CN101915871B - MEMS (Micro Electronic Mechanical System) clamped beam type online microwave power sensor and production method thereof - Google Patents
MEMS (Micro Electronic Mechanical System) clamped beam type online microwave power sensor and production method thereof Download PDFInfo
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- CN101915871B CN101915871B CN2010102238105A CN201010223810A CN101915871B CN 101915871 B CN101915871 B CN 101915871B CN 2010102238105 A CN2010102238105 A CN 2010102238105A CN 201010223810 A CN201010223810 A CN 201010223810A CN 101915871 B CN101915871 B CN 101915871B
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Abstract
The invention discloses an MEMS (Micro Electronic Mechanical System) clamped beam type online microwave power sensor and a production method thereof. The microwave power sensor comprises a gallium arsenide substrate, a mainline CPW (Co-Planer Waveguide), a subline CPW, an MEMS clamped beam type structure and a terminal microwave power monitoring system, wherein the MEMS clamped beam type structure comprises a clamped beam and an anchor area; the clamped beam stretches across the mainline CPW signal line, and both ends of the clamped beam are fixed on the anchor area; the anchor are is connected with the terminal microwave power monitoring system through the subline CPW signal line rather than the CPW ground line; and a drive electrode is arranged below the clamped beam type structure. The MEMS clamped beam type online microwave power sensor not only has the advantages of a terminal type microwave power sensor, such as low loss and high sensitivity, but also has the advantages of online microwave power measurement, realization of monitoring and not monitoring, integration of the online microwave power sensors with various kinds of coupling factors, and compatibility with the gallium arsenide monolithic microwave integrated circuit.
Description
Technical field
The present invention relates to microelectron-mechanical (hereinafter to be referred as MEMS), relate in particular to online microwave power detector of MEMS clamped beam formula and preparation method thereof.
Background technology
In research of microwave technology, microwave power is an important parameter that characterizes the microwave signal characteristic, and the measurement of microwave power has consequence in applications of wireless technology.Existing microwave power detector is based on the terminal power sensor of diode, thermistor and thermoelectric pile, and they have low-loss and highly sensitive advantage, yet its maximum shortcoming is a full consumption input signal power when measuring microwave power.Development along with microelectric technique; Modern PCS Personal Communications System and radar system not only require microwave power detector microwave signal when the power measurement process to be still available; It is online microwave power measurement; And microwave power detector proposed multi-purpose requirement, as realizing monitoring and not monitoring the integrated of two states and the online power sensor of multiple coupled degree.In recent years,, and the MEMS fixed beam structure carried out deep research, made based on the MEMS technology and realize that the online microwave power detector of clamped beam formula three degrees of coupling of above-mentioned functions becomes possibility along with the fast development of MEMS technology.
Summary of the invention
Goal of the invention: in order to overcome the deficiency that exists in the prior art; The present invention provides a kind of online microwave power detector and preparation method based on technological clamped beam formula three degrees of coupling of MEMS; Through control MEMS clamped beam driving voltage, make this microwave power detector realize monitoring and not monitoring two states; Through the width of co-planar waveguide (hereinafter to be referred as CPW) signal wire below MEMS clamped beam and the respective beam of design different in width, change the size of these MEMS clamped beam degrees of coupling, realize online microwave power detector integrated of the different degrees of coupling.
Technical scheme: for realizing above-mentioned purpose, the technical scheme that the present invention adopts is:
The online microwave power detector of a kind of MEMS clamped beam formula; Comprise gallium arsenide substrate, CPW, MEMS clamped beam formula structure and terminal microwave power monitoring system: said CPW comprises main line CPW signal wire, by-pass CPW signal wire and CPW ground wire; Said main line CPW signal wire and CPW ground wire constitute main line CPW, and said by-pass CPW signal wire and CPW ground wire constitute by-pass CPW; Said MEMS clamped beam formula structure comprises clamped beam and anchor district; Said clamped beam is across above main line CPW signal wire; The two ends of clamped beam are fixed in the anchor district, and said anchor district is connected with terminal microwave power monitoring system through by-pass CPW signal wire rather than CPW ground wire; Said fixed beam structure below is provided with drive electrode.
