CN101803133A - 多腔刻蚀端面dfb激光器 - Google Patents
多腔刻蚀端面dfb激光器 Download PDFInfo
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- CN101803133A CN101803133A CN200880106365A CN200880106365A CN101803133A CN 101803133 A CN101803133 A CN 101803133A CN 200880106365 A CN200880106365 A CN 200880106365A CN 200880106365 A CN200880106365 A CN 200880106365A CN 101803133 A CN101803133 A CN 101803133A
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- 239000004065 semiconductor Substances 0.000 claims abstract description 41
- 238000005530 etching Methods 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims description 14
- 238000005538 encapsulation Methods 0.000 claims description 6
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 abstract description 5
- 238000000576 coating method Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 7
- 208000002925 dental caries Diseases 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000007704 transition Effects 0.000 description 2
- 101150034459 Parpbp gene Proteins 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007850 degeneration Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000000025 interference lithography Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001915 proofreading effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/028—Coatings ; Treatment of the laser facets, e.g. etching, passivation layers or reflecting layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1021—Coupled cavities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1039—Details on the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (21)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US96001407P | 2007-09-11 | 2007-09-11 | |
US60/960,014 | 2007-09-11 | ||
PCT/US2008/076018 WO2009036172A1 (en) | 2007-09-11 | 2008-09-11 | Multiple cavity etched-facet dfb lasers |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101803133A true CN101803133A (zh) | 2010-08-11 |
CN101803133B CN101803133B (zh) | 2013-02-27 |
Family
ID=40431769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008801063655A Active CN101803133B (zh) | 2007-09-11 | 2008-09-11 | 多腔刻蚀端面dfb激光器 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8014434B2 (zh) |
EP (1) | EP2188875B1 (zh) |
JP (1) | JP5190115B2 (zh) |
CN (1) | CN101803133B (zh) |
WO (1) | WO2009036172A1 (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105826813A (zh) * | 2016-05-06 | 2016-08-03 | 华中科技大学 | 一种基于高阶表面光栅的单模激光器 |
CN107221838A (zh) * | 2017-06-12 | 2017-09-29 | 陕西源杰半导体技术有限公司 | 改善边模抑制比的激光器芯片及其制造方法 |
CN107230931A (zh) * | 2017-07-17 | 2017-10-03 | 青岛海信宽带多媒体技术有限公司 | 分布反馈半导体激光芯片及其制备方法、光模块 |
CN107275925A (zh) * | 2017-07-31 | 2017-10-20 | 青岛海信宽带多媒体技术有限公司 | 激光芯片及其制备方法、光模块 |
CN108418094A (zh) * | 2018-05-10 | 2018-08-17 | 厦门市芯诺通讯科技有限公司 | 一种高速dfb半导体激光器的制备方法 |
CN113508502A (zh) * | 2019-03-12 | 2021-10-15 | 华为技术有限公司 | 双腔dfb激光器芯片、光发射组件、光模块及光网络装置 |
CN115912056A (zh) * | 2023-02-17 | 2023-04-04 | 福建慧芯激光科技有限公司 | 一种多渐变脊波导dfb激光器芯片 |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8456969B1 (en) | 2012-03-27 | 2013-06-04 | Seagate Technology Llc | Laser integrated recording head for heat assisted magnetic recording |
US8477571B1 (en) | 2012-03-27 | 2013-07-02 | Seagate Technology Llc | Heat assisted magnetic recording using surface-emitting distributed feedback laser |
CN104201566B (zh) * | 2014-08-22 | 2017-12-29 | 华中科技大学 | 一种具有高单纵模成品率的脊波导分布反馈半导体激光器 |
CN112204833A (zh) * | 2018-05-30 | 2021-01-08 | 华为技术有限公司 | 激光器芯片设计 |
US11600964B2 (en) * | 2020-08-17 | 2023-03-07 | Cisco Technology, Inc. | Package self-heating using multi-channel laser |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4674096A (en) * | 1985-03-04 | 1987-06-16 | California Institute Of Technology | Lateral coupled cavity semiconductor laser |
US4730327A (en) * | 1985-12-16 | 1988-03-08 | Lytel Incorporated | Dual channel fabry-perot laser |
JP2624310B2 (ja) * | 1988-09-28 | 1997-06-25 | キヤノン株式会社 | 多波長半導体レーザ装置 |
