CN101593647A - A kind of mother matrix synthesizes contraposition technology - Google Patents
A kind of mother matrix synthesizes contraposition technology Download PDFInfo
- Publication number
- CN101593647A CN101593647A CNA2009100230996A CN200910023099A CN101593647A CN 101593647 A CN101593647 A CN 101593647A CN A2009100230996 A CNA2009100230996 A CN A2009100230996A CN 200910023099 A CN200910023099 A CN 200910023099A CN 101593647 A CN101593647 A CN 101593647A
- Authority
- CN
- China
- Prior art keywords
- film
- mother matrix
- contraposition
- versions
- large aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to colorful visualization pipe manufacturer field, be specifically related to the synthetic contraposition technology of a kind of mother matrix.In the prior art, want to produce the new mother matrix of forming new figure by a plurality of former mother matrix figure repeated arrangement, on laser plotter, carry out, make new mother matrix cost height.The present invention includes following operating procedure: utilize the former master copy in large aperture to go out a plurality of first film versions; The no part of each first film version is cut; With the splicing of first film version after a plurality of the cutting, fixing; Utilize splicing to fix first film version copy large aperture mother matrix again.Utilize the former master copy in small-bore to go out a plurality of second film versions, the no part of each second film version is cut; Be benchmark with the large aperture mother matrix again, to second film version after cutting and the accurate contraposition of large aperture mother matrix; A plurality of second film versions are fixed; Second film version of utilizing contraposition to fix at last copies out the small-bore mother matrix; It is low that the present invention makes the mother matrix cost, and the mother matrix contraposition of large and small aperture is accurate.
Description
One, technical field
The present invention relates to colorful visualization pipe manufacturer field, be specifically related to the synthetic contraposition technology of a kind of mother matrix.
Two, background technology
In the color picture tube manufacturing, the production of half tone will use working version that steel band is carried out double-sided exposure, two-sided corrosion.The relative position of figure must precisely be guaranteed on the working version on steel band two sides so, and therefore the figure on the working version of large and small aperture has contraposition exactly, could guarantee that like this half tone of producing can satisfy instructions for use.And working version is by the master copy manufacturing, so require the figure on the mother matrix of large and small aperture that contraposition is exactly arranged.On the other hand, because the dimensional requirement of figure is very high on the mother matrix, manufactures new mother matrix and need carry out on the high-precision laser plotter of special use, the expense of therefore drawing mother matrix is also very high.In the prior art, wanting to produce the new mother matrix of being made of new figure a plurality of former mother matrix figure repeated arrangement, is to carry out on high-precision laser plotter, and the cost that causes making new mother matrix is very high.
Three, summary of the invention:
The invention provides the synthetic contraposition technology of a kind of mother matrix cheaply, paint the high shortcoming of mother matrix expense to overcome light.
In order to reach above-mentioned technical purpose, the technical solution used in the present invention is:
A kind of mother matrix synthesizes contraposition technology, comprises following operating procedure:
(1) the large aperture mother matrix of synthetic required figure:
(1) utilize the former master copy in large aperture to go out a plurality of first film versions; The figure that forms on first film version that copies out is identical with figure on the former mother matrix in large aperture;
(2) according to the requirement of synthetic mother matrix figure, the no part of each first film version is cut;
(3) first film version after a plurality of the cutting is spliced according to designing requirement;
(4) will splice good a plurality of first film versions fixes;
(5) a plurality of first film version copies large aperture mother matrix that utilizes splicing to fix again; The figure that forms on the large aperture mother matrix that copies out is identical with figure on a plurality of first film versions of fixing of splicing;
(2) the small-bore mother matrix of synthetic required figure:
(6) utilize the former master copy in small-bore to go out a plurality of second film versions; The figure that forms on second film version that copies out is identical with figure on the former mother matrix in small-bore;
(7) according to the requirement of synthetic mother matrix figure, the no part of each second film version is cut;
(8) at microscopically, the large aperture mother matrix that makes with step (5) is a benchmark, and second film version and large aperture mother matrix after a plurality of the cutting are carried out accurate contraposition;
(9) contraposition is good a plurality of second film versions are fixed;
(10) a plurality of second film versions of utilizing contraposition to fix at last copy out the small-bore mother matrix; It is identical with figure on a plurality of second film versions that contraposition fixes to copy out the figure that forms on the mother matrix of small-bore;
Utilize the former master copy in large aperture to go out a plurality of first film versions in the above-mentioned steps (1); Its copy condition is: in the partial vacuum time of bleeding is 20S～50S, and the vacuum time of bleeding is to be that the mask and the film are combined closely and exposed with the former mother matrix in large aperture under the condition of 50S～100S, and the luminous flux of exposure is 65lm～120lm; Utilizing working temperature again is 25 ℃～38 ℃ developer solution, and the film after the exposure is developed, and makes identical on the figure that forms on the film and the former mother matrix in large aperture; The fixing solution that re-uses 25 ℃～38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution were dried 35 seconds～40 seconds under 37 ℃～43 ℃ condition again; Just form first film version on the film with the identical figure of the former mother matrix in large aperture; The time of wherein, development, photographic fixing, washing respectively is 35 seconds～40 seconds.
