CN101636696B

CN101636696B - Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Info

Publication number: CN101636696B
Application number: CN200880004238.4A
Authority: CN
Inventors: 斯蒂芬·泽尔特; 关彦彬; 安德拉斯·G·梅杰; 曼弗雷德·莫尔; 约翰尼斯·艾森门格; 达米安·菲奥尔卡; 简·霍恩; 马库斯·德冈瑟; 弗洛里安·巴赫; 迈克尔·帕特拉; 约翰尼斯·万格勒; 迈克尔·莱
Original assignee: Carl Zeiss SMT GmbH
Current assignee: Carl Zeiss SMT GmbH
Priority date: 2007-02-06
Filing date: 2008-02-06
Publication date: 2013-07-31
Anticipated expiration: 2028-02-06
Also published as: CN101636696A; DE102007005875A1

Abstract

The invention relates to an illumination system (12) of a microlithographic projection exposure apparatus (10), comprising a pupil surface and a substantially planar arrangement of beam deflecting elements (28) which can preferably be triggered in an individual manner and are used for variably illuminating the pupil surface. Each beam deflecting element (28) allows a projection light beam (32) that is incident thereon to be deflected in accordance with a control signal which is applied to the beam deflecting element (28). A measuring illumination device (54, 56, 58, 60; 88; 90; 98) directs a measuring light beam (36) that is independent from the projection light beams (32) onto a beam deflecting element (28). A detector device detects the measuring light beam (38) after the latter has been deflected on the beam deflecting element (28). An evaluation unit determines the deflection of the projection light beam (32) from the test signals supplied by the detector device.

Description

The monitoring method of multiple mirror arrays and equipment in the illuminator of microlithographic projection exposure apparatus

Technical field

The present invention relates to a kind of illuminator of microlithographic projection exposure apparatus, wherein, the planar arrangement of being made up of the beam deflection element for example micro mirror array is used for illumination iris face changeably.

Background technology

Illuminator at the microlithographic projection exposure apparatus of the semiconductor element that is used for making fine structure, more and more planar arrangement of using the beam deflection element, can handle projection light very neatly by them, so that improve the imaging characteristic of microlithographic projection exposure apparatus.An example of this respect is so-called Multi-Mirror-Array (multiple mirror arrays), wherein with a plurality of micro mirrors, preferably is arranged in array by row and column.Micro mirror is movable and especially can be around two mutually perpendicular axis tilts, thereby the surface normal that makes them start from neutral position can tilt along any direction.

This can be used in the adjustment that changes illumination changeably in illuminator.Example to this provides in WO2005/026843A2 and EP1262836A1.In addition, multiple mirror arrays also is used as the reflectivity mask mother matrix (WO2005/096098A2) of microlithographic projection exposure apparatus.

For this base part importantly, learn each mirror element obliquity accurately, in order to adjusting the accurate position that influences the respective imaging characteristic fatefully.

For example disclose a kind of device in US6421573B1, wherein secondary light source is used to determine the pitch angle of each scanner mirror, makes the light deflection of UV laser instrument here by scanner mirror, so that can inscribe pattern.

By the known a kind of method of adjusting the corresponding mirror element of multiple mirror arrays of US6965119, wherein, part exposure beam, that is projection light extract from course of the beam, so that can implement the adjustment of mirror element by ionization meter.This method obviously is imperfect, because effectively the extraction of light causes loss of strength, this did not wish to take place for the short as far as possible time shutter.

Therefore, be to avoid the infringement that brings because of loss of strength by prior art, for example can in the time that object lens do not utilize as yet, carry out the inspection and the adjustment of multiple mirror arrays mirror element orientation.Certainly, prolonging in some cases for the off-air time of checking that mirror element is required, this is undesirable and effective work of influencing corresponding object lens.

Determine that by the corresponding sensor on the actuator that makes the mirror element motion anglec of rotation of multiple mirror arrays mirror element or pitch angle bother very much, this is because the mirror element enormous amount, and because sensor needs installing space, cause in form for the shared volume of the arrangement of the beam deflection element of multiple mirror arrays very big.

Summary of the invention

Therefore the purpose of this invention is to provide a kind of device and a kind of method, can determine the angular position of multiple mirror arrays mirror element with effective and efficient manner by it.Especially should provide a kind of method and apparatus, can detect the deflection of projection light of shining the beam deflection element of many plane arrangements with energy measurement by them, and can monitor and adjust these deflection thus.Yet because for example because thermal load and so on causes optical element surface and the especially change of surface region shape or orientation, for the monitoring imaging characteristic with to revise for the possible image defects is that people are concerned about, so this method and apparatus can be considered many other application.

This purpose reaches by the equipment of the requirement 1 described feature of having the right and the method for the requirement 56 described features of having the right.Favourable design is the technical theme of dependent claims.

Basic design of the present invention is, except that the projection light of illuminator projecting beam deflecting element planar arrangement, at least one measuring beam of measuring lighting device is directed on the beam deflection element that will check, thus the deflection that can cause by the beam deflection element by the detection device records measuring beam.If the supposition measuring beam is by the deflection of beam deflection element and to be incident on the deflection of the projection light on the beam deflection element interrelated, so finally can determine the deflection or this change of projection light by this independent measurement mechanism with respect to the adjustment of stipulating.By the independent measurement mechanism that produces corresponding measuring beam additionally is set, can cancel effective light is extracted from projection light, and can be embodied in utilize carry out continuously during the microlithographic projection exposure apparatus, change the check of being carried out and determine for the optical element deflection that will check.For this reason, only need to make the incident direction of one or more measurement beam to be different from the incident direction of one or more projecting beams, thereby do not influence each other.

Adopt this method, especially can monitor and check the angle variation of its surface normal of minute surface that optical element will be checked or the orientation of corresponding minute surface.

Preferably, the mirror element of the multiple mirror arrays (Multi-Mirror-Array MMA) that illustrated above can being used to check especially of described method and apparatus.

The incident direction of measurement beam, both can relate to optical element to check the surface incident angle aspect difference, also can be in difference aspect the incident orientation angle.The incident orientation angle refers to the plane of the plane of incidence of corresponding beam with respect to a regulation here, for example the average anglec of rotation along the plane of incidence of North-south arranged in orientation.

If the incident direction of measuring beam and projection light is as broad as long aspect the incident orientation angle, their differences aspect incident angle at least then write down measuring beam from direct reflection to avoid influencing each other and to allow by detection system.

If the incident direction of measuring beam and the incident direction of one or more projecting beams, difference aspect the incident orientation angle then additionally can also be distinct aspect the incident angle of the optical element that will check.But this is also unnecessary.

Preferably, the incident direction of measuring beam and the incident direction of one or more projecting beams, aspect the incident orientation angle difference is being arranged, this moment can be in the scope more than 30 ° around the anglec of rotation of the optical element surface normal that will check, and being preferably more than 60 ° and the anglec of rotation especially each other is 90 °.When between the plane of incidence of the plane of incidence of measuring light and projection light being 90 ° of configurations, king-sized installing space is provided, be used to be provided with the pick-up unit of measuring lighting device and corresponding configuration.

Regulation illumination for the optical element that guarantees to check with measuring light, and similarly in order to allow to write down in accordance with regulations measuring light since with the interactive variation of optical element, can be on the one hand between light source and the optical element that will check, and/or on the other hand between the optical element that will check and relevant detection device, optical system is set respectively.

Measuring light can have any appropriate wavelength, and both has been in visible region and also is in the invisible light district.Usually, only refer to any electromagnetic radiation.

Measure illuminating optical system and can comprise one or more collimating apparatuss, be the orifice plate with the microlens array that is connected the upstream especially in form, thereby produce the correspondingly measuring beam of collimation.

The measuring beam of these collimations is by the surface that will check, and the preceding convergent lens reflection of the position transducer that is located at pick-up unit accordingly, especially the lens arra that little convergent lens is formed, they are as far field construction image or Fourier transform, imaging in corresponding convergent lens focal plane.In the focal plane there corresponding position transducer can be set, for example 4 quad detectors or position sensing formula dimension sensor, they determine to arrive at the deviation of the light cone and the neutral position of sensor, and neutral position is corresponding with the orientation of the optical element surface regulation that will check.

For obtaining more installation space, additional optics can be set between the optical element that will check and pick-up unit, it allows pick-up unit away from the optical element setting that will check.Can adopt a kind of optics in addition, it can be implemented pick-up unit and dispose changeably in the optical element surface district blur-free imaging that will check.For this reason, the optics of correspondingly imaging is designed to, the surface region that optical element will be checked is satisfying under the condition of intersection situation of (also claiming " Scheimpflug condition (Scheimpflug condition) ") imaging on the optical lens that sets for position transducer.

