodiment, the hot stamping plate precursor comprises the coating that comprises ester homopolymerization of aryl diazosulfonic acid or copolymer, described homopolymerization or copolymer are hydrophilic and dissolved in working fluid and more soluble after exposure before being exposed to the processing of heat or UV light and hydrophobization.
The preferred embodiment of this aryl diazosulfonic acid ester polymer is to pass through aryl diazosulfonic acid ester monomer and other aryl diazosulfonic acid ester monomer and/or and vinyl monomer, for example homopolymerization of (methyl) acrylic acid or its ester, (methyl) acrylamide, acrylonitrile, vinyl acetate, vinyl chloride, vinylidene chloride, styrene, AMS etc. or the compound of copolymerization.Suitable aryl diazosulfonic acid ester monomer is open in EP-A 339393, EP-A 507008 and EP-A 771645, and suitable aryl diazosulfonic acid ester polymer is open in EP 507,008, EP 960,729, EP 960,730 and EP 1,267,211.
Another kind of suitable hot stamping plate precursor is a positive-working, and depends on the thermal induction dissolving of oleophilic resin.Oleophilic resin is preferably and dissolves in the water-based developer, and more preferably pH is the polymer of the water-based alkaline-based developer of 7.5-14.Preferred polymer is a phenolic resins, for example the polymer of novolaks, resol, polyvinylphenol and carboxyl substituted.The representative instance of these polymer is described in DE-A-4007428, DE-A-4027301 and DE-A-4445820.With respect to the gross weight of all components that exists in the ground floor, the amount of the phenolic resins that exists in the ground floor is preferably 50wt% at least, preferably 80wt% at least.
In preferred embodiments, oleophilic resin is preferably phenyl wherein or the hydroxyl phenolic resins with the organic substituent chemical modification.Can show the printing chemicals with the phenolic resins of organic substituent chemical modification, for example fountain solution or printing machine chemicals, for example chemical resistance of the improvement of version cleaning agent.The example of the phenolic resins of this chemical modification is described in EP-A 0934822, EP-A1072432, US 5641608, EP-A 0982123, WO 99/01795, EP-A 02102446, EP-A 02102444, EP-A 02102445, EP-A 02102443, EP-A 03102522.The modified resins of describing among the EP-A 02102446 is preferred, those resins of replacing with group of the phenyl of wherein said phenolic resins particularly with structure-N=N-Q, wherein-the N=N-group covalently bound to the carbon atom of phenyl and wherein Q be aromatic group.
In latter's embodiment, coating can comprise the second layer, and this second layer comprises polymer or the copolymer (promptly (being total to) polymer) that comprises at least one monomeric unit, and described monomeric unit comprises at least one sulfuryl amine group.This one deck is arranged between the above-mentioned layer and hydrophilic support that comprises oleophilic resin.Below, ' (being total to) polymer that comprises the monomeric unit that at least one comprises at least one sulfuryl amine group ' is also referred to as " sulfonamide (being total to) polymer ".Sulfonamide (being total to) polymer is preferably alkali-soluble.Sulfuryl amine group is preferably by-NR-SO 2-,-SO 2-NR-or-SO 2-NRR ' expression, wherein R and R ' represent hydrogen or organic substituent independently of one another.
Sulfonamide (being total to) polymer is preferably by monomeric unit homopolymerization that contains at least one sulfuryl amine group or the high-molecular weight compounds by this monomeric unit and other polymerisable monomer unit copolymerization.
The example that contains the monomeric unit of at least one sulfuryl amine group comprises and also contains at least one for example monomeric unit of the polymerizable unsaturated bond of acryloyl group, pi-allyl or vinyl oxygen base.The example that is fit to is at US 5,141, and 838, open among EP 1545878, EP 909,657, EP 0894622 and the EP 1,120,246.
Comprise EP 1,262 with the example of the monomeric unit of the monomeric unit combined polymerization that contains at least one sulfuryl amine group, 318, disclosed monomeric unit among EP 1,275,498, EP 909,657, EP 1,120,246, EP 0894622 and the EP 1,400,351.