EP0361399A3 (en) * | 1988-09-28 | 1990-07-18 | Canon Kabushiki Kaisha | Semmiconductor laser array including lasers with reflecting means having different wavelength selection properties |
US5231642A (en) * | 1992-05-08 | 1993-07-27 | Spectra Diode Laboratories, Inc. | Semiconductor ring and folded cavity lasers |
JPH08255947A (ja) * | 1995-03-17 | 1996-10-01 | Mitsubishi Electric Corp | 半導体レーザ装置,及びその製造方法 |
FR2744292B1 (fr) * | 1996-01-29 | 1998-04-30 | Menigaux Louis | Composant d'emission laser multi-longueur d'onde |
US5963568A (en) * | 1996-07-01 | 1999-10-05 | Xerox Corporation | Multiple wavelength, surface emitting laser with broad bandwidth distributed Bragg reflectors |
JPH1174610A (ja) * | 1997-08-29 | 1999-03-16 | Canon Inc | 光半導体装置、その製造方法、駆動方法、及びこれらを使ったシステム |
US6104739A (en) * | 1997-12-24 | 2000-08-15 | Nortel Networks Corporation | Series of strongly complex coupled DFB lasers |
US6207950B1 (en) * | 1999-01-11 | 2001-03-27 | Lightlogic, Inc. | Optical electronic assembly having a flexure for maintaining alignment between optical elements |
WO2001013480A1 (en) * | 1999-08-13 | 2001-02-22 | Wisconsin Alumni Research Foundation | Single mode, single lobe surface emitting distributed feedback semiconductor laser |
FR2845833A1 (fr) * | 2002-10-15 | 2004-04-16 | Cit Alcatel | Amplificateur optique a semiconducteurs a stabilisation de gain laterale et distribuee |
US20040190580A1 (en) * | 2003-03-04 | 2004-09-30 | Bardia Pezeshki | High-yield high-precision distributed feedback laser based on an array |
US7113526B2 (en) * | 2003-10-09 | 2006-09-26 | Photodigm, Inc. | Multi-wavelength grating-outcoupled surface emitting laser system |
JP2007534154A (ja) * | 2003-10-20 | 2007-11-22 | ビノプティクス・コーポレイション | 表面放射入射光子デバイス |
JP4844031B2 (ja) * | 2005-07-20 | 2011-12-21 | 富士ゼロックス株式会社 | 発光モジュール |
IES20050587A2 (en) * | 2005-09-08 | 2007-02-21 | Eblana Photonics Ltd | Multi-stripe laser diode designs which exhibit a high degree of manafacturability |
-
2008
- 2008-09-11 WO PCT/US2008/076018 patent/WO2009036172A1/en active Application Filing
- 2008-09-11 US US12/208,988 patent/US8014434B2/en active Active
- 2008-09-11 EP EP08830477.9A patent/EP2188875B1/en active Active
- 2008-09-11 JP JP2010524983A patent/JP5190115B2/ja active Active
- 2008-09-11 CN CN2008801063655A patent/CN101803133B/zh active Active
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105826813A (zh) * | 2016-05-06 | 2016-08-03 | 华中科技大学 | 一种基于高阶表面光栅的单模激光器 |
CN105826813B (zh) * | 2016-05-06 | 2019-02-05 | 华中科技大学 | 一种基于高阶表面光栅的单模激光器 |
CN107221838A (zh) * | 2017-06-12 | 2017-09-29 | 陕西源杰半导体技术有限公司 | 改善边模抑制比的激光器芯片及其制造方法 |
CN107221838B (zh) * | 2017-06-12 | 2023-04-25 | 陕西源杰半导体科技股份有限公司 | 改善边模抑制比的激光器芯片及其制造方法 |
CN107230931A (zh) * | 2017-07-17 | 2017-10-03 | 青岛海信宽带多媒体技术有限公司 | 分布反馈半导体激光芯片及其制备方法、光模块 |
CN107230931B (zh) * | 2017-07-17 | 2020-03-13 | 青岛海信宽带多媒体技术有限公司 | 分布反馈半导体激光芯片及其制备方法、光模块 |
CN107275925A (zh) * | 2017-07-31 | 2017-10-20 | 青岛海信宽带多媒体技术有限公司 | 激光芯片及其制备方法、光模块 |
CN108418094A (zh) * | 2018-05-10 | 2018-08-17 | 厦门市芯诺通讯科技有限公司 | 一种高速dfb半导体激光器的制备方法 |
CN108418094B (zh) * | 2018-05-10 | 2024-01-09 | 厦门市炬意科技有限公司 | 一种高速dfb半导体激光器的制备方法 |
CN113508502A (zh) * | 2019-03-12 | 2021-10-15 | 华为技术有限公司 | 双腔dfb激光器芯片、光发射组件、光模块及光网络装置 |
CN113508502B (zh) * | 2019-03-12 | 2022-12-30 | 华为技术有限公司 | 双腔dfb激光器芯片、光发射组件、光模块及光网络装置 |
CN115912056A (zh) * | 2023-02-17 | 2023-04-04 | 福建慧芯激光科技有限公司 | 一种多渐变脊波导dfb激光器芯片 |
Also Published As
Publication number | Publication date |
---|---|
CN101803133B (zh) | 2013-02-27 |
EP2188875A4 (en) | 2014-07-30 |
JP5190115B2 (ja) | 2013-04-24 |
EP2188875B1 (en) | 2019-12-11 |
WO2009036172A1 (en) | 2009-03-19 |
EP2188875A1 (en) | 2010-05-26 |
US8014434B2 (en) | 2011-09-06 |
US20090067465A1 (en) | 2009-03-12 |
JP2010539711A (ja) | 2010-12-16 |
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Address after: Massachusetts, USA Patentee after: BINOPTICS Corp. Address before: American New York Patentee before: BINOPTICS Corp. |
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