CN101957514B - Panel assembly alignment system and alignment method thereof - Google Patents
Panel assembly alignment system and alignment method thereof Download PDFInfo
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- CN101957514B CN101957514B CN201010269431XA CN201010269431A CN101957514B CN 101957514 B CN101957514 B CN 101957514B CN 201010269431X A CN201010269431X A CN 201010269431XA CN 201010269431 A CN201010269431 A CN 201010269431A CN 101957514 B CN101957514 B CN 101957514B
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Abstract
The invention discloses a panel assembly alignment system and an alignment method thereof. In the system, a first panel at the bottom layer is provided with a plurality of first alignment patterns which are arranged in an equal distance mode and form a geometric figure; a second panel at a medium layer is provided with a plurality of second alignment patterns, wherein the second alignment patterns form a geometric figure, and the distance of adjacent alignment patterns is wider when the patterns are further away from the figure center; and a third panel at an upper layer is provided with a plurality of third alignment patterns, wherein the third alignment patterns form a geometric figure, and the distance of adjacent alignment patterns is narrower when the patterns are further away from the figure center. In the system, an operation unit controls a shooting unit to shoot each panel so as to analyze the superposed positions of the first alignments pattern and the second alignment patterns, and determine the offset direction of the second panel relatively to the first panel, so that when the third panel is placed, the third alignment patterns according with the offset direction and the level of the superposed position are superposed at the superposed position.
Description
Technical field
The invention relates to a kind of panel sets erection system, particularly combine the contraposition of panel to photograph decision technology with the panel combination alignment system of the contraposition pattern-pitch technology that changes panel and to method for position relevant for a kind of.
Background technology
In the bore hole formula 3D display panel of prior art; For the images of left and right eyes that makes the user really receives different shows signal; Usually in standard panel (normal cell panel) applying one Polarizer (Color Filter Panel; CF Panel) after, the gap barricade (Slit Cell/Black Matrix Barrier) of on Polarizer, fitting again is to isolate the picture signal of standard panel output by the indivedual shows signal that receive of images of left and right eyes by the gap barricade.
Yet, no matter use the sort of gap barricade structure, all need carry out upright, the applying processing procedure of the above panel sets of secondary, like: standard panel the once combination processing procedure that combines with Polarizer; Polarizer and the upright processing procedure of the secondary group that combines of gap barricade; Need dispose the upright processing procedure of three groups of other assembled components between the panel ... by that analogy.As long as during the upright processing procedure of preceding group for several times the situation that the panel contraposition is squinted takes place; Tilt to fit in the standard panel like Polarizer; Will cause assembling that panel after the completion can't be complete isolates the receivable shows signal of images of left and right eyes, and then reduce the quality that panel shows the stereoptics image.
Secondly; Though manufacturer disposes alignment mark with auxiliary contraposition on each panel; But large-scale panel is excessive because of area, makes that I guess carried out contraposition by alignment mark when arbitrary panel had a little offset in arbitrary group of upright processing procedure; But its deviation of position away from alignment mark is gradually to strengthen more, and alignment mark will be ineffective fully.
Therefore, how to avoid or reduce panel because of contraposition skew produces can't be complete isolate the receivable shows signal of images of left and right eyes, and then reduce the influence of the panel demonstration stereoptics quality of image, the problem that should ponder over for manufacturer.
Summary of the invention
The problem that desire of the present invention solves provides a kind of panel sets erection system and method for adjusting panel to the spacing of bit patterns, accomplishes assembling so that liquid crystal panel can be kept the mode of its perspective view usefulness.
For solving the said system problem; The present invention discloses a kind of panel combination alignment system, and it comprises: a plurality of first pair of bit patterns, a plurality of second pair of bit patterns, a plurality of the 3rd pair of bit patterns, an assembly are put unit, at least one camera unit and an arithmetic element.
The first contraposition pattern forms a geometric scheme, and outwards equidistantly is disposed at the calibration region of one first panel with the geometric scheme center; Second pair of bit patterns also forms above-mentioned geometric scheme, and gets over away from the geometric scheme center with the position, and the spacing of collinear adjacent second pair of bit patterns is wide more, to be disposed at the calibration region of one second panel; The 3rd contraposition pattern forms above-mentioned geometric scheme, and with the position more away from the geometric scheme center, the spacing of collinear adjacent the 3rd pair of bit patterns is narrow more and be disposed at the calibration region of one the 3rd panel; Assembly is put the unit and is put first panel, second panel and the 3rd panel in regular turn, and first pair of bit patterns corresponds to second pair of bit patterns, and second pair of bit patterns corresponds to the 3rd pair of bit patterns; Camera unit is taken the contraposition of first pair of bit patterns and second pair of bit patterns to form one first image, reaches lasting contraposition of taking second pair of bit patterns and the 3rd pair of bit patterns to form one second image; Arithmetic element obtains first image and from first pair of bit patterns and second pair of bit patterns, finds out at least one first overlapping pattern and overlap pattern with at least one second of overlapping; And find out an offset direction of corresponding first panel of second panel; And when putting the unit and put the 3rd panel with Control Component, at least one the 3rd overlap pattern and coincide with at least one second and overlap on the pattern what meet the offset direction in the 3rd pair of bit patterns according to second image; Wherein, First overlap pattern be a plurality of first pair of bit patterns one of them; Second overlap pattern be a plurality of second pair of bit patterns one of them; The 3rd overlap pattern be a plurality of the 3rd pair of bit patterns one of them, this first, second all be that the offset direction at geometric scheme center is identical separately, rank is identical to bit patterns with respect to it with the 3rd coincidence pattern.
