CN101876667A - Atomic force microscope probe based on structures of carbon nano tube and planar wave guide - Google Patents
Atomic force microscope probe based on structures of carbon nano tube and planar wave guide Download PDFInfo
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Abstract
The invention provides an atomic force microscope probe based on structures of a carbon nano tube and a planar wave guide, belonging to the technical field of micronano. The atomic force microscope probe comprises a probe substrate platform compatible with the atomic force microscope, a planar wave guide attached to the surface of the probe substrate platform and a carbon nano tube as a probe point. when in use, the planar waveguide structure is connected to a high-frequency (microwave) measuring instrument, and the whole probe is arranged to the atomic force microscope (AFM) and is scanned or positioned by the standard operation of the AFM, so that the surface topography of a measuring sample can be measured and the high-frequency characteristics of the measuring sample can be synchronously measured in situ. Particularly, the high-frequency (microwave) transmission with small signal loss can be carried out by using the planar waveguide; the carbon nanotube as the probe point has excellent high-frequency transmission property and the mechanical property; the diameter of the carbon nanotube can be adjusted by controlling growth conditions; in addition, the invention is suitable for high-precision and high-frequency (high-frequency) measurement.
Description
Technical field
The invention belongs to little the nano measurement technical field, be specifically related to a kind of planar waveguiding structure and carbon nano-tube point that is installed on atomic force microscope (AFM), this probe can carry out the measurement of surface topography, high frequency (to microwave region) electric property etc. simultaneously to samples such as nano structural material, device and various soft materials.
Background technology
On nanoscale, various materials with low dimensional structures and device receive much concern because of its excellent characteristic and huge potential using value, especially the electricity transport property focus studying especially and use.Along with going deep into of electrology characteristic research, the method for utilizing the electrical measurement means of direct current that nano material and device are studied and characterized is pursued ripe, the physical mechanism of being correlated with comprise various Transport Model also pursue clear.
Yet because experiment and theoretic complicacy, interchange electric property for nano structural material and device thereof, especially the relevant report of high frequency performance and measurement is also few, high frequency property (mainly being radio frequency and microwave frequency band) then exactly with the phenomenon of aspects such as the various physics of occurring in nature, chemistry and biology extensively and be closely related, for example study the high-property transmission line of carbon nano-tube, must characterize the transmission performance of its high-frequency signal as integrated circuit of new generation; And for example electroneurographic signal transmits at neuronal cell surface with the form of pulse, and this pulse promptly belongs to high-frequency signal; And for example the difference of the different ions in the solion under high-frequency electric field responds and mechanism.The high frequency characteristics of material and device is not only significant for the ultimate principle and the Mechanism Study in fields such as physics, chemistry, biology under the research nanoscale, and in these fields wide application prospect will be arranged.
On nanoscale, because material and size of devices restriction, conventional electrical measurement method is difficult to directly measure, and high frequency measurement makes the more apparent difficulty of measurement because of it to each abnormal parameters sensitivity.And the common introducing external electrode of micro-nano electronic applications can cause inevitable influence and even damage to sample itself unavoidably, sign for soft material sample (as active somatic cell) then can't realize especially, but adopt atomic force microscope (AFM, Atomic Force Microscope), utilize probe then can realize original position and harmless measurement as survey instrument, not only can measure the sample that comprises biological soft material, and have high spatial resolution to satisfy meticulous measurement to nanoscale with different surfaces character.At present existing AFM goes up the relevant report (A.Karbassi of high frequency probe, C.A.Paulson, Y.Wang, A.Bettermann, and D.W.van der Weide, " Localized Microwave Measurement using AFM-Compatible Scanning Nearfield MicrowaveMicroscope Cantilever with Ultra-tall Coaxial Probe ", 2007IEEE Antennas and PropagationSociety International Symposium 3336-9,2008), but afm tip material (silicon commonly used, silicon nitride or metal etc.) high frequency characteristics still be weak, and the diameter of needle point is bigger, mechanical characteristic is also undesirable.
Summary of the invention
The object of the present invention is to provide a kind of AFM probe of atomic force microscope, can carry out pattern, high frequency (to microwave region) electricity performance measurement simultaneously micro Nano material, device and various soft material (as biological cell etc.) sample.