The suitable example of sulfonamide (being total to) polymer and/or its preparation method is open in EP-A 933682, EP-A 982123, EP-A 1072432, WO 99/63407 and EP 1,400,351.The highly preferred example of sulfonamide (being total to) polymer (general formula (IV)) is open in EP 1604818.
The layer that comprises sulfonamide (being total to) polymer may further include other hydrophobic base-material, for example the phenolic resins of phenolic resins (for example novolaks, resol or polyvinylphenol), chemical modification or contain the polymer of carboxyl, nitrile group or maleimide base group.
The dissolubility of the coating of latter's embodiment in developer can be regulated the component fine setting by optional dissolubility.More specifically, can use development accelerant and development restrainer.Coating comprises in the embodiment more than a layer therein, and these compositions can join ground floor, the second layer and/or other optional layer of coating.
Development accelerant has been the compound of dissolution accelerator effect, because they can improve the rate of dissolution of coating.For example, in order to improve the water-based development, can use cyclic acid anhydride, phenol or organic acid.The example of cyclic acid anhydride comprises phthalic anhydride, tetrabydrophthalic anhydride, hexahydrophthalic anhydride, 3,6-bridging oxygen-4-tetrahydrochysene-phthalic anhydride, tetrachlorophthalic tetrachlorophthalic anhydrid, maleic anhydride, chloromaleic acid acid anhydride, α-phenyl maleic anhydride, succinyl oxide and PMA, as US 4, describe in 115,128.The example of phenol comprise bisphenol-A, right-nitrophenol, right-thanatol, 2,4,4 '-trihydroxybenzophenone, 2,3,4-trihydroxy-benzophenone, 4-dihydroxy benaophenonel, 4,4 ', 4 " trihydroxy-triphenyl methane and 4; 4 '; 3 ", 4 " and tetrahydroxy-3,5; 3 ', 5 '-tetramethyl triphenyl-methane etc.The organic acid example comprises sulfonic acid, sulfinic acid, alkylsurfuric acid, phosphonic acids, phosphoric acid and carboxylic acid, and JP-A 60-88 for example describes in 942 and 2-96,755.These organic acid instantiations comprise right-toluenesulfonic acid, DBSA, right-toluenesulfinic acid, ethyl sulfuric acid, phenyl-phosphonic acid, phenyl phosphinic acid, phenyl phosphate, diphenyl phosphate, benzoic acid, M-phthalic acid, adipic acid, right-toluic acid, 3,4-dimethoxybenzoic acid, 3,4,5-trimethoxybenzoic acid, 3,4,5-trimethoxy cinnamic acid, phthalic acid, terephthalic acid (TPA), 4-cyclohexene-1,2-dioctyl phthalate, erucic acid, laurate, n-undecane acid and ascorbic acid.With respect to whole coating, the cyclic acid anhydride that comprises in the coating, phenol or organic acid amount are preferably 0.05 to 20wt%.The polymer development accelerant, for example comprise at least between 70mol%-cresols also is suitable development accelerant as the phenolic resins of repeated monomer unit.
In preferred embodiments, coating also contains developer opposing agent, is also referred to as development restrainer, one or more compositions of unexposed area dissolving during promptly can postponing to process.The dissolving inhibitory action preferably by adding thermoreversion, make that the dissolving of exposure area is not significantly postponed, can obtain thus to expose and unexposed area between big dissolving difference.For example the compound of describing among EP-A 823327 and the WO97/39894 it is believed that the effect of dissolution inhibitor, and reason is for example formation by hydrogen bridge, with the interaction of one or more alkali soluble resins in the coating.This type of inhibitor generally includes at least one hydrogen bridge and forms group, for example nitrogen-atoms,
Figure BPA00001213316500101
(CO-), sulfinyl (SO-) or sulfonyl (SO for base, carbonyl 2-) and big hydrophobic part, for example one or more aromatic rings.Some of following compound, for example IR dyes is for example spent cyanines and is seted off by contrast dyestuff (contrast dye), and for example quaternized triarylmethane dye also can play dissolution inhibitor.