Utilize the former master copy in small-bore to go out a plurality of second film versions in the above-mentioned steps (6); Its copy condition is: in the partial vacuum time of bleeding is 20S～50S, and the vacuum time of bleeding is to be that the mask and the film are combined closely and exposed with the former mother matrix in small-bore under the condition of 50S～100S, and the luminous flux of exposure is 65lm～120lm; Utilizing working temperature again is 25 ℃～38 ℃ developer solution, and the film after the exposure is developed, and makes identical on the figure that forms on the film and the former mother matrix in small-bore; The fixing solution that re-uses 25 ℃～38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution were dried 35 seconds～40 seconds under 37 ℃～43 ℃ condition again; Just form second film version on the film with the identical figure of the former mother matrix in small-bore; The time of wherein, development, photographic fixing, washing respectively is 35 seconds～40 seconds.
In the above-mentioned steps (5), a plurality of first film versions of utilizing splicing to fix copy out the large aperture mother matrix: a plurality of first film versions and the glass dry plate cleaning surfaces that earlier splicing are fixed before the copy are clean, utilize the exposure machine vacuum-pumping system with the condition of vacuum degree for (680～760) * 133.3pa, a plurality of first film versions and glass dry plate that splicing is fixed carried out vacuum suction 8～12 minutes; Be the condition of 1.8lx～2.0lx again with the exposure illumination, a plurality of first film versions that fix with splicing are the exposure that mask carries out 15S～60S, utilizing working temperature is that 19 ℃～21 ℃ developer solution carries out developing in 2～4 minutes to the glass dry plate, makes to form on the glass dry plate and splice the identical figure of first film version that fixes; The last working temperature of utilizing again is that 19 ℃～21 ℃ fixing solution carries out photographic fixing in 2 minutes～4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate; Through above-mentioned steps, just formed the large aperture mother matrix of the identical figure of a plurality of first film versions that fixes with splicing on the glass dry plate.
In the above-mentioned steps (10), a plurality of second film versions of utilizing contraposition to fix copy out the small-bore mother matrix: a plurality of second film versions and the glass dry plate cleaning surfaces that earlier contraposition are fixed before the copy are clean, utilize the exposure machine vacuum-pumping system with the condition of vacuum degree for (680～760) * 133.3pa, a plurality of second film versions and glass dry plate that contraposition is fixed carried out vacuum suction 8～12 minutes; Be the condition of 1.8lx～2.0lx again with the exposure illumination, a plurality of second film versions that fix with contraposition are the exposure that mask carries out 15S～60S, utilizing working temperature is that 19 ℃～21 ℃ developer solution carries out developing in 2～4 minutes to the glass dry plate, makes and forms the identical figure of second film version that fixes with contraposition on the glass dry plate; The last working temperature of utilizing again is that 19 ℃～21 ℃ fixing solution carries out photographic fixing in 2 minutes～4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate; Through above-mentioned steps, just formed the small-bore mother matrix of the identical figure of a plurality of second film versions that fixes with contraposition on the glass dry plate.
