CN101593653A - A kind of front panel of plasma display and manufacture method thereof - Google Patents
A kind of front panel of plasma display and manufacture method thereof Download PDFInfo
- Publication number
- CN101593653A CN101593653A CNA2008101132002A CN200810113200A CN101593653A CN 101593653 A CN101593653 A CN 101593653A CN A2008101132002 A CNA2008101132002 A CN A2008101132002A CN 200810113200 A CN200810113200 A CN 200810113200A CN 101593653 A CN101593653 A CN 101593653A
- Authority
- CN
- China
- Prior art keywords
- zno
- transparent dielectric
- glass
- dielectric layer
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Abstract
The present invention relates to a kind of front panel of plasma display and manufacture method thereof.Front panel of plasma display of the present invention comprises: glass substrate (201); First transparent dielectric layer (202) is arranged on the glass substrate; Silver electrode (203) is arranged on first transparent dielectric layer (202); Second transparent dielectric layer (205) is arranged on the glass substrate and covers silver electrode (203).The method that the present invention makes front panel of plasma display (200) comprises the steps: A) go up at glass substrate (201) with transparent dielectric material and make first transparent dielectric layer (202); B) on first transparent dielectric layer (202), produce silver electrode (203); C) go up making second transparent dielectric layer (205) to cover silver electrode (203) at glass substrate (201).Transparent dielectric layer among the present invention not only can prevent the aetiolation that the silver diffusion brings, and can reduce the bubble that produces with electrode reaction.
Description
Technical field
The present invention relates to a kind of front panel of plasma display and manufacture method thereof.
Background technology
Plasma display (PDP) display screen is reached by front panel and rear board to be formed attached to the function element on the panel.In order to reduce product cost, glass substrate is selected soda-lime glass with low cost usually for use in the panel.
Electrode belongs to the discharge device of PDP, and the most frequently used electrode material is photosensitive silver paste.The silver electrode that photosensitive silver paste is made has the formed precision height, and electric conductivity is stable, is the material of display device first-selection.
Yet silver is easy to see through electrode black matrix and glass substrate effect, forms aetiolation at glass baseplate surface, reduces the brightness of display device, changes the colour temperature of chromatic display.
Reacting to each other between silver electrode and the transparent dielectric layer in addition to produce a large amount of bubbles, reduces the transmitance of front panel, and the withstand voltage properties of dielectric layer also can weaken simultaneously.
Therefore, how to provide a kind of method, can solve silver electrode and cause the aetiolation of glass surface and the air bubble problem of silver electrode and transparent dielectric layer reaction generation, become a difficult problem of pendulum in face of people.
Summary of the invention
The object of the invention is to provide a kind of front panel of plasma display and manufacture method thereof, by between glass substrate and silver electrode, increasing transparent dielectric layer, can effectively solve silver electrode and cause the aetiolation of glass baseplate surface and the air bubble problem of silver electrode and transparent dielectric layer reaction generation.Improved the resistance to pressure that covers transparent dielectric layer on the silver electrode.
The object of the invention is achieved through the following technical solutions.
An aspect of of the present present invention relates to a kind of front panel of plasma display, comprising:
-glass substrate;
-the first transparent dielectric layer is arranged on the glass substrate;
-silver electrode is arranged on first transparent dielectric layer;
-the second transparent dielectric layer is arranged on the glass substrate and covers silver electrode.
Wherein, constitute first transparent dielectric layer and alternatively the inorganic base of second transparent dielectric layer contain 0.05%～1% CuO by weight.
The inorganic base that constitutes first transparent dielectric layer and second transparent dielectric layer is a glass, preferred seal glass, more preferably low-melting point sealing glass, most preferably crown glass.
Inorganic base is selected from following at least a: PbO-B
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3System, Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na or K in system; R ' is Ba or Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5, B
2O
3-ZnO-V
2O
5System, SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5System, Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2Be glass.
Inorganic base contains 15%～40% B by weight
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.
Glass substrate is the soda-lime glass substrate.
