CN101930167A - Pellicle frame and lithographic pellicle - Google Patents
Pellicle frame and lithographic pellicle Download PDFInfo
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- CN101930167A CN101930167A CN2010102140925A CN201010214092A CN101930167A CN 101930167 A CN101930167 A CN 101930167A CN 2010102140925 A CN2010102140925 A CN 2010102140925A CN 201010214092 A CN201010214092 A CN 201010214092A CN 101930167 A CN101930167 A CN 101930167A
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- pellicle frame
- pellicle
- mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
Abstract
The object of the present invention is to provide a kind of pellicle frame,, still can do one's utmost to alleviate distortion because of the caused exposure negative of the distortion of pellicle frame even protective film is fitted on the exposure negative; And provide a kind of lithographic pellicle with this kind pellicle frame.Pellicle frame of the present invention is characterised in that, the section of pellicle frame is on top parallel with bottom and area is 20mm
2Following tetragonal at least one side has the shape of the depressed part that comprises curve.
Description
Technical field
When the present invention relates to make semiconductor devices such as LSI, super LSI or display panels as the dust of photolithographic mask block use, lithographic pellicle (pellicle) and pellicle frame (pellicle frame).
Background technology
In the manufacturing of the semiconductor manufacturing of LSI, super LSI etc. or display panels etc., rayed is come pattern-making in semiconductor wafer or liquid crystal on raw sheet, but if be attached with dust on the employed exposure negative this moment, this dust can absorb light or make light deflection, thereby cause the pattern after the transfer printing to deform or the edge roughening, except that this, also can make the contaminated blackening of substrate, and have the problem of infringement size, quality, outward appearance etc.In addition, in the present invention, " exposure negative " is meant the general name of photolithographic mask (also abbreviating " mask " as) and light shield (reticle).With the mask is that example is described as follows.
These operations are normally carried out in dust free room, even but in dust free room, will often keep the exposing cleaning suitable difficulty still of negative, so, the method for blocking the protective film of dust adopted in exposure negative surface applying being used to of can making that the exposure light line passes through well.
For the basic comprising of protective film, comprise pellicle frame and be attached at pellicle (pellicle film) on this pellicle frame.Pellicle is by formations such as the nitrocellulose that penetrates well of light (g light, i light, 248nm, 193nm etc.) that can make exposure usefulness, cellulose acetate, fluorine based polymers.Easy to be broad dose of the top of pellicle frame portion coating pellicle, then that pellicle is air-dry and give bonding or give bonding with bonding agents such as acryl resin, epoxy resin, fluororesin.And then, for the exposure negative being installed, the bonding coat that is made of polybutene resin, vinylite, acryl resin and silicone resin etc. being set and being used for protecting the light shield bonding agent protection of bonding coat to use liner in the following portion of pellicle frame.
Be arranged to be centered around the formed area of the pattern in exposure negative surface in the protective film.Protective film is provided with in order to prevent dust and to be attached on the exposure negative, so its area of the pattern and protective film outside are isolated in the mode that can not allow the dust of protective film outside be attached to pattern plane.
In recent years, along with the miniaturization development of the design rule of LSI towards 0.25 micron (subquarter-micron) level, exposure light source also is tending towards the short wavelengthization gradually, that is, be transferred to KrF excimer laser (248nm), ArF excimer laser (193nm) etc. gradually from g light (436nm), i light (365nm) beginning as the mercury vapor lamp of main flow up to now.Along with the process of miniaturization, mask and the desired flatness of silicon wafer are also become more and more stricter.
Protective film is after mask is finished, and is fitted on the mask in order to prevent to adhere to dust on the pattern.When fitting in protective film on the mask, the flatness of mask can change.When the flatness variation of mask, as mentioned above, may produce problems such as focus departs from.In addition, when flatness changed, the pattern form that is depicted on the mask also can change, and also can cause the obstacle that goes wrong on the registration accuracy of mask.
The main cause that the mask flatness that is caused by the applying protective film changes has several, but known wherein maximum factor is the flatness of pellicle frame.
Distortion for the caused mask of distortion that prevents pellicle frame discloses following method: the sectional area of pellicle frame is made as 6mm in the TOHKEMY 2009-25562 communique
2Below, perhaps in pellicle frame, use young's modulus (Young ' s modulus) to be the material below the 50GPa.