Advantage of the present invention is:
1. reduced the manufacturing cost of mother matrix: utilize mother matrix synthesis technique provided by the invention, on the basis of former mother matrix figure, utilize a plurality of film versions that copy out former mother matrix figure, a plurality of film versions are arranged splicing, make the new mother matrix of forming new figure by a plurality of former mother matrix figure repeated arrangement; Avoided using the high expense of the new mother matrix of laser plotter manufacturing.
2. will produce the new mother matrix of being made of new figure a plurality of former mother matrix figure repeated arrangement, must guarantee has contraposition very accurately between the figure of the new mother matrix in large and small aperture.And the present invention utilizes method simple, that implement easily to make the figure of large and small aperture mother matrix obtain contraposition accurately in the mother matrix synthesis technique, makes the new mother matrix that finally synthesizes satisfy instructions for use.
Four, embodiment:
The present invention will be further described in detail below in conjunction with embodiment:
Embodiment 1:
A kind of mother matrix synthesizes contraposition technology, comprises following operating procedure:
(1) the large aperture mother matrix of synthetic required figure:
(1) utilize the former master copy in large aperture to go out a plurality of first film versions, the figure that forms on first film version that copies out is identical with figure on the former mother matrix in large aperture; Its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, and the partial vacuum 20S that bleeds, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 50S with the former mother matrix in large aperture, the luminous flux of exposure is 65lm; Re-use developing machine, utilizing working temperature is 25 ℃ developer solution, and the film after the exposure is developed, and makes identical on the figure that forms on the film and the former mother matrix in large aperture; The fixing solution that re-uses 38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution are dried 38S again under 40 ℃ condition; Just form first film version on the film with the identical figure of the former mother matrix in large aperture; The time of wherein, development, photographic fixing, washing respectively is 38S.Make first film version a plurality of and the identical figure of the former mother matrix in large aperture by above step;
(2) according to the requirement of synthetic mother matrix figure, the no part of each first film version is cut;
(3) first film version after a plurality of the cutting is spliced on the sheet base according to designing requirement;
(4) will splice good a plurality of first film versions fixes: push down a plurality of first film versions that splicing is finished with pouring weight, the blended rubber band is pasted and fixed on a plurality of first film versions on the sheet base;
(5) a plurality of first film versions of utilizing splicing to fix again copy out the large aperture mother matrix of required figure: a plurality of first film versions and the glass dry plate cleaning surfaces that earlier splicing are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 680 * 133.3pa with vacuum degree, and a plurality of first film versions and glass dry plate that splicing is fixed carried out vacuum suction 12 minutes.Be the condition of 1.9lx again with the exposure illumination, a plurality of first film versions that fix with splicing are the exposure that mask carries out 15S, utilizing working temperature is that 20 ℃ developer solution carries out developing in 3 minutes to the glass dry plate, makes to form on the glass dry plate and splice the identical figure of first film version that fixes.The last working temperature of utilizing again is that 21 ℃ fixing solution carries out photographic fixing in 3 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, just form the large aperture mother matrix of the identical figure of a plurality of first film versions that fixes with splicing on the glass dry plate;
(2) the small-bore mother matrix of synthetic required figure:
(6) utilize the former master copy in small-bore to go out a plurality of second film versions, its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, 20S bleeds in the partial vacuum, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 50S with the former mother matrix in small-bore, and the luminous flux of exposure is 65lm; Re-use developing machine, utilizing working temperature is 38 ℃ developer solution, and the film after the exposure is developed, and makes on the film to form and the identical figure of the former mother matrix in small-bore; The fixing solution that re-uses 38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed developer solution above the flush away and fixing solution.Under 40 ℃ condition, dry 35S again; Just form second film version on the film with the identical figure of the former mother matrix in small-bore; The time of wherein, development, photographic fixing, washing respectively is 38S.Make second film version a plurality of and the identical figure of the former mother matrix in small-bore by above step;
(7) according to the requirement of synthetic mother matrix figure, the no part of each second film version is cut;