Other suitable inhibitor improves the developer resistance, infiltrates coating because they postpone aqueous alkaline developer.This compound may reside in the ground floor, if and/or have a second layer, be present in the second layer, as describing among the EP-A 950518, and/or be present in the development barrier on the described layer, as describing among EP-A 864420, EP-A 950517, WO 99/21725 and the WO 01/45958.In latter's embodiment, by being exposed to heat or infrared light, the barrier layer in developer dissolubility or the barrier layer since the permeability of developer can be improved.
The preferred embodiment that postpones the inhibitor of aqueous alkaline developer infiltration coating comprises following:
(a) be insoluble in developer or can not be by the polymeric material of developer infiltration, for example hydrophobic or water-resistance polymer or copolymer, for example acrylic acid series polymeric compounds, polystyrene, styrene-propene acid based copolymer, polyester, polyamide, polyureas, polyurethane, NC Nitroncellulose and epoxy resin; Or comprise the polymer of siloxanes (silicone) and/or perfluoroalkyl unit.
(b) difunctional compound for example comprises polar group and for example surfactant of the hydrophobic grouping of long chain hydrocarbon groups, many or oligosiloxane and/or perfluorinate alkyl.Representative instance is Megafac F-177, and a kind of perfluorinate surfactant is available from Dainippon Ink﹠amp; Chemicals, Inc..The appropriate amount of this compound is 10-100mg/m 2, 50-90mg/m more preferably 2
(c) for example comprise the polar block of many or oligomeric (alkylidene oxygen) and for example long chain hydrocarbon groups, how or the difunctionality block copolymer of the hydrophobic block of oligosiloxane and/or perfluorinate alkyl.The appropriate amount of this compound is 0.5-25mg/m 2, be preferably 0.5-15mg/m 2With most preferably be 0.5-10mg/m 2A kind of suitable copolymers comprises about 15 to 25 siloxane units and 50 to 70 alkylideneoxygen groups.Preferred examples comprises the copolymer that comprises phenyl methyl siloxanes and/or dimethyl siloxane and oxirane and/or expoxy propane, for example Tego Glide 410, Tego Wet 265, Tego Protect 5001 or Silikophen P50/X, all available from TegoChemie, Essen, Germany.Described many or oligosiloxane can be linear, ring-type or crosslinking polymer or copolymer.The term polysiloxane compound should comprise any compound that contains more than a siloxane group-Si (R, R ')-O-, and wherein R and R ' are the optional alkyl or aryl that replaces.Preferred siloxanes is phenylalkyl siloxanes and dialkylsiloxane.The number of siloxane group is at least 2 in polymer or the oligomer, is preferably at least 10, more preferably at least 20.It can be lower than 100, preferably is lower than 60.
It is believed that between coating and dry period, the above-mentioned type (b) and inhibitor (c) tend to because its bifunctional structure, and the interface of self poisoning between coating and air and form to isolate the upper strata thus, even when being used as first and/or during the composition of the coating solution of the optional second layer.Simultaneously, surfactant also works to improve the spreading agent of coating quality.As if so the barrier layer that above-mentioned delay developer infiltrates coating can be played in the isolation upper strata that forms.
Perhaps, (a) inhibitor to (c) type can apply in independent solution, is coated on first, optional second and/or other layer of coating.In this embodiment, maybe advantageously use a kind of solvent in independent solution, it can not dissolve the composition that exists in other layer, makes highly enriched anti-water or the hydrophobic phase that obtains to play above-mentioned development barrier effect at the coating top.