As pellicle frame, its section shape mostly is rectangle, and discloses a kind of pellicle frame in Japanese kokai publication hei 9-68793 communique, and the section of its pellicle frame has the upper end side of the inner peripheral surface shape also inwards more outstanding than lower end side.
In recent years,, also compare and become more and more stricter gradually, after the 65nm node, the requirement that 0.5 μ m is following, be preferably 0.25 μ m occurred with the such requirement of the 2 μ m of flatness on pattern plane to the desired flatness of mask.
Usually, the flatness of pellicle frame is about 20～80 μ m, and in the time of will having adopted the protective film of the pellicle frame of flatness difference to fit on the mask like this, the shape of framework can be transferred on the mask, and the distortion of mask can take place.When fitting, protective film is overlayed on mask energetically with about 200～400N (20～40kg is heavy).Because the flatness of mask surface is more smooth than pellicle frame, so when protective film being overlayed when the process of mask finishes, because of pellicle frame can return to the original form, so pellicle frame can make the mask distortion.
Summary of the invention
The problem that the present invention will solve is, the first, a kind of pellicle frame is provided, and even on protective film being fitted in the exposure negative time, also can alleviate distortion because of the exposure negative that distortion caused of pellicle frame.The problem that the present invention will solve is, the second, a kind of lithographic pellicle is provided, and it has above-mentioned pellicle frame.
Above-mentioned problem of the present invention realizes by following scheme (1) and (10).And outline as follows in the lump with (2)～(9) as preferred implementation.
(1). a kind of pellicle frame is characterized in that the section of pellicle frame bar is for and area parallel with bottom on top is 20mm
2Following tetragonal at least one side has the shape of the depressed part that comprises curve.
(2). according to (1) described pellicle frame, wherein, described curve is from by selecting the convex curve that circle, ellipse, hyperbolic curve and para-curve constituted.
(3). according to (1) or (2) described pellicle frame, wherein, described depressed part only is made of convex curve.
(4). according to (1) or (2) described pellicle frame, wherein, described depressed part comprises at least one straight line.
(5). according to (4) described pellicle frame, wherein, described depressed part comprises at least one straight line parallel with described top.
(6). according to each the described pellicle frame in (1)～(5), wherein, the sectional area of described pellicle frame bar is 6mm
2Below.
(7). according to each the described pellicle frame in (1)～(6), it is made of the material of young's modulus by 1～80GPa.
(8). according to each the described pellicle frame in (1)～(7), it is made of aluminium alloy.
(9). according to each the described pellicle frame in (1)～(8), the flatness of pellicle frame is below the 20 μ m
(10). a kind of lithographic pellicle, it is attached at pellicle one end face of each described pellicle frame in (1)～(9) by the pellicle bonding agent, and in the other end exposure negative bonding agent is set.
According to the present invention, can provide the pellicle frame and the lithographic pellicle of the distortion of the exposure negative that a kind of distortion that can alleviate because of pellicle frame causes.
Description of drawings
Fig. 1 is an example of the constructed profile of the configuration example of expression protective film.
Fig. 2 is the figure of an example of the section shape of expression pellicle frame bar.
Fig. 3 is the figure of the variation example of the section shape of expression pellicle frame bar.
Symbol description
1 pellicle
2 adhesive linkages
3 pellicle frames
The 4 bonding bonding coats of using
5 exposure negatives
10 protective films
12 tops
13 top portions
14 bottoms
15 following portions
16 pars intermedias
17 sides
18 contain the depressed part of curve shape
19 sides
Embodiment
Pellicle frame of the present invention is characterized in that, the section of pellicle frame bar is for and area parallel with bottom on top is 20mm
2Following tetragonal at least one side has the shape of the depressed part that comprises curve.
Below, with reference to accompanying drawing, the present invention is described.
Shown in the sectional view among Fig. 1; lithographic pellicle 10 of the present invention; applying is attached at pellicle 1 with adhesive linkage 2 upper surface of pellicle frame 3 by pellicle; so; at this moment, be used to make lithographic pellicle 10 to be bonded in the bonding of exposure negative (mask or light shield) 5, be formed at the lower surface of pellicle frame 3 usually with bonding coat 4; and, strippingly be pasted with liner (not shown) in this bonding lower surface with bonding coat 4.In addition, on pellicle frame 3, can be provided with not shown air pressure adjustment and use hole (blow vent), and then, in order to remove particulate, dedusting filtrator (not shown) can be set on this blow vent also.
