CN101710216A - Color filter substrate and manufacture method thereof - Google Patents
Color filter substrate and manufacture method thereof Download PDFInfo
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- CN101710216A CN101710216A CN200910260647A CN200910260647A CN101710216A CN 101710216 A CN101710216 A CN 101710216A CN 200910260647 A CN200910260647 A CN 200910260647A CN 200910260647 A CN200910260647 A CN 200910260647A CN 101710216 A CN101710216 A CN 101710216A
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Abstract
The invention discloses a color filter substrate comprising a substrate, a black matrix layer, a plurality of color filter films and at least a repair structure. The black matrix layer is arranged on the substrate and provided with a plurality of openings; the black matrix layer is provided with at least a defect area positioned between every two adjacent openings; the color filter film is arranged in the opening, and the repair structure is arranged on the defect area; and the repair structure comprises an ink-receptive material layer and an ink-repellent material layer, wherein the ink-receptive material layer is arranged on the substrate, and the ink-receptive material layer contacts with an adjacent color filter film. In addition, the ink-repellent material layer is stacked on the ink-receptive material layer. The invention further provides a manufacture method of the color filter substrate.
Description
Technical field
The present invention relates to a kind of colored filter substrate, and particularly relevant for a kind of manufacture method of colored filter substrate.
Background technology
Because display (liquid crystal display, LCD) have conventional cathode ray tube (cathode ray tube such as low voltage operating, radiationless line scattering, in light weight and volume be little, CRT) display of the manufacturing advantage that is beyond one's reach, therefore become the major subjects of display research in recent years, and constantly developed towards colorize.
Can make LCD carry out full-colorization demonstration by colored filter.In recent years, the multiple method of utilizing ink jet printing (inkiet printing) technology to form colored filter is developed.This ink-jet printing process is prior to forming black matrix on the substrate, to define a plurality of pixel regions.Then, carry out ink-jet printing process so that color pigment (red, green, blueness) is injected in the black defined pixel region of matrix.Continue it, carry out heat baking (thermal baking process) technology so that color pigment is solidified.
The technology of ink jet printing (Ink-jet printing) can directly be coated color pigment on the substrate, to make colored filter, its benefit is, need not utilize mask (mask) or half tone (stencil) promptly can produce the colored filter film of different colours.In addition, not only processing step is simple and easy and do not have relevant issues of using other acid-base solutions to derive because of need for ink-jet printing process.
Figure 1A to Fig. 1 C is the manufacturing process synoptic diagram of known colored filter substrate, and Fig. 2 is the schematic top plan view of known colored filter substrate.Please refer to Figure 1A, a substrate 100 at first is provided, and on substrate 100, form a black matrix layer 110.From Figure 1A as can be known, black matrix layer 110 has a plurality of openings 112, to define pixel region on substrate 100.It should be noted that, in black matrix layer 110 manufacturing process, the generation of defect area D is difficult to avoid, generally speaking, defect area D is meant disconnected place of lacking of black matrix layer 110, if do not repair, will cause the color pigment generation overflow (overflow) of follow-up formation and the phenomenon of colour mixture at defect area D.
Then please refer to Figure 1B,, can go up in defect area D and form repairing light shield layer 120 with ink-resistant characteristic (lyophilic) for fear of the color pigment generation overflow of follow-up formation and the phenomenon of colour mixture.
Then please refer to Fig. 1 C, after forming repairing light shield layer 120, then, in each opening 112, form the color pigment of different colours.Have the ink-resistant characteristic owing to repair light shield layer 120, so color pigment contact with repairing light shield layer 120 hardly, cause color pigment incomplete phenomenon to occur inserting being adjacent to repairing light shield layer 120 places (the X place, position among Fig. 1 C).After in opening 112, inserting color pigment, by hot baking process so that color pigment is cured as colored filter film 130, to finish the making of colored filter substrate CF.At this moment, the inserting of colored filter film 130 not exclusively can cause position X that the phenomenon of light leak takes place, as shown in Figure 2.
Summary of the invention
The invention provides a kind of colored filter substrate and manufacture method thereof, insert the light leakage phenomena (leakage) that is not exclusively caused to improve effectively because of colored filter film.