According to inventor's research work in early stage, find that carbon nano-tube has relatively better high frequency performance (S.Y.Xu*, Y.Yang, D.F.Pei, X.Zhao, Y.X.Wang, W.Q.Sun, B.Ma, Y.Li, S.S.Xie, and L.M.Peng, " Awaveguide-like effect observed in multi-walled carbon nanotubes ", Adv.Funct.Mater., 2010, inpress.), the characteristics that have controllable diameter simultaneously, and carbon nano-tube mechanical characteristic excellence are the ideal materials of making probe.The preparation method of carbon nano-tube is very ripe, by placing catalyst granules at AFM semi-girder front end, again by chemical gaseous phase depositing process (CVD, Chemical Vapor Deposition) just makes carbon nano-tube bundle (the Neil R.Wilson and Julie V.Macpherson that can be used for probe tip, " Carbon nanotube tips for atomic force microscopy ", Nat.Nanotechnol.4,483,2009).As if the surface that polymkeric substance is covered carbon nano-tube, can guarantee the mechanical robustness of carbon nano-tube bundle in the scanning process, make its unlikely scattering in scanning process.In sum, the high frequency characteristics ideal of carbon nano-tube, synthesis technique maturation, the technical feasibility of AFM probe tip is made in many walls carbon tube bank,, can be provided strong means for the high frequency measurement of nanoscale based on the AFM probe of carbon nano-tube in conjunction with characteristics such as AFM self high-resolution, harmless contacts.
In addition, in order accurately to characterize nano material, device or the response condition of other sample under high-frequency signal injection, high frequency measurement need link to each other the carbon tube bank needle point of AFM with external high-frequency signal source or oscillograph, must solve be situated between and see the transfer problem of macro-scale, need utilize the micro-nano manufacturing process make can stable transfer waveguide connect.In fields such as physics, chemistry and biologies, the research of relevant high frequency is mainly based on radio frequency and microwave region, and frequency range is roughly 30KHz to 300GHz, for the measurement that realizes being correlated with then needs low-loss, has the precision high-frequency structure of accurate parameters.At present, the high-frequency transmission on miniature scale adopts coplanar waveguide structure usually, promptly typical GSG (ground wire-signal wire-ground wire, electromagnetic wave transmits between signal wire and ground wire) structure.By the high-frequency transmission theory, by the width and the spacing of signal calculated line, but accurately predicting waveguide Transmission Characteristics (as characteristic impedance, Frequency Response etc.), and the design of optimizing waveguide thus guarantees the signal high efficiency of transmission to realize impedance matching.After determining structure, utilize the micro-nano processing technology (photoetching, plated film etc.) of standard to realize waveguide at the detecting probe surface of AFM, and link to each other with carbon nanotubes grown bundle needle point on it, will import high frequency lead or microwave interface at last and link to each other with external test macro and can finish building of whole measuring system.
The present invention includes but be not limited only to and one on the AFM probe base platform of AFM compatibility.By the preparation of micro-nano processing technology, be attached to the slab guide of probe base platform, and locate by CVD means carbon nanotubes grown needle point at probe base platform front end (semi-girder), slab guide links to each other with carbon nano-tube point.
Can be coated with polymeric material on the carbon nano-tube point, polymeric material thickness is 100nm--1 μ m.
Technological merit of the present invention and effect:
The present invention is a kind of atomic force microscope probe based on carbon nano-tube and planar waveguiding structure, can realize the measurement such as surface topography, high frequency (to microwave region) electric property to nano material, device and various soft material (as biological cell etc.) sample simultaneously.The function that this device possesses comprises: (1) can carry out the accurate sign of sample topography by this probe is mounted to AFM under several normal operating modes of AFM; (2) by this probe is mounted to AFM, and the planar waveguiding structure of detecting probe surface is connected to electricity measuring Instrument (as signal source, oscillograph etc.) by high frequency cable or microwave waveguide, the high frequency characteristics that can come measuring samples by operation fixed point or the scanning of AFM; (3) can carry out above-mentioned (1), (2) function simultaneously, i.e. the high frequency characteristics of measuring samples in situ when characterizing the sample surfaces pattern; (4) can control (comprising the covering of multi-wall carbon nanometer tube bundle surface aggregate thing) characteristic (comprising diameter, mechanical characteristic etc.) of needle point by controlling growth conditions (comprising catalyst particle size etc.) and post-processed as the multi-wall carbon nanometer tube bundle of AFM probe tip.