Front panel of plasma display of the present invention further comprises: diaphragm is arranged on second transparent dielectric layer.Diaphragm is preferably the magnesium oxide diaphragm.
The thickness of transparent dielectric layer is 1 μ m～6 μ m.
Another aspect of the present invention relates to a kind of method of making front panel of plasma display, comprises the steps:
A) on glass substrate, make first transparent dielectric layer with transparent dielectric material;
B) on first transparent dielectric layer, produce silver electrode;
C) on glass substrate, make second transparent dielectric layer to cover silver electrode.
Make first transparent dielectric layer and alternatively the method for second transparent dielectric layer may further comprise the steps:
A1) on glass substrate, apply transparent dielectric material;
A2) glass substrate that will have the transparent dielectric material layer carries out drying;
A3) dried transparent dielectric material layer is carried out sintering.
Applying can be printing, coating or attaching.
Inorganic base in the transparent dielectric material contains 0.05%～1% CuO by weight.
Inorganic base is a glass, preferred seal glass, more preferably low-melting point sealing glass, most preferably crown glass.
Inorganic base is selected from following at least a: PbO-B
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3System, Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na or K in system; R ' is Ba or Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5, B
2O
3-ZnO-V
2O
5System, SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5System, Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2Be glass.
Inorganic base contains 15%～40% B by weight
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.
Method of the present invention further comprises: D) make diaphragm on second transparent dielectric layer.Diaphragm is preferably the magnesium oxide diaphragm.
Vector contg accounts for 20%～45% of transparent dielectric material total weight by weight in the transparent dielectric material.
Beneficial effect:
1. solved the soda-lime glass aetiolation;
2. reduced the bubble that electrode perimeter produces;
3. reduced the glass substrate cost;
4. technology is simple.
Description of drawings
Fig. 1 is the perspective view of front panel of plasma display of the present invention.
Embodiment
In the present invention, except that specializing, all content, percentage, umber all are in weight (quality).
The present invention is described in detail below with reference to accompanying drawing 1.Fig. 1 is the perspective view of front panel of plasma display of the present invention.
One aspect of the present invention relates to a kind of front panel of plasma display 200, comprising:
-glass substrate 201;
-the first transparent dielectric layer 202 is arranged on the glass substrate 201;
-silver electrode 203 is arranged on first transparent dielectric layer 202;
-the second transparent dielectric layer 205 is arranged on the glass substrate 201 and covers silver electrode 203.
Preferred front panel of plasma display of the present invention further comprises: diaphragm 206 is arranged on second transparent dielectric layer 205.Diaphragm 206 is preferably the magnesium oxide diaphragm.
The pattern part of corresponding at least silver electrode is provided with first transparent dielectric layer 202 between glass substrate 201 and the silver electrode 203.In a kind of preferred embodiment, between glass substrate 201 and the silver electrode 203 only the pattern part of corresponding silver electrode be provided with first transparent dielectric layer 202.In another kind of embodiment, be arranged on the whole glass substrate 201 at first transparent dielectric layer 202 between glass substrate 201 and the silver electrode 203.
The thickness of first transparent dielectric layer 202 has no particular limits, and arrives glass substrate 201 as long as can block silver ion.For example, the thickness of first transparent dielectric layer 202 can be 1 μ m～6 μ m.
The inorganic base of second transparent dielectric layer 205 and first transparent dielectric layer 202 can be identical, also can be different.Consider cost and simplify technology, the inorganic base of preferred second transparent dielectric layer 205 is identical with first transparent dielectric layer 202.
First transparent dielectric layer 202 is arranged on the Wuxi face of soda-lime glass substrate 201.
The inventor finds, when the inorganic base that constitutes first transparent dielectric layer 202 contains CuO, can more effectively stop seeing through of silver, suppresses silver electrode color development aetiolation.The content of CuO preferably by weight 0.05%～1% in the inorganic base, and more preferably 0.05%～0.5%.Constitute first transparent dielectric layer 202 and alternatively the inorganic base of second transparent dielectric layer 205 contain 0.05%～1% CuO by weight.That is to say that the inorganic base that constitutes first transparent dielectric layer 202 contains 0.05%～1% CuO by weight, the inorganic base that constitutes second transparent dielectric layer 205 can contain 0.05%～1% CuO by weight, also can not contain CuO.In a kind of preferred embodiment, the inorganic base that constitutes first transparent dielectric layer 202 and second transparent dielectric layer 205 all contains 0.05%～1% CuO by weight.