The invention provides a kind of colored filter substrate, it comprises a substrate, black matrix layer, a plurality of colored filter film and an at least one preparing structure.Black matrix layer is disposed on the substrate, and black matrix layer has a plurality of openings, and black matrix layer has at least one defect area between adjacent apertures.Colored filter film is disposed in the opening, and preparing structure is disposed on the defect area.Aforesaid preparing structure comprises an ink-receptive material layer and an ink-resistant material layer, and wherein ink-receptive material layer is disposed on the substrate, and ink-receptive material layer contacts with adjacent colored filter film.In addition, the ink-resistant material layer is stacked on the ink-receptive material layer.
In one embodiment of this invention, aforesaid opening exposes the subregion of substrate, and colored filter film is disposed on the substrate that opening exposes.
In one embodiment of this invention, the width of aforesaid ink-receptive material layer is greater than the width of ink-resistant material layer.
In one embodiment of this invention, the gross thickness of aforesaid ink-receptive material layer and ink-resistant material layer equals the thickness of black matrix in fact.
In one embodiment of this invention, aforesaid ink-receptive material layer and ink-resistant material layer can shield lights.
In one embodiment of this invention, aforesaid ink-receptive material layer or ink-resistant material layer can shield lights.
The invention provides a kind of manufacture method of colored filter substrate.At first, form a black matrix layer on a substrate, wherein black matrix layer has a plurality of openings.Then, detect black matrix layer and whether have a defect area between two adjacent openings, when black matrix has defect area, on defect area, form a preparing structure, and the formation method of aforesaid preparing structure is prior to formation one ink-receptive material layer on the substrate.Afterwards, on ink-receptive material layer, form an ink-resistant material layer, so that the ink-resistant material layer is stacked on the ink-receptive material layer.Then, in opening, form a plurality of colored filter film.
In one embodiment of this invention, the formation method of aforesaid ink-receptive material layer comprises ink jet printing (inkjet printing), coating (dispensing) or dry film applying.
In one embodiment of this invention, the formation method of aforesaid ink-resistant material layer comprises ink jet printing, coating or dry film applying.
In one embodiment of this invention, the formation method of aforesaid colored filter film comprises ink jet printing.
Based on above-mentioned, because the present invention adopts ink-receptive material layer and is stacked in ink-resistant material layer repairing defect area on the ink-receptive material layer, therefore the present invention can make colored filter film contact with ink-receptive material layer, to avoid inserting the light leakage phenomena that is not exclusively caused because of colored filter film.
For above-mentioned feature and advantage of the present invention can be become apparent, embodiment cited below particularly, and cooperate appended accompanying drawing to be described in detail below.
Description of drawings
Figure 1A to Fig. 1 C is the manufacturing process synoptic diagram of known colored filter substrate;
Fig. 2 is the schematic top plan view of known colored filter substrate;
Fig. 3 A to Fig. 3 D and Fig. 4 A to Fig. 4 D are the manufacturing process synoptic diagram of the colored filter substrate of one embodiment of the invention.
Wherein, Reference numeral
100,200: substrate 110,210: black matrix layer
112,212: opening 120: repair light shield layer
130,230: colored filter film 210a, 222: the ink-resistant particle
220: preparing structure 220a: ink-receptive material layer
220b: ink-resistant material layer D: defect area
CF: colored filter substrate X: position
Embodiment
Fig. 3 A to Fig. 3 D and Fig. 4 A to Fig. 4 D are the manufacturing process synoptic diagram of the colored filter substrate of one embodiment of the invention.At first please refer to Fig. 3 A and Fig. 4 A, a substrate 200 is provided, and on substrate 200, form a black matrix layer 210.In the present embodiment, black matrix layer 210 has a plurality of openings 212, to define pixel region on substrate 200.It should be noted that the generation of defect area D is difficult to avoid in black matrix layer 210 manufacturing process, generally speaking, defect area D is meant disconnected place of lacking of black matrix layer 210.
From Fig. 3 A as can be known, black matrix layer 210 has a plurality of ink-resistant particles (lyophilic particles) 210a, and these ink-resistant particles 210a is distributed in the upper surface of black matrix layer 210, with the color pigment generation overflow of effectively avoiding follow-up formation and the problem of colour mixture.