Said CPW is mainly used in the transmission that realizes microwave signal, adopts gold copper-base alloy.Realize treating the input and output of the microwave signal of power scale through main line CPW, realize being coupled out a certain proportion of main line CPW microwave power on the microwave power monitoring system of terminal by fixed beam structure through by-pass CPW.
Through to the setting of the width of clamped beam, can design different coupling degree value (being the microwave power number percent that by-pass CPW is coupled to) from main line CPW with the width of the main line CPW signal wire that is positioned at corresponding clamped beam below.
Through whether the power supply of drive electrode being controlled the control that can realize to clamped beam DOWN or UP state; When clamped beam is in the UP state; Be that clamped beam and main line CPW signal wire are contactless; This moment, clamped beam was coupled microwave power to by-pass CPW hardly from main line CPW, thereby main line CPW was not carried out power monitoring; When clamped beam was in the DOWN state, promptly clamped beam contacted with the CPW signal wire, and this moment, clamped beam was coupled the microwave power of corresponding proportion in by-pass CPW from main line CPW, thereby main line CPW is carried out power monitoring.
The number of said clamped beam formula structure is three, adopts gold copper-base alloy.The clamped beam width of different clamped beam formula structures can be different; The main line CPW signal wire width of corresponding clamped beam below also can be inequality; Can realize the different coupling degree through each clamped beam width with corresponding the different of main line CPW signal wire width, each clamped beam formula structure has independent driving electrodes separately.
The input end part of general by-pass CPW signal wire becomes vertical relation with corresponding main line CPW signal wire.
The main line CPW signal wire and the drive electrode surface coverage of said clamped beam below have the silicon nitride medium layer.
The place that said CPW ground wire is cut off can realize connecting through air bridges.
Said terminal microwave power monitoring system comprises terminal resistance and the thermoelectric pile that absorbs the terminal resistance heat, and the output terminal connecting terminal resistance of said by-pass CPW signal wire, thermoelectric pile is near terminal resistance, but is not connected with terminal resistance.
Terminal resistance adopts tantalum-nitride material to process, and absorbs and is coupled to the microwave power on the by-pass CPW by the MEMS clamped beam from main line CPW, and be converted into heat fully; After absorbing this heat near the end (being the hot junction) of the thermoelectric pile of terminal resistance, cause the rising of absorption edge temperature, still keep environment temperature away from the end (being cold junction) of the thermoelectric pile of terminal resistance; Because the two ends temperature is different; According to the Seebeck effect, produce the output of thermoelectrical potential, realize monitoring to microwave power.
Said thermoelectric pile can be made up of four thermopairs, and said thermopair comprises semiconductor thermocouple arm and metal thermocouple arm, adopts gold and lightly doped GaAs material to constitute.
In order to improve heat by the efficient of terminal resistance to the transmission of the hot junction of thermoelectric pile; And then the temperature difference at raising thermoelectric pile two ends; To improve the sensitivity of microwave power detector, can the gallium arsenide substrate etching attenuate below the hot junction of terminal resistance and thermoelectric pile be formed the substrate film structure.Terminal resistance and thermoelectric pile are covered by the silicon nitride medium layer, and its effect is that the protection terminal resistance is connected with the circuit of by-pass CPW output terminal and thermoelectric pile.
