CN101555441B - Cleaning agent and cleaning process of GGH heat exchange component - Google Patents
Cleaning agent and cleaning process of GGH heat exchange component Download PDFInfo
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- CN101555441B CN101555441B CN2008101036467A CN200810103646A CN101555441B CN 101555441 B CN101555441 B CN 101555441B CN 2008101036467 A CN2008101036467 A CN 2008101036467A CN 200810103646 A CN200810103646 A CN 200810103646A CN 101555441 B CN101555441 B CN 101555441B
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- 238000004140 cleaning Methods 0.000 title claims abstract description 105
- 238000000034 method Methods 0.000 title abstract description 7
- 239000012459 cleaning agent Substances 0.000 title abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000002253 acid Substances 0.000 claims abstract description 29
- 230000002378 acidificating effect Effects 0.000 claims abstract description 26
- 239000003513 alkali Substances 0.000 claims abstract description 19
- 238000005406 washing Methods 0.000 claims abstract description 14
- 239000012530 fluid Substances 0.000 claims description 24
- 238000005554 pickling Methods 0.000 claims description 18
- 230000003068 static effect Effects 0.000 claims description 16
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 claims description 6
- 239000003546 flue gas Substances 0.000 claims description 6
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 claims description 4
- 239000012964 benzotriazole Substances 0.000 claims description 3
- DCEMCPAKSGRHCN-UHFFFAOYSA-N oxirane-2,3-dicarboxylic acid Chemical compound OC(=O)C1OC1C(O)=O DCEMCPAKSGRHCN-UHFFFAOYSA-N 0.000 claims description 3
- LBHZKEWZASOKKW-UHFFFAOYSA-N C(C)(=O)O.NC(=N)N.OCC(P(O)(O)=O)P(O)(O)=O Chemical compound C(C)(=O)O.NC(=N)N.OCC(P(O)(O)=O)P(O)(O)=O LBHZKEWZASOKKW-UHFFFAOYSA-N 0.000 claims description 2
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 claims description 2
- 150000007942 carboxylates Chemical class 0.000 claims description 2
- ZJAOAACCNHFJAH-UHFFFAOYSA-N phosphonoformic acid Chemical class OC(=O)P(O)(O)=O ZJAOAACCNHFJAH-UHFFFAOYSA-N 0.000 claims description 2
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical class [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 claims description 2
- 229920005552 sodium lignosulfonate Polymers 0.000 claims description 2
- 229920001897 terpolymer Polymers 0.000 claims description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 abstract description 17
- 230000000149 penetrating effect Effects 0.000 abstract description 3
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 238000011010 flushing procedure Methods 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000004094 surface-active agent Substances 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 239000012466 permeate Substances 0.000 description 9
- 239000013543 active substance Substances 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 102100035024 Carboxypeptidase B Human genes 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 229940120146 EDTMP Drugs 0.000 description 2
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 2
- 101000946524 Homo sapiens Carboxypeptidase B Proteins 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 2
- JBIROUFYLSSYDX-UHFFFAOYSA-M benzododecinium chloride Chemical compound [Cl-].CCCCCCCCCCCC[N+](C)(C)CC1=CC=CC=C1 JBIROUFYLSSYDX-UHFFFAOYSA-M 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 2
- 230000002000 scavenging effect Effects 0.000 description 2
- 229920006029 tetra-polymer Polymers 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 101150096185 PAAS gene Proteins 0.000 description 1
- 206010065954 Stubbornness Diseases 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- BJFLSHMHTPAZHO-UHFFFAOYSA-N benzotriazole Chemical compound [CH]1C=CC=C2N=NN=C21 BJFLSHMHTPAZHO-UHFFFAOYSA-N 0.000 description 1
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 239000003500 flue dust Substances 0.000 description 1
- 235000003599 food sweetener Nutrition 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000003765 sweetening agent Substances 0.000 description 1
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- Detergent Compositions (AREA)
Abstract
The invention provides a cleaning agent and a cleaning method of a GGH heat exchange component applying the same. The cleaning agent comprises alkaline cleaning solution and acidic cleaning solution, wherein the alkaline cleaning solution contains 1.6 weight percent to 11.0 weight percent (wt, same below) of alkali, 0.7 to 2.4 of penetrating agent, 1.2 to 3.5 of scale dissolver, 0.3 to 1.2 of surfactant, 0.2 to 1.3 of remover b and the balance of water; and the acidic cleaning solution contains 2.6 to 5.5 of strong acid, 0.7 to 2.4 of penetrating agent, 0.3 to 1.2 of latent solvent, 0.2 to 0.6of inhibitor, 0.2 to 1.3 of remover a, and the balance of water. The washing process comprises an alkaline cleaning step, an acid cleaning step and a high-pressure water flushing step between the alk aline cleaning step and the acid cleaning step. The cleaning process and the cleaning agent of the GHH heat exchange component have the advantages of quick and thorough cleaning, low cost, environmental protection, and the like.