Then please refer to Fig. 3 B, Fig. 3 C, Fig. 4 B and Fig. 4 C, in the present embodiment, after black matrix layer 210 completes, can detect black matrix layer 210 and whether have a defect area D (being illustrated among Fig. 3 A and Fig. 4 A) between two adjacent openings 212, when black matrix layer 210 has defect area D, go up to form a preparing structure 220 prior to defect area D, in the hope of the color pigment generation overflow of avoiding follow-up formation and the phenomenon of colour mixture.In the present embodiment, the making of preparing structure 220 is prior to forming an ink-receptive material layer 220a on the substrate 200 at defect area D place, afterwards, go up in ink-receptive material layer 220a again and form an ink-resistant material layer 220b, so that ink-resistant material layer 220b can be stacked on the ink-receptive material layer 220a.For example, the formation method of ink-receptive material layer 220a and ink-resistant material layer 220b for example is that ink jet printing (inkjetprinting), coating (dispensing) or dry film are fitted.It should be noted that aforesaid coating process for example can realize by syringe needle or micro pipette.
Hold above-mentionedly, for example have a plurality of ink-resistant particles 222 among the ink-resistant material layer 220b of present embodiment,, help avoid the color pigment generation overflow of follow-up formation and the phenomenon of colour mixture so that the surface of ink-resistant material layer 220b has ink-resistant characteristic to a certain degree.
From Fig. 3 C and Fig. 4 D as can be known, the width of the ink-receptive material layer 220a of present embodiment can be greater than the width of ink-resistant material layer 220b, and the gross thickness of ink-receptive material layer 220a and ink-resistant material layer 220b equals the thickness of black matrix 210 in fact.Yet the present invention does not limit width and the thickness of ink-receptive material layer 220a and ink-resistant material layer 220b, and those skilled in the art are when making suitable change and variation according to the product actual demand.
In addition, still possess the function of shield lights in order to make preparing structure 220, present embodiment can adopt can shield lights material make ink-receptive material layer 220a and ink-resistant material layer 220b.Certainly, present embodiment can also adopt can shield lights material make one of them of ink-receptive material layer 220a and ink-resistant material layer 220b.In other words, ink-receptive material layer 220a and ink-resistant material layer 220b are as long as one of them can shield lights, and like this, ink-receptive material layer 220a and ink-resistant material layer 220b will be more polynary in the selection of material.
Then please refer to Fig. 3 D and Fig. 4 D, after forming preparing structure 220, then in each opening 212, form the color pigment of different colours.Because the ink-receptive material layer 220a in the preparing structure 220 has ink-receptive characteristic, and ink-resistant material layer 220b has the ink-resistant characteristic, therefore color pigment can contact with the ink-receptive material layer 220a that is not covered by ink-resistant material layer 220b, but color pigment contacts with ink-resistant material layer 220b hardly.At this moment, color pigment can effectively cover and be adjacent to preparing structure 220 places (the X place, position among Fig. 3 D) and do not have and insert incomplete phenomenon and take place, thus at position X place the phenomenon of difficult generation light leak.After in opening 212, inserting color pigment, can make color pigment be cured as colored filter film 230 by hot baking process or other curing process, to finish the making of colored filter substrate CF.Hold above-mentionedly, the formation method of aforesaid colored filter film 230 comprises ink jet printing.
Below will arrange in pairs or groups Fig. 3 D and Fig. 4 D is described at the structure of the colored filter substrate CF of present embodiment.
Please refer to Fig. 3 D and Fig. 4 D, the colored filter substrate CF of present embodiment comprises a substrate 200, one black matrix layer 210, a plurality of colored filter film 230 and at least one preparing structure 220.Black matrix layer 210 is disposed on the substrate 200, and black matrix layer 210 has a plurality of openings 212, and black matrix layer 210 has at least one defect area D between adjacent apertures 212.Colored filter film 230 is disposed in the opening 212.In detail, the opening 212 of black matrix layer 210 can expose the subregion of substrate 200, and colored filter film 230 is disposed on the substrate 210 that opening 212 exposed.