(8) at microscopically, the large aperture mother matrix that makes with step (5) is a benchmark, and second film version after a plurality of the cutting is carried out accurate contraposition at microscopically and large aperture mother matrix;
(9) a plurality of second film versions that contraposition is good are attached on the sheet base with double faced adhesive tape and fix;
(10) a plurality of second film versions of utilizing contraposition to fix at last copy out the small-bore mother matrix of required figure: a plurality of second film versions and the glass dry plate cleaning surfaces that earlier contraposition are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 680 * 133.3pa with vacuum degree, and a plurality of second film versions and glass dry plate that contraposition is fixed carried out vacuum suction 10 minutes; Be the condition of 1.9lx again with the exposure illumination, a plurality of second film versions that fix with contraposition are the exposure that mask carries out 60S, utilizing working temperature is that 20 ℃ developer solution carries out developing in 3 minutes to the glass dry plate, makes and forms the identical figure of second film version that fixes with contraposition on the glass dry plate; The last working temperature of utilizing again is that 20 ℃ fixing solution carries out photographic fixing in 3 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, the glass dry plate just forms the small-bore mother matrix of the identical figure of a plurality of second film versions that fixes with contraposition.
Embodiment 2:
A kind of mother matrix synthesizes contraposition technology, comprises following operating procedure:
(1) the large aperture mother matrix of synthetic required figure:
(1) utilize the former master copy in large aperture to go out a plurality of first film versions; Its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, and the partial vacuum 30S that bleeds, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 75S with the former mother matrix in large aperture, the luminous flux of exposure is 90lm; Re-use developing machine, utilizing working temperature is 36 ℃ developer solution, and the film after the exposure is developed, and makes on the film to form and the identical figure of the former mother matrix in large aperture; The fixing solution that re-uses 36 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution are dried 40S again under 43 ℃ condition; Just form first film version on the film with the identical figure of the former mother matrix in large aperture; The time of wherein, development, photographic fixing, washing respectively is 40S.Make first film version a plurality of and the identical figure of the former mother matrix in large aperture by above step;
(2) according to the requirement of synthetic mother matrix figure, the no part of each first film version is cut;
(3) first film version after a plurality of the cutting is spliced on the sheet base according to designing requirement;
(4) will splice good film version fixes: push down a plurality of first film versions that splicing is finished with pouring weight, the blended rubber band is pasted and fixed on a plurality of first film versions on the sheet base;
(5) a plurality of first film versions of utilizing splicing to fix again copy out the large aperture mother matrix of required figure: a plurality of first film versions and the glass dry plate cleaning surfaces that earlier splicing are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 760 * 133.3pa with vacuum degree, and a plurality of first film versions and glass dry plate that splicing is fixed carried out vacuum suction 9 minutes.Be the condition of 2.0lx again with the exposure illumination, a plurality of first film versions that fix with splicing are the exposure that mask carries out 25S, utilizing working temperature is that 19 ℃ developer solution carries out developing in 2 minutes to the glass dry plate, makes to form on the glass dry plate and splice the identical figure of first film version that fixes.The last working temperature of utilizing again is that 19 ℃ fixing solution carries out photographic fixing in 4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, just form the large aperture mother matrix of the identical figure of a plurality of first film versions that fixes with splicing on the glass dry plate;
(2) the small-bore mother matrix of synthetic required figure:
(6) utilize the former master copy in small-bore to go out a plurality of second film versions, its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, 30S bleeds in the partial vacuum, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 80S with the former mother matrix in small-bore, and the luminous flux of exposure is 90lm; Re-use developing machine, utilizing working temperature is 25 ℃ developer solution, and the film after the exposure is developed, and makes on the film to form and the identical figure of the former mother matrix in small-bore; The fixing solution that re-uses 25 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed developer solution above the flush away and fixing solution.Under 43 ℃ condition, dry 39S again; Just form second film version on the film with the identical figure of the former mother matrix in small-bore; The time of wherein, development, photographic fixing, washing respectively is 40S.Make second film version a plurality of and the identical figure of the former mother matrix in small-bore by above step;