The inorganic base of first transparent dielectric layer 202 and second transparent dielectric layer 205 can be glass, preferred seal glass, more preferably low-melting point sealing glass.From leaded angle, seal glass can be lead glass or crown glass.The angle of crystallization whether before and after the sealing-in, seal glass can be non-crystalline type seal glass and crystal type seal glass.
The example of lead glass has PbO-B
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3Be glass.
Crown glass is meant lead content less than 0.2% glass (Unite States Standard), preferably less than 0.1% glass (European Union's standard).Consider influence, preferably adopt crown glass health and environment.
A kind of example of crown glass is a lead-free phosphate glass.The example of lead-free phosphate glass has Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na, K in system; R ' is Ba, Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5Be glass.
A kind of example of crown glass is unleaded non-crystalline type glass.Unleaded non-crystalline type glass can be (1) SiO
2-B
2O
3-RO-RO
2System, (2) B
2O
3-ZnO-V
2O
5System, (3) P
2O
5-ZnO-R
2O
3Be glass, the composition of these glass can be with reference to " latest developments that low-melting sealing glass is unleaded and the development trend thereof " of Shi Chengli, building glass and industrial glass, 2007, (2): 27-30.
A kind of example of crown glass is unleaded crystal type glass.Unleaded crystal type glass can be SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5Be glass.The example of crown glass also has Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2System lead-free glass.
The example of low-melting point sealing glass can also be the mentioned seal glass of following document: Bai Jinwei, " low-melting sealing glass is formed and development ", material Leader, 2002, the 16 the 12nd phases of volume, 43-46; Shi Chengli, " latest developments that low-melting sealing glass is unleaded and development trend thereof ", building glass and industrial glass, 2007, the 2 phases, 27-30; Guo Hongwei etc., " progress of low-melting sealing glass ", material Leader, 2005, the 19 volume special edition V, 283-285.
In a kind of preferred embodiment, B
2O
3-BaO-ZnO-SiO
2Be that glass preferred ingredients proportioning is: 15%～40% B
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.The inorganic base proportioning of preferred second transparent dielectric layer 205 also is the said components proportioning as first transparent dielectric layer 202.The reason of the inorganic base of first transparent dielectric layer 202 and/or second transparent dielectric layer 205 being formed the as above scope of being limited to is as follows:
B
2O
3Reduce devitrification of glass and conductivity, improve thermo-chemical stability and dielectric constant, enlarge the vitrifying scope, improve glassy lustre, be less than 15%, the vitrifying difficulty; More than 40%, phase-splitting easily takes place.
ZnO reduces thermal coefficient of expansion, reduces softening point, increases heat, chemical stability and alkali resistance.Its content is 30～55%.If be less than 30%, do not reach and reduce the coefficient of expansion or softening point effect, if more than 55%, crystallization takes place easily, be difficult to obtain transparent sintered medium layer.
BaO reduces glass softening point, increases thermal coefficient of expansion, and suppresses the glass phase-splitting.Content is lower than 5%, can not reach significantly to flux and improve the transmitance effect, if be higher than 25%, the glass dust thermal coefficient of expansion is bigger than normal.
SiO
2Effectively improve the glass transition warm area, increase glass heat chemical stability and mechanical strength, reduce conductivity and dielectric loss.Content is higher than 20%, and glass softening point is higher, is lower than 3%, vitrifying difficulty, resistance to water variation.
The inventor finds that unexpectedly CuO can effectively suppress silver electrode color development aetiolation as glass additive, can control ligancy, stability and the animal migration of glass in addition.Content is lower than 0.05%, can not effectively suppress aetiolation, and content more than 1% excessively painted and stable deterioration of dielectric layer can take place, and is lower than 0.5% for good.