In addition, first or the optional second layer and/or other layer can comprise further stroke (run length) and/or the chemical-resistant polymer that improves version.The example is to comprise that (CO-NR-CO-) polymer of side group, wherein R is hydrogen, the optional alkyl that replaces or the optional aryl that replaces, for example polymer of describing among EP-A 894622, EP-A 901902, EP-A 933682 and the WO99/63407 to imide.
The coating of above-mentioned temperature-sensitive printing plate precursor preferably also contains infrared Absorption dyestuff or pigment, coating comprises in the embodiment more than a layer therein, and described infrared Absorption dyestuff or pigment may reside in ground floor and/or the second layer and/or optional other layer.Preferred IR absorbing dye is cyanine dye, portion's cyanine dye, indoaniline dyes, oxonol dye, oxa-benzene
Figure BPA00001213316500121
(pyrilium) dyestuff and square
Figure BPA00001213316500122
(squarilium) dyestuff.The case description of suitable IR dyestuff is at for example EP-A 823327, EP-A 978376, EP-A 1029667, EP-A 1053868, EP-A 1093934; Among WO 97/39894 and the WO 00/29214.Preferred compound is following cyanine dye:
Figure BPA00001213316500123
Figure BPA00001213316500131
The concentration of IR dyestuff is preferably 0.25-15.0wt% in the coating, and more preferably 0.5-10.0wt% most preferably is 1.0-7.5wt%, with respect to whole coating.
Coating may further include one or more colouring agents, for example provide visible color and be retained in the coating at unexposed area place for coating so that exposure and handle after obtain the dyestuff or the pigment of visual picture.This dyestuff often is called as and sets off by contrast dyestuff or indicating dye.Preferably, this dyestuff has blueness and have absorption maximum in the wave-length coverage of 600nm-750nm.Although this dyestuff absorbs visible light, it does not preferably make printing plate precursor sensitization, and promptly when being exposed to visible light, coating can not become and dissolve in developer more.This representative instance that sets off by contrast dyestuff is three of amino-replacement-or triarylmethane colouring matters, for example crystal violet, crystal violet, Victoria's ethereal blue, flexoblau 630, basonylblau 640, Chinese scholartree Huang and peacock green.At EP-A400, the dyestuff of thoroughly discussing in 706 also is the suitable dyestuff that sets off by contrast.One or more set off by contrast dyestuff and may reside in the ground floor, and/or in optional second and/or other layer.
The temperature-sensitive plate precursor can directly utilize heat, for example by means of hot head, or indirectly by infrared light, preferred near infrared light imaging exposure.The preferred IR light-absorbing compound from what has been discussed above of infrared light changes into heat.The thermosensitive offset precursor is preferably insensitive to visible light, promptly is exposed to visible light and can produce appreciable impact to the rate of dissolution of coating in developer.Most preferably, this coating is insensitive to environment daylight.
Printing plate precursor can be exposed to infrared light by means of for example LED or laser instrument.Most preferably, the only wavelength that exposure is used is for about 750 to about 1500nm, more preferably the near infrared light launched of the laser instrument of 750 to 1100nm for example semiconductor laser diode, Nd:YAG or Nd:YLF laser instrument.Required laser power depend on plate precursor speed, (the modern version group is at the 1/e of maximum intensity by pixel time of staying of the laser beam of spot diameter decision 2Under representative value: 5-25 μ m), the sweep speed of exposure device and resolution ratio (is the number of the addressable pixel of per unit air line distance, represents through dots per inch commonly used or dpi; Representative value: 1000-4000dpi).
Usually use laser instrument-exposure device of two types: interior drum (ITD) and external drum (XTD) platemaking machine.The ITD platemaking machine of heat version is characterised in that up to the high sweep speed of 500m/sec usually and may needs several watts laser power.The XTD platemaking machine of heat version has the typical laser power of about 200mW to about 1W, with for example 0.1 to 10m/sec low sweep speed work.The XTD platemaking machine that emission wavelength is housed is one or more laser diodes of 750-850nm is the particularly preferred embodiment of the inventive method.