Description
Technical field
The present invention relates to a kind of chemical and cleaning, especially relate to a kind of chemical and cleaning that is used for flue gas-flue gas heat exchange device (GGH) heat-exchanging component.
Background technology
Flue gas among the sweetener GGH has brought a large amount of calcium plasters or flue dust from thionizer or in the former flue gas, and the rotor that runs into hygrometric state deposits on the heat transfer element surface in a large number, with producing serious clogging phenomenon.Normally carry out for what guarantee to produce, need wash the dirt on GGH heat exchange element surface, recover the circulation passage of flue gas in the GGH heat exchange element.For this reason, GGH often is equipped with sootblower and is used for daily purging, adopts high pressure water as the seriously stifled lose heart mediation of rotor.But this high pressure water washing in service can only be removed the scum on surface.
For solving the incrustation that the GGH operational process forms, need carry out matting to the GGH heat exchange element.But there are the shortcoming that scavenging period is long, medicament expense is used height, descale effect difference in the chemical of prior art and cleaning.
Summary of the invention
Above-mentioned scavenging period of the prior art is long in order to overcome at least in part, medicament expense is with defectives such as height, descale effect differences, eliminates the fouling of GGH heat exchange element and stops up, the invention provides a kind of newly, clean-out system and cleaning fast and effectively.
According to an aspect of the present invention, a kind of clean-out system is provided, in particular for cleaning the GGH heat-exchanging component, perhaps has been used for the clean-out system of scale removal, said clean-out system comprises alkaline cleaning fluid and the acidic cleaning solution that uses respectively,
Said alkaline cleaning fluid contains the highly basic of 1.6～11.0%wt, the permeate agent of 0.7～2.4%wt, the scale-dissolving agent of 1.2～3.5%wt, the tensio-active agent of 0.3～1.2%wt, the stripper b of 0.2～1.3%wt, and the water of surplus;
Said acidic cleaning solution contains the strong acid of 2.6～5.5%wt, the permeate agent of 0.7～2.4%wt, the solubility promoter of 0.3～1.2%wt, the inhibiter of 0.2～0.6%wt, the stripper a of 0.2～1.3%wt, and the water of surplus.
Said alkaline cleaning fluid and acidic cleaning solution be not special restriction on the use order, can use alkaline cleaning fluid earlier, also can use acidic cleaning solution earlier.The also not special restriction of volume ratio that said alkaline cleaning fluid and acidic cleaning solution use or weight ratio.In one embodiment, the volume ratio scope that said alkaline cleaning fluid and acidic cleaning solution use is about 95: 5-5: 95, in one embodiment; Volume ratio is about 90: 10-10: 90, and in one embodiment, volume ratio is about 80: 20-20: 80; In one embodiment, volume ratio is about 70: 30-30: 70, in one embodiment; Volume ratio is about 60: 40-40: 60, and in one embodiment, volume ratio is for being 50: 50 basically.
Said permeate agent, scale-dissolving agent, tensio-active agent, inhibiter, solubility promoter and stripper can adopt this type of reagent well known in the art.Wherein stripper b (basic) expression is used for the stripper of alkaline cleaning fluid, and stripper a (acid) expression is used for the stripper of acidic cleaning solution.
In one embodiment, said stripper b is selected from one or more in SAP 73 (PASP), poly-epoxy succinic acid (PESA), ROHM (PAA) and the ZX-I (PAAS), is preferably ROHM.
In one embodiment, said stripper a is selected from one or more in SAP 73 (PASP), poly-epoxy succinic acid (PESA), 2-hydroxyethylidene diphosphonic acid guanidine-acetic acid (HPAA) and the ethylene diamine tetra methylene phosphonic acid (EDTMP), is preferably SAP 73.