Description of drawings
Below in conjunction with accompanying drawing the present invention is illustrated in further detail:
Fig. 1 is an AFM probe preparation process schematic diagram;
Fig. 2 is an AFM probe structure synoptic diagram of the present invention, wherein 1-AFM probe base platform; The 2-slab guide; The 3-carbon nano-tube point; The 4-polymkeric substance;
The application block diagram of the whole AFM probe unit of Fig. 3.
Embodiment
Below with reference to accompanying drawing of the present invention, more detailed description goes out embodiments of the invention.
It is simple and easy relatively to the invention provides a kind of preparation, can realize samples such as nano material, device and various soft materials are carried out simultaneously the AFM probe of the measurement of surface topography, high frequency (to microwave region) electric property etc.This device can be by being mounted to AFM and operating by AFM, the high frequency characteristics of the accurately surface topography of measuring samples, and in site measurement simultaneously sample.This probe unit can but be not limited to carry out separately the measurement of surface topography and high frequency electric property.Can but be not limited to handle the characteristic of the carbon nano-tube of controlling needle point by control growth conditions and later stage polymkeric substance parcel.This probe unit allows to change sample and takes multiple measurements.
With reference to figure 2, probe base adopts can carry out micro-machined insulating material, for example but be not limited only to silicon nitride, monox etc.According to the AFM standard size, corresponding size is processed in substrate, front end etches cantilever beam structure by the micro-nano processing technology, the similar but afm tip that is not limited only to use always of one-piece construction.Probe base plays the effect of supporting and embedding AFM mainly as the substrate of whole probe structure.
Planar waveguiding structure and electrode directly are attached to the probe base surface, use the metallic conductor of stable in properties, for example but be not limited only to gold, platinum etc.Planar waveguiding structure and electrode integral body are covered in a surface of probe base, slab guide one termination electrode, and the other end extends on the cantilever beam structure at probe base tip.The three wire configuration of ground wire-signal wire-ground wire is adopted in slab guide, and the size of every lead and geometric configuration and mutual spacing require calculation Design according to the transmission parameter of waveguide.Waveguide and electrode such as but not limited to photoetching, plated film etc., are attached to probe base surface with metallic film by the micro-nano processing technology.The effect of electrode is to be connected with waveguiding structure, and is connected to the instrument (for example but be not limited only to signal source, oscillograph etc.) of high frequency or microwave by high frequency cable or microwave waveguide.The effect of waveguide provides the path of high frequency (to microwave region) signal, by the connection of electrode, imports surveying instrument with the signal importing needle point of external instrument or with the signal that needle point is measured.
The needle point of AFM probe uses the multi-wall carbon nanometer tube bundle of (cantilever beam structure of overlay planes waveguide) growth in situ at the probe base tip.By on the semi-girder at probe base tip, placing catalyst granules, laying method for example but be not limited only to the nano-probe technology, catalyst granules is generally but is not limited only to a certain size gold, copper particle.Utilize the carbon nano tube growth technology again, for example but be not limited only to the CVD method, placing catalyst granules place growth in situ multi-wall carbon nanometer tube bundle.Characteristics such as the diameter of multi-walled carbon nano-tubes and length can change by control catalyst grain size and growth conditions.Multi-wall carbon nanometer tube bundle carries out the scanner uni high frequency measurement as probe tip to sample surfaces, includes but are not limited to pattern scanning and high frequency (microwave) and measures.
The outer polymeric layer that covers of AFM probe tip mainly is to be used to reinforce adhering to of multi-wall carbon nanometer tube bundle, increases the intensity and the elasticity of needle point, and multi-walled carbon nano-tubes can not scattered in scanning process.Polymeric material requires insulation and has the good mechanical characteristic.
This probe can carry out simultaneously micro Nano material, device and samples such as various soft material such as biological cell but be not limited only to the measurement of pattern, high frequency (to microwave region) electrical property etc.
Following mask body provides one and realizes process program of the present invention, but the scope that does not limit the present invention in any way.
1, probe base selective oxidation silicon materials obtain the cuboid substrate of the about 5mm * 2.5mm of a block size * 0.6mm by processing technologys such as cutting polishings.Silicon nitride film bonding with this substrate and the several approximately microns of a layer thickness (1-2 μ m usually), the front end of silicon nitride film protrudes in substrate, make the about 100 μ m of length, the rectangle micro-cantilever of the about 10 μ m of width by the lithographic technique in the microelectronic technique (as plasma etching).This substrate with semi-girder also can be by obtaining to the relevant afm tip manufacturer order of making.