(7) according to the requirement of synthetic mother matrix figure, the no part of each second film version is cut;
(8) at microscopically, the large aperture mother matrix that makes with step (5) is a benchmark, and second film version after a plurality of the cutting is carried out accurate contraposition at microscopically and large aperture mother matrix;
(9) a plurality of second film versions that contraposition is good are attached on the sheet base with double faced adhesive tape and fix;
(10) a plurality of second film versions of utilizing contraposition to fix at last copy out the small-bore mother matrix of required figure: a plurality of second film versions and the glass dry plate cleaning surfaces that earlier contraposition are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 700 * 133.3pa with vacuum degree, and a plurality of second film versions and glass dry plate that contraposition is fixed carried out vacuum suction 8 minutes; Be the condition of 2.0lx again with the exposure illumination, a plurality of second film versions that fix with contraposition are the exposure that mask carries out 15S, utilizing working temperature is that 19 ℃ developer solution carries out developing in 4 minutes to the glass dry plate, makes and forms the identical figure of second film version that fixes with contraposition on the glass dry plate; The last working temperature of utilizing again is that 21 ℃ fixing solution carries out photographic fixing in 2 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, the glass dry plate just forms the small-bore mother matrix of the identical figure of a plurality of second film versions that fixes with contraposition.
Embodiment 3:
A kind of mother matrix synthesizes contraposition technology, comprises following operating procedure:
(1) the large aperture mother matrix of synthetic required figure:
(1) utilize the former master copy in large aperture to go out a plurality of first film versions; Its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, and the partial vacuum 50S that bleeds, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 100S with the former mother matrix in large aperture, the luminous flux of exposure is 120lm; Re-use developing machine, utilizing working temperature is 38 ℃ developer solution, and the film after the exposure is developed, and makes on the film to form and the identical figure of the former mother matrix in large aperture; The fixing solution that re-uses 25 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution are dried 35S again under 37 ℃ condition; Just form first film version on the film with the identical figure of the former mother matrix in large aperture; The time of development, photographic fixing, washing respectively is 35S.Make first film version a plurality of and the identical figure of the former mother matrix in large aperture by above step;
(2) according to the requirement of synthetic mother matrix figure, the no part of each first film version is cut;
(3) first film version after a plurality of the cutting is spliced on the sheet base according to designing requirement;
(4) will splice good film version fixes: push down a plurality of first film versions that splicing is finished with pouring weight, the blended rubber band is pasted and fixed on a plurality of first film versions on the sheet base;
(5) a plurality of first film versions of utilizing splicing to fix again copy out the large aperture mother matrix of required figure: a plurality of first film versions and the glass dry plate cleaning surfaces that earlier splicing are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 720 * 133.3pa with vacuum degree, and a plurality of first film versions and glass dry plate that splicing is fixed carried out vacuum suction 8 minutes.Be the condition of 1.8lx again with the exposure illumination, a plurality of first film versions that fix with splicing are the exposure that mask carries out 60S, utilizing working temperature is that 21 ℃ developer solution carries out developing in 4 minutes to the glass dry plate, makes to form on the glass dry plate and splice the identical figure of first film version that fixes.The last working temperature of utilizing again is that 20 ℃ fixing solution carries out photographic fixing in 2 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, just form the large aperture mother matrix of the identical figure of a plurality of first film versions that fixes with splicing on the glass dry plate;
(2) the small-bore mother matrix of synthetic required figure:
(6) utilize the former master copy in small-bore to go out a plurality of second film versions, its copy condition is: utilize exposure machine pumped vacuum systems vacuum suction, 50S bleeds in the partial vacuum, it is that the mask and the film are combined closely and exposed that vacuum is bled under the condition of 100S with the former mother matrix in small-bore, and the luminous flux of exposure is 120lm; Re-use developing machine, utilizing working temperature is 35 ℃ developer solution, and the film after the exposure is developed, and makes on the film to form and the identical figure of the former mother matrix in small-bore; The fixing solution that re-uses 36 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed developer solution above the flush away and fixing solution.Under 37 ℃ condition, dry 40S again; Just form second film version on the film with the identical figure of the former mother matrix in small-bore; The time of wherein, development, photographic fixing, washing respectively is 35S.Make second film version a plurality of and the identical figure of the former mother matrix in small-bore by above step;