Also can the anchor clamps hole be set at pellicle frame.The shape of the depth direction in this anchor clamps hole is not particularly limited, and only otherwise run through and get final product, also can be the recess that has taper at the cylinder front end.
The position of above-mentioned air pressure adjustment with hole and anchor clamps hole is set, and preferably its section shape is to be provided with the depressed part quadrilateral before that comprises convex curve, more preferably rectangle.
As shown in Figure 2, in pellicle frame of the present invention, the section of pellicle frame is characterised in that to have following shape, and promptly on top 12 and areas parallel with following 14 are 20mm
2Following basic quadrilateral (below, be also referred to as " basic quadrilateral ".Constitute by four limits 12,17,14,19.) the dual-side 17 of subtend and at least one side of 19 have the shape of the depressed part that comprises curve.The section of this pellicle frame is to have by the formed pars intermedia 16 of the depressed part that comprises convex curve to connect the shape that top portion 13 that comprises top 12 and the following portion 15 that comprises following 14 form in basic quadrilateral.
As mentioned above, to be considered to mainly be because due to the deformation of the pellicle frame of protective film owing to the deformation that protective film is fitted in the mask that causes on the mask.When fitting, pellicle frame deforms, and the distortional stress of this pellicle frame desire when restoring to the original state can make mask deform.This distortional stress exists with ... the young's modulus and the deflection thereof of the material that constitutes pellicle frame.According to the present invention, be reduced into forr a short time than basic quadrilateral by sectional area with pellicle frame, can be made into the less pellicle frame of distortional stress.That is, the pellicle because the top of pellicle frame is sticked, and bottom is provided with bonding agent and is adhered to mask, so, top and the following width that all needs to a certain degree.Yet, connect the pars intermedia of top portion and following portion, can be set at than about the narrower width in both sides.
Have section in the framework of tetragonal substantially shape, such pellicle frame bar can be made by the shape with the depressed part that comprises curve of pruning from least one avris of the side of tetragonal subtend.In addition, the position of described air pressure adjustment with the pellicle frame in hole and anchor clamps hole is set, can not form depressed part, the position of the pellicle frame in anchor clamps hole is set, preferably need not cut and form nonpenerative anchor clamps hole.
In addition, as other method, above-mentioned pellicle frame also can be made by engineering plastics are carried out injection mo(u)lding in the mould with regulation section shape.
Substantially tetragonal shape so long as top and following parallel getting final product are not particularly limited, as basic quadrilateral, comprises containing foursquare rectangle, trapezoidal, parallelogram wherein preferred rectangle.As trapezoidal, its top is comparable following short, the also comparable length of side down.
Substantially tetragonal area is 20mm
2Below.When surpassing 20mm
2The time, have the limitation on the device in the time of increasing the height of framework, so that frame width can become is excessive, it is too small that the inside dimension of protective film can become, thereby produce the unfavorable condition that area of the pattern is limited significantly.
Substantially tetragonal area is preferably 15mm
2Below, more preferably 12mm
2Below.In addition, tetragonal substantially area is preferably 2mm
2More than, 4mm more preferably
2More than.When being in the above-mentioned numerical range, can suppress frame width imperceptibly, so have the advantage that can obtain area of the pattern fully greatly.
In the present invention, depressed part can be the shape that comprises the concavo-convex curve of tool, preferably comprises the shape of the curve of convex or concavity in a direction, and this curve is further preferably from by selecting the convex curve that circle, ellipse, hyperbolic curve and para-curve constituted.
The depressed part that comprises convex curve preferably only is made of convex curve.As the shape that only constitutes by convex curve, but illustration semicircle, partial circle, semiellipse, local ellipse, local hyperbolic curve and local parabolic.In the local shape of ellipse, hyperbolic curve and parabolical conic section, preferably comprise near the local curve in its summit.The convex curve that depressed part comprised can be from side and presents convex or concavity towards the inboard.
In the present invention, depressed part preferably comprises above-mentioned convex curve and at least one straight line.As the shape of this depressed part, but the straight line that illustration is reported to the leadship after accomplishing a task with above-mentioned convex curve with this convex curve is as string and the bowed shape that surrounds, the shape that comprises above-mentioned convex curve and at least one straight line.In the latter's example, include quadrant, 1/4th ellipses.Preferably comprise at least one straight line parallel with above-mentioned depressed part with this top.Also can be two straight lines parallel and to the depressed part of side side projection with this top.