For solving the said method problem; The present invention discloses a kind of panel combination contraposition method; It comprises: put one first panel in a plummer, a plurality of first contraposition pattern arrangement become a geometric scheme, and outwards equidistantly are disposed at the calibration region of one first panel with the geometric scheme center; Put one second panel on first panel; So that the first pair of bit patterns is corresponding to a plurality of second pair of bit patterns of two panels; The second contraposition pattern arrangement becomes above-mentioned geometric scheme; And the position is more away from the geometric scheme center, and the spacing of collinear adjacent second pair of bit patterns is wide more and be disposed at the calibration region of one second panel; Find out at least one first coincidence pattern that overlaps from second pair of bit patterns of each first pair of bit patterns and each and overlap the pattern and second panel offset direction with at least one second corresponding to first panel; Overlap pattern from a plurality of the 3rd pair of bit patterns of one the 3rd panel, to find out at least one the 3rd; The 3rd pair of above-mentioned bit patterns also disposes and forms above-mentioned geometric scheme; And the position is more away from the geometric scheme center, and the spacing of collinear adjacent the 3rd pair of bit patterns is narrow more and be disposed at the calibration region of one the 3rd panel; And put the 3rd panel on second panel, overlap pattern to make the 3rd coincidence pattern coincide with second; Wherein, First overlap pattern be a plurality of first pair of bit patterns one of them; Second overlap pattern be a plurality of second pair of bit patterns one of them; The 3rd overlap pattern be a plurality of the 3rd pair of bit patterns one of them, this first, second all be that the offset direction at geometric scheme center is identical separately, rank is identical to bit patterns with respect to it with the 3rd coincidence pattern.
No matter characteristics of the present invention are the present invention and are applicable to the upright processing procedure of group of various gaps barricade structure, and the upright number of times of group is not limited.Secondly; When panel contraposition skew takes place during the upright processing procedure of group, can by after the improvement to bit patterns, combine the technique of counterpoint of photographing; To revise the contraposition deflection problem of each panel; Panel after making assembling accomplish can be complete isolate the receivable shows signal of images of left and right eyes, and then promote the quality that panel shows the stereoptics image, be applicable to the upright processing procedure of group of large-scale panel simultaneously.
Description of drawings
Figure 1A and Figure 1B illustrate the panel combination alignment system configuration diagram of the embodiment of the invention;
Fig. 2 A and Fig. 2 B illustrate the first panel contraposition pattern arrangement synoptic diagram of the embodiment of the invention;
Fig. 2 C and Fig. 2 D illustrate the second panel contraposition pattern arrangement synoptic diagram of the embodiment of the invention;
Fig. 2 E and Fig. 2 F illustrate the 3rd panel contraposition pattern arrangement synoptic diagram of the embodiment of the invention;
Fig. 2 G to Fig. 2 I illustrates the contraposition pattern-pitch synoptic diagram of each panel of the embodiment of the invention;
Fig. 3 A illustrate the embodiment of the invention to the desirable synoptic diagram that overlaps of bit patterns;
Fig. 3 B illustrates an example of the first presentation content synoptic diagram of the embodiment of the invention;
Fig. 3 C illustrates the 3rd of the embodiment of the invention and overlaps pattern selection synoptic diagram and figure;
Fig. 3 D illustrates an example of the second presentation content synoptic diagram of the embodiment of the invention;
Fig. 4 A illustrates another example of the first presentation content synoptic diagram of the embodiment of the invention;
Fig. 4 B illustrates the 3rd of the embodiment of the invention and overlaps another selection synoptic diagram of pattern;
Fig. 4 C illustrates another example of the second presentation content synoptic diagram of the embodiment of the invention;
Fig. 5 A and Fig. 5 B illustrate another configuration diagram of panel combination alignment system of the embodiment of the invention;
Fig. 6 A illustrates the panel combination contraposition method flow synoptic diagram of the embodiment of the invention; And
Fig. 6 B illustrates the thin portion schematic flow sheet of Fig. 6 A flow process of the embodiment of the invention.
Embodiment
Now cooperate and graphic preferred embodiment of the present invention is specified as follows.