Simultaneously, corresponding optics must guarantee, the incident direction of measuring beam on the detection convergent lens of pick-up unit, and with the orientation in optical element relevant surfaces district, or corresponding with the pitch angle of multiple mirror arrays mirror element.This for example can guarantee by the relay optics with two convergent lenses.

By equipment of the present invention and method, determine the orientation of optical element minute surface by angle, can be at optical element or wherein be provided with between operating period of illuminator of optical element and carry out continuously.For ACTIVE CONTROL or adjust steerable beam deflection element, for example the micro mirror of multiple mirror arrays can use definite value thus.

Description of drawings

By in the detailed description of accompanying drawing to two kinds of embodiment, can know and find out other advantages of the present invention and feature below.Here accompanying drawing is represented in the mode of pure signal:

Fig. 1 represents the skeleton view of microlithographic projection exposure apparatus very simplifiedly;

What Fig. 2 indicated to check in form is the optical element side view of multiple mirror arrays;

The optical element vertical view that will check in Fig. 3 presentation graphs 1 and measurement mechanism figure;

Fig. 4 represents by measurement mechanism skeleton view of the present invention;

Fig. 5 represents by the measurement mechanism first embodiment side view of the present invention;

Fig. 6 represents by the measurement mechanism second embodiment side view of the present invention;

Fig. 7 represents to be encapsulated in the multiple mirror arrays side view in the housing;

Fig. 8 represents a kind of embodiment skeleton view, wherein by the inclination of each mirror element of camera record multiple mirror arrays;

Fig. 9 represents a kind of pattern, and it is fit to use in the embodiment shown in fig. 8;

Figure 10 represents to have the illuminator side view of multiple mirror arrays;

Figure 11 represents the calibrating installation overview, wherein represents calibration plate on the one hand, is illustrated in the intensity distributions of mirror element between moving period on the other hand, and the relation of determining thus between mirror element angle and system angle;

Figure 12 represents the control loop block scheme, and it can be used to monitoring and control beam deflection element;

Figure 13 represents the more detailed block diagram of adjusting algorithm shown in Figure 12; And

Figure 14 represents the measurement mechanism structure diagram, and it uses a kind of frequency multiplication method.

Embodiment

1. the structure of projection exposure apparatus

Fig. 1 very schematically represents the skeleton view of projection exposure apparatus 10, and it is applicable to photolithographic fabrication micro-structural member.Projection exposure apparatus 10 comprises illuminator 12, on its mask 14 in being arranged on so-called mask plane, and the surround 16 of the narrow rectangle in the illustrated embodiment that throws light on.Illuminator 12 comprises light source, can produce projection light by it.Light source commonly used for example is the excimer laser that adopts laser medium KrF, ArF or F2, can produce the projection light of wavelength 248nm, 193nm or 157nm respectively by them.On mask 14, be in the structure 18 of 16 inside, surround, by projection objective 20 imaging on photographic layer 22.Photographic layer 22, here it for example can relate to photoresist, be applied on the wafer 24 or the another kind of substrate that is suitable on, and be in the picture plane that is also referred to as wafer plane of projection objective 20.Because projection objective 20 has the imaging ratio usually | β |＜1, thus be in the structure 18 of 16 inside, surround dwindle be imaged as 16 '.

The performance of this projection exposure apparatus 10 not only depends on projection objective 20, but also depends on the illuminator 12 to mask 14 illuminations.The beam intensity on being radiated at mask 14, its illumination angle distributes and also to influence quality, will be included in structure 18 imaging on photographic layer 22 in the mask 14 with this quality.According to the direction and the size of the structure 18 of wanting imaging, it is favourable adopting different illumination angles to distribute.Because should give different mask 14 imagings, so desirable illuminator is can adjust different illumination angles easily with it and distribute by projection exposure apparatus 10.For this reason, for the pupil plane of determining the illuminator 12 that illumination angle distributes fatefully, need and to throw light on as far as possible changeably by drivable optical element.

2. by measuring principle of the present invention

Fig. 2 represents an example of this optical element in diagrammatic side view, the monitoring of optical element and control can be used by equipment of the present invention or by method of the present invention.The optical element of Fig. 1 relates to so-called multiple mirror arrays (Multi-Mirror-Array) 26, it comprises a plurality of little mirror elements 28, they are set to and can move, exactly especially can tilt, thereby for example make almost minute surface 30 that different orientations can be arranged each other in row and column ground mirror element 28 arranged side by side.The projection light 32 of incident can be divided into the projecting beam 34 of many reflections by reflection on minute surface 30 thus, and their direction of propagation can tilt within the boundary of regulation and freely selects by minute surface 30.Tilt in this article to be meant around the rotatablely moving of axis, this axis can pass through mirror element 28 centers basically, at its edge or even outside mirror element 28, extend, thereby with respect to the orientation of the projection light 32 change minute surfaces 30 of incident.Two kinds of selectable schemes mentioning later also often are called rotation.Form of implementation according to mirror element 28 mechanical suspension and actuator, the also combination that can use translation and rotatablely move, in order to simplify this combination is called " banking motion " equally hereinafter, purpose is to reach the orientation that changes mirror element 28, and thereby also changes the direction of propagation of the projecting beam 34 of reflection.

In addition, in a plurality of systems, the projection light 32 of incident also is divided into light beam one by one by the use microlens array, and focuses on the mirror element 28 before shining minute surface 30.

In the illuminator 12 of microlithographic projection exposure apparatus 10, this multiple mirror arrays 26 can be used to illumination iris face changeably, also is called for short pupil illumination.For this reason, the projection light 32 of incident makes the light that produces expectation on pupil plane distribute at mirror element 28 upper deflectings of sufficient amount.Here, mirror quantity is not only to the space wave of light intensity, and to the minimum diameter of the projecting beam 34 (superposeing, their form pupil illumination) of reflection, material impact arranged all.The calculating of optical design shows, the intensity distributions in order to obtain can compare with the characteristic of traditional diffraction optical element aspect its characteristic in pupil plane needs 4000 mirrors at least.Because the very little change at mirror element 28 pitch angle is just to pupil illumination, and thereby the illumination angle on mask 14 is distributed with huge effect, so the present invention proposes, determine minute surface 30 angular position accurately by measuring technique.

According to the present invention, as shown in Figure 3, except the projection light 32 of incident, that is except effective light (being also referred to as the object lens beam) by illuminator 12 illumination masks 14, additional measurement lighting device also is set, it is at least one measuring beam for example with measuring light 36 in form, is directed into the mirror element 28 of multiple mirror arrays 26.By this embodiment, to measure illumination and can produce one or more measuring beams or measurement beam for this reason, they for some or all of mirror elements 28 or scanning that is each other in succession or are directed on the mirror element 28 simultaneously.Because the incident direction of measuring beam is known, so can draw the orientation of the minute surface 30 of reflection by measuring the exit direction of the measuring beam that reflects.Utilized the deflection of measuring light 36 to be associated here with the deflection of projection light 32.Therefore the measuring light 38 of reflection comprises relevant heeling condition and thereby the information that is orientated of relevant mirror element 28.In measurement mechanism shown in Figure 3, the measuring light 36 in a plane is directed on the mirror element 28, and this plane is changeed 90 ° with respect to the plane of incidence of the projection light 32 of incident around the surface normal of mirror surface 30.

Also can realize the continuous coverage of mirror element 28 orientations thus at illuminator 12 duration of works.Therefore can not cause the down time of projection exposure apparatus 10 for the orientation of determining mirror element 28.Because for the orientation of determining mirror element 28 is not used projection light 32 parts of any incident, thus can not form light loss, otherwise can reduce the turnout of projection exposure apparatus 10.

Fig. 4 presses measuring principle details of the present invention with perspective representation.As seen from Figure 4, the projection light 32 of incident shines the minute surface 30 of mirror elements 28 along incident direction 40 with the incident angle α of regulation.The incident direction 40 of the projection light 32 of incident here and the surface normal 42 of minute surface 30 are across plane of incidence (xz plane) 44, and by the reflection rule, the exit direction 46 of the projecting beam 34 of reflection also is in this plane.