According to an aspect of the present invention; A kind of clean-out system is provided; In particular for cleaning the clean-out system of GGH heat-exchanging component; Said clean-out system comprises alkaline cleaning fluid and the acidic cleaning solution that uses respectively, and said alkaline cleaning fluid contains the highly basic of 2.0～10.0%wt, the permeate agent of 1.0～2.0%wt, the scale-dissolving agent of 1.5～3.0%wt, the tensio-active agent of 0.5～1.0%wt, the stripper b of 0.5～1.0%wt, and the water of surplus; Said acidic cleaning solution contains the strong acid of 3.0～5.0%wt, the permeate agent of 1.0～2.0%wt, the solubility promoter of 0.5～1.0%wt, the inhibiter of 0.3～0.5%wt, the stripper a of 0.5～1.0%wt, and the water of surplus.
In one embodiment, said alkaline cleaning fluid contains the highly basic of 3～8%wt, the permeate agent of 1%wt, the scale-dissolving agent of 1.5%wt, the tensio-active agent of 0.5%wt, the stripper b of 0.5%wt and the water of surplus; Said acidic cleaning solution contains the strong acid of 3.5～4.5%wt, the inhibiter of 0.3%wt, the permeate agent of 1.0%wt, the solubility promoter of 0.5%wt, the stripper a of 0.5%wt, and the water of surplus.Preferably, said highly basic is NaOH, and said strong acid is HCl, and said permeate agent is AEO (JFC).Preferably, in one embodiment, said alkaline cleaning fluid contains the NaOH of 6%wt, and said acidic cleaning solution contains the HCl of 4%wt.
In one embodiment, said highly basic is selected from alkali metal base, and for example one or both among NaOH and the KOH are preferably NaOH.
In one embodiment; Said permeate agent is selected from AEO (JFC), Zhong Xin polyoxyethylenated alcohol (JFC-2), high fatty alcohol polyethylene oxide ether; For example one or more in SFC, aerosol-OT salt (fast penetrant T) and the succsinic acid di-sec-octyl sodium sulfonate (quickly penetrating agent S) are preferably AEO.
In one embodiment, said scale-dissolving agent is selected from one or more in EDTA (YD 30), HPMA (HPMA), ATMP (ATMP) and the HEDP (HEDP), is preferably HPMA.
In one embodiment; Said tensio-active agent is selected from one or more in dodecyl benzyl dimethyl ammonium chloride (1227), cetyl trimethylammonium bromide (1631), OTAC (1831), desugar sodium lignosulfonate (M-9), TX10 (APE) and the alkylphenol polyethylene oxide ether (for example OP), is preferably dodecyl benzyl dimethyl ammonium chloride.
In one embodiment, said inhibiter is selected from benzotriazole (BTA), 2-mercaptobenzothiazole (MBT), quaternary ammonium salt inhibiter (for example XD-16) and imidazolines inhibiter (for example, one or more in IS-126) is preferably XD-16.
In one embodiment, said strong acid is selected from one or more in the strong acid such as HCl, HNO3, HF and H2SO4, is preferably HCl.
In one embodiment; Said solubility promoter is selected from one or more in vinylformic acid-propenoate-phosphonic acids-sulphonate tetrapolymer (TH-241), TH-3100 carboxylate salt-sulphonate-nonionic terpolymer (TH-3100) and the phosphono-carboxylic acids multipolymer (POCA), is preferably vinylformic acid-propenoate-phosphonic acids-sulphonate tetrapolymer.
According to another aspect of the present invention, a kind of cleaning of GGH heat-exchanging component is provided, said cleaning comprises alkali cleaning step, acid pickling step, and the high pressure water washing step between said alkali cleaning step and the acid pickling step; Said alkali cleaning step comprises, uses alkaline cleaning fluid to carry out static immersing at 65～85 ℃, and soak time is 5～8.5h; Said acid pickling step comprises, uses acidic cleaning solution to carry out static immersing at 45～65 ℃, and soak time is 5～8.5h.
In one embodiment, said alkali cleaning step is carried out static immersing at 70～80 ℃, and soak time is 6～8h, for example 7h; Said acid pickling step carries out static immersing at 50～60 ℃, and soak time is 6～8h, for example 7h.