At first please illustrate the panel combination alignment system configuration diagram of the embodiment of the invention with reference to Figure 1A and Figure 1B; Please consult the 3rd panel contraposition pattern arrangement synoptic diagram that the second panel contraposition pattern arrangement synoptic diagram, Fig. 2 E and Fig. 2 F that the first panel contraposition pattern arrangement synoptic diagram, Fig. 2 C and Fig. 2 D that Fig. 2 A and Fig. 2 B illustrate the embodiment of the invention illustrate the embodiment of the invention illustrate the embodiment of the invention simultaneously, and illustrate the contraposition pattern-pitch synoptic diagram of each panel of the embodiment of the invention with Fig. 2 G to Fig. 2 I.Present embodiment describes with the upright processing procedure of three deck panels groups; One first panel 41 of bottom is standard panel (normal cell panel); One second panel 42 in middle level is Polarizer (Color Filter Panel; CF Panel), one the 3rd panel 43 on upper strata is gap barricade (Slit Cell/Black Matrix/BMBarrier).
Like Fig. 2 A, Fig. 2 B and Fig. 2 G; First panel, 41 peripheries comprise a calibration region 411; Dispose a plurality of first pair of bit patterns 51 on the calibration region 411; These first pair of bit patterns 51 can form the geometric scheme of location usefulness, this with two each other the cruciform of vertical and staggered line spread be example, but not as limit.
The first pair of bit patterns 51 is outwards configuration at first with first pair of bit patterns 511 at criss-cross center, and the spacing of per two adjacent first pair of bit patterns 51 is all equal.In this explanation, the spacing of indication here is that the distance with the center of per two pairs of bit patterns is as the criterion, but also is able to the peripheral outer edge of bit patterns is carried out distance computation.In this, the distance that makes each distance is R.
Like Fig. 2 C, Fig. 2 D and Fig. 2 H; Second panel, 42 peripheries also comprise a calibration region 421; Dispose a plurality of second pair of bit patterns 52 on the calibration region 421; The cruciform that the geometric scheme that these second pair of bit patterns 52 form forms similar in appearance to first pair of bit patterns 51, and dispose at first outwards scattering with second pair of bit patterns 521 at cruciform center.But different with first pair of bit patterns 51 be in, in collinear two adjacent second pair of bit patterns 52, with allocation position outer more (deep second pair of bit patterns 521), the spacing of two adjacent second pair of bit patterns 52 is configured with regard to wide more mode.Other says it; Except that second pair of bit patterns 521 at center; The spacing of each second pair of bit patterns 52 and second pair of bit patterns 52 of prime (near second pair of bit patterns 521 at center) also will go up a predeterminable range less compared with the spacing with secondary (away from central point) second pair of bit patterns 52.
In this; Make second pair of bit patterns 521 of central point be second pair of bit patterns of the first order; Second pair of bit patterns 52 that its periphery is adjacent is the second pair of bit patterns 522 in the second level, and what second pair of bit patterns in the second level 522 was peripheral is second pair of bit patterns 523 of the third level to bit patterns.Wherein, Making the second pair of bit patterns of the first order (second pair of bit patterns 521 at center) and the spacing of the second pair of bit patterns 522 in the second level is R; Above-mentioned predeterminable range is 1; Then second pair of bit patterns in the second level 522 is R+1 with the spacing of second pair of bit patterns 523 of the third level, the spacing of second pair of bit patterns of the third level 523 and second pair of bit patterns 524 of the fourth stage be R+2... by that analogy.
Like Fig. 2 E, Fig. 2 F and Fig. 2 I; The 3rd panel 43 peripheries also comprise a calibration region 431; Dispose a plurality of the 3rd pair of bit patterns 53 on the calibration region 431; The cruciform that the geometric scheme that three pairs of bit patterns of this grade in an imperial examination 53 form forms similar in appearance to first pair of bit patterns 51, and dispose at first outwards scattering with the 3rd pair of bit patterns 531 at criss-cross center.But different with first pair of bit patterns 51 be in, in collinear two adjacent the 3rd pair of bit patterns 53, with allocation position outer more (deep the 3rd pair of bit patterns 531), the spacing of two adjacent the 3rd pair of bit patterns 53 is configured with regard to narrow more mode.Other says it; Except that the 3rd pair of bit patterns 531 at center; The spacing of each the 3rd pair of bit patterns 53 and the 3rd pair of bit patterns 53 of prime (near the 3rd pair of bit patterns 531 at center) also will go up a predeterminable range compared with the spacing with secondary (deep the 3rd pair of bit patterns 531) the 3rd pair of bit patterns 53 more.Yet predeterminable range does not exceed with 1.
In this, make the 3rd pair of bit patterns 531 at center be the 3rd pair of bit patterns of the first order, the 3rd pair of bit patterns 53 that its periphery is adjacent be the 3rd pair of bit patterns 532 in the second level, the 3rd pair of bit patterns in the second level 532 peripheries be the 3rd pair of bit patterns 533 of the third level to bit patterns.Wherein, Making the 3rd pair of bit patterns of the first order (the 3rd pair of bit patterns 531 at center) and the spacing of the 3rd pair of bit patterns 532 in the second level is R; Above-mentioned predeterminable range is 1; Then the 3rd pair of bit patterns in the second level 532 is R-1 with the spacing of the 3rd pair of bit patterns 533 of the third level, the spacing of the 3rd pair of bit patterns of the third level 533 and the 3rd pair of bit patterns 534 of the fourth stage be R-2... by that analogy.