Known platemaking machine can provide the printing machine benefit that reduce downtime as the outer exposure device of printing machine.XTD platemaking machine structure also can be used for exposure in the printing machine, is provided at instant benefit to version in the multicolour press.More ins and outs of exposure device are described in for example US 5,174,205 and US 5,163,368 in the printing machine.
After the exposure, precursor can be by means of suitable working fluid, and for example alkaline aqueous solution develops, and removes the not imaging region of coating thus; Development step can combine with the mechanical lapping of for example using the revolution brush.During the development, any water soluble protective layer of existence also is removed.The temperature-sensitive printing plate precursor coalescent based on latex also can use the light water or the aqueous solution, for example is coated with sol solution (gumming solution) and develops.Being coated with sol solution is generally and comprises that the opposing of one or more the lithographic plate images that can protect forme is polluted or the surface protection compound that damages liquid, aqueous.The suitable example of this compound is film-forming hydrophilic polymer or surfactant.Be coated with sol solution and preferably have 4 to 10, more preferably 5 to 8 pH.Preferably be coated with sol solution at EP 1,342, describe in 568.In addition, this printing plate precursor can directly be assembled to after exposure on the printing machine and by supplying with printing ink and/or fountain solution to this precursor and develop in printing machine.
About the more details of development step can for example find among EP 1614538, EP 1614539, EP 1614540 and the WO/2004071767.
Photosensitive printing plate precursor
Except that above-mentioned hot material, also can use photoactive coating in the methods of the invention.The representative instance of this version is " PS " version of UV sensitivity and the so-called photopolymer version that contains the photopolymerisable compositions of sclerosis when exposure.
In particular embodiment of the present invention, use " PS " version of conventional UV sensitivity.This edition suitable example of sensitization is at EP1 in 300-450nm (near UV and blue light) scope, and 029, discuss among the 668A2.Positivity and negative-working composition are generally used for " PS " version.
The positive-working imaging layer preferably includes neighbour-naphthoquinone two azide (NQD) and alkali soluble resins.Particularly preferably be the neighbour-naphthoquinones-diazido sulphonic acid ester of various hydroxy compounds or the neighbour-naphthoquinones-diazido sulfonic acid amides or the neighbour-naphthoquinones-diazido carboxylic acid amide of neighbour-naphthoquinones diazido carboxylate and various aromatic amine compounds.Can use two kinds of variants of NQD system: single-component system and bicomponent system.This photosensitive forme is open in the prior art widely, described prior art is US 3,635,709, J.P.KOKAI No.55-76346, J.P.KOKAINo.Sho 50-117503, J.P.KOKAI No.Sho 50-113305, US 3 for example, 859,099; US3,759,711; GB-A 739654, US 4,266,001 and J.P.KOKAI No.55-57841.
The negative-working layer of " PS " version preferably includes diazol, diazotising resin or ester homopolymerization of aryl diazosulfonic acid or copolymer.The suitable example of low-molecular-weight diazol comprises: benzidine chlorination bisazo (tetrazoniumchloride), 3,3 '-dimethylbenzidine chlorination bisazo, 3,3 '-dimethoxy benzidine chlorination bisazo, 4,4 '-diamino-diphenyl amine chlorination bisazo, 3,3 '-the oligomeric condensation product of diethyl biphenyl amine sulfuric acid bisazo, 4-amino-diphenyl-amine sulfuric acid diazonium, 4-amino-diphenyl-amine diazonium chloride, 4-piperidyl aniline sulfuric acid diazonium, 4-lignocaine aniline sulfuric acid diazonium and diazonium diphenylamines and formaldehyde.The example of diazo resin comprises the condensation product as the aryl diazonium salt of light-sensitive material.This condensation product is for example described in DE-P-1214086.Photosensitive or heat-sensitive layer preferably also comprises base-material, for example polyvinyl alcohol.