2, the AFM probe base ready after, need be used for the planar waveguiding structure of high frequency/microwave transmission by the micro fabrication preparation at the upper surface of substrate, shown in Fig. 1 (a).G-S-G (ground wire-signal wire-ground wire) structure is adopted in this slab guide, and its scale parameter (being mainly transversely each line width, thickness, spacing) is the transmission needs according to different frequency or band signal, utilizes the correlation computations of electromagnetic theory to obtain.As adopt gold as the transmission line material, and requiring waveguide impedance is 50 ohm, frequency 1GHz, and then the thickness of Dui Ying gold thin film is 100nm, and the signal wire width is 1mm, and signal wire and ground distance between centers of tracks are 15 μ m.In substrate, make the figure of required size by preparation mask and means of photolithography, the gold of step acquisition desired thickness such as carry out metal coating (means of selecting magnetron sputtering plating usually are to guarantee the covering of side) again and peel off.It should be noted that the part of semi-girder, need all deposit certain thickness gold thin film, thereby guarantee that signal can be passed to the needle point of lower surface on its whole surface as signal wire.
3, this probe and common commercial AFM probe one different part are that needle point adopts carbon nano-tube to replace silicon nitride needle point (being formed by the direct etching of silicon nitride film) commonly used or is used for the metal needle point (as platinum, tungsten) of signal conduction.The afm tip of carbon nano-tube can obtain by two kinds of methods: first method promptly utilizes micro-nano operating control (as nano-probe) that carbon nano-tube is moved to the micro-cantilever lower surface in situ, make carbon nano-tube adhere to micro-cantilever by conducting resinl or in-situ deposition agraphitic carbon, but this class methods adhesion and electric conductivity can't guarantee; Second method promptly is to adopt the method for growth in situ, (diameter can not wait from 10nm to hundreds of nm as gold, copper etc. to utilize micro-nano operating control such as nano-probe original position on micro-cantilever to place catalyst granules earlier, can control the diameter of institute's carbon nanotubes grown by the catalyst granules of selecting different sizes), utilize CVD means in-situ growing carbon nano tube again, can select and reaction conditions controls Single Walled Carbon Nanotube, multi-walled carbon nano-tubes or the multi-wall carbon nanometer tube bundle of selective growth different-diameter according to catalyzer, shown in Fig. 1 (b), Fig. 1 (c).
4, after carbon nano-tube point preparation is finished,, need adhere to one layer of polymeric protected at the carbon nano-tube skin in order to guarantee the intensity that it adheres to and multi-walled carbon nano-tubes is unlikely in scanning process scatters.Polymeric material is alternative more, as oxirane, and the about 100nm of cladding thickness.Concrete control method can directly be dipped in whole needle point tip in the polymer solution, treats afterwards can finish surface coverage after its solvent evaporates, and the preparation of carbon nano-tube AFM probe can be finished, shown in Fig. 1 (d).
5, in the use, need this probe is installed on the probe location of AFM (Veeco Di MultiMode V-type), as shown in Figure 3.Need to use anchor clamps when mounted, the metal waveguide electrodes exposed of probe upper surface is connected with lead with convenient.The external of metal flat waveguide can change the adapter realization of G-S-G planar structure by a SMA, G-S-G holds the metal electrode on direct contact probe surface, and SMA end then can be by external high frequency cable HF measuring instrument be connected (as signal source, oscillograph etc.) the most finally.After connection finished, a need according to the AFM using method sample is scanned or one-point measurement gets final product.
Though this instructions is described the process of AFM probe provided by the invention and preparation thereof in detail by specific embodiment, but it should be appreciated by those skilled in the art, implementation of the present invention is not limited to the description scope of embodiment, in not breaking away from essence of the present invention and spiritual scope, can carry out various modifications and replacement to the present invention.
Claims (5)
1. the probe of an atomic force microscope, comprise one with the probe base platform of atomic force microscope compatibility, the front end of this probe base platform is a semi-girder, it is characterized in that, be attached on the probe base platform surface planar waveguiding structure is arranged, one end connection electrode of this slab guide, the other end of slab guide links to each other with the carbon nano-tube point on semi-girder.
2. probe as claimed in claim 1 is characterized in that, the three wire configuration of ground wire-signal wire-ground wire is adopted in described slab guide.
3. probe as claimed in claim 1 is characterized in that, described carbon nano-tube point is Single Walled Carbon Nanotube, multi-walled carbon nano-tubes or multi-wall carbon nanometer tube bundle.