By shown in Figure 3, in yz plane 48, this plane on the orientation is 90 ° anglec of rotation θ around order of magnitude of surface normal 42 rotations with respect to the plane of incidence 40 of projection light 32, the measuring light 36 of incident is directed on the minute surface 28 along incident direction 50, it is after reflection on the minute surface 28, as the direction emission of measuring light 38 along exit direction 52 towards pick-up unit of reflection.So in this programme, the incident direction 50 of measuring light 36 and the incident direction 40 of projection light 32 are different at least aspect azimuthal incident direction, that is in plane of incidence.Additionally or by another kind of select, measuring light 36 also can be by an incident angle irradiation minute surface 30 that is different from projection light 32.

This point is at the incident direction 50 of measuring light 36 ' illustrate, it is in the same plane of incidence 44 that projection light 32 shines mirror element 28 therein, yet be formed into firing angle α ' with respect to surface normal 42, α ' is different with the incident angle α of projection light 32 incident directions 40.Therefore, the measuring light 38 of reflection is also being different from the angle of projection light 32, along exit direction 52 ' from mirror element 28 emissions.This slotted line 36 incident directions 50 that comprise incident ' and the measuring light 38 of reflection penetrate directions 52 ' layout, also constituted a kind of by the solution of the present invention.

3. measurement mechanism embodiment

Fig. 5 represents a kind of embodiment of measurement mechanism, and wherein, the light source 54 of measuring lighting device is directed to light on the orifice plate 56.Produce a plurality of pointolites 58 by orifice plate 56.In the downstream, collimating apparatus convergent lens 60 constitutes collimating apparatus respectively, and by the light that relevant pointolite 58 produces, produces the measuring beam 62 of collimation, and collimating apparatus convergent lens 60 can be microlens array, perhaps can microlens array gets mode and makes up.Produce measuring beam 62, propagation preferably parallel to each other by different collimating apparatus convergent lenses 60.

Replacedly, single measuring beam 62 also can scan on multiple mirror arrays 26 with two galvanometer scanners or a kind of combination by a polygon scanner and a galvanometer scanner.Light source, for example VCSEL (seeing below) can also be pulse, makes light source only luminous when hitting mirror element 28.Zone between mirror does not influence signal thus, and described signal time is differentiated ground by detection device records.

The minute surface 28 that the measuring beam 62 irradiation multiple mirror arrays 26 of collimation will be checked, and there according to the orientation of minute surface 28 along different direction deflection.The measuring beam 64 irradiation microlens arrays of reflection, it comprises a plurality of detecting device convergent lenses 66, and the position transducer 68 of pick-up unit is set in their back focal plane.By this configuration, the angle of the measuring beam 64 irradiating and detecting device convergent lenses 66 of reflection, the focal position that focuses on the measurement beam 64 that reflects on the position transducer 68 is Fourier's relation.

Because according to the top reflection rule that has illustrated, the angle of the measuring beam 64 of reflection depends on the orientation of multiple mirror arrays 26 each relevant mirror element 28, therefore can determine the orientation of mirror element 28 by the focal position on the record position sensor 68.Can for example use 4 quad detectors or position sensing dimension sensor as position transducer 68.In this way, for example can determine from ± 2 to ± 3 ° the angular range that mirror element 28 tilts with respect to predetermined surface orientation.

If the minute surface 30 of mirror element 28 has flexibility, then measuring beam 62 can be directed on the difference of same mirror element 28.This can be simultaneously or also can be in succession, even adopts a kind of scanning method realization with same measuring beam 62.Then, by the different deflections of measuring beam 62, can determine curvature for minute surface 30 differences.Another kind of determine that the possibility of curvature is,,, determine its divergence and thereby the curvature of minute surface 30 for example by determining the focus diameter of measuring beam 62 on position transducer 68 from curved mirror 30 from the divergence of known incident measuring light 36.

Integration and time by signal on position transducer 68 compare, and have under the situation of constant intensity at the supposition light source, can further measure the possible change of minute surface 30 reflection coefficients, and the degeneration of inferring the mirror layer.

Comprise that in order to make the pick-up unit that comprises position transducer 68 and to be connected the upstream microlens array of detecting device convergent lens 66 can arrange with a certain distance from multiple mirror arrays 26,, establish additional relay optics 70 by another kind of embodiment shown in Figure 6.With two

convergent lenses

72 and 74 relay optics that schematically illustrate purely 70, multiple mirror arrays 26 is imaged on the layout of detecting device convergent lens 66 among the figure.By relay optics 70, allow from one of the optical element/a plurality of surfaces that will check, be minute surface 30 in this example, distance is bigger, and does not limit the angular range that will check.Therefore described relay optics 70 makes detectable angular range and position transducer 68 to take off coupling from the distance of multiple mirror arrays 26.Measurement mechanism can be arranged on outside the course of the beam of illuminator 12 in this way, can provide enough installing spaces there.

In the embodiment shown in fig. 6, position transducer 68 and comprise that the microlens array of detecting device convergent lens 66 is arranged in

plane

76 and 78, they satisfy the condition of intersection with respect to the plane 80 that multiple mirror arrays 26 is arranged in wherein.If the principal plane of relay optics 70, intersect in an axis with the plane 80 that the mirror element 28 of the plane 76 of detecting device convergent lens 66 and multiple mirror arrays 26 extends therein, then satisfy the condition of intersection.Observing under the situation of this condition,, make and also can clearly go up imaging each other for them although

plane

76 and 80 disposes with inclining towards each other.Therefore this layout makes big zone or a plurality of mirror elements 28 of optical element surface that will check, equally clearly is imaged on the detecting device convergent lens 66 of microlens array, and can realizes the corresponding azimuthal arrangement of pick-up unit.By this layout, the plane 80 that is obliquely installed with respect to optical axial, mirror element 28 extends therein can clearly imaging on the detecting device convergent lens 66 of microlens array.

With embodiment illustrated in fig. 5 similar, the focal position that forms on position transducer 68 changes with incident angle, and relevant measuring beam 64 is with described incident angle irradiating and detecting device convergent lens 66.Yet owing to,, be intended to measure the orientation of this minute surface so this incident angle is proportional with relevant minute surface pitch angle again by relay optics 70 imagings.Thus here, can also by the focus in position transducer 68 with corresponding to the departing from of the neutral position of minute surface 30 predetermined orientations, release the pitch angle of related minute surface 30.

The present invention can determine the orientation of multiple mirror arrays 26 mirror elements 28 at the projection exposure apparatus duration of work.When the orientation that records departed from the setting orientation, related mirror element 28 can be resetted, until the setting orientation that reaches expectation.This is ACTIVE CONTROL or the condition precedent of adjusting mirror element 28, and the back also will describe in detail this.

4. the encapsulation of multiple mirror arrays

Fig. 7 represents a multiple mirror arrays 26 very simplifiedly, and in order to prevent external action, for example pressure or temperature fluctuation is encapsulated in it in housing 82 of illuminator 12 inside.Housing 82 has transparent window 84, and the projection light 32 of incident and measuring light 36 can be by each mirror elements 28 of its irradiation multiple mirror arrays 26.After the orientation deflection of each beam according to mirror element 28, they are along the transparent window 84 that passes housing 82 in the other direction.

For fear of undesirable reflection and loss of strength associated therewith, transparent window 84 is with one or more anti-reflecting layers 86, and their angles common and transmission light wavelength and generation are complementary.Therefore anti-reflecting layer 86 is designed in this example, makes the projection light 32 with incident angle α incident, can be by transparent window 84 under the least possible situation of loss of strength.

For make incident different wave length is arranged mostly and as mentioned above in some cases with the measuring light 36 of different angles β irradiation multiple mirror arrays 26, do not cause the harmful reflection that to pass transparent window 84 as far as possible, in the course of the beam of the measuring light 36 of incident, insert polarizer 88.Here the polarization direction with the measuring light 36 of incident is chosen as, and makes measuring light 36 about 36 plane of incidences of the measuring light on transparent window 84 p polarization basically.

Measure lighting device in addition and be set to, make the incident angle β of the measuring light 36 of incident equal Brewster angle (Brewster angle) at least substantially.That is to say that as if the interface of light with two optical mediums of Brewster angle irradiation, then reflected light only contains the s polarized component of incident light.The p polarized component of incident light is refracted in another optical medium fully in this case.Because the measuring light of incident in this example 36 complete p polarizations and thereby do not contain any can reflectible s polarized component, so catoptrical intensity is zero with Brewster angle incidence the time, and thereby do not have measuring light 36 on transparent window 84, to reflect.Approximate during with Brewster angle incidence, that is in 5 ° of scopes of Brewster angle, because the partial reflection of p polarized component, the intensity of reflection is approximately less than 5% of the intensity of incident.Although therefore 86 projection lights 32 for incident of anti-reflecting layer, and not optimised for the measuring light 36 of incident, the measuring light 36 of incident still almost can can't harm the lost territory and pass transparent window 84.Yet advantageously, the wavelength of the measuring light 36 of incident is greater than the thickness of anti-reflecting layer 86, and this projection light 32 for incident is preferred, because the measuring light 36 of 86 pairs of incidents of anti-reflecting layer cuts little ice in this case.