A kind of method for preparing the online microwave power detector of MEMS clamped beam formula, said method comprises the steps:
A, preparation gallium arsenide substrate: select the semi-insulating GaAs substrate of extension for use, wherein extension N
+Gallium arsenide be doped to heavy doping, general concentration is more than or equal to 10
18Cm
-3
B, photoetching are also isolated the N of extension
+Gallium arsenide, the figure and the ohmic contact regions of the semiconductor thermocouple arm of formation thermoelectric pile;
C, anti-carve the N that forms by the figure of the semiconductor thermocouple arm of thermoelectric pile
+Gallium arsenide, (general concentration is 10 to form light dope
18Cm
-3Below) the semiconductor thermocouple arm of thermoelectric pile;
D, photoetching: removal will keep the local photoresist of gold germanium nickel/gold;
E, sputter gold germanium nickel/gold;
F, peel off, form the metal thermocouple arm of thermoelectric pile;
G, photoetching: removal will keep the local photoresist of tantalum nitride;
H, sputter tantalum nitride;
I, peel off;
J, photoetching: removal will keep the photoresist in the place of ground floor gold;
K, evaporation ground floor gold;
L, peel off, form main line CPW and by-pass CPW, anchor district and drive electrode;
M, anti-carve tantalum nitride, form the terminal resistance that is connected with by-pass CPW signal wire output terminal, its square resistance is 25 Ω/;
N, deposit silicon nitride: with plasma-enhanced chemical vapour deposition technology grown silicon nitride dielectric layer;
O, photoetching and etch silicon nitride dielectric layer: keep the silicon nitride on clamped beam below main line CPW signal wire and drive electrode, terminal resistance and the thermoelectric pile;
P, deposit and photoetching polyimide sacrificial layer: coating polyimide sacrifice layer on gallium arsenide substrate; The photoetching polyimide sacrificial layer only keeps the sacrifice layer of clamped beam below;
Q, evaporation titanium/gold/titanium: the down payment that evaporation is used to electroplate;
R, photoetching: removal will be electroplated local photoresist;
S, electrogilding;
T, removal photoresist: remove and need not electroplate local photoresist;
U, anti-carve titanium/gold/titanium, the corrosion down payment forms main line CPW and by-pass CPW and MEMS clamped beam;
V, with this gallium arsenide substrate thinning back side, generally in 50 μ m and 200 mu m ranges;
W, back side photoetching: remove the photoresist that forms the membrane structure place at the gallium arsenide back side;
The gallium arsenide substrate of the below, hot junction of X, etching attenuate terminal resistance and thermoelectric pile forms membrane structure;
Y, release polyimide sacrificial layer: developer solution soaks, and removes the polyimide sacrificial layer under the MEMS clamped beam, and deionized water soaks slightly, the absolute ethyl alcohol dehydration, and normal temperature volatilizees down, dries.
Beneficial effect: the online microwave power detector of MEMS clamped beam formula of the present invention; The advantage that not only has the terminal type microwave power detector; Like low-loss and high sensitivity, and have online microwave power measurement, realize monitoring and do not monitor the integrated and compatible advantage of the online microwave power detector of two states, the multiple degree of coupling with GaAs single-chip microwave integration circuit.
Description of drawings
Fig. 1 is a structural representation of the present invention;
Fig. 2 is the enlarged diagram of I portion among Fig. 1;
Fig. 3 be among Fig. 2 A-A to sectional view;
Fig. 4 is the enlarged diagram of II portion among Fig. 1.
Embodiment
Below in conjunction with accompanying drawing the present invention is done explanation further.
Be depicted as the online microwave power detector of a kind of MEMS clamped beam formula like Fig. 1,2,3 and 4, the terminal microwave power monitoring system 6 (frame of broken lines part among Fig. 1) that on gallium arsenide substrate 1, is provided with CPW, three MEMS clamped beam formula structures and constitutes by terminal resistance 13 and thermoelectric pile.
CPW comprises main line CPW signal wire 7, by-pass CPW signal wire 8 and CPW ground wire 9; Said main line CPW signal wire 7 constitutes main line CPW with CPW ground wire 9; Said by-pass CPW signal wire 8 constitutes by-pass CPW with CPW ground wire 9, and the ground wire 9 that is cut off is connected through air bridges 17.