Like Figure 1A, the first Control Components of arithmetic element 10 are put unit 30 obtaining first panel 41, and first panel 41 is placed on the plummer 11.And after the 41 quilt storings of first panel, arithmetic element 10 is promptly controlled the contraposition situation that at least one camera unit 20 is taken first panel 41 and second panel 42, promptly is the coincidence status of taking first pair of bit patterns 51 and second pair of bit patterns 52, to form one first image.In this explanation, assembly put unit 30 can be hollow sucker or mechanical arm etc. in order to grasp, the assembly of absorption panel is moved, placing device or assembly, but not as limit, any device of moving or putting panel is all suitable.Camera unit 20 sees through a transfer table or and moves the arm of force 12 and connect, move the arm of force 12 again by 10 controls of arithmetic element with travelling shot unit 20, it can be moved according to particular trajectory.Yet camera unit 20 combines to move the arm of force 12 and assembly to be put unit 30 to move the technology of panel is located by prior art, and it knows usually that by technical field tool of the present invention the knowledgeable is known, illustrated and do not give unnecessary details these technology with letter at this.
Please consult Fig. 3 A in regular turn and illustrate the overlapping an example, figure BC that synoptic diagram, Fig. 3 B illustrate the first presentation content synoptic diagram of the embodiment of the invention and illustrate the 3rd of the embodiment of the invention and overlap pattern and select synoptic diagram and figure and Fig. 3 D to illustrate an example of the second presentation content synoptic diagram of the embodiment of the invention of the embodiment of the invention bit patterns is desirable.Like Fig. 3 A, when first panel 41 overlapped with second panel 42, optimal coincidence situation did, the first pair of bit patterns 511 that is in the center of cross shape should overlap with second pair of bit patterns 521 at center, but actual contraposition situation and ideal difference to some extent.
Like Figure 1A and Fig. 3 B, arithmetic element 10 can obtain first image, and analyzes in all the first pair of bit patterns 51 and the second pair of bit patterns 52, and what overlap at least one first overlaps pattern and overlap pattern with at least one second.Shown in Fig. 3 B, when supposing that first panel 41 overlaps with second panel 42, a little to some extent skew of second panel 42, and what cause overlapping is first pair of bit patterns of the third level 513 and second pair of bit patterns 523 of the third level to bit patterns, and the offset direction is-X.This promptly represents and first overlaps pattern and for first pair of bit patterns of the third level 513, the second of-directions X overlaps patterns be-second pair of bit patterns 523 of the third level of directions X, i.e. two pairs of interior bit patterns of broken circle frame.
Like Fig. 3 C, arithmetic element 10 can analyze in all the 3rd pair of bit patterns 53, and what person is the corresponding first coincidence pattern overlaps pattern with second one the 3rd a coincidence pattern.With this example, arithmetic element 10 analyzes the offset direction and overlaps pattern for the 3rd pair of bit patterns of the third level 533 of-X for fitting the 3rd of lattice.
Like Figure 1B and Fig. 3 D, arithmetic element 10 can continue to take the first coincidence pattern overlaps pattern with second coincidence position by control camera unit 20, to form one second image.Arithmetic element 10 Control Component storing unit 30 again is placed in the 3rd panel 43 on second panel 42.And when putting the 3rd panel 43; Arithmetic element 10 is analyzed the alignment of present panel according to second image that continues to produce; Coincide with second and overlap on the pattern to make the 3rd of above-mentioned right lattice overlap pattern, adjust by this panel sets upright after, liquid crystal panel presents the demonstration deflection angle of picture.
Wherein, Camera unit 20 with the line spread that forms above-mentioned cruciform (no matter first pair of bit patterns or second pair of bit patterns are benchmark) as motion track to take coincidence one by one to bit patterns; With 1A and Fig. 3 B, promptly be that camera unit carries out displacement shooting behavior with X-direction and Y direction (no matter successively).Afterwards; Be benchmark by arithmetic element 10 with first pair of bit patterns 51 again; Analyze the first pair of bit patterns 51 of identical progression and the degree that overlaps of second pair of bit patterns 52, find out first of coincidence and overlap pattern and overlap pattern, and find out the offset direction of second panel 42 corresponding to first panel 41 with second.
Please consulting another example, Fig. 4 B that Fig. 4 A illustrates the first presentation content synoptic diagram of the embodiment of the invention in regular turn illustrates the 3rd of the embodiment of the invention and overlaps pattern another selects synoptic diagram and figure and Fig. 4 C to illustrate another example of the second presentation content synoptic diagram of the embodiment of the invention.
