CN101736297B - Rotatable sputtering cathode device for film coating - Google Patents
Rotatable sputtering cathode device for film coating Download PDFInfo
- Publication number
- CN101736297B CN101736297B CN200810235989A CN200810235989A CN101736297B CN 101736297 B CN101736297 B CN 101736297B CN 200810235989 A CN200810235989 A CN 200810235989A CN 200810235989 A CN200810235989 A CN 200810235989A CN 101736297 B CN101736297 B CN 101736297B
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- Prior art keywords
- circular tubes
- cathode
- hole
- centre bearing
- film coating
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- 239000007888 film coating Substances 0.000 title claims abstract description 14
- 238000009501 film coating Methods 0.000 title claims abstract description 14
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000009413 insulation Methods 0.000 claims description 26
- 238000007789 sealing Methods 0.000 claims description 11
- 230000000630 rising effect Effects 0.000 claims description 6
- 239000011521 glass Substances 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000013077 target material Substances 0.000 abstract 3
- 238000009504 vacuum film coating Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000002826 coolant Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 208000002925 dental caries Diseases 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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Abstract
The invention discloses a rotatable sputtering cathode device for film coating which is characterized by uniform sputtering of film coating materials and high target material use ratio. The invention comprises a pair of cathode circular tubes and a circular tube shape target material, wherein the cathode circular tubes are supported in the machine frame in movable manner and the circular tube shape target material is mounted on the cathode circular tubes; a central supporting tube and a magnetic core element are supported in the cathode circular tubes; the central supporting tube as well as an isolating sleeve, a supporting seat and the cathode circular tubes form a closed cavity, a seal lug is arranged on the inner wall of the isolating sleeve to seal contact with the central supporting tube, the end part of the central supporting tube positioned outside the seal lug is provided with a through hole, the inner cavity of the central supporting tube is communicated with the water inlet tube mounted on the machine frame via the through hole and the through hole on the isolating sleeve, the cavity on the other side of the seal lug is communicated with the water outlet tube mounted on the machine frame via the water outlet through hole on the isolating sleeve, and the water outlet hole on the other end of the inner cavity of the central supporting tube is communicated with the cavity. The invention can be applied to production equipments for vacuum film coating glass.
Description
Technical field
The present invention relates to a kind of plated film sputter equipment, refer more particularly to a kind of rotatable sputtering cathode device for film coating.
Background technology
Adopt plane sputter cathode target mostly in the equipment of production coated glass at present; Its principle of work is: it is indoor to need the glass of plated film to send into vacuum plating; A certain amount of high-purity process gas of the indoor feeding of vacuum plating---like oxygen, nitrogen or argon gas; Process gas forms the plasma body of positively charged under the effect of EM field and free electron; Plasma body under the control in magnetic field, is used material according to the plated film that certain track and dynamics bombardment are fixedly mounted on the indoor planar cathode target of vacuum plating under the attraction of the negative electrode that is loaded with high negative voltage; Coating Materials is come out by gas molecule collision, is deposited on the certain thickness rete of formation on glass according to certain orientation.The shortcoming of above-mentioned plane sputter cathode target is: because bombardment track and target all are fixed; Therefore after using for some time; Sputter cathode target surface, plane can form runway shape sputter pit, not only can destroy the homogeneity of coatings, and reduce the utilization ratio of target; Need often to change target, very trouble.
Summary of the invention
Technical problem to be solved by this invention is: will provide all even target utilization of a kind of Coating Materials sputter high rotatable sputtering cathode device for film coating.
For addressing the above problem; The technical scheme that the present invention adopts is: rotatable sputtering cathode device for film coating; Comprise: be installed in the pipe shape target on the cathode circular tubes, the two ends of cathode circular tubes are connected with a supporting base respectively, and one of them supporting base insulation ground expansion bearing is on frame; This supporting base is provided with driving wheel and brush, and power supply is connected on the cathode circular tubes through brush and supporting base conduction; Going back insulation supporter in cathode circular tubes inside has the centre bearing pipe, and the bottom of centre bearing pipe is provided with magnetic core element; Another supporting base expansion bearing is in insulation covering, and insulation covering is installed on the frame; Constitute an airtight cavity between centre bearing pipe and insulation covering, supporting base and the cathode circular tubes; The insulation covering inwall is provided with the sealing projection and contacts with the centre bearing seal of tube; The end that is positioned at the centre bearing pipe in the sealing projection outside is provided with through hole; The inner chamber of centre bearing pipe communicates with rack-mounted water inlet pipe through the through hole on this through hole and the insulation covering; The cavity of sealing projection opposite side communicates with rack-mounted rising pipe through the water outlet through hole on the insulation covering, is provided with posticum at the other end of centre bearing pipe, and cavity communicates through the inner chamber of this posticum with the centre bearing pipe.