Glass substrate of the present invention has no particular limits, and gets final product soda-lime glass for example, the Cs25 glass of the PD200 glass of Japan AGC company exploitation, Corning Incorporated's exploitation so long as can be used for the glass substrate of PDP display.Glass substrate can also be that U.S. Pat 6313052B1, US 6297182B1, US 6087284, US 5459109, Japan Patent NEG spy drive the glass substrate disclosed in the flat 8-290938.
Another aspect of the present invention relates to a kind of method of making front panel of plasma display, comprises the steps:
A) on glass substrate 201, make first transparent dielectric layer 202 with transparent dielectric material;
B) on first transparent dielectric layer 202, produce silver electrode 203;
C) on glass substrate 201, make second transparent dielectric layer 205 to cover silver electrode 203.
Method of the present invention further comprises:
D) on second transparent dielectric layer 205, make diaphragm 206.Diaphragm 206 is preferably the magnesium oxide diaphragm.
The method of making first transparent dielectric layer 202 and second transparent dielectric layer, 205 transparent dielectric layers may further comprise the steps:
A1) on glass substrate, apply transparent dielectric material;
A2) glass substrate that will have the transparent dielectric material layer carries out drying;
A3) dried transparent dielectric material layer is carried out sintering.
Applying can be printing, coating or attaching.For example, can adopt methods such as silk screen print method, die cladding process, beam cladding process, cylinder cladding process, spraying process, laminate patch method to apply transparent dielectric material.
First transparent dielectric layer 202 is arranged on the Wuxi face of soda-lime glass substrate 201.
Dry temperature range is 150～200 ℃.The temperature range of sintering is 500 ℃～550 ℃.
Transparent dielectric material is preferably slurry.Transparent dielectric paste is made of inorganic base and carrier etc.Transparent dielectric material can also further comprise the functional powder of giving dielectric layer electricity and optical property.
The inorganic base of first transparent dielectric layer 202 and second transparent dielectric layer 205 can be identical, also can be different.
Preferably contain CuO in the inorganic base.The content of CuO preferably by weight 0.05%～1% in the inorganic base, and more preferably 0.05%～0.5%.
Preferred inorganic base provides with powder type, and inorganic base is preferably glass dust.Transparent dielectric paste is made of glass dust, organic carrier in a kind of preferred embodiment.Glass dust can be ground and be made by the parent glass that physicochemical property reaches the requirement of PDP dielectric paste, is main component in transparent dielectric paste, is about 60%～80% by weight usually in slurry.The glass dust that is adopted in the transparent dielectric paste, its average grain diameter are no more than 4.0 μ m usually, preferably are no more than 2.0 μ m.And the maximum particle diameter of glass dust is no more than 10 μ m usually.
The glass that glass dust adopted, preferred seal glass, more preferably low-melting point sealing glass.From leaded angle, seal glass can be lead glass or crown glass.The angle of crystallization whether before and after the sealing-in, seal glass can be non-crystalline type seal glass and crystal type seal glass.
The example of lead glass has PbO-B
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3Be glass etc.
Crown glass is meant lead content less than 0.2% glass (Unite States Standard), preferably less than 0.1% glass (European Union's standard).Consider influence, preferably adopt crown glass health and environment.
A kind of example of crown glass is a lead-free phosphate glass.The example of lead-free phosphate glass has Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na, K in system; R ' is Ba, Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5Be glass.
A kind of example of crown glass is unleaded non-crystalline type glass.Unleaded non-crystalline type glass can be (1) SiO
2-B
2O
3-RO-RO
2System, (2) B
2O
3-ZnO-V
2O
5System, (3) P
2O
5-ZnO-R
2O
3Be glass, the composition of these glass can be with reference to " latest developments that low-melting sealing glass is unleaded and the development trend thereof " of Shi Chengli, building glass and industrial glass, 2007, (2): 27-30.
A kind of example of crown glass is unleaded crystal type glass.Unleaded crystal type glass can be SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5Be glass.The example of crown glass also has Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2System lead-free glass.