When exposure, diazo resin or diazol are by the water-soluble water-insoluble (because destruction of diazonium groups) that is converted into, and in addition the photolytic product of diazonium can improve the crosslinked level of polymer base material or diazo resin, thus selectively with the coating in the imaging pattern from the water-soluble water-insoluble that is converted into.Unexposed area keeps no change, and is promptly water-soluble.
This printing plate precursor can use above-mentioned alkaline aqueous solution to develop.
In second suitable embodiment, photosensitive forme is based on photopolymerization reaction and contain the coating that comprises Photocurable composition, and described Photocurable composition comprises that radical initiator is (as US 5,955,238; US 6,037, and 098; US 5,629, and 354; US 6,232, and 038; US6,218,076; US 5,955, and 238; US 6,037, and 098; US 6,010, and 824; US5,629,354; DE 1,470, and 154; EP 024,629; EP 107,792; US 4,410, and 621; EP215,453; DE 3,211,312 and EP A 1,091,247 in disclosed), polymerizable compound (as EP1,161,4541, EP 1,349,006, WO 2005/109103, EP 1,788,448; EP1,788,435; EP 1,788, and 443; EP 1,788, and is disclosed in 434) and polymer base material (as US2004/0260050; US 2005/0003285; US 2005/0123853; EP 1,369, and 232; EP 1,369, and 231; EP 1,341, and 040; US 2003/0124460, and EP 1241002, EP1, and 288,720, US 6,027,857, and US 6,171, and 735; US 6,420, and 089; EP 152,819; EP 1,043, and 627; US 6,899, and 994; US 2004/0260050; US 2005/0003285; US2005/0170286; US 2005/0123853; US 2004/0260050; US2005/0003285; US 2004/0260050; US 2005/0003285; Disclosed among US 2005/0123853 and the US 2005/0123853).Can choose wantonly and add other composition, for example sensitizer, coinitiator, cohesive promote compound, colouring agent, surfactant and/or printout reagent.These formes can use for example Ar laser instrument (488nm) or FD-YAG laser instrument (532nm), semiconductor laser InGaN (350 to 450nm), infrared laser diode (830nm) or Nd-YAG laser instrument (1060nm), adopt blue, green or ruddiness (being that wave-length coverage is 450-750nm), purple light (being that wave-length coverage is 350-450nm) or infrared light (being that wave-length coverage is 750-1500nm) sensitization.
Usually, the photopolymer version is handled in the alkaline developer of pH＞10 (referring to more than) and gluing subsequently.Perhaps, also can be coated with sol solution, remove unexposed area thus, the photopolymer version of exposure is developed by applying to coating.The suitable sol solution that is coated with is described in WO/2005/111727.After the step of exposure, the imaging precursor also can directly be assembled on the printing machine and by apply printing ink and/or fountain solution is processed in printing machine.The method for preparing this version is disclosed in WO93/05446, US 6,027,857, US 6,171,735, US 6,420, and 089, US6,071,675, US 6,245,481, US 6,387, and 595, US 6,482,571, US6,576,401, US 6,548, and 222, among WO 03/087939, US 2003/16577 and the US2004/13968.
For protecting the coating surface of heat and/or photosensitive printing plate precursor, particularly avoid mechanical failure, also can choose wantonly and apply protective layer.Protective layer generally includes at least a water soluble binders; the for example polyvinyl acetate of polyvinyl alcohol, polyvinylpyrrolidone, partial hydrolysis, gelatin, carbohydrate or hydroxyethylcellulose; and can be in any known mode by for example aqueous solution or dispersion production; if desired; described solution or dispersion can contain on a small quantity; promptly be lower than the organic solvent of 5wt%, based on the gross weight of the coating solvent of protective layer.The thickness of protective layer can suitably be any amount, advantageously is 5.0 μ m at the most to be preferably 0.1 to 3.0 μ m, is preferably 0.15 to 1.0 μ m especially.
Optional, coating can further contain other composition, for example surfactant, particularly perfluorinated surface-active agent, silicon or Titanium Di Oxide particle or polymer beads, for example delustering agent and interleaving agent.