Said MEMS clamped beam formula structure comprises clamped beam 3 and anchor district 12; Said clamped beam 3 is across above main line CPW signal wire 7; The two ends of clamped beam 3 are fixed in the anchor district 12; Said anchor district 12 is connected with terminal resistance 13 through by-pass CPW signal wire 8 rather than CPW ground wire 9, the input end part of by-pass CPW signal wire 8 and corresponding 7 one-tenth vertical relations of main line CPW signal wire.Drive electrode 10 is arranged on clamped beam 3 belows, and each clamped beam formula structure below is provided with independent driving electrodes 10 separately, and drive electrode 10 provides electricity to drive through press welding block 18.The main line CPW signal wire 7 of clamped beam 3 belows is covered by silicon nitride medium layer 11 with drive electrode 10.
The width of fixed beam structure 3 through designing three kinds of different in width and respective beam below main line CPW signal wire 7 can set the size of clamped beam 3 degree of coupling when the DOWN attitude, and clamped beam 3 does not have almost power to be coupled out from main line CPW when the UP attitude; Whether supplying power through the drive electrode 10 of clamped beam 3 is used for controlling fixed beam structure and whether is in DOWN or UP state, and whether corresponding main line CPW goes up certain proportion power and be coupled out by clamped beam.
Online microwave power detector of the present invention is through the clamped beam 3 of three kinds of different in width of design and the width of respective beam below main line CPW signal wire 7; Design the microwave power detector that degree of coupling size is respectively three kinds of degrees of coupling of 1%, 5% and 10%, and realized online microwave power detector integrated of three kinds of degrees of coupling.Microwave signal 2 to be measured is transmitted on main line CPW; When the drive electrode 10 of three clamped beam formula structures does not all apply driving voltage; Then these three kinds of clamped beam formula structures all are in the UP state; Microwave signal power to be measured is not coupled out certain proportion by clamped beam formula structure to by-pass CPW from main line CPW, and the microwave power detector of this moment is in not monitoring state.The drive electrode 10 that when the degree of coupling is 1% clamped beam formula structure is applied in driving voltage; The degree of coupling is that 5% and 10% clamped beam formula structure all is not applied to driving voltage; The degree of coupling is that 1% clamped beam 3 is in the DOWN state so; Microwave signal power degree of being coupled then to be measured is that 1% clamped beam formula structure is coupled certain proportion to by-pass CPW from main line CPW; The watt level that is coupled out accounts for 1% of microwave signal power to be measured; Yet the degree of coupling is 5% and 10% clamped beam formula structure all is not coupled out corresponding proportion to microwave signal power to be measured to by-pass CPW from main line CPW because of all applying driving voltage, is that microwave power on the by-pass CPW that connects of 1% clamped beam formula structure is absorbed by its relevant terminal resistance 13 fully and transfers heat in the degree of coupling, absorbs this heat near the thermoelectric pile of this terminal resistance 13; There is the temperature difference in the hot cold two ends that cause thermoelectric pile; Thereby on thermoelectric pile, produce the output of thermoelectrical potential, realize the indirect measurement of microwave signal power to be measured, so the degree of coupling is that 1% the online microwave power detector of clamped beam formula structure is in monitoring state; In like manner, can realize respectively that the degree of coupling is that 5% or 10% the online microwave power detector of clamped beam formula structure is in monitoring state.