Substantially the tetragonal top and following parallel that is shaped as.As such quadrilateral, comprise containing foursquare rectangle, trapezoidal, parallelogram preferred rectangle.As trapezoidal, its top is comparable following short, the also comparable length of side down.
Pellicle frame of the present invention, the both sides of preferred portion on top and following portion have specific thickness at above-below direction.
In addition, the section of pellicle frame bar of the present invention though have the depressed part that comprises convex curve, substitutes the shape that forms of curved portion of regulation by the polygon more than 6 dihedrals that are similar to this curve, also can be used as equipollent and is used equally.
With reference to Fig. 3, the section shape of pellicle frame bar is described.
(a) a section shape that is shaped as pellicle frame of the present invention, it is following shape, the top is 20mm with following parallel and area
2The depressed part that the substantial middle of the dual-side of following tetragonal substantially lengthwise rectangle has part-circular, and connect top portion 13 and following portion 15 by the narrow pars intermedia 16 in centre.
(b) in the shape, only the side at the side of tetragonal substantially rectangle has semicircular depressed part.
(c) in the shape, the depressed part that has quadrant shape at a side of rectangle, and straight line portion is parallel with the top.
(d) in the shape, the depressed part that has part-circular at the dual-side of rectangle, and straight line portion is all parallel with the top.
(e) in the shape, have 2 straight lines and the depressed part that curve constituted of concavity slightly from a side of rectangle.
From distortional stress is that little viewpoint is considered, in above-mentioned section shape example, preferred (a) reaches (d), more preferably (d).
In addition, also can be deformed into following shape:, have the depressed part that comprises convex curve from its dual-side or a side with parallelogram or trapezoidal as basic quadrilateral.
Pars intermedia is that the pars intermedia of on top portion and following portion has the narrow zone of width, but also can be as illustrated in this (c), near top portion or following portion place, pars intermedia wider width.
Pellicle frame of the present invention is suitably to design according to the shape of mask, and the flat shape of pellicle frame is ring-type or rectangular-shaped, square shape usually, and possesses the size and the shape that can cover the circuit pattern portion that is located at mask.The angle of the pellicle frame of rectangle (comprising square) can be carried out fillet and be handled.The preferably about 1～10mm of the height of pellicle frame, 2～7mm more preferably from about, preferred especially 3～6mm.The top of pellicle frame and bottom, the about 2mm of preferable width.
In addition, preferred top portion and/or following portion have the above thickness of 0.4mm at least, more preferably have 0.4～0.8mm.
The preferred 6mm of the sectional area of above-mentioned pellicle frame bar
2Below, be preferably 1～6mm
2, more preferably 3mm
2More than.As the present invention, the width of the pars intermedia by reducing pellicle frame can easily be realized so little sectional area.Thus,, can reduce distortional stress, consequently also can reduce the distortion of mask by reducing sectional area.
Substantially tetragonal area is made as 100%, and the sectional area proportion of pellicle frame bar can improve the flatness of framework, the flatness of mask more at least more, is preferred therefore.Particularly, preferred 25～85%, more preferably 35～75%, further preferred 40～60%.When in the scope that is in above-mentioned numerical value, not only can guarantee the intensity that framework is required, therefore and preferred can also improve the flatness of framework and mask.
Pellicle frame of the present invention, preferably using young's modulus is that the material of 1～80GPa constitutes.
As the above-mentioned material that constitutes pellicle frame, preferably can illustration aluminium, magnesium alloy, synthetic resin etc., more preferably use aluminium, magnesium alloy or polycarbonate resin, especially preferably use aluminium.
As aluminium, preferably can use in the past the aluminum alloy materials that uses, more preferably use JIS A7075, JIS A6061, JIS A5052 material etc., as long as have above-mentioned section shape, and can guarantee intensity, not special restriction as pellicle frame.Alligatoring preferably before the polymkeric substance tunicle is set, is carried out by sand blower or chemical grinding in the pellicle frame surface.Among the present invention, the method for the alligatoring on relevant this framework surface can adopt known method in the past.For aluminum alloy materials, preferably utilize stainless steel, emery, beaded glass etc. that blasting treatment is implemented on the surface, carry out chemical grinding by NaOH etc. again, with the method for surface coarsening.
