CN101924529B - 压电谐振器结构 - Google Patents
压电谐振器结构 Download PDFInfo
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CN201010267632A CN101924529B (zh) | 2010-08-31 | 2010-08-31 | 压电谐振器结构 |
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Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
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CN103607178B (zh) * | 2013-09-17 | 2016-10-05 | 诺思(天津)微系统有限公司 | 薄膜体波谐振器及提高其品质因数的方法 |
CN103472129B (zh) * | 2013-09-17 | 2017-01-11 | 天津大学 | 用于流体环境检测的谐振传感器 |
DE102017117870B3 (de) * | 2017-08-07 | 2018-12-27 | RF360 Europe GmbH | BAW-Resonator mit reduzierten Störmoden und erhöhtem Gütefaktor |
DE102017117869A1 (de) * | 2017-08-07 | 2019-02-07 | RF360 Europe GmbH | BAW-Resonator mit reduzierten Verlusten, HF-Filter mit einem BAW-Resonator und Verfahren zum Herstellen eines BAW-Resonators |
DE102017118804B3 (de) | 2017-08-17 | 2018-11-15 | RF360 Europe GmbH | Akustischer Resonator mit hohem Q |
DE102018107496B3 (de) * | 2018-03-28 | 2019-07-11 | RF360 Europe GmbH | Volumenschallwellenresonatorvorrichtung und Verfahren zu deren Herstellung |
CN111193485B (zh) * | 2018-11-14 | 2023-10-27 | 天津大学 | 具有粗糙面的体声波谐振器、滤波器和电子设备 |
CN111355466B (zh) * | 2018-12-20 | 2024-09-17 | 天津大学 | 具有多梁檐空隙的体声波谐振器、滤波器和电子设备 |
KR102272592B1 (ko) * | 2019-01-31 | 2021-07-05 | 삼성전기주식회사 | 체적 음향 공진기 |
CN111010099B (zh) * | 2019-03-02 | 2024-08-20 | 天津大学 | 带凹陷结构和凸结构的体声波谐振器、滤波器及电子设备 |
CN111010108A (zh) * | 2019-03-02 | 2020-04-14 | 天津大学 | 带凹陷和空气翼结构的体声波谐振器、滤波器及电子设备 |
CN111010100A (zh) * | 2019-03-02 | 2020-04-14 | 天津大学 | 压电层带凹陷结构的体声波谐振器、滤波器及电子设备 |
CN110113026B (zh) * | 2019-05-22 | 2021-04-02 | 武汉敏声新技术有限公司 | 一种二维兰姆波谐振器 |
CN111010140A (zh) * | 2019-05-31 | 2020-04-14 | 天津大学 | 突起结构内侧设置空隙结构的谐振器及电子设备 |
CN111030636A (zh) * | 2019-07-15 | 2020-04-17 | 天津大学 | 带声学阻抗失配结构的体声波谐振器、滤波器及电子设备 |
CN112994639A (zh) * | 2019-12-16 | 2021-06-18 | 中芯集成电路(宁波)有限公司 | 一种薄膜压电声波谐振器及其制造方法及滤波器 |
CN111669141B (zh) * | 2020-05-29 | 2021-11-02 | 见闻录(浙江)半导体有限公司 | 一种体声波谐振器的电极结构及制作工艺 |
CN111884620A (zh) * | 2020-07-10 | 2020-11-03 | 瑞声科技(南京)有限公司 | 谐振器 |
CN112968685B (zh) * | 2021-02-05 | 2023-04-25 | 武汉敏声新技术有限公司 | 带有沟槽结构的体声波谐振器 |
CN113411061B (zh) * | 2021-06-10 | 2022-09-09 | 天津大学 | 基于体声波谐振器寄生模式的三维微阵列成型装置及方法 |
CN114826191B (zh) * | 2022-05-23 | 2023-11-07 | 武汉敏声新技术有限公司 | 一种薄膜体声波谐振器 |
CN115603697B (zh) * | 2022-09-21 | 2024-01-23 | 见闻录(浙江)半导体有限公司 | 一种声波谐振器及其制造方法、滤波器和电子设备 |
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CN1541447A (zh) * | 2001-08-14 | 2004-10-27 | 皇家飞利浦电子股份有限公司 | 带有体波谐振器的滤波系统 |
CN1682442A (zh) * | 2002-09-12 | 2005-10-12 | 皇家飞利浦电子股份有限公司 | 具有抑制体声波滤波器中通带波纹的装置的体声波谐振器 |
CN1705226A (zh) * | 2004-06-03 | 2005-12-07 | 索尼株式会社 | 薄膜体音响谐振器及薄膜体音响谐振器的制造方法 |
CN1864326A (zh) * | 2003-10-06 | 2006-11-15 | 皇家飞利浦电子股份有限公司 | 谐振器结构及其制造方法 |
US7280007B2 (en) * | 2004-11-15 | 2007-10-09 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Thin film bulk acoustic resonator with a mass loaded perimeter |
CN101630946A (zh) * | 2009-08-27 | 2010-01-20 | 浙江大学 | 一种薄膜体声波谐振器及其制备方法 |
Family Cites Families (1)
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US7388454B2 (en) * | 2004-10-01 | 2008-06-17 | Avago Technologies Wireless Ip Pte Ltd | Acoustic resonator performance enhancement using alternating frame structure |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1541447A (zh) * | 2001-08-14 | 2004-10-27 | 皇家飞利浦电子股份有限公司 | 带有体波谐振器的滤波系统 |
CN1682442A (zh) * | 2002-09-12 | 2005-10-12 | 皇家飞利浦电子股份有限公司 | 具有抑制体声波滤波器中通带波纹的装置的体声波谐振器 |
CN1864326A (zh) * | 2003-10-06 | 2006-11-15 | 皇家飞利浦电子股份有限公司 | 谐振器结构及其制造方法 |
CN1705226A (zh) * | 2004-06-03 | 2005-12-07 | 索尼株式会社 | 薄膜体音响谐振器及薄膜体音响谐振器的制造方法 |
US7280007B2 (en) * | 2004-11-15 | 2007-10-09 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Thin film bulk acoustic resonator with a mass loaded perimeter |
CN101630946A (zh) * | 2009-08-27 | 2010-01-20 | 浙江大学 | 一种薄膜体声波谐振器及其制备方法 |
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Effective date of registration: 20170801 Address after: Five street 300462 Tianjin economic and Technological Development Zone Xinye No. 27 Patentee after: ROFS MICROSYSTEM(TIANJIN) Co.,Ltd. Address before: 100026 Beijing City, Chaoyang District Jintai in a 14-5-303 Co-patentee before: Zhang Hao Patentee before: Pang Wei |
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Commission number: 4W104735 Conclusion of examination: Claim No. 201010267632.6 of the patent for invention No. 1-2 shall be void and shall continue to be valid on the basis of claim 3-15. Decision date of declaring invalidation: 20170120 Decision number of declaring invalidation: 31024 Denomination of invention: Piezoelectric resonator structure Granted publication date: 20121010 Patentee: ROFS MICROSYSTEM(TIANJIN) Co.,Ltd.|Zhang Hao |
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Address after: No. 27 Xinye Fifth Street, Tianjin Binhai New Area Economic and Technological Development Zone, 300462 Patentee after: ROFS MICROSYSTEM(TIANJIN) Co.,Ltd. Address before: 300462 27 new business five street, Tianjin economic and Technological Development Zone Patentee before: ROFS MICROSYSTEM(TIANJIN) Co.,Ltd. |
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