CN101724810A - Evaporation method and evaporation equipment - Google Patents
Evaporation method and evaporation equipment Download PDFInfo
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- CN101724810A CN101724810A CN200910225436A CN200910225436A CN101724810A CN 101724810 A CN101724810 A CN 101724810A CN 200910225436 A CN200910225436 A CN 200910225436A CN 200910225436 A CN200910225436 A CN 200910225436A CN 101724810 A CN101724810 A CN 101724810A
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Abstract
The invention provides an evaporation method and evaporation equipment. The evaporation method comprises the following steps: firstly, providing a substrate and an evaporation mask, wherein the evaporation mask is provided with N pattern regions; in addition, providing an evaporation source, wherein the evaporation source is provided with a plurality of evaporation regions, and each evaporation region of the evaporation source is arranged corresponding to at least one pattern region of the evaporation mask; then, arranging the evaporation mask between the substrate and the evaporation source; then, evaporating the substrate for the first time; after the substrate is rotated for 90 degrees, evaporating the substrate for the second time; after the substrate is rotated for 90 degrees again, evaporating the substrate for the third time; and after the substrate is rotated for 90 degrees again, evaporating the substrate for the fourth time.
Description
Technical field
The invention relates to a kind of method of evaporating and evaporation equipment, and particularly relevant for a kind of method of evaporating and evaporation equipment that is applied to display of organic electroluminescence.
Background technology
The various communications that the information communication industry has become now main flow industry, particularly portable show the emphasis that product develops especially.And because flat-panel screens is communication interface between people and the information, so its development particularly important that seems.Display of organic electroluminescence (Organic Light Emitting Diode, OLED) with its luminous, wide viewing angle, power saving, program is simple and easy, low-cost, service temperature is extensive, the advantage of high speed of answer and full-colorization or the like, make it have great potentiality, therefore be expected to become the main flow of flat-panel screens of future generation.
Display of organic electroluminescence is the indicating meter that a kind of luminous characteristic of utilizing luminous organic material reaches display effect, wherein the molecular weight according to luminous organic material is divided into small molecules display of organic electroluminescence (Small Molecule OLED, SM-OLED) with polymer electro-exciting light-emitting display (PolymerLight Emitting Diode, PLED) two big classes.Both ray structures are made of pair of electrodes and organic material layer.When applying volts DS, organic luminous material layer is injected from anode (anode) in the hole, and electronics injects organic luminous material layer from negative electrode (cathode), because the potential difference that extra electric field caused makes two kinds of carriers of hole and electronics (carrier) move in the luminous organic material layer and produces radiativity to combine (Radiative Recombination).Part can form the luminous organic material molecular excitation single excite state molecule in conjunction with the energy of being emitted again by the electron hole.When single excite state molecule releases energy when getting back to ground state, wherein a certain proportion of energy can be emitted and luminous in the mode of photon, and this is the principle of luminosity of display of organic electroluminescence.
Along with the development of the maximization of display of organic electroluminescence, the bottleneck that it faced is that mask size required in the display of organic electroluminescence method of evaporating limits to some extent.In addition, be full-colorization in response to indicating meter, the part of luminescent layer needs red, blue, green three kinds of luminescent materials in three indoor evaporations of other evaporation cavity of branch usually in traditional evaporation technology.Such method is many except required mask number, and evaporation cavity number is also many, therefore can cause the long and expense problem of higher of evaporation time.
Summary of the invention
The invention provides a kind of method of evaporating, it can solve display of organic electroluminescence and have long and processing unit expense problem of higher of output time.
The invention provides a kind of evaporation equipment, it can reduce the required mask number of display of organic electroluminescence and evaporate required cavity number.