Pellicle frame of the present invention, also can replace known Youngs such as aluminum alloy materials commonly used is the material of 69GPa, is that the material of 1～50GPa constitutes and preferably use young's modulus.As young's modulus is material in the above-mentioned scope, but the 2.5GPa of the 3GPa of the 44GPa of illustration magnesium alloy, acryl resin, polycarbonate resin.
When using the material of these low young's moduluses, even surpass 6mm at sectional area
2, be 12mm
2Situation under, still can reduce distortional stress, thereby can reduce the distortion of mask.
The sectional area of pellicle frame bar of the present invention is preferably 12mm
2Below.
Be made as 1～6mm at sectional area with pellicle frame
2The time, preferably be located at 3～6mm
2, use the material that hangs down young's modulus, by multiplier effect, can further reduce the distortion of mask more.
Among the present invention, preferably the flatness of pellicle frame is made as more than the 0 μ m below the 20 μ m, more preferably is made as below the above 10 μ m of 0 μ m.When the flatness of pellicle frame is good, when fitting in protective film on the mask, can reduce to put on the distortional stress of pellicle frame, its result can reduce the deflection of mask.
Need to prove, " flatness " of above-mentioned pellicle frame, be meant the height of 8 points of the position that by appropriateness separated of measurement on pellicle frame, preferably with 4 of each bight of pellicle frame and four limit central authorities 4 height of totally 8 points, calculate imaginary plane, deduct the value that the difference of minimum point is calculated by the peak the distance from this imaginary plane to each point.The flatness of pellicle frame can be measured by " laser displacement gauge with XY axle program platform ", uses homemade displacement machine among the present invention.
In the present invention, on the exposure negative bonding plane and/or pellicle bonding plane of pellicle frame, preferably carry out chamfered, more preferably carry out the C chamfered in the bight that interior lateral surface constituted of exposure negative bonding plane and/or pellicle bonding plane and pellicle frame.Need to prove that the C chamfering is meant that the face portion with the angle cutting intersection of 45 degree is the bight, the processing of being carried out.
Among the present invention, in order to absorb parasitic light, pellicle frame preferably has black oxidation tunicle and/or black polymer tunicle.In addition, be under the situation of aluminium alloy system at pellicle frame, especially preferably have the aluminium alloy system pellicle frame of the plating coated film of black anodizing tunicle (black alumite tunicle) and/or polymkeric substance.
Formation method as the black anodizing tunicle on pellicle frame surface, usually can adopt following method, with the basic treatment of NaOH etc. bathe carry out the processing in tens of seconds after, in the dilute sulphuric acid aqueous solution, carry out anodic oxidation, carry out black-dyeing, sealing of hole processing then, and the oxide film thereon of black is set from the teeth outwards.
In addition, polymkeric substance tunicle (polymer coating) can be by the whole bag of tricks setting, but can enumerate atomizing coating, electrostatic applications, electro-deposition coating etc. usually.Among the present invention, preferably be coated with the polymkeric substance tunicle is set by electro-deposition.
Relevant electro-deposition is coated with, and can use any of thermohardening type resin, ultraviolet curing resin.In addition, for above-mentioned each gel-type resin, also can use any coating of the coating of anionic electrodeposition deposition, cationic electrodeposition coating.Among the present invention, because of also requiring anti-ultraviolet property, so from stability, outward appearance and the intensity consideration of coating, the anionic electrodeposition deposition of preferred thermohardening type resin is coated with.
Lithographic pellicle of the present invention can be by in any of above-mentioned pellicle frame, as an end face of top by the pellicle bonding agent pellicle that is sticked, and in other end exposure negative bonding agent is set and makes as bottom.
There is no particular restriction for the kind of relevant pellicle, for example, can use employed noncrystalline fluoropolymer etc. in the known excimer laser.As the example of noncrystalline fluoropolymer, can enumerate Cytop (Asahi Glass (incorporated company) system trade name), Teflon (registered trademark) AF (E.I.Du Pont Company's system trade name) etc.These polymkeric substance also can be dissolved in the solvent as required when the making of pellicle and use, for example, and can be with suitable dissolvings such as fluorine series solvents.
Embodiment
Below, come particular instantiation and the present invention is described by embodiment.In addition, the example of " mask " conduct " exposure negative " in embodiment and the comparative example and putting down in writing, it equally also can be applicable to light shield (reticle) certainly.
Below, with reference to embodiment, specify the present invention, but the present invention not only is defined in following embodiment.