In a preferred embodiment, said alkali cleaning step is carried out static immersing at 75 ℃, and soak time is 6.5 h; Said acid pickling step carries out static immersing at 55 ℃, and soak time is 6.5h.
In one embodiment, the amount of scale buildup degree according to the GGH heat-exchanging component repeats said cleaning, until cleaning up.
In one embodiment, the cleaning of GGH heat-exchanging component of the present invention can be represented as follows:
In one embodiment, carry out said alkali cleaning step earlier, carry out said acid pickling step again; In another embodiment, carry out said acid pickling step earlier, carry out said alkali cleaning step again.In a preferred embodiment, said cleaning is by as the said alkali cleaning step of the first step, as the said high pressure water washing step in second step, and forms as the said acid pickling step in the 3rd step.In addition, the same with clean-out system, the also not special restriction of volume ratio that said alkaline cleaning fluid and acidic cleaning solution use or weight ratio, alkaline cleaning fluid in the above-mentioned clean-out system and acidic cleaning solution volume ratio are equally applicable to cleaning.
Adopt the cleaning and the clean-out system of GGH heat-exchanging component of the present invention,, clean repeatedly repeatedly and can the GGH heat-exchanging component be cleaned up for the GGH heat-exchanging component of serious fouling.The cleaning of GGH heat-exchanging component of the present invention and clean-out system have clean fast, thoroughly, advantages such as low, the environmental protection of cost; For the fouling of the surperficial stubbornness of GGH heat exchange element, also can clean quickly and efficiently.In addition, after reading this specification sheets, those skilled in the art also can obviously know other advantage of the present invention and effect.
Embodiment
To combine specific embodiment that the present invention is elaborated below, should be appreciated that these specific embodiments only are used to explain the object of the invention, and be not intended to restriction the present invention.Those skilled in the art can obviously carry out various modifications, modification and correction to it after reading specification sheets, these modifications, modification and correction all drop within the scope of the present invention.
Except as otherwise noted, the per-cent among the present invention all is weight percents.
Embodiment 1
Adopt following clean-out system:
Alkaline cleaning fluid contains the water of 6%wtNaOH, 1%wtJFC, 1.5%wtHPMA, 0.5%wt1227,0.5%wtPAA and surplus; Acidic cleaning solution contains 4%wtHCl, 0.3%wt XD-16,1.0%wtJFC, 0.5%wt TH-241,0.5%wtPASP, and the water of surplus.
And adopt following cleaning:
High pressure water washing → alkali cleaning step → high pressure water washing → acid pickling step.
The alkali cleaning step is carried out static immersing at 75 ℃, and soak time is 6.5h; Acid pickling step carries out static immersing at 55 ℃, and soak time is 6.5h.
Having removed area fully is 0.1m
2, thickness is the GGH heat-exchanging component fouling of 7mm, consumes alkaline cleaning fluid and the acidic cleaning solution of each 500mL altogether, whole cleaning process amounts to about 13 hours.
Embodiment 2
Adopt following clean-out system:
Alkaline cleaning fluid contains the water of 2%wtNaOH, 1.5%wt fast penetrant T, 1.5%wtEDTA, 0.5%wt1631,0.5%wtPASP and surplus; Acidic cleaning solution contains 3%wtHCl, 0.3%wtBTA, 1.0%wtJFC, 0.5%wt TH-3100,0.5%wt PESA, and the water of surplus.
And adopt following cleaning:
High pressure water washing → alkali cleaning step → high pressure water washing → acid pickling step.
The alkali cleaning step is carried out static immersing at 70 ℃, and soak time is 5h; Acid pickling step carries out static immersing at 50 ℃, and soak time is 5h.
Having removed area fully is 0.1m
2, thickness is the GGH heat-exchanging component fouling of 6mm, consumes alkaline cleaning fluid and the acidic cleaning solution of each 500mL altogether, whole cleaning process amounts to about 10 hours.
Embodiment 3
Adopt following clean-out system:
Alkaline cleaning fluid contains the water of 10%wtNaOH, 0.8%wtJFC, 1.5%wtHPMA, 0.5%wtM-9,0.5%wtPAAS and surplus; Acidic cleaning solution contains 5%wtHCl, 0.3%wtMBT, 1.0%wtJFC, 0.5%wt POCA, 0.5%wt HPAA, and the water of surplus.