On above-mentioned centre bearing pipe, also be provided with several guide vanes.
Described magnetic core element is installed in the magnetic core mount pad, and the magnetic core mount pad is installed on the centre bearing pipe through attachment fastener.
Between described magnetic core element and cathode circular tubes, also be provided with several support rollers.
The centre of described magnetic core element is the N utmost point, and the S utmost point is being arranged in both sides.
Advantage of the present invention is: through adopting target cylindraceous, make it during work to rotate, target just can not form pit when being bombarded like this, and avoids the formation of sputter zone of oxidation, improves the utilization ratio of target, improves the homogeneity of coatings.
Description of drawings
Fig. 1 is the structural representation of rotatable sputtering cathode device for film coating of the present invention;
Fig. 2 is the partial enlarged drawing of A part among Fig. 1;
Fig. 3 is the partial enlarged drawing of B part among Fig. 1;
Fig. 4 is magnetic core element and magnetic core mount pad partial C-C sectional structure chart among Fig. 1.
Among the figure: 1, cathode circular tubes, 2, target, 3, supporting base, 31, supporting base, 4, frame, 5, driving wheel; 6, brush, 7, the centre bearing pipe, 8, magnetic core element, 9, insulation covering, 10, cavity, 11, the sealing projection, 12, through hole; 13, through hole, 14, water inlet pipe, 15, the water outlet through hole, 16, rising pipe, 17, posticum; 18, guide vane, 19, the magnetic core mount pad, 20, attachment fastener, 21, support roller, 22, insulating part.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment technical scheme of the present invention and principle of work thereof and advantage are done further to describe.
Like Fig. 1, Fig. 2, shown in Figure 3; Rotatable sputtering cathode device for film coating; Comprise: be installed in the pipe shape target 2 on the cathode circular tubes 1, the two ends of cathode circular tubes 1 are connected with a supporting base 3 and 31 respectively, one of them supporting base 3 through insulating part 22 and bearing insulation ground expansion bearing on frame 4; This supporting base 3 is provided with driving wheel 5 and brush 6, and 3 conduction are connected on the cathode circular tubes 1 power supply with supporting base through brush 6; Go back insulation supporter in cathode circular tubes 1 inside centre bearing pipe 7 is arranged; The bottom of centre bearing pipe 7 is provided with magnetic core element 8; Referring to shown in Figure 4, described magnetic core element 8 is installed in the magnetic core mount pad 19, and magnetic core mount pad 19 is installed on the centre bearing pipe 7 through attachment fastener 20; The centre of described magnetic core element 8 is the N utmost point, and the S utmost point is being arranged in both sides; In insulation covering 9, insulation covering 9 is installed on the frame 4 to another supporting base 31 through the bearing expansion bearing; Centre bearing pipe 7 and insulation covering 9, supporting base 3 and 31 and cathode circular tubes 1 between constitute an airtight cavity 10; Insulation covering 9 inwalls are provided with sealing projection 11 and contact with 7 sealings of centre bearing pipe; The end that is positioned at the centre bearing pipe 7 in sealing projection 11 outsides is provided with through hole 12; The inner chamber of centre bearing pipe 7 communicates with water inlet pipe 14 on being installed in frame 4 through the through hole 13 on this through hole 12 and the insulation covering 9; The cavity 10 of sealing projection 11 opposite sides communicates with rising pipe 16 on being installed in frame 4 through the water outlet through hole 15 on the insulation covering 9; The other end at centre bearing pipe 7 is provided with posticum 17, and cavity 10 communicates with the inner chamber of centre bearing pipe 7 through this posticum 17.On centre bearing pipe 7, also be provided with several guide vanes 18, the effect of guide vane 18 is flow directions of guiding water, and water coolant can be discharged from rising pipe 16 through cavity 10 fast.Between magnetic core element 8 and cathode circular tubes 1, also be provided with several support rollers 21, the effect of support roller 21 is: prevent that centre bearing pipe 7 and magnetic core element 8 grades from rubbing the rotation of obstruction cathode circular tubes 1 because of the inwall of conduct oneself with dignity bending and cathode circular tubes 1.