The present invention proposes a kind of method of evaporating, and it at first provides substrate and evaporation mask (mask) is provided, and wherein evaporates to have N area of the pattern on the mask.In addition, provide evaporation source (evaporation source), wherein evaporation source has a plurality of evaporation region, and at least one area of the pattern setting of the corresponding evaporation of each evaporation region mask.Then, will evaporate mask is arranged between substrate and the evaporation source.Afterwards, substrate is carried out the evaporation step first time (evaporation process).After substrate rotating 90 degree, substrate is carried out the evaporation step second time.With after substrate rotating 90 degree, substrate is carried out evaporation step for the third time once more.With after substrate rotating 90 degree, substrate is carried out evaporation step the 4th time once more.
The present invention proposes a kind of evaporation equipment (evaporation appratus) in addition, and it is in order to evaporate substrate, and described evaporation equipment comprises evaporation source and evaporation mask.Evaporation source has a plurality of evaporation region, and the evaporating materials in the wherein said evaporation region is incomplete same.Have N area of the pattern on the evaporation mask, and at least one area of the pattern of the corresponding evaporation of each evaporation region mask of evaporation source is provided with.
Based on above-mentioned, method of evaporating of the present invention and evaporation equipment can be finished the evaporation in N zone on a substrate in same evaporation chamber, to finish the evaporation step of N panel simultaneously.Owing to do not need to change, therefore can effectively reduce the required time of evaporation and then improve production capacity in the transfer of a plurality of evaporation chamber.
Description of drawings
Figure 1A to Fig. 1 F is the schematic flow sheet of method of evaporating according to an embodiment of the invention.
Fig. 2 is the synoptic diagram that evaporates mask according to an embodiment of the invention.
Fig. 3 A to Fig. 3 D is respectively the synoptic diagram of the evaporation step of corresponding diagram 1C to Fig. 1 F.
Fig. 4 A to Fig. 4 D is respectively the evaporation step substrate schematic top plan view afterwards of Fig. 3 A to Fig. 3 D.
Fig. 5 is the synoptic diagram that evaporates mask according to an embodiment of the invention.
Fig. 6 utilizes the evaporation mask of Fig. 5 to carry out evaporation step substrate schematic top plan view afterwards.
Drawing reference numeral
100,500: substrate
102a～102d, 502a～502d, 501a～501d: zone
200,400: the evaporation mask
202a～202d, 402a～402d: area of the pattern
300: evaporation source
302a～302d: evaporation region
304; Plate washer
306a～306d: evaporating materials
R1～R3: direction
Embodiment
For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended accompanying drawing to be described in detail below.
Figure 1A to Fig. 1 F is the schematic flow sheet of method of evaporating according to an embodiment of the invention.Please, at first provide a substrate 100 and an evaporation mask 200 earlier with reference to Figure 1A.Has n-quadrant 102a～102d on the substrate 100.Have N area of the pattern 202a～202d on the evaporation mask 200.In a preferred embodiment, above-mentioned N=4
n, and n is the positive integer more than 0 or 0.In the present embodiment, be with n=1, just N=4 is that example illustrates, but it is not in order to limit the present invention.In other words, in the present embodiment, evaporation mask 200 has 4 area of the pattern 202a～202d.
In the present embodiment, this method of evaporating is to be that example illustrates to be used for display of organic electroluminescence.In more detail, the method for evaporating of present embodiment is that the method for evaporating with the organic luminous layer that is applied to display of organic electroluminescence is that example illustrates.But the invention is not restricted to this, the method for evaporating of the following stated can also be applied to other devices or the evaporation of other retes.