Like Figure 1A and Fig. 4 A, arithmetic element 10 can obtain first image, and analyzes in all the first pair of bit patterns 51 and the second pair of bit patterns 52, and what overlap at least one first overlaps pattern and overlap pattern with at least one second.Shown in Fig. 4 A, when supposing that first panel 41 overlaps with second panel 42, a little to some extent skew of second panel 42, and what cause overlapping is first pair of bit patterns of the fourth stage 514 and second pair of bit patterns 524 of the fourth stage to bit patterns, and the offset direction is Y.This promptly represent first overlap pattern be first pair of bit patterns of the fourth stage 514, the second of Y direction to overlap patterns be second pair of bit patterns 524 of the fourth stage of Y direction, i.e. two pairs of bit patterns in the broken circle frame.
Like Fig. 4 B, arithmetic element 10 can analyze in all the 3rd pair of bit patterns 53, and what person is the corresponding first coincidence pattern overlaps pattern with second one the 3rd a coincidence pattern.With this example, it is the three coincidence pattern of the 3rd pair of bit patterns of the fourth stage 534 of Y for right lattice that arithmetic element 10 analyzes the offset direction.
Like Figure 1B and Fig. 4 C, arithmetic element 10 can continue to take the first coincidence pattern overlaps pattern with second coincidence position by control camera unit 20, to form one second image.Arithmetic element 10 Control Component storing unit 30 again is placed in the 3rd panel 43 on second panel 42.And when putting the 3rd panel 43; Second image according to continuing to produce is analyzed present alignment; Coincide with second and overlap on the pattern to make the 3rd of above-mentioned right lattice overlap pattern, adjust by this panel sets upright after, liquid crystal panel presents the demonstration deflection angle of picture.
In like manner, second panel 42 corresponding to the offset direction of first panel 41 be directions X or-the Y direction, also find out the corresponding the 3rd in the above described manner and overlap pattern, be placed in the offset direction of second panel 42 with control and adjustment the 3rd panel 43.
In addition; The first pair of bit patterns 51, the second pair of bit patterns 52 are identical with the pattern of the 3rd pair of bit patterns 53; And the second pair of bit patterns 52 greater than the size of 53, the first pairs of bit patterns 51 of the 3rd pair of bit patterns between the second pair of bit patterns 52 and the 3rd pair of bit patterns 53, but not as limit.
Please consult Fig. 5 A and Fig. 5 B simultaneously and illustrate another configuration diagram of panel combination alignment system of the embodiment of the invention, illustrating different being in of Organization Chart with Figure 1A and Figure 1B has a plurality ofly in the camera unit of native system, explain with two camera units at this.
In the present embodiment, one first camera unit 21 carries out displacement with X-direction and takes behavior, and one second camera unit 22 carries out displacement shooting behavior with Y direction.Yet, might cause disalignment to overlap pattern to the design and the size of bit patterns, so arithmetic element 10 when overlapping pattern and judge, can obtain the coincidence pattern of a group or two groups to all having one group.
Have two groups if overlap pattern, arithmetic element 10 promptly can analyze in each the 3rd pair of bit patterns 53, meets two the 3rd pair of bit patterns 53 of above-mentioned coincidence pattern demand, to overlap pattern as the 3rd.Afterwards; Arithmetic element 10 Control Component storing unit 30 again is placed in the 3rd panel 43 on second panel 42; And when putting the 3rd panel 43, analyze present panel offset state, coincide with its corresponding two second with two the 3rd coincidence patterns that make above-mentioned right lattice and overlap on the pattern according to second image that continues to produce; Adjust by this panel sets upright after, liquid crystal panel presents the demonstration deflection angle of picture.
See also Fig. 6 A and illustrate the panel combination contraposition method flow synoptic diagram of the embodiment of the invention and the thin portion schematic flow sheet that Fig. 6 B illustrates Fig. 6 A flow process of the embodiment of the invention, please consult Figure 1A to Fig. 5 B simultaneously and be beneficial to understand.The method flow process is following:
Put one first panel 41 in a plummer 11, a plurality of first pair of bit patterns 51 are configured to a geometric scheme and outwards equidistantly are disposed at the calibration region 411 (step S110) of one first panel 41 with the geometric scheme center.First panel, 41 peripheries comprise a calibration region 411; Dispose a plurality of first pair of bit patterns 51 on the calibration region 411; These first pair of bit patterns 51 can form the shape of location usefulness, this with two each other the cruciform of vertical and staggered line spread be example, but not as limit.The first pair of bit patterns 51 is outwards configuration at first with first pair of bit patterns 511 at criss-cross center, and the spacing of per two adjacent first pair of bit patterns 51 is all equal.In this explanation, the spacing of indication here is that the distance with the center of per two pairs of bit patterns is as the criterion, but also is able to the peripheral outer edge of bit patterns is carried out distance computation.In this, make each apart from being the R distance.Arithmetic element can be first Control Component put the unit obtaining first panel, and first panel 41 is placed on the plummer 11.
