CN101780452B - Photocatalyst metal ceiling processing method and device - Google Patents
Photocatalyst metal ceiling processing method and device Download PDFInfo
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- CN101780452B CN101780452B CN2010101191031A CN201010119103A CN101780452B CN 101780452 B CN101780452 B CN 101780452B CN 2010101191031 A CN2010101191031 A CN 2010101191031A CN 201010119103 A CN201010119103 A CN 201010119103A CN 101780452 B CN101780452 B CN 101780452B
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Abstract
The invention discloses a photocatalyst metal ceiling processing method with simple and convenient process and capability of coating a photocatalyst on the traditional ceiling and a metal ceiling processing device with easy disassembly, convenient movement and transportation and on-site operation. The processing method comprises the following steps of: cleaning, drying, coating a titanium oxide film layer, drying, solidifying and detecting. The processing device comprises an ultrasonic cleaning device (1), a conveying device (2), a drying device (7), a first automatic spraying device (4), an infrared roasting device (5) and a detecting device (9), wherein the ultrasonic cleaning device (1) is used for cleaning dust, oil stains and impurities on the surface of a metal ceiling (8), the conveying device (2) is used for automatically conveying the metal ceiling (8), the drying device (7) is used for drying the cleaned surface of the metal ceiling (8), the first automatic spraying device (4) is used for spraying water-soluble titanium dioxide on the surface of the metal ceiling (8) and forming a titanium oxide film layer (92), the infrared roasting device (5) is used for drying and solidifying the titanium oxide film layer (92), and the detecting device (9) is used for detecting the thickness of the titanium oxide film layer (92). The invention can be applied to the ceiling processing field.
Description
Technical field
The present invention relates to a kind of processing method and equipment of ceiling, relate in particular to a kind of processing method and equipment of photocatalyst metal ceiling.
Background technology
Along with science and technology development, various modern buildings be presented in people in face of, like glass body of wall, metallic object packing etc.Have at present many novel buildings to adopt the building of Roof system, the especially steel construction of metal structure again, its Roof system also adopts the Roof system of metal structure naturally.The composite metal Roof system is used more and more widely in buildings such as all types of industries, physical culture, amusement, exhibition center, retail supermarket.Early stage metal Roof system is not provided with ceiling system; Therefore the various beams of roofing inside, post, fixed component etc. all directly come out; Usually also need reach lower position through some suspender members are set; So that hang devices such as fire extinguisher canvas hose, air conditioning wind pipe, the terrace of this direct exposure influences the attractive in appearance of interior of building.Along with development of times, in order to pursue the room effect of neat appearance, at present a lot of metal Roof systems are decorated the terrace of interior of building, and this need be provided with ceiling system at terrace usually.
No matter be traditional building or modern steel building, all generally use metal ceiling, especially the aluminium alloy ceiling has wide range of applications, and it has light weight, advantage such as durable, attractive in appearance.But along with the growth of service time, the outer surface of ceiling also can be stained with harmful substances such as impurity such as dust granules and breed bacteria and but be difficult for discovering; And, clean utmost point trouble because the ceiling suspension is higher, therefore present ceiling seldom carries out cleaned at regular intervals; And service time one is of a specified duration, gets confused easily, shades in the surface of ceiling, influences the aesthetics of product.
At present, also do not have and to apply the method and apparatus that photocatalyst is produced the photocatalyst ceiling to the existing ceiling of having installed and used.
Summary of the invention
Technical problem to be solved by this invention is the deficiency that overcomes prior art; Provide that a kind of operation is easy, production efficiency is high, can apply the photocatalyst metal ceiling processing method of photocatalyst to the existing ceiling of having installed and used, the photocatalyst metal ceiling of this method processing has health, environmental protection, convenience for washing, low, the attractive and durable advantage of cost.
In addition, the present invention also provides a kind of and is easy to dismounting, is convenient to photocatalyst metal ceiling process equipment mobile and that transport, can operate at the scene.