The method of evaporating of present embodiment is to be that example illustrates with the organic luminous layer that is used for display of organic electroluminescence, and the design on the evaporation mask 200 as shown in Figure 2.In Fig. 2, evaporation mask 200 has four area of the pattern 202a～202d, it is respectively the first area of the pattern 202a, the second area of the pattern 202b, the 3rd area of the pattern 202c and the 4th area of the pattern 202d, wherein the first area of the pattern 202a and the 3rd pattern 202c are positioned on the diagonal lines of evaporation mask 200, and the second area of the pattern 202b and the 4th area of the pattern 202d are positioned on another diagonal lines that evaporates mask 200.Pattern in each area of the pattern 202a～202d on the above-mentioned evaporation mask 200 is a patterns of openings, uses so that the evaporating materials of evaporation source can be formed on the substrate 100 graphically by these patterns of openings.Then, please refer to Figure 1B, substrate 100 and evaporation mask 200 are combined.In the present embodiment, evaporation mask 200 is the belows that are arranged at substrate 100.In general, the mode that substrate 100 and evaporation mask 200 are combined is by mechanical arm substrate 100 and evaporation mask 200 to be combined.In order to take surface or the substrate 100 lip-deep retes that do not undermine substrate 100 into account, usually can a bit of distance of maintenance between substrate 100 and the evaporation mask 200 and directly do not fit together.In addition, can be plated in the specific position of substrate 100 accurately, so the distance between substrate 100 and the evaporation mask 200 is the smaller the better in order to make evaporating materials.
Afterwards, please refer to Fig. 1 C, an evaporation source 300 is provided, below evaporation mask 200, this evaporation source 300 has evaporation region 302a～302d.Present embodiment is to be that example illustrates with 4 evaporation region, but the invention is not restricted to this.Particularly, an area of the pattern 202a～202d of the corresponding evaporation of each evaporation region 302a～302d mask 200 is provided with.In the present embodiment, the evaporation region 302a of evaporation source 300 is area of the pattern 202a settings of corresponding evaporation mask 200; The evaporation region 302b of evaporation source 300 is that the area of the pattern 202b of corresponding evaporation mask 200 is provided with; The evaporation region 302c of evaporation source 300 is that the area of the pattern 202c of corresponding evaporation mask 200 is provided with; The evaporation region 302d of evaporation source 300 is that the area of the pattern 202d of corresponding evaporation mask 200 is provided with.In addition, in each evaporation region 302a～302d of evaporation source 300, be provided with evaporating materials 306a～306d separately, and these a little evaporating materials 306a～306d are incomplete same.For instance, in above-mentioned evaporation region 302a～302c the first color evaporating materials 306a, the second color evaporating materials 306b and the 3rd color evaporating materials 306c are set respectively.The first color evaporating materials 306a for example is that red evaporating materials, the second color evaporating materials 306b for example are green evaporating materials, and the 3rd color evaporating materials 306c for example is blue evaporating materials.
In addition, the 4th color evaporating materials 306d or any evaporation material is not set can be set in the evaporation region 302d.If the 4th color evaporating materials 306d is set in the evaporation region 302d, described the 4th evaporating materials 306d can be the first color evaporating materials (red evaporating materials), the second color evaporating materials (green evaporating materials) and the 3rd color evaporating materials (blue evaporating materials) one of them.According to another embodiment, the 4th above-mentioned evaporating materials 306d can be the evaporating materials that is different from the first color evaporating materials (red evaporating materials), the second color evaporating materials (green evaporating materials) and the 3rd color evaporating materials (blue evaporating materials), and it for example is white evaporating materials, light green evaporating materials, scarlet evaporating materials or the evaporating materials of other colors.So that these those skilled in the art understand the present invention, present embodiment is to be that example illustrates so that the 4th color evaporating materials 306d (green evaporating materials) to be set in evaporation region 302d in order to describe in detail.
According to a preferred embodiment of the present invention, not interfering with each other or mixed in together in evaporative process for the evaporating materials 306a～306d that makes each the evaporation region 302a～302d in the evaporation source 300, in evaporation source 300, can comprise plate washer 304 is set.Plate washer 304 mainly is between the evaporation region 302a～302d that is arranged at evaporation source 300.The material of plate washer 304 is generally metal, and it mainly is can bear the required temperature of method of evaporating for considering.In addition, the form of this evaporation source 300 can be an evaporation source, line evaporation source or face evaporation source.In more detail, the form that the evaporating materials 306a～306d of each the evaporation region 302a～302d in the evaporation source 300 can evaporate with the form of an evaporation, evaporates with line evaporates, or evaporates with the form of face evaporation.