Put one second panel 42 on first panel 41, so that aforesaid first pair of bit patterns 51 corresponds to a plurality of second pair of bit patterns 52 of second panel 42.These second pair of bit patterns 52 is configured to above-mentioned geometric scheme, and the position is more away from the geometric scheme center, and the spacing of collinear adjacent second pair of bit patterns 52 is wide more, with the calibration region 421 (step S120) that is disposed at one second panel 42.
Second panel, 42 peripheries also comprise a calibration region 421; Dispose a plurality of second pair of bit patterns 52 on the calibration region 421; The cruciform that the pattern that these second pair of bit patterns 52 form forms similar in appearance to first pair of bit patterns 51, and with second pair of bit patterns 521 at criss-cross center at first outwards disposing.And collinear two adjacent second pair of bit patterns 52, with allocation position outer more (away from criss-cross central point), the spacing of two adjacent second pair of bit patterns 52 is configured with regard to wide more mode.Other says it; Except that second pair of bit patterns 521 at center; The spacing of each second pair of bit patterns 52 and second pair of bit patterns 52 of prime (near second pair of bit patterns 521 at center) also will go up a predeterminable range less compared with the spacing with secondary (deep second pair of bit patterns 521) second pair of bit patterns 52.
From first pair of bit patterns 51 and second pair of bit patterns 52, find out at least one first overlapping pattern and overlap the pattern and second panel 42 offset direction with at least one second of overlapping corresponding to first panel 41; Overlap pattern from a plurality of the 3rd pair of bit patterns 53 of one the 3rd panel 43, to find out at least one the 3rd; Three pairs of bit patterns 53 of this grade in an imperial examination also dispose and form above-mentioned geometric scheme; And the position is more away from the geometric scheme center; The spacing of collinear adjacent the 3rd pair of bit patterns 53 is narrow more, with the calibration region 431 (step S130) that is disposed at one the 3rd panel 43.Arithmetic element 10 can obtain first image, and analyzes in all the first pair of bit patterns 51 and the second pair of bit patterns 52, and what overlap at least one first overlaps pattern and overlap pattern with at least one second.
Yet it is following that bit patterns is overlapped analysis mode:
Analysis is positioned at the degree that overlaps (step S131) of same line spread and first pair of bit patterns 51 at the same level and second pair of bit patterns 52.Camera unit 20 with the line spread that forms above-mentioned cruciform (no matter first pair of bit patterns or second pair of bit patterns) as motion track; To take coincidence one by one to bit patterns; First image of captured formation is received by arithmetic element 10, and analyzes the first pair of bit patterns 51 of same level and the degree that overlaps of second pair of bit patterns 52.
Find out the first the highest coincidence pattern of coincidence degree and overlap pattern (step S132) with second.It is the highest that arithmetic element 10 can be analyzed registrations, and first pair of bit patterns 51 at the same level and second pair of bit patterns 52 are regarded as above-mentioned first and overlap pattern and overlap pattern with second.Overlap pattern according to first afterwards and overlap the offset direction (step S 133) of coincidence location determination second panel 42 of pattern with second for first panel 41.Like Fig. 3 B is example, and arithmetic element 10 can judge-first pair of bit patterns of the third level 513 and second pair of bit patterns 523 of the third level of directions X overlap, and assert that second panel 42 is-X corresponding to the offset direction of first panel 41.Fig. 4 C is an example again, and first pair of bit patterns of the fourth stage 514 that arithmetic element 10 can be judged the Y direction overlaps with second pair of bit patterns 524 of the fourth stage, and assert that second panel 42 is Y corresponding to the offset direction of first panel 41.
Put the 3rd panel 43 on second panel 42, overlap pattern (step S140) to make aforesaid the 3rd coincidence pattern coincide with aforesaid second.Arithmetic element 10 can analyze in all the 3rd pair of bit patterns 53, and what person is the corresponding first coincidence pattern overlaps pattern with second one the 3rd a coincidence pattern.Afterwards, arithmetic element 10 can continue to take the first coincidence pattern overlaps pattern with second coincidence position by control camera unit 20, to form one second image.Arithmetic element 10 Control Component storing unit 30 again is placed in the 3rd panel 43 on second panel 42.And when putting the 3rd panel 43; Second image according to continuing to produce is analyzed present panel alignment; Coincide with second and overlap on the pattern to make the 3rd of above-mentioned right lattice overlap pattern, adjust by this panel sets upright after, liquid crystal panel presents the demonstration deflection angle of picture.
In sum, be only notebook invention for presenting the embodiment or the embodiment of the technological means that adopted of dealing with problems, be not the scope that is used for limiting patent working of the present invention.Be that patent claim context all and of the present invention conforms to, or change and modification, be all claim scope of the present invention and contain according to the equalization that claim scope of the present invention is done.