(7) according to the requirement of synthetic mother matrix figure, the no part of each second film version is cut;
(8) at microscopically, the large aperture mother matrix that makes with step (5) is a benchmark, and second film version after a plurality of the cutting is carried out accurate contraposition at microscopically and large aperture mother matrix;
(9) a plurality of second film versions that contraposition is good are attached on the sheet base with double faced adhesive tape and fix;
(10) a plurality of second film versions of utilizing contraposition to fix at last copy out the small-bore mother matrix of required figure: a plurality of second film versions and the glass dry plate cleaning surfaces that earlier contraposition are fixed before the copy are clean, utilizing the exposure machine vacuum-pumping system is the condition of 760 * 133.3pa with vacuum degree, and a plurality of second film versions and glass dry plate that contraposition is fixed carried out vacuum suction 12 minutes; Be the condition of 1.8lx again with the exposure illumination, a plurality of second film versions that fix with contraposition are the exposure that mask carries out 30S, utilizing working temperature is that 21 ℃ developer solution carries out developing in 2 minutes to the glass dry plate, makes and forms the identical figure of second film version that fixes with contraposition on the glass dry plate; The last working temperature of utilizing again is that 19 ℃ fixing solution carries out photographic fixing in 4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate.Through above-mentioned steps, the glass dry plate just forms the small-bore mother matrix of the identical figure of a plurality of second film versions that fixes with contraposition.
Claims (5)
1. the synthetic contraposition technology of mother matrix is characterized in that: comprise following operating procedure
(1) the large aperture mother matrix of synthetic required figure:
(1) utilize the former master copy in large aperture to go out a plurality of first film versions; The figure that forms on first film version that copies out is identical with figure on the former mother matrix in large aperture;
(2) according to the requirement of synthetic mother matrix figure, the no part of each first film version is cut;
(3) first film version after a plurality of the cutting is spliced according to designing requirement;
(4) will splice good a plurality of first film versions fixes;
(5) a plurality of first film version copies large aperture mother matrix that utilizes splicing to fix again; The figure that forms on the large aperture mother matrix that copies out is identical with figure on a plurality of first film versions of fixing of splicing;
(2) the small-bore mother matrix of synthetic required figure:
(6) utilize the former master copy in small-bore to go out a plurality of second film versions; The figure that forms on second film version that copies out is identical with figure on the former mother matrix in small-bore;
(7) according to the requirement of synthetic mother matrix figure, the no part of each second film version is cut;
(8) at microscopically, the large aperture mother matrix that makes with step (5) is a benchmark, and second film version and large aperture mother matrix after a plurality of the cutting are carried out accurate contraposition;
(9) contraposition is good a plurality of second film versions are fixed;
(10) a plurality of second film versions of utilizing contraposition to fix at last copy out the small-bore mother matrix; It is identical with figure on a plurality of second film versions that contraposition fixes to copy out the figure that forms on the mother matrix of small-bore;
2. a kind of mother matrix according to claim 1 synthesizes contraposition technology, it is characterized in that: utilize the former master copy in large aperture to go out a plurality of first film versions in the step (1); Its copy condition is: in the partial vacuum time of bleeding is 20S～50S, and the vacuum time of bleeding is to be that the mask and the film are combined closely and exposed with the former mother matrix in large aperture under the condition of 50S～100S, and the luminous flux of exposure is 65lm～120lm; Utilizing working temperature again is 25 ℃～38 ℃ developer solution, and the film after the exposure is developed, and makes identical on the figure that forms on the film and the former mother matrix in large aperture; The fixing solution that re-uses 25 ℃～38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution were dried 35 seconds～40 seconds under 37 ℃～43 ℃ condition again; Just form first film version on the film with the identical figure of the former mother matrix in large aperture; The time of wherein, development, photographic fixing, washing respectively is 35 seconds～40 seconds.