The example of low-melting point sealing glass can also be the mentioned seal glass of following document: Bai Jinwei, " low-melting sealing glass is formed and development ", material Leader, 2002, the 16 the 12nd phases of volume, 43-46; Shi Chengli, " latest developments that low-melting sealing glass is unleaded and development trend thereof ", building glass and industrial glass, 2007, the 2 phases, 27-30; Guo Hongwei etc., " progress of low-melting sealing glass ", material Leader, 2005, the 19 volume special edition V, 283-285.
In a kind of preferred embodiment, B
2O
3-BaO-ZnO-SiO
2Be that glass preferred ingredients proportioning is: 15%～40% B
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.The inorganic base proportioning of preferred second transparent dielectric layer 205 also is the said components proportioning as first transparent dielectric layer 202.
Carrier is made up of solvent and resin, and vector contg accounts for 20%～45% of transparent dielectric material total weight by weight.
As solvent, mainly contain alcohols such as α (β, γ)-terpenes such as terpinol, ethylene glycol one alkyl (dialkyl group) ethers, diethylene glycol one alkyl (dialkyl group) ethers, ethylene glycol one alkyl (dialkyl group) ether diacetate esters class, diethylene glycol one alkyl (dialkyl group) ether diacetate esters class, propylene glycol one alkyl (dialkyl group) ethers, propylene glycol one alkyl (dialkyl group) ether diacetate esters class, dibutyl phthalate, methyl alcohol, ethanol, isopropyl alcohol, 1-butanols.These can distinguish use separately, also can mix two or more uses.
As resin, mainly containing fibers such as NC Nitroncellulose, ethyl cellulose, hydroxyethylcellulose is resin, acrylic resins such as butyl polyacrylate, poly-methyl acrylate, acrylic acid series condensate, polyvinyl alcohol, polyvinyl butyral resin etc.These can be used alone, but also also mix together respectively.
The manufacture method of silver electrode 203 is being known in the art, and for example, can adopt following method to carry out.Utilize silk screen print method on glass substrate 201, to make one deck photosensitive silver electrode layer, the photosensitive silver electrode layer was carried out drying 10～15 minutes in 80～200 degree celsius temperature scopes, the exposure ultraviolet ray is vertically exposed to the photosensitive silver electrode layer by the exposure mother matrix of producing in advance that has required silver electrode pattern, and exposure is at 400～500mj/cm
2In the scope, unwanted part photosensitive silver electrode layer is removed in development to the silver electrode after the exposure, thereby obtains required silver electrode pattern, and developer solution is 0.3%～0.5% NaCO
3, the glass substrate 201 that has silver electrode 203 figures that development is finished is finished the making of silver electrode 203 behind the sintering curing in 550～570 degrees centigrade of scopes.
In order to simplify description, outstanding inventive point of the present invention no longer is described in detail for other parts in the PDP substrate, element, circuit etc. and manufacture process thereof.
In a kind of preferred embodiment, the method for making front panel of plasma display comprises the steps:
1. at first on soda-lime glass substrate 201, apply the transparent dielectric paste that a layer thickness is 4 μ m～10 μ m with methods such as printing, coatings;
2. the soda-lime glass substrate 201 that will have above-mentioned slurry carries out drying in 150～200 ℃ of temperature ranges;
3. with dried soda-lime glass substrate 201 sintering in 500 ℃～550 ℃ temperature ranges, make first transparent dielectric layer 202;
4. on first transparent dielectric layer 202 of the soda-lime glass substrate 201 behind the sintering, make silver electrode 203.
5. on the silver electrode 203 and first transparent dielectric layer 202, apply the above-mentioned slurry that a layer thickness is 25 μ m～35 μ m with methods such as printing, coatings;
6. the soda-lime glass substrate 201 that will have above-mentioned slurry carries out drying in 150～200 ℃ of temperature ranges;
7. with dried soda-lime glass substrate 201 sintering in 500 ℃～550 ℃ temperature ranges, to make second transparent dielectric layer 205;
8. finish evaporation or sputter magnesium oxide diaphragm 206 on second transparent medium of sintering for the second time;
The present invention makes a layer thickness on soda-lime glass substrate 201 be 4 to 10 microns transparent dielectric paste, thickness 1 to the 6 μ m of first transparent dielectric layer 202 behind the sintering.This dielectric layer not only can prevent the aetiolation that the silver diffusion brings, and can reduce the bubble that produces with electrode reaction.