After reflection on the mirror element 28 of multiple mirror arrays 26, though the angle that beam penetrates no longer equals Brewster angle, but, thereby, also can observe and reduced undesirable reflection even under the situation of the beam of this ejaculation because little pitch angle ± 2-3 ° of mirror element 28 be near Brewster angle.

In addition, can also design airtight housing in conjunction with the multiple mirror arrays 26 of the encapsulation of Fig. 7 explanation, the inert gases that the mirror element 28 of multiple mirror arrays 26 is in the housing 82 center on.As an alternative, housing 82 also can be provided with gas and connect (Fig. 7 does not show), so that change inert gas.Can that is to say continuously in this case, even during multiple mirror arrays 26 usefulness measuring light 36 and/or projection light 32 illuminations, also can implement gas and change.By another kind of selectable scheme, the gas of inert gas is changed also and can be carried out when multiple mirror arrays 26 measuring light 36 of no use and/or projection light 32 illuminations.

Be suitable for all gas or gaseous mixture as inert gas, as long as they prevent reaction or retarted reaction in the following manner on the minute surface 30 of multiple mirror arrays 26 mirror elements 28, promptly, in the term of life that mirror element 28 is intended to, its reflection characteristic is not had or has no significant effect at least, that is to say that the change of their reflection characteristic (for example their reflection coefficient) in described term of life is no more than about 10%.When minute surface 30 or under the coating that uses the there situation about may react, light wavelength and light intensity in the time of especially also should considering multiple mirror arrays 26 work.Employed inert gas also may be relevant with light wavelength and light intensity.

Because minute surface 30 has the coating that increases reflection usually, and the material that depends on this coating or this multiple coating, in air, for example this coating is worsened by reacting with airborne oxygen, so by housing 82 encapsulation be included in the inert gas that is suitable in the housing, prevent that coating from worsening by multiple mirror arrays 26.In addition, because, suppressed the possible reaction of coating material and air, so when minute surface 30 coating, can adopt many kinds of materials based on encapsulation multiple mirror arrays 26 and use inert gas.As coating material or as the material of mirror element 28, for example can adopt aluminium, amorphous state or crystalline silicon, chromium, iridium, molybdenum, palladium, ruthenium, tantalum, tungsten, rhodium, rhenium, germanium, coating equally also can be made by these mixtures of material.Can for example use the potpourri of helium, argon or other inert gases, nitrogen or these gases as inert gas.In addition, used gas also can be used to the temperature control of multiple mirror arrays 26, so that for example cool off multiple mirror arrays 26 with measuring light 36 and/or projection light 32 irradiations the time.Center on transparent window 84 on the housing 82 of multiple mirror arrays 26,, can comprise the quartzy of amorphous state or crystalline state or comprise for example calcium fluoride, or form by these materials according to measuring light 36 and/or projection light 32 employed wavelength and employed intensity.

As above-mentioned replacement at use inert gas in the housing 82 of multiple mirror arrays 26, housing also can be evacuated, and perhaps gas or gaseous mixture can change aspect its pressure or its composition.Be evacuated or by changing gaseous tension or gas componant by housing 82, can prevent reaction harmful on the minute surface 30 of the mirror element 28 of multiple mirror arrays 26 equally, or can postpone in the following manner, promptly, mirror element 28 its by the term of life that is intended in, its reflection characteristic is not had remarkable influence.

5. determine orientation by pattern identification

Fig. 8 represents the another kind of possibility of mirror element 28 orientations of definite multiple mirror arrays 26.Pattern here, for example the pattern of an illumination is in reflection and imaging in camera 91 on the multiple mirror arrays 26.The pattern of this illumination can be for example by wearing the half reflection screen 90 of described pattern in the illumination, or by producing by slide (being similar to lantern slide).

Fig. 9 represents a kind of in order to reach by purpose applicable patterns of the present invention for example.This pattern bright and dark between the tessellate that replaces, its frequency increases continuously along two screen axle x screens and y screen, so screen 90 has consistent pattern without any two districts.If observe local camera photograph corresponding to a mirror element 28, then be pursuant to the inclination of mirror element 28, can in this details, see the not same district of pattern.So the apparatus for evaluating by for example implement auto-associating between the details of camera images and screen 90 known pattern just can write down out mirror element 28 and tilt accurately.Because camera can be set to, make it write down a plurality of mirror elements 28 and make a zone of each mirror element 28 independent display screen pattern, so adopt this device can determine the inclination of a plurality of mirror elements 28 simultaneously.

Replace orderly as shown in Figure 9 pattern, also can select random pattern, as long as it has narrow as far as possible autocorrelation function.

Another kind of possibility is, adopts different color distribution along two screen axis x screens with the y screen, and thereby can be implemented in the look coding of diverse location on the screen.Therefore in theory one to the camera 91 of color sensitivity or other to the color sensor sensitive, have only a pixel just to be enough to determine the pitch angle of mirror element 28 by said method.Because directly had color vector or RGB vector in the commercially available color digital camera, so described assessment is very simple and amount of calculation is very little.

6. calibrate-the first embodiment

Figure 10 reduced representation is a kind of can be by the configuration of the first embodiment calibration measurement device.Calibration be included in reflection projection light 34 reality beam deflection with by the comparison between the signal of measurement mechanism record, this projection light 34 is intended to throw light on for the pupil plane of illuminator 12 with the intensity distributions of expectation.But the calibration of Chan Shuing here also can be used under following situation, that is the signal of describing mirror element 28 orientations is not to be provided by above-mentioned measurement mechanism, but is provided by other sensors or measurement mechanism.Can for example consider in this article, for example on multiple mirror arrays 26, be arranged on the electromechanical, piezoelectric type, induction type, condenser type or the optical sensor that write down the pitch angle to a certain extent from " inside ".

In the pupil shaped portion 92 of the illuminator 12 that Figure 10 represents very simply, the projection light 32 that is produced by projection source (for example excimer laser) shines multiple mirror arrays 26, and in the above the reflection after through pupil optics 94, be directed on the pupil plane 96 of illuminator 12.Usually be no more than 90%-95% because be applicable to the packing density of the multiple mirror arrays 26 that reaches this purpose, and thereby the reflectivity fragment that between each mirror element 28, do not have fragment or do not expect, so in the present embodiment, the projection light 32 of incident focuses on the mirror element 28 with less projecting beam by microlens array, as in the prior art for example by WO 2005/026843 A2 known.

In addition, by independent course of the beam, the measuring beam 62 of collimation is directed on the multiple mirror arrays 26 with bigger incident angle α '.In the present embodiment, measure the layout that lighting device comprises a plurality of semiconductor lasers, laser instrument is luminous from its flat semiconductor surface.(VerticalCavity Surface Emitting Laser: vertical cavity surface emitting laser) array 98, can be at each mirror element 28 of multiple mirror arrays 26, with measuring beam 62 illuminations of a collimation by this so-called VCSEL.For single controllability is described, Figure 10 dot the measuring beam 62 of two temporarily disconnecteds ' course of the beam.After reflection on the multiple mirror arrays 26, measuring beam 62 irradiation position sensors 68, as the measuring beam 64 of the reflection of device convergent lens 66 after testing, position transducer 68 is arranged on the focal plane of detecting device convergent lens 66.Because detecting device convergent lens 66, the focus that the angle change of the measuring beam 64 of reflection impels the measuring beam 64 of reflection to focus on position transducer 68 moves.

For the calibration measurement device, described layout also has projection light detecting device 100, and it is located in the pupil plane on the accurate preposition, but is close to that available pupil hole, especially in 1/5 distance less than the pupil hole diameter.If the measurement at each mirror element 28 pitch angle of calibration is now then only tilted corresponding mirror element 28, until the projection light detecting device 100 in the projecting beam 34 illumination pupil faces of its reflection.If measuring beam 62 is directed on the mirror element 28 that will calibrate simultaneously, then the focal position of determining on position transducer 68 this moment can be used as calibration value and is stored in the apparatus for evaluating.