Please continue C with reference to Fig. 1, evaporation mask 200 is arranged between substrate 100 and the evaporation source 300, carry out the evaporation step first time, wherein an area of the pattern 202a～202d on the corresponding evaporation of each the evaporation region 302a on the evaporation source 300～302d mask 200 is provided with.Carrying out the first time during evaporation step, the schematic top plan view that evaporation mask 200 and substrate 100 are combined as shown in Figure 3A.In Fig. 3 A, pattern on the evaporation region 202a of evaporation mask is that the regional 102a of counterpart substrate is provided with, pattern on the evaporation region 202b of evaporation mask is that the regional 102b of counterpart substrate is provided with, pattern on the evaporation region 202c of evaporation mask is that the regional 102c of counterpart substrate is provided with, and the pattern on the evaporation region 202d of evaporation mask is that the regional 102d of counterpart substrate is provided with.Carry out after the evaporation step first time, formed evaporation pattern is shown in Fig. 4 A on substrate 100.In Fig. 4 A, evaporation has red, green, blue, green evaporation pattern respectively in the regional 102a～102d of substrate 100.
Afterwards, please continue D, substrate 100 is rotated 90 degree along the R1 direction with reference to Fig. 1.In other words, evaporation mask 200 all maintains static with evaporation source 300, and only substrate 100 is rotated 90 degree.And then, substrate 100 is carried out the evaporation step second time.Carrying out the second time during evaporation step, the schematic top plan view that evaporation mask 200 and substrate 100 are combined is shown in Fig. 3 B.In Fig. 3 B, pattern on the evaporation region 202a of evaporation mask is that the regional 102d of counterpart substrate is provided with, pattern on the evaporation region 202b of evaporation mask is that the regional 102a of counterpart substrate is provided with, pattern on the evaporation region 202c of evaporation mask is that the regional 102b of counterpart substrate is provided with, and the pattern on the evaporation region 202d of evaporation mask is that the regional 102c of counterpart substrate is provided with.Carry out after the evaporation step second time, formed evaporation pattern is shown in Fig. 4 B on substrate 100.In Fig. 4 B, evaporation has red, green, blue, green evaporation pattern respectively in regional 102d, the 102a of substrate 100,102b, 102c.
Afterwards, please continue E, substrate 100 is rotated 90 degree once again along the R2 direction with reference to Fig. 1.In other words, evaporation mask 200 all maintains static with evaporation source 300, and only substrate 100 is rotated once again 90 degree.And then, substrate 100 is carried out evaporation step for the third time.When carrying out for the third time evaporation step, the schematic top plan view that evaporation mask 200 and substrate 100 are combined is shown in Fig. 3 C.In Fig. 3 C, pattern on the evaporation region 202a of evaporation mask is that the regional 102c of counterpart substrate is provided with, pattern on the evaporation region 202b of evaporation mask is that the regional 102d of counterpart substrate is provided with, pattern on the evaporation region 202c of evaporation mask is that the regional 102a of counterpart substrate is provided with, and the pattern on the evaporation region 202d of evaporation mask is that the regional 102b of counterpart substrate is provided with.Carry out for the third time after the evaporation step, formed evaporation pattern is shown in Fig. 4 C on substrate 100.In Fig. 4 C, evaporation has red, green, blue, green evaporation pattern respectively in regional 102c, the 102d of substrate 100,102a, 102b.
Please continue F, substrate 100 is rotated 90 degree once again along the R3 direction with reference to Fig. 1.In other words, evaporation mask 200 all maintains static with evaporation source 300, and only substrate 100 is rotated once again 90 degree.And then, substrate 100 is carried out evaporation step the 4th time.When carrying out the 4th evaporation step, the schematic top plan view that evaporation mask 200 and substrate 100 are combined is shown in Fig. 3 D.In Fig. 3 D, pattern on the evaporation region 202a of evaporation mask is that the regional 102b of counterpart substrate is provided with, pattern on the evaporation region 202b of evaporation mask is that the regional 102c of counterpart substrate is provided with, pattern on the evaporation region 202c of evaporation mask is that the regional 102d of counterpart substrate is provided with, and the pattern on the evaporation region 202d of evaporation mask is that the regional 102a of counterpart substrate is provided with.After carrying out the 4th evaporation step, formed evaporation pattern is shown in Fig. 4 D on substrate 100.In Fig. 4 D, evaporation has red, green, blue, green evaporation pattern respectively in regional 102b, the 102c of substrate 100,102d, 102a.