Embodiment
Embodiment 1
1. at first on soda-lime glass substrate 201, apply the transparent dielectric paste that a layer thickness is 10 μ m with painting method; Glass dust set of dispense ratio as inorganic base in the slurry is B
2O
3Content 30%, ZnO content 31%, SiO
2Content 18%, BaO content 20.2%, CuO content 0.8%, solvent terpinol content 32%, resin ethyl cellulose cellulose content 1.3% in the slurry;
2. the soda-lime glass substrate 201 that will have above-mentioned slurry carries out drying at 150 ℃;
With dried soda-lime glass substrate 201 at 550 ℃ of sintering, make first transparent dielectric layer 202;
4. on first transparent dielectric layer 202 behind the sintering, make silver electrode 203;
5. on the silver electrode 203 and first transparent dielectric layer 202, apply the above-mentioned slurry that a layer thickness is 35 μ m with methods such as printing, coatings; In the slurry as the B of the glass dust set of dispense ratio of inorganic base
2O
3Content 30%, ZnO content 31%, SiO
2Content 18%, BaO content 20.2%, CuO content 0.8%, solvent terpinol content 32%, resin ethyl cellulose cellulose content 1.3% in the slurry;
6. the soda-lime glass substrate 201 that will have above-mentioned slurry carries out drying at 150 ℃;
With dried soda-lime glass substrate 201 at 550 ℃ of sintering, to make second transparent dielectric layer 205;
8. finish evaporation magnesium oxide diaphragm 206 on second transparent dielectric layer 205 of sintering for the second time.
Embodiment 2 to 7
The step of embodiment 2 to 7 is identical with embodiment 1, only carries out according to the actual conditions shown in the table 1.
Table 1 embodiments of the invention
Comparative Examples
Comparative Examples 1: do not have the front panel of transparent dielectric layer between soda-lime glass substrate and silver electrode, promptly Comparative Examples 1 adopts and directly makes silver electrode on the soda-lime glass substrate.
Comparative Examples 2: be provided with transparent dielectric layer between soda-lime glass substrate and silver electrode, transparent dielectric layer does not contain CuO, and other composition is identical with embodiment 1.
Comparative Examples 3: use soda-lime glass substrate and AP5655 transparent medium.
Performance relatively
Utilize the transmitance of measurement of ultraviolet-visible spectrophotometer transparent dielectric layer between visible region, make comparisons with wavelength 550nm green-yellow light transmitance numerical value.Usually requiring transmitance is being good more than 80%.
Use the color color difference meter to measure the b value of expression dielectric layer degree of staining.Deducting the numerical value that obtains after the b of Ag electrode and glass substrate from total b value is the dielectric layer yellowness.If the b value is lower than 1.5, do not observe the yellowing phenomenon substantially, so the b value is lower than 1.5 for good.
Number of bubbles is observed the number of bubbles of finding greater than 20 μ m with the magnifying glass of 30 times of enlargement ratios in 5cm * 5cm scope.
The performance of table 2 embodiment of the invention and Comparative Examples relatively.
By the data shown in the table 2 as can be seen, glass substrate of the present invention is being better than Comparative Examples aspect yellowness, transmitance, the number of bubbles three.
Claims (15)
1. a front panel of plasma display (200) is characterized in that, comprising:
Glass substrate (201);
First transparent dielectric layer (202) is arranged on the described glass substrate (201);
Silver electrode (203) is arranged on described first transparent dielectric layer (202);
Second transparent dielectric layer (205) is arranged at described glass substrate (201) and goes up and cover described silver electrode (203).