For example can to pass through pupil optics 94 or pass through the non-linear of crooked minute surface 30 formation in order to write down, it is a plurality of advantageously to center on the pupil hole layout, especially four projection light detecting devices 100.These projection light detecting devices 100 also can be designed as 4 quad detectors.

If the pitch angle of each mirror element 28 is calibration in a manner described all, then measurement mechanism be used in illuminator 12 duration of works detect mirror element 28 inclination and thereby detect the illumination of pupil plane, in order that mirror element 28 can be adjusted in case of necessity again.Usually this adjustment again is favourable, because for example because mirror element 28 vibrations that air-flow or sound wave cause may cause the high frequency interference in 100Hz to 1000Hz scope, the error that can cause the pupil plane illumination to allow.

In addition, can also write down unsuitable illumination by the calibration steps of describing, this is that microlens array focuses on projection light 32 on the mirror element 28 owing to drift slowly between the mirror element 28 of multiple mirror arrays 26 and the microlens array causes.These not measured at first device recordings are because it has experienced other drift.Because each mirror element 28 also even can aim at projection light detecting device 100 at illuminator 12 duration of works, and this can the appreciable impact pupil plane illumination, so calibration can be during operation in accordance with regulations time slot repeat for each mirror element 28 gradually.Write down and proofread and correct drift slowly thus.The share that depends on the projection light that may extract from the normal course of the beams of illuminator 12 has much, can change the time slot, or can calibrate indivedual, some or all mirror elements 28 in this way simultaneously.

7. calibrate-the second embodiment

The another kind of calibration steps of the measurement mechanism that Figure 11 has described in detail on shown in the overview.Calibration steps by present embodiment also can be independent of the measurement mechanism use.Therefore can consider to use, when the signal that contains relevant mirror element 28 orientation information, be not by above-mentioned measurement mechanism yet, but when providing by other sensors or measurement mechanism.

Especially, the calibration steps of present embodiment can advantageously be used, thereby directly calibration drives the adjusting parameter of mirror element 28, if select a kind of so-called feedforward (Feed-Forward) method of operation of multiple mirror arrays 26, wherein independent sensor or measurement mechanism will be set in order to feed back not necessarily.Find out by knowing in the explanation of back, this is based on the following fact: in order to calibrate possible slow mechanism again, as drift, charging etc., especially can repeat the calibration steps introduced fast with low cost, and even can in the exposure process of exposure machine 10, implement at each mirror element 28.

Press present embodiment, produce the zone 102 of some transmissions minimizings 50% in the position of pupil plane regulation.For this reason, can be for example in pupil plane or near establish transparent calibration plate 104.The zone 102 that these reduce transmissions has the size of the hot spot that the projecting beam 34 by reflection produces respectively in pupil plane.They constitute a kind of calibration scale here, it or fix with respect to the optical axis of illuminator 12, or be located at one replaceably and accurately accurately be orientated on the position of regulation and by angle.Adopt appropriate methods, the zone 104 that transmission reduces also can be located on the element that has existed or in, for example on the pupil optics 94.

In order to calibrate mirror element 28, in plane on the scene (field plane), for example in the object lens face of projection objective 20 or the picture plane, settle intensity sensor.Intensity sensor record intensity distributions 106, and the projecting beam 34 of the reflection of each mirror element 28 by giving it, along predefined paths, for example along coordinate axis, the diverse location of illumination pupil face (seeing Figure 11 upper right side curve map).At the motion of a mirror element 28, represented this intensity distributions 106 for example among Figure 11, hot spot is that move at the center with the pupil plane along the X-axis line when motion, that is outside optical axis.If the zone 104 of reducing from the projecting beam 34 irradiation transmissions of the reflection of mirror element 28, then it as the decline of intensity by the intensity sensor record.

In this way by zone 102 and the corresponding apparatus for evaluating of arranging that rightly transmission reduces, the latter writes down the minimum value of intensity distributions 106 and according to the position that regional 104 understanding is configured in the regulation of pupil plane inside, can calibrate the measuring-signal of the measurement mechanism of measuring a plurality of mirror elements orientations simultaneously.The pitch angle of the mirror element 28 that measurement mechanism is determined thus connects with the absolute angular position of projection light 32 illumination angles, shown in the bottom-right curve map of Figure 10.

By favourable further developing, replace common intensity sensor, the intensity sensor that adopts angle to resolve in the plane on the scene.Thus, not only can determine only to deny point in certain exposure field plane, but also can determine be from the rayed of which direction this point.Because different direction is associated with position in the pupil plane in this plane, thus the intensity sensor of resolving by this angle, even can calibrate a plurality of mirror elements 28 simultaneously.Therefore separately the transmission of the irradiation zone 102 of reducing should be in each other from position far away as far as possible, make intensity sensor still can enough resolve the direction that is associated in the plane on the scene exactly.

In order to prevent that projection exposure apparatus 10 from throwing in the operating process on pupil plane, occur local strength in the zone 102 that transmission reduces and descend, always will otherwise with the twice that provides so the projecting beam 34 of multiple reflection be directed on the zone 102 that will throw light on.Because the transmission in these zones 102 is 50% amount as mentioned above, twice projecting beam 34 can produce desired intensity.In this way, although calibration plate 104 fixing uses, but still can in pupil plane, cause uniform intensity distributions.

Taken place among the embodiment of Jie Shaoing in the above transmission reduce about 50%, therefore this transmission reduce district 102 when the projection operation with double mirror number, or throw light on the projecting beam 34 of double reflection.Transmission reduces district 102 also can be reduced to 1/n, and wherein n is the integer more than or equal to 2.In this case, when transmission reduces district's 102 projection operations separately, with projecting beam 34 illuminations of n reflection.

When the projecting beam 34 of each reflection had about same intensity, these embodiment recommended.Yet if the intensity of the projecting beam 34 of each reflection has evident difference each other, n also can be a number that is different from integer.In this case, when the projection operation, transmission reduces projecting beam 34 illuminations of a plurality of reflections of district's 102 usefulness, makes for giving the angle that transmission reduces district 102, reaches desired intensity in the plane on the scene.

As an alternative, calibration plate 104 throws operating period normal, also can remove from course of the beam.

8. adjust-the first embodiment

So far equipment of being introduced and method are applicable to the pitch angle of each mirror element 28 of determining multiple mirror arrays 26.In case can access the information at relevant pitch angle, then must guarantee by regulating system, as far as possible accurately observe the setting value of pitch angle regulation.Preferably, the whole neutral mean value that is provided with of beam deflection element can be adjusted at least 1/6000 precision.In addition, can be adjusted at least 1/500 precision with respect to this neutral being oppositely arranged of being provided with.

Adjust duration t and (mirror element 28 must be at this moment between in orientation) be set determines, that is, should within these times, change pupil illumination for the reasonable work of microlithographic projection exposure apparatus 10 by these times.Typically, the described time is in the 10ms-50ms scope.This directly influences the bandwidth of regulating system, that is is intended to measure and adjust the frequency at the pitch angle of mirror element 28.

For getting rid of indivedual mirror elements 28, can cancel active damping in some cases, as long as the mechanical property of multiple mirror arrays 26 is enough stable for so-called feedforward control by for the multiple mirror arrays 26 of adjacent mirror element 28 or external action exciting.

However the indivedual mirror elements 28 of recalibration are appropriate often, because the relation between the normal vector nv of minute surface 30 and the control signal sv that applies can change in time owing to different influences.The available formula nv=K of this relation (t) * sv expresses.Wherein measuring K (t) is a tensor under general situation, because control signal sv also may for example influence by static each other.If the time dependence of tensor K itself depends on external parameter p, temperature for example, then these influences can be measured by independent measurement mechanism (for example temperature sensor).Tensor is not only the function of time t, and is function (that is the K=K (t, p)) of parameter p.(t p) can be used to determine control signal sv tensor K, need not implement to recalibrate.

Yet because suppress the influence that some are uncertain of till the ass ascends the ladder fully usually, so however still need recalibration.For example for rational feedforward control, adjusting the duration when being 10ms, for the pitch angle of the single mirror element 28 of calibration measurement, rate of calibration is that 1kHz (that is the time of adjustment 1/10th) may be necessary.

No longer can get rid of because interior or outer interference causes in the multiple mirror arrays 26 of vibration, and a kind of enclosed control loop is being provided.When the typical natural frequency of mirror element 28 inclination vibrations was 1-2kHz, for each corresponding coordinate of each mirror element 28, obtaining measuring and adjusting speed was 1-2kHz, preferably 10-20kHz.In the multiple mirror arrays 26 with at least 4000 mirror elements 28, this causes each coordinate, for example pitch angle or translation, and measuring rate surpasses 4MHz.