What deserves to be mentioned is, according to one embodiment of the invention, according to the needs of the design of the pixel among the regional 102a～102d on the substrate 100, after finishing above-mentioned evaporation step, last pattern in the regional 102a～102d of substrate 100 has special mirror image symmetric relation.In other words, pattern in regional 102a and the pattern of regional 102c have the symmetric relation of mirror image, and the pattern of pattern in regional 102b and regional 102d has the symmetric relation of mirror image.
The foregoing description is in four evaporation region evaporating materials to be set all.So, according to other embodiment, if be not provided with evaporating materials among the 4th the evaporation region 302d of evaporation source 300, then this evaporation step can be after the step of carrying out Fig. 1 E, when carrying out the step of Fig. 1 F, just with substrate 100 along the R3 direction rotate once again 90 the degree after, when substrate 100 is carried out the 4th evaporation step, described the 4th evaporation step is that three evaporation region that are provided with evaporating materials are evaporated, and the corresponding substrate regions that is not provided with the 4th evaporation region 302d of evaporating materials then can not be evaporated evaporating materials.
The above embodiments are having 4 zones on the substrate 100, and evaporation mask 200 has 4 evaporation region (N=4), and evaporation source 300 to have 4 evaporation sources be that example illustrates.So, the invention is not restricted to this, in the present invention, above-mentioned N=4
n, and n is the positive integer more than 0 or 0.Therefore according to other embodiments of the invention, can have 16 zones on the substrate 100, evaporation mask 200 can have 16 evaporation region (N=4
2), and evaporation source 300 has 4 evaporation sources.As shown in Figure 5, it is the synoptic diagram that evaporates mask according to another embodiment of the present invention.In Fig. 5, evaporation mask 400 has area of the pattern 402a～402d, and each area of the pattern 402a～402d can be further divided into 4 area of the pattern again.With area of the pattern 402a is example, can further be divided into area of the pattern 401a～401d in the area of the pattern 402a.So, in this embodiment, each area of the pattern 402a～402d is an evaporation region (a kind of evaporating materials) of corresponding evaporation source, and therefore four area of the pattern 401a～401d in same area of the pattern 402a are evaporation region (a kind of evaporating materials) of corresponding evaporation source.
And arrange in pairs or groups as the described evaporation step of Figure 1A to Fig. 1 F with the evaporation mask of Fig. 5, formed evaporation pattern is as shown in Figure 6 on substrate.In Fig. 6, substrate 500 has regional 502a～502d, and each regional 502a～502d can be further divided into 4 area of the pattern again.With regional 502a is example, can further be divided into regional 501a～501d in the regional 502a.Similarly, substrate 500 shown in Figure 6 is structures of finishing four times evaporation step.Because the present invention makes the operating method of the several 90 degree rotations of special design and collocation evaporation step on the mask in evaporation, can make that (the evaporation pattern of 501a～501d) is identical for each the regional 502a～502d of substrate 500 and the zone in each regional 502a～502d.Therefore, after the manufacturing step after proceeding Fig. 6, promptly finish after the manufacturing step of each rete of display of organic electroluminescence, substrate 500 can be carried out cutting step, so can obtain 16 display panel.In other words, can in same evaporation chamber, carry out the evaporation step of the organic luminous layer of 16 organic EL display panels simultaneously according to the method for present embodiment.