Claims (10)
1. a panel combination alignment system is characterized in that, comprising:
A plurality of first pair of bit patterns form a geometric scheme, outwards equidistantly are disposed at a calibration region of one first panel with this geometric scheme center;
A plurality of second pair of bit patterns form this geometric scheme, and more away from this geometric scheme center, the spacing of collinear adjacent these second pair of bit patterns is wide more and be disposed at a calibration region of one second panel with the position;
A plurality of the 3rd pair of bit patterns form this geometric scheme, and more away from this geometric scheme center, the spacing of three pairs of bit patterns of collinear adjacent this grade in an imperial examination is narrow more and be disposed at a calibration region of one the 3rd panel with the position;
One assembly is put the unit, puts this first panel, this second panel and the 3rd panel in regular turn, corresponding these the second pair of bit patterns of these first pair of bit patterns, three pairs of bit patterns of corresponding this grade in an imperial examination of these second pair of bit patterns;
At least one camera unit, the contraposition of taking these first pair of bit patterns and these second pair of bit patterns reach lasting contraposition of taking these second pair of bit patterns and three pairs of bit patterns of this grade in an imperial examination to form one second image to form one first image; And
One arithmetic element; Obtain this first image; Overlap pattern from second pair of bit patterns of these first pair of bit patterns and these, to find out at least one first coincidence pattern that overlaps with at least one second; And find out this second panel to a offset direction that should first panel, and when putting unit and put the 3rd panel, at least one the 3rd overlap pattern and coincide with this and second overlap on pattern what meet this offset direction in three pairs of bit patterns of this grade in an imperial examination according to this this assembly of second image control; Wherein, First overlap pattern be a plurality of first pair of bit patterns one of them; Second overlap pattern be a plurality of second pair of bit patterns one of them; The 3rd overlap pattern be a plurality of the 3rd pair of bit patterns one of them, this first, second all be that the offset direction at geometric scheme center is identical separately, rank is identical to bit patterns with respect to it with the 3rd coincidence pattern.
2. panel combination alignment system as claimed in claim 1; It is characterized in that; During these second contraposition pattern arrangement, outwards form a plurality of levels, except that this second pair of bit patterns at this geometric scheme center by this geometric scheme center; The spacing of the gap ratio of this second pair of bit patterns of second pair of bit patterns of this of each grade and prime and this secondary second pair of bit patterns is less than a predeterminable range; And during these grade in an imperial examination three contraposition pattern arrangement, except that the 3rd pair of bit patterns at this geometric scheme center, the spacing of the gap ratio of the 3rd pair of bit patterns of each grade and the 3rd pair of bit patterns of prime and the 3rd pair of secondary bit patterns exceeds a predeterminable range.
3. panel combination alignment system as claimed in claim 1; It is characterized in that; When overlapping out these of two, second pair of bit patterns of these first pair of bit patterns and these first overlap patterns and these of two second when overlapping pattern; Calculate these first overlap patterns with these second overlap pattern pattern coincidence progression and this second panel to offset direction that should first panel; From three pairs of bit patterns of this grade in an imperial examination, finding out two triple patterns that close of this grade in an imperial examination, when putting unit and put the 3rd panel, overlap patterns with these two the 3rd and coincide with these two second and overlap on the patterns to control this assembly.
4. panel combination alignment system as claimed in claim 1; It is characterized in that; This geometric scheme is the cruciform of two each other vertical and staggered line spread; This camera unit be with these line spread be motion track to take coincidence one by one to bit patterns,, first overlap pattern and second overlap pattern according to this first pair of bit patterns of peer and the degree that overlaps of this second pair of bit patterns by this arithmetic element with this that find out coincidence with this.
5. panel combination alignment system as claimed in claim 1; Wherein this first pair of bit patterns, this second pair of bit patterns are identical with the pattern of the 3rd pair of bit patterns; And this second pair of bit patterns be greater than the 3rd pair of bit patterns, and the size of this first pair of bit patterns is between this second pair of bit patterns and the 3rd pair of bit patterns.
6. a panel combination contraposition method is characterized in that, comprising:
Put one first panel in a plummer, a plurality of first contraposition pattern arrangement become a geometric scheme and outwards equidistantly are disposed at a calibration region of one first panel with this geometric scheme center;
Put one second panel on this first panel; So that these first pair of bit patterns is corresponding to a plurality of second pair of bit patterns of this second panel; These second contraposition pattern arrangement become this geometric scheme; And the position is more away from this geometric scheme center, and the spacing of collinear adjacent these second pair of bit patterns is wide more and be disposed at a calibration region of this second panel;
Find out at least one first coincidence pattern that overlaps from second pair of bit patterns of these first pair of bit patterns and these and overlap pattern and this second panel offset direction with at least one second corresponding to this first panel; Overlap pattern from a plurality of the 3rd pair of bit patterns of one the 3rd panel, to find out at least one the 3rd; These grade in an imperial examination three contraposition pattern arrangement become this geometric scheme; And the position is more away from this geometric scheme center, and the spacing of three pairs of bit patterns of collinear adjacent this grade in an imperial examination is narrow more and be disposed at the calibration region of one the 3rd panel; Wherein, First overlap pattern be a plurality of first pair of bit patterns one of them; Second overlap pattern be a plurality of second pair of bit patterns one of them; The 3rd overlap pattern be a plurality of the 3rd pair of bit patterns one of them, this first, second all be that the offset direction at geometric scheme center is identical separately, rank is identical to bit patterns with respect to it with the 3rd coincidence pattern; And
Put the 3rd panel on this second panel, coincide with this at least one second coincidence pattern with this at least one the 3rd coincidence pattern of order.