For this reason, can use control loop, according to the sensor signal of the measurement mechanism of accepting, this control loop directly acts on the adjusting parameter s at control mirror element 28 pitch angle, makes and observes the pitch angle setting value as far as possible exactly.For this purpose, use so-called PID (proportion integration differentiation) regulator usually, it receives regulates difference e, that is the deviation between reflection angle setting value and the actual value, as input signal.Then, according to the adjustment of PID regulator ratio parts (P), integrating block (I) and differentiating unit (D), correspondingly determine to regulate parameter s, it influences the actual value of reflection angle again.This enclosed control loop is by so-called regulating frequency f work.

Yet, have following point aspect the adjustment of the mirror element 28 of multiple mirror arrays 26 here.At first the differential of sensor signal often is difficult to carry out, because the sensor values of measurement mechanism is subject to uncertain influence very much.Therefore differential by discontinuous filtration, can cause strong noise to amplify in the adjustment link of appraising and deciding for differentiating unit (D), and the conditioning signal that obtains can't be used.On the other hand, regulating difference e can only calculate with the sample frequency that mirror element 28 inclination measurement are provided.Because mirror element 28 googol amounts, for example several thousand or even tens thousand of mirror elements 28, greatly limited the maximum sample frequency of single mirror element 28.Control loop also can only be worked with the corresponding regulating frequency f of described little sample frequency with one thus, thereby can cause departing from significantly setting value.

Figure 12 represents the regulation scheme of control loop, and its uses the state estimator based on model, and thereby does not have above mentioned those shortcomings.Based on the state estimator of model, based on model, and by the sensor signal that is subjected to possible uncertainty (for example because measuring method) influence, estimate the pitch angle that mirror element 28 is current.For this reason, by internal model,, calculate the state vector of estimation according to (being subjected to uncertain sex) sensor signal based on the state estimator of model, that is the pitch angle x of pitch angle x that for example estimates and the estimation time-derivative of ordering.Other location parameters that state vector also can comprise a plurality of pitch angle and/or mirror element 28 with and behavioral characteristics, for example their time-derivative.

Compare the state vector of this estimation and the set condition of system then, that is the setting value of pitch angle reality and time-derivative thereof.Although determine the time-derivative at pitch angle by the reflection angle setting value by differential here, described differential does not have any difficulty, because the setting value at pitch angle is not influenced by uncertainty yet.Except regulating poor e, also according to the time-derivative de of described more adjusted difference, their are common constitute regulate difference vector (e, de).

(e de) is transferred to a kind of adjusting algorithm, and its calculation control parameter s also is transferred to the controller of mirror element 28 should to regulate difference vector now.The regulation scheme of having represented this adjusting algorithm among Figure 13 in detail.As seen from Figure 13, regulating algorithm has three proportioning elements, can determine the influence of different adjustment parts by them.First proportioning element KP wherein regulates difference e and only multiply by a constant corresponding to the ratio parts (P) of PID regulator.Second proportioning element KI will multiply by a constant for the output signal of the integrator of regulating poor e integration, and thereby corresponding to the integrating block (I) of PID regulator.The 3rd proportioning element KD is corresponding to the differentiating unit (D) of PID regulator, and wherein, as explained above, the time-derivative de and a constant that will be transferred to the adjusting difference e that regulates algorithm multiply each other.Export as regulating parameter s after whole three regulator parts additions.

This control loop also can use having of digital form of stronger probabilistic measuring-signal based on the state estimator based on model, as adopts the situation of common PID regulator.

As the starting point that produces based on the state estimator of model, recommend to use by the known state estimator of document, they are particularly useful for considering the uncertain at random of measuring-signal that when estimating these state estimator can correspondingly adapt to the requirement of concrete applicable cases.The example of this respect is Kalman filter (EKF), wireless cable-styled (unscented) Kalman filter (UKF) or the particulate filter of Kalman filter (Kalman filter), expansion.

Because these are based on the state estimator of model, also state vector (the x that can estimate with the speed output of the sample frequency that is higher than measuring-signal, the x point), although so mirror element 28 enormous amount and the low sample frequency of each mirror element 28 are explicitly therewith regulated and still can be carried out with high regulating frequency f.Mirror element 28 pitch angle can reach enough precision thus.

In Kalman filter, to be distinguished between the kinematics model scheme of the Taylor expansion of top rake and kinetic model scheme, this kinetic model scheme is more accurately simulated the characteristic of system in the period that measured value is not provided especially.

In addition, all regulating elements can be multiple or commonage exist, be used to regulate a plurality of mirror elements 28.Therefore all adjusting parameters are for example regulated parameter s, can be used as vector, and the quantity of its component is identical with the quantity of mirror element 28.

A kind of appropriate application to this is that control loop is also carried out by software or fpga chip, because especially can be thus by flexible design based on the state estimator of model.

9. adjust-the second embodiment

Having 12, one important aspects of illuminator that multiple mirror arrays 26 is used for the illumination iris face is the speed and the precision that can have when adjusting each mirror element 28.The critical data of the pick-up unit that record mirror element 28 tilts, the here optics that proposes by designing institute and the general requirement decision of mechanical aspects to illuminator 12 pupil shaped portions 92 and illuminator 12.

By a kind of embodiment, multiple mirror arrays 26 always has 64 * 64=4096 mirror element 28, and they are respectively controlled separately and necessary its pitch angle of independent measurement along two axis.Adopt scheme well known in the prior art so far, so a large amount of mirror elements 28 can not be with desired precision with according to adjusting in the time to the weak point of the requirement decision of contemporary projection exposure apparatus 10.This be because, each mirror element 28 should be able to center on given neutral position along two axis be taked at least ± and 2 °, as may ± 3 ° pitch angle, control system must be controlled this angular range, has the systemic precision of about 11 microradians and the statistics uncertainty of about 140 microradians.

Therefore be necessary to measure the mirror position, and implement to revise by control loop.Here, in order to measure a complete set of 4096 mirror elements 28, about 1ms of operational time that is to say, must determine the pitch angle of each mirror element 28 in about 250ns with desired precision ground.In addition, (seeing the embodiment of Figure 10) also should each be measured by measuring beam 62 in the pitch angle of mirror element, and wherein, the direction of propagation of the measuring beam 64 of reflection after reflection on the minute surface 30 provides the information about the pitch angle.Therefore, purpose is enough pitch angle of definite measuring beam 64 that is reflected promptly.

For this reason, as top illustrated, by using the Fourier optics parts, for example the detecting device convergent lens 66, with angular transition be the position and on position transducer 68 this position of record.But, very difficultly can use the sort of pick-up unit of representing among 4096 parallel embodiment as Fig. 5 because structure space is limited.That is to say, under the situation that does not drop into huge expense,, can distinguish and only use a position transducer 68 and Fourier optics parts just as in the embodiment shown in fig. 10.Pay through the nose, four pick-up units approximately can be installed, but at present 4096 pick-up units may be installed hardly.Therefore the purpose that will reach is, only with a position transducer 68 and Fourier optics parts, just can satisfy measuring and the control device requirement.

For this reason, Figure 14 shows a kind of schematic construction of device, can implement a kind of multiplication method by it, and this method can be only with a position transducer 68, and is parallel and measure a plurality of mirror elements 28 independently.

As having mentioned among the embodiment of Figure 10, can use the arrangement of laser diode, promptly so-called VCSEL array 98 as the light source of measuring illumination.This have the square of 64 * 64 lattice points or a VCSEL array 98 of hexagonal mesh, can buy on market.By matrix driving, wherein anode in row or column and negative electrode are connected to each other respectively, can control independently simultaneously to reach 64 for example laser diodes in delegation.The light of laser diode by being fixedly mounted on the collimating apparatus convergent lens 60 of the microlens array on the VCSEL array 98, focuses on the multiple mirror arrays 26.

As position transducer 68, can consider commercial different schemes.Have about 4MHz bandwidth with and noise still also allow the position transducer 68 of desired measuring accuracy, on market, can buy, it also is called for short PSD (for example 2L4 type of SiTek).But because the Measuring Time of each mirror element 28 only allows about 250ns, so this position transducer 68 has limited its ability to work in view of measuring speed.In the replacement scheme of seeking position transducer 68, it can be realized the spatial resolution that requires and allow shorter Measuring Time.Therefore the present invention relates to various types of detecting devices, wherein the data of the 2L4PSDs of SiTek can be used as starting point.