2. front panel of plasma display according to claim 1 is characterized in that, the inorganic base that constitutes described first transparent dielectric layer (202) and described alternatively second transparent dielectric layer (205) contains 0.05%～1% CuO by weight.
3. front panel of plasma display according to claim 2 is characterized in that, described inorganic base is a glass, preferred seal glass, more preferably low-melting point sealing glass, most preferably crown glass.
4. according to each described front panel of plasma display of claim 2 to 3, it is characterized in that described inorganic base is selected from following at least a glass:
PbO-B
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3System, Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na or K in system; R ' is Ba or Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5, B
2O
3-ZnO-V
2O
5System, SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5System, Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2Be glass.
5. according to each described front panel of plasma display of claim 2 to 3, it is characterized in that described inorganic base contains 15%～40% B by weight
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.
6. according to each described front panel of plasma display of claim 1 to 3, it is characterized in that described glass substrate (201) is the soda-lime glass substrate.
7. according to each described front panel of plasma display of claim 1 to 3, it is characterized in that, further comprise:
Diaphragm (206) is arranged on described second transparent dielectric layer (205).
8. according to each described front panel of plasma display of claim 1 to 3, it is characterized in that the thickness of described first transparent dielectric layer (202) is 1 μ m～6 μ m.
9. a plasma display is characterized in that, comprises each described front panel of plasma display (200) of claim 1 to 8.
10. a method of making front panel of plasma display (200) is characterized in that described method comprises the steps:
A) go up making first transparent dielectric layer (202) with transparent dielectric material at glass substrate (201);
B) on described first transparent dielectric layer (202), produce silver electrode (203);
C) go up making second transparent dielectric layer (205) to cover described silver electrode (203) at described glass substrate (201).
11. method according to claim 10 is characterized in that, the method for making described first transparent dielectric layer (202) and described alternatively second transparent dielectric layer (205) may further comprise the steps:
A1) on described glass substrate (201), apply described transparent dielectric material;
A2) the described glass substrate (201) that will have described transparent dielectric material layer carries out drying;
A3) dried described transparent dielectric material layer is carried out sintering.
12. method according to claim 10 is characterized in that, the inorganic base in the described transparent dielectric material contains 0.05%～1% CuO by weight.
13. method according to claim 12 is characterized in that, described inorganic base is a glass, preferred seal glass, more preferably low-melting point sealing glass, most preferably crown glass.
14., it is characterized in that described inorganic base is selected from following at least a: PbO-B according to each described method of claim 11 to 13
2O
3-SiO
2System, PbO-ZnO-B
2O
3System, PbO-B
2O
3-SiO
2-ZnO system, P
2O
5-PbO-V
2O
5-Sb
2O
3System, Na
2O-CaO-P
2O
5System, Na
2O-BaO-P
2O
5System, Na
2O-Al
2O
3-P
2O
5System, Li
2O-BaO-P
2O
5System, SnO-P
2O
5System, ZnO-P
2O
5System, RO-R ' O-P
2O
5(R is Li, Na or K in system; R ' is Ba or Ca), SnO-B
2O
3-P
2O
5System, SnO-ZnO-P
2O
5, B
2O
3-ZnO-V
2O
5System, SiO
2-AlO-RO system, ZnO-B
2O
3-SiO
2System, SiO
2-B
2O
3-Al
2O
3-Li
2O system, B
2O
3-ZnO-V
2O
5System, SiO
2-B
2O
3-Al
2O
3-Li
2O-P
2O
5System, B
2O
3-ZnO-BaO-SrO-V
2O
5System, Bi
2O
3-B
2O
3-BaO system, B
2O
3-BaO-ZnO, Bi
2O
3-B
2O
3-BaO-ZnO system, B
2O
3-BaO-ZnO-SiO
2Be glass.