7. panel combination contraposition method as claimed in claim 6; It is characterized in that; During these second contraposition pattern arrangement, outwards form a plurality of levels, except that this second pair of bit patterns at this geometric scheme center by this geometric scheme center; The spacing of the gap ratio of this second pair of bit patterns of second pair of bit patterns of this of each grade and prime and this secondary second pair of bit patterns is less than a predeterminable range; And during these grade in an imperial examination three contraposition pattern arrangement, except that the 3rd pair of bit patterns at this geometric scheme center, the spacing of the gap ratio of the 3rd pair of bit patterns of each grade and the 3rd pair of bit patterns of prime and the 3rd pair of secondary bit patterns exceeds a predeterminable range.
8. panel combination contraposition method as claimed in claim 6; It is characterized in that; When overlapping out these of two, second pair of bit patterns of these first pair of bit patterns and these first overlap patterns and these of two second when overlapping pattern; According to these first overlap patterns with these second overlap pattern pattern coincidence progression and this second panel to offset direction that should first panel; From three pairs of bit patterns of this grade in an imperial examination, finding out two triple patterns that close of this grade in an imperial examination, and when putting the 3rd panel, overlap patterns with these two the 3rd and coincide with these two second and overlap on the patterns.
9. panel combination contraposition method as claimed in claim 6; It is characterized in that; Find out at least one first coincidence pattern that overlaps from second pair of bit patterns of these first pair of bit patterns and these and overlap with at least one second pattern and this second panel this step, comprising corresponding to the offset direction of this first panel:
Analysis is positioned at this first pair of bit patterns of same line spread and peer and the degree that overlaps of this second pair of bit patterns;
Finding out the highest this of coincidence degree first overlaps pattern and second overlaps pattern with this; And
First overlap pattern and second overlap the offset direction of this second panel of pattern judgement according to this for this first panel with this.
10. panel combination contraposition method as claimed in claim 6; It is characterized in that; This first pair of bit patterns, this second pair of bit patterns are identical with the pattern of the 3rd pair of bit patterns; And this second pair of bit patterns be greater than the 3rd pair of bit patterns, and the size of this first pair of bit patterns is between this second pair of bit patterns and the 3rd pair of bit patterns.
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| CN106646989A (en) * | 2016-09-30 | 2017-05-10 | 张家港康得新光电材料有限公司 | Alignment method and device for ultraviolet photomask |
| CN106547132A (en) * | 2017-01-13 | 2017-03-29 | 深圳市华星光电技术有限公司 | Liquid crystal cell manufacture device and method |
| JP2019168581A (en) * | 2018-03-23 | 2019-10-03 | シャープ株式会社 | Image display panel and image display device |
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| JPH05205995A (en) * | 1992-01-30 | 1993-08-13 | Hitachi Ltd | Alignment mark |
| KR100324110B1 (en) * | 1999-07-31 | 2002-02-16 | 구본준, 론 위라하디락사 | The align pattern formed on the substrate in the liquid crystal display |
| JP4038133B2 (en) * | 2002-02-28 | 2008-01-23 | 芝浦メカトロニクス株式会社 | Substrate bonding apparatus and method, and substrate detection apparatus |
| CN100514163C (en) * | 2004-10-08 | 2009-07-15 | 中华映管股份有限公司 | Method for improving assembling deviation of liquid crystal display panel and manufacturing technology of liquid crystal panel |
| JP2008040341A (en) * | 2006-08-09 | 2008-02-21 | Sharp Corp | Composite display panel and method of manufacturing composite display panel |
| JP2008268420A (en) * | 2007-04-18 | 2008-11-06 | Sharp Corp | Method for manufacturing liquid crystal display device |
| KR101331942B1 (en) * | 2007-05-03 | 2013-11-21 | 삼성디스플레이 주식회사 | Display device and method of manufacturing for the same |
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Effective date of registration: 20230511 Address after: No. two, No. 1188 West Ring Road, Shengze Town, Wujiang District, Jiangsu, Suzhou Patentee after: Suzhou Shengze science and Technology Pioneer Park Development Co.,Ltd. Address before: 215217, No. 88, Tung Hing Road, Tongli District, Wujiang Economic Development Zone, Suzhou, Jiangsu Patentee before: CPTW (WUJIANG) Co.,Ltd. Patentee before: Chunghwa Picture Tubes, Ltd. |