4. probe as claimed in claim 3 is characterized in that, is coated with polymeric material on the described carbon nano-tube point.
5. probe as claimed in claim 4 is characterized in that, described polymeric material thickness is 100nm--1 μ m.
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| CN102621352A (en) * | 2011-02-01 | 2012-08-01 | 国家纳米科学中心 | Atomic force microscope probe and probe tip thereof and method for detecting capability of adhesion between helicobacter pylori and gastric mucus |
| CN102768292A (en) * | 2012-07-25 | 2012-11-07 | 天津大学 | Ultrahigh vacuum fast scanning microscopy method based on carbon nanotube probe |
| CN105182007A (en) * | 2015-09-02 | 2015-12-23 | 南京大学 | Method for representing surface mechanical parameters of nano material under ultrasonic excitation |
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| CN107796958A (en) * | 2017-09-18 | 2018-03-13 | 上海理工大学 | A kind of preparation method of AFM colloid probe |
| CN109239405A (en) * | 2018-07-24 | 2019-01-18 | 西安交通大学 | A kind of preparation method of atomic force microscope probe |
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| CN102621352A (en) * | 2011-02-01 | 2012-08-01 | 国家纳米科学中心 | Atomic force microscope probe and probe tip thereof and method for detecting capability of adhesion between helicobacter pylori and gastric mucus |
| CN102621352B (en) * | 2011-02-01 | 2015-01-07 | 国家纳米科学中心 | Atomic force microscope probe and probe tip thereof and method for detecting capability of adhesion between helicobacter pylori and gastric mucus |
| CN102768292A (en) * | 2012-07-25 | 2012-11-07 | 天津大学 | Ultrahigh vacuum fast scanning microscopy method based on carbon nanotube probe |
| CN102768292B (en) * | 2012-07-25 | 2014-05-21 | 天津大学 | Ultrahigh vacuum fast scanning microscopy method based on carbon nanotube probe |
| CN105182007B (en) * | 2015-09-02 | 2018-05-25 | 南京大学 | A kind of method that nano-material surface mechanical parameter characterizes under ultrasonic action |
| CN105182007A (en) * | 2015-09-02 | 2015-12-23 | 南京大学 | Method for representing surface mechanical parameters of nano material under ultrasonic excitation |
| CN107064564A (en) * | 2016-01-26 | 2017-08-18 | 三星电子株式会社 | Cantilever device, inspection device, method of analyzing surface, and method of forming micro pattern |
| CN107064564B (en) * | 2016-01-26 | 2022-02-11 | 三星电子株式会社 | Cantilever device, inspection device, method of analyzing surface, and method of forming micro pattern |
| CN106124543B (en) * | 2016-07-08 | 2019-04-09 | 东南大学 | Nano material exchange electrical performance testing device and method based in situ TEM |
| CN106124543A (en) * | 2016-07-08 | 2016-11-16 | 东南大学 | Nano material based in situ TEM exchange electrical performance testing device and method |
| CN107796958A (en) * | 2017-09-18 | 2018-03-13 | 上海理工大学 | A kind of preparation method of AFM colloid probe |
| CN109239405A (en) * | 2018-07-24 | 2019-01-18 | 西安交通大学 | A kind of preparation method of atomic force microscope probe |
| CN109489545A (en) * | 2018-11-13 | 2019-03-19 | 中国科学院上海应用物理研究所 | A kind of protein analytical methods based on nanometer mechanics |
| CN110470917A (en) * | 2019-07-22 | 2019-11-19 | 西安电子科技大学 | A kind of high temperature resistant electric-field probe applied to high temperature and high speed plasma internal electric field distribution measuring |
| CN111004722A (en) * | 2019-11-21 | 2020-04-14 | 浙江大学 | Frequency shift super-resolution microscopic chip capable of applying electric field |
| WO2021120233A1 (en) * | 2019-12-20 | 2021-06-24 | 江苏集萃微纳自动化系统与装备技术研究所有限公司 | Real-time stiffness adjustment method for probe of atomic force microscope |
| CN111825056A (en) * | 2020-07-17 | 2020-10-27 | 杭州电子科技大学 | Method for forming cantilever probe based on femtosecond laser and high temperature and cantilever probe |
| CN113433348A (en) * | 2021-06-03 | 2021-09-24 | 中北大学 | Probe for microwave test |
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Application publication date: 20101103 |