(embodiment 1)
Cytop CTX-S (Asahi Glass (incorporated company) system trade name) is dissolved in obtains 5% solution in the perfluorotributylamine, on silicon wafer, with 830rpm the wafer rotation is spread on the wafer this drips of solution by method of spin coating.Then, after at room temperature dry 30 minutes, carry out drying with 180 ℃ again, form uniform film.The aluminium frame that is coated with bonding agent is fitted on this film, only film is peeled off and made pellicle.Make the above-mentioned Cytop CTX-S film of required number, in embodiment 1～8 and comparative example, use.
Making aluminium alloy (hereinafter referred to as " Al alloy ") system, physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (a), and sectional area is 4.33mm for 2mm
2) pellicle frame.Need to prove that section shape is as follows, from being the two sides of the rectangle of 2.0mm highly for 3.5mm, width, with highly be 2.5mm, the degree of depth be 0.75mm size in the central portion to remove radius be the shape that the circular arc of 1.42mm gets.The thickness of top portion and following portion is 0.5mm in their end, and the width of central zone portion also is 0.5mm.In addition, impose the C chamfered in four bights of pellicle frame.
Measure the flatness of this framework from being coated with mask bonding agent one side, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminium alloy system frame, cut off the film of framework periphery, make protective film.
With the protective film that completes, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.27 μ m.In addition, though the maximum distortion scope of mask has changed 48nm, compare with comparative example and can suppress to be low-down value.In addition, table 1 has gathered the measurement result of flatness and maximum distortion scope.
Need to prove that the flatness of mask uses the UltraFlat of Tropel company to record.In addition, the flatness of framework uses the laser displacement gauge with XY axle program platform to record.
In addition, " the maximum distortion scope of mask " be meant, measures the shape 2 times of mask, in the difference of the height of mask each point just/the absolute value sum of minus side maximum variable quantity separately.In addition, causing mask when distortion because of the applying protective film, even in the unchanged situation of flatness, the maximum distortion scope still is a higher value sometimes, so as the index of the distortion/deformation of mask, maximum distortion model figure is more more effective than flatness.
(embodiment 2)
The aluminium alloy system of making, physical dimension are that 149mm * 115mm * 3.0mm, top and following width are that (section shape is shown in Fig. 3 (a), and sectional area is 3.79mm for 2mm
2) pellicle frame.In addition, section shape is as follows, have from being the two sides of the rectangle of 2.0mm highly for 3.0mm, width, with highly be 2.0mm, the degree of depth be 0.75mm size in the central portion to remove radius be the shape that the circular arc of 1.042mm gets.Top and following thickness are 0.5mm in their end, and the width of central zone portion also is 0.5mm.Measure the flatness of this framework from being coated with mask bonding agent one side, flatness is 10 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminium alloy system frame, cut off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.26 μ m.In addition, though the maximum distortion scope has changed 36nm, compare with comparative example and can suppress to be low-down value.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 3)
Making magnesium alloy (hereinafter referred to as " Mg alloy ") system, physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (a), and sectional area is 4.33mm for 2mm
2) the identical pellicle frame of section shape and embodiment 1.Measure the flatness of this framework from being coated with mask bonding agent one side, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of magnesium alloy system frame, cut off the film of framework periphery, make protective film.
With the protective film that completes, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.24 μ m.In addition, though the maximum distortion scope of mask has changed 38nm, compare with comparative example and can suppress to be low-down value.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 4)
Making polycarbonate resin (hereinafter referred to as " PC resin ") system, physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (a), and sectional area is 4.33mm for 2mm
2) the identical pellicle frame of section shape and embodiment 1.Measure the flatness of this framework from being coated with mask bonding agent one side, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of polycarbonate resin frame, cut off the film of framework periphery, make protective film.