Principle of work of the present invention is: the drive unit by other setting during work drives supporting base 3 and 31, reaches cathode circular tubes 1 and target 2 uniform rotation through driving wheel 5, and through brush 6 high negative voltage is passed on the cathode circular tubes 1 through supporting base 3.It is indoor that the glass of need plated film is sent into vacuum plating; A certain amount of high-purity process gas of the indoor feeding of vacuum plating---like oxygen, nitrogen or argon gas; Process gas forms the plasma body of positively charged under the effect of EM field and free electron, and plasma body is being loaded with the negative electrode of high negative voltage---under the attraction of cathode circular tubes 1, under the control in magnetic field; Plated film according to certain track and dynamics are bombarded on the pipe shape target 2 that at the uniform velocity rotates is used material; Coating Materials is come out by gas molecule collision, is deposited on the certain thickness rete of formation on glass according to certain orientation, accomplishes plated film work.Among the present invention; Because target 2 is constantly at the uniform velocity rotation when work; Thereby plasma body will bombard its whole surface equably, on its surface with regard to can not form because of a certain position by the sputter pit that long-term bombardment forms, effectively avoided the formation of sputter zone of oxidation; And improved the utilization ratio of target, improved the homogeneity of coatings.
In addition; The working temperature of target 2 is too high after the long term operation; Can in cathode circular tubes 1, feed water coolant, its method of cooling is: in water inlet pipe 14, feed nonconducting water coolant, water coolant is arranged on through hole 13 and the inner chamber that is arranged on the through hole 12 inflow centre bearing pipes 7 on the centre bearing pipe 7 on the insulation covering 9 from water inlet pipe 14 processes; Flow into cavitys 10 from posticum 17 then, after water outlet through hole 15 flow out from rising pipe 16.During work, because cathode circular tubes 1 is in slew rope, thereby guide vane 18 relatively rotates with respect to cathode circular tubes 1, thereby guide cooling water flows to water outlet through hole 15 apace better.
Claims (5)
1. rotatable sputtering cathode device for film coating; It is characterized in that: comprising: be installed in the pipe shape target on the cathode circular tubes; The two ends of cathode circular tubes are connected with a supporting base respectively; One of them supporting base insulation ground expansion bearing is on frame, and this supporting base is provided with driving wheel and brush, and power supply is connected on the cathode circular tubes through brush and this supporting base conduction; Going back insulation supporter in cathode circular tubes inside has the centre bearing pipe, and the bottom of centre bearing pipe is provided with magnetic core element; Another supporting base expansion bearing is in insulation covering, and insulation covering is installed on the frame; Constitute an airtight cavity between centre bearing pipe and insulation covering, supporting base and the cathode circular tubes; The insulation covering inwall is provided with the sealing projection and contacts with the centre bearing seal of tube; The end that is positioned at the centre bearing pipe in the sealing projection outside is provided with through hole; The inner chamber of centre bearing pipe communicates with rack-mounted water inlet pipe through the through hole on this through hole and the insulation covering; The cavity of sealing projection opposite side communicates with rack-mounted rising pipe through the water outlet through hole on the insulation covering, is provided with posticum at the other end of centre bearing pipe, and cavity communicates through the inner chamber of this posticum with the centre bearing pipe.
2. according to the described rotatable sputtering cathode device for film coating of claim 1, it is characterized in that: on the centre bearing pipe, also be provided with several guide vanes.
3. according to claim 1 or 2 described rotatable sputtering cathode device for film coating, it is characterized in that: described magnetic core element is installed in the magnetic core mount pad, and the magnetic core mount pad is installed on the centre bearing pipe through attachment fastener.