According to the data of having delivered of PSD, amplifier circuit and analog-digital converter, can infer accessible in theory statistics site error.Because it is slightly less than requirement, therefore can doubles by the time-division in theory and come analyzing prism element 28.The laser diode of VCSEL array 98 is here one after the other connected, so only by the measuring beam 64 difference irradiation position sensors 68 of a mirror element 28 reflections.Yet, because the limited bandwidth of laser diode and position transducer 68, measure the required time to be shortened less than 100ns.This method is called " in proper order " method hereinafter because light source is strictly connected in succession and once only a quilt throw light on respectively.

In order to resist restrictive factor, for example the signal elevating time of position transducer 68, DC depart from and drift about and the 1/f noise of amplifier, laser diode does not one after the other connect and disconnects, but for example works simultaneously in groups with four or eight laser diodes.Certainly, the intensity of each laser diode of a group is modulated with different frequency sinusoidal ground.Because the electrode current of detection position, phase sensitive ground sensor 68, that is its output signal,, separate by the frequency of its modulation in the part of the different measuring light beam 64 of position transducer 68 diverse locations reflection.Briefly, be similar to measuring method by method of the present invention with the lock-in amplifier of a plurality of concurrent workings.

The signal elevating time that reduces position transducer 68 thus strictly limits the effect of measurement mechanism ability to work.Therefore can and in addition under the situation that amplitude reduces, realize the measurement at a plurality of mirror elements 28 pitch angle in described bandwidth range.In addition, eliminated all DC effects, that is depart from, the influence of drift and 1/f noise.For example, can cancel for the required differential amplifier of the PSD bias voltage of position transducer 68, thereby eliminate its noise by the AC coupling of amplifier.In addition, the influence of " dead time " (this moment system stabilityization and can not measure) also significantly reduces.

As the secondary effect of AC coupling, also improved the digital sensor quality of signals of position transducer 68, because realized only when AC is coupled, just reaching highest resolution with the D-A converter of the irrelevant latest generation of the measuring method of using.

Different with known locking principle, system is not with a kind of frequency but modulates simultaneously with multiple frequency.With regard to these characteristics, native system is similar to Fourier's interferometer a bit.

The special selection makes and can utilize the strict periodicity boundary condition at frequency and data recording time.Therefore also can realize free from error Fourier analysis, and there is no need as in the lock-in amplifier, using graduation or double type " window " by very short data stream.

Also have some shortcomings although compare, yet these shortcomings can be easy to overcome with the advantage that illustrated method is found out easily:

Position transducer 68 treatable maximum light intensity are restricted.Therefore when a plurality of light sources throw light on simultaneously, the brightness of each light source be should reduce, thereby signal amplitude and noise ratio reduced.Yet this amplitude loss is by longer available Measuring Time compensation, and therefore limiting maximum light intensity self can not bring additional measuring error.

Based on the selection (seeing below) of frequency, need be greater than the bandwidth of 4MHz.Tiao Zhi light source is many more simultaneously, and required bandwidth is big more.Because the bandwidth that position transducer 68 is limited, signal amplitude is less when frequency is higher, and thereby statistical errors bigger.

For fruitful ground technical application, key is correctly to select survey frequency.For fear of the window problem in Fourier analysis, select frequency, thereby measure the number of cycles of each frequency in measurement clearance respectively.Therefore for all frequencies, the border of measurement clearance is periodic boundary condition.Therefore do not need window, and measuring-signal quadrature exactly, thereby prevent the channel interference when Fourier analysis.

VCSEL array 98 and electronic equipment thereof show, are nonlinear relationships between drive signal and luminosity.Therefore except that survey frequency, light field also contains its harmonic wave.If this harmonic wave of a laser diode overlaps with the survey frequency of another laser diode (that is another mirror element 28), the measurement result of then giving this another laser diode is compromised.Therefore should the neither one survey frequency be many times of another survey frequency.In order to ensure this point, frequency as Prime Number Distribution in bandwidth.

What be suitable in this object lesson is to reach 250ns the measuring period of each mirror.When four light sources are movable simultaneously, need four frequencies, so that analyze four mirror elements 28 simultaneously.Therefore this measurement duration is 1 μ s (the negligible number level is the transit time of 200ns).Therefore periodic boundary condition is applicable to that those are frequencies of many times of 1MHz.Therefore, many times of preceding four prime numbers of 1MHz are frequency 2MHz, 3MHz, 5MHz and 7MHz.When measuring eight at the same time, the gap is that the long and survey frequency of 2ps is 1,1.5,2.5,3.5,5.5,6.5,8.5 and 9.5MHz.The bandwidth of position transducer 68 is depended in the optimal selection of number of frequencies.Draw by simulation, be between four and eight frequencies for the optimum value of the critical data of Silek 2L4 and requirement, value also can be determined by experiment accurately.Because the density of prime number reduces with the increase of value, thus along with increasing bandwidth, the survey frequency number also increases, the sensor 68 spendable signal amplitudes that dip thus, this influences precision once more.

Owing to can on position transducer 68, detect peaked limited total intensity, also must select the luminosity of light source, the feasible saturation limit that is no more than position transducer 68.For this reason, reasonably be to adjust the average power of each light source high as far as possible thus with light source control for making maximum total intensity as far as possible little.Because frequency determines by Prime Number Distribution, and each light source has identical amplitude, so maximum total luminosity can minimize by adjusting relative phase.The minimized result of Nonlinear Numerical is, only by appropriately selecting phase place, just can reach significantly to reduce maximum intensity.Maximal value is 2.93 when 4 light sources for example with many times of expression of single maximum intensity, is 4.33 when 6 light sources, is 5.57 when 8 light sources.

Compare with aforementioned sequential sampling mirror element (not modulating), the advantage that the method for being introduced is outstanding is, the speed of position transducer 68 does not also mean that restriction for measuring accuracy essence.Can promptly measure arbitrarily in principle, although make measuring accuracy impaired owing to reduced signal amplitude.But it is contemplated that (and in calculation element, being easy to realize) thus, between friction speed and precision, change according to instruction by design evaluation software correspondingly.Therefore for example when measuring error is big, all mirrors can be adjusted into sampling time of 0.2ms for the active damping of mirror, and the adjustment process for reality is returned as 1ms again when precision entirely.When pure proceeding measurement, no longer can reach survey frequency 0.2ms with SiTek 2L4.Therefore this method (that is be 0.2ms when the 2L4 with SiTek should reach the sampling time, so that active damping) under given condition is not only a kind of favourable scheme, and even might be unique feasible scheme.

Need following parts in order to carry out described measuring method:

The measurement lighting device that comprises a plurality of light sources, it is provided with the master control amplifier of appropriate quantity, thereby the light source of one group of one-tenth such as 4,6,8 can be worked simultaneously.

Signal generator, it can produce the frequency sinusoidal signal relevant with phase place, and wherein the quantity of signal is identical with the quantity of light source of control simultaneously.For this reason, (Direct Digital Synthesis: generator Direct Digital formula compositor) is well-adapted by the DDS principle.

Four analog-digital converters, they are with position transducer 68 pre-amplifying signal digitizings.Because this technology is based on synchronous detection, the clock source of converter can be derived by the benchmark identical with the clock of signal generator.

Calculation element, it can assess the sensor signal of analog-digital converter.For this generic task reasonably be, use programmable logical block here, for example FPGA (Field-Programmable GateArray: field programmable gate array).Therefore calculation element (FPGA) has following main task:

Zero collects the measurement data of four ND converters.

Zero digitally produces frequency sine identical with light source frequency and cosine signal.

Zero usefulness A/D converter data multiplication sine and cosine signal.This makes the frequency of each use obtain 8 products.

Zero through these products that add up in measurement clearance.These and number provide not standardized 0 ° and 90 ° of components, can determine the amplitude of input signal separately by them by second addition.

By these amplitudes,, determine the 2D angle position of mirror separately by simple addition, subtraction and division.These computings can have many time, because each mirror of this computing need only be implemented twice.

By utilizing available calculation element in modern FPGAs, can in single FPGA, finish this task with the expense of appropriateness.

FPGA comprises the electronic installation calcspar of the function of tonic chord as seen from Figure 14.

In computing unit 108, only be decorated with the big computing of calculated amount." MAC unit " is the multiply-add unit, and it provides with 8*n form doubly, and wherein n is the quantity of light source, and they use different frequency modulation (PFM)s simultaneously.Except that computing unit 108 (it is carried out and directly do not show in hardware as " Firmware " of FPGA), native system is very similar with habitual " in proper order " measuring method, can low cost make thus.In this sketch, the main integrated function of DDS device in FPGA (D/A converter is in the lower right) is although this also can carry out with the DDS member on the market.