Any coating process can be used for two or more coating solutions are applied to the water-wetted surface of carrier.Laminated coating can apply by each layer of continuous coating/drying or by once being coated with some coating solutions simultaneously.In the drying steps, from the coating removal volatile solvent, drying when coating self-supporting and touch.But in drying steps, remove whole solvents and inessential (and or even impossible).In fact, residual solvent content can be considered to other composition variable, and composition can be optimized whereby.Dry usually by typically at least 70 ℃, suitably be 80-150 ℃ and particularly under 90-140 ℃ the temperature, blow warm air is carried out on coating.Also can use infrared lamp.Usually can be 15-600 second drying time.
Between coating and the drying, or after the drying steps, heat treatment and cooling subsequently can provide other benefit, as describing among WO99/21715, EP-A 1074386, EP-A 1074889, WO00/29214 and WO/04030923, WO/04030924, the WO/04030925.
So the forme that obtains can be used for conventional so-called wet method hectographic printing, and wherein printing ink and water-based fountain solution are fed on the version.So-called single fluid printing ink is used in another kind of suitable printing process, rather than fountain solution.Suitable single fluid printing ink is in US 4,045,232; US4,981,517 and US 6,140,392 in describe.In most preferred embodiment, single fluid printing ink comprises the printing ink phase, is also referred to as hydrophobic or the oleophylic phase, and the polyalcohol phase, as describing among the WO 00/32705.
Embodiment
Embodiment 1
1. the preparation of aluminium base AS-01 to AS-34 and sign
By 0.30mm thick aluminum foil (1050 aluminium quality) is immersed in the aqueous solution that contains 34g/lNaOH 5 seconds (not mobile paillon foil or agitating solution) down at 75 ℃, at room temperature used the demineralized water rinsing 5 seconds (continuous mobile paillon foil simultaneously), with this aluminium foil degreasing.Under 37 ℃, containing 12g/l HCl and 12g/l SO then 4 2-The aqueous solution in, use density to be 126A/dm 2Alternating current, produce 1000C/dm 2Total charge density, during 8 seconds, this paillon foil is carried out electrochemical roughening.The electrolytical pH of roughening is 0.55.Before the roughening, in the roughening electrolyte with the pre-etching of aluminium base 3 seconds.
2. decontamination mark step
After the roughening step, make aluminium base experience decontamination mark step, be included in cathodic polarization in the above-mentioned roughening electrolyte.The condition of cathodic polarization is described in table 1.Subsequently, at room temperature use this paillon foil of demineralized water rinsing 5 seconds, simultaneously continuous mobile aluminium base and dry.
3. stain evaluation
Aluminium base immersed respectively under 80 ℃ contain 145g/l H 2SO 4The aqueous solution in, continue 0 second, 3 seconds and 6 seconds respectively.Subsequently, this aluminium base of rinsing 5 seconds in demineralized water at room temperature, move continuously simultaneously their and dry.
Subsequently, use GretagMacBeth SpectroEye spectrophotometer (available from GretagMacBeth) to measure the L value of the aluminium base that obtains.Have linear relationship between the residual stain on the L value of the aluminium base of roughening and decontamination mark and this base material, condition is that the roughness value of base material is similar.
For each aluminium base, determine dip time by linear interpolation method, the L value becomes identical with L value with reference to aluminium base under this dip time.
With reference to aluminium base is roughening under the condition identical with base material AS-01 to AS-34 (as mentioned above), and contains 145g/l H by immersing down at 80 ℃ subsequently 2SO 4The aqueous solution in 6 seconds and the base material of decontamination mark.
Table 1: cathodic polarization condition and stain result
Figure BPA00001213316500181
Figure BPA00001213316500191
(1) under 80 ℃ at 145g/l H 2SO 4In dip time, obtain with reference to L value identical on the aluminium base.
Result from table 1 is clearly visible, needs charge density to be higher than 200C/dm during cathodic polarization 2, with from the surface removal stain.