The method for preparing the online microwave power detector of above-mentioned MEMS clamped beam formula is following:
A, preparation gallium arsenide substrate 1: select the semi-insulating GaAs substrate of extension for use, wherein extension N
+The doping content of gallium arsenide is 10
18Cm
-3, its square resistance is 100～130 Ω/;
B, photoetching are also isolated the N of extension
+Gallium arsenide, the figure and the ohmic contact regions of the semiconductor thermocouple arm 14 of formation thermoelectric pile;
C, anti-carve the N that forms by the figure of the semiconductor thermocouple arm 14 of thermoelectric pile
+Gallium arsenide, forming doping content is 10
17Cm
-3The semiconductor thermocouple arm 14 of thermoelectric pile;
D, photoetching: removal will keep the local photoresist of gold germanium nickel/gold;
E, sputter gold germanium nickel/gold, its thickness are
altogether
F, peel off, form the metal thermocouple arm 15 of thermoelectric pile;
G, photoetching: removal will keep the local photoresist of tantalum nitride;
H, sputter tantalum nitride, making its thickness is 1 μ m;
I, peel off;
J, photoetching: removal will keep the photoresist in the place of ground floor gold;
K, evaporation ground floor gold, making its thickness is 0.3 μ m;
L, peel off, form main line CPW and by-pass CPW, anchor district 12 and drive electrode 10;
M, anti-carve tantalum nitride, form the terminal resistance 13 that is connected with by-pass CPW signal wire 8 output terminals, its square resistance is 25 Ω/;
N, deposit silicon nitride: with plasma-enhanced chemical vapour deposition technology growth
thick silicon nitride medium layer 11;
O, photoetching and etch silicon nitride dielectric layer 11: keep the silicon nitride 11 on clamped beam 3 below main line CPW signal wires 7 and drive electrode 10, terminal resistance 13 and the thermoelectric pile;
P, deposit and photoetching polyimide sacrificial layer: on gallium arsenide substrate 1, apply the thick polyimide sacrificial layer of 1.6 μ m; Pit is filled up in requirement, and the thickness of polyimide sacrificial layer has determined MEMS clamped beam 3 and its below in the distance between the silicon nitride medium layer 11 on the signal wire 7 of main line CPW; The photoetching polyimide sacrificial layer only keeps the sacrifice layer of clamped beam 3 belows;
Q, evaporation titanium/gold/titanium, make its thickness be 500/1500/
the evaporation down payment that is used to electroplate;
R, photoetching: removal will be electroplated local photoresist;
S, electrogilding, its thickness are 2 μ m;
T, removal photoresist: remove and need not electroplate local photoresist;
U, anti-carve titanium/gold/titanium, the corrosion down payment forms main line CPW and by-pass CPW and MEMS clamped beam 3;
V, with this gallium arsenide substrate 1 thinning back side to 100 μ m;
W, back side photoetching: remove the photoresist that forms membrane structure 16 places at the gallium arsenide back side;
The gallium arsenide substrate of below, the hot junction of X, etching attenuate terminal resistance 13 and thermoelectric pile forms membrane structure 16: etching the substrate thickness of 80 μ m, keep the membrane structure of 20 μ m;
Y, release polyimide sacrificial layer: developer solution soaks, and removes the polyimide sacrificial layer under the MEMS clamped beam 3, and deionized water soaks slightly, the absolute ethyl alcohol dehydration, and normal temperature volatilizees down, dries.
The above only is a preferred implementation of the present invention; Be noted that for those skilled in the art; Under the prerequisite that does not break away from the principle of the invention, can also make some improvement and retouching, these improvement and retouching also should be regarded as protection scope of the present invention.
Claims (6)
1. online microwave power detector of MEMS clamped beam formula, it is characterized in that: said microwave power detector comprises gallium arsenide substrate (1), CPW, MEMS clamped beam formula structure and terminal microwave power monitoring system (6); Said CPW comprises main line CPW signal wire (7), by-pass CPW signal wire (8) and CPW ground wire (9), and said main line CPW signal wire (7) and CPW ground wire (9) constitute main line CPW, and said by-pass CPW signal wire (8) and CPW ground wire (9) constitute by-pass CPW; Said MEMS clamped beam formula structure comprises clamped beam (3) and anchor district (12); Said clamped beam (3) is across the top at main line CPW signal wire (7); The two ends of clamped beam (3) are fixed in the anchor district (12), and said anchor district (12) is connected with terminal microwave power monitoring system (6) through by-pass CPW signal wire (8); Said clamped beam formula structure below is provided with drive electrode (10).