With the protective film that completes, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness is that 0.25 μ m does not change.In addition, though the maximum distortion scope of mask has changed 27nm, compare with comparative example and can suppress to be low-down value.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 5)
The aluminium alloy system of making and physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (b), and sectional area is 4.55mm for 2mm
2) pellicle frame.Need to prove that section shape is as follows, have from being a side of the rectangle of 2.0mm highly for 3.5mm, width, with highly be 2.5mm, the degree of depth be 1.25mm size in the central portion to remove radius be the shape that the circular arc of 1.25mm gets.The thickness of top portion and following portion is 0.5mm in their end, and the width of central zone portion is 0.75mm.Measure the flatness of this framework from a side that is coated with the mask bonding agent, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminum alloy frame, cut off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.27 μ m.In addition, though the maximum distortion scope has changed 52nm, compare the value that can suppress with comparative example for lower.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 6)
The aluminium alloy system of making and physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (c), and sectional area is 5.23mm for 2mm
2) pellicle frame.Need to prove that section shape is as follows, have from being a side of the rectangle of 2.0mm highly for 3.5mm, width, with highly be 1.5mm, deeply the size of degree of serving as 1.5mm to remove radius be the shape that the quadrant arc of 1.5mm gets.The thickness of top portion, at one end portion is 0.5mm.Measure the flatness of this framework from a side of coating mask bonding agent, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminium alloy system frame, cut off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.28 μ m.In addition, though the maximum distortion range 63nm, compare with comparative example and can suppress to be low-down value.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 7)
The aluminium alloy system of making, physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (d), and sectional area is 3.92mm for 2mm
2) pellicle frame.Need to prove, section shape is as follows, have from being a side of the rectangle of 2.0mm highly for 3.5mm, width, highly being that 2.5mm, the degree of depth are that the size of 0.9mm is removed the one-sided circular arc that radius is 3.92mm, and from relative side with same size remove upside down identical 3.92mm one-sided circular arc and shape.Top and following thickness are 0.5mm in their end.Measure the flatness of this framework from a side of coating mask bonding agent, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminum alloy frame, cut off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness is 0.26 μ m.In addition, though the maximum distortion range 37nm, compare the value that can suppress for lower with comparative example.In addition, table 1 has gathered the measurement result of flatness.
(embodiment 8)
The polycarbonate system of making and physical dimension are that 149mm * 122mm * 3.5mm, top and following width are that (section shape is shown in Fig. 3 (d), and sectional area is 3.92mm for 2mm
2) the identical pellicle frame of section shape and embodiment 7.Need to prove that measure the flatness of this framework from a side of coating mask bonding agent, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of polycarbonate system frame, cuts off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.25 μ m and does not change.In addition, though the maximum distortion range 26nm, compare the value that can suppress for lower with comparative example.In addition, table 1 has gathered the measurement result of flatness.
(comparative example)
The aluminium alloy system of making, physical dimension are that 149mm * 122mm * 3.5mm, width are that (section shape is a rectangle to 2mm, and sectional area is 7.00mm
2) pellicle frame.Measure the flatness of this framework from a side that is coated with the mask bonding agent, flatness is 20 μ m.At the end face coating mask bonding agent of this framework, at other end coated film bonding agent.Then, the pellicle of before having peeled off is fitted in the film bonding agent side of aluminium frame, cut off the film of framework periphery, make protective film.
With the protective film of making, fitting in the length of side with load 20kg is that the square and flatness of 142mm is on the mask of 0.25 μ m.Then, measure the flatness with the mask of protective film once more, flatness becomes 0.29 μ m.In addition, the maximum distortion range 100nm.
Gather above result, and shown in the following table 1.
Claims (12)
1. a pellicle frame is characterized in that, the section of pellicle frame bar is for and area parallel with bottom on top is 20mm
2Following tetragonal at least one side has the shape of the depressed part that comprises curve.
2. pellicle frame according to claim 1, wherein, described curve is from by selecting the convex curve that circle, ellipse, hyperbolic curve and para-curve constituted.
3. pellicle frame according to claim 1, wherein, described depressed part only is made of convex curve.
4. pellicle frame according to claim 1, wherein, described depressed part comprises at least one straight line.
5. pellicle frame according to claim 4, wherein, described depressed part comprises at least one straight line parallel with described top.
6. pellicle frame according to claim 1, wherein, the sectional area of described pellicle frame bar is 1mm
2Above 6mm
2Below.
7. pellicle frame according to claim 1, it is made of the material of young's modulus by 1～80GPa.
8. pellicle frame according to claim 1, its by be selected from aluminium alloy, magnesium alloy, and polycarbonate resin in material constitute.
9. pellicle frame according to claim 1, it is made of aluminium alloy.
10. pellicle frame according to claim 1, wherein, described tetragonal area is 4mm
2Above 20mm
2Below.
11. pellicle frame according to claim 1, wherein, the flatness of pellicle frame is below the above 20 μ m of 0 μ m.