Embodiment 2
1. the preparation of aluminium base AS-35 to AS-63 and sign
By 0.30mm thick aluminum foil (1050 aluminium quality) is immersed in the aqueous solution that contains 34g/lNaOH 5 seconds (not mobile paillon foil or agitating solution) down at 75 ℃, at room temperature used the demineralized water rinsing 5 seconds (continuous mobile paillon foil simultaneously), with this aluminium foil degreasing.Then under 37 ℃, at " the g/l SO that contains y ' g/lHCl and y 4 2-The aqueous solution in, use density to be x A/dm 2Alternating current, produce zC/dm 2Total charge density, this paillon foil is carried out electrochemical roughening as shown in table 2.The pH that is used for the roughening electrolyte solution of AS-35 to AS-49 is 0.55, and the pH that is used for the roughening electrolyte solution of AS-50 to AS-63 is 0.25.Before the roughening, in the roughening electrolyte with the pre-etching of paillon foil 3 seconds.
After the roughening step, make paillon foil experience decontamination mark step, be included in cathodic polarization in above-mentioned roughening electrolyte under the condition that table 2 describes.Subsequently, at room temperature use this paillon foil of demineralized water rinsing 5 seconds, simultaneously continuous mobile paillon foil and dry.
For the gained aluminium base being characterized, the different piece of paillon foil immersed down at 80 ℃ contain 145g/l H with regard to the stain that exists 2SO 4The aqueous solution in, continue 0,3 and 6 second respectively.These parts are rinsing 5 seconds (moving them simultaneously continuously) in demineralized water at room temperature subsequently, and drying is used GretagMacBeth SpectroEye spectrophotometer measurement L value then.By linear interpolation method, determine dip time, the L value becomes identical with L value with reference to substrate foil under this dip time, and is described with reference to substrate foil roughening under the same terms as mentioned above, and contains 145g/l H by it is immersed down at 80 ℃ subsequently 2SO 4The aqueous solution in 6 seconds and carry out the decontamination mark.
Table 2: roughening and cathodic polarization condition and stain result
Figure BPA00001213316500201
Figure BPA00001213316500211
(1): under 80 ℃ at 145g/l H 2SO 4In dip time (s), obtain with reference to L value identical on the aluminium base.
Result from table 2 is clearly visible, needs charge density to be 400C/dm at least during cathodic polarization 2, to remove the stain that exists on the surface.

Claims (10)

1. make the method for lithographic printing-plate carrier, may further comprise the steps:
(i) provide alumina supporter;
(ii) in the roughening electrolyte solution, make described carrier roughening;
(iii), produce charge density Q, in containing the decontamination mark electrolyte solution of hydrochloric acid, handle the carrier of this roughening by applying direct current;
Be characterised in that pH＜1 of decontamination mark electrolyte solution, Q is 400C/dm at least 2
2. according to the method for claim 1 or 2, wherein Q is between 400 and 1000C/dm 2Between.
3. according in each method of preceding claim, wherein pH＞0.
4. according in each method of preceding claim, wherein obtain charge density Q by the direct current that applies 0.1 to 10 second.
5. according in each method of preceding claim 1 to 3, wherein by apply＜5 seconds direct current obtains charge density Q.
6. according in each method of preceding claim, wherein direct current has between 50 and 300A/dm 2Between density.
7. according in each method of preceding claim, wherein the roughening electrolyte has identical composition with decontamination mark electrolyte.
8. according to the method for claim 7, wherein step (ii) with is (iii) carried out in one or more identical process tanks.
9. method according to Claim 8, wherein process tank has a zone that has an AC power supplies and another has the zone of DC power supply.
10. make the method for lithographic printing plate precursor, may further comprise the steps:
(i) provide the carrier that obtains by in each method of preceding claim;
(ii) on described carrier, apply and comprise at least one heat-or the coating of photosensitive imaging layer;
The (iii) dry precursor that obtains.
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