15., it is characterized in that described inorganic base contains 15%～40% B by weight according to each described method of claim 11 to 13
2O
3, 30%～55% ZnO, 3%～20% SiO
2, 5%～25% BaO, 0.05%～1% CuO.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008101132002A CN101593653A (en) | 2008-05-27 | 2008-05-27 | A kind of front panel of plasma display and manufacture method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2008101132002A CN101593653A (en) | 2008-05-27 | 2008-05-27 | A kind of front panel of plasma display and manufacture method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101593653A true CN101593653A (en) | 2009-12-02 |
Family
ID=41408245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008101132002A Pending CN101593653A (en) | 2008-05-27 | 2008-05-27 | A kind of front panel of plasma display and manufacture method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101593653A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102097267A (en) * | 2010-12-21 | 2011-06-15 | 四川虹欧显示器件有限公司 | Method for manufacturing front panel of plasma display screen |
| CN102667963A (en) * | 2009-12-18 | 2012-09-12 | 欧丽安株式会社 | Dielectric composition for a plasma display panel |
| CN105693094A (en) * | 2016-03-24 | 2016-06-22 | 福建省南平市三金电子有限公司 | Preburning low-melting-point sealing glass sheet and preparation method thereof |
-
2008
- 2008-05-27 CN CNA2008101132002A patent/CN101593653A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102667963A (en) * | 2009-12-18 | 2012-09-12 | 欧丽安株式会社 | Dielectric composition for a plasma display panel |
| CN102097267A (en) * | 2010-12-21 | 2011-06-15 | 四川虹欧显示器件有限公司 | Method for manufacturing front panel of plasma display screen |
| CN102097267B (en) * | 2010-12-21 | 2012-11-14 | 四川虹欧显示器件有限公司 | Method for manufacturing front panel of plasma display screen |
| CN105693094A (en) * | 2016-03-24 | 2016-06-22 | 福建省南平市三金电子有限公司 | Preburning low-melting-point sealing glass sheet and preparation method thereof |
| CN105693094B (en) * | 2016-03-24 | 2019-06-14 | 福建省南平市三金电子有限公司 | A kind of pre-burning low-melting sealing glass piece and preparation method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1878710A1 (en) | Glass composition for electrode coating and glass paste containing same | |
| KR100941907B1 (en) | Lead-free glass, glass powder of electrode coating, and plasma display | |
| EP1884500A1 (en) | Plasma display panel and method for manufacturing same | |
| CN101774766A (en) | Acid-resistance lead-free glass dust for media | |
| JP2006193385A (en) | Glass for coating electrode and front and back substrates of plasma display panel | |
| US6497962B1 (en) | Low melting point glass for covering electrodes, and plasma display device | |
| US5948537A (en) | Substrate for a plasma display panel and low melting point glass composition | |
| CN101593653A (en) | A kind of front panel of plasma display and manufacture method thereof | |
| KR20020034925A (en) | Glass for covering electrodes and plasma display panel | |
| JP2007217271A (en) | Glass for covering electrode and plasma display device | |
| CN102082056B (en) | Dielectric glass powder for plasma display panel | |
| CN101593654A (en) | A kind of front panel of plasma display and manufacture method thereof | |
| CN102044396B (en) | Barrier size used for plasma display and barrier made of same | |
| JP2011006322A (en) | Plasma display panel and method of producing the same | |
| KR20080044771A (en) | Dielectric powder for display device | |
| JP2005314201A (en) | Non-lead glass, glass powder for covering electrode and plasma display device | |
| JP4380589B2 (en) | Low melting point glass for electrode coating and plasma display device | |
| CN100506729C (en) | Non-lead glass, glass powder for covering electrodes and plasma display device | |
| JP4282885B2 (en) | Low melting point glass for electrode coating and plasma display device | |
| JP4075298B2 (en) | Low melting point glass for electrode coating | |
| KR20080024086A (en) | Glass powder for covering electrode of display device | |
| KR100496404B1 (en) | Glass composition for coating electrode and glass forming coating meterial for coating electrode, and plasma display panel using the same and production method thereof | |
| CN101681762B (en) | Plasma display panel | |
| JP4958078B2 (en) | A material for a plasma display panel, a method for producing a rear glass substrate for a plasma display panel, and a rear glass substrate for a plasma display panel produced by the method. | |
| CN102265372A (en) | Plasma display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Open date: 20091202 |