2. the online microwave power detector of MEMS clamped beam formula according to claim 1, it is characterized in that: the number of said clamped beam formula structure is three.
3. the online microwave power detector of MEMS clamped beam formula according to claim 1 is characterized in that: the main line CPW signal wire (7) and drive electrode (10) surface coverage of said clamped beam below have silicon nitride medium layer (11).
4. the online microwave power detector of MEMS clamped beam formula according to claim 1; It is characterized in that: said terminal microwave power monitoring system (6) comprises terminal resistance (13) and absorbs the thermoelectric pile of terminal resistance (13) heat, the output terminal connecting terminal resistance (13) of said by-pass CPW signal wire (8).
5. the online microwave power detector of MEMS clamped beam formula according to claim 4, it is characterized in that: said thermoelectric pile is made up of four thermopairs, and said thermopair comprises semiconductor thermocouple arm (14) and metal thermocouple arm (15).
6. method for preparing the online microwave power detector of claim 1 described MEMS clamped beam formula, it is characterized in that: said method comprises the steps:
A, preparation gallium arsenide substrate (1): select the semi-insulating GaAs substrate of extension for use, wherein extension N
+Gallium arsenide be entrained in 10
18Cm
-3More than;
B, photoetching are also isolated the N of extension
+Gallium arsenide, the figure and the ohmic contact regions of the semiconductor thermocouple arm (14) of formation thermoelectric pile;
C, anti-carve the N that forms by the figure of the semiconductor thermocouple arm (14) of thermoelectric pile
+Gallium arsenide forms N
+The gallium arsenide doping content is 10
18Cm
-3The semiconductor thermocouple arm (14) of following thermoelectric pile;
D, photoetching: removal will keep the local photoresist of gold germanium nickel/gold;
E, sputter gold germanium nickel/gold;
F, peel off, form the metal thermocouple arm (15) of thermoelectric pile;
G, photoetching: removal will keep the local photoresist of tantalum nitride;
H, sputter tantalum nitride;
I, peel off;
J, photoetching: removal will keep the photoresist in the place of ground floor gold;
K, evaporation ground floor gold;
L, peel off, form main line CPW and by-pass CPW, anchor district (12) and drive electrode (10);
M, anti-carve tantalum nitride, form the terminal resistance (13) that is connected with by-pass CPW signal wire (8) output terminal, its square resistance is 25 Ω/;
N, deposit silicon nitride: with plasma-enhanced chemical vapour deposition technology grown silicon nitride dielectric layer (11);
O, photoetching and etch silicon nitride dielectric layer (11): keep the silicon nitride (11) on clamped beam (3) below main line CPW signal wire (7) and drive electrode (10), terminal resistance (13) and the thermoelectric pile;
P, deposit and photoetching polyimide sacrificial layer: go up the coating polyimide sacrifice layer in gallium arsenide substrate (1); The photoetching polyimide sacrificial layer only keeps the sacrifice layer of clamped beam (3) below;
Q, evaporation titanium/gold/titanium: the down payment that evaporation is used to electroplate;
R, photoetching: removal will be electroplated local photoresist;
S, electrogilding;
T, removal photoresist: remove and need not electroplate local photoresist;
U, anti-carve titanium/gold/titanium, the corrosion down payment forms main line CPW and by-pass CPW and MEMS clamped beam (3);
V, with in this gallium arsenide substrate (1) thinning back side to 50 μ m and 200 mu m ranges;
W, back side photoetching: remove the photoresist that forms membrane structure (16) place at the gallium arsenide back side;
The gallium arsenide substrate of the below, hot junction of X, etching attenuate terminal resistance (13) and thermoelectric pile forms membrane structure (16);
Y, release polyimide sacrificial layer: developer solution soaks, and removes the polyimide sacrificial layer under the MEMS clamped beam (3), and deionized water soaks slightly, the absolute ethyl alcohol dehydration, and normal temperature volatilizees down, dries.
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