In sum, method of evaporating of the present invention and evaporation equipment can be finished the evaporation in N zone on a substrate in same evaporation chamber, to finish the evaporation step of N display panel simultaneously.Owing to do not need to change, therefore can effectively reduce the required time of evaporation and then improve production capacity in the transfer of a plurality of evaporation chamber.
In the present embodiment, be that substrate rotating, evaporation mask and all fixed mode of evaporation source are carried out, in practical application, also can be the mode of evaporating mask and evaporation source is fixed, rotated to substrate carry out, have relative displacement relation to get final product so long as substrate evaporates between mask and evaporation source with rotation, the present invention does not limit.
Though the present invention discloses as above with embodiment; right its is not in order to qualification the present invention, any person of ordinary skill in the field, without departing from the spirit and scope of the present invention; when doing a little change and retouching, so protection scope of the present invention is when being as the criterion with institute of claim institute confining spectrum.
Claims (16)
1. a method of evaporating is characterized in that, described method of evaporating comprises:
One substrate is provided;
One evaporation mask is provided, has N area of the pattern on the described evaporation mask;
One evaporation source is provided, and wherein said evaporation source has a plurality of evaporation region, at least one area of the pattern setting of the corresponding described evaporation mask of each evaporation region;
Described evaporation mask is arranged between described substrate and the described evaporation source;
Described substrate is carried out an evaporation step for the first time;
After described substrate rotating 90 degree, described substrate is carried out an evaporation step for the second time;
Once more with after described substrate rotating 90 degree, described substrate is carried out an evaporation step for the third time; And
With after described substrate rotating 90 degree, described substrate is carried out evaporation step one the 4th time once more.
2. method of evaporating as claimed in claim 1 is characterized in that, it is that described evaporation mask is arranged at described substrate below that described evaporation mask is arranged between described substrate and the described evaporation source, and more described evaporation source is arranged at described evaporation mask below.
3. method of evaporating as claimed in claim 1 is characterized in that N=4
n, and n is the positive integer more than 0 or 0.
4. method of evaporating as claimed in claim 1 is characterized in that, described method of evaporating more is included in described these evaporation region and is provided with in a plurality of evaporating materials, and wherein said these evaporating materials are incomplete same.
5. method of evaporating as claimed in claim 4 is characterized in that, one first color evaporating materials, one second color evaporating materials and one the 3rd color evaporating materials are set respectively in described these evaporation region.
6. method of evaporating as claimed in claim 5 is characterized in that, more comprises in described these evaporation region one the 4th color evaporating materials is set.
7. method of evaporating as claimed in claim 6 is characterized in that, described the 4th color evaporating materials be selected from the described first color evaporating materials, the described second color evaporating materials and described the 3rd color evaporating materials one of them.
8. method of evaporating as claimed in claim 6, it is characterized in that described the 4th color evaporating materials is selected from a white evaporating materials or is different from the evaporating materials of the described first color evaporating materials, the described second color evaporating materials and described the 3rd color evaporating materials.
9. an evaporation equipment is characterized in that, described evaporation equipment is in order to evaporate a substrate according to method of evaporating as claimed in claim 1, and described evaporation equipment comprises:
One evaporation source, described evaporation source has a plurality of evaporation region, and the evaporating materials in wherein said these evaporation region is incomplete same;
One evaporation mask has N area of the pattern on the described evaporation mask, and at least one area of the pattern setting of the corresponding described evaporation mask of each evaporation region of described evaporation source.
10. evaporation equipment as claimed in claim 9 is characterized in that N=4
n, and n is the positive integer more than 0 or 0.
11. evaporation equipment as claimed in claim 9 is characterized in that, described evaporation equipment more comprises a plate washer, is arranged between described these evaporation region of described evaporation source.
12. evaporation equipment as claimed in claim 9, wherein said evaporation source comprise an evaporation source, line evaporation source or face evaporation source.
13. evaporation equipment as claimed in claim 9, it is characterized in that, described evaporation equipment more comprises one first color evaporating materials, one second color evaporating materials and one the 3rd color evaporating materials, the described first color evaporating materials, the described second color evaporating materials and described the 3rd color evaporating materials is corresponding is arranged in described these evaporation region.