Preparing structure 220 then is disposed on the defect area D.Aforesaid preparing structure 220 comprises an ink-receptive material layer 220a and an ink-resistant material layer 220b, and wherein ink-receptive material layer 220a is disposed on the substrate 200, and ink-receptive material layer 220a contacts with adjacent colored filter film 230.In addition, ink-resistant material layer 220b is stacked on the ink-receptive material layer 220a.
Based on above-mentioned, because the present invention adopts ink-receptive material layer simultaneously and is stacked in ink-resistant material layer repairing defect area on the ink-receptive material layer, therefore the present invention can make colored filter film contact with ink-receptive material layer, to avoid inserting the light leakage phenomena that is not exclusively caused because of colored filter film.
Certainly; the present invention also can have other various embodiments; under the situation that does not deviate from spirit of the present invention and essence thereof; those of ordinary skill in the art work as can make various corresponding changes and distortion according to the present invention, but these corresponding changes and distortion all should belong to the protection domain of the appended claim of the present invention.
Claims (10)
1. a colored filter substrate is characterized in that, comprising:
One substrate;
One black matrix layer is disposed on this substrate, wherein should black matrix layer have a plurality of openings, and should black matrix layer have at least one defect area between adjacent apertures;
A plurality of colored filter film are disposed in these openings; And
At least one preparing structure is disposed on this defect area, and wherein this preparing structure comprises:
One ink-receptive material layer is disposed on this substrate, and wherein this ink-receptive material layer contacts with adjacent colored filter film; And
One ink-resistant material layer is stacked on this ink-receptive material layer.
2. colored filter substrate according to claim 1 is characterized in that, these openings expose the subregion of this substrate, and these colored filter film are disposed on this substrate that these openings expose.
3. colored filter substrate according to claim 1 is characterized in that the width of this ink-receptive material layer is greater than the width of this ink-resistant material layer.
4. colored filter substrate according to claim 1 is characterized in that, the gross thickness of this ink-receptive material layer and this ink-resistant material layer equals the thickness of this black matrix in fact.
5. colored filter substrate according to claim 1 is characterized in that, this ink-receptive material layer and this ink-resistant material layer can shield lights.
6. colored filter substrate according to claim 1 is characterized in that, this ink-receptive material layer or this ink-resistant material layer can shield lights.
7. the manufacture method of a colored filter substrate is characterized in that, comprising:
On a substrate, form a black matrix layer, wherein should black matrix layer have a plurality of openings;
Detect this black matrix layer and whether have a defect area between two adjacent openings;
When this black matrix layer has this defect area, on this defect area, form a preparing structure, and the formation method of this preparing structure comprises:
On this substrate, form an ink-receptive material layer;
On this ink-receptive material layer, form an ink-resistant material layer, so that this ink-resistant material layer is stacked on this ink-receptive material layer; And
In these openings, form a plurality of colored filter film.
8. the manufacture method of colored filter substrate according to claim 7 is characterized in that, the formation method of this ink-receptive material layer comprises ink jet printing, coating or dry film applying.
9. the manufacture method of colored filter substrate according to claim 7 is characterized in that, the formation method of this ink-resistant material layer comprises ink jet printing, coating or dry film applying.
10. the manufacture method of colored filter substrate according to claim 7 is characterized in that, the formation method of these colored filter film comprises ink jet printing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102606477A CN101710216B (en) | 2009-12-18 | 2009-12-18 | Color filter substrate and manufacture method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009102606477A CN101710216B (en) | 2009-12-18 | 2009-12-18 | Color filter substrate and manufacture method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101710216A true CN101710216A (en) | 2010-05-19 |
| CN101710216B CN101710216B (en) | 2011-07-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009102606477A Expired - Fee Related CN101710216B (en) | 2009-12-18 | 2009-12-18 | Color filter substrate and manufacture method thereof |
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| Country | Link |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113241360A (en) * | 2021-05-17 | 2021-08-10 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and preparation method thereof |
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2009
- 2009-12-18 CN CN2009102606477A patent/CN101710216B/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113241360A (en) * | 2021-05-17 | 2021-08-10 | 武汉华星光电半导体显示技术有限公司 | OLED display panel and preparation method thereof |
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| Publication number | Publication date |
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| CN101710216B (en) | 2011-07-06 |
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Granted publication date: 20110706 Termination date: 20201218 |