And adopt following cleaning:
High pressure water washing → alkali cleaning step → high pressure water washing → acid pickling step.
The alkali cleaning step is carried out static immersing at 80 ℃, and soak time is 8h; Acid pickling step carries out static immersing at 60 ℃, and soak time is 8h.
Having removed area fully is 0.1m
2, thickness is the GGH heat-exchanging component fouling of 7mm, consumes alkaline cleaning fluid and the acidic cleaning solution of each 500mL altogether, whole cleaning process amounts to about 16 hours.
Those skilled in the art are readily appreciated that clean-out system of the present invention not only is applicable to the GGH heat-exchanging component, also are applicable to similar occasion, for example are used for the cleaning of boiler etc.
Claims (4)
1. clean-out system, said clean-out system comprise alkaline cleaning fluid and the acidic cleaning solution that uses respectively,
Wherein, said alkaline cleaning fluid contains the water of 2%wtNaOH, 1.5%wt aerosol-OT salt, 1.5%wt YD 30,0.5%wt cetyl trimethylammonium bromide, 0.5%wt SAP 73 and surplus; Said acidic cleaning solution contains 3%wtHCl, 0.3%wt benzotriazole, 1.0%wt AEO, 0.5%wt TH-3100 carboxylate salt-sulphonate-nonionic terpolymer, 0.5%wt poly-epoxy succinic acid, and the water of surplus.
2. clean-out system, said clean-out system comprise alkaline cleaning fluid and the acidic cleaning solution that uses respectively,
Wherein, said alkaline cleaning fluid contains the water of 10%wtNaOH, 0.8%wt AEO, 1.5%wt HPMA, 0.5%wt desugar sodium lignosulfonate, 0.5%wt ZX-I and surplus; Said acidic cleaning solution contains 5%wtHCl, 0.3%wt 2-mercaptobenzothiazole, 1.0%wt AEO, 0.5%wt phosphono-carboxylic acids multipolymer, 0.5%wt 2-hydroxyethylidene diphosphonic acid guanidine-acetic acid, and the water of surplus.
3. the cleaning of flue gas-flue gas heat exchange device heat-exchanging component, use the described clean-out system of claim 1, and adopt following cleaning:
High pressure water washing → alkali cleaning step → high pressure water washing → acid pickling step;
Said alkali cleaning step is carried out static immersing at 70 ℃, and soak time is 5h; Said acid pickling step carries out static immersing at 50 ℃, and soak time is 5h.
4. the cleaning of flue gas-flue gas heat exchange device heat-exchanging component, use the described clean-out system of claim 2, and adopt following cleaning:
High pressure water washing → alkali cleaning step → high pressure water washing → acid pickling step;
Said alkali cleaning step is carried out static immersing at 80 ℃, and soak time is 8h; Said acid pickling step carries out static immersing at 60 ℃, and soak time is 8h.
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| CN2008101036467A CN101555441B (en) | 2008-04-09 | 2008-04-09 | Cleaning agent and cleaning process of GGH heat exchange component |
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| CN2008101036467A CN101555441B (en) | 2008-04-09 | 2008-04-09 | Cleaning agent and cleaning process of GGH heat exchange component |
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Address after: 100011 Beijing Dongcheng District, West Binhe Road, No. 22 Patentee after: China Shenhua Energy Co.,Ltd. Patentee after: SHENHUA GUOHUA (BEIJING) ELECTRIC POWER RESEARCH INSTITUTE Co.,Ltd. Patentee after: Xi'an Thermal Power Research Institute Co.,Ltd. Patentee after: Guoneng Yuedian Taishan Power Generation Co.,Ltd. Address before: 100011 Beijing city Dongcheng District No. 16 Andrew intercontinental 4 storey building Patentee before: China Shenhua Energy Co.,Ltd. Patentee before: SHENHUA GUOHUA (BEIJING) ELECTRIC POWER RESEARCH INSTITUTE Co.,Ltd. Patentee before: Xi'an Thermal Power Research Institute Co.,Ltd. Patentee before: GUANGDONG GUOHUA YUEDIAN TAISHAN POWER GENERATION Co.,Ltd. |