14. evaporation equipment as claimed in claim 13 is characterized in that, described evaporation equipment more comprises one the 4th color evaporating materials, and described the 4th color evaporating materials correspondence is arranged in described these evaporation region.
15. evaporation equipment as claimed in claim 14 is characterized in that, described the 4th color evaporating materials be selected from the described first color evaporating materials, the described second color evaporating materials and described the 3rd color evaporating materials one of them.
16. evaporation equipment as claimed in claim 14, it is characterized in that described the 4th color evaporating materials is selected from a white evaporating materials or is different from the evaporating materials of the described first color evaporating materials, the described second color evaporating materials and described the 3rd color evaporating materials.
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| CN200910225436XA CN101724810B (en) | 2009-12-10 | 2009-12-10 | Evaporation method and evaporation equipment |
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|---|---|---|---|
| CN200910225436XA CN101724810B (en) | 2009-12-10 | 2009-12-10 | Evaporation method and evaporation equipment |
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| CN101724810A true CN101724810A (en) | 2010-06-09 |
| CN101724810B CN101724810B (en) | 2011-04-13 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101969105A (en) * | 2010-11-12 | 2011-02-09 | 四川虹视显示技术有限公司 | Substrate and evaporation method thereof |
| CN102978566A (en) * | 2012-12-14 | 2013-03-20 | 西北有色金属研究院 | Method for preparing vacuum physical vapor deposition plating pattern |
| CN103572245A (en) * | 2012-08-07 | 2014-02-12 | 联胜（中国）科技有限公司 | Mask module and organic vapor deposition device and thermal evaporation device using mask module |
| CN104060226A (en) * | 2013-03-19 | 2014-09-24 | 财团法人工业技术研究院 | Evaporation plating equipment and evaporation plating method |
| CN107017343A (en) * | 2016-01-27 | 2017-08-04 | 周卓辉 | The preparation method of organic element |
| CN107425144A (en) * | 2017-08-21 | 2017-12-01 | 江苏集萃有机光电技术研究所有限公司 | The preparation method of OLED evaporation sources, evaporated device and oled panel pel array |
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2009
- 2009-12-10 CN CN200910225436XA patent/CN101724810B/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101969105A (en) * | 2010-11-12 | 2011-02-09 | 四川虹视显示技术有限公司 | Substrate and evaporation method thereof |
| CN103572245A (en) * | 2012-08-07 | 2014-02-12 | 联胜（中国）科技有限公司 | Mask module and organic vapor deposition device and thermal evaporation device using mask module |
| CN102978566A (en) * | 2012-12-14 | 2013-03-20 | 西北有色金属研究院 | Method for preparing vacuum physical vapor deposition plating pattern |
| CN102978566B (en) * | 2012-12-14 | 2015-02-25 | 西北有色金属研究院 | Method for preparing vacuum physical vapor deposition plating pattern |
| CN104060226A (en) * | 2013-03-19 | 2014-09-24 | 财团法人工业技术研究院 | Evaporation plating equipment and evaporation plating method |
| CN107017343A (en) * | 2016-01-27 | 2017-08-04 | 周卓辉 | The preparation method of organic element |
| CN107017343B (en) * | 2016-01-27 | 2019-04-02 | 周卓辉 | The production method of the organic layer of organic illuminating element |
| CN107425144A (en) * | 2017-08-21 | 2017-12-01 | 江苏集萃有机光电技术研究所有限公司 | The preparation method of OLED evaporation sources, evaporated device and oled panel pel array |
| CN107425144B (en) * | 2017-08-21 | 2020-06-05 | 江苏集萃有机光电技术研究所有限公司 | OLED evaporation source, evaporation equipment and preparation method of OLED panel pixel array |
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| Publication number | Publication date |
|---|---|
| CN101724810B (en) | 2011-04-13 |
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