3. a kind of mother matrix according to claim 1 synthesizes contraposition technology, it is characterized in that: utilize the former master copy in small-bore to go out a plurality of second film versions in the step (6); Its copy condition is: in the partial vacuum time of bleeding is 20S～50S, and the vacuum time of bleeding is to be that the mask and the film are combined closely and exposed with the former mother matrix in small-bore under the condition of 50S～100S, and the luminous flux of exposure is 65lm～120lm; Utilizing working temperature again is 25 ℃～38 ℃ developer solution, and the film after the exposure is developed, and makes identical on the figure that forms on the film and the former mother matrix in small-bore; The fixing solution that re-uses 25 ℃～38 ℃ makes the in white and black stable figure of formation on the film; Then the film after the photographic fixing is washed, developer solution above the flush away and fixing solution were dried 35 seconds～40 seconds under 37 ℃～43 ℃ condition again; Just form second film version on the film with the identical figure of the former mother matrix in small-bore; The time of wherein, development, photographic fixing, washing respectively is 35 seconds～40 seconds.
4. a kind of mother matrix according to claim 1 synthesizes contraposition technology, it is characterized in that: in the step (5), a plurality of first film versions of utilizing splicing to fix copy out the large aperture mother matrix: a plurality of first film versions and the glass dry plate cleaning surfaces that earlier splicing are fixed before the copy are clean, utilize the exposure machine vacuum-pumping system with the condition of vacuum degree for (680～760) * 133.3pa, a plurality of first film versions and glass dry plate that splicing is fixed carried out vacuum suction 8～12 minutes; Be the condition of 1.8lx～2.0lx again with the exposure illumination, a plurality of first film versions that fix with splicing are the exposure that mask carries out 15S～60S, utilizing working temperature is that 19 ℃～21 ℃ developer solution carries out developing in 2～4 minutes to the glass dry plate, makes to form on the glass dry plate and splice the identical figure of first film version that fixes; The last working temperature of utilizing again is that 19 ℃～21 ℃ fixing solution carries out photographic fixing in 2 minutes～4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate; Through above-mentioned steps, just formed the large aperture mother matrix of the identical figure of a plurality of first film versions that fixes with splicing on the glass dry plate.
5. a kind of mother matrix according to claim 1 synthesizes contraposition technology, it is characterized in that: in the step (10), a plurality of second film versions of utilizing contraposition to fix copy out the small-bore mother matrix: a plurality of second film versions and the glass dry plate cleaning surfaces that earlier contraposition are fixed before the copy are clean, utilize the exposure machine vacuum-pumping system with the condition of vacuum degree for (680～760) * 133.3pa, a plurality of second film versions and glass dry plate that contraposition is fixed carried out vacuum suction 8～12 minutes; Be the condition of 1.8lx～2.0lx again with the exposure illumination, a plurality of second film versions that fix with contraposition are the exposure that mask carries out 15S～60S, utilizing working temperature is that 19 ℃～21 ℃ developer solution carries out developing in 2～4 minutes to the glass dry plate, makes and forms the identical figure of second film version that fixes with contraposition on the glass dry plate; The last working temperature of utilizing again is that 19 ℃～21 ℃ fixing solution carries out photographic fixing in 2 minutes～4 minutes to the glass dry plate, makes and forms in white and black stable figure on the glass dry plate; Through above-mentioned steps, just formed the small-bore mother matrix of the identical figure of a plurality of second film versions that fixes with contraposition on the glass dry plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100230996A CN101593647B (en) | 2009-06-29 | 2009-06-29 | Master synthesis and contraposition process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100230996A CN101593647B (en) | 2009-06-29 | 2009-06-29 | Master synthesis and contraposition process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101593647A true CN101593647A (en) | 2009-12-02 |