12. a lithographic pellicle, it is attached at an end face of each described pellicle frame in the claim 1 to 11 by the pellicle bonding agent with pellicle, and in the other end exposure negative bonding agent is set.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009-149777 | 2009-06-24 | ||
| JP2009149777A JP5411596B2 (en) | 2009-06-24 | 2009-06-24 | Pellicle frame and lithography pellicle |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101930167A true CN101930167A (en) | 2010-12-29 |
| CN101930167B CN101930167B (en) | 2013-05-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2010102140925A Active CN101930167B (en) | 2009-06-24 | 2010-06-24 | Pellicle frame and lithographic pellicle |
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| Country | Link |
|---|---|
| US (1) | US8221945B2 (en) |
| EP (1) | EP2267527B1 (en) |
| JP (1) | JP5411596B2 (en) |
| KR (1) | KR101780064B1 (en) |
| CN (1) | CN101930167B (en) |
| HK (1) | HK1148825A1 (en) |
| TW (1) | TWI471685B (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5411595B2 (en) * | 2009-06-24 | 2014-02-12 | 信越化学工業株式会社 | Pellicle frame and lithography pellicle |
| JP5481106B2 (en) * | 2009-06-24 | 2014-04-23 | 信越化学工業株式会社 | Pellicle frame and lithography pellicle |
| JP4974389B2 (en) * | 2009-10-30 | 2012-07-11 | 信越化学工業株式会社 | Pellicle frame for lithography and pellicle for lithography |
| JP4889778B2 (en) * | 2009-10-02 | 2012-03-07 | 信越化学工業株式会社 | Pellicle manufacturing method and lithography pellicle |
| KR101990345B1 (en) | 2009-10-02 | 2019-06-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Method of producing pellicle |
| KR20130067325A (en) | 2011-10-07 | 2013-06-24 | 삼성전자주식회사 | Pellicles having a buffer zone and photomask structures having the pellicle thereon |
| JP6156998B2 (en) * | 2013-10-22 | 2017-07-05 | 信越化学工業株式会社 | Pellicle |
| KR102242562B1 (en) * | 2014-09-04 | 2021-04-20 | 삼성전자주식회사 | Apparatus for protecting extreme ultra violet(EUV) mask, and EUV exposure apparatus comprising the same |
| JP6304884B2 (en) | 2014-09-22 | 2018-04-04 | 信越化学工業株式会社 | Pellicle pasting method |
| JP6293041B2 (en) | 2014-12-01 | 2018-03-14 | 信越化学工業株式会社 | Pellicle frame and pellicle using the same |
| JP6347741B2 (en) | 2014-12-25 | 2018-06-27 | 信越化学工業株式会社 | Pellicle |
| KR102186010B1 (en) | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | EUV pellicle structure, and method for manufacturing same |
| JP6607574B2 (en) | 2016-08-24 | 2019-11-20 | 信越化学工業株式会社 | Pellicle frame and pellicle |
| JP7139133B2 (en) | 2018-04-03 | 2022-09-20 | 信越化学工業株式会社 | Pellicle frame, pellicle, and method for manufacturing pellicle frame |
| TWI670562B (en) * | 2018-06-21 | 2019-09-01 | 美商微相科技股份有限公司 | Photomask protection component structure |
| JP6975702B2 (en) * | 2018-11-30 | 2021-12-01 | 信越化学工業株式会社 | Pellicle frame and pellicle |
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- 2010-06-23 TW TW99120416A patent/TWI471685B/en active
- 2010-06-23 KR KR1020100059529A patent/KR101780064B1/en active IP Right Grant
- 2010-06-23 EP EP10166975.2A patent/EP2267527B1/en active Active
- 2010-06-24 CN CN2010102140925A patent/CN101930167B/en active Active
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Also Published As
| Publication number | Publication date |
|---|---|
| KR101780064B1 (en) | 2017-10-10 |
| US8221945B2 (en) | 2012-07-17 |
| TWI471685B (en) | 2015-02-01 |
| CN101930167B (en) | 2013-05-15 |
| EP2267527A2 (en) | 2010-12-29 |
| JP2011007935A (en) | 2011-01-13 |
| KR20100138822A (en) | 2010-12-31 |
| JP5411596B2 (en) | 2014-02-12 |
| EP2267527A3 (en) | 2013-04-03 |
| TW201109839A (en) | 2011-03-16 |
| US20100330467A1 (en) | 2010-12-30 |
| EP2267527B1 (en) | 2021-05-12 |
| HK1148825A1 (en) | 2011-09-16 |
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