4. according to claim 1 or 2 described rotatable sputtering cathode device for film coating, it is characterized in that: between magnetic core element and cathode circular tubes, also be provided with several support rollers.
5. according to claim 1 or 2 described rotatable sputtering cathode device for film coating, it is characterized in that: the centre of described magnetic core element is the N utmost point, and the S utmost point is being arranged in both sides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810235989A CN101736297B (en) | 2008-11-19 | 2008-11-19 | Rotatable sputtering cathode device for film coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200810235989A CN101736297B (en) | 2008-11-19 | 2008-11-19 | Rotatable sputtering cathode device for film coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101736297A CN101736297A (en) | 2010-06-16 |
| CN101736297B true CN101736297B (en) | 2012-10-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810235989A Expired - Fee Related CN101736297B (en) | 2008-11-19 | 2008-11-19 | Rotatable sputtering cathode device for film coating |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102296273B (en) * | 2010-06-24 | 2013-06-05 | 上海子创镀膜技术有限公司 | Rotating cathode drive system for vacuum magnetron sputtering coating film |
| CN103409725A (en) * | 2013-05-22 | 2013-11-27 | 东莞宏威数码机械有限公司 | Rotary alien target cathode mechanism and magnetron sputtering coating device |
| CN105506568B (en) * | 2016-01-21 | 2017-10-31 | 武汉科瑞达真空科技有限公司 | A kind of new twin external rotating cathode |
| CN108559960B (en) * | 2018-07-18 | 2023-09-22 | 北京泰科诺科技有限公司 | Insulating material pipeline inner wall coating film device |
| CN112430801A (en) * | 2020-10-27 | 2021-03-02 | 中国石油天然气集团有限公司 | Magnetron sputtering device and magnetron sputtering method for inner wall of steel pipe |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1182805A (en) * | 1997-04-30 | 1998-05-27 | 浙江大学 | Rotary target column type magnetic controlled sputtering device |
| CN1986875A (en) * | 2005-12-22 | 2007-06-27 | 应用材料两合公司 | Sputter apparatus with a pipe cathode and method for operating this sputter apparatus |
| CN101280421A (en) * | 2008-03-24 | 2008-10-08 | 重庆跃进机械厂有限公司 | Multi-station bearing magnetron sputtering coating device |
| CN201326007Y (en) * | 2008-11-19 | 2009-10-14 | 苏州新爱可镀膜设备有限公司 | Rotary sputtering cathode device used for film coating |
-
2008
- 2008-11-19 CN CN200810235989A patent/CN101736297B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1182805A (en) * | 1997-04-30 | 1998-05-27 | 浙江大学 | Rotary target column type magnetic controlled sputtering device |
| CN1986875A (en) * | 2005-12-22 | 2007-06-27 | 应用材料两合公司 | Sputter apparatus with a pipe cathode and method for operating this sputter apparatus |
| CN101280421A (en) * | 2008-03-24 | 2008-10-08 | 重庆跃进机械厂有限公司 | Multi-station bearing magnetron sputtering coating device |
| CN201326007Y (en) * | 2008-11-19 | 2009-10-14 | 苏州新爱可镀膜设备有限公司 | Rotary sputtering cathode device used for film coating |
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| CN101736297A (en) | 2010-06-16 |
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| C53 | Correction of patent for invention or patent application | ||
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| CB03 | Change of inventor or designer information |
Inventor after: Huang Feng Inventor before: Zhao Zidong |
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Free format text: CORRECT: INVENTOR; FROM: ZHAO ZIDONG TO: HUANG FENG |
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| CP02 | Change in the address of a patent holder |
Address after: 215627 No. 99 Chiang Kai highway, Jiangsu, Zhangjiagang Patentee after: Suzhou Xin'aike Deposition Equipment Co., Ltd. Address before: 215625 Jiangsu city of Zhangjiagang province Fengzhen Jin Jin Nan Lu Jinfeng Technology Park No. B19 Patentee before: Suzhou Xin'aike Deposition Equipment Co., Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121017 Termination date: 20161119 |
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| CF01 | Termination of patent right due to non-payment of annual fee |