First kind of technical scheme that photocatalyst metal ceiling processing method of the present invention adopted is: may further comprise the steps:
(a) cleaning step: metal ceiling is put into ultrasonic cleaning equipment clean, remove dust, greasy dirt and the impurity on said metal ceiling surface;
(b) drying steps: will clean the said metal ceiling in back and send into drying device, with the dry tack free of said metal ceiling through transport;
(c) the oxidation film layer step of coated titanium: said metal ceiling is sent into first automatic spray apparatus through said transport, spray water-soluble titanium dioxide, form the oxidation film layer of titanium on the surface of said metal ceiling;
(d) baking and curing step: the said metal ceiling that will apply the oxidation film layer of said titanium is sent into the infrared ray apparatus for baking through said transport, with the oxidation film layer baking and curing of said titanium;
(e) detect step: pass out to the detection station through the said metal ceiling of said transport after, detect through the thickness of checkout gear to the oxidation film layer of said titanium with baking and curing.
Be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer of said titanium.
Comprise the nanometer-level silver ion in the oxidation film layer of said titanium.
The material of said inorganic matter separation layer is silica or silicon nitride.
The surface of said metal ceiling itself applies organic coating, and said metal ceiling adopts aluminium alloy base plate.
Second kind of technical scheme that photocatalyst metal ceiling processing method of the present invention adopted is: may further comprise the steps:
(a) cleaning step: metal ceiling is put into ultrasonic cleaning equipment clean, remove dust, greasy dirt and the impurity on said metal ceiling surface;
(b) drying steps: will clean the said metal ceiling in back and send into drying device, with the dry tack free of said metal ceiling through transport;
(b1) apply the separation layer step: said metal ceiling is sent into second automatic spray apparatus through transport, at the surface-coated inorganic matter separation layer of said metal ceiling;
(c) the oxidation film layer step of coated titanium: said metal ceiling is sent into first automatic spray apparatus through said transport, spray water-soluble titanium dioxide, form the oxidation film layer of titanium on the surface of said inorganic matter separation layer;
(d) baking and curing step: the said metal ceiling that will apply the oxidation film layer of said inorganic matter separation layer and said titanium is sent into the infrared ray apparatus for baking through said transport, with the oxidation film layer baking and curing of said inorganic matter separation layer and said titanium;
(e) detect step: pass out to the detection station through the said metal ceiling of said transport after, detect through the thickness of checkout gear to the oxidation film layer of said titanium with baking and curing.
Be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer of said titanium.
Comprise the nanometer-level silver ion in the oxidation film layer of said titanium.
The material of said inorganic matter separation layer is silica or silicon nitride.
The surface of said metal ceiling itself applies organic coating, and said metal ceiling adopts aluminium alloy base plate.
First kind of technical scheme that photocatalyst metal ceiling process equipment of the present invention is adopted is: comprise the ultrasonic cleaning equipment that is used to remove surperficial dust, greasy dirt and impurity of metal ceiling; The transport that is used for the said metal ceiling of automatic transport; Dry drying device is carried out on the surface of said metal ceiling after being used for cleaning; Be used for first automatic spray apparatus that sprays water-soluble titanium dioxide on the surface of said metal ceiling and form the oxidation film layer of titanium; Be used for infrared ray apparatus for baking with the oxidation film layer baking and curing of said titanium; Be used for the checkout gear that the thickness to the oxidation film layer of said titanium detects, said ultrasonic cleaning equipment, said drying device, said first automatic spray apparatus, said infrared ray apparatus for baking form automatic production line through said transport.
Be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer of said titanium; Comprise the nanometer-level silver ion in the oxidation film layer of said titanium.
The material of said inorganic matter separation layer is silica or silicon nitride; The surface of said metal ceiling itself applies organic coating, and said metal ceiling adopts aluminium alloy base plate.
Second kind of technical scheme that photocatalyst metal ceiling process equipment of the present invention is adopted is: comprise the ultrasonic cleaning equipment that is used to remove surperficial dust, greasy dirt and impurity of metal ceiling; The transport that is used for the said metal ceiling of automatic transport; Dry drying device is carried out on the surface of said metal ceiling after being used for cleaning; Be used for second automatic spray apparatus at the surface-coated inorganic matter separation layer of said metal ceiling; Be used for first automatic spray apparatus that sprays water-soluble titanium dioxide on the surface of said inorganic matter separation layer and form the oxidation film layer of titanium; Be used for infrared ray apparatus for baking with the oxidation film layer baking and curing of said inorganic matter separation layer and said titanium; Be used for the checkout gear that the thickness to the oxidation film layer of said titanium detects, said ultrasonic cleaning equipment, said drying device, said second automatic spray apparatus, said first automatic spray apparatus, said infrared ray apparatus for baking form automatic production line through said transport.