| CN101593647B CN101593647B (en) | 2010-09-29 |
Family
ID=41408239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009100230996A Expired - Fee Related CN101593647B (en) | 2009-06-29 | 2009-06-29 | Master synthesis and contraposition process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101593647B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101846878A (en) * | 2010-06-21 | 2010-09-29 | 四川虹欧显示器件有限公司 | Large-size film master mask design and combination method thereof |
| CN105922719A (en) * | 2016-05-10 | 2016-09-07 | 天津北玻玻璃工业技术有限公司 | Ultra-wide silk screen dot print film splicing method |
| CN106528977A (en) * | 2016-10-26 | 2017-03-22 | 上海斐讯数据通信技术有限公司 | Gerber file generation method and system |
-
2009
- 2009-06-29 CN CN2009100230996A patent/CN101593647B/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101846878A (en) * | 2010-06-21 | 2010-09-29 | 四川虹欧显示器件有限公司 | Large-size film master mask design and combination method thereof |
| CN101846878B (en) * | 2010-06-21 | 2012-07-04 | 四川虹欧显示器件有限公司 | Large-size film master mask design and combination method thereof |
| CN105922719A (en) * | 2016-05-10 | 2016-09-07 | 天津北玻玻璃工业技术有限公司 | Ultra-wide silk screen dot print film splicing method |
| CN105922719B (en) * | 2016-05-10 | 2018-09-18 | 天津北玻玻璃工业技术有限公司 | Ultra-wide silk screen dot prints film spliced method |
| CN106528977A (en) * | 2016-10-26 | 2017-03-22 | 上海斐讯数据通信技术有限公司 | Gerber file generation method and system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101593647B (en) | 2010-09-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4468843B2 (en) | Manufacturing method of optical waveguide | |
| CN101593647B (en) | Master synthesis and contraposition process | |
| CN105259739B (en) | The photolithography method and device of periodic array in two dimensions are prepared from imaging based on ultraviolet wide spectrum | |
| CN103336418B (en) | Uv keyline layout method and device | |
| JP2014081587A (en) | ALIGNMENT OF SINGLE-MODE POLYMER WAVEGUIDE (PWG) ARRAY AND SILICON WAVEGUIDE (SiWG) ARRAY OF PROVIDING ADIABATIC COUPLING | |
| CN102520482A (en) | Critical method for manufacturing fiber array by semiconductor technology | |
| WO2016023253A1 (en) | Exposure method and exposure apparatus | |
| JP4153442B2 (en) | Manufacturing method of optical module | |
| CN106145029A (en) | A kind of method preparing micro coaxle metal structure on the metallic substrate | |
| JP2015065308A5 (en) | ||
| CN101430401A (en) | Manufacturing method of optical waveguide device and optical waveguide device obtained thereby | |
| JP2006350014A (en) | Optical waveguide element and its manufacturing method | |
| CN103207545A (en) | Electron beam exposure method implemented by aid of ultraviolet setting adhesive | |
| CN103777364B (en) | A kind of manufacture method of graticle | |
| JP2018151416A (en) | Optical connector | |
| CN114966929A (en) | Imposition work template, manufacturing method thereof and method for manufacturing diffraction gratings in batches | |
| KR20110097411A (en) | Method for optical interconnecting of planar lightwave circuit device | |
| CN100468198C (en) | Method for cutting film workpiece | |
| WO2020224071A1 (en) | Photoresist composition, display panel and preparation method therefor | |
| JP2009300562A (en) | Multi-channel right-angled optical path converting element | |
| CN111679549B (en) | Adhesive suitable for pellicle for EUV lithography and pellicle using the adhesive | |
| CN114488392A (en) | Double-sided grating waveguide, preparation method thereof and positioning device | |
| JP3133474B2 (en) | Manufacturing method of optical waveguide with guide groove | |
| CN104765247A (en) | Making method of submicron grating | |
| CN1272671C (en) | Three dimensional microstructure processing method based on thick rubber photoetching |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100929 Termination date: 20130629 |