10. conclusion

Measurement and the equipment of mentioning in conjunction with the illumination of pupil plane undoubtedly also can advantageously be used to active mask above, wherein establishes arrangement of micro mirrors equally as controlled member.

Equally, multiple mirror arrays can substitute with other reflections or transmissive element, if they can make incident light in the different subregions of element by applying control signal along different directions deflection.Alternative structure that these are different can for example comprise photoelectricity or acousto-optic element, by making the material that is suitable for be subjected to electric field or hyperacoustic influence, can change refractive index in them.This change of refractive index can be used to reach the light deflection of expectation.

Although describe the present invention in detail by appended embodiment; but it will be apparent to those skilled in the art that; can just omit some features that illustrated and/or with regard to the characteristics combination of introducing, it is possible substituting or improving, and does not break away from the scope that appended claims is asked for protection.

Claims

1. the illuminator (12) of a microlithographic projection exposure apparatus (10), comprise pupil plane and be used for that pupil plane throws light on changeably, the plane layout basically that is formed by beam deflection element (28), wherein, for each beam deflection element (28), have and be assigned to it and get to projecting beam (32) on it, wherein, according to the control signal that is applied on beam deflection element (28), each beam deflection element (28) allows to be assigned to projecting beam (32) deflection on described beam deflection element, it is characterized in that

At least one measures lighting device (54,56,58,60; 88; 90; 98), can will be directed on the beam deflection element (28) with the irrelevant measuring beam (36) of projecting beam (32) with it,

Pick-up unit can be recorded in by the measuring beam (38) after beam deflection element (28) deflection by it, and

Assessment unit is used for determining to be assigned to according to the measuring-signal that pick-up unit provides the deflection of the projecting beam (32) of described beam deflection element (28).

2. according to the described illuminator of claim 1, it is characterized by, described beam deflection element (28) is separately controllable.

3. according to the described illuminator of claim 1, it is characterized by, described measuring beam (36) can incident direction (50,50 ') be directed on the beam deflection element (28), and this incident direction (50,50 ') is different from the incident direction (40) of projecting beam (32) the described beam deflection element of irradiation (28) of giving beam deflection element (28).

4. according to the described illuminator of claim 3, it is characterized by, the described incident direction (50,50 ') that is directed into the measuring beam (36) on the beam deflection element (28), with described incident direction (40) of giving the projecting beam (32) of beam deflection element (28), difference aspect incident angle and/or position angle.

5. according to the described illuminator of claim 4, it is characterized by, the described position angle that is directed into the incident direction (50) of the measuring beam (36) on the beam deflection element (28), position angle with the incident direction (40) of the described projecting beam (32) of giving beam deflection element (28) differs each other above 30 °.

6. according to the described illuminator of claim 4, it is characterized by, the described position angle that is directed into the incident direction (50) of the measuring beam (36) on the beam deflection element (28), position angle with the incident direction (40) of the described projecting beam (32) of giving beam deflection element (28) differs each other above 60 °.

7. according to the described illuminator of claim 4, it is characterized by, the described position angle that is directed into the incident direction (50) of the measuring beam (36) on the beam deflection element (28), position angle with the incident direction (40) of the described projecting beam (32) of giving beam deflection element (28) differs about 90 ° each other.

8. according to the described illuminator of claim 1, it is characterized by, described beam deflection element (28) is the tiltable mirror that mirror surface (30) is arranged.

9. according to the described illuminator of claim 8, it is characterized by, described mirror can tilt around two tilt axis.

10. according to the described illuminator of claim 9, it is characterized by, described tilt axis is that mutually orthogonal is arranged.

11. according to claim 8 or 9 described illuminators, it is characterized by, can also determine the curvature of mirror surface (30) by apparatus for evaluating.

12. according to the described illuminator of claim 11, it is characterized by, many measuring beams (36) can be directed on the single minute surface (30); And, based on the different deflections that measuring beam (36) is gone up experience at the minute surface (30) of bending, can determine curvature by apparatus for evaluating.

13. according to the described illuminator of claim 11, it is characterized by, can write down the xsect of measuring beam (36) by pick-up unit; And, based on determined xsect, can determine curvature by apparatus for evaluating.

14., it is characterized in that housing (82), beam deflection element (28) wherein is installed, and housing (82) there are pair measuring beam (36) and the transparent window (84) of projecting beam (32) according to the described illuminator of claim 1.

15. according to the described illuminator of claim 14, it is characterized by, the measuring beam (36) of p-polarization can be directed on the window (84) with Brewster angle by measuring lighting device (88).

16. according to the described illuminator of claim 15, it is characterized by,, maybe the measuring beam (36) of different polarization can be converted to the measuring beam (36) of p-polarization by measuring the measuring beam (36) that lighting device (88) can produce the p-polarization.

17. according to the described illuminator of claim 15, it is characterized by, described measurement lighting device (88) comprises light source (54; 98) and polarizer (88), this polarizer (88) is the measuring beam of transmission p-polarization (36) only.

18. according to the described illuminator of one of claim 14 to 17, it is characterized by, described transparent window (84) has anti-reflecting layer (86), this anti-reflecting layer (86) is optimized for the projecting beam (32) of incident; And the wavelength of described measuring beam (36) is greater than the thickness of described anti-reflecting layer (86).

19. according to the described illuminator of claim 1, it is characterized by, measuring lighting device (54,56,58,60; 88; 98) and between the beam deflection element (28), the incident sidelight is set learns system (56,58,60).

20. according to the described illuminator of claim 19, it is characterized by, described light incident side optical system (56,58,60) comprises that at least one is used to produce the collimating apparatus of parallel beam (62) (56,58,60).

21. according to the described illuminator of claim 20, it is characterized by, described light incident side optical system (56,58,60) comprises the layout of convergent lens (60), each convergent lens (60) is wherein accurately attached troops to a unit in a beam deflection element (28).

22. according to the described illuminator of claim 1, it is characterized by, between beam deflection element (28) and pick-up unit, the outgoing sidelight be set learn system (66; 70,72,74).

23. according to the described illuminator of claim 22, it is characterized by, pick-up unit has a plurality of scanner-recorders (68) with space analysis; And, described exiting side optical system (66; 70,72,74) comprise at least one convergent lens (66), at least one in the scanner-recorder (68) is set in its focal plane.

24. according to the described illuminator of claim 22, it is characterized by, pick-up unit has a plurality of scanner-recorders (68) with space analysis; And, described exiting side optical system (66; 70,72,74) comprise at least one convergent lens (66), described scanner-recorder (68) is arranged in the focal plane of layout of convergent lens (66), and each convergent lens (66) is wherein accurately attached troops to a unit in a beam deflection element (28).

25. according to the described illuminator of claim 24, it is characterized by, for each convergent lens (66) accurately sets a scanner-recorder (68) that has living space and resolve.

26. according to the described illuminator of claim 24, it is characterized in that object lens (70,72,74), it arranges beam deflection element (28) and is imaged on convergent lens (66) layout.

27. according to the described illuminator of claim 26, it is characterized by, the layout of described object lens (70,72,74), described beam deflection element (28) and described convergent lens (66) are arranged and are satisfied the condition of intersection.

28. according to the described illuminator of claim 1, it is characterized by, described pick-up unit comprises that at least one is designed to the scanner-recorder of 4 quad detectors (68).

29. according to the described illuminator of claim 1, it is characterized by, described at least one measurement lighting device (90) produces a lighting pattern, measuring beam is from this lighting pattern outgoing; And described pick-up unit is a camera, can write down details by the pattern after beam deflection element (28) deflection by it.

30. according to the described illuminator of claim 29, it is characterized by, described pattern does not have the part of two identical unanimities.

31. according to claim 29 or 30 described illuminators, it is characterized by, described pattern produces by the screen of illumination.

32. according to claim 29 or 30 described illuminators, it is characterized by, described pattern produces by the screen of transillumination.

33., it is characterized by a plurality of beam deflection elements of described camera record (28) according to claim 29 or 30 described illuminators.

34. according to claim 29 or 30 described illuminators, it is characterized by, it comprises another assessment unit, described another assessment unit can find in pattern by the details of the pattern of camera record.

35. according to claim 29 or 30 described illuminators, it is characterized by, described apparatus for evaluating can be implemented the details of pattern and the auto-correlation between the pattern.