Be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer of said titanium; Comprise the nanometer-level silver ion in the oxidation film layer of said titanium.
The material of said inorganic matter separation layer is silica or silicon nitride; The surface of said metal ceiling itself applies organic coating, and said metal ceiling adopts aluminium alloy base plate.
The invention has the beneficial effects as follows: adopt photocatalyst metal ceiling process equipment of the present invention and photocatalyst metal ceiling processing method to make that the photocatalyst metal ceiling operation is easy, production efficiency is high; Process equipment is compact, it is little to take up an area of, be easy to dismounting, be convenient to move and transportation, can operate at the scene, both can also can apply photocatalyst to the existing ceiling of having installed and used that self has organic coating to the ceiling substrate; The photocatalyst metal ceiling that processes is because its surface attachment organic/inorganic substance separation layer; The surface attachment of said inorganic matter separation layer has the oxidation film layer of titanium; The oxidation film layer of said titanium belongs to photocatalyst, and its active ingredient is titanium dioxide, through certain light source irradiation; Can promote most organic compound generation oxidation reactions, the oxidation step of going forward side by side generates CO
2And H
2O, it acts on wide spectrum, in the photocatalyst reaction process; Can not only destroy biotic factor; Also can destroy various organic chemicals, promote the carrying out of chemical reaction, indoor harmful organic gas is had certain oxygenolysis; Therefore have air cleaning, environment is antibiotic and the function of deodorizing, has changed traditional depollution of environment technology mode; In addition, titanium dioxide tool strongly hydrophilic so the surface has self-cleaning function, keeps bright and clean forever, cleans conveniently, prevents that dirt from adhering to; The adhesion of said inorganic matter separation layer and said metal substrate is strong, and the oxidation film layer of said titanium has high rigidity, is difficult for being destroyed, and human body is had no harm, can also reduce the wearing and tearing on surface and oozing out of harmful substance, so environment protecting is preferable; And said organic/inorganic substance separation layer can avoid the surperficial dust of said metal ceiling, organic coating etc. to receive titanium dioxide decomposition destruction, thereby avoiding face coat to destroy comes off, and influences attractive in appearance and effect that purify air; In the photocatalyst reaction process, titanium dioxide is not participated in reaction and is not discharged harmful substance in addition, only plays the catalysis instrumentality; Itself do not prolong in time and consume, self property is constant before and after the reaction, in course of reaction, the material that is acted on is completely oxidized to innocuous substances such as harmless carbon dioxide and water; Therefore harmless fully to environment; Help health, and service life is lasting, is suitable for the lifelong of metal ceiling and effectively uses; It can play a role containing under the multiple light sources such as faint ultraviolet light, natural daylight, sunlight, therefore adopts the photocatalyst metal ceiling of method and apparatus processing of the present invention to have health, environmental protection, convenience for washing, low, the attractive and durable advantage of cost;
Owing to be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer of said titanium; Active ingredient concentration is high; It has more powerful redox ability, high chemical stability and nontoxic performance in the sun; Have excellent sterilizing antibiotic with usefulness such as degraded pernicious gas etc., avoided bacterium to send out heavy breathing, prevent mouldy; Avoided adopting traditional chemosterilant that there is the problem of secondary toxicity and excitant and continuation difference in environmental improvement, so the metal ceiling of the present invention's processing purifies air and the better effects if of self-cleaning;
Because comprise the nanometer-level silver ion in the oxidation film layer of said titanium, silver ion has bactericidal effect efficiently, it just can discharge sterilization under indoor light, so it purifies air and self-cleaning effective the metal ceiling that the present invention processes under indoor environment.
Description of drawings
Fig. 1 is the schematic flow sheet of the photocatalyst metal ceiling processing method of the embodiment of the invention one;
Fig. 2 is the structural representation of the photocatalyst metal ceiling process equipment of the embodiment of the invention one;
Fig. 3 is the local section structural representation of the photocatalyst metal ceiling processed of the present invention;
Fig. 4 is the schematic flow sheet of the photocatalyst metal ceiling processing method of the embodiment of the invention two;
Fig. 5 is the structural representation of the photocatalyst metal ceiling process equipment of the embodiment of the invention two.
The specific embodiment
Embodiment one:
As shown in Figure 1, the photocatalyst metal ceiling processing method of present embodiment may further comprise the steps:
(a) cleaning step: metal ceiling 8 is put into ultrasonic cleaning equipment 1 clean, remove dust, greasy dirt and the impurity on said metal ceiling 8 surfaces;
(b) drying steps: will clean the said metal ceiling 8 in back and send into drying device 7, with the dry tack free of said metal ceiling 8 through transport 2;
(c) the oxidation film layer step of coated titanium: dried said metal ceiling 8 is sent into first automatic spray apparatus 4 through said transport 2, spray water-soluble titanium dioxide, form the oxidation film layer 92 of titanium on the surface of said metal ceiling 8;
(d) baking and curing step: the said metal ceiling 8 that will apply the oxidation film layer 92 of said titanium is sent into infrared ray apparatus for baking 5 through said transport 2, with oxidation film layer 92 baking and curing of said titanium;
(e) detect step: through said transport 2 the said metal ceiling 8 after the baking and curing is passed out to the detection station, the thickness of the oxidation film layer 92 through 9 pairs of said titaniums of checkout gear detects.
As shown in Figure 2; The photocatalyst metal ceiling process equipment of present embodiment comprises the ultrasonic cleaning equipment 1 of the dust, greasy dirt and the impurity that are used to remove metal ceiling 8 surfaces; The transport 2 that is used for the said metal ceiling 8 of automatic transport; Dry drying device 7 is carried out on the surface of said metal ceiling 8 after being used for cleaning; Be used for first automatic spray apparatus 4 that sprays water-soluble titanium dioxide on the surface of said metal ceiling 8 and form the oxidation film layer 92 of titanium; Be used for the infrared ray apparatus for baking 5 with oxidation film layer 92 baking and curing of said titanium, be used for the checkout gear 9 that the thickness to the oxidation film layer 92 of said titanium detects, said ultrasonic cleaning equipment 1, said drying device 7, said first automatic spray apparatus 4, said infrared ray apparatus for baking 5 form automatic production lines through said transport 2.
As shown in Figure 3, adopt the processing method of present embodiment and the local section structure of the photocatalyst metal ceiling 8 that apparatus processing is come out to comprise metal substrate 90, the surface attachment organic/inorganic substance separation layer 91 of said metal substrate 90; The surface attachment of said inorganic matter separation layer 91 has the oxidation film layer 92 of titanium, and said metal substrate 90 is an aluminium alloy base plate, certainly; Also can be the existing ceiling of having installed and used, even its surface can have organic coating, be rich in the dichloride in anatase type grade titanium dioxide in the oxidation film layer 92 of said titanium; Active ingredient concentration is high, and it has powerful redox ability, high chemical stability and nontoxic performance in the sun, have excellent sterilizing antibiotic with usefulness such as degraded pernicious gas; Avoided bacterium to send out heavy breathing; Prevent mouldyly, avoided adopting traditional chemosterilant that there is the problem of secondary toxicity and excitant and continuation difference in environmental improvement, purify air and self-cleaning effective; Comprise the nanometer-level silver ion in the oxidation film layer 92 of said titanium; Silver ion has bactericidal effect efficiently, and it just can discharge sterilization under indoor light, and it purifies air and self-cleaning effective under indoor environment; The material of said inorganic matter separation layer 91 is a silica, can certainly be other materials such as silicon nitride.
Embodiment two:
As shown in Figure 4, the photocatalyst metal ceiling processing method of present embodiment may further comprise the steps:
(a) cleaning step: metal ceiling 8 is put into ultrasonic cleaning equipment 1 clean, remove dust, greasy dirt and the impurity on said metal ceiling 8 surfaces;
(b) drying steps: will clean the said metal ceiling 8 in back and send into drying device 7, with the dry tack free of said metal ceiling 8 through transport 2;
(b1) apply the separation layer step: said metal ceiling 8 is sent into second automatic spray apparatus 3 through transport 2, at the surface-coated inorganic matter separation layer 91 of said metal ceiling 8;
(c) the oxidation film layer step of coated titanium: dried said metal ceiling 8 is sent into first automatic spray apparatus 4 through said transport 2, spray water-soluble titanium dioxide, form the oxidation film layer 92 of titanium on the surface of said inorganic matter separation layer 91;
(d) baking and curing step: the said metal ceiling 8 that will apply the oxidation film layer 92 of said inorganic matter separation layer 91 and said titanium is sent into infrared ray apparatus for baking 5 through said transport 2, with oxidation film layer 92 baking and curing of said inorganic matter separation layer 91 and said titanium;
(e) detect step: through said transport 2 the said metal ceiling 8 after the baking and curing is passed out to the detection station, the thickness of the oxidation film layer 92 through 9 pairs of said titaniums of checkout gear detects.
As shown in Figure 5; The photocatalyst metal ceiling process equipment of present embodiment comprises the ultrasonic cleaning equipment 1 of the dust, greasy dirt and the impurity that are used to remove metal ceiling 8 surfaces; The transport 2 that is used for the said metal ceiling 8 of automatic transport; Dry drying device 7 is carried out on the surface of said metal ceiling 8 after being used for cleaning; Be used for second automatic spray apparatus 3 at the surface-coated inorganic matter separation layer 91 of said metal ceiling 8; Be used for first automatic spray apparatus 4 that sprays water-soluble titanium dioxide on the surface of said inorganic matter separation layer 91 and form the oxidation film layer 92 of titanium; Be used for infrared ray apparatus for baking 5 with oxidation film layer 92 baking and curing of said inorganic matter separation layer 91 and said titanium; Be used for the checkout gear 9 that the thickness to the oxidation film layer 92 of said titanium detects, said ultrasonic cleaning equipment 1, said drying device 7, said second automatic spray apparatus 3, said first automatic spray apparatus 4, said infrared ray apparatus for baking 5 form automatic production lines through said transport 2.
The local section structure that adopts the processing method of present embodiment and the photocatalyst metal ceiling 8 that apparatus processing is come out is with embodiment one.
Photocatalyst metal ceiling processing method operation of the present invention is easy, production efficiency is high, can apply the existing ceiling of having installed and used; Photocatalyst metal ceiling process equipment of the present invention is easy to dismounting, be convenient to move and transportation, can operate at the scene; Adopt the photocatalyst metal ceiling of this method and apparatus processing to have health, environmental protection, convenience for washing, low, the attractive and durable advantage of cost, can carry out upgrading to it at the scene, place of existing ceiling.
The present invention can be widely used in the ceiling manufacture field.
Claims (5)
1. photocatalyst metal ceiling processing method is characterized in that: may further comprise the steps:
(a) cleaning step: metal ceiling (8) is put into ultrasonic cleaning equipment (1) clean, remove dust, greasy dirt and the impurity on said metal ceiling (8) surface;
(b) drying steps: will clean the said metal ceiling in back (8) and send into drying device (7), with the dry tack free of said metal ceiling (8) through transport (2);
(b1) apply the separation layer step: said metal ceiling (8) is sent into second automatic spray apparatus (3) through transport (2); At the surface-coated inorganic matter separation layer (91) of said metal ceiling (8), the material of said inorganic matter separation layer (91) is silica or silicon nitride;
(c) the oxidation film layer step of coated titanium: said metal ceiling (8) is sent into first automatic spray apparatus (4) through said transport (2); Surface at said inorganic matter separation layer (91) sprays water-soluble titanium dioxide; Form the oxidation film layer (92) of titanium; The oxidation film layer of said titanium is rich in the dichloride in anatase type grade titanium dioxide in (92), and the oxidation film layer of said titanium comprises the nanometer-level silver particle in (92);
(d) baking and curing step: the said metal ceiling (8) that will apply the oxidation film layer (92) of said inorganic matter separation layer (91) and said titanium is sent into infrared ray apparatus for baking (5) through said transport (2), with oxidation film layer (92) baking and curing of said inorganic matter separation layer (91) and said titanium;
(e) detect step: through said transport (2) the said metal ceiling (8) after the baking and curing is passed out to the detection station, detect through the thickness of checkout gear (9) to the oxidation film layer (92) of said titanium.
2. photocatalyst metal ceiling processing method according to claim 1 is characterized in that: the surface of said metal ceiling (8) itself applies organic coating, and said metal ceiling (8) adopts aluminium alloy base plate.
3. photocatalyst metal ceiling process equipment; It is characterized in that: comprise the ultrasonic cleaning equipment (1) that is used to remove surperficial dust, greasy dirt and impurity of metal ceiling (8); The transport (2) that is used for the said metal ceiling of automatic transport (8); Dry drying device (7) is carried out on the surface of said metal ceiling (8) after being used for cleaning; Be used for spraying water-soluble titanium dioxide and form first automatic spray apparatus (4) of the oxidation film layer (92) of titanium on the surface of said metal ceiling (8); Be used for infrared ray apparatus for baking (5) with oxidation film layer (92) baking and curing of said titanium; Be used for the checkout gear (9) that the thickness of the oxidation film layer (92) to said titanium detects, said ultrasonic cleaning equipment (1), said drying device (7), said first automatic spray apparatus (4), said infrared ray apparatus for baking (5) form automatic production line through said transport (2); The oxidation film layer of said titanium is rich in the dichloride in anatase type grade titanium dioxide in (92); The oxidation film layer of said titanium comprises the nanometer-level silver particle in (92).
4. photocatalyst metal ceiling process equipment; It is characterized in that: comprise the ultrasonic cleaning equipment (1) that is used to remove surperficial dust, greasy dirt and impurity of metal ceiling (8); The transport (2) that is used for the said metal ceiling of automatic transport (8); Dry drying device (7) is carried out on the surface of said metal ceiling (8) after being used for cleaning; Be used for second automatic spray apparatus (3) at the surface-coated inorganic matter separation layer (91) of said metal ceiling (8); Be used for spraying water-soluble titanium dioxide and form first automatic spray apparatus (4) of the oxidation film layer (92) of titanium on the surface of said inorganic matter separation layer (91); Be used for infrared ray apparatus for baking (5) with oxidation film layer (92) baking and curing of said inorganic matter separation layer (91) and said titanium; Be used for the checkout gear (9) that the thickness of the oxidation film layer (92) to said titanium detects, said ultrasonic cleaning equipment (1), said drying device (7), said second automatic spray apparatus (3), said first automatic spray apparatus (4), said infrared ray apparatus for baking (5) form automatic production line through said transport (2); The oxidation film layer of said titanium is rich in the dichloride in anatase type grade titanium dioxide in (92); The oxidation film layer of said titanium comprises the nanometer-level silver particle in (92); The material of said inorganic matter separation layer (91) is silica or silicon nitride.
5. according to claim 3 or 4 described photocatalyst metal ceiling process equipments, it is characterized in that: the surface of said metal ceiling (8) itself applies organic coating, and said metal ceiling (8) adopts aluminium alloy base plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101191031A CN101780452B (en) | 2010-01-26 | 2010-01-26 | Photocatalyst metal ceiling processing method and device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010101191031A CN101780452B (en) | 2010-01-26 | 2010-01-26 | Photocatalyst metal ceiling processing method and device |
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| CN101780452A CN101780452A (en) | 2010-07-21 |
| CN101780452B true CN101780452B (en) | 2012-02-22 |
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| CN2010101191031A Expired - Fee Related CN101780452B (en) | 2010-01-26 | 2010-01-26 | Photocatalyst metal ceiling processing method and device |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN104309395A (en) * | 2014-11-06 | 2015-01-28 | 天津发洋环保科技有限公司 | Spray coating production line for photocatalytic calligraphy and painting |
| CN104353592A (en) * | 2014-11-06 | 2015-02-18 | 天津发洋环保科技有限公司 | Full-automatic photocatalyst spraying production line |
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| CN2542326Y (en) * | 2002-03-13 | 2003-04-02 | 孙实庆 | Photocatalyst coating device for fibre, organics and metal |
| CN1742582A (en) * | 2005-09-29 | 2006-03-08 | 深圳清华大学研究院 | Photocatalyst-type anti-biotic material preparing method |
| CN201011079Y (en) * | 2006-09-22 | 2008-01-23 | 北京多尔佳科技有限公司 | Inorganic composite antibiotic ceiling board |
| CN201664659U (en) * | 2010-01-26 | 2010-12-08 | 百安力钢结构应用科技有限公司 | Processing equipment for metal ceiling coated with photocatalyst |
-
2010
- 2010-01-26 CN CN2010101191031A patent/CN101780452B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2542326Y (en) * | 2002-03-13 | 2003-04-02 | 孙实庆 | Photocatalyst coating device for fibre, organics and metal |
| CN1742582A (en) * | 2005-09-29 | 2006-03-08 | 深圳清华大学研究院 | Photocatalyst-type anti-biotic material preparing method |
| CN201011079Y (en) * | 2006-09-22 | 2008-01-23 | 北京多尔佳科技有限公司 | Inorganic composite antibiotic ceiling board |
| CN201664659U (en) * | 2010-01-26 | 2010-12-08 | 百安力钢结构应用科技有限公司 | Processing equipment for metal ceiling